CN205799243U - Monocrystal silicon cylinder polishing frock - Google Patents
Monocrystal silicon cylinder polishing frock Download PDFInfo
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- CN205799243U CN205799243U CN201620774578.7U CN201620774578U CN205799243U CN 205799243 U CN205799243 U CN 205799243U CN 201620774578 U CN201620774578 U CN 201620774578U CN 205799243 U CN205799243 U CN 205799243U
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- polishing
- grip block
- monocrystal silicon
- silicon cylinder
- frock
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Abstract
The utility model discloses monocrystal silicon cylinder polishing frock, including clamping device and burnishing device, described clamping device include left grip block, the right grip block matched with left grip block for the left actuator driving left grip block to rotate, for the distance adjusting means driving right grip block to move linearly along left grip block and right grip block place, for the right actuator driving right grip block to rotate；Described burnishing device includes slide glass and the polishing structure being arranged on slide glass, and it utilizes artificial polishing, and polishing effect is good.
Description
Technical field
This utility model relates to optical component processing unit (plant) field, is specifically related to a kind of monocrystal silicon cylinder polishing frock.
Background technology
Grinding machine (grinder, grinding machine) is to utilize grinding tool that surface of the work is carried out the lathe of grinding.
Most grinding machine is that the emery wheel using high speed rotating carries out grinding, and minority is to use other grinding tools such as oilstone, abrasive band
It is processed with free abrasive, such as honing machine, superfinisher, abrasive belt grinding machine, grinder and buffing machine etc..Existing monocrystalline
The polishing of silicon cylinder uses grinding machine to be processed, and its polishing effect is the best, i.e. surface roughness poor effect.
Utility model content
This utility model provides a kind of monocrystal silicon cylinder polishing frock to solve above-mentioned technical problem, and it utilizes artificial throwing
Light, polishing effect is good.
This utility model is achieved through the following technical solutions:
Monocrystal silicon cylinder polishing frock, including clamping device and burnishing device,
Described clamping device includes left grip block, for the left actuator and the left grip block phase that drive left grip block to rotate
The right grip block coordinated, the distance regulation being used for driving right grip block to move linearly along left grip block and right grip block place fill
Put, for the right actuator driving right grip block to rotate；
Described burnishing device includes slide glass and the polishing structure being arranged on slide glass.
The technical solution of the utility model by machinery and manually combines, to improve the precision of monocrystal silicon cylinder polishing.Left
Monocrystal silicon is fixed by grip block and right grip block respectively from the two ends of monocrystal silicon cylinder, and distance adjusting means is to left grip block
With the distance between right grip block is adjusted, beneficially the picking and placeing of monocrystal silicon；Left actuator and right actuator drive left folder respectively
Hold block and right grip block synchronous axial system, i.e. drive monocrystal silicon to rotate；Slide glass, with fixing polishing structure, also allows for human hand held polishing dress
Put.Human hand held burnishing device is polished operation to the monocrystal silicon being in rotation, is conducive to improving the polishing of monocrystal silicon cylinder
Surface roughness.
Described polishing structure is to have the polishing post of burnishing surface.Polishing structure is set to column construction rather than lamellar knot
Structure, it is simple to polishing structure is polished.When the burnishing surface polishing structure is worn, polishing post can be cut, again
Make smooth burnishing surface.
In order to avoid the polishing post destruction to monocrystal silicon, the cross section of described polishing post is circular or oval.Polishing post
Cross section is circular or oval, is the structures such as square, prismatic compared to cross section, and it does not contains corner angle, becomes round and smooth structure, to list
During crystal silicon cylinder polishing operation, corner angle can be avoided to scratch monocrystal silicon cylinder, it is to avoid polishing effect is affected.
Described polishing post has multiple, and multiple the most adjacent arrangements of polishing post and upper surface flush constitute burnishing surface, described throwing
The central shaft of light beam is in the same plane.When monocrystal silicon cylinder is polished, for the ease of force to improve polishing precision, right
The length of burnishing surface has certain requirement, utilizes adjacent being arranged to make up of multiple polishing post to polish structure, it is simple to burnishing surface length
It is adjusted, when burnishing surface length is longer, it is possible to effective reduction polishes the area of slide glass shared by structure.Polishing column section becomes
Circular or oval, its adjacent arrangement and central shaft are in the same plane so that burnishing surface has a complete polish line
Face.
The length of the burnishing surface of described polishing post is more than 40 millimeters and less than 50 millimeters.Polishing post is fixed on slide glass, throws
The length of the burnishing surface that light beam is formed is difficult to long, and when its length is long, during operation, artificial hand-held slide glass is applied to polish on post
Power uneven, affect polishing effect；The length of burnishing surface is not easy to too short, has both been not easy to hand-held, has also reduced polishing efficiency.
Described polishing structure is diamond.
Also including that protective cover, described left grip block and right grip block are respectively positioned in protective cover, described protective cover includes lower cover
Be movably connected in down the upper cover covered, the same side of described upper cover and lower cover is provided with opening.At the list to high speed rotating
When crystal silicon cylinder is processed, coolant keeps inertia to run, and easily damages operator, utilizes protective cover to block cold
But liquid, it is to avoid the coolant attack to operator.Arranging of opening operates for staff.
For the ease of keeping the moistening of processing workpiece and abrasive surface, described on cover and be provided with water inlet, described lower cover
On be provided with outlet.Water inlet water inlet not only can realize the purpose of cooling, and can ensure to polish the self-sharpening of frock, carries
High working (machining) efficiency.
This utility model compared with prior art, at least has such advantages as and beneficial effect:
1, this utility model by machinery and manually combines, and the human hand held burnishing device monocrystal silicon to being in rotation is carried out
Polishing operation, utilizes artificial polishing, is conducive to improving the surface roughness to the polishing of monocrystal silicon cylinder.
2, the length of the burnishing surface of polishing post of the present utility model is more than 40 millimeters and less than 50 millimeters, makes manually to act on
The active force of burnishing surface is uniform, improves polishing effect.
Accompanying drawing explanation
Accompanying drawing described herein is used for providing being further appreciated by this utility model embodiment, constitutes the one of the application
Part, is not intended that the restriction to this utility model embodiment.In the accompanying drawings:
Fig. 1 is the structural representation of this utility model clamping device.
Fig. 2 is the structural representation of this utility model burnishing device.
The parts title of labelling and correspondence in accompanying drawing:
11, left grip block；12, left actuator；21, right grip block；22, distance adjusting means；23, right actuator；31, carry
Sheet；32, polishing structure；41, lower cover；42, upper cover；43, opening；44, water inlet；45, outlet.
Detailed description of the invention
For making the purpose of this utility model, technical scheme and advantage clearer, below in conjunction with embodiment and accompanying drawing,
The utility model is described in further detail, and exemplary embodiment of the present utility model and explanation thereof are only used for explaining this
Utility model, is not intended as restriction of the present utility model.
Embodiment 1
A kind of monocrystal silicon cylinder polishing frock as depicted in figs. 1 and 2, including clamping device and burnishing device,
Described clamping device includes left grip block 11, for the left actuator 12 driving left grip block 11 to rotate and left folder
Hold right grip block 21 that block 11 matches, for driving right grip block 21 to move along left grip block 11 and right grip block 21 place straight line
Dynamic distance adjusting means 22, for the right actuator 23 driving right grip block 21 to rotate；
Described burnishing device includes slide glass 31 and the polishing structure 32 being arranged on slide glass 31.
Left actuator 12, right actuator 23 all can use the structures such as motor to realize, and it controls left grip block 11, right folder respectively
Hold block 21 in same direction, same rotational speed rotate.Distance adjusting means 22 can use existing various structures to realize.
During operation, finely tune distance adjusting means 22, make right grip block 21 move to the direction away from left grip block 11, will be single
Between crystal silicon cylinder traverse and left grip block 11, right grip block 21, adjustable range adjusting means 22 again, make right grip block 21 to
Rightabout moves to be matched for clamping tightly monocrystal silicon cylinder with left grip block 11.Control left actuator 12, right actuator 23, left clamping
Block 11, right grip block 21 drive monocrystal silicon to rotate while synchronous axial system, the hand-held slide glass of operator, utilize polishing structure pair
Monocrystal silicon cylinder polishes.This programme i.e. uses machinery and manually combines, and improves the rough surface of the polishing to monocrystal silicon cylinder
Degree.
Embodiment 2
The present embodiment refines on the basis of above-described embodiment, and the most described polishing structure 32 is the throwing with burnishing surface
Light beam.
Described polishing post can use cross section to be circular or oval structure.
Polishing post can use single realization to may be used without multiple realization, for the ease of polishing the setting of structure, preferably throws
Light beam has multiple, and multiple the most adjacent arrangements of polishing post and upper surface flush constitute burnishing surface, the central shaft position of described polishing post
On same plane.
The length of the burnishing surface of described polishing post is more than 40 millimeters and less than 50 millimeters.Experimental results demonstrate, burnishing surface
Length when 45 millimeter, the power being manually exerted to polish on post is uniform, and is easy to be controlled power.Preferably may be used
Directly the length of burnishing surface is set to 45 millimeters.
Described polishing structure 32 is diamond.
Embodiment 3
The present embodiment optimizes on the basis of above-described embodiment, the most also includes protective cover, described left grip block 11 He
Right grip block 21 is respectively positioned in protective cover, and described protective cover includes lower cover 41 and the upper cover 42 being movably connected on lower cover 41, institute
The same side stating upper cover 42 and lower cover 41 is provided with opening 43.Can be connected by structures such as loose-leaves between upper cover and lower cover.
For the ease of the observation to monocrystal silicon cylinder polishing situation, the upper cover 42 generally transparence of workpiece protective cover.
It is provided with water inlet 44 on described upper cover 42, described lower cover 41 is provided with outlet 45.
Above-described detailed description of the invention, is entered the purpose of this utility model, technical scheme and beneficial effect
One step describes in detail, be it should be understood that and the foregoing is only detailed description of the invention of the present utility model, is not used to limit
Fixed protection domain of the present utility model, all within spirit of the present utility model and principle, any amendment, the equivalent made are replaced
Change, improvement etc., within should be included in protection domain of the present utility model.
Claims (8)
1. monocrystal silicon cylinder polishing frock, including clamping device and burnishing device, it is characterised in that:
Described clamping device includes left grip block (11), is used for the left actuator (12) and the left side that drive left grip block (11) to rotate
Right grip block (21) that grip block (11) matches, it is used for driving right grip block (21) along left grip block (11) and right grip block
(21) place rectilinear movement distance adjusting means (22), be used for the right actuator (23) that drives right grip block (21) to rotate；
Described burnishing device includes slide glass (31) and the polishing structure (32) being arranged on slide glass (31).
Monocrystal silicon cylinder the most according to claim 1 polishing frock, it is characterised in that: described polishing structure (32) is for having
The polishing post of burnishing surface.
Monocrystal silicon cylinder the most according to claim 2 polishing frock, it is characterised in that: the cross section of described polishing post is circular
Or it is oval.
4. polish frock according to the monocrystal silicon cylinder described in Claims 2 or 3, it is characterised in that: described polishing post has multiple, many
The individual the most adjacent arrangement of polishing post and upper surface flush constitute burnishing surface, and the central shaft of described polishing post is in the same plane.
Monocrystal silicon cylinder the most according to claim 2 polishing frock, it is characterised in that: the length of the burnishing surface of described polishing post
Degree is more than 40 millimeters and less than 50 millimeters.
Monocrystal silicon cylinder the most according to claim 1 polishing frock, it is characterised in that: described polishing structure (32) is Buddha's warrior attendant
Stone.
Monocrystal silicon cylinder the most according to claim 1 polishing frock, it is characterised in that: also include protective cover, described left folder
Holding block (11) and right grip block (21) is respectively positioned in protective cover, described protective cover includes lower cover (41) and is movably connected in lower cover
(41) upper cover (42) on, the same side of described upper cover (42) and lower cover (41) is provided with opening (43).
Monocrystal silicon cylinder the most according to claim 7 polishing frock, it is characterised in that: be provided with on described upper cover (42) into
The mouth of a river (44), described lower cover (41) is provided with outlet (45).
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201620774578.7U CN205799243U (en) | 2016-07-22 | 2016-07-22 | Monocrystal silicon cylinder polishing frock |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201620774578.7U CN205799243U (en) | 2016-07-22 | 2016-07-22 | Monocrystal silicon cylinder polishing frock |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN205799243U true CN205799243U (en) | 2016-12-14 |
Family
ID=57509189
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201620774578.7U Active CN205799243U (en) | 2016-07-22 | 2016-07-22 | Monocrystal silicon cylinder polishing frock |
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| Country | Link |
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| CN (1) | CN205799243U (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN106002623A (en) * | 2016-07-22 | 2016-10-12 | 成都贝瑞光电科技股份有限公司 | Monocrystalline silicon cylinder polishing fixture |
-
2016
- 2016-07-22 CN CN201620774578.7U patent/CN205799243U/en active Active
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN106002623A (en) * | 2016-07-22 | 2016-10-12 | 成都贝瑞光电科技股份有限公司 | Monocrystalline silicon cylinder polishing fixture |
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| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant |