CN207408730U - A kind of efficient, even light shaping lighting system of high uniformity passive beam - Google Patents
A kind of efficient, even light shaping lighting system of high uniformity passive beam Download PDFInfo
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- CN207408730U CN207408730U CN201721592256.1U CN201721592256U CN207408730U CN 207408730 U CN207408730 U CN 207408730U CN 201721592256 U CN201721592256 U CN 201721592256U CN 207408730 U CN207408730 U CN 207408730U
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- semiconductor laser
- optical element
- high uniformity
- diffraction optical
- lighting system
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Abstract
The utility model discloses a kind of efficient, even light shaping lighting system of high uniformity passive beam, including semiconductor laser array module, diffraction optical element, six rib stick integration devices, square rod integration device.Semiconductor laser is arranged by regular hexagon, as light source；Diffraction optical element expands light source；Six rib stick integration devices carry out even light to the hot spot after expanding；Square rod integration device is to light beam further even light, and be rectangle by beam shaping, for use in projection display system.The utility model can obtain the rectangular illumination hot spot of high uniformity, suitable for laser projection display field.
Description
Technical field
The utility model is related to projection display technique fields, are specially a kind of efficient, even finishing of high uniformity passive beam
Shape lighting system.
Background technology
It is needed in projection display system by image display on the screen of large area, this just needs lighting system that can send
The illumination spot of high uniformity, uniform illumination micro display chip（Usually 4:3 or 16:9 rectangular shape）.Yet with photograph
The inhomogeneities for the light beam that light source in bright system is sent, and light spot shape is also not rectangle, and illumination efficiency is subject to serious shadow
It rings.In order to which the hot spot for being emitted lighting system matches with display chip, illumination efficiency is improved, it is necessary to the light beam sent to light source
Carry out even light and Shape correction.Mainly located among these using two kinds of integration devices of square rod integrator and compound eye array lens
Reason.Compared to compound eye array lens, the even smooth mode of square rod integrator have many advantages, such as that craftsmanship is preferable, at low cost and principle is simple and
It is widely adopted.
At present, in the even smooth mode of square rod integrator using it is relatively broad be revolution ellipsoid and single square rod combination side
Formula, one end of square rod are located at second focal position of ellipsoid, and incident beam is in optical wand inner surface multiple reflections, so as to reach even light
Effect.However for square rod integration device, the output light field uniformity is related with square rod length, within the specific limits, exists most
Good optical wand length, therefore, the even light effect of single square rod have certain limitation.
Utility model content
The purpose of this utility model is to provide it is a kind of efficiently, the even light shaping lighting system of high uniformity passive beam, with
Solve the problems mentioned above in the background art.
To achieve the above object, the utility model provides following technical solution：One kind is efficient, high uniformity passive beam is even
Light shaping lighting system, including semiconductor laser array module, diffraction optical element, six rib stick integration devices, square rod integration
Device；The diffraction optical element is arranged between semiconductor laser array module and six rib stick integration devices, six rib
Stick integration device is arranged between diffraction optical element and square rod integration device.
Preferably, the semiconductor laser array mould each semiconductor laser in the block uses close-packed arrays mode, row
Into regular hexagon, quadrangle or equilateral triangle, primary light source is formed.
Preferably, the semiconductor laser quantity is 3n2- 3n+1, wherein, n is regular hexagon, quadrangle or positive three
The angular semiconductor laser quantity per side.
Preferably, diffraction optical element is inserted into after the semiconductor laser array module, noise spectra of semiconductor lasers is sent
Light beam expanded.
Compared with prior art, the beneficial effects of the utility model are：
（1）The utility model can obtain the rectangular illumination hot spot of high uniformity, suitable for laser projection display field.
（2）The utility model employs the even smooth mode of combination of six rib stick integration devices and square rod integration device, improves light
Beam uniformity and even light quality.
（3）The hot spot that the utility model is emitted light source using diffraction optical element expands, even so as to improve
Light efficiency.
Description of the drawings
Fig. 1 is the utility model structure diagram.
Fig. 2 is each laser spread pattern schematic diagram in semiconductor laser array module in the utility model；
Fig. 3 is each laser another kind spread pattern schematic diagram in semiconductor laser array module in the utility model；
Fig. 4 is each laser another kind spread pattern schematic diagram in semiconductor laser array module in the utility model；
Fig. 5 is semiconductor laser array module, diffraction optical element and the even light integrators of hexagonal prisms in the utility model
Apart from schematic diagram between part.
Fig. 6 is the hot spot and expanded through diffraction optical element that semiconductor laser array module is sent in the utility model
Beam speckle contrast's schematic diagram afterwards.
Fig. 7 is the hot spot angle schematic diagram incided into the utility model in six rib stick integration devices.
Specific embodiment
The following is a combination of the drawings in the embodiments of the present utility model, and the technical scheme in the embodiment of the utility model is carried out
It clearly and completely describes, it is clear that the described embodiments are only a part of the embodiments of the utility model rather than whole
Embodiment.Based on the embodiment in the utility model, those of ordinary skill in the art are without making creative work
All other embodiments obtained shall fall within the protection scope of the present invention.
Referring to Fig. 1, the utility model provides a kind of technical solution：A kind of efficient, even finishing of high uniformity passive beam
Shape lighting system, including semiconductor laser array module 101, diffraction optical element 102, six rib stick integration devices 103, square rod
Integration device 104；The diffraction optical element 102 is arranged on 101 and six rib stick integration device of semiconductor laser array module
Between 103, the six ribs stick integration device 103 is arranged between diffraction optical element 102 and square rod integration device 104.Wherein
101 specific spread pattern of semiconductor laser array module is as shown in Figure 2；It is fifty-fifty in semiconductor laser array module 101
Conductor laser uses close-packed arrays mode, lines up regular hexagon, quadrangle or equilateral triangle, forms primary light source；Light source
After diffraction optical element expands, the angle of divergence of hot spot will increase the light beam sent, and it is even to incide into the progress of six rib stick integration devices
Light, then through square rod integration device further even light, and be rectangle by beam shaping, for use in projection display system.It is described
Hexagonal prisms integration device be that the hot spot after diffraction optical element expands is homogenized.The square rod integration device is
Hot spot uniformity coefficient is further improved, and is rectangle by spot shaping；Semiconductor laser quantity is 3n2- 3n+1, wherein, n is
The semiconductor laser quantity of regular hexagon, quadrangle or equilateral triangle per side, wherein semiconductor laser tail optical fiber radius are
A, the numerical aperture of tail optical fiber is 0.22.
In the utility model, diffraction optical element 102 is inserted into after semiconductor laser array module 101, semiconductor is swashed
The light beam that light device is sent is expanded.To improve the even light efficiency of six rib stick integration devices and square rod integration device；It is even in light beam
The even light integrators part of six rib sticks is inserted into light shaping lighting system, to improve even light effect.
In the utility model, the light that light source is sent is irradiated to six rib stick integration devices after diffraction optical element 102 expands
On 103,105 shape of hot spot is approximate regular hexagon.Wherein, semiconductor laser array module 101 arrives diffraction optical element 102
The distance between be that the distance between x, 102 to six rib stick integration device 103 of diffraction optical element is y, as shown in Figure 3.Diffraction
The angle of divergence of optical element 102 is 9 °, then the light beam that semiconductor laser array module 101 is sent as light source is through diffraction optics
After element 102, when being irradiated in six rib stick integration devices 103, compared to the light beam that semiconductor laser array module 101 is sent,
Spot width expands z, and z is approximately equal to 0.23x+0.40y, as shown in figure 4, area expands。
The angle of divergence and control room of reasonable selection diffraction optical element 102 are away from x and y so that the light beam after expanding can be completely into six
In rib stick integration device 103, and the angle of divergence of light beam is in the numerical aperture of six rib stick integration devices 103.Rotate six rib sticks
Integration device 103, can make hot spot 105 and six rib stick integration devices 103 while with while it is parallel or have certain angle theta, θ is in 0-
Between 60 °, as shown in Figure 5.Selecting θ, the beam shape after six rib stick integration devices, 103 even light is for 30 ° of tangential manner
Dodecagon.Again through the rectangular Uniform Illumination light beam of 104 even light shaping of square rod integration device, to meet projection display system
It needs.
The utility model employs the even smooth mode of combination of six rib stick integration devices and square rod integration device, and it is equal to improve light beam
Evenness and even light quality；The hot spot that the utility model is emitted light source using diffraction optical element expands, so as to carry
High even light efficiency；The utility model can obtain the rectangular illumination hot spot of high uniformity, suitable for laser projection display field.
While there has been shown and described that the embodiment of the utility model, for the ordinary skill in the art,
It is appreciated that in the case where not departing from the principle of the utility model and spirit can these embodiments be carried out with a variety of variations, repaiied
Change, replace and modification, the scope of the utility model are defined by the appended claims and the equivalents thereof.
Claims (4)
1. a kind of efficient, even light shaping lighting system of high uniformity passive beam, it is characterised in that：Including semiconductor laser battle array
Row module（101）, diffraction optical element（102）, six rib stick integration devices（103）, square rod integration device（104）；The diffraction
Optical element（102）It is arranged on semiconductor laser array module（101）With six rib stick integration devices（103）Between, described six
Rib stick integration device（103）It is arranged on diffraction optical element（102）With square rod integration device（104）Between.
2. a kind of efficient, even light shaping lighting system of high uniformity passive beam according to claim 1, feature exist
In：The semiconductor laser array module（101）In each semiconductor laser using close-packed arrays mode, line up positive six side
Shape, quadrangle or equilateral triangle form primary light source.
3. a kind of efficient, even light shaping lighting system of high uniformity passive beam according to claim 2, feature exist
In：The semiconductor laser quantity is 3n2- 3n+1, wherein, n is half of regular hexagon, quadrangle or equilateral triangle per side
Conductor laser quantity.
4. a kind of efficient, even light shaping lighting system of high uniformity passive beam according to claim 1, feature exist
In：The semiconductor laser array module（101）After be inserted into diffraction optical element（102）, what noise spectra of semiconductor lasers was sent
Light beam is expanded.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201721592256.1U CN207408730U (en) | 2017-11-24 | 2017-11-24 | A kind of efficient, even light shaping lighting system of high uniformity passive beam |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201721592256.1U CN207408730U (en) | 2017-11-24 | 2017-11-24 | A kind of efficient, even light shaping lighting system of high uniformity passive beam |
Publications (1)
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|---|---|
| CN207408730U true CN207408730U (en) | 2018-05-25 |
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Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN107656415A (en) * | 2017-11-24 | 2018-02-02 | 北京速镭视激光科技有限公司 | A kind of efficient, even light shaping illuminator of high uniformity passive beam |
| CN117518336A (en) * | 2024-01-08 | 2024-02-06 | 中国科学院苏州生物医学工程技术研究所 | Ultrashort dodging system |
| CN117518336B (en) * | 2024-01-08 | 2024-04-12 | 中国科学院苏州生物医学工程技术研究所 | Ultrashort dodging system |
-
2017
- 2017-11-24 CN CN201721592256.1U patent/CN207408730U/en active Active
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN107656415A (en) * | 2017-11-24 | 2018-02-02 | 北京速镭视激光科技有限公司 | A kind of efficient, even light shaping illuminator of high uniformity passive beam |
| CN117518336A (en) * | 2024-01-08 | 2024-02-06 | 中国科学院苏州生物医学工程技术研究所 | Ultrashort dodging system |
| CN117518336B (en) * | 2024-01-08 | 2024-04-12 | 中国科学院苏州生物医学工程技术研究所 | Ultrashort dodging system |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| GR01 | Patent grant | ||
| GR01 | Patent grant | ||
| TR01 | Transfer of patent right |
Effective date of registration: 20190312 Address after: 230000 Pearl Industrial Park, 106 Innovation Avenue, Hefei High-tech Zone, Anhui Province Patentee after: Hefei Panchromatic Light Display Technology Co., Ltd. Address before: 100023 Beijing Daxing District Beijing Economic and Technological Development Zone Patentee before: BEIJING SUPERLASER TECHNOLOGY CO., LTD. |
|
| TR01 | Transfer of patent right |