CN207337072U - 图像投影装置及系统 - Google Patents

图像投影装置及系统 Download PDF

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Publication number
CN207337072U
CN207337072U CN201721232612.9U CN201721232612U CN207337072U CN 207337072 U CN207337072 U CN 207337072U CN 201721232612 U CN201721232612 U CN 201721232612U CN 207337072 U CN207337072 U CN 207337072U
Authority
CN
China
Prior art keywords
prism
image projection
digital micromirror
light beam
micromirror device
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
CN201721232612.9U
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English (en)
Chinese (zh)
Inventor
D·马克莱
T·L·莱迪戈
T·N·托马斯
陈正方
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Applied Materials Inc
Original Assignee
Applied Materials Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Applied Materials Inc filed Critical Applied Materials Inc
Application granted granted Critical
Publication of CN207337072U publication Critical patent/CN207337072U/zh
Active legal-status Critical Current
Anticipated expiration legal-status Critical

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Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/04—Prisms
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
    • G02B26/08—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light
    • G02B26/0816—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements
    • G02B26/0833—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements the reflecting element being a micromechanical device, e.g. a MEMS mirror, DMD
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
    • G02B26/08—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light
    • G02B26/0816—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
    • G02B26/08—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light
    • G02B26/0875—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more refracting elements
    • G02B26/0883—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more refracting elements the refracting element being a prism
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/09—Beam shaping, e.g. changing the cross-sectional area, not otherwise provided for
    • G02B27/0938—Using specific optical elements
    • G02B27/0977—Reflective elements
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/18—Diffraction gratings
    • G02B5/1861—Reflection gratings characterised by their structure, e.g. step profile, contours of substrate or grooves, pitch variations, materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
    • G03F7/2008—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image characterised by the reflectors, diffusers, light or heat filtering means or anti-reflective means used
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2051—Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Computer Hardware Design (AREA)
  • Manufacturing & Machinery (AREA)
  • Power Engineering (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Mechanical Light Control Or Optical Switches (AREA)
  • Projection Apparatus (AREA)
  • Optical Elements Other Than Lenses (AREA)
  • Microscoopes, Condenser (AREA)
CN201721232612.9U 2016-02-25 2017-02-24 图像投影装置及系统 Active CN207337072U (zh)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
US201662299777P 2016-02-25 2016-02-25
US62/299,777 2016-02-25
US201662363597P 2016-07-18 2016-07-18
US62/363,597 2016-07-18
CN201720170550.7U CN206563865U (zh) 2016-02-25 2017-02-24 受抑立方体形组件

Related Parent Applications (1)

Application Number Title Priority Date Filing Date
CN201720170550.7U Division CN206563865U (zh) 2016-02-25 2017-02-24 受抑立方体形组件

Publications (1)

Publication Number Publication Date
CN207337072U true CN207337072U (zh) 2018-05-08

Family

ID=58505139

Family Applications (2)

Application Number Title Priority Date Filing Date
CN201721232612.9U Active CN207337072U (zh) 2016-02-25 2017-02-24 图像投影装置及系统
CN201720170550.7U Active CN206563865U (zh) 2016-02-25 2017-02-24 受抑立方体形组件

Family Applications After (1)

Application Number Title Priority Date Filing Date
CN201720170550.7U Active CN206563865U (zh) 2016-02-25 2017-02-24 受抑立方体形组件

Country Status (5)

Country Link
JP (1) JP3209936U (ko)
KR (1) KR200496178Y1 (ko)
CN (2) CN207337072U (ko)
DE (1) DE202017100852U1 (ko)
TW (1) TWM548800U (ko)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN111487837A (zh) * 2019-01-25 2020-08-04 舜宇光学（浙江）研究院有限公司 一种基于dlp技术的微型投影光引擎
KR20220003367A (ko) 2020-07-01 2022-01-10 김은진 고양이 캣닢봉 장난감

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20090190101A1 (en) * 2008-01-28 2009-07-30 International Business Machines Corporation Double-Reverse Total-Internal-Reflection-Prism Optical Engine
KR20120131359A (ko) * 2011-05-25 2012-12-05 삼성전자주식회사 릴레이 렌즈들이 생략된 영상투사장치
US9250509B2 (en) * 2012-06-04 2016-02-02 Applied Materials, Inc. Optical projection array exposure system
TW201505743A (zh) * 2013-08-13 2015-02-16 Hon Hai Prec Ind Co Ltd 雷射加工裝置

Also Published As

Publication number Publication date
TWM548800U (zh) 2017-09-11
CN206563865U (zh) 2017-10-17
KR200496178Y1 (ko) 2022-11-17
DE202017100852U1 (de) 2017-06-02
KR20170003102U (ko) 2017-09-04
JP3209936U (ja) 2017-04-13

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