CN207282462U - Semiconductor silicon ring circulation cleaning washing trough - Google Patents
Semiconductor silicon ring circulation cleaning washing trough Download PDFInfo
- Publication number
- CN207282462U CN207282462U CN201720995162.2U CN201720995162U CN207282462U CN 207282462 U CN207282462 U CN 207282462U CN 201720995162 U CN201720995162 U CN 201720995162U CN 207282462 U CN207282462 U CN 207282462U
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- rinse bath
- reserve tank
- semiconductor silicon
- silicon ring
- liquid reserve
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Abstract
The utility model discloses a kind of semiconductor silicon ring circulation cleaning washing trough, including rinse bath and liquid reserve tank, the open topped of the rinse bath, recursive filter and communicating valve are equipped between rinse bath and liquid reserve tank, one end of the communicating valve is connected with rinse bath, the other end is connected with liquid reserve tank, and the liquid in the rinse bath can be entered in liquid reserve tank by communicating valve；The pump intake of recursive filter is connected with liquid reserve tank, its port of export is connected with rinse bath, and liquid can be entered in rinse bath by recursive filter in liquid reserve tank.Using above structure, realize that etching solution repeatedly utilizes and quality improves to being cleaned in rinse bath, without hindering normal cleaning etching to carry out, improve the utilization rate of cleaning solution, reduce production cost, cleaning etching efficiency is improved at the same time, while can also improve the uniformity of semiconductor silicon ring surface cleaning etching, improves the yields of product.
Description
Technical field
The utility model belongs to semiconductor etching technique field, and in particular to a kind of semiconductor silicon ring circulation cleaning washing trough.
Background technology
The etching of semiconductor is that semiconductor is immersed to the unwanted material of remover surface attachment in etching solution, is ensured
Its clean purity, in existing Etaching device, in disk or cricoid semiconductor silicon ring, typically hangs over silicon ring generally
Frock on, then be put into etching groove static soak in etching solution, such silicon ring each several part is because the etching solution being subject to is pressed
Power effect is different, then cleaning action is also different, and it is uneven so to will result in the etching of ring product surface, so as to reduce the good of product
Product rate；
In addition, because the cleaning etching solution for etching is all special chemical liquid, in traditional equipment, when clear
Liquid rinse in washing trough is contaminated to be continuing with passing through it, it is necessary to which liquid is collected separately out to after to a certain degree
His treatment process and then pour into rinse bath uses, or directly outwells what is more renewed, and which adds be produced into
This, or the normal work of cleaning etching is hindered, reduce cleaning etching efficiency.
Utility model content
To solve above technical problem, the utility model provides a kind of semiconductor silicon ring circulation cleaning washing trough, there is provided etching
The utilization rate of cleaning solution, reduces the holding time for being replaced and cleaned liquid, there is provided cleaning etching efficiency.
To achieve the above object, technical solutions of the utility model are as follows：
A kind of semiconductor silicon ring circulation cleaning washing trough, its key are：Including rinse bath and liquid reserve tank, the rinse bath it is upper
Portion is open, and recursive filter and communicating valve are equipped between rinse bath and liquid reserve tank, and one end of the communicating valve is connected with rinse bath,
The other end is connected with liquid reserve tank, and the liquid in the rinse bath can be entered in liquid reserve tank by communicating valve；
The pump intake of the recursive filter is connected with liquid reserve tank, its port of export is connected with rinse bath, liquid in liquid reserve tank
It can be entered by recursive filter in rinse bath.
Using above scheme, pass through company by then being carved when cleaning tank liquid is excessive or is contaminated being continuing with
Port valve enters in liquid reserve tank, is then continuing with again by being pumped into after recursive filter filtering in rinse bath again, so as to improve erosion
The utilization rate of cleaning solution is carved, while reduces the time for being replaced and cleaned liquid, is conducive to improve the efficiency of etch cleaning, and reduces life
Produce cost.
As preferred：The liquid reserve tank is equipped with liquid injection port close to the position on top, and dump valve is equipped with close to the position of lower part.
Using above structure, it is advantageously implemented quickly to the supplement for cleaning etching solution and exclusion, and cleaning etching process will not be hindered,
Improve efficiency.
As preferred：The cleaning groove sidewall is equipped with overfolw hole close to the position on top.Using above structure, avoid cleaning
After liquid in groove is excessive, the immoderate spilling of open-mouth from its upper end pollutes external environment condition, and from one position of overfolw hole
Outflow, then facilitate processing to collect.
As preferred：It is equipped with the rinse bath and is used to keep semiconductor silicon ring to rotate in rinse bath in etching process
Support driving mechanism, the support driving mechanism includes at least three support shafts being arranged in parallel, and driving is at least within
The driving motor that piece support shaft rotates, each support shaft is triangular in shape in rinse bath or arc-shaped distribution.Using above structure,
Semiconductor silicon ring is realized by support shaft and is supported, while drives semiconductor silicon ring to rotate by the rotation of support shaft, it is ensured that
The uniformity of semiconductor silicon ring etch cleaning, improves yields, has the advantages of simple structure and easy realization.
As preferred：Annular groove is distributed along its length in the support shaft, and the annular groove face in each support shaft is set
Put.Using above structure, axial limiting can be carried out to semiconductor silicon ring, it is ensured that it prevents deflection in the stability of rotation process
Damaged in collision, annular groove can be directly process in support shaft, and be come without introducing more parts as position limiting structure, drop
Low manufacturing cost, and difficulty of processing.
As preferred：The support driving mechanism further includes two installing plates for being symmetrically disposed on support shaft both ends, described
Support shaft is three, is horizontally set in rinse bath, and the driving motor is installed on the side of rinse bath, and three support shafts are in three
Angular distribution a, wherein support shaft close to bottom of rinse bath is connected with driving motor.Using above structure, pass through three branch
The supporting structure that axis forms triangle is supportted, semiconductor silicon ring is put into the shape with the inscribed circle of similar triangle after three support shafts afterwards
Shape is abutted with three support shafts, and its weight is mainly by the spring bearing close to cleaning groove bottom wall by then design driven motor drives
Move this root support shaft to rotate, can preferably ensure the stability that semiconductor silicon ring is servo-actuated, reduce the probability for skidding and stopping operating,
Further improve the reliability of device.
As preferred：The position that the installing plate corresponds to two support the end of the shaft not being connected with driving motor is equipped with cunning
Groove, two support shaft both ends extend through sliding slot, and can be slided along the sliding slot, and the support shaft runs through the end of sliding slot
It is equipped with locking nut.Using above structure, the size for the support triangle shape that three support shafts are formed can be so adjusted, from
And different size of semiconductor silicon ring is adapted to, the applicability of device is further increased, and after adjusting in place, locking can be passed through
Nut is locked, and ensure that the stability after its adjusting.
Compared with prior art, the beneficial effects of the utility model are：
Using semiconductor silicon ring circulation cleaning washing trough provided by the utility model, during etch cleaning, by being circulated throughout
Filter and the cooperation for connecting valve arrangement, are realized to cleaning etching solution repeatedly utilizes in rinse bath and quality improves, and
Normal cleaning etching will not be hindered to carry out, the utilization rate of cleaning solution is improved, reduce production cost, while improve cleaning etching
Efficiency, while the uniformity of semiconductor silicon ring surface cleaning etching can be also improved, improve the yields of product.
Brief description of the drawings
Fig. 1 is the utility model structure diagram；
Fig. 2 is the stereogram of embodiment illustrated in fig. 1；
Fig. 3 is the structure diagram of support driving mechanism；
Fig. 4 is rinse bath internal structure schematic diagram；
Fig. 5 is the mounting structure schematic diagram of support driving mechanism；
The use state diagram of Fig. 6 the utility model.
Embodiment
The utility model is described in further detail with attached drawing with reference to embodiments.
It is main to include in the clear of hollow rectangular parallelepiped structure referring to figs. 1 to the semiconductor silicon ring circulation cleaning washing trough shown in Fig. 6
Washing trough 1 and liquid reserve tank 3, and the internal capacity of liquid reserve tank 3 is more than the internal capacity of rinse bath 1, rinse bath 1 is located at liquid reserve tank 3
Top, its upper part is open, and liquid reserve tank 3 is closed babinet.
It is the compactedness of holding meanss with reference to figure 1 and Fig. 2, rinse bath 1 and liquid reserve tank 3 are of same size, and liquid reserve tank 3
It is longer than rinse bath 1, be equipped with communicating valve 5 in the side of rinse bath 1, the upper end of communicating valve 5 connect with the inside of rinse bath 1, lower end and
The connection of the inside of liquid reserve tank 3, can so when the etch cleaning liquid in rinse bath 1 is excessive or cannot be continuing with because of cleaning pollution
It is directly entered by communicating valve 5 in the liquid reserve tank 3 of lower part；
Recursive filter 4 is additionally provided between rinse bath 1 and liquid reserve tank 3, as shown in the figure, the front end of 1 length direction of rinse bath
Align with liquid reserve tank 3, recursive filter 4 is then located at the rear end of rinse bath 1, and direct seat is on the roof of liquid reserve tank 3, circulating filtration
The lower part of device 4 is equipped with pump intake 41, and pump intake 41 is stretched into inside liquid reserve tank 3 and communicated therewith, and close to the bottom of liquid reserve tank 3, follows
Ring filter 4 is set straight up, and the inside of its port of export 40 and rinse bath 1 connect, inside recursive filter 4 in pump intake 41 and
Filter assemblies (not shown) is come between the port of export 40, filter assemblies can be sponge kind material, etching can be produced miscellaneous
Matter produce suction-operated, improve cleaning solution quality, and do not influence etch cleaning liquid normal through；
By communicating valve 5 and recursive filter 4, then when the cleaning solution in rinse bath 1 is contaminated being unable to normal use,
Then entered by communicating valve 5 in liquid reserve tank 3, then the effect by recursive filter 4, i.e., it is then relatively clean by being pumped into, filtering
Net cleaning solution is again introduced into rinse bath 1, realizes the quick cyclic utilization of cleaning solution, is saved the replacing construction of cleaning solution, is carried
High etch cleaning efficiency, while the utilization rate of etch cleaning liquid is added, reduce production cost.
Certainly, etch cleaning liquid can not possibly use always, and in order to during etch cleaning liquid is replaced, not interfere with
To normal cleaning etching work procedure, liquid injection port 30 is equipped with the roof of liquid reserve tank 3, can be quickly to liquid storage by liquid injection port 30
The pure cleaning etching liquid of supplement, is equipped with dump valve 31 close to the position of bottom in 3 side wall of liquid reserve tank, passes through discharge in case 3
Valve 31 can discharge the liquid in liquid reserve tank 3, and liquid injection port 30 is used cooperatively with dump valve 31, can together with recursive filter 4
To realize the quality control to cleaning etching solution well, it is ensured that under the premise of not influencing semiconductor silicon annular eclipse and carving cleaning quality,
Avoid because being replaced and cleaned liquid reduces cleaning efficiency, and provides the service efficiency of etch cleaning liquid.
Referring to figs. 2 and 3 etching uniformly being cleaned to semiconductor silicon ring in the utility model in order to realize, in rinse bath 1
Support driving mechanism 2 is additionally provided with, is installed for the ease of manufacture, support driving mechanism 2 is mainly by support shaft 20, drive in the present embodiment
Dynamic motor 21 and installing plate 22 are formed.
It is horizontal between two pieces of installing plates 22 being vertically arranged to be equipped with three support shafts 20, three support shafts 20 with reference to figure 3
It is arranged in parallel, and wherein at least has one to be in two other on horizontal plane of different height, is i.e. an at least support shaft
20 there are difference in height, such three to form the supporting structure of a triangle with the axis of other two support shafts 20；
Driving motor 21 is located at the side of rinse bath 1, its transmission shaft is connected with speed regulating axle 210, and passes through timing gear
Wheel shaft 210 is connected with a wherein support shaft 20, drives its rotation, in the present embodiment, in order to ensure the rotation of semiconductor silicon ring E
Stability, driving motor 21 is connected with close to a support shaft 20 of 1 bottom wall of rinse bath, because semiconductor silicon ring E is placed on three
When in root support shaft 20, the power born close to a support shaft 20 of rinse bath 1 bottom wall is maximum, then this root support shaft 20 with
The frictional force liquid that semiconductor silicon ring E is produced is maximum and most stable of, then the stability that semiconductor silicon ring E is servo-actuated is also better.
In order to ensure semiconductor silicon ring E will not glance off collision when rotating, also set along the length direction of support shaft 20
There is position limiting structure, ensure that support shaft 20 can only be circumferentially rotated with this, without axial displacement occurs, that improves device can
By property, with reference to figure 3, Fig. 5 and Fig. 6, the position limiting structure in the present embodiment is the annular groove 200 of 20 length direction of support shaft distribution, ring
Groove 200 is radially recessed inwardly to form deep gouge structure for sub- 20 surface of support shaft, and the annular groove 200 1 in each support shaft 20
One corresponds to, and such three support shafts 20 form the structure of triangle, and semiconductor silicon ring E is placed between three support shafts 20, and embedding
Enter in corresponding three annular grooves 200, so as to can not only realize the support to semiconductor silicon ring E, but also axial clamping limit can be realized to it
Position, it is ensured that stability when it is rotated.
Can be according to material and Cost Design difference position limiting structure in certain actual production process, for example can also directly exist
Support shaft 20 is spaced apart outwardly extending annular protrusion, and semiconductor silicon ring E is placed on two neighboring ring when so cleaning
Between shape protrusion.
Similarly, the embodiment of above-mentioned support driving 2 is also only a kind of preferable scheme, can basis when setting
Need, or even support shaft 20 is vertically arranged, then design is in step-like structure, and semiconductor silicon ring E is directly placed at correspondence
Same level-one step on, can equally drive semiconductor silicon ring E to stablize rotation, or only rely on a support shaft 20 and rinse bath
Other supporting structures of 1 inner wall together, can also realize above-mentioned function；
Even if in the present embodiment, the quantity of support shaft 20 can also set multiple support shafts 20 nor fixed, more
A support shaft 20 is arc-shaped distribution, i.e. line of the axis of support shaft 20 on vertical section is in arc-shaped, as semiconductor silicon ring E
Certainly motor 21 can be driven to drive several at the same time by transmission combination with each support shaft 20 while abutting after being put into
Support axis 20 rotates at the same time, so ensures the stability of semiconductor silicon ring E velocities of rotation.
In the present embodiment, in order to make device adapt to the semiconductor silicon ring E of different size model, two are corresponded on installing plate 22
The position for 20 end of support shaft that root is not connected with driving motor 21 is equipped with sliding slot 220, with reference to figure 3 and Fig. 5, sliding slot 220
For the strip through-hole being obliquely installed on installing plate 22, the both ends for not connecting the support shaft 20 of driving motor 21 extend through correspondence
Sliding slot 220, and be equipped with locking nut 201 in its end, tightened, 20 end of support shaft can consolidated by locking nut 201
The optional position being scheduled in sliding slot 220, changes the position of any one support shaft 20, you can changes three support shafts 20 and is formed
Triangular support structure size, meet more polytypic semiconductor silicon ring E support fixed demand.
With reference to figure 3 to Fig. 5, the both sides lower end of installing plate 22 has the protuberance 221 extended straight down, 1 bottom of rinse bath
The position of corresponding protuberance 221 is equipped with card slot 11 on the inside of wall, and after installing plate 22 is put into rinse bath 1, protuberance 221 is embedded just below
In card slot 11, then it will be close to a support shaft 20 of 1 bottom wall of rinse bath and be connected with driving motor 21, so that its relative position is consolidated
It is fixed, further improve the stability of device.
With reference to figure 1, to prevent in the case of not paying attention in the present embodiment, the cleaning etching solution in rinse bath 1 is excessive, and from
The spilling of the upper end open-mouth dispersiveness of rinse bath 1, impacts, rinse bath 1 is leaned on to workplace or to the parts of lower section
The position of nearly upper end is equipped with an overfolw hole 10, and overfolw hole 10 passes through overfolw hole 10 away from the side for being equipped with driving motor 21
It can further realize and control and guiding are realized to the liquid measure in rinse bath 1.
Referring to figs. 1 to Fig. 6, semiconductor silicon ring E is put into three support shafts 20, and ensure the lateral margin of semiconductor silicon ring E
It is embedded into one group of annular groove 200 of face, it is ensured that its stability, will not find that deflection moves, then start driving motor 21, band
A dynamic support shaft 20 close to 1 bottom wall of rinse bath rotates, then by the frictional force between semiconductor silicon ring E and support shaft 20,
Rotated together so as to drive semiconductor silicon ring E also to follow, so that semiconductor silicon ring E times the affected in etching solution is cleaned
It is consistent with position etc., its uniformity is kept, improves its yields.
Finally it should be noted that foregoing description is only the preferred embodiment of the utility model, the common skill of this area
Art personnel on the premise of without prejudice to the utility model aims and claim, can make under the enlightenment of the utility model
Expression, such conversion are each fallen within the scope of protection of the utility model as multiple types.
Claims (7)
- A kind of 1. semiconductor silicon ring circulation cleaning washing trough, it is characterised in that：Including rinse bath (1) and liquid reserve tank (3), the rinse bath (1) open topped, is equipped with recursive filter (4) and communicating valve (5), the communicating valve between rinse bath (1) and liquid reserve tank (3) (5) one end is connected with rinse bath (1), and the other end is connected with liquid reserve tank (3), and the liquid in the rinse bath (1) can pass through company Port valve (5) enters in liquid reserve tank (3)；The pump intake (41) of the recursive filter (4) is connected with liquid reserve tank (3), its port of export (40) is connected with rinse bath (1), Liquid reserve tank (3) interior liquid can be entered in rinse bath (1) by recursive filter (4).
- 2. semiconductor silicon ring circulation cleaning washing trough according to claim 1, it is characterised in that：The liquid reserve tank (3) is close to upper The position in portion is equipped with liquid injection port (30), and dump valve (31) is equipped with close to the position of lower part.
- 3. semiconductor silicon ring circulation cleaning washing trough according to claim 1 or 2, it is characterised in that：The rinse bath (1) by The position of its nearly side wall upper part is equipped with overfolw hole (10).
- 4. semiconductor silicon ring circulation cleaning washing trough according to claim 1, it is characterised in that：It is equipped with the rinse bath (1) For keeping semiconductor silicon ring rotating support driving mechanism (2) in rinse bath (1), the support driving in etching process Mechanism (2) includes at least three support shafts (20) being arranged in parallel, and drives what at least one of support shaft (20) rotated Drive motor (21), each support shaft (20) is triangular in shape in rinse bath (1) or arc-shaped distribution.
- 5. semiconductor silicon ring circulation cleaning washing trough according to claim 4, it is characterised in that：Along it on the support shaft (20) Annular groove (200) is distributed with length direction, and annular groove (200) face in each support shaft (20) is set.
- 6. semiconductor silicon ring circulation cleaning washing trough according to claim 4 or 5, it is characterised in that：The support driving mechanism (2) two installing plates (22) for being symmetrically disposed on support shaft (20) both ends are further included, the support shaft (20) is three, and level is set Put in rinse bath (1), the driving motor (21) is installed on the side of rinse bath (1), and three support shafts (20) are triangular in shape Distribution a, wherein support shaft (20) close to rinse bath (1) bottom is connected with driving motor (21).
- 7. semiconductor silicon ring circulation cleaning washing trough according to claim 6, it is characterised in that：The installing plate (22) corresponding two The position of support shaft (20) end that root is not connected with driving motor (21) is equipped with sliding slot (220), two support shafts (20) both ends extend through sliding slot (220), and can be slided along the sliding slot (220), and the support shaft (20) runs through sliding slot (220) End be equipped with locking nut (201).
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201720995162.2U CN207282462U (en) | 2017-08-09 | 2017-08-09 | Semiconductor silicon ring circulation cleaning washing trough |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201720995162.2U CN207282462U (en) | 2017-08-09 | 2017-08-09 | Semiconductor silicon ring circulation cleaning washing trough |
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| Publication Number | Publication Date |
|---|---|
| CN207282462U true CN207282462U (en) | 2018-04-27 |
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| Application Number | Title | Priority Date | Filing Date |
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| CN201720995162.2U Active CN207282462U (en) | 2017-08-09 | 2017-08-09 | Semiconductor silicon ring circulation cleaning washing trough |
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| CN (1) | CN207282462U (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN113073325A (en) * | 2021-03-24 | 2021-07-06 | 重庆臻宝实业有限公司 | Etching cleaning device |
-
2017
- 2017-08-09 CN CN201720995162.2U patent/CN207282462U/en active Active
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN113073325A (en) * | 2021-03-24 | 2021-07-06 | 重庆臻宝实业有限公司 | Etching cleaning device |
| CN113073325B (en) * | 2021-03-24 | 2023-03-14 | 重庆臻宝实业有限公司 | Etching cleaning device |
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