CN207216270U - 一种用于曝光机的新型光源 - Google Patents
一种用于曝光机的新型光源 Download PDFInfo
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Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN110204003A (zh) * | 2019-06-30 | 2019-09-06 | 鸿利智汇集团股份有限公司 | 一种直饮水紫外消毒控制系统及控制方法 |
CN114002900A (zh) * | 2021-12-24 | 2022-02-01 | 宁波舜宇车载光学技术有限公司 | 图像投射装置及制造图像投射装置的方法 |
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Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN110204003A (zh) * | 2019-06-30 | 2019-09-06 | 鸿利智汇集团股份有限公司 | 一种直饮水紫外消毒控制系统及控制方法 |
CN114002900A (zh) * | 2021-12-24 | 2022-02-01 | 宁波舜宇车载光学技术有限公司 | 图像投射装置及制造图像投射装置的方法 |
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TR01 | Transfer of patent right |
Effective date of registration: 20190904 Address after: Room A-430, 4th Floor, Block A, Phase II, Guangxi Huike Science and Technology Co., Ltd., 336 East Extension Line of Beihai Avenue, Beihai Industrial Park, Guangxi Zhuang Autonomous Region Patentee after: Beihai Hui Ke Photoelectric Technology Co., Ltd. Address before: 225000 Jinrong Science Park, Ji'an South Road, Hangjiang District, Yangzhou City, Jiangsu Province, 4-102 Patentee before: Yangzhou best technology Co., Ltd. |
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TR01 | Transfer of patent right | ||
TR01 | Transfer of patent right |
Effective date of registration: 20210420 Address after: Room 301, 3rd floor, building 16, Guangxi Huike Technology Co., Ltd., No. 336, East extension of Beihai Avenue, Beihai Industrial Park, 536000, Guangxi Zhuang Autonomous Region Patentee after: Beihai Huike Semiconductor Technology Co.,Ltd. Address before: Room A-430, 4th Floor, Block A, Phase II, Guangxi Huike Science and Technology Co., Ltd., 336 East Extension Line of Beihai Avenue, Beihai Industrial Park, Guangxi Zhuang Autonomous Region Patentee before: BEIHAI HKC PHOTOELECTRIC TECHNOLOGY Co.,Ltd. |
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