CN207133523U - Bore hole 3D gratings - Google Patents
Bore hole 3D gratings Download PDFInfo
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- CN207133523U CN207133523U CN201720856173.2U CN201720856173U CN207133523U CN 207133523 U CN207133523 U CN 207133523U CN 201720856173 U CN201720856173 U CN 201720856173U CN 207133523 U CN207133523 U CN 207133523U
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- reflection layer
- bore hole
- high reflection
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Abstract
The utility model provides a kind of bore hole 3D gratings, including basic unit, is provided with low reflection layer in the one side of basic unit, is provided with high reflection layer above low reflection layer, at least high reflection layer is optical grating construction.In another optional scheme, a kind of bore hole 3D gratings, high reflection layer is provided with the one side of basic unit, is provided with low reflection layer above high reflection layer, high reflection layer and low reflection layer are optical grating construction.The utility model can use more cheap common glass substrates, the light shield of common glass substrates and the light shield of general precision, the light shield fit problem of the figure without considering double exposure, and preparation section is reduced together.
Description
Technical field
Display device field is the utility model is related to, more particularly to a kind of bore hole 3D gratings.
Background technology
The A of Chinese patent literature CN 104166240 describe a kind of bore hole 3D display devices, wherein recording using light
The structure of grating (barrier type) bore hole 3D display devices.Bore hole 3D display devices mainly utilize binocular parallax
Principle make one produce 3D feel, i.e., by the way that the light path of incident light is adjusted, the left eye of people is received left eye
Image, the right eye of people can receive right-eye image, and left-eye images and right-eye image will not mutual crosstalks.
Existing bore hole 3D gratings baffle plate is to hide hood configuration, in preparation process, is made by several times using each function grating layer
Standby scheme, the aligning accuracy between each grating layer require high, it is very big to prepare difficulty.In order to improve aligning accuracy, it is necessary to
Using the glass substrate of low thermal expansion, the MASK of low thermal expansion（Light shield）Substrate, high-precision MASK, it is easy to prepare 3D gratings twice
Fit, production line between figure are precisely controlled to temperature, it is desirable to which the temperature change of glass substrate will be below 0.5 degree.
Such as the touch sensing described in the A of CN 104345935 and the contact panel comprising this touch sensing and its
In preparation method, the parallax grating layer that a kind of sputtering way is formed is described, utilizes sputter（Sputter）Or the mode institute of evaporation
The strip pattern of formation comes as parallax grating therein, but the concrete structure of the grating is not disclosed.
The content of the invention
Technical problem to be solved in the utility model is to provide a kind of bore hole 3D gratings, can reduce bore hole 3D grating systems
Technical difficulty during standby, the light shield of common glass substrates, common reticle substrate and general precision can be used.
In order to solve the above technical problems, technical scheme is used by the utility model：A kind of bore hole 3D gratings, including base
Layer, low reflection layer is provided with the one side of basic unit, is provided with high reflection layer above low reflection layer, at least high reflection layer is optical grating construction.
In preferable scheme, low reflection layer and high reflection layer are optical grating construction.
In another optional scheme, a kind of bore hole 3D gratings, high reflection layer, high reflection layer top are provided with the one side of basic unit
Provided with low reflection layer, high reflection layer and low reflection layer are optical grating construction.
In preferable scheme, described basic unit is glass substrate or transparent plastic substrate.
In preferable scheme, described low reflection layer is molybdenum oxide layer；Described high reflection layer is aluminium lamination or silver layer.
In preferable scheme, the grating device being made up of basic unit, low reflection layer and high reflection layer is located at backlight assembly and battle array
Between row glass assembly.
A kind of preparation method for preparing above-mentioned bore hole 3D gratings, comprises the following steps：
First, under vacuum conditions, in magnetron sputtering apparatus, using Mo targets as target, oxygen is passed through, in the one side of basic unit
Low reflection layer is prepared with reactive magnetron sputtering technique；
2nd, Al targets or Ag targets are replaced by as target, argon gas is passed through, on the surface of low reflection layer with reactive magnetron sputtering work
Skill prepares high reflection layer；
3rd, etched diffraction grating；
The preparation of bore hole 3D gratings is realized by above step.
In another optional scheme, a kind of preparation method for preparing above-mentioned bore hole 3D gratings, comprise the following steps：First,
In magnetron sputtering apparatus, using Al targets or Ag targets as target, be passed through argon gas, basic unit one side with reactive magnetron sputtering technique
Prepare high reflection layer；
2nd, Mo targets are replaced by as target, oxygen is passed through, is prepared on the surface of high reflection layer with reactive magnetron sputtering technique
Low reflection layer；
3rd, etched diffraction grating；
The preparation of bore hole 3D gratings is realized by above step.
In preferable scheme, the temperature conditionss of low reflection layer sputter are 100 ~ 150 DEG C；The temperature conditionss of high reflection layer sputter
For 70 ~ 100 DEG C.
In preferable scheme, described lithographic method is etched using gold-tinted, is comprised the following steps：
S1, upper photoresistance；
S2, exposed with light shield, illumination condition is parallel UV light；Light accumulated amount：50~150mj；
S3, development, detected after development；
S4, etched with etching liquid；
S5, demoulding；
Realize that grating etches by above step.
A kind of bore hole 3D gratings provided by the utility model, by using above-mentioned structure, it can once produce two kinds instead
The opposite film layer of attribute is penetrated, the wherein reflectivity of low reflection layer is less than less than 20%, and the reflectivity of high reflection layer is more than more than 70%,
Bore hole 3D gratings are once completed to prepare.The utility model can use more cheap common glass substrates, common glass substrates
Light shield and general precision light shield, the light shield fit problem of the figure without considering double exposure, and preparation section is reduced
Together, the preparation difficulty of bore hole 3D gratings is effectively reduced.
Brief description of the drawings
The utility model is described in further detail with reference to the accompanying drawings and examples：
Fig. 1 is the schematic diagram of bore hole 3D gratings in the utility model.
Fig. 2 is the schematic diagram of another bore hole 3D gratings in the utility model.
Fig. 3 is the partial enlarged drawing of bore hole 3D gratings in the utility model.
Fig. 4 is the partial enlarged drawing of the bore hole 3D gratings of another structure in the utility model.
Fig. 5 is process chart of the present utility model.
In figure：Grating device 1, basic unit 101, low reflection layer 102, high reflection layer 103, display device 2, backlight assembly 3, the
One polaroid 4, the second polaroid 5, array glass assembly 6, the first optical cement 7, the second polaroid 8, color film glass 9, cover plate 10,
Locating piece 11, the second optical cement 12.
Embodiment
Embodiment 1：
In Fig. 4, a kind of bore hole 3D gratings, including basic unit 101, low reflection layer 102 is provided with the one side of basic unit 101, it is low
The top of reflecting layer 102 is provided with high reflection layer 103, and at least high reflection layer 103 is optical grating construction.Grating described in the utility model
Structure refers to the lines being made up of high reflection layer 103 and low reflection layer 102, have identical line width and same line away from.
In preferable scheme, low reflection layer 102 and high reflection layer 103 are optical grating construction.The structure is the anti-rasterizer pasted
Part 1.High reflection layer 103 is close to backlight assembly.When in this example, using the etching liquid etched diffraction grating of such as embodiment 7, pass through control
Etching parameters, only high reflection layer 103 is set to be prepared to optical grating construction, and low reflection layer 102 keeps constant.It can be carried under the structure
High display quality.Etching parameters, which include adjustment, to be reduced the concentration proportioning of acid solution and shortens etch period.
Embodiment 2：
In another optional scheme such as Fig. 3, a kind of bore hole 3D gratings, high reflection layer 103 is provided with the one side of basic unit 101,
The top of high reflection layer 103 is provided with low reflection layer 102, and high reflection layer 103 and low reflection layer 102 are optical grating construction.The structure is just
The grating device 1 of patch.Basic unit 101 is close to backlight assembly.
Embodiment 3：
On the basis of embodiment 1,2, in preferable scheme, described basic unit 101 is glass substrate or transparent plastic base
Plate.
In preferable scheme, described low reflection layer 102 is molybdenum oxide layer, and molybdenum oxide layer includes molybdenum monoxide layer, dioxy
Change molybdenum layer, molybdenum trioxide layer etc.；Described high reflection layer 103 is aluminium lamination or silver layer.
In preferable scheme such as Fig. 2, the grating device 1 that is made up of basic unit 101, low reflection layer 102 and high reflection layer 103
Between backlight assembly 3 and array glass assembly 6.
Such as in Fig. 2, using the reflective grating device 1 of the utility model whole bore hole 3D display component structure according to
It is secondary to be：
Backlight assembly 3, it is the first polaroid 4 on backlight assembly 3, the first polaroid 4 is attached to the bottom of grating device 1,
It is grating device 1 on first polaroid 4, is the first optical cement 7 on grating device 1, is second inclined on the first optical cement 7
Mating plate 5, is array glass assembly 6 on the second polaroid 5, such as liquid crystal array glass assembly, is on array glass assembly 6
Color film glass 9, color film glass 9 are used to change the color of transmitted light, are the second polaroid 8 on color film glass 9, the second polarisation
It is the second optical cement 12 on piece 8, is cover plate 10 on the second optical cement 12, or cover plate and touch module.Ensure rasterizer
Part 1 aligns with array glass assembly 6, and error precision is less than 5 μm.To ensure to align, in grating device 1 and array glass assembly
6 are provided with the locating piece 11 for positioning close to the position at edge.
Embodiment 4：
As shown in Figure 5, one kind prepares the preparation method of the bore hole 3D gratings of above-described embodiment 1 ~ 3, comprises the following steps：
First, under vacuum conditions, in magnetron sputtering apparatus, using Mo targets as target, oxygen is passed through, air pressure is 1 ~ 10
MTorr, low reflection layer 102 is prepared with reactive magnetron sputtering technique in the one side of basic unit 101；Magnetron sputtering mode is direct current (DC)
Magnetron sputtering, current density：4 ~ 60mA/cm, power density：1 ~ 40W/cm, sedimentation rate 100nm/min ~ 1000nm/min.
2nd, Al targets or Ag targets are replaced by as target, is passed through argon gas, air pressure is 1 ~ 10 mTorr, in low reflection layer 102
Surface prepares high reflection layer 103 with reactive magnetron sputtering technique；Control parameter is identical with step 1；
3rd, etched diffraction grating；
The preparation of bore hole 3D gratings is realized by above step.
Embodiment 5：
In another optional scheme such as Fig. 5, one kind prepares the preparation method of the bore hole 3D gratings of above-described embodiment 1 ~ 3, bag
Include following steps：First, in magnetron sputtering apparatus, using Al targets or Ag targets as target, argon gas is passed through, air pressure is 1 ~ 10
MTorr, high reflection layer 103 is prepared with reactive magnetron sputtering technique in the one side of basic unit 101；
Magnetron sputtering mode is direct current (DC) magnetron sputtering, current density：4 ~ 60mA/cm, power density：1~40W/cm
, sedimentation rate 100nm/min ~ 1000nm/min.
2nd, Mo targets are replaced by as target, are passed through oxygen, air pressure is 1 ~ 10 mTorr, on the surface of high reflection layer 103
Low reflection layer 102 is prepared with reactive magnetron sputtering technique；Control parameter is identical with step 1；
3rd, etched diffraction grating；
The preparation of bore hole 3D gratings is realized by above step.
Embodiment 6：
On the basis of embodiment 4,5, in preferable scheme, the temperature conditionss of the sputter of low reflection layer 102 are 100 ~ 150
℃；The temperature conditionss of the sputter of high reflection layer 103 are 70 ~ 100 DEG C.
Embodiment 7：
On the basis of embodiment 4 ~ 6, in preferable scheme, described lithographic method is etched using gold-tinted, including following
Step：
S1, upper photoresistance；The positivity photoresist of the models such as photoresistance model RZJ-304, RD-PFS120；Photoresist thickness is 1
~2.5um；
S2, exposed with light shield, illumination condition is parallel UV light；Light accumulated amount：50~150mj；The line width of light shield is uniform
Property 1um, within MASK overall lengths differ 5um with design load；Monochromatic burner inspection is without striped.
S3, development, detected after development；Developer model：The solution of KOH molar concentration 0.5 ~ 1%, TMAH's is mole dense
The solution of degree 1.5% ~ 3%.
S4, etched with etching liquid；Phosphoric acid, nitric acid, the mixture of acetic acid and water；The configuration proportion of etching liquid：Phosphatase 11 00 ~
140L, 10 ~ 20L of nitric acid, 10 ~ 15L of acetic acid, 10 ~ 18L of pure water；According to different reflecting layer materials, matched somebody with somebody using corresponding solution
Than etching liquid temperature：30 ~ 50 degree；
S5, demoulding；Liquid parting uses butyl carbitol and dimethyl acetamide mixed solution, specifically matches according to photoresistance type
Number it is combined；Demoulding temperature is 30 ~ 45 degrees Celsius；
Realize that grating etches by above step.
The above embodiments are only optimal technical scheme of the present utility model, and are not construed as limit of the present utility model
System, the technical scheme that the scope of protection of the utility model should be recorded with claim, including the technical scheme that claim is recorded
The equivalents of middle technical characteristic are protection domain.Equivalent substitution i.e. within this range is improved, also in the utility model
Protection domain within.
Claims (9)
1. a kind of bore hole 3D gratings, including basic unit（101）, it is characterized in that：In basic unit（101）One side be provided with low reflection layer
（102）, low reflection layer（102）Top is provided with high reflection layer（103）, at least high reflection layer（103）For optical grating construction.
2. bore hole 3D gratings according to claim 1, it is characterized in that：Low reflection layer（102）And high reflection layer（103）For light
Grid structure.
3. the bore hole 3D gratings according to any one of claim 1 ~ 2, it is characterized in that：Described basic unit（101）For glass base
Plate or transparent plastic substrate.
4. the bore hole 3D gratings according to any one of claim 1 ~ 2, it is characterized in that：Described low reflection layer（102）For oxygen
Change molybdenum layer；Described high reflection layer（103）For aluminium lamination or silver layer.
5. the bore hole 3D gratings according to any one of claim 1 ~ 2, it is characterized in that：By basic unit（101）, low reflection layer
（102）And high reflection layer（103）The grating device of composition（1）Positioned at backlight assembly（3）With array glass assembly（6）Between.
6. a kind of bore hole 3D gratings, including basic unit（101）, it is characterized in that：In basic unit（101）One side be provided with high reflection layer
（103）, high reflection layer（103）Top is provided with low reflection layer（102）, high reflection layer（103）And low reflection layer（102）For grating knot
Structure.
7. bore hole 3D gratings according to claim 6, it is characterized in that：Described basic unit（101）For glass substrate or transparent
Plastic base.
8. bore hole 3D gratings according to claim 6, it is characterized in that：Described low reflection layer（102）For molybdenum oxide layer；Institute
The high reflection layer stated（103）For aluminium lamination or silver layer.
9. bore hole 3D gratings according to claim 6, it is characterized in that：By basic unit（101）, low reflection layer（102）It is anti-with height
Penetrate layer（103）The grating device of composition（1）Positioned at backlight assembly（3）With array glass assembly（6）Between.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201720856173.2U CN207133523U (en) | 2017-07-14 | 2017-07-14 | Bore hole 3D gratings |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201720856173.2U CN207133523U (en) | 2017-07-14 | 2017-07-14 | Bore hole 3D gratings |
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| Publication Number | Publication Date |
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| CN207133523U true CN207133523U (en) | 2018-03-23 |
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ID=61634266
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| CN201720856173.2U Active CN207133523U (en) | 2017-07-14 | 2017-07-14 | Bore hole 3D gratings |
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Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN107329278A (en) * | 2017-07-14 | 2017-11-07 | 宜昌南玻显示器件有限公司 | Bore hole 3D gratings and preparation method |
| CN112526794A (en) * | 2020-12-24 | 2021-03-19 | 合肥维信诺科技有限公司 | Mirror display device |
-
2017
- 2017-07-14 CN CN201720856173.2U patent/CN207133523U/en active Active
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN107329278A (en) * | 2017-07-14 | 2017-11-07 | 宜昌南玻显示器件有限公司 | Bore hole 3D gratings and preparation method |
| CN112526794A (en) * | 2020-12-24 | 2021-03-19 | 合肥维信诺科技有限公司 | Mirror display device |
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