CN105093618B - A kind of display base plate and preparation method thereof and display panel - Google Patents

A kind of display base plate and preparation method thereof and display panel Download PDF

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Publication number
CN105093618B
CN105093618B CN201510477669.4A CN201510477669A CN105093618B CN 105093618 B CN105093618 B CN 105093618B CN 201510477669 A CN201510477669 A CN 201510477669A CN 105093618 B CN105093618 B CN 105093618B
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China
Prior art keywords
film layer
submounts
neighboring area
distance measurement
black matrix
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CN201510477669.4A
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Chinese (zh)
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CN105093618A (en
Inventor
曹诚英
汪弋
周纪登
冯伟
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BOE Technology Group Co Ltd
Hefei Xinsheng Optoelectronics Technology Co Ltd
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BOE Technology Group Co Ltd
Hefei Xinsheng Optoelectronics Technology Co Ltd
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Priority to CN201510477669.4A priority Critical patent/CN105093618B/en
Publication of CN105093618A publication Critical patent/CN105093618A/en
Priority to US15/147,448 priority patent/US10394081B2/en
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    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1337—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/1303—Apparatus specially adapted to the manufacture of LCDs
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1339—Gaskets; Spacers; Sealing of cells
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/133302—Rigid substrates, e.g. inorganic substrates
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/133351—Manufacturing of individual cells out of a plurality of cells, e.g. by dicing
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/133354—Arrangements for aligning or assembling substrates
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/133357—Planarisation layers
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509—Filters, e.g. light shielding masks
    • G02F1/133512—Light shielding layers, e.g. black matrix
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509—Filters, e.g. light shielding masks
    • G02F1/133514—Colour filters
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1337—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers
    • G02F1/133776—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers having structures locally influencing the alignment, e.g. unevenness
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1339—Gaskets; Spacers; Sealing of cells
    • G02F1/13394—Gaskets; Spacers; Sealing of cells spacers regularly patterned on the cell subtrate, e.g. walls, pillars

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  • Physics & Mathematics (AREA)
  • Nonlinear Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Mathematical Physics (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Liquid Crystal (AREA)
  • Devices For Indicating Variable Information By Combining Individual Elements (AREA)

Abstract

The present invention provides a kind of display base plate and preparation method thereof and display panel.The display base plate includes multiple submounts, distance measurement zone is provided with the substrate of interval region between submounts, distance measurement zone is used to before each film layer in submounts is formed using exposure technology measure the spacing between mask plate and substrate, Supported film layer is set on the substrate of the neighboring area of distance measurement zone, neighboring area is located in interval region around distance measurement zone, and neighboring area and distance measurement zone are used to be blocked in each film layer that exposure is formed in submounts.The neighboring area and submounts region of the distance measurement zone of the display base plate will not form very big offset, so that the display base plate subsequently with other substrates to being not in obvious stress concentration during box, and then the display base plate can be avoided to moderate finite deformation occurs during box, thus avoid, to the thick appearance exception of box after box, making local yellowing phenomenon will not occur in display to the display panel after box.

Description

A kind of display base plate and preparation method thereof and display panel
Technical field
The present invention relates to display technology field, in particular it relates to a kind of display base plate and preparation method thereof and display panel.
Background technology
Compared with cathode-ray tube display (CRT), liquid crystal display (LCD) has lot of advantages, such as thinner thickness, work( Consumption is more low.Therefore, liquid crystal display all instead of CRT monitor in many fields.
Conventional tft liquid crystal panel (TFT-LCD) includes array base palte (Array), color membrane substrates (CF) and liquid Crystal layer, liquid crystal layer are filled between Array substrates and CF substrates.CF substrates film layer formation order be followed successively by black matrix (BM), Color film layer (B, G, R coloured silk film), flatness layer (OC) and spacer material (PS), the preparation technology of each film layer all include coating, exposure and Development.
Conventional exposure method is proximity printing, it is therefore desirable to tests the distance between mask plate and glass substrate.Such as Shown in Fig. 1, the system construction drawing of distance between mask plate and glass substrate, including semiconductor laser are determined for prior art 61st, polaroid 62, reflective mirror 63, mask plate 64, glass substrate 65 and linear transducer 66.Sent out by semiconductor laser 61 Bear laser and adjust light path through polarizer 62, then the light beam of outgoing is irradiated on reflective mirror 63, it is anti-by reflective mirror 63 The ranging window 641 of the light beam penetrated through mask plate 64 incides the upper surface A1 points of glass substrate 65, and linear transducer 66 connects Receive the light beam of the lower surface A points of 64 ranging window of mask plate 641 refraction and the light of glass substrate 65 upper surface A1 point reflections Intensity signal, then voltage signal is converted into by analog to digital conversion circuit, the intensity signal of A1 points and A points is showed.Pass through Treatment Analysis is carried out to the voltage signal that receives, compares the time difference for receiving two signals, so as to determine mask plate 64 with The distance between glass substrate 65, i.e. the distance between A1 points and A points.
In order to ensure the accuracy of the distance between mask plate 64 for measuring and glass substrate 65 data before exposure every time, survey Away from must not have other any film layers at window 641 in addition to black matrix, therefore the film layer coating post-exposure after black matrix Before be required for ranging window 641 and its peripheral region carrying out light barrier blocking, to prevent the exposure of the photoresist of subsequent film solid Change, ranging window 641 is sheltered from.In addition, in the peripheral region being blocked of ranging window 641 if there is film layer, Easily cause the border area being blocked between region and the region that is not blocked due to blocking in exposure and not exclusively expose, rear Chip pollution is produced in continuous developing process.Therefore, being corresponded on general color membrane substrates motherboard near ranging window 641 to be present A sheet of white space 7, as shown in Figure 2.
As shown in figure 3, due to the presence of white space 7 near ranging window 641 on color membrane substrates motherboard, make color membrane substrates Motherboard blank region 7 can form offset with other non-NULL white regions, and this is female in follow-up color membrane substrates motherboard and array base palte The vacuum of plate causes to deform box substrate, causes box thick to that can cause to produce Newton's ring to box substrate stress concentration during box It is abnormal, therefore occur picture display inequality during lighting, local jaundice occurs under same GTG.
The content of the invention
The present invention is for above-mentioned technical problem present in prior art, there is provided a kind of display base plate and preparation method thereof and Display panel.The neighboring area and submounts region of the distance measurement zone of the display base plate will not form very big offset, so as to Make the display base plate, to being not in obvious stress concentration during box, and then this can avoided aobvious subsequently with other substrates Show that substrate to moderate finite deformation occurs during box, is thus avoiding, to the thick appearance exception of box after box, making to exist to the display panel after box Local yellowing phenomenon will not occur during display.
The present invention provides a kind of display base plate, including multiple submounts, the substrate of the interval region between the submounts On be provided with distance measurement zone, the distance measurement zone is used to before each film layer in the submounts is formed using exposure technology measure to cover Spacing between template and the substrate, Supported film layer is set on the substrate of the neighboring area of the distance measurement zone, it is described Neighboring area is located in the interval region around the distance measurement zone, and the neighboring area and the distance measurement zone are used to expose It is blocked during each film layer that light is formed in the submounts.
Preferably, the thickness of the support film layer is identical with the gross thickness of all film layers in the submounts.
Preferably, the film layer in the submounts includes black matrix, color film layer, flatness layer and spacer material, the support membrane Layer includes extending to the black matrix of the neighboring area, the color film layer, described flat from the region where the submounts Smooth layer and the spacer material, and the figure of the figure film layer identical with the submounts of each film layer divides in the support film layer It is not identical.
Preferably, the support film layer is the photoresist layer of solidification.
Preferably, the support film layer is the sealant layer of solidification.
Preferably, the support film layer is arranged at the side of the close submounts of the neighboring area.
The present invention also provides a kind of display panel, including above-mentioned display base plate.
The present invention also provides a kind of preparation method of display base plate, including each film layer formed in submounts, the son Distance measurement zone is provided with the substrate of interval region between substrate, is additionally included in the substrate of the neighboring area of the distance measurement zone It is upper to form support film layer；The neighboring area is located in the interval region around the distance measurement zone, described in exposure formation The neighboring area and the distance measurement zone are blocked during each film layer in submounts.
Preferably, each film layer formed in submounts is included on the substrate of the corresponding submounts and formed Black matrix, color film layer, flatness layer and spacer material, the black matrix, the color film layer, the flatness layer and the spacer material also prolong Extend the neighboring area and form the support film layer, specifically include：
Step S1：Black matrix film layer is coated with the whole substrate of the display base plate；
Step S2：The black matrix film layer of the corresponding distance measurement zone and the neighboring area is blocked；
Step S3：The black matrix film layer do not blocked is exposed using the mask plate including black matrix figure；
Step S4：The shelter for blocking the neighboring area and the distance measurement zone is removed；
Step S5：The black matrix film layer in the neighboring area and the distance measurement zone is entered using laser printing apparatus Row exposure；
Step S6：The black matrix film layer through overexposure is developed, ultimately formed described in the submounts Black matrix and the black matrix of the neighboring area；Retain the black matrix film layer in the distance measurement zone；
According to the step identical with forming the black matrix son is formed on the substrate for forming the black matrix Substrate neutralizes the color film layer, the flatness layer and the spacer material in the neighboring area；And remove in the distance measurement zone The color film layer, the flatness layer and the spacer material.
Preferably, first, each film layer in the submounts is sequentially formed over the substrate using patterning processes, it is right Answer and do not form any film layer on the substrate of the neighboring area；Then, it is coated with the substrate for completing above-mentioned steps Photoresist film layer, the photoresist film layer is exposed and developed, retain the corresponding light in the neighboring area Photoresist, remove and correspond to positioned at the neighboring area with the photoresist in exterior domain.
Preferably, first, each film layer in the submounts is sequentially formed over the substrate using patterning processes, it is right Answer and do not form any film layer on the substrate of the neighboring area；It is then, corresponding to be coated with sealant in the neighboring area, And the sealant is solidified.
Beneficial effects of the present invention：Display base plate provided by the present invention, by setting branch in the neighboring area of distance measurement zone Film layer is supportted, the neighboring area and submounts region for making the distance measurement zone of the display base plate will not form very big offset, so as to Make the display base plate, to being not in obvious stress concentration during box, and then this can avoided aobvious subsequently with other substrates Show that substrate to moderate finite deformation occurs during box, is thus avoiding, to the thick appearance exception of box after box, making to exist to the display panel after box Local yellowing phenomenon will not occur during display.
Display panel provided by the present invention, by using above-mentioned display base plate, it is not in stress to make the display panel Concentrate, so that the display panel will not deform, and then it is existing to make the display panel that local jaundice will not occur in display As.
Brief description of the drawings
Fig. 1 is the system structure diagram for measuring distance between mask plate and glass substrate in the prior art；
Fig. 2 is the structure top view of color membrane substrates motherboard in the prior art；
Fig. 3 is structure sectional view of the color membrane substrates motherboard along AA ' cutting lines in Fig. 2；
Fig. 4 is the structure top view of display base plate in the embodiment of the present invention 1；
Fig. 5 is structure sectional view of the display base plate along AA ' cutting lines in Fig. 4；
Fig. 6 is the structure top view of display base plate in the embodiment of the present invention 2；
Fig. 7 is structure sectional view of the display base plate along AA ' cutting lines in Fig. 6；
Fig. 8 is the structure top view of display base plate in the embodiment of the present invention 3；
Fig. 9 is structure sectional view of the display base plate along AA ' cutting lines in Fig. 8；
Figure 10 is the structure top view of another display base plate in the embodiment of the present invention 3.
Description of reference numerals therein：
1. submounts；2. interval region；3. distance measurement zone；4. neighboring area；5. support film layer；51. black matrix；52. color film Layer；53. flatness layer；54. spacer material；61. semiconductor laser；62. polaroid；63. reflective mirror；64. mask plate；641. ranging Window；65. glass substrate；66. linear transducer；7. white space.
Embodiment
To make those skilled in the art more fully understand technical scheme, below in conjunction with the accompanying drawings and it is embodied Mode is described in further detail to a kind of display base plate provided by the present invention and preparation method thereof and display panel.
Embodiment 1：
The present embodiment provides a kind of display base plate, as shown in Figure 4 and shown in Fig. 5, including multiple submounts 1, submounts 1 it Between interval region 2 substrate on be provided with distance measurement zone 3, distance measurement zone 3 be used for formed using exposure technology it is each in submounts 1 The spacing between mask plate and substrate is measured before individual film layer, Supported film layer 5 is set on the substrate of the neighboring area 4 of distance measurement zone 3, Neighboring area 4 is located in interval region 2 around distance measurement zone 3, and neighboring area 4 and distance measurement zone 3 are used to form subbase in exposure It is blocked during each film layer in plate 1.
By setting support film layer 5 in the neighboring area 4 of distance measurement zone 3, make the neighboring area of the distance measurement zone 3 of the display base plate 4 and the region of submounts 1 will not form very big offset so that the display base plate when subsequently with other substrates to box not Obvious stress concentration occurs, and then the display base plate can be avoided thus to be avoided to moderate finite deformation occurs during box Thick to the box after box there is exception, makes local yellowing phenomenon will not occur in display to the display panel after box.
Wherein, support the thickness of film layer 5 identical with the gross thickness of all film layers in submounts 1.It is arranged such, display can be made The neighboring area 4 and the region of submounts 1 of the distance measurement zone 3 of substrate will not form offset, so that the display base plate is follow-up With other substrates to being not in stress concentration during box, and then the display base plate can be avoided to being deformed during box, thus Avoid, to the thick appearance exception of box after box, making local yellowing phenomenon will not occur in display to the display panel after box.
In the present embodiment, the film layer in submounts 1 includes black matrix, color film layer, flatness layer and spacer material, supports film layer 5 Black matrix 51, color film layer 52, flatness layer 53 and spacer material 54 including extending to neighboring area 4 from the region where submounts 1, And support the figure difference of the figure film layer identical with submounts 1 of each film layer in film layer 5 identical.Support in film layer 5 The figure of black matrix 51 is identical with the figure of black matrix in submounts 1, supports the figure and submounts of the color film layer 52 in film layer 5 1 prize film layer figure it is identical, flatness layer 53 and spacer material 54 are same.It is arranged such, support membrane in neighboring area 4 can be made Each film layer in layer 5 is once coated with and developed with each film layer in submounts 1 to be formed, so that the preparation of support film layer 5 Technique will not additionally increase coating and the developing process of display base plate.Meanwhile it is arranged such, moreover it is possible to make the thickness of support film layer 5 It is identical with the gross thickness of all film layers in submounts 1, so as to avoid the neighboring area 4 of the distance measurement zone 3 of display base plate and submounts 1 Region forms offset.
Display base plate in the present embodiment is color membrane substrates motherboard, the setting of distance measurement zone 3, can be made on color membrane substrates motherboard Position correspondence of each film layer when being formed is accurate, and ensures the accuracy that each film layer figure is formed.
In the present embodiment, support film layer 5 is arranged at the side of the close submounts 1 of neighboring area 4.It is arranged such, After the display base plate and other substrates are to box, because support film layer 5 is close to the edge of submounts 1, and the region of submounts 1 is Viewing area, so support film layer 5 can form good support to the fringe region of viewing area, so that the display surface formed to box The viewing area of plate will not be deformed due to stress concentration, and then be able to ensure that viewing area is not in that box is thick abnormal, be avoided Local yellowing phenomenon when being shown to display panel after box.
It should be noted that support film layer 5 can be covered with whole neighboring area 4, neighboring area 4 can also be only distributed in Regional area.As long as ensuring at least to set Supported film layer 5 close to the side of submounts 1 in neighboring area 4, can just change well Local yellowing phenomenon when being apt to or avoiding the display base plate with other substrates to being shown after box.
Said structure based on display base plate, the present embodiment also provide a kind of preparation method of the display base plate, including shape Into each film layer in submounts 1, distance measurement zone 3 is provided with the substrate of the interval region 2 between submounts 1, is additionally included in survey Support film layer 5 is formed on the substrate of neighboring area 4 away from area 3；Neighboring area 4 is located in interval region 2 around distance measurement zone 3, Neighboring area 4 and distance measurement zone 3 are blocked in each film layer that exposure is formed in submounts 1.
In the present embodiment, each film layer for being formed in submounts 1 be included on the substrate of corresponding submounts 1 successively formed it is black Matrix, color film layer, flatness layer and spacer material, black matrix 51, color film layer 52, flatness layer 53 and spacer material 54 also extend to peripheral region Domain 4 forms support film layer 5, specifically includes：
Step S1：Black matrix film layer is coated with the whole substrate of display base plate.
In the step, black matrix film layer covers the region beyond all forming regions of submounts 1 and submounts 1.
Step S2：The black matrix film layer of corresponding distance measurement zone 3 and neighboring area 4 is blocked.
It is arranged such, is to prevent the corresponding black matrix photoresist for being distributed in neighboring area 4 from solidifying after exposure, influence When subsequent film exposes, the accuracy of ranging between mask plate and distance measurement zone 3.
Step S3：The black matrix film layer do not blocked is exposed using the mask plate including black matrix figure.
After the step, the black matrix film layer of the corresponding forming region of submounts 1 and corresponding submounts 1, the and of distance measurement zone 3 Neighboring area 4 forms the figure of black matrix with the exposure of the black matrix film layer of exterior domain, and distance measurement zone 3 and neighboring area 4 is black Matrix film layer is not exposed.
Step S4：The shelter for blocking neighboring area 4 and distance measurement zone 3 is removed.
Step S5：In neighboring area 4 and distance measurement zone 3 black matrix film layer is exposed using laser printing apparatus.
Laser printing apparatus is by shining directly into black matrix film layer, making by the radium-shine light beam for forming black matrix figure Black matrix film layer chemically reacts, so as to expose the figure to form black matrix.By controlling effective displacement of radium-shine light beam, from And realize the exposure to black matrix film layer in whole neighboring area 4.After the step, the black matrix film layer in neighboring area 4 On form the figure of black matrix, the whole black matrix film layer in distance measurement zone 3 is all exposed.
Step S6：Black matrix film layer through overexposure is developed, ultimately forms the black matrix in submounts 1 and periphery The black matrix 51 in region 4；Retain the black matrix film layer in distance measurement zone 3.
In the step, because black matrix photoresist is negative photoresist, so the black matrix film layer part after exposed is retained Get off, unexposed black matrix film layer part is removed after development.Black matrix film layer in distance measurement zone 3 retains, due to black Matrix film layer can be reflected light, and subsequent film can be realized using the principle of reflection and range measurement principle of the prior art Layer prepare when mask plate and distance measurement zone 3 between distance measurement, so black matrix film layer needs to retain in distance measurement zone 3.
According to sequentially forming with forming the identical step of black matrix 51 on the substrate for forming black matrix 51 in submounts 1 and Color film layer 52, flatness layer 53 and spacer material 54 in neighboring area 4；And remove the color film layer 52 in distance measurement zone 3, the and of flatness layer 53 Spacer material 54.The system of the preparation process of color film layer 52, flatness layer 53 and spacer material 54 and above-mentioned black matrix 51 i.e. in neighboring area 4 Standby step is all identical respectively, it is unique unlike, using laser printing apparatus in neighboring area 4 and distance measurement zone 3 subsequent film When layer is exposed, follow-up each film layer (i.e. color film layer 52, flatness layer 53 and spacer material 54) in distance measurement zone 3 all must be through exposing It is removed after photodevelopment, in order to avoid follow-up each film layer blocks distance measurement zone 3 after respective prepare, makes the film layer subsequently prepared again The distance between mask plate and substrate (being black matrix film layer upper surface in distance measurement zone 3 in the present embodiment) can not be measured before exposure.
The preparation method of the display base plate, in the inner support film layer 5 of neighboring area 4 preparation of each film layer be coated with and aobvious in film layer In shadow technique, it can be completed with a developing process with the identical film layer in the corresponding region of submounts 1 by being once coated with, so as to The preparation of each film layer in the inner support film layer 5 of neighboring area 4 is set additionally not increase film layer coating and the developing process of display base plate, Prepare simple.
In the present embodiment, due to the black matrix of the corresponding region of submounts 1, color film layer, flatness layer and spacer material and peripheral region Black matrix 51, color film layer 52, flatness layer 53 and the spacer material 54 in domain 4 respectively to be formed by being once coated with, so through overexposure After development, the gross thickness of the support film layer 5 of neighboring area 4 is equal to the gross thickness of all film layers in submounts 1.
It is further to note that the display base plate in the present embodiment can also be array base palte motherboard.
Embodiment 2：
The present embodiment provides a kind of display base plate, and as different from Example 1, as shown in Figure 6 and Figure 7, support film layer 5 is The photoresist layer of solidification.
Correspondingly, the preparation method of display base plate is in the present embodiment：First, using patterning processes on substrate shape successively Into each film layer in submounts 1, any film layer is not formed on the substrate of corresponding neighboring area 4；Then, above-mentioned steps are completed Substrate on coating photoresist film layer, photoresist film layer is exposed and developed, retains the corresponding light in neighboring area 4 Photoresist, the corresponding neighboring area 4 that is located at is removed with the photoresist in exterior domain.Finally, the photoresist in neighboring area 4 is added Heat cure, general heating-up temperature are 100-200 DEG C.Wherein, the exposure to photoresist film layer can use traditional uv-exposure Technique is exposed by mask plate, and laser printing apparatus can also be used to carry out directly printing exposure.
It should be noted that the thickness of the photoresist film layer of coating is equal to the gross thickness of all film layers in submounts 1, pass through After exposed and developed, the gross thickness of the support film layer 5 of neighboring area 4 is equal to the gross thickness of all film layers in submounts 1.
Other structures of display base plate and preparation method thereof are in the same manner as in Example 1 in the present embodiment, and here is omitted.
Embodiment 3：
The present embodiment provides a kind of display base plate, unlike embodiment 1-2, as shown in Figure 8 and Figure 9, supports film layer 5 For the sealant layer of solidification.
Correspondingly, the preparation method of display base plate is in the present embodiment：First, using patterning processes on substrate shape successively Into each film layer in submounts 1, any film layer is not formed on the substrate of corresponding neighboring area 4；Then, it is corresponding in neighboring area Coating sealant in 4, and sealant is solidified.
Sealant in neighboring area 4 can (as shown in Figure 8) separated with the sealant in other regions on display base plate, Sealant in neighboring area 4 can also be continuous (as shown in Figure 10) with the sealant in other regions on display base plate, specifically exists Sealant is carried out being interrupted coating during coating or continuous coating can be achieved.
It should be noted that the display base plate of sealant is coated with other substrates to box, the thickness after sealant solidification Equal to the gross thickness of all film layers in submounts 1.
Other structures of display base plate and preparation method thereof are in the same manner as in Example 1 in the present embodiment, and here is omitted.
Embodiment 1-3 beneficial effect：Display base plate provided in embodiment 1-3, by the peripheral region of distance measurement zone Domain sets support film layer, the neighboring area of the distance measurement zone of the display base plate and submounts region is not formed very big break Difference so that the display base plate subsequently with other substrates to being not in obvious stress concentration during box, and then can The display base plate is avoided to moderate finite deformation occurs during box, thus to avoid, to the thick appearance exception of box after box, making to aobvious after box Show that in display local yellowing phenomenon will not occur for panel.
Embodiment 4：
The present embodiment provides a kind of display panel, including embodiment 1-3 the display base plate in any one.
By using display base plates of the embodiment 1-3 in any one, it is not in stress concentration to make the display panel, from And the display panel is not deformed, and then make the display panel that local yellowing phenomenon will not occur in display.
It is understood that the principle that embodiment of above is intended to be merely illustrative of the present and the exemplary implementation that uses Mode, but the invention is not limited in this.For those skilled in the art, the essence of the present invention is not being departed from In the case of refreshing and essence, various changes and modifications can be made therein, and these variations and modifications are also considered as protection scope of the present invention.

Claims (11)

1. a kind of display base plate, including multiple submounts, ranging is provided with the substrate of the interval region between the submounts Area, the distance measurement zone are used to measure mask plate and the lining before each film layer in the submounts is formed using exposure technology Spacing between bottom, it is characterised in that Supported film layer, the week are set on the substrate of the neighboring area of the distance measurement zone Border area domain is located in the interval region around the distance measurement zone, and the neighboring area and the distance measurement zone are used to expose It is blocked during each film layer formed in the submounts.
2. display base plate according to claim 1, it is characterised in that in the thickness and the submounts of the support film layer The gross thickness of all film layers is identical.
3. display base plate according to claim 2, it is characterised in that the film layer in the submounts includes black matrix, coloured silk Film layer, flatness layer and spacer material, the support film layer include extending to the neighboring area from the region where the submounts The black matrix, the color film layer, the flatness layer and the spacer material, wherein,
The figure of the black matrix in the support film layer is identical with the figure of the black matrix in the submounts；The support The figure of the color film layer in film layer is identical with the figure of the color film layer in the submounts；In the support film layer The figure of the flatness layer is identical with the figure of the flatness layer in the submounts；The dottle pin in the support film layer The figure of thing is identical with the figure of the spacer material in the submounts.
4. display base plate according to claim 2, it is characterised in that the support film layer is the photoresist layer of solidification.
5. display base plate according to claim 2, it is characterised in that the support film layer is the sealant layer of solidification.
6. according to the display base plate described in claim 1-5 any one, it is characterised in that the support film layer is arranged at The side of the close submounts of the neighboring area.
7. a kind of display panel, it is characterised in that including the display base plate described in claim 1-6 any one.
8. a kind of preparation method of display base plate, including each film layer formed in submounts, the interval between the submounts Distance measurement zone is provided with the substrate in region, it is characterised in that is also included on the substrate of the neighboring area of the distance measurement zone Form support film layer；The neighboring area is located in the interval region around the distance measurement zone, and the son is formed in exposure The neighboring area and the distance measurement zone are blocked during each film layer in substrate.
9. preparation method according to claim 8, it is characterised in that each film layer formed in submounts is included in Black matrix, color film layer, flatness layer and spacer material, the black matrix, the coloured silk are formed on the substrate of the corresponding submounts Film layer, the flatness layer and the spacer material also extend to the neighboring area and form the support film layer, specifically include：
Step S1：Black matrix film layer is coated with the whole substrate of the display base plate；
Step S2：The black matrix film layer of the corresponding distance measurement zone and the neighboring area is blocked；
Step S3：The black matrix film layer do not blocked is exposed using the mask plate including black matrix figure；
Step S4：The shelter for blocking the neighboring area and the distance measurement zone is removed；
Step S5：The black matrix film layer in the neighboring area and the distance measurement zone is exposed using laser printing apparatus Light；
Step S6：The black matrix film layer through overexposure is developed, ultimately forms the black square in the submounts Battle array and the black matrix of the neighboring area；Retain the black matrix film layer in the distance measurement zone；
According to the step identical with forming the black matrix submounts are formed on the substrate for forming the black matrix Neutralize the color film layer, the flatness layer and the spacer material in the neighboring area；And remove the institute in the distance measurement zone State color film layer, the flatness layer and the spacer material.
10. preparation method according to claim 8, it is characterised in that first, using patterning processes over the substrate according to The secondary each film layer formed in the submounts, correspond to and do not form any film layer on the substrate of the neighboring area；Then, The coating photoresist film layer on the substrate for completing above-mentioned steps, is exposed and develops to the photoresist film layer, retains The corresponding photoresist in the neighboring area, remove and correspond to positioned at the neighboring area with the light in exterior domain Photoresist.
11. preparation method according to claim 8, it is characterised in that first, using patterning processes over the substrate according to The secondary each film layer formed in the submounts, correspond to and do not form any film layer on the substrate of the neighboring area；Then, It is corresponding that sealant is coated with the neighboring area, and the sealant is solidified.
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