CN207008096U - Infrared polarizer with medium and wire grating structure - Google Patents
Infrared polarizer with medium and wire grating structure Download PDFInfo
- Publication number
- CN207008096U CN207008096U CN201720838809.0U CN201720838809U CN207008096U CN 207008096 U CN207008096 U CN 207008096U CN 201720838809 U CN201720838809 U CN 201720838809U CN 207008096 U CN207008096 U CN 207008096U
- Authority
- CN
- China
- Prior art keywords
- wire
- medium
- sub
- wavelength
- grid layer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
Landscapes
- Polarising Elements (AREA)
Abstract
This patent discloses a kind of infrared polarizer with medium and wire grating structure, the polarizer of this patent, it is made up of respectively transparent substrates, low-refraction sub-wavelength medium wire-grid layer and sub-wavelength metal wire-grid layer from bottom to up.Substrate is medium-wave infrared wave band transparent material, and refractive index is between 1.6 to 4.0, and low-refraction sub-wavelength medium wire-grid layer refractive index is between 1.3 2.4, and the wire grating cycle is identical with dielectric wire grid cycle, between 200 500nm.By inserting one layer of low-refraction sub-wavelength medium wire-grid layer with same dutycycle between substrate and sub-wavelength metal wiregrating, transmissivity and extinction ratio of the wire-grid polarizer in the TM polarised lights of medium-wave infrared wave band can be effectively improved.Sub-wavelength metal wire-grid polarizer have the characteristics that small volume, integrability, flexible design, to polarization sensitive, had great application prospect in integrated optics, micro-nano device etc..
Description
Technical field
This patent designs a kind of infrared polarizer, more particularly to a kind of infrared polarization with medium and wire grating structure
Device.
Background technology
Sub-wavelength metal wiregrating is due to the asymmetry of structure and the caused sensitiveness to polarised light, by substrate
The regulation and control of the parameters such as material, metal material, the packing material in wiregrating groove and dutycycle reach to sub-wavelength metal wiregrating
The purpose of optics regulation and control.Sub-wavelength metal wire-grid polarizer have small volume, integrability, flexible design, to polarization sensitive
The features such as, there is very big application potential in integrated optics, micro-nano device etc., passed in polarization imaging, Photoelectric Detection, optics
The fields such as sense, navigation have great application prospect.Therefore design and prepare wide spectrum, high TM ripples transmissivity and High Extinction Ratio
Wire-grid polarizer is always pursuing a goal for people.
2005, it was 200nm that Nano Opto companies of the U.S., which design and are prepared in the cycle of 1.52 μm of -1.57 mu m waveband,
Metallic wire grid polarizer, multi-layer anti-reflective film, TM are deposited respectively on the top of the bottom of wiregrating, middle part and wiregrating in the structure
Transmitance is up to 97%, and extinction ratio is more than 40dB, but the polarizer introduces multi-layer anti-reflective film, and with higher deep width
Than (about 7：1) difficulty of preparation, is added, is not easy to prepare on a large scale, sees J.J.Wang, W.Zhang, and Z.Deng, et
al.High-performance nano wiregrid polarizers.2005,Optics Letters.30(2):195-
196.2008, Dai Dun universities of the U.S. devised the SiO that between Si substrates and Al wiregratings plus one layer of 50nm is thick2Anti-reflecting layer
Wire-grid polarizer, its operation wavelength are 1.5-5 μm, and TM transmitances are up to 70%, and extinction ratio is more than 40dB.But do not explain herein
SiO2As the Physical Mechanism of anti-reflective film layer, Z.Wu, P.E.Powers, A.M.Sarangan et al.Optical are seen
characterization of wire grid micropolarizers designed for infrared imaging
polarimetry[J].2008,Optics Letters,33(15):1653-1655.University Of Suzhou is managed using rigorous coupled wave
By devising, a kind of having based on one-dimensional sub-wavelength metal wire grid construction polarizes and the polarization-type of colored filter function is colored
Optical filter, the structure is between low-refraction polymethyl methacrylate base bottom and metal Al gratings plus a floor height refractive index is situated between
Matter wire-grid layer, transmitance are more than 72.6%, and extinction ratio is more than 40dB, see leaf swallow, Zhou Yun, a permanent metal gratings type polarized color
Optical filter .2011, Acta Optica, 31 (4), 0405003,1-7.
Most of above result of study is all as anti-reflective film, using medium wiregrating conduct using uniform media coating
The research of anti-reflecting layer is less, and is mostly used in visible light wave range, this patent mainly by medium wire-grid layer basement with
Between wire grating, higher TM transmissivities and extinction ratio are obtained, to meet requirement of the infrared band to polarizer.
The content of the invention
The purpose of this patent is to provide a kind of infrared polarizer with medium and wire grating structure.
This patent carries medium and the structure of the infrared polarizer of wire grating structure is：From substrate 3 from bottom to top successively
It is low-refraction sub-wavelength medium wire-grid layer 2, sub-wavelength metal wire-grid layer 1；
For the refractive index of described low-refraction sub-wavelength medium wire-grid layer 2 between 1.3-2.4, thickness h 1 is 30-
200nm, the material of low-refraction sub-wavelength medium wire-grid layer 2 use MgF2、SiO2Or TiO2.Period p is 200-500nm, is accounted for
Sky is 0.4-0.6 than w/p.
The described cycle of sub-wavelength metal wire-grid layer 1 and dutycycle is identical with low-refraction sub-wavelength medium wire-grid layer 2, thick
It is 100-200nm to spend h2, and metal material selects Al, Cu, Ag or Au.
This patent advantage is：There is the low of same dutycycle by inserting one layer between substrate and sub-wavelength metal wiregrating
Refractive index sub-wavelength medium wire-grid layer, transmissivity of the wire-grid polarizer in the TM polarised lights of medium-wave infrared wave band can be effectively improved
And extinction ratio.Sub-wavelength metal wire-grid polarizer have the characteristics that small volume, integrability, flexible design, to polarization sensitive,
Had great application prospect in integrated optics, micro-nano device etc..
Brief description of the drawings
Fig. 1 is the infrared polarizer structural representation with medium and wire grating structure of this patent.1 is sub- ripple in figure
Long metal wire gate layer, 2 be low-refraction sub-wavelength medium wire-grid layer, and 3 be transparent substrates.
Fig. 2 be in this patent embodiment 1 TM, TE transmissivity of the infrared polarizer with medium and wire grating structure with
Lambda1-wavelength graph of a relation.
Fig. 3 is extinction ratio and the incidence of the infrared polarizer with medium and wire grating structure in this patent embodiment 1
Optical wavelength graph of a relation.
Fig. 4 be in this patent embodiment 2 TM, TE transmissivity of the infrared polarizer with medium and wire grating structure with
Lambda1-wavelength graph of a relation.
Fig. 5 is extinction ratio and the incidence of the infrared polarizer with medium and wire grating structure in this patent embodiment 2
Optical wavelength graph of a relation.
Fig. 6 be in this patent embodiment 3 TM, TE transmissivity of the infrared polarizer with medium and wire grating structure with
Lambda1-wavelength graph of a relation.
Fig. 7 is extinction ratio and the incidence of the infrared polarizer with medium and wire grating structure in this patent embodiment 3
Optical wavelength graph of a relation.
Embodiment
To the design of infrared polarizer structure and the analysis of optical property with medium and wire grating structure, using having
The method FDTD solutions softwares simulation of limit GPS local area differential is calculated to complete.As shown in figure 1, Fig. 1 carries medium for this patent
With the structural representation of the infrared polarizer of wire grating structure.From the metallic aluminium with high extinction coefficient as wiregrating
Metal material.It is low-refraction sub-wavelength medium wire-grid layer 2, sub-wavelength metal wire-grid layer 1 successively from bottom to top from substrate 3.Figure
The cycle phase of middle sub-wavelength metal wiregrating and low-refraction sub-wavelength medium wire-grid layer is same, is all p, and wiregrating width is w, dutycycle
F is defined as w/p, and the thickness of low-refraction sub-wavelength medium wire-grid layer 2 is h1, and the thickness of sub-wavelength metal wire-grid layer is h2.
Specific implementation of the patent mode is further described below in conjunction with the accompanying drawings.
Embodiment 1：
The structural representation of infrared polarizer with medium and wire grating structure shown in Figure 1, choice of the substrates
Sapphire (Al2O3), incident light is 3-5 μm, and vertical incidence.Low-refraction antireflection wire-grid layer 2 is MgF2, thickness h 1 is
100nm, the material of wire grating is Au, period p 400nm.Thickness h 2 is 150nm, dutycycle 0.5.
Under the structural condition, TM, TE transmissivity and lambda1-wavelength relation are as shown in Fig. 2 extinction ratio and incident light
Wavelength relationship is as shown in figure 3, at 4 μm, TM transmissivities 95%, extinction ratio 29dB.
Embodiment 2：
The structural representation of infrared polarizer with medium and wire grating structure shown in Figure 1, choice of the substrates
Si, incident light is 3-5 μm, and vertical incidence.Low-refraction antireflection wire-grid layer 2 is SiO2, thickness h 1 is 200nm, metal wire
The material of grid is Al, period p 500nm.Thickness h 2 is 100nm, dutycycle 0.6.
Under the structural condition, TM, TE transmissivity and lambda1-wavelength relation are as shown in figure 4, extinction ratio and incident light
Wavelength relationship is as shown in figure 5, at 4 μm, TM transmissivities 85%, extinction ratio 30dB.
Embodiment 3：
The structural representation of infrared polarizer with medium and wire grating structure shown in Figure 1, choice of the substrates
Ge, incident light is 3-5 μm, and vertical incidence.Low-refraction antireflection wire-grid layer 2 is TiO2, thickness h 1 is 30nm, wire grating
Material be Ag, period p 300nm.Thickness h 2 is 200nm, dutycycle 0.4.
Under the structural condition, TM, TE transmissivity and lambda1-wavelength relation are as shown in fig. 6, extinction ratio and incident light
Wavelength relationship is as shown in fig. 7, at 4 μm, TM transmissivities 68%, extinction ratio 29dB.
Above-described embodiment only illustrates the principle and effect of this patent, and unrestricted this patent, it is any without departing from this specially
Unsubstantiality in sharp spirit is replaced or the patent of modification is created and each fallen within the scope of this patent.
Claims (1)
1. a kind of infrared polarizer with medium and wire grating structure, sub- by sub-wavelength metal wire-grid layer (1), low-refraction
Wavelength medium wire-grid layer (2) and transparent substrates (3) are formed, it is characterised in that：
Described infrared polarizer structure is：It is low-refraction sub-wavelength medium wire-grid layer (2) successively upwards from substrate (3), sub-
Length metal wire-grid layer (1)；
For the refractive index of described low-refraction sub-wavelength medium wire-grid layer (2) between 1.3-2.4, thickness h 1 is 30-200nm,
The material of low-refraction sub-wavelength medium wire-grid layer (2) uses MgF2、SiO2Or TiO2, period p 200-500nm, dutycycle
W/p is 0.4-0.6；
Described sub-wavelength metal wire-grid layer (1) cycle and dutycycle is identical with low-refraction sub-wavelength medium wire-grid layer (2), thick
Degree h2 is 100-200nm, and metal material selects Al, Cu, Ag or Au.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201720838809.0U CN207008096U (en) | 2017-07-12 | 2017-07-12 | Infrared polarizer with medium and wire grating structure |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201720838809.0U CN207008096U (en) | 2017-07-12 | 2017-07-12 | Infrared polarizer with medium and wire grating structure |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN207008096U true CN207008096U (en) | 2018-02-13 |
Family
ID=61453955
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201720838809.0U Active CN207008096U (en) | 2017-07-12 | 2017-07-12 | Infrared polarizer with medium and wire grating structure |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN207008096U (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN107121720A (en) * | 2017-07-12 | 2017-09-01 | 中国科学院上海技术物理研究所 | A kind of infrared polarizer with medium and wire grating structure |
| CN110456440A (en) * | 2019-08-28 | 2019-11-15 | 山东劳动职业技术学院（山东劳动技师学院） | A kind of infrared polarizer of three layer line grid structure of metal-dielectric-metal |
-
2017
- 2017-07-12 CN CN201720838809.0U patent/CN207008096U/en active Active
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN107121720A (en) * | 2017-07-12 | 2017-09-01 | 中国科学院上海技术物理研究所 | A kind of infrared polarizer with medium and wire grating structure |
| CN110456440A (en) * | 2019-08-28 | 2019-11-15 | 山东劳动职业技术学院（山东劳动技师学院） | A kind of infrared polarizer of three layer line grid structure of metal-dielectric-metal |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| Wang et al. | A theoretical study of a plasmonic sensor comprising a gold nano-disk array on gold film with a SiO2 spacer | |
| Wang et al. | A novel plasmonic refractive index sensor based on gold/silicon complementary grating structure | |
| CN110133771B (en) | Method for realizing ultra-narrow band absorption and sensing by using structural symmetry defects | |
| Yu et al. | Spatial optical crosstalk in CMOS image sensors integrated with plasmonic color filters | |
| CN104880755B (en) | A kind of sub-wave length metal grating polarizer for being monolithically integrated in high index of refraction substrate | |
| Wang et al. | Subwavelength gold grating as polarizers integrated with InP-based InGaAs sensors | |
| CN207008096U (en) | Infrared polarizer with medium and wire grating structure | |
| Wen et al. | Multifunctional silicon optoelectronics integrated with plasmonic scattering color | |
| Lei et al. | High-performance tunable plasmonic absorber based on the metal-insulator-metal grating nanostructure | |
| CN107121720A (en) | A kind of infrared polarizer with medium and wire grating structure | |
| Liu et al. | Tunable multi-band terahertz absorber based on a one-dimensional heterostructure containing semiconductor | |
| Ng et al. | Miniaturization of a-Si guided mode resonance filter arrays for near-IR multi-spectral filtering | |
| CN112161954A (en) | Plasmon refractive index sensor based on out-of-plane lattice point resonance | |
| CN204679671U (en) | Be monolithically integrated in the sub-wave length metal grating polaroid of high index of refraction substrate | |
| CN110673249A (en) | Reflective filter | |
| Huang et al. | Ultrasensitive and tunable multi-narrowband metamaterial absorber | |
| Hu et al. | Study on the photoelectric conversion efficiency of solar cells with light trapping arrays | |
| US10283667B1 (en) | Surface plasma wave coupled detectors | |
| Park et al. | Tuning optical absorption in an ultrathin lossy film by use of a metallic metamaterial mirror | |
| Liao et al. | A wide-angle TE-polarization absorber based on a bilayer grating | |
| Guo et al. | Design of infrared polarizer based on sub-wavelength metal wire grid | |
| US10107940B2 (en) | Small-scale light absorbers with large absorption cross-sections | |
| Liu et al. | Design of an Au–Pt–Ti wire-grid polarizer based on midinfrared pixelated micropolarizer arrays | |
| Liu et al. | Common metal-dielectric-metal nanocavities for multispectral narrowband light absorption | |
| Cui et al. | Extraordinary optical transmission performances of nanosandwiched grating for wideband multi-function integration |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| GR01 | Patent grant | ||
| GR01 | Patent grant |