CN206858645U - A kind of optical thin film homogeneous film formation system - Google Patents
A kind of optical thin film homogeneous film formation system Download PDFInfo
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- CN206858645U CN206858645U CN201720651967.5U CN201720651967U CN206858645U CN 206858645 U CN206858645 U CN 206858645U CN 201720651967 U CN201720651967 U CN 201720651967U CN 206858645 U CN206858645 U CN 206858645U
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Abstract
The utility model discloses a kind of optical thin film homogeneous film formation system, including control unit, film thickness monitoring system, vacuum chamber, the film-coating workpiece frame being located in vacuum chamber, motor and coating materials evaporation source, also include the encoder that can monitor the real-time corner in initial corner and film forming procedure of the motor when film forming starts, coating materials evaporation source has coating materials liberation port, the Evaporation barrier part of coating materials evaporation source release coating materials can be blocked by being provided with vacuum chamber at coating materials liberation port, and Evaporation barrier part, encoder are connected with described control unit.The utility model can ensure when motor rotates to same position, can close Evaporation barrier part, stop evaporation.The mode of stopping of sentencing of this thickness has the advantage that, the each position of optical base-substrate or lens on work rest experienced complete motor swing circle, it is minimum by dynamic deviation to the thickness that every tunic is brought, narrow band pass filter, high-precision edge filter or film yields can be improved, improves the performance of optical coating system.
Description
Technical field
The utility model is used for optical film technology field, more particularly to a kind of optical thin film homogeneous film formation system.
Background technology
Application of the optical thin film in current information-intensive society is more and more extensive, and it is in image procossing, fiber optic communication, life section
, laser, biochemistry, military affairs are all widely used, and how precision system manufactures now for the optically thin membrane type of these specific functions
The problem that optical thin film equipment faces.
The principle of general filming equipment is that under vacuum conditions, motor driven film-coating workpiece frame at the uniform velocity turns in vacuum chamber
Dynamic, optical base-substrate or lens are placed on work rest.Evaporation source can be electron beam or resistance thermal evaporation, and effect is to make plating membrane material
Material vaporizes at high temperature, can control the line of heating power or electron beam, allow the film of vaporization to be applied with more uniform rate vacuum
It is applied on optical base-substrate or lens.Optical base-substrate or lens have different requirements for the uniformity of plated film, for example do conventional
Anti-reflection film, film thickness uniformity control can, film thickness uniformity of optical image security optical filter within 2% will control
Within 0.5%, in order to avoid image produces aberration, visual effect is influenceed.The optical filter used fiber optic communication, by film thickness not
The requirement of Wavelength distribution deviation caused by is that uniformity is less than 0.1%.
The reason for causing uneven film thickness even is a lot, and we also take a variety of methods and go to correct uneven film thickness,
And achieve good effect.But in conventional optical coating apparatus, as long as it, which monitors measurement parameter, reaches setup parameter
It is required that may turn off evaporation shield, caused by result be thick film on same circle optical base-substrate on work rest distribution be it is different,
When evaporation is originated and terminated, the location of caused difference is rotated by motor, causes these optical base-substrates or lens in thickness
Fluctuation is had on uniform distribution, uniformity is bad, and after repeatedly accumulation, error is increasing, final optical characteristics
Uniformity, which just becomes, to be broken, and reduces product yield, is made the optical parametric distortion of product, is not reached design requirement and cause to waste.
Utility model content
To solve the above problems, the utility model provides the film thickness distribution of optical base-substrate or eyeglass on a kind of guarantee work rest
The optical thin film homogeneous film formation system of uniformity.
Technical scheme is used by the utility model solves its technical problem:Including control unit, film thickness monitoring system,
Vacuum chamber, the film-coating workpiece frame being located in the vacuum chamber, motor and be located at described that the film-coating workpiece frame rotates can be driven
Coating materials evaporation source below film-coating workpiece frame, in addition to initial corner and film forming mistake of the motor when film forming starts can be monitored
The encoder of real-time corner in journey, coating materials evaporation source have coating materials liberation port, and being provided with vacuum chamber at coating materials liberation port can
The Evaporation barrier part of coating materials evaporation source release coating materials is blocked, Evaporation barrier part, encoder are connected with described control unit.
The improvement of technical solutions of the utility model is further used as, the Evaporation barrier part includes evaporation shield and can driven
The dynamic evaporation shield blocks the actuator at the top of the coating materials evaporation source, and the actuator is connected with described control unit.
The improvement of technical solutions of the utility model is further used as, the film thickness monitoring system includes being located at the plated film work
Part frame pivot or the optical monitoring piece of edge, the light source that incident light can be projected to the optical monitoring piece, can be by leading
Detector, amplifier, the number that light optical fiber receives the monochromator of optical monitoring piece reflected light and is sequentially connected with the monochromator
According to processor, the data processor is connected with described control unit.
The improvement of technical solutions of the utility model is further used as, film is provided between the film-coating workpiece frame and coating materials evaporation source
Thick modifying mask.
The improvement of technical solutions of the utility model is further used as, the film-coating workpiece frame is provided with some installation positions.
The beneficial effects of the utility model:Encoder is added to electric rotating machine in the utility model, when film forming starts, evaporation
Stop member is opened, the initial corner of encoders monitor motor now, and initial corner is fed back into control unit, film forming procedure
In, film thickness monitoring system monitors the thickness of the optical base-substrate or lens surface on film-coating workpiece frame in real time, and data feedback is given
Control unit, after thickness reaches requirement, the corner of encoders monitor now, and when this corner is equal to initial corner, pass through
Control unit control Evaporation barrier member blocks coating materials evaporation source release coating materials, so as to ensure to rotate to same position in motor
When, Evaporation barrier part can be just closed, stops evaporation.The mode of stopping of sentencing of this thickness has the advantage that, on work rest
Optical base-substrate or each position of lens experienced complete motor swing circle, the thickness brought to every tunic by dynamic deviation most
It is small, the film forming yields of narrow band pass filter, high-precision edge filter can be improved, improves the performance of optical coating system.
Brief description of the drawings
The utility model is described in further detail below in conjunction with the accompanying drawings:
Fig. 1 is the utility model first embodiment theory structure schematic diagram;
Fig. 2 is the utility model second embodiment theory structure schematic diagram.
Embodiment
Reference picture 1, Fig. 2, that show the concrete structure of the preferred embodiment of the utility model.It will be detailed below
The design feature of each element of the utility model, and during if being described to direction (upper and lower, left and right, before and after), it is with Fig. 1 institutes
The structure shown is that reference describes, but actual use direction of the present utility model is not limited thereto.
The utility model provides a kind of optical thin film homogeneous film formation system, including control unit 1 (computer system), film
Thick monitoring system, vacuum chamber 2, the film-coating workpiece frame 3 being located in the vacuum chamber 2, it can drive what the film-coating workpiece frame 3 rotated
Motor 4 and the coating materials evaporation source 5 for being located at the lower section of film-coating workpiece frame 3, the film-coating workpiece frame 3 are provided with some installation positions,
Optical film product being needed with manufacture as low-cost, high-volume as possible, having specific function.Also include that the motor can be monitored
The encoder 6 of real-time corner in the 4 initial corner and film forming procedure when film forming starts, encoder 6 are located at the motor 4
Top, coating materials evaporation source 5 have coating materials liberation port, and being provided with vacuum chamber 2 at coating materials liberation port can block coating materials evaporation source 5 to release
The Evaporation barrier part of coating materials is put, Evaporation barrier part, encoder 6 are connected with described control unit 1.The Evaporation barrier portion
Part includes evaporation shield 7 and the evaporation shield 7 can be driven to block the actuator 8 at the top of coating materials evaporation source 5, the drive
Moving part 8 is connected with described control unit 1, and control unit 1 controls evaporation shield 7 to be received at the top of coating materials evaporation source 5 by actuator 8
Put.
Wherein, the film thickness monitoring system includes being located at the pivot of film-coating workpiece frame 3 (referring to Fig. 1) or edge
The optical monitoring piece 9 of (referring to Fig. 2), the light source 10 of incident light can be projected to the optical monitoring piece 9, can be connect by light-conductive optic fibre
Detector 12, amplifier 13, the number received the monochromator 11 of the reflected light of optical monitoring piece 9 and be sequentially connected with the monochromator 11
According to processor 14, the data processor 14 is connected with described control unit 1.The light that light source 10 is sent is directly or indirectly through leading
Light optical fiber is projected on the optical monitoring piece 9 in vacuum chamber 2, and reflected light (or transmitted light) receives monochromator by light-conductive optic fibre
11, the light that monochromator 11 selects certain bandwidth therein is received by detector 12, after amplified and data processing, transfers to calculate
Machine system judges that when the optical signature detected is with designing consistent, computer sends instruction and stops plated film, so as to reach control
Purpose after film.
Thickness modifying mask 15 is provided between the film-coating workpiece frame 3 and coating materials evaporation source 5, because optical base-substrate or lens exist
Position on film-coating workpiece frame 3 is different, what the coating materials in vacuum coated was unevenly distributed, so we need a thickness to repair
Positive baffle plate 15, the scope of our needs will be adapted to after the film on work rest 3 as far as possible.
Encoder 6 is added to electric rotating machine 4 in the utility model, when film forming starts, Evaporation barrier part struts, encoder
6 monitoring motors 4 initial corners now, and initial corner is fed back into control unit 1, in film forming procedure, film thickness monitoring system
The thickness of optical base-substrate on monitoring film-coating workpiece frame 3 or lens surface in real time, and data feedback is worked as into film to control unit 1
When thickness reaches requirement, encoder 6 monitors the corner of now motor 4, and when this corner is equal to initial corner, passes through control unit
1 control Evaporation barrier member blocks coating materials evaporation source 5 discharges coating materials, so as to ensure when motor 4 rotates to same position, side
Evaporation barrier part can be closed, stops evaporation.The mode of stopping of sentencing of this thickness has the advantage that, on film-coating workpiece frame 3
Optical base-substrate or each position of lens experienced complete motor swing circle, the thickness brought to every tunic by dynamic deviation most
It is small, the thickness correlation between optical base-substrate and monitored optical monitoring piece on work rest is improved, arrowband filter can be improved
Mating plate, high-precision edge filter or film yields, improve the performance of optical coating system.
Certainly, the invention is not limited to above-mentioned embodiment, and those skilled in the art are without prejudice to originally
Equivalent variations or replacement can be also made on the premise of utility model spirit, these equivalent modifications or replacement are all contained in the application
In claim limited range.
Claims (5)
- A kind of 1. optical thin film homogeneous film formation system, it is characterised in that:Including control unit, film thickness monitoring system, vacuum chamber, set Film-coating workpiece frame in the vacuum chamber, motor and be located at the film-coating workpiece frame that the film-coating workpiece frame rotates can be driven The coating materials evaporation source of lower section, in addition to can monitor real-time in initial corner and film forming procedure of the motor when film forming starts The encoder of corner, coating materials evaporation source have coating materials liberation port, and being provided with vacuum chamber at coating materials liberation port can block coating materials to steam Rise and discharge the Evaporation barrier part of coating materials, Evaporation barrier part, encoder are connected with described control unit.
- 2. optical thin film homogeneous film formation system according to claim 1, it is characterised in that:The Evaporation barrier part includes Evaporation shield and the evaporation shield can be driven to block the actuator at the top of the coating materials evaporation source, the actuator with it is described Control unit connects.
- 3. optical thin film homogeneous film formation system according to claim 1, it is characterised in that:The film thickness monitoring system includes It is located at the optical monitoring piece of the film-coating workpiece frame pivot or edge, incident light can be projected to the optical monitoring piece Light source, the detection that can be received the monochromator of optical monitoring piece reflected light by light-conductive optic fibre and be sequentially connected with the monochromator Device, amplifier, data processor, the data processor are connected with described control unit.
- 4. optical thin film homogeneous film formation system according to claim 1, it is characterised in that:The film-coating workpiece frame and coating materials Thickness modifying mask is provided between evaporation source.
- 5. optical thin film homogeneous film formation system according to claim 1, it is characterised in that:The film-coating workpiece frame is provided with Some installation positions.
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CN201720651967.5U CN206858645U (en) | 2017-06-06 | 2017-06-06 | A kind of optical thin film homogeneous film formation system |
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CN201720651967.5U CN206858645U (en) | 2017-06-06 | 2017-06-06 | A kind of optical thin film homogeneous film formation system |
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Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN112501562A (en) * | 2020-11-30 | 2021-03-16 | 深圳恒泰克科技有限公司 | Multi-source electron beam evaporation coating device and film thickness uniformity correction method |
CN112680709A (en) * | 2020-12-15 | 2021-04-20 | 光芯薄膜(深圳)有限公司 | High-precision film thickness measuring system and method |
-
2017
- 2017-06-06 CN CN201720651967.5U patent/CN206858645U/en active Active
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN112501562A (en) * | 2020-11-30 | 2021-03-16 | 深圳恒泰克科技有限公司 | Multi-source electron beam evaporation coating device and film thickness uniformity correction method |
CN112680709A (en) * | 2020-12-15 | 2021-04-20 | 光芯薄膜(深圳)有限公司 | High-precision film thickness measuring system and method |
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GR01 | Patent grant | ||
GR01 | Patent grant | ||
TR01 | Transfer of patent right |
Effective date of registration: 20221011 Address after: Room 203, Second Floor, Yufang Science Park, Gaolong West Road, Gaopu Town, Dongguan City, Guangdong Province, 523000 Patentee after: Fan Xinyi Address before: No. 203, Floor 2, Yufang Science Park, Gaolong West Road, Gaopu Town, Dongguan City, Guangdong Province 523275 Patentee before: RUNOPTICS CO.,LTD. |
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TR01 | Transfer of patent right |