CN206794251U - Quartz wafer cleaning device - Google Patents
Quartz wafer cleaning device Download PDFInfo
- Publication number
- CN206794251U CN206794251U CN201720516910.4U CN201720516910U CN206794251U CN 206794251 U CN206794251 U CN 206794251U CN 201720516910 U CN201720516910 U CN 201720516910U CN 206794251 U CN206794251 U CN 206794251U
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- CN
- China
- Prior art keywords
- quartz wafer
- beaker
- polyfluortetraethylecleaning
- cleaning
- basket
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Abstract
The utility model provides a kind of quartz wafer cleaning device, including internal descaling bath pedestal, multiple beakers and the multiple polyfluortetraethylecleaning cleaning baskets for carrying cavity, multiple beaker fixing holes are provided with the top of the descaling bath pedestal, the descaling bath base cavity is internally provided with heating tube, electrical heating wire is provided with the heating tube, each beaker is detachably arranged in each beaker fixing hole, each polyfluortetraethylecleaning cleaning basket is detachably arranged in each beaker, and liquid drain hole is offered on each polyfluortetraethylecleaning cleaning basket.The device, which facilitates, to be taken out quartz wafer from pickle and hot water elution and ultrasonic wave cleaning is subsequently carried out to quartz wafer, and multiple PROCESS FOR TREATMENTs can be carried out to quartz wafer by realizing a device, reduce pollution of the quartz wafer process to quartz wafer of taking.And the device also has the advantages that simple in construction, convenient to use.
Description
Technical field
A kind of wafer cleaner is the utility model is related to, specifically, relate to a kind of quartz wafer cleaning device.
Background technology
Quartz wafer is element mostly important in electronic component, and quartz wafer is needed by multiple tracks in production procedure
Treatment process, and the chip produced has that a parameter index is extremely important in process, i.e. drive level dependency, specifically
Refer to resonator under different exciting powers, the different variable quantities that the frequency and resistance of quartz wafer are showed, and resonator produces
The main reason for raw drive level dependency, is caused by chip is contaminated, and existing quartz wafer decontamination method generally existing
Clean insufficient phenomenon.
In order to solve the problem present on, people are seeking a kind of preferable technical solution always.
The content of the invention
The purpose of this utility model is that in view of the shortcomings of the prior art, so as to provide, one kind is practical, simple to operate, goes
The good quartz wafer cleaning device of dirty effect.
To achieve these goals, technical scheme is used by the utility model：A kind of quartz wafer cleaning device, it
Including internal descaling bath pedestal, multiple beakers and the multiple polyfluortetraethylecleaning cleaning baskets for carrying cavity, the descaling bath pedestal top
Portion is provided with multiple beaker fixing holes, and the cavity inside of the descaling bath pedestal is provided with heating tube, set in the heating tube
There is electrical heating wire, each beaker is detachably arranged in each beaker fixing hole, and each polyfluortetraethylecleaning cleaning basket can
Dismounting is arranged in each beaker, and liquid drain hole is offered on each polyfluortetraethylecleaning cleaning basket.
Based on above-mentioned, the height of the polyfluortetraethylecleaning cleaning basket is less than the height of the beaker.
Based on above-mentioned, end cover is additionally provided with the top of each beaker.
Based on above-mentioned, the polyfluortetraethylecleaning cleaning basket includes cylindrical shape cleaning basket matrix and to be arranged on the cylindrical shape clear
The cleaning basket frame bottom of basket matrix one end is washed, is offered respectively on the cylindrical shape cleaning basket matrix and the cleaning basket frame bottom described
Liquid drain hole.
Based on above-mentioned, the internal diameter of the polyfluortetraethylecleaning cleaning basket is less than the internal diameter of the beaker.
The utility model has substantive distinguishing features and progress compared with the prior art, specifically, the utility model pass through by
Treat that the quartz wafer of pickling is placed in the polyfluortetraethylecleaning cleaning basket with liquid drain hole to be cleaned, facilitate from pickle
Take out quartz wafer and hot water elution and ultrasonic wave cleaning are subsequently carried out to quartz wafer, realizing a device can be to quartz-crystal
Piece carries out multiple PROCESS FOR TREATMENTs, reduces pollution of the quartz wafer process to quartz wafer of taking.And the device also has structure
Simply, the advantages that convenient to use.
Brief description of the drawings
Fig. 1 is that quartz wafer cleaning device provided by the utility model is in polyfluortetraethylecleaning cleaning basket and is not put into burning completely
Confined state structural representation inside cup.
Fig. 2 is the structural representation of the descaling bath pedestal of quartz wafer cleaning device provided by the utility model.
Fig. 3 is the structural representation of polyfluortetraethylecleaning cleaning basket in quartz wafer cleaning device provided by the utility model.
Fig. 4 is the beaker structural representation in quartz wafer cleaning device provided by the utility model.
In figure：1st, descaling bath pedestal；12nd, beaker fixing hole；2nd, beaker；21st, beaker closure；3rd, polytetrafluoroethylene (PTFE) is clear
Wash basket；31st, liquid drain hole；32nd, basket matrix is cleaned；33rd, basket frame bottom is cleaned.
Embodiment
Below by embodiment, the technical solution of the utility model is described in further detail.
Embodiment 1
As depicted in figs. 1 and 2, the present embodiment provides a kind of quartz wafer cleaning device, and it includes inside and carries cavity
1,15 beaker 2 of cuboid descaling bath pedestal and 15 polyfluortetraethylecleaning cleaning baskets 3.The top of descaling bath pedestal 1 is set
15 beaker fixing holes 12 are put, the die cavity of the descaling bath pedestal 1 is internally provided with heating tube, is provided with the heating tube
Electrical heating wire, each beaker 2 are detachably arranged in the beaker fixing hole 12, and each polyfluortetraethylecleaning cleaning basket 3 can
Dismounting is arranged in the beaker 2, and liquid drain hole 31 is offered on the polyfluortetraethylecleaning cleaning basket 3.
Specifically, as shown in figure 3, the polyfluortetraethylecleaning cleaning basket 3 includes cylindrical shape cleaning basket matrix 32 and is arranged on
The cleaning basket frame bottom 33 of described one end of cylindrical shape cleaning basket matrix 32, the cylindrical shape cleaning basket matrix 32 and the cleaning basket frame
The liquid drain hole 31 is offered on bottom 33 respectively.In order to which the polyfluortetraethylecleaning cleaning basket 3 is completely disposed at into the beaker 2
In, the height of the polyfluortetraethylecleaning cleaning basket 3 is less than the height of the beaker 2, the internal diameter of the polyfluortetraethylecleaning cleaning basket 3
Less than the internal diameter of the beaker 2.As shown in figure 4, in order to carry out sealing pickling to chip, the top of beaker 2 is additionally provided with
End cover 21.
Specifically, when being cleaned using the device to quartz wafer, concrete operation step is：
Each beaker 2 is placed in beaker fixing hole 12 first, and adds into each beaker 2 pickle and with the burning
Sealing cap for cup 21 is sealed；Water is added into the cuboid descaling bath pedestal 1 with cavity and connects the heating tube
Pickle is heated by water；Then quartz wafer to be cleaned is put into each polyfluortetraethylecleaning cleaning basket 3 simultaneously
It is put into acid solution and soaks together with the polyfluortetraethylecleaning cleaning basket 3, after pickling immersion certain time, it is clear takes out the polytetrafluoroethylene (PTFE)
Wash basket 3 and drench and do remaining pickle；
Finally the polyfluortetraethylecleaning cleaning basket 3 and quartz wafer are put into hot water rinse together, flowing water cleans 2 minutes extremely
3 minutes, so as to obtain the quartz wafer after pickling.
Finally it should be noted that:Above example is only illustrating the technical solution of the utility model rather than it is limited
System；Although the utility model is described in detail with reference to preferred embodiment, those of ordinary skill in the art should
Understand：Specific embodiment of the present utility model can still be modified or some technical characteristics are equally replaced
Change；Without departing from the spirit of technical solutions of the utility model, it all should cover in the claimed technical scheme of the utility model
Among scope.
Claims (5)
- A kind of 1. quartz wafer cleaning device, it is characterised in that：It includes internal descaling bath pedestal, the multiple beakers for carrying cavity With multiple polyfluortetraethylecleaning cleaning baskets, the descaling bath pedestal top is provided with multiple beaker fixing holes, the descaling bath pedestal Cavity inside be provided with heating tube, electrical heating wire is provided with the heating tube, each beaker is detachably arranged at each institute State in beaker fixing hole, each polyfluortetraethylecleaning cleaning basket is detachably arranged in each beaker, each polytetrafluoroethyl-ne Liquid drain hole is offered on alkene cleaning basket.
- 2. quartz wafer cleaning device according to claim 1, it is characterised in that：The height of the polyfluortetraethylecleaning cleaning basket Height of the degree less than the beaker.
- 3. quartz wafer cleaning device according to claim 2, it is characterised in that：It is additionally provided with the top of each beaker close End-blocking lid.
- 4. quartz wafer cleaning device according to claim 3, it is characterised in that：The polyfluortetraethylecleaning cleaning basket includes Cylindrical shape cleans basket matrix and is arranged on the cleaning basket frame bottom of described cylindrical shape cleaning basket matrix one end, and the cylindrical shape cleans basket The liquid drain hole is offered respectively on matrix and the cleaning basket frame bottom.
- 5. quartz wafer cleaning device according to claim 4, it is characterised in that：The polyfluortetraethylecleaning cleaning basket it is interior Footpath is less than the internal diameter of the beaker.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201720516910.4U CN206794251U (en) | 2017-05-11 | 2017-05-11 | Quartz wafer cleaning device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201720516910.4U CN206794251U (en) | 2017-05-11 | 2017-05-11 | Quartz wafer cleaning device |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN206794251U true CN206794251U (en) | 2017-12-26 |
Family
ID=60740314
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201720516910.4U Active CN206794251U (en) | 2017-05-11 | 2017-05-11 | Quartz wafer cleaning device |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN206794251U (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN113376961A (en) * | 2021-06-09 | 2021-09-10 | 浙江一晶科技股份有限公司 | Method for processing quartz tuning fork |
-
2017
- 2017-05-11 CN CN201720516910.4U patent/CN206794251U/en active Active
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN113376961A (en) * | 2021-06-09 | 2021-09-10 | 浙江一晶科技股份有限公司 | Method for processing quartz tuning fork |
| CN113376961B (en) * | 2021-06-09 | 2024-06-07 | 浙江一晶科技股份有限公司 | Quartz tuning fork processing method |
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| GR01 | Patent grant |