CN206741085U - Laser energy attenuating device for dual wavelength - Google Patents
Laser energy attenuating device for dual wavelength Download PDFInfo
- Publication number
- CN206741085U CN206741085U CN201720335541.9U CN201720335541U CN206741085U CN 206741085 U CN206741085 U CN 206741085U CN 201720335541 U CN201720335541 U CN 201720335541U CN 206741085 U CN206741085 U CN 206741085U
- Authority
- CN
- China
- Prior art keywords
- laser
- attenuator
- laser energy
- wavelength
- attenuating device
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Landscapes
- Lasers (AREA)
Abstract
The utility model provides one kind and is used for dual-wavelength laser energy attenuation device, solves the technical problem different to the decay of different wave length laser energy of same attenuator in multiwavelength laser damage measure.The utility model combines to form attenuating device in attenuating device using a set of or Duo Tao convergent mode of motions executing agency, can choose the multiple attenuators of installation on each disk of decaying, each attenuator deposits the optical thin film for correcting different wave length transmissivity.Inputted using the laser beam of two wavelength of 532nm and 1064nm, energy attenuation is carried out by the dual-wavelength laser energy attenuation device of the present utility model that is used for, the attenuation rate of strict conformance can be obtained without changing attenuator and attenuator combination.The utility model apparatus structure is simple, uses a set of function that two sets of attenuators are realized for dual-wavelength laser energy attenuation device；Attenuation accuracy is high, can improve laser damage threshold measuring accuracy；Suitable for continuous laser and pulse laser, have wide application prospects in the industrial production.
Description
Technical field
The utility model belongs to optical technical field, relates generally to laser energy decay, is specifically that one kind is used for dual wavelength
Laser energy attenuating device.Suitable for the various occasions of laser energy decay.
Technical background
In high energy laser system, there is various optical elements and thin-film device.However, due to laser power
Height, act directly on optical element and irremediable damage often is produced to device.Such as tested in laser damage threshold and be
, it is necessary to which the laser energy for obtaining different energy levels acts on material surface in system, so as to complete specific systemic-function.Therefore, exist
Need to decay to laser energy in mechanism.Preferably decay should only change the amplitude of incident beam, without influenceing it
Geometry (beamwidth, angle of divergence etc.), position phase, polarization state, spatial distribution and time response, and should have that dynamic range is wide, light
Compose the features such as region is wide and repdocutbility is good.In addition, its optically and mechanically structure is more simple better.
Current attenuator species both domestic and external is various, according to attenuator producing principle, there is following several frequently seen method：Machine
Tool formula dims late method, photoelectric technology light modulation method, absorption of crystal method, polarization fading method and absorption attenuator method.
Mechanical regulation diaphragm method：This method is exactly by iris diaphgram mode, realizes the space attenuation to light beam, this side
The characteristics of method is that small volume, speed very fast, small power consumption, technology are relatively ripe, but shortcoming is that dynamic regulation scope is small, line
Property degree is bad, is not easy to realize cascade operation.
Photoelectric technology dims method：Photoelectricity light modulation includes Faraday, electro-optic crystal light modulation and liquid crystal light modulation, these three sides
Common feature is possessed by method：Dynamic range is smaller, it is necessary to which cascade operation, dims non-linear serious, it is necessary to which closed loop compensation, is somebody's turn to do
Mode is not suitable for a wide range of, high accuracy light modulation.
Absorption of crystal method feature：Light intensity regulating scope is wide, the rule because the thickness exponentially of optical power attenuation and material successively decreases
Rule, so by the coefficient and material thickness of reasonable selection different materials, the light intensity regulating of wide scope can be achieved, and not too much
The volume and weight of increase system；It can be achieved to continuously adjust without cascade.By the continuous motion of accurate control axial direction, light can be achieved
Strong continuously adjusts (monotone decreasing is incremented by), occurs without mutation；Tuning linearity is good.Shortcoming is the side of degree of regulation one of light intensity
Face depends on the uniformity of material, on the other hand the control accuracy depending on leading screw, and condition of realizing requires higher.
Absorption attenuator method：A wide range of, continuous light tuning can be achieved in absorption decay, by controlling the anglec of rotation to realize
The consecutive variations of luminous energy.
Above-mentioned several damped methods, it is to be directed to the decay under the conditions of Single wavelength.
Although also there is researcher to propose that the decay under the conditions of multi-wavelength can be carried out at present, its major way is for difference
Wavelength, convert different attenuator combinations.Most importantly, due to having changed attenuator (or changing attenuator combination),
Substantially for different wave length, what light beam passed through is not same optical system, therefore this method has larger aberration, and
And the decay laser of multiple wavelength can not be exported simultaneously.Therefore, essence is also and unresolved dual wavelength attenuation problem.
The content of the invention
For overcome the deficiencies in the prior art, the utility model provides one kind double wave elongate member in same test system
The lower dual-wavelength laser energy attenuation device for obtaining identical attenuation rate.
The utility model is a kind of laser energy attenuating device for dual wavelength, and laser energy attenuating device includes bottom
Seat and the damping mechanism being installed on base, damping mechanism are rotated by motor driven decay disc system, and attenuator is circumferentially uniform
It is installed on decay disk, incident light is laser, and emergent light is the laser output after decay, it is characterised in that：The attenuator is
Surface deposition has the attenuator for correcting different wave length transmittance optical film；Decay in the laser energy for dual wavelength and fill
The input put, provided with two lasers, the optical maser wavelength of first laser device is 532nm, and second laser optical maser wavelength is
1064nm, when above-mentioned dual-wavelength laser is by the same laser energy attenuating device for dual wavelength, in test process
Attenuator combination need not be changed, that is, obtain the laser output of identical attenuation rate.
The utility model is realized during damage measure to 532nm laser attenuation rate identical with 1064nm laser
Decay.
Compared with prior art, the utility model has the characteristics that：
1. realize the decay of the identical attenuation rate of dual-wavelength laser：The utility model declines in the laser energy for dual wavelength
Subtract and the attenuator that deposited film is employed in device, such as：Using deposited MgF2The attenuator of film, it can not convert
In the case of attenuator, the technique effect that there is identical attenuation rate for different wave length is realized.
2. the laser energy attenuating device structure that the utility model is used for dual wavelength is simple, realized using a set of attenuator
The function of two sets of attenuators.
3. attenuation accuracy is high, attenuation rate control errors can improve laser damage threshold measuring accuracy in 0.1%.
4. the utility model is applied to continuous laser and pulse laser, before being widely used in actual industrial production
Scape.
Brief description of the drawings
Fig. 1 is the laser energy attenuating device structure shaft side figure of the present utility model for dual wavelength；
Fig. 2 is the laser energy attenuating device structure left view of the present utility model for dual wavelength；
Fig. 3 is that the utility model realizes damage measure FB(flow block)；
Fig. 4 is the Optical transmission spectrum figure of non-plated film decay sheet matrix；
Fig. 5 is that deposition has MgF in the utility model2The Optical transmission spectrum figure of different wave length after the attenuator of plated film.
Embodiment
In damage from laser technical field of measurement and test, used laser energy attenuator generally requires specific attenuator.Pin
The particular decay device to match with laser wavelength need to be configured to the laser of a certain specific wavelength, in other words a wavelength laser
Device need to configure matching particular decay device, and purposes is restricted.Laser attenuator assembly is precision optical instrument, not only cost
Height, necessary installing space is also required to during use.
Embodiment 1
For this present situation, the utility model expands innovation and exploitation, proposes that a kind of laser energy for dual wavelength declines
Subtract device, referring to Fig. 1, include base 9 and the convergent mode of motion executing agency being installed on base 9, driven and decayed by motor 1
Disk 4 is rotated, and attenuator is circumferentially uniformly installed on decay disk 4, and the attenuator in the utility model has for repairing for surface deposition
The attenuator 7 of positive different wave length transmittance optical film, is monolithically fabricated the laser energy of the present utility model for dual wavelength and declines
Subtract device.In use, incident light is laser, emergent light is the laser output after decay.Again referring to Fig. 2, the utility model with
In the input of the laser energy attenuating device of dual wavelength, provided with two lasers, the optical maser wavelength of first laser device is
532nm, second laser optical maser wavelength are 1064nm, when above-mentioned dual-wavelength laser passes through the same laser energy for dual wavelength
When measuring attenuating device, attenuator combination need not be changed in test process, that is, obtain the laser output of identical attenuation rate.This practicality
The output laser of the new laser energy attenuating device for dual wavelength has identical attenuation rate.
Referring to Fig. 1, whole device includes：Decay disk 4, surface deposition have thin for correcting different wave length transmittance optical
The attenuator 7 of film, stepper motor 1, timing belt, big synchronous pulley, small synchronous pulley, jackscrew 2, magnetic pole 3, tensioning wheel 6, Hall pass
Sensor 8, base 9, decay disk bearing 10.
Several surfaces deposition has for correcting the circumferentially uniformly installation of the attenuator 7 of different wave length transmittance optical film
On decay disk 4, need that 2~10 surfaces can be installed on decay disk and deposited to have for correcting different wave length transmission according to test
The attenuator 7 of rate optical thin film, had using 5 surfaces depositions for correcting declining for different wave length transmittance optical film in this example
Subtract piece 7, the interval of each attenuator installation position is drilled with three apertures, five groups of apertures is drilled with altogether, for installing magnetic pole 3.Decay
Disk 4, small synchronous pulley, big synchronous pulley are pressed on the slack list of timing belt by synchronous band connection, tensioning wheel 6, are adjusted by jackscrew 2
Whole tensioning wheel position, the tensioning degree for adjusting timing belt form a set of convergent mode of motion executing agency, convergent mode of motion executing agency peace
Loaded on decay disk bearing 10, decay disk bearing 10 is fixed on base 9, and decay disk bearing is also drilled with three apertures, respectively with
A certain group of three aperture position of five groups of apertures of decay disk 4 is corresponding.
In this example, the magnetic pole on decay disk bearing 10 with being installed on decay disk is arranged on using a Hall sensor 8
Correspondence position, for the positioning of attenuator, stepper motor 1 is fixed on decay disk bearing 10, and stepper motor output shaft 5 is by small
Synchronous pulley exports.
In the input of the laser energy attenuating device for dual wavelength, provided with two lasers, first laser device swashs
The a length of 532nm of light wave, second laser optical maser wavelength are 1064nm, when above-mentioned dual-wavelength laser same is used for dual wavelength by this
Laser energy attenuating device when, attenuator combination need not be changed in test process, that is, the laser for obtaining identical attenuation rate is defeated
Go out.The output laser that the utility model is used for the laser energy attenuating device of dual wavelength has identical attenuation rate.
The laser energy attenuating device structure that the utility model is used for dual wavelength is simple, and two are realized using a set of attenuator
Cover attenuator function.
Embodiment 2
Laser energy attenuating device for dual wavelength is monolithically fabricated same embodiment 1, and in the utility model surface deposits
There is the attenuator for correcting different wave length transmittance optical film, the film deposited is MgF2Film, MgF2Film thickness is
44.12nm；Laser damage threshold at 532nm, 1064nm is more than 10J/cm2。
It is not limited to deposit MgF on attenuator2Film, TiO2, SiO2It is also suitable Deng film.Selected according to different attenuation rates
Different films is used for the transmissivity for correcting different wave length.
The utility model employs the attenuator that deposited film, example in the laser energy attenuating device for dual wavelength
Such as：Using deposited MgF2The attenuator of film, can be in the case where not converting attenuator, and realize has for different wave length
The technique effect of identical attenuation rate.
In this example, it is co-axially mounted and is fixed on decay disk bearing 10 using two groups of identical structural damping movement executing mechanisms,
Referring to Fig. 1, when using Liang Tao convergent mode of motion executing agencies, supporting two Hall sensors 8 are needed, for the positioning of attenuator,
To realize a variety of attenuation rates of laser energy.
Embodiment 3
Laser energy attenuating device for dual wavelength is monolithically fabricated same embodiment 1~2, on the utility model attenuator
The MgF of deposition2Film is prepared using Assisted by Ion Beam evaporation, and the membrane structure consistency of formation is high, after the completion of preparation, 350 DEG C
Vacuum annealing 2 hours, it ensure that the adhesive force of film and substrate is strong and have high laser damage threshold, chemical stability is good.
The example that a utility model carries out dual wavelength energy attenuation is given below, to the utility model furtherly
It is bright.
Embodiment 4
The overall of laser energy attenuating device for dual wavelength is formed with embodiment 1~3, realizes dual-wavelength laser energy
Decay, specifically realize that dual-wavelength laser energy has identical decay when not changing attenuator combination in damage from laser test
Rate, detailed process include：
Step 1, for dual wavelength laser energy attenuating device based on form damage from laser test system, wherein, the
One laser and second laser are respectively placed in input, wherein first laser device for a branch road respectively as two laser input sources
Outgoing testing laser be 532nm, be connected to steering optical unit, be sequentially connected in series afterwards along laser emitting direction：Collimate, expand
Unit, for the laser energy attenuating device of dual wavelength, focusing unit, it is tested print；The outgoing testing laser of second laser
For 1064nm, collimation same with first laser device, expand unit are sequentially entered along laser emitting direction afterwards, for dual wavelength
Laser energy attenuating device, focusing unit, it is tested in the light path of print；All optical elements, the component of each branch road are same respectively
Optical axis, form damage from laser test system.Selected first laser device is the Nd after frequency multiplication：YAG laser, second laser are
Nd：YAG laser.
Step 2, the optical line terminal by tested print installed in test system；Print is tested during concrete operations to may be mounted at
In two-dimensional movement platform.It is tested print that all kinds of damage from laser films using optical glass as substrate, which can be selected,.
Step 3, first laser device are closed, second laser transmitting 1064nm laser.
Step 4, the 1064nm laser beams of second laser are entered by the laser after collimation and expand unit is used for double wave
Long laser energy attenuating device.
Step 5, when second laser 1064nm laser beams pass through it is heavy in the laser energy attenuating device for dual wavelength
After product has the attenuator of film, 1064nm laser realizes N% energy attenuation.
1064nm laser beam line focus units after step 6, decay converge to tested print surface, realize to being tested print
1064nm damages from laser test.
Step 7, second laser are closed, and open first laser device, and laser sends 532nm laser.
The diverted optical unit of 532nm laser that step 8, first laser device are sent, into collimation, expand unit；
Step 9, the 532nm laser of first laser device are collimated and laser after expanding passes through the laser energy for dual wavelength
Measure attenuating device；
Step 10, deposition has declining for film in 532nm laser beams are by the laser energy attenuating device for dual wavelength
After subtracting piece, attenuation schemes are not adjusted, without changing attenuator, N% energy attenuation can be achieved without converting attenuator position；
Obtain with 1064nm laser beam identical laser energy attenuation rates, N=7 in this example.
Laser line focus unit converges to tested print surface after step 11, decay, realizes and tested print 532nm is swashed
Light injury is tested.
It as needed other laser energy attenuation rates, can be moved by convergent mode of motion executing agency, adjust the position of attenuator, it is real
Existing differential declines piece combination, reaches required laser energy attenuation rate.
The utility model can realize quick, the accurate detection of laser damage threshold.
The utility model is applied to continuous laser and pulse laser, has wide practical use in actual industrial production.
Embodiment 5
For dual wavelength laser energy attenuating device technical scheme with embodiment 1-4, referring to Fig. 2, during use
Second laser can also be first shut off, allows first laser device first to launch 532nm laser, i.e., first carries out the test of 532nm laser,
The test of 1064nm laser is carried out afterwards.
It is adjusted using combination of the stepper motor to attenuator, a variety of laser energy attenuation rates can be obtained, thus carried
High measuring accuracy and test scope, open up more applications.
Embodiment 6
For dual wavelength laser energy attenuating device technical scheme with embodiment 1-5, referring to Fig. 2, the utility model
In first laser device and second laser, wherein have one need through steering optical unit, another be then not required to through turning
To optical unit, i.e., when the 1064nm laser that second laser is sent is diverted optical unit, into collimation, expand unit
When；Collimation, expand unit are penetrated in the 532nm laser straights access that first laser device is sent.
The utility model has stronger adaptability.
A complete example is given below, the utility model is explained again：
Embodiment 7
For dual wavelength laser energy attenuating device technical scheme with embodiment 1-6.
In this example, three sets of convergent mode of motion executing agencies specifically are selected, 4 kinds of differential declines rates are installed on each disk 4 of decaying
Plated film attenuator, can be achieved 125 kinds of different attenuation rates.
Because each plated film attenuator is only capable of realizing specific attenuation rate to multi-wavelength, in order to realize laser energy 0~
The linear attenuation of 98% scope, the mode that this example employs 12 attenuator combinations are realized.
The utility model give it is a kind of be used for dual-wavelength laser energy attenuation device, to attenuator table in the utility model
Face plated film, change the transmissivity of each wavelength, the transmissivity of two wavelength of 1064nm and 532nm is modified, same
In optical system, completely the same attenuation rate is realized.
Embodiment 8
For dual wavelength laser energy attenuating device technical scheme with embodiment 1-7, referring to Fig. 4, Fig. 4 is non-plated film
The Optical transmission spectrum figure of decay sheet matrix, it is visible in Fig. 4, using same sheet glass, by taking K9 substrate glass as an example, correspond to
The transmissivity 91.88% of 532nm laser wave strong points, the transmissivity corresponding to 1064nm laser wave strong points is 92.73%, due to material
There is dispersion in material, cause decay sheet matrix to have different transmissivities to different wave length, both phase differentials to different wave length in itself
Nearly 1%.
The attenuator for having film using deposition in the utility model forms the laser energy attenuating device for dual wavelength, pin
The laser of different wave length is inputted to have obtained the laser output of identical attenuation rate.The utility model passes through test of many times and detection,
For test result referring to Fig. 5, Fig. 5 is that deposition has MgF in the utility model2The Optical transmission spectrum of different wave length after the attenuator of plated film
Figure, Fig. 5 are visible：The laser for still having change for different laser inputs exports, but correspond to 532nm optical maser wavelengths and
1064nm laser wave strong points have identical attenuation rate.Not only solved with this utility model in optical field for different
Dual-wavelength laser energy obtains the technical barrier of identical attenuation rate.Importantly, it can be realized very using this technique effect
More technology applications, such as, it is applied to dual-wavelength laser damage measure, is just decayed with a set of laser energy for dual wavelength
Device realizes the accurate attenuation of dual wavelength.By technological achievement further genralrlization of the present utility model, can be used for three wavelength and
Same laser energy attenuation test and application above.
Referring to Fig. 5, the utility model attenuation accuracy is high, and attenuation rate control errors are in 0.1%.
In summary, one kind provided by the utility model is used for dual-wavelength laser energy attenuation device, solves multi-wavelength
The same attenuator technical problem different to the decay of different wave length laser energy in damage from laser test.The utility model is being decayed
It can combine to form attenuating device using a set of or Duo Tao convergent mode of motions executing agency in device, can be chosen on each disk of decaying
Multiple attenuators are installed, each attenuator deposits the optical thin film for correcting different wave length transmissivity.Using 532nm and
The laser beam input of two wavelength of 1064nm, carried out by the dual-wavelength laser energy attenuation device provided by the utility model that is used for
Energy attenuation, the attenuation rate of strict conformance can be obtained without changing attenuator and attenuator combination.The utility model is used for double wave
Long laser energy attenuating device structure is simple, and two sets of decay are realized using a set of dual-wavelength laser energy attenuation device that is used for
The function of device；Attenuation accuracy is high, can improve laser damage threshold measuring accuracy；Suitable for continuous laser and pulse laser, in work
Have wide practical use in industry production.
Claims (3)
1. a kind of laser energy attenuating device for dual wavelength, laser energy attenuating device includes base and is installed on base
On damping mechanism, damping mechanism by motor driven decay disc system rotate, attenuator circumferentially is uniformly installed on decay disk on,
Incident light is laser, and emergent light is the laser output after decay, it is characterised in that：The attenuator is that surface deposition has for repairing
The attenuator of positive different wave length transmittance optical film；In the input of the laser energy attenuating device for dual wavelength, it is provided with
Two lasers, the optical maser wavelength of first laser device is 532nm, and second laser optical maser wavelength is 1064nm, when above-mentioned double wave
When long laser is by the same laser energy attenuating device for dual wavelength, attenuator group need not be changed in test process
Close, that is, obtain the laser output of identical attenuation rate.
2. the laser energy attenuating device according to claim 1 for dual wavelength, it is characterised in that surface deposition has thin
The attenuator of film, the film deposited are MgF2Film, MgF2Film thickness is 44.12nm；Laser damage at 532nm, 1064nm
Hinder threshold value and be more than 10J/cm2。
3. the laser energy attenuating device according to claim 2 for dual wavelength, it is characterised in that on the attenuator
The MgF of deposition2Film using Assisted by Ion Beam evaporation prepare, after the completion of preparation at 350 DEG C vacuum annealing 2 hours.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201720335541.9U CN206741085U (en) | 2017-03-31 | 2017-03-31 | Laser energy attenuating device for dual wavelength |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201720335541.9U CN206741085U (en) | 2017-03-31 | 2017-03-31 | Laser energy attenuating device for dual wavelength |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN206741085U true CN206741085U (en) | 2017-12-12 |
Family
ID=60559274
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201720335541.9U Expired - Fee Related CN206741085U (en) | 2017-03-31 | 2017-03-31 | Laser energy attenuating device for dual wavelength |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN206741085U (en) |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN106908948A (en) * | 2017-03-31 | 2017-06-30 | 西安工业大学 | Can be used for the laser energy attenuating device of dual wavelength and method |
| CN110544861A (en) * | 2019-09-18 | 2019-12-06 | 北京理工大学 | Laser attenuation protection device |
| CN113776786A (en) * | 2021-09-17 | 2021-12-10 | 中国科学院西安光学精密机械研究所 | Transmittance and reflectivity measuring instrument and measuring method thereof |
| CN114422026A (en) * | 2021-12-09 | 2022-04-29 | 武汉华中天经通视科技有限公司 | Self-stabilization device and method for space optical communication channel |
-
2017
- 2017-03-31 CN CN201720335541.9U patent/CN206741085U/en not_active Expired - Fee Related
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN106908948A (en) * | 2017-03-31 | 2017-06-30 | 西安工业大学 | Can be used for the laser energy attenuating device of dual wavelength and method |
| CN106908948B (en) * | 2017-03-31 | 2022-10-04 | 西安工业大学 | Laser energy attenuation device and method for dual wavelengths |
| CN110544861A (en) * | 2019-09-18 | 2019-12-06 | 北京理工大学 | Laser attenuation protection device |
| CN113776786A (en) * | 2021-09-17 | 2021-12-10 | 中国科学院西安光学精密机械研究所 | Transmittance and reflectivity measuring instrument and measuring method thereof |
| CN114422026A (en) * | 2021-12-09 | 2022-04-29 | 武汉华中天经通视科技有限公司 | Self-stabilization device and method for space optical communication channel |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN206741085U (en) | Laser energy attenuating device for dual wavelength | |
| CN106908948A (en) | Can be used for the laser energy attenuating device of dual wavelength and method | |
| Pervak et al. | 1.5-octave chirped mirror for pulse compression down to sub-3 fs | |
| JP6879950B2 (en) | Non-linear optical wavelength converter with output scaling | |
| US20190369006A1 (en) | High temporal resolution mueller matrix elliptical polarization measuring device and method | |
| JP2016504199A5 (en) | ||
| CN103151703B (en) | Littrow-structure tunable external-cavity laser and mode-hopping-free sweep-frequency regulation method thereof | |
| WO2021036167A1 (en) | Apparatus for measuring fp transmittance curve using whispering gallery mode laser light source, and method | |
| CN110779620B (en) | Wide-spectrum tunable standard single photon source generation device and optical radiation calibration method | |
| CN103540906A (en) | Optical/crystal comprehensive film thickness monitoring method | |
| CN103604751B (en) | The device of property measuring period chiral structure transparent membrane optical activity and corresponding method | |
| Huang et al. | Control bandwidth promotion of adaptive fiber-optics collimator and its application in coherent beam combination | |
| CN1858566A (en) | Accurate real-time measuring device of ultrashort pulse | |
| US20230073406A1 (en) | Micro-thrust and micro-impulse application device and method based on light pressure principle | |
| CN111987579A (en) | Pulse sequence modulation method based on Fabry-Perot interferometer | |
| CN108051887B (en) | Apodization grating secondary exposure manufacturing system and method based on dynamic optical shielding plate | |
| CN109724539B (en) | Temperature drift zero compensation method for strain angle sensor | |
| CN106198456A (en) | Ultra-fast optical based on magneto-optic kerr/Faraday effect gate imaging system and method | |
| CN106052751B (en) | A kind of frequency resolution optical switch laser measuring device based on transient grating | |
| CN101839860A (en) | Multi-wave excitation device of laser Raman spectrometer | |
| CN109323759A (en) | Improve the method that laser freuqency doubling system temperature actively follows compensation precision | |
| CN101806717B (en) | Measuring device for nonlinear transmission characteristic of laser beam | |
| CN101308332A (en) | Method and its system for controlling photolithography exposure dosage | |
| Kopainsky et al. | Investigation of intra-and intermolecular transfer processes by picosecond fluorescence gating | |
| Korolkov et al. | Conformal optical elements for correcting wavefront distortions in YAG: Nd3+ active elements |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| GR01 | Patent grant | ||
| GR01 | Patent grant | ||
| CF01 | Termination of patent right due to non-payment of annual fee | ||
| CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20171212 Termination date: 20180331 |