CN206654861U - A kind of straight-line groove micro-structural multilayer film glass in order - Google Patents

Abstract

The utility model belongs to special glass material processing technical field, is related to a kind of straight-line groove micro-structural multilayer film glass and preparation method thereof in order；Straight-line groove microstructure film glass pane surface is arranged alternately ZrO₂Step and corresponding channel bottom, ZrO₂The preparation that continues successively of step and channel bottom upper surface has metal layer A l, Cu₂O layers and ZnO layer three-layer thin-film；Preparation method comprises the following steps：1st, ZrO is prepared₂Step and channel bottom；2nd, metal Al layer is prepared；3rd, Cu is prepared₂O layers；4th, ZnO layer is prepared；The utility model has heat-insulating and energy-saving, photocatalysis, decoration and other effects.For example its heat-insulating and energy-saving is embodied in multilayer film and microflute can obstruct infrared emanation, and can allows visible light-transmissive；Its photocatalysis can be decomposed into organic matter of the absorption on surface water and carbon dioxide, and straight line micro groove structure is effectively the residue of degraded together as natural rainwater, gravity and wind wash away totally.

Description

A kind of straight-line groove micro-structural multilayer film glass in order

Technical field

The utility model belongs to special glass material processing technical field, and it is more to be related to a kind of straight-line groove micro-structural in order Tunic glass and preparation method thereof.

Background technology

With the aggravation reduced increasingly with environmental pollution of globalization petroleum-based energy, effectively using cold in solar control room Heat, photocatalysis make organic matter dirt be rapidly decomposed into inorganic matter into ecological circulation and realize self-cleaning of building glass etc. As one of outlet of sustainable development.But most of architectural glazings are using simple glass, coloured glass at present Or double glazing (framework is folded up between two sheet glass and is sealed), though it has certain effect to building energy conservation and comfortably, and it is full The foot not demand of people.In addition, also a kind of more popular technical method-pad pasting or plating i.e. on common monolithic glass Film, can also admirably achieve that certain summer is heat-insulated, purpose of Winter protection.The product of hot topic is also low in the world in recent years Emission coated monolithic glass (abbreviation LowE glass) and following glass product-electrochomeric glass of a kind of new development.They Energy-saving efficiency and cost performance etc. all Shortcomings.Chinese utility model patent application 200420083199.0 discloses one Kind low radiation coated glass, it is compounded with five film layers：Metal oxide film layer, metal or alloy barrier layer, argent, metal Or alloy barrier layer, metal oxide film layer.The composite glass structure uses too many noble metal and alloy, cost height.

Above-mentioned patent and other products do not possess the energy-conservation for making glass and light radiation and are in through characteristic with extraneous ring Border automatically micro can adjust the function of changing, that is, not having makes windowpane realize in day/night, fine day/cloudy day alternating feelings The function of light transmission features change under shape；They are also without the more important function-glass automatic cleaning action of glass pane.Close In automatically cleaning and its light-catalysed general principle, the TiO as semiconductor material with wide forbidden band₂, its photoelectricity/photocatalysis characteristic grinds Study carefully always individual focus.Magazine《J.Phys.D:Appl.Phys.》(P.035301) 43rd phase in 2010 reports and utilizes TiO₂ Nanocrystalline porous film does application of electrode in Photoelectrochemistry and obtains photoelectric transformation efficiency and brought up to from 1 ﹪ 7.9 more than ﹪ achievement.Magazine《Applied Surface Science》The 20th phase (P.8451) report of volume 257 in 2011 TiO₂Photocatalytic degradation in terms of research, the described in the text utilizes lightinduced adsorption research TiO₂Automatically cleaning and anti- Bacterium characteristic.With typical catalysis material TiO₂The metal oxide for having similar characteristics also has ZnO, magazine《Thin Solid Films》(P.89-94) 496th phase in 2006 is reported in ZnO and In₂O₃Doping and multiphase phase diagram theory etc. one A little deeply thin young work, particularly ZnO conduction/photoelectricity/photocatalysis research is even more to receive much attention, this be mainly ZnO not only Basic performance with above-mentioned excellent material, and it is its aboundresources, cheap, nontoxic, and the space further researched and developed is very Greatly.

In terms of inexpensive photoelectricity, photocatalysis, it is all good candidate material to have many metal oxides, the utility model Using titanium oxide (ZnO) and cuprous oxide (Cu₂O it is mainly) that it not only has the basic performance of the materials such as photoelectricity, photocatalysis, and And it is their aboundresources, cheap, nontoxic, the space further researched and developed is very big.

At present, the decorative effect of rich and honour golden yellow color is all also not equipped with market and document, there is photoelectricity, photocatalysis The functions such as self-cleaning, there is low-E energy-saving effect, having just can be automatically with outer without using extra automatically controlled sensor-based system Boundary's light intensity and the micro light radiation for changing glass pass through " the straight-line groove microstructure film glass " of characteristic, its structure, prepare Method and efficiency and all different with conventional traditional product and production method.

The content of the invention

The utility model solves and overcome above-mentioned problem, is provided using physics and chemically composited preparation method A kind of straight-line groove micro-structural multilayer film glass and preparation method thereof in order.

The utility model adopts the following technical scheme that realization, is described with reference to the drawings as follows：

A kind of straight-line groove micro-structural multilayer film glass, including straight-line groove microstructure film glass plate 1 in order, the straight-line groove is micro- The surface of structural membrane glass plate 1 is arranged alternately ZrO₂Step 2 and corresponding channel bottom 3, ZrO₂Step 2 and channel bottom 3 The upper surface preparation that continues successively has metal layer A l, Cu₂O layers 5 and the three-layer thin-film of ZnO layer 6.

The straight-line groove microstructure film glass plate 1 is flat board, and the area of straight-line groove microstructure film glass plate 1 is in 1- Between 58000 square centimeters；The ZrO₂The cycle of the upright projection plane of step 2 and channel bottom 3 is in 700-3000 nanometers Between.

The preparation method of described a kind of straight-line groove micro-structural multilayer film glass in order, it is characterised in that including following step Suddenly：

Step 1, prepare ZrO₂Step and channel bottom；

Step 2, prepare metal layer A l；

Step 3, prepare Cu₂O layers；

Step 4, prepare ZnO layer.

ZrO is prepared described in technical scheme steps 1₂Step 2 and channel bottom 3 comprise the following steps that：

1) it is equipped with ZrO₂Precursor liquid；The ZrO₂Precursor liquid proportioning be four butanol zirconiums：Benzoylacetone：Absolute ethyl alcohol= 1： 0.8：28；

2) ZrO is prepared on the glass plate of cleaning using vertical czochralski method₂Film；

3) using the ZrO in double laser beams interference effect face on a glass₂On film, ZrO is obtained₂Step 2 and trench bottom Portion 3, obtain the glass plate with ZrO2 steps 2 and channel bottom 3.

Comprising the following steps that for metal layer A l is prepared in technical scheme steps 2：

1) dc physics magnetically controlled sputter method deposited metals are used above in the glass plate with ZrO2 steps and channel bottom Layer Al；

2) in dc physics magnetron sputtering processes, institute deposited metal layer Al target material (source material) is from high-purity Al gold Category, Sputtering power density are chosen to be 31W/cm², the sputtering pressure of Ar gas is chosen to be 1.2Pa, and the back end vacuum of vacuum chamber is selected For 10^-3Pa, base station heating-up temperature are chosen to be 200 degree；

Metal layer A l film thicknesses are between 20-200 nanometers.

Cu is prepared described in technical scheme steps 3₂O layers comprise the following steps that：

1) colloid chemistry reaction is carried out in reactive tank using copper ions solution I and sodium citrate solution II；

2) " the glass/ZrO to be deposited that completion step 2 is obtained during the course of the reaction₂/ Al " is { since glass surface It is followed successively by ZrO₂[have ZrO2 steps 2 and channel bottom 3], Al layers } substrate is put into the chemical solution in reactive tank；Carry simultaneously Chemical reaction is controlled to prepare Cu for ultrasonic energy₂O films, ultrasonic wave is chosen to be 15-75 khz frequencies and 45-250 watts defeated Go out power, reaction temperature is controlled in 40-75 DEG C of scope；

Cu₂The thickness of O layers is between 20-500 nanometers.

The copper ions solution I is allocated in technical scheme is:- the 1.3mol/L of copper sulphate 0.7, sodium ascorbate 0.3- 0.8mol/L；The preferred 1mol/L of copper sulphate, the preferred 0.5mol/L of sodium ascorbate；

Allocating the sodium citrate solution II is:Sodium citrate, 0.03-0.08mol/L；The preferred 0.05mol/ of sodium citrate L；

Comprising the following steps that for ZnO layer 6 is prepared described in technical scheme steps 4：

1) in " glass/ZrO obtained by completing step 3₂/Al/Cu₂O " (is followed successively by ZrO since glass surface₂, Al Layer, Cu₂O layers) substrate is used above rf physics magnetically controlled sputter methods and prepares oxide skin(coating) ZnO；

2) in rf physics magnetron sputtering processes, institute deposited oxide layer ZnO target material (source material) selects high-purity ZnO Ceramics, Sputtering power density are chosen to be 56W/cm², Ar and O₂The sputter gas air pressure of gas is chosen to be 2.0Pa, the back end of vacuum chamber Vacuum is chosen to be 10^-3Pa, base station heating-up temperature are chosen to be 300 degree；The thickness of ZnO layer 6 is between 20-900 nanometers.Most " glass/ZrO is obtained afterwards₂/Al/Cu₂O/ZnO " (is followed successively by ZrO since glass surface₂, Al layers, Cu₂O layers, ZnO layer).

The utility model mainly make use of a variety of physical and chemical principles --- (i) photoresistance and photocatalysis effect Should；(ii) composite principle of material；(iii) straight-line groove microstructure design；(iv) low emissivity material.

(i) photoresistance and photocatalytic effect

ZnO absorption band gap Eg is 3.30eV semi-conducting materials, can good match solar spectrum visible region and to visible Light has extraordinary transmissivity, and there is good photoelectric effect can obtain the characteristics such as good photoelectric characteristic and photocatalysis. It is well known that similar oxide semiconductor also has Cu₂O, its energy gap Eg are 2.20eV, it may have above-mentioned nearly all Good physical chemistry and the characteristic such as photoelectric characteristic and photocatalysis.The good main table of photoelectric conversion characteristic of above-mentioned two kinds of materials It is now the carrier increase in membrane material when on its surface of sunlight irradiation of sensitivity；So as to ZnO and Cu₂O film glass is conductive Characteristic changes with strong and weak change of incident light, and this will produce and heat-insulated effect is realized to the prevention of infrared emanation；Light is urged Changing characteristic can make film glass be used for photocatalytic degradation organic dirt and realize automatic cleaning action.

(ii) composite principle of material

According to band theory and crystallographic knowledge, the energy gap of general semiconductor is narrower, and the electronics of filled band is easy to Excited and enter conduction band, while hole is left in filled band, in the presence of external electric field, the sky in electronics and filled band in conduction band Cave all may participate in conduction.This just explain well why above-mentioned Cu₂O/ZnO bilayer membrane materials have good physical chemistry Characteristic and composite effect.In the case of two kinds of metal oxide composites of the present utility model, because Cu₂O/ZnO bilayers circle Face has different energy gap Eg sizes and carrier potential, therefore under photon h ν irradiation, oxide semiconductor Cu₂In O The light induced electron being excited can be moved on another oxide semiconductor ZnO conduction band；Hole energy caused by being excited in ZnO Move in CdS valence band.It is all these to promote efficiently separating for respective light induced electron and hole, improve the two half Conductor photoelectric effect and the self-cleaning net effect for ultimately resulting in good photocatalytic effect.

Similar analysis and situation, in " Al/Cu₂O " " metal/metal oxide " bed boundary, there is lowest conduction band energy Level E_cWith energy gap E_gCu₂O oxides can explain its photocatalytic activity with the compound band structure of Al metal conductor layers Enhancing.In During Illumination, continue and come from ZnO and Cu₂The light induced electron being excited inside O just moves to from conduction band Among metal, the recombination rate of hole and electronics is eventually reduced, and improves the characteristic of photoelectricity and photochemical catalyst.

Generally, the less Cu of energy gap₂O in principle can be using absorbing wavelength as 400-800 nanometers light, this just can very well Ground absorbs visible ray and makes full use of it, still, Cu₂O can not but utilize ultraviolet light well, because the electronics being wherein excited There is energy that substantial portion of energy conversion is phonon vibration without for being catalyzed it is understood that broad stopband with hole The absorption of corresponding " purple light-ultraviolet light " region spectrum frequency ranges of ZnO, so by Cu₂O with ZnO is compound can be achieved with possessing more Wide incident light response spectrum scope.

(iii) straight-line groove microstructure design

Orderly densely arranged straight-line groove micro-structural in " straight-line groove microstructure film glass " adds the surface of glass plate Product, improve the reflection characteristic of sunlight and various heat radiations., will be right according to them are designed under the influence of the dimensional effect of micro-structural The light of different spectral bands produces different transmissions, reflection, scattering；So that the micro-structural of reduced size can be to a certain extent The stop to infrared band radiant light is improved, ensures that the characteristic of visible transmission is realized.

It is well known that in our environment in general solar energy and various infrared sources, light source etc. for glass pane All it is angled incident light；And the micro-structural of reduced size all to produce one in the incident heat radiation light of glass surface Determine the reflection of multiple multiple angles of degree, and in straight-line groove micro-structural multiple reflections and decay；Avoiding problems due to general Lead to the mirror-reflection (i.e. normal reflection) of glass pane and coated glass and caused reflection glare and light pollution.

(iv) low emissivity material.

Due to " the ZrO coated in straight-line groove and its ledge surface₂/Al/Cu₂O/ZnO " is the more of photoelectricity and low-radiation material Layer film, so this infrared optical heat radiation reflecting layer causes " the straight-line groove microstructure film glass " to have very low surface emissivity Rate, and it is very high to the reflectivity of infrared emanation；Visible ray can still pass through the film and glass plate simultaneously.Total effect energy Keep indoor light soft, realize that the save lighting energy, body-sensing are comfortable and healthy.

Comprehensive Design and utilization by above-mentioned four kinds of physics principles, should " straight-line groove microstructure film glass " realize as Under scene application.In summer, it can the heat radiation that sends of the outer sun of blocking portion locellus get in, indoor air-conditioning cold air is but Outdoor can not be by convection into, saves air-conditioning expense；And it has to the visible light ray of the aerial diffusion in day and passes through characteristic well simultaneously, Save lighting expense.In the winter time, the far infrared that indoor radiating piece and indoor object distribute effectively will be reflected back room by it It is interior, ensure that indoor heat does not scatter and disappear to outdoor.Simultaneously the visible ray of the part sun can also be allowed to get in, so as to save Warming by air conditioner and lighting expense are used.

The utility model advantageous effects compared with prior art:

1) one kind is realized with multilayer film " ZrO₂/Al/Cu₂O/ZnO " and " Al/Cu₂O/ZnO " is respectively peak and valley alternating Orderly densely arranged straight-line groove microstructure film glass and its manufacture method, the utility model " straight-line groove microstructure film glass " With sunshade, energy-conservation, the effect of decoration.

2) its energy-saving low-carbon be embodied in can it is heat-insulated and insulation, and can allow visual field spectral region sunlight pass through, and Realize and save the effect that electric consumption on lighting reaches glass.

3) its heat-insulated multilayer film and microflute of being embodied in can obstruct infra-red radiation.

4) being somebody's turn to do " straight-line groove microstructure film glass " just can be automatically strong with ambient without using extra automatically controlled sensor-based system The light radiation spent and change glass passes through characteristic.

5) organic matter of the absorption on surface can also be decomposed into by being somebody's turn to do the photocatalysis of " straight-line groove microstructure film glass " Water and carbon dioxide, straight line micro groove structure effectively degraded remnants and inorganic matter together with natural rainwater, gravity and Wind washes away totally；I.e. the laminated film can make body surface have the function of self-cleaning.

6) should " straight-line groove microstructure film glass " also there is certain curtain effect, you can seen not outside daytime room with realization People and thing to interior, and it is indoor it can easily be seen that the scene of outdoor.

7) design that " the straight-line groove microstructure film glass " can be selective has light yellow, silver color and wealth and rank golden yellow etc. The color of multiple types；With making human eye comfortably and certain light transmission characteristics；Can selectivity have broken colour light splitting, Ke Yixuan Selecting property has the reflection (avoiding reflecting glare and light pollution) of reduction light and the slow reflection of realization, can be selective have partly anti- Penetrate or be totally reflected the decorative effect of minute surface.

Brief description of the drawings

The utility model is further described below in conjunction with the accompanying drawings：

Fig. 1 is the integrally-built front view of one embodiment of the present utility model；

Fig. 2 be in Fig. 1 A-A to sectional view；

In figure：1st, straight-line groove microstructure film glass plate；2、ZrO₂Step；3rd, channel bottom；4th, metal layer A l；5、Cu₂O Layer；6th, ZnO layer.

Embodiment

The utility model is explained in detail below：

Embodiment one

The present embodiment is multilayer film " ZrO₂/Al/Cu₂O/ZnO " and " Al/Cu₂O/ZnO " is respectively that peak and valley alternately has The densely arranged straight-line groove microstructure film glass of sequence, straight-line groove microstructure film glass plate 1 are 1 square centimeter of writing board shapes, its peak With the ZrO on the surface of paddy alternating wave-like₂The cycle of the upright projection plane of step 2 and channel bottom 3 is 700 nanometers；Gold The thickness for belonging to layer Al is 20 nanometers；Cu₂The thickness of O layers is 20 nanometers；The thickness of ZnO layer is 20 nanometers.

The manufacture method of orderly straight-line groove micro-structural multilayer film glass, comprises the following steps：

Step 1, prepare ZrO₂Step 2 and channel bottom 3:

ZrO used₂Precursor liquid proportioning be four butanol zirconiums：Benzoylacetone：Absolute ethyl alcohol=1：0.8：28, and using vertically Czochralski method prepares ZrO on the glass plate of cleaning₂；Using the ZrO in double laser beams interference effect face on a glass₂On, obtain Obtain ZrO₂Step 2 and channel bottom 3, the ZrO₂The cycle of the upright projection plane of step 2 and channel bottom 3 is 700 nanometers.

Step 2, prepare metal layer A l:

Using physics magnetically controlled sputter method in ZrO₂Metal layer A l is prepared on the surface of step 2 and channel bottom 3；Metal level For Al thickness control at 20 nanometers, target material is high-purity Al metals, and sputtering power density is 31W/cm², the sputtering of Ar gas Air pressure is 1.2Pa, and the back end vacuum of vacuum chamber is 10^-3Pa, base station heating-up temperature are 200 degree.

Step 3, prepare Cu₂O layers：

Colloid chemistry reaction is carried out in reactive tank using copper ions solution I and sodium citrate solution II, was being reacted " glass/ZrO to be deposited in journey₂/ Al " substrates are put into the chemical solution in reactive tank, while provide ultrasonic energy Control chemically reacts to prepare Cu₂O films；Oxide Cu₂O layer film thickness is controlled at 20 nanometers；Copper ions solution I is:Copper sulphate 0.7 mol/L, sodium ascorbate 0.3mol/L；The sodium citrate solution II is:Sodium citrate, 0.03mol/L.The chemistry Method prepares Cu₂The temperature control of solution I and solution II is at 40 DEG C during O films, and ultrasonic wave be chosen to be 15 khz frequencies with And the energy field of 45 watts of power outputs is applied in reaction solution.

Step 4, prepare ZnO layer：

Using physics magnetically controlled sputter method in " glass/ZrO₂/Al/Cu₂O " substrate upper surfaces prepare ZnO layer.The thickness of ZnO layer At 20 nanometers, target material is high-purity ZnO ceramic, radio frequency power density 56W/cm for degree control², Ar and O₂The sputter gas gas of gas Press as 2.0Pa, the back end vacuum of vacuum chamber is 10^-3Pa, base station heating-up temperature are 300 degree.

Embodiment two

The present embodiment is multilayer film " ZrO₂/Al/Cu₂O/ZnO " and " Al/Cu₂O/ZnO " is respectively that peak and valley alternately has The densely arranged straight-line groove microstructure film glass of sequence, straight-line groove microstructure film glass plate are 1 square centimeter of writing board shapes, its peak and The ZrO on the surface of paddy alternating wave-like₂The cycle of the upright projection plane of step 2 and channel bottom 3 is 1800 nanometers；Metal Layer Al thickness is 100 nanometers；Cu₂The thickness of O layers is 100 nanometers；The thickness of ZnO layer is 500 nanometers.

The manufacture method of orderly straight-line groove micro-structural multilayer film glass, comprises the following steps：

Step 1, prepare ZrO₂Step 2 and channel bottom 3:

ZrO used₂Precursor liquid proportioning be four butanol zirconiums：Benzoylacetone：Absolute ethyl alcohol=1：0.8：28, and using vertically Czochralski method prepares ZrO on the glass plate of cleaning₂；Using the ZrO in double laser beams interference effect face on a glass₂On, obtain Obtain ZrO₂Step 2 and channel bottom 3, the ZrO₂The cycle of the upright projection plane of step 2 and channel bottom 3 is 1800 nanometers.

Step 2, prepare metal layer A l:

Using physics magnetically controlled sputter method in ZrO₂Metal layer A l4 is prepared on the surface of step 2 and channel bottom 3；Metal Layer Al thickness control is at 100 nanometers, and target material is high-purity Al metals, and sputtering power density is 31W/cm², Ar gas Sputtering pressure is 1.2Pa, and the back end vacuum of vacuum chamber is 10^-3Pa, base station heating-up temperature are 200 degree.

Step 3, prepare Cu₂O layers：

Colloid chemistry reaction is carried out in reactive tank using copper ions solution I and sodium citrate solution II, was being reacted " glass/ZrO to be deposited in journey₂/ Al " substrates are put into the chemical solution in reactive tank, while provide ultrasonic energy Control chemically reacts to prepare Cu₂O films；Oxide skin(coating) Cu₂O film thicknesses are controlled at 100 nanometers；Copper ions solution I is:Sulfuric acid Copper 1 mol/L, sodium ascorbate 0.5mol/L；The sodium citrate solution II is:Sodium citrate, 0.05mol/L.The chemistry Method prepares Cu₂The temperature control of solution I and solution II is at 55 DEG C during O films, and ultrasonic wave be chosen to be 45 khz frequencies with And the energy field of 150 watts of power outputs is applied in reaction solution.

Step 4, prepare ZnO layer：

Using physics magnetically controlled sputter method in " glass/ZrO₂/Al/Cu₂O " substrate upper surfaces prepare ZnO layer 6.ZnO layer 6 For thickness control at 500 nanometers, target material is high-purity ZnO ceramic, radio frequency power density 56W/cm², Ar and O₂The sputter gas of gas Air pressure is 2.0Pa, and the back end vacuum of vacuum chamber is 10^-3Pa, base station heating-up temperature are 300 degree.

Embodiment three

The present embodiment is multilayer film " ZrO₂/Al/Cu₂O/ZnO " and " Al/Cu₂O/ZnO " is respectively that peak and valley alternately has The densely arranged straight-line groove microstructure film glass of sequence, straight-line groove microstructure film glass plate 1 are 1 square centimeter of writing board shapes, its peak With the ZrO on the surface of paddy alternating wave-like₂The cycle of the upright projection plane of step 2 and channel bottom 3 is 3000 nanometers；Gold The thickness for belonging to layer Al is 200 nanometers；Cu₂The thickness of O layers is 500 nanometers；The thickness of ZnO layer is 900 nanometers.

The manufacture method of orderly straight-line groove micro-structural multilayer film glass, comprises the following steps：

Step 1, prepare ZrO₂Step 2 and channel bottom 3:

ZrO used₂Precursor liquid proportioning be four butanol zirconiums：Benzoylacetone：Absolute ethyl alcohol=1：0.8：28, and using vertically Czochralski method prepares ZrO on the glass plate of cleaning₂；Using the ZrO in double laser beams interference effect face on a glass₂On, obtain Obtain ZrO₂Step 2 and channel bottom 3, the ZrO₂The cycle of the upright projection plane of step 2 and channel bottom 3 is 3000 nanometers.

Step 2, prepare metal layer A l:

Using physics magnetically controlled sputter method in ZrO₂Metal layer A l4 is prepared on the surface of step 2 and channel bottom 3；Metal Layer Al thickness control is at 200 nanometers, and target material is high-purity Al metals, and sputtering power density is 31W/cm², Ar gas Sputtering pressure is 1.2Pa, and the back end vacuum of vacuum chamber is 10^-3Pa, base station heating-up temperature are 200 degree.

Step 3, prepare Cu₂O layers：

Colloid chemistry reaction is carried out in reactive tank using copper ions solution I and sodium citrate solution II, was being reacted " glass/ZrO to be deposited in journey₂/ Al " substrates are put into the chemical solution in reactive tank, while provide ultrasonic energy Control chemically reacts to prepare Cu₂O films；Oxide skin(coating) Cu₂O film thicknesses are controlled at 500 nanometers；Copper ions solution I is:Sulfuric acid Copper 1.3mol/L, sodium ascorbate 0.8mol/L；The sodium citrate solution II is:Sodium citrate, 0.08mol/L.Describedization Method prepares Cu₂The temperature control of solution I and solution II is chosen to be 75 khz frequencies at 75 DEG C, and ultrasonic wave during O films And the energy field of 250 watts of power outputs is applied in reaction solution.

Step 4, prepare ZnO layer：

Using physics magnetically controlled sputter method in " glass/ZrO₂/Al/Cu₂O " substrate upper surfaces prepare ZnO layer 6.ZnO layer 6 Thickness control at 900 nanometers, target material is high-purity ZnO ceramics, radio frequency power density 56W/cm², Ar and O₂The sputtering gas of gas Body air pressure is 2.0Pa, and the back end vacuum of vacuum chamber is 10^-3Pa, base station heating-up temperature are 300 degree.

Claims (2)

1. A kind of 1. straight-line groove micro-structural multilayer film glass in order, it is characterised in that：Including straight-line groove microstructure film glass plate (1), Straight-line groove microstructure film glass plate (1) surface is arranged alternately ZrO₂Step (2) and corresponding channel bottom (3), ZrO₂The preparation that continues successively of step (2) and channel bottom (3) upper surface has metal layer A l (4), Cu₂O layers (5) and ZnO layer (6) three Layer film.
2. A kind of 2. straight-line groove micro-structural multilayer film glass in order according to claim 1, it is characterised in that：

   The straight-line groove microstructure film glass plate (1) is flat board, and the area of straight-line groove microstructure film glass plate (1) is in 1- Between 58000 square centimeters；

   The ZrO₂The cycle of the upright projection plane of step (2) and channel bottom (3) is between 700-3000 nanometers.