CN206649283U - A kind of detection means of focus detection side formula photoetching position of focal plane - Google Patents
A kind of detection means of focus detection side formula photoetching position of focal plane Download PDFInfo
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- CN206649283U CN206649283U CN201720417210.XU CN201720417210U CN206649283U CN 206649283 U CN206649283 U CN 206649283U CN 201720417210 U CN201720417210 U CN 201720417210U CN 206649283 U CN206649283 U CN 206649283U
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- silicon chip
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- calibration plate
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Abstract
The utility model discloses a kind of detection means of focus detection side formula photoetching position of focal plane, including light source, vertically it is located at silicon chip side and the calibration plate vertical with silicon chip, and it is located between light source and calibration plate and for the microscope group by light focusing caused by light source in calibration plate, also include being used for the detector for detecting calibration plate glazed thread focal position, and the controller for handling detectable signal is connected and be used for detector；Utilize the focus detection method with degree of precision, by the scaling position of focus detection silicon chip side, the placement of silicon chip will be facilitated, reduced because of influence caused by photoresist absorption detecting light, and silicon chip photoetching position of focal plane can be carried out to detect and calibrate in real time, simple and convenient and precision is higher.
Description
Technical field
Silicon chip photoetching position of focal plane detection technique field is the utility model is related to, more particularly to a kind of focus detection side
The detection means of formula photoetching position of focal plane.
Background technology
Etching system is the mainstay of high-tech industry sustainable development, can finally influence electronic product commercial competition
Success or failure.Projection aligner refers to the figure on mask plate projecting to circuit board making egative film (such as silicon chip) by Imagewise exposure
On machine, effective depth of focus of projection objective is universal shorter, in order to realize accurate exposure, it is necessary to which focal plane detecting system is to silicon chip
The position of plane of exposure is monitored in real time, it is ensured that exposure can be on same focal plane, so as to the figure on mask plate every time
Can preferably it be transferred on circuit board making egative film.
Currently used litho machine focal plane detection is carried out in the upper surface of silicon chip or horizontal plane, such detection
Method is unfavorable for the placement of silicon chip, while photoresist meeting absorption detecting light, causes to detect light intensity reduction, reduces accuracy of detection.And
Existing optical detective technology have it is based on slit, based on grating, based on mirror surface, based on Moire fringe, still
Some accuracy of detection of these optical detection methods are not high, and some precision are high, but need the optical element of Various Complex and high-precision
The image formation optical device of degree, cause complicated, expensive.
Therefore how to make that the detection of silicon chip photoetching position of focal plane is simple and convenient, precision is higher and cost is low, be this area skill
The current technical issues that need to address of art personnel.
Utility model content
The purpose of this utility model is to provide a kind of detection means of focus detection side formula photoetching position of focal plane, can be right
Silicon chip photoetching position of focal plane detect and calibrate in real time, and simple and convenient and precision is higher.
In order to solve the above technical problems, the utility model provides a kind of detection of focus detection side formula photoetching position of focal plane
Device, including light source, be located at silicon chip side and the calibration plate vertical with the silicon chip vertically, and it is located at the light source and described
Between calibration plate and it is used for microscope group of the light focusing in the calibration plate caused by the light source, in addition to for detecting institute
The detector of calibration plate glazed thread focal position is stated, and the control for handling detectable signal is connected and be used for the detector
Device.
Preferably, in addition to as the controller control and for the platform shifter of silicon chip described in vertical shift, it is described
Silicon wafer horizontal is arranged on the Z axis platform of the platform shifter.
Preferably, there is the reflecting layer for being used for reflecting the light focus, in the light in the plate face of the calibration plate
Be provided tiltedly with the reflected light path of focus for filtering and reflect the dichroism mirror of particular light ray, in addition to be located at described two to
On the reflected light path of color mirror and in the convex lens of focusing reflection light, and it is located on the focal plane of the convex lens and in institute
The focal point for stating convex lens is provided with the detection plate of pin hole, and the detector is located at after the detection plate and detected by the pin hole
Light intensity.
Preferably, in addition to the controller it is connected and is used for the driver for adjusting the setting angle of the microscope group.
Preferably, in addition to for the speculum that reflexes to light caused by the light source in the microscope group.
Preferably, the controller is computer, and the driver is piezoelectric ceramic actuator.
The detection means of formula photoetching position of focal plane in focus detection side provided by the utility model, utilizes focus detection silicon chip
The scaling position of side, facilitate the placement of silicon chip, reduce the influence of photoresist absorption detecting light, can be to silicon chip photoetching focal plane position
Progress is put to detect and calibrate in real time, and focus detection technology has higher accuracy, it can be ensured that position of focal plane is high-precision
Positioned at projected focal spot, ensure the complete and accurate of photoengraving pattern.
Brief description of the drawings
Fig. 1 is that one kind of the detection means of formula photoetching position of focal plane in focus detection side provided by the utility model is specific
The structural representation of embodiment；
Fig. 2 is the front schematic view of calibration plate provided by the utility model.
Marked in accompanying drawing as follows：
Light source 1, speculum 2, microscope group 3, dichroism mirror 4, calibration plate 5, silicon chip 6, convex lens 7, detection plate 8, detector
9th, controller 10, driver 11, platform shifter 12, Z axis platform 13, light focus 14, focal plane hatching line 15, origin 16.
Embodiment
Core of the present utility model is to provide a kind of detection means of focus detection side formula photoetching position of focal plane, can be right
Silicon chip photoetching position of focal plane detect and calibrate in real time, and simple and convenient and precision is higher.
In order that those skilled in the art more fully understand the utility model, below in conjunction with the accompanying drawings and it is embodied
The utility model is described in further detail for mode.
Fig. 1 and Fig. 2 are refer to, Fig. 1 is the inspection of formula photoetching position of focal plane in focus detection side provided by the utility model
Survey a kind of structural representation of embodiment of device；Fig. 2 is the front signal of calibration plate provided by the utility model
Figure.
The detection means for the focus detection side formula photoetching position of focal plane that the utility model embodiment provides, including
Light source 1, calibration plate 5, microscope group 3, detector 9 and the controller 10 being connected with detector 9, light source 1 is used to emit beam, to be measured
6 generally horizontal placement of silicon chip, calibration plate 5 are located at the side of silicon chip 6 and are vertically arranged with silicon chip 6 vertically, and microscope group 3 is located in light source 1
Between calibration plate 5, the light that light source 1 is sent is focused in calibration plate 5 by microscope group 3, and microscope group 3 can be also used for colour killing in addition
Difference so that the hot spot that light can form very little is gathered in calibration plate 5, and the light detected by detector 9 in calibration plate 5 is burnt
The position of point 14, and detectable signal is handled by controller 10.
There is the focal plane hatching line 15 as standard for horizontal location, i.e. focal plane hatching line 15 is throwing in calibration plate 5
The horizontal hatching line for the focal plane that shadow object lens are focused on the side of silicon chip 6, is provided with origin 16 on focal plane hatching line 15, in calibration plate 5
It is 1 μm of point to be generally evenly distributed with radius anyhow, with facilitate determine light focus 14 in calibration plate 5 with focal plane hatching line 15
And the position relationship of origin；If light focus 14 just on focal plane hatching line 15, illustrates that the silicon chip 6 of detection is in setting
On photoetching focal plane；If light focus 14 is located at the top of focal plane hatching line 15, illustrate light of the position of silicon chip 6 in setting of detection
Carve below focal plane, it should move silicon chip 6 straight up；If light focus 14 is located at the lower section of focal plane hatching line 15, illustrate
The position of silicon chip 6 of detection is above the photoetching focal plane of setting, it should moves silicon chip 6 straight down.Controller 10 calculates light
Focus 14 to focal plane hatching line 15 in calibration plate 5 vertical distance h, as silicon chip 6 need vertical shift up or down away from
From then by the vertical shift h distances up or down of silicon chip 6, so as to realize the detection and calibration of the position of focal plane of silicon chip 6.
Because position of the light focus 14 in calibration plate 5 uses polar coordinates, then calculate light focus 14 to focal plane and cut open
During the vertical distance h of line 15, the distance r of light focus 14 and origin on focal plane hatching line 15, and light focus 14 are first measured
Angle α between the line and focal plane hatching line 15 of both origins, then it can be seen from polar trigonometric function formula, h
=r sin α.
In summary, the detection means of formula photoetching position of focal plane in focus detection side provided by the utility model, utilizes tool
There is the focus detection method of degree of precision, by the scaling position of the side of focus detection silicon chip 6, the placement of silicon chip 6 will be facilitated, subtracted
Less because of influence caused by photoresist absorption detecting light, and the photoetching position of focal plane of silicon chip 6 can be carried out to detect and calibrate in real time, it is simple
Folk prescription is just and precision is higher.
Further, for convenience of the accurate adjustment of the position of silicon chip 6, the focus that the utility model embodiment provides is visited
The detection means of side formula photoetching position of focal plane is surveyed, the platform shifter 12 for vertical shift silicon chip 6, silicon chip can also be included
6 can be horizontally arranged on the Z axis platform 13 of platform shifter 12, and platform shifter 12 can be controlled by controller 10, counted
Light focus 14 is calculated to after the vertical distance h of focal plane hatching line 15 in calibration plate 5, the band of 10 control platform shifter of controller 12
The dynamic vertical shift h of silicon chip 6, realizes the detection and calibration of the position of focal plane of silicon chip 6, ensures that exposure can be in same focal plane every time
On, realize accurate exposure.
On the basis of above-mentioned each embodiment, the focus detection side of the utility model embodiment offer
The detection means of formula photoetching position of focal plane, there is the reflecting layer for reflection light focus 14 in the plate face of calibration plate 5, in addition to
Dichroism mirror 4, convex lens 7 and the detection plate 8 for being provided with pin hole, dichroism mirror 4 tilt the reflected light for being located at light focus 14
Lu Shang, convex lens 7 are located on the reflected light path of dichroism mirror 4, and detection plate 8 is located on the focal plane of convex lens 7 and pin hole is opened
In the focal point of convex lens 7, after detector 9 is located at detection plate 8, the position of 5 glazing line focus of calibration plate 14 can not only be detected, also
Light intensity can be detected by pin hole.
During detection, the light focused in calibration plate 5 is reflexed on dichroism mirror 4 by reflecting layer, and dichroism mirror 4 is right
Particular light ray is almost fully reflective, and other light are filtered out, and to increase accuracy of detection, the particular light ray reflected passes through
Convex lens 7 are gathered at the pin hole of detection plate 8, and are detected by detector 9.
Wherein it should be noted that because the front of detector 9 is provided with the detection plate 8 with pin hole, when silicon chip 6 inclines
During oblique or 5 defocus of calibration plate, light path will change, and the reflection light that planoconvex lens 7 is assembled stops tested drafting board 8, then visits
The light intensity that device 9 is detected by pin hole is surveyed will greatly to decay.
The detection of detector 9 passes through the light intensity of the focusing reflection light of pin hole in detection plate 8, and is handled by controller 10, if
Controller 10 judges that detection light intensity is more than default light intensity, then illustrates that silicon chip 6 does not have run-off the straight, light focus 14 is located at calibration plate
On 5, then continue through positional information of the probing light focus 14 of detector 9 in calibration plate 5 and handled by controller 10；If control
Device 10 processed judges that detection light intensity is less than default light intensity, then illustrates the run-off the straight of silicon chip 6, or the defocus of calibration plate 5, then can adjust silicon
Piece 6 is finely tuned to microscope group 3, to ensure that light focus 14 is remained in calibration plate 5, ensures the light focus 14 detected
Confidence breath is correct.Wherein, it is the standard of comparison set in advance in controller 10 in advance to preset light intensity, presets light intensity
Numerical value is more than zero and is less than the light intensity magnitude that detector 9 is detected by pin hole when light focus 14 is maintained in calibration plate 5, its
Concrete numerical value can determine that the application is not especially limited to this within the above range according to experiment.
Therefore, the detection means of formula photoetching position of focal plane in focus detection side provided by the utility model, additionally it is possible to utilize
The size cases for detecting light intensity are tilted detecting silicon chip 6 or the situation of the defocus of calibration plate 5, are had real-time, sensitive accurate
Feature.
Further, for convenience of the accurate adjustment of the position of microscope group 3, the focus that the utility model embodiment provides is visited
The detection means of side formula photoetching position of focal plane is surveyed, the driver 11 for being used to adjust the setting angle of microscope group 3 can also be included, driven
Dynamic device 11 can be controlled by controller 10, realize feedback regulation, sensitive accurate.
In addition, the detection means for the silicon chip photoetching position of focal plane that the utility model embodiment provides, in addition to use
In light caused by light source 1 to be reflexed to the speculum 2 in microscope group 3, it can so facilitate the placement of light source 1, and can increase
Light intensity.It is of course also possible to speculum 2 is not provided with, also within the scope of protection of the utility model.
On the basis of above-mentioned each embodiment, the silicon chip photoetching focal plane of the utility model embodiment offer
The detection means of position, controller 10 are specifically as follows computer, and it can both realize the calculating of the position of light focus 14, judge
The size for the light light intensity that detector 9 passes through through pin hole, can also accurate control platform shifter 12 and driver 11；In addition,
Driver 11 is specifically as follows piezoelectric ceramic actuator 11, and precision is higher, it is possible to achieve the precise vernier adjustment of microscope group 3.
In summary, the detection means of formula photoetching position of focal plane in focus detection side provided by the utility model, light source 1 are sent out
The light gone out is focused in calibration plate 5 by microscope group 3, and the light focus 14 focused in calibration plate 5 is scaled the reflection on plate 5
Layer is reflexed on dichroism mirror 4, is filtered and is reflected, and the particular light ray reflected through dichroism mirror 4 passes through convex lens 7 again
It is gathered at the pin hole of detection plate 8, is detected by detector 9, the intensity signal that detector 9 detects is handled by controller 10, control
Device 10 processed judges to detect whether light intensity is less than default light intensity, and controls whether driver 11 finely tunes to microscope group 3 according to judged result,
Positional information of the light focus 14 that other detector 9 detects in calibration plate 5 is handled by controller 10, and controller 10 calculates
Silicon chip 6 needs the distance of vertical shift, and drives the vertical shift of silicon chip 6 by control platform shifter 12.
The detection means of formula photoetching position of focal plane in focus detection side provided by the utility model has been carried out in detail above
It is thin to introduce.Specific case used herein is set forth to principle of the present utility model and embodiment, above example
Explanation be only intended to help and understand method and its core concept of the present utility model.It should be pointed out that for the art
For those of ordinary skill, on the premise of the utility model principle is not departed from, some change can also be carried out to the utility model
Enter and modify, these are improved and modification is also fallen into the protection domain of the utility model claims.
Claims (6)
1. a kind of detection means of focus detection side formula photoetching position of focal plane, it is characterised in that including light source, be located at silicon vertically
Piece side and the calibration plate vertical with the silicon chip, and be located between the light source and the calibration plate and be used for the light
Microscope group of the light focusing caused by source in the calibration plate, in addition to for detecting the calibration plate glazed thread focal position
Detector, and the controller for handling detectable signal is connected and is used for the detector.
2. detection means according to claim 1, it is characterised in that also include being controlled by the controller and for vertical
The platform shifter of the mobile silicon chip, the silicon wafer horizontal are arranged on the Z axis platform of the platform shifter.
3. detection means according to claim 1 or 2, it is characterised in that have in the plate face of the calibration plate and be used for instead
The reflecting layer of the light focus is penetrated, is provided tiltedly with the reflected light path of the light focus for filtering and reflecting specific light
The dichroism mirror of line, in addition to be located on the reflected light path of the dichroism mirror and in the convex lens for focusing on reflection light,
And it is located on the focal plane of the convex lens and is provided with the detection plate of pin hole, the detector in the focal point of the convex lens
It is located at after the detection plate and light intensity is detected by the pin hole.
4. detection means according to claim 3, it is characterised in that also include being connected with the controller and for adjusting
The driver of the setting angle of the microscope group.
5. detection means according to claim 4, it is characterised in that also include for light caused by the light source is anti-
The speculum being incident upon in the microscope group.
6. detection means according to claim 5, it is characterised in that the controller is computer, and the driver is
Piezoelectric ceramic actuator.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201720417210.XU CN206649283U (en) | 2017-04-19 | 2017-04-19 | A kind of detection means of focus detection side formula photoetching position of focal plane |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201720417210.XU CN206649283U (en) | 2017-04-19 | 2017-04-19 | A kind of detection means of focus detection side formula photoetching position of focal plane |
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| Publication Number | Publication Date |
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| CN206649283U true CN206649283U (en) | 2017-11-17 |
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201720417210.XU Withdrawn - After Issue CN206649283U (en) | 2017-04-19 | 2017-04-19 | A kind of detection means of focus detection side formula photoetching position of focal plane |
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN106842830A (en) * | 2017-04-19 | 2017-06-13 | 广东工业大学 | A kind of detection means and method of focus detection side formula photoetching position of focal plane |
-
2017
- 2017-04-19 CN CN201720417210.XU patent/CN206649283U/en not_active Withdrawn - After Issue
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN106842830A (en) * | 2017-04-19 | 2017-06-13 | 广东工业大学 | A kind of detection means and method of focus detection side formula photoetching position of focal plane |
| CN106842830B (en) * | 2017-04-19 | 2018-05-18 | 广东工业大学 | A kind of detection device and method of focus detection side formula photoetching position of focal plane |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| GR01 | Patent grant | ||
| GR01 | Patent grant | ||
| AV01 | Patent right actively abandoned |
Granted publication date: 20171117 Effective date of abandoning: 20180518 |
|
| AV01 | Patent right actively abandoned |