CN206622420U - Micro-fluidic chip plasma cleaner - Google Patents
Micro-fluidic chip plasma cleaner Download PDFInfo
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- CN206622420U CN206622420U CN201720271059.3U CN201720271059U CN206622420U CN 206622420 U CN206622420 U CN 206622420U CN 201720271059 U CN201720271059 U CN 201720271059U CN 206622420 U CN206622420 U CN 206622420U
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Abstract
This application discloses a kind of micro-fluidic chip plasma cleaner, including：Casing, the casing have a cleaning cabin, hatch are offered on the casing, and the hatch is sealed with cleaning hatch door, and transparent watch window is provided with the cleaning hatch door, and one end of the cleaning hatch door is rotationally connected with the casing；Plasma producing apparatus, it is arranged in the cleaning cabin；Vavuum pump, it is connected to the cleaning cabin；Control unit, including vacuum regulation stall, the vacuum regulation stall are arranged on the casing, and the vacuum controllable register is connected to the vavuum pump, and the vacuum regulation stall is adjustable in certain vacuum degree intervals linear.The micro-fluidic chip surface treatment intensity height of this new type washing machine processing, surface treatment success rate are high, while have the advantages of operation is quick, simple.
Description
Technical field
The application is related to a kind of plasma cleaner, more particularly to it is a kind of for micro-fluidic chip surface treatment grade from
Sub- cleaning machine.
Background technology
Plasma is the 4th state of a kind of state of material, also referred to as material, and is not belonging to common solid-liquid-gas tri-state.
The energy enough to gas application is allowed to ionization and become as plasmoid." activity " component of plasma includes:Ion, electricity
Son, atom, active group, the nucleic (metastable state) of excitation state, photon etc..Plasma cleans machine is exactly by using these activity
The property of component handles sample surfaces, the purpose of so as to realize cleaning, coating.
When plasma cleaner is used for micro-fluidic chip field, the chip surface after corona treatment exactly make use of
Characteristic changes, and after chip surface processing, is sexually revised available for chip bonding, chip surface infiltration.It is but existing etc.
The vacuum of Ion Cleaning machine, handling the progress of the parameters such as intensity needs, repeatedly the manual purge gas that adjusts passes in and out, to reach required
Vacuum, further, since the continuous entrance of gas, cause the chip surface of processing unstable.
Utility model content
The purpose of this utility model is to provide a kind of plasma cleaner of micro-fluidic chip surface treatment, can direct root
The parameters such as vacuum, processing time, cleaning strength are set according to demand, reach the purpose of the surface treatment to micro-fluidic chip.
To achieve the above object, the utility model provides following technical scheme：
The embodiment of the present application discloses a kind of micro-fluidic chip plasma cleaner, including：
Casing, the casing have a cleaning cabin, hatch are offered on the casing, and the hatch is sealed with cleaning cabin
Door, described clean on hatch door are provided with transparent watch window, and one end of the cleaning hatch door is rotationally connected with the casing；
Plasma producing apparatus, it is arranged in the cleaning cabin；
Vavuum pump, it is connected to the cleaning cabin；
Control unit, including vacuum regulation stall, the vacuum regulation stall are arranged on the casing, the vacuum
Degree controllable register is connected to the vavuum pump, and the vacuum regulation stall is adjustable in certain vacuum degree intervals linear.
Preferably, in above-mentioned micro-fluidic chip plasma cleaner, the adjustable range of the vacuum regulation stall
In 0.02~0.05MPa.
Preferably, in above-mentioned micro-fluidic chip plasma cleaner, described control unit also includes cleaning strength and adjusted
Save gear, the cleaning strength regulation stall is arranged on the casing, the cleaning strength regulation stall be connected to the grade from
Daughter generating means, the cleaning strength regulation stall include multiple gears, and each gear corresponds to the plasma hair respectively
Certain operating power range of generating apparatus.
Preferably, in above-mentioned micro-fluidic chip plasma cleaner, described control unit is also determined including processing time
When device, the processing time timer is arranged on the casing, and the processing time timer is connected to the plasma hair
Generating apparatus.
Preferably, in above-mentioned micro-fluidic chip plasma cleaner, the setting scope of the processing time timer
In 30~120s.
Preferably, in above-mentioned micro-fluidic chip plasma cleaner, cleaning switch, clear is additionally provided with the casing
Wash pause switch and total power switch.
Preferably, in above-mentioned micro-fluidic chip plasma cleaner, the back side of the casing is provided with fan mouth, electricity
Source line interface and vavuum pump connect gas port, and the vavuum pump is connected to the vavuum pump and connects gas port.
Compared with prior art, the utility model has the advantage of：The micro-fluidic chip surface of this new type washing machine processing
It is high to handle intensity height, surface treatment success rate, while there is the advantages of operation is quick, simple.
Brief description of the drawings
, below will be to embodiment or existing in order to illustrate more clearly of the embodiment of the present application or technical scheme of the prior art
There is the required accompanying drawing used in technology description to be briefly described, it should be apparent that, drawings in the following description are only this
Some embodiments described in application, for those of ordinary skill in the art, on the premise of not paying creative work,
Other accompanying drawings can also be obtained according to these accompanying drawings.
Fig. 1 show the positive dimensional structure diagram of cleaning machine in the utility model specific embodiment；
Fig. 2 show the dimensional structure diagram of cleaning machine reverse side in the utility model specific embodiment.
Embodiment
Present embodiment discloses a kind of plasma cleaner, is surface-treated by plasma yield and micro-fluidic chip
The quantitative relationship of effect is provided with cleaning strength regulation stall, while is easy to there is provided vacuum regulation stall quickly to set vacuum
Degree, it is surface-treated for micro-fluidic chip.
Below in conjunction with the accompanying drawing in the utility model embodiment, the technical scheme in the embodiment of the utility model is carried out
Detailed description, it is clear that described embodiment is only the utility model part of the embodiment, rather than whole implementation
Example.Based on the embodiment in the utility model, those of ordinary skill in the art institute on the premise of creative work is not made
The every other embodiment obtained, belong to the scope of the utility model protection.
With reference to shown in Fig. 1 and Fig. 2, micro-fluidic chip plasma cleaner includes casing 1, plasma producing apparatus, true
Empty pump and control unit.
Casing 1 has a cleaning cabin 2, and hatch is offered on casing 1, and the hatch is sealed with cleaning hatch door 3, cleans cabin
Transparent watch window 4 is provided with door 3, one end of cleaning hatch door 3 is rotationally connected with casing 1.Plasma producing apparatus
It is arranged in cleaning cabin 2.Vavuum pump is connected to cleaning cabin 2.Control unit includes vacuum regulation stall 5, and this is true
Reciprocal of duty cycle regulation stall 5 is arranged on casing 1, and vacuum controllable register is connected to vavuum pump, and vacuum regulation stall 5 is certain true
Reciprocal of duty cycle intervals linear is adjustable.
In the technical scheme, plasma cleaner is surface-treated for micro-fluidic chip, is to use energy conversion technique, with
Gas converts electrical energy into the high plasma of activity, in certain bar as cleansing medium under certain vacuum subnormal ambient
Under part sample surfaces characteristic is changed, sample surfaces characteristic changing includes adhesiveness, compatibility, wellability.Plasma
Plasma caused by cleaning machine is caused the change of molecular structure, realized to sample surfaces by soft brush solid sample surface
Modification.Vacuum regulation stall 5 can directly set vacuum needed for cleaning.
Preferably, the adjustable range of vacuum regulation stall 5 is in 0.02~0.05MPa.
Further, control unit also includes cleaning strength regulation stall 6, and the cleaning strength regulation stall 6 is arranged at case
On body 1, cleaning strength regulation stall 6 is connected to plasma producing apparatus, and cleaning strength regulation stall 6 includes multiple gears,
Each gear corresponds to certain operating power range of plasma producing apparatus respectively.
In the technical scheme, cleaning strength regulation stall can directly be adjusted to optimal gear and be cleaned, cleaning strength gear
Determined by the quantitative relationship of plasma yield and surface treatment effect.
In a preferred embodiment, cleaning strength gear is provided with I grade, II grade, III grade, can meet different chip surfaces
Handle the demand to intensity.
Further, control unit also includes processing time timer 7, and the processing time timer 7 is arranged at casing 1
On, processing time timer 7 is connected to plasma producing apparatus.
Preferably, the setting scope of processing time timer is in 30~120s.
In the technical scheme, processing time timer is setting the plasma clean time.
In this case, vacuum, processing time, cleaning strength are the empirical values according to micro-fluidic chip surface treatment effect.
Further, cleaning switch 8, cleaning pause switch 9 and total power switch 10 are additionally provided with casing 1.
Further, the back side of casing 1 is provided with fan mouth 11, electric source line interface 12 and vavuum pump and connects gas port 13, vacuum
Pump is connected to vavuum pump and connects gas port 13.
Further, control unit also includes vacuum, processing timing, the display device of cleaning strength.
The process on plasma cleaner processing micro-fluidic chip surface is as follows：
(1), plasma cleaner is placed on firm levels operation platform, should ensure that plasma cleaner is in steady shape
State；Instrument preoperation inspection ensures that all junctions are air tight；Before cleaning sample, the sky that 10~15min does not place sample is carried out
Cleaning, ensure the ultra-clean of cleaning cabin.
(2) total power switch, is opened, instrument preheating 5-15min, whether correct inspection connects everywhere；
(3), micro-fluidic chip is put into cleaning cabin in order, it is impossible to overlapping placement, between keeping certain between object
Gap, shut hatch door；
(4) vavuum pump, is opened, vacuum regulation stall is set to 300~500pa, it is corresponding that processing time 6s is set；
(5) cleaning switch, is opened, cleaning strength gear is set, chromatic colour aura now can be observed by cleaning hatch door
Occur, show that plasma produces.
(6), when treated between be zeroed after, instrument connects the automatic exhaust decompression of gas port by vavuum pump, opens hatch door, processing knot
Beam.
It should be noted that herein, such as first and second or the like relational terms are used merely to a reality
Body or operation make a distinction with another entity or operation, and not necessarily require or imply and deposited between these entities or operation
In any this actual relation or order.Moreover, term " comprising ", "comprising" or its any other variant are intended to
Nonexcludability includes, so that process, method, article or equipment including a series of elements not only will including those
Element, but also the other element including being not expressly set out, or it is this process, method, article or equipment also to include
Intrinsic key element.In the absence of more restrictions, the key element limited by sentence "including a ...", it is not excluded that
Other identical element also be present in process, method, article or equipment including the key element.
Described above is only the embodiment of the application, it is noted that for the ordinary skill people of the art
For member, on the premise of the application principle is not departed from, some improvements and modifications can also be made, these improvements and modifications also should
It is considered as the protection domain of the application.
Claims (7)
- A kind of 1. micro-fluidic chip plasma cleaner, it is characterised in that including：Casing, the casing have a cleaning cabin, offer hatch on the casing, the hatch is sealed with cleaning hatch door, institute State and transparent watch window is provided with cleaning hatch door, one end of the cleaning hatch door is rotationally connected with the casing；Plasma producing apparatus, it is arranged in the cleaning cabin；Vavuum pump, it is connected to the cleaning cabin；Control unit, including vacuum regulation stall, the vacuum regulation stall are arranged on the casing, and the vacuum is adjusted Section baffle plate is connected to the vavuum pump, and the vacuum regulation stall is adjustable in certain vacuum degree intervals linear.
- 2. micro-fluidic chip plasma cleaner according to claim 1, it is characterised in that：The vacuum regulation stall Adjustable range in 0.02~0.05MPa.
- 3. micro-fluidic chip plasma cleaner according to claim 1, it is characterised in that：Described control unit also includes Cleaning strength regulation stall, the cleaning strength regulation stall are arranged on the casing, the cleaning strength regulation stall connection In the plasma producing apparatus, the cleaning strength regulation stall includes multiple gears, and each gear corresponds to described respectively Certain operating power range of plasma producing apparatus.
- 4. micro-fluidic chip plasma cleaner according to claim 1, it is characterised in that：Described control unit also includes Processing time timer, the processing time timer are arranged on the casing, and the processing time timer is connected to described Plasma producing apparatus.
- 5. micro-fluidic chip plasma cleaner according to claim 4, it is characterised in that：The processing time timer Setting scope in 30~120s.
- 6. micro-fluidic chip plasma cleaner according to claim 1, it is characterised in that：It is additionally provided with the casing Cleaning switch, cleaning pause switch and total power switch.
- 7. micro-fluidic chip plasma cleaner according to claim 1, it is characterised in that：The back side of the casing is set There are fan mouth, electric source line interface and vavuum pump to connect gas port, the vavuum pump is connected to the vavuum pump and connects gas port.
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2017200065005 | 2017-01-04 | ||
| CN201720006500 | 2017-01-04 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN206622420U true CN206622420U (en) | 2017-11-10 |
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ID=60208208
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201720271059.3U Active CN206622420U (en) | 2017-01-04 | 2017-03-20 | Micro-fluidic chip plasma cleaner |
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Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN108080045A (en) * | 2017-12-27 | 2018-05-29 | 北京百奥芯科技有限公司 | A kind of hydrophilically modified method of fluid channel inside micro-fluidic chip |
| CN109174788A (en) * | 2018-08-19 | 2019-01-11 | 清华大学 | Microballoon cleans chip and the microballoon cleaning device comprising it |
-
2017
- 2017-03-20 CN CN201720271059.3U patent/CN206622420U/en active Active
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN108080045A (en) * | 2017-12-27 | 2018-05-29 | 北京百奥芯科技有限公司 | A kind of hydrophilically modified method of fluid channel inside micro-fluidic chip |
| CN109174788A (en) * | 2018-08-19 | 2019-01-11 | 清华大学 | Microballoon cleans chip and the microballoon cleaning device comprising it |
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