CN206471344U - Device for handling the substrate used in solar cell manufacture - Google Patents

Abstract

A kind of device (100) for being used to handle the substrate (10) used in solar cell manufacture is provided.Described device (100) includes：Component (110) is checked, it is described to check the first size that component is configured as detecting the first line pattern (13) on first substrate；Processing equipment (120), the processing equipment is configured as above the first line pattern (13) providing the second line pattern (14), to form the line pattern (12) of combination, wherein described check the second size that component (110) is additionally configured to detect the line pattern (12) of the combination；And aligning equipment (130), the aligning equipment is configured as being directed at least one of the processing equipment (120) and second substrate based on the first size and second size.

Description

Device for handling the substrate used in solar cell manufacture

Technical field

Embodiment of the present disclosure is related to a kind of device for being used to handle the substrate used in solar cell manufacture.This Disclosed embodiment is particularly used for depositing a material to (such as sun on the substrate used in solar cell manufacture Can battery line pattern or the dual printing of printed traces (for example, fingers and/or bus)) device.

Background technology

Solar cell is photovoltaic (PV) device that sunlight is directly changed into electric energy.In this area, it is known that Solar cell is produced on substrate (such as crystallizing silicon substrate layer) using deposition technique (such as silk-screen printing), so that in the sun The structure of conducting wire pattern is realized on one or more surfaces of energy battery.Line pattern can be then with multiple depositing operation shapes Into.For the quality of manufactured solar cell, the line pattern deposited during depositing operation should be relative to each other Alignment.For example, line pattern is such as exported relative to each other on that will definitely influence the electrical characteristics of manufactured solar cell Power.

In view of at least some problems in the above, the problem of overcoming this area, for handling in solar cell system It is beneficial to make the new equipment of the middle substrate used.The disclosure be intended in particular for offer one kind allow improve line pattern relative to The device of mutual alignment.

Utility model content

In view of there is provided a kind of device for being used to handle the substrate used in solar cell manufacture for the above.This public affairs Further aspect, benefit and the feature opened are apparent from claims, specification and drawings.

According to an aspect of this disclosure, to be used to handle the substrate that uses in solar cell manufacture (all there is provided a kind of Such as first substrate and second substrate) device.Described device includes：Component is checked, the inspection component is configured as detection the The first size of first line pattern on one substrate；Processing equipment, the processing equipment is configured as in the first line The second line pattern is provided above pattern, to form the line pattern of combination, wherein the inspection component is additionally configured to detection Second size of the line pattern of the combination；And aligning equipment, the aligning equipment be configured as be based on first chi The processing equipment and/or the second substrate are aligned by very little and described second size.

Brief description of the drawings

Therefore, in order to mode, the sheet summarized above used in the features described above structure of the disclosure is understood in detail Disclosed more specifically description may be referred to embodiment and draw.Accompanying drawing is related to embodiment of the present disclosure, and is described as follows：

Fig. 1 shows the dress for being used to handle the substrate used in solar cell manufacture according to embodiment described herein The schematic diagram put；

Fig. 2 shows the top view of the solar cell of the line pattern with combination according to embodiment described herein；

Fig. 3 shows the cross-sectional view of Fig. 2 solar cell；

Fig. 4 A to Fig. 4 C show to be used for what processing was used in solar cell manufacture according to embodiment described herein The programme of work of the device of substrate；

Fig. 5 A to Fig. 5 C show the first size and second of the line pattern on the substrate according to embodiment described herein The example of size；And

Fig. 6 shows the system for manufacture of solar cells according to embodiment described herein.

Embodiment

With detailed reference to the various embodiments of the disclosure, one or more examples of these embodiments show in the accompanying drawings Go out.In the following description to accompanying drawing, same reference numerals refer to same parts.In general, only describe relative to independent The difference of embodiment.Each example is provided for explaining present disclosure, rather than means limitation of this disclosure.In addition, Illustrate or be described as an embodiment part feature can be used for other embodiment or combined with other embodiment with Produce another embodiment.This means description includes such modifications and variations.

In solar cell manufacture, line pattern can be provided then (for example, printing) for example in silk-screen printing technique In over each other.For the quality of the solar cell manufactured, line pattern should be aligned relative to each other.For example, Line pattern is relative to each other on that will definitely influence the electrical characteristics of manufactured solar cell, such as power output.

The device of the disclosure performs to the duplication check for providing the line pattern on substrate to make to provide in follow-up base Line pattern alignment on plate.Specifically, detection first size, the first width of all patterns of first line as described, and (for example, deposition) second line pattern is then provided on first line pattern.Then, the second of the line pattern of detection combination Size (such as the second width).The information obtained from first size and the second size can be used in processing equipment and/or subsequent substrate To be aligned.For example, first size and the second size can be compared, and the second line map can be learnt from comparing Dislocation of the case relative to first line pattern.Executable being aligned so that for second substrate correction dislocation to subsequent substrate. Specifically, the alignment of another first line pattern and/or another second line pattern in subsequent substrate can be improved.

Fig. 1 shows the substrate 10 that processing is used in solar cell manufacture that is used for according to embodiment described herein The schematic diagram of the device 100 of (such as first substrate and second substrate).Can be tinuous production road according to the device 100 of the disclosure A part, and be configurable to manufacture solar cell.

Device 100 includes：Component 110 is checked, the inspection component is configured as detection (or determine or measure) first base The first size of first line pattern on plate；Processing equipment, such as depositing device 120, the processing equipment are configured as (for example, on first line pattern) is provided or the second line pattern of deposition above first line pattern, to form combination Line pattern, wherein checking that component 110 is also configured to the second size of the line pattern of detection (or determine or measure) combination； And aligning equipment 130, the aligning equipment is configured as based on first size and the second size come by processing equipment (or place A part for equipment is managed, for example, technique head (process head) and/or silk screen) and/or second substrate alignment.Second substrate It is the substrate post-processed in first substrate.Term " size " can synonymously be used with such as " ductility (extension) ".

Description uses depositing device 120 as processing equipment below.However, the disclosure is not restricted to this, and handle Equipment, which can be selected from, includes the group of the following：Print head, the print head for being arranged to silk-screen printing, ink-jet printer, Laser equipment, and any combination of them.For example, device 100, and specifically, processing equipment is configurable to double Reprint brush, multiple print, ink jet printing and/or laser grooving and scribing.

In some implementations, first size and the second size can be compared, and second can be learnt from comparing Dislocation of the line pattern relative to first line pattern.First size and the second size may correspond to each other, so as to carry out Compare.For example, both first size and the second size can be the width and/or length of respective lines pattern.In some realities In existing mode, when the second size is more than first size, it may be determined that dislocation.When first size is basic substantially with the second size When upper equal, it can be assumed that the alignment of basic perfect.If it is determined that dislocation, then the executable second substrate as subsequent substrate Alignment come cause for second substrate correct dislocation.Can more accurately it perform for forming first line pattern and/or the The technique (such as depositing operation and/or laser scribing process) of two line patterns.Specifically, embodiment of the present disclosure can be with Perform closed-loop control.

The line pattern of combination can form the conducting wire of solar cell, such as fingers and/or bus.Citing comes Say, first line pattern and the second line pattern can deposit (for example, printing) in over each other in dual typography, with Just the fingers of solar cell are formed.The exemplary solar cell of line pattern with the combination is shown in figs. 2 and 3 Go out.

In the example shown in figure 1, device 100 include turntable 140, turntable 140 can be rotated around rotation axis 142 so as to At least checking moving substrate 10 between component 110 and processing equipment (such as depositing device 120).However, the disclosure is not limited In this, and transmission equipment (such as linear transfer equipment) in addition to turntable 140 can be used at least checking component 110 and place Manage transmission base plate 10 between equipment.According to some embodiments, check that component 110 may include among inspection post, or be used as inspection Look into station.Processing equipment may include among treating stations (such as deposition station, printing station or laser grooving and scribing station).

In some implementations, substrate 10 is positioned at substrate support (such as moveable substrate support (" cunning Shuttle ")) on, the substrate support is attached to turntable 140.In other implementations, turntable 140 has substrate support. For example, turntable 140 can be provided can place the support surface of substrate 10 thereon.

According to can be with some embodiments that other embodiment described herein is combined, processing equipment be configured as using In silk-screen printing.Specifically, processing equipment can be print head, and device 100 is configurable to dual printing or more weight Printing, such as triple printings.In some implementations, processing equipment may include silk screen and with for example, at least one wiping The printing equipment of knife (squeegee) and at least one optional flood bar (floodbar).Silk screen can include net, printing and cover At least one of mould, piece, sheet metal, plastic sheet, plate, metallic plate and plastic plate.In some implementations, silk screen restriction pair Ying Yu will print the silk-screen patterns or feature of structure on the substrate 10, wherein silk-screen patterns or feature may include hole, slit, At least one of otch or other holes.In some embodiments, printing equipment (such as doctor) contact silk screen, wherein Printing equipment is compeled to pass the material through silk screen, is specifically printed onto through hole on substrate 10, so as to limit such as first line figure Case and/or the second line pattern.

According to some embodiments that can be combined with other embodiment described herein, check component 110 include one or Multiple cameras, one or more described cameras are configured as detection first size and the second size.In some implementations, one or Multiple cameras can be high resolution camera.According to some embodiments, first size and/or the second size can be stored in one or In multiple cameras, such as further handling.For example, the second size can be with being previously stored in magazine first Size is compared.

In some implementations, one or more at least one magazine cameras can be matrix camera.For example, one Or at least one multiple magazine camera and specifically each camera, can have 1,000,000 pixels or higher resolution ratio, And can especially have 2,000,000 pixels or higher resolution ratio.One or more cameras can have per 30 microns or smaller of pixel Resolution ratio, the particularly resolution ratio per 20 microns or smaller of pixel, and the resolution ratio more particularly per 10 microns or smaller of pixel. One or more cameras may include single camera (such as one matrix camera) or camera system (such as multiple matrix cameras).Citing For, one or more cameras can be 2 cameras, 3 cameras or 4 cameras.In some implementations, first size and/or Second size the pixel on the predetermined direction of the respective lines in line pattern can be shown detecting by counting (or determine or Measurement).

In some implementations, one or more cameras include one or more first cameras and one or more second cameras, One or more described first cameras are configured as detecting first size, and one or more described second cameras are configured as detection second Size.In other words, first size and the second size can be used different cameral to detect.For example, check that component 110 can have There are at least two sub-components, at least two sub-component is for example provided at the diverse location of turntable 140.Specifically, A sub-component (such as one or more first cameras) in two sub-components may be provided in " entrance " of turntable 140 or " enter Entering " position (represents) place with digital " 1 " in figure 6.Another sub-component (such as one or more second phases in two sub-components Machine) " outlet " or " leaving " position for may be provided in turntable 140 (represents) place with digital " 3 " in figure 6.In some realizations In mode, one or more second cameras can be high resolution camera, such as APPVS (" senior print after-vision system ").

In further implementation, one or more cameras are configured as detecting both first size and the second size. In other words, first size and the second size are by identical camera calibration.For example, first size and the second size can be in bases Plate 10 is detected when being in substantially the same position.For example, first line pattern may be provided on substrate 10 and At the position of processing equipment.Then, turntable 140 is rotatable so that substrate 10 is moved into inspection component 110, to detect First size.Turntable 140 it is rotatable with by substrate 10 from checking that component 110 is moved to same treatment equipment or another processing is set It is standby, to provide the second line pattern on first line pattern.For example, first line pattern and the second line pattern can Using same deposition equipment and be specifically deposited using identical silk screen.Then, substrate 10 can by revolving-turret 140 come Inspection component 110 is moved back to, to detect the second size.

According to some embodiments that can be combined with other embodiment described herein, aligning equipment 130 is configured as Positioning changes processing equipment or the orientation of the part of processing equipment and/or substrate 10 (such as first substrate and second substrate). For example, aligning equipment 130 can come substrate 10 relative to processing equipment (for example, relative to printing equipment and/or silk screen) Positioning.Additionally or alternatively, aligning equipment 130 can by least a portion of processing equipment (such as printing equipment (technique head) and/ Or silk screen) positioned relative to substrate 10.

In some implementations, substrate 10 is positioned at substrate support (such as moveable substrate support (" cunning Shuttle ")) on, the substrate support is attached to turntable 140.Substrate 10 can be used substrate support to be aligned.Specifically, Aligning equipment 130 can be configured to alignment substrate support, so that the substrate 10 that will be located into thereon is aligned.Aligning equipment 130 can It is included among substrate support.In further embodiment, aligning equipment 130 may be provided on turntable 140, or bag Include among the turntable.

According to some implementations, aligning equipment 130 is configured as positioning in the x-direction and the z-direction or registration process is set Standby and/or substrate 10 (such as second substrate), and/or be configured as the angle orientation of processing equipment and/or substrate 10 being adjusted to Such as target orientation.X-direction and Y-direction can be the X-direction and Y-direction of cartesian coordinate system, and can specifically defined level Face.Angle orientation can refer to substrate 10, substrate support (for example, supporting the support surface of the substrate 10) and/or depositing device 120 The angle orientation of (for example, silk screen).For example, angle orientation may be defined as the first reference line at substrate 10 or substrate support Angle (for example, θ) between second reference line at road and target (such as depositing device 120) place.

According to some embodiments that can be combined with other embodiment described herein, aligning equipment 130 is configured as At least one of X corrected values, Y corrected values and angle corrected value are calculated by processing equipment and/or (such as the second base of substrate 10 Plate) alignment.For example, aligning equipment 130 is configured as first size and the second size being compared, and is based on comparing As a result at least one of X corrected values, Y corrected values and angle corrected value is calculated to be directed at second substrate.

In some embodiments, aligning equipment 130 is configured as providing (for example, deposition or print) the on the substrate 10 Before one line pattern, in adjustment processing equipment or the part and/or the position of substrate 10 of processing equipment and angle orientation at least One.By performing adjustment before forming first line pattern on substrate, first line pattern can be aligned relative to substrate 10. The quality of solar cell produced by can improving.

According to can check that component 110 is configured with some embodiments that other embodiment described herein is combined For for closed-loop control or feedback control.It is orientated, can be improved in subsequent substrate by the position and/or angle that adjust subsequent substrate Line pattern positional accuracy.

According to some embodiments, aligning equipment 130 may include be used for for example in the horizontal plane by processing equipment (for example, Technique head and/or silk screen) and/or the position of substrate 10 and/or angle orientation alignment one or more actuators.One or more actuatings Device can include stepper motor, pneumatic motor and/or servomotor.For example, aligning equipment 130 may include three actuatings Device.First actuator is provided to for example move in the X direction using substrate support or localization process equipment or processing The part of equipment and/or substrate 10.Second actuator be provided to for example move in the Y direction using substrate support or The part and/or substrate 10 of localization process equipment or processing equipment.3rd actuator is provided to for example using substrate branch Support member be angularly displaced from or localization process equipment or processing equipment part and/or substrate 10.In some implementations, One actuator and the second actuator can be linear actuators, and/or the 3rd actuator can be revolving actuator.

In some implementations, check component 110 be additionally configured to the first line pattern on substrate 10 and/or Second line pattern carries out quality inspection.For example, check that the image or number obtained by one or more cameras can be used in component 110 According to come on substrate 10 line pattern carry out quality inspection.In other words, check that component 110 can be used for multiple tasks, be such as aligned And quality inspection.

Fig. 2 and Fig. 3 show the solar cell of the line pattern 12 with combination according to embodiment described herein.Figure 2 show the top view of solar cell, and Fig. 3 shows the side view of solar cell.Fig. 2 and Fig. 3 are exemplarily illustrated too The fingers of positive energy battery.However, the disclosure is not restricted to this, and the disclosure can be used for the All other routes figure of solar cell Case, such as bus or score line.

Solar cell includes substrate 10, and substrate 10, which has, provides (for example, deposition) in the line pattern of combination thereon 12.The line pattern 12 of combination includes the line pattern 14 of first line pattern 13 and second, or by first line pattern 13 and the Two line patterns 14 are constituted.The line pattern 14 of first line pattern 13 and second can be for example in dual typography or laser grooving and scribing (for example, printing or laser grooving and scribing) is provided in technique in over each other.First line pattern 13 may be directly deposited on substrate 10 And/or second line pattern 14 can be directly printed on first line pattern 13.For printing first line pattern 13 and second The printing material of line pattern 14 may include silver or be silver.According to some realities that can be combined with other embodiment described herein Mode is applied, printing material may be selected from including the group of the following：Silver, aluminium, copper, tin, nickel, silicon substrate cream paste, and theirs are any Combination.

When referring to term " in ... top ", such as the second line pattern 14 should be managed in the top of first line pattern 13 Solution, from substrate 10, first line pattern 13 is provided at the top of substrate 10, and the provided after first line pattern 13 Therefore two line patterns 14 are above first line pattern 13 and square on the substrate 10.In other words, term " ... on Side " is used to limit line pattern order, and wherein starting point is exactly substrate 10.Above and below this does not consider whether solar cell is depicted as It is inverted.

Fig. 4 A to Fig. 4 C show to be used for what processing was used in solar cell manufacture according to embodiment described herein The programme of work of the device of substrate.Described device is configurable for dual printing, multiple print (for example, triple printings), swashed Photoetching is drawn or any combination of them.For example, first line pattern can be formed by laser grooving and scribing, and the second circuit Pattern can be formed by deposition technique (such as silk-screen printing).

Described device is arranged to detect the first size of the first line pattern on first substrate, by the second line map Case provides (for example, deposition) above first line pattern to form the line pattern of combination, the line pattern of detection combination The second size, and based on first size and the second size registration process equipment and/or second substrate.The alignment of second substrate It can perform as described with regard to FIG. 1.

According to some embodiments that can be combined with other embodiment described herein, described device can be configured to too It is positive above-mentioned programme of work to be performed with pre-determined number during battery production, such as once a day or shorter time once, it is and special Be not per hour once or shorter time once.In other words, according to some embodiments, not to each produced sun Energy battery performs the closed-loop control that the disclosure is provided.On the contrary, closed-loop control can regular or irregular time interval perform, with Just alignment is improved without reducing the yield of manufacture of solar cells system.

According to some embodiments that can be combined with other embodiment described herein, to processing equipment and/or second The alignment of substrate is included on second substrate before providing (for example, deposition) another first line pattern, based on first substrate Processing equipment and/or second substrate are aligned by first size and the second size.Additionally or alternatively, according to can with it is described herein Some embodiments that other embodiment is combined, the alignment of processing equipment and/or second substrate is included on second substrate Another first line pattern on or before its top provides (for example, deposition) another second line pattern, based on first substrate First size and the second size processing equipment and/or second substrate are aligned.

In some implementations, first size and the second size are compared by described device, and are based on comparing knot Fruit calculates at least one of X corrected values, Y corrected values and angle corrected value, and processing equipment and/or second substrate are aligned.

According to some embodiments that can be combined with other embodiment described herein, first size and the second size Compare relative amplification of the line pattern relative to first line pattern including determining combination.For example, it may be determined that second How much bigger size is than first size.Performed to will definitely relatively amplify based on determined by.For example, can calculate X corrected values, At least one of Y corrected values and angle corrected value compensate the line pattern of combination on the second substrate as subsequent substrate Relative amplification.

In Figure 4 A, substrate 10 is positioned at inspection component 110, to detect first size.In figure 4b, turntable 140 Rotate substrate 10 being moved to processing equipment, such as depositing device 120, so as in first line pattern from inspection component 110 The second line pattern of upper offer.As shown in Figure 4 C, then, substrate 10 can move back to inspection component by revolving-turret 140 110, to detect the second size.

Fig. 5 A to Fig. 5 C show to be arranged on (such as first substrate and/or of substrate 10 according to embodiment described herein Two substrates) on line pattern first size and the second size.

According to some embodiments that can be combined with other embodiment described herein, the first chi of first line pattern The width and/or length of such as one or more independent circuits in the very little pattern including first line.For example, first line figure The first size of case is the width or length of for example independent circuit in first line pattern.Second chi of the line pattern of combination The width and/or length of for example independent circuit in the very little line pattern that may include combination.For example, the line pattern of combination The second size be combination line pattern in for example independent circuit width or length.Line pattern width is alternatively referred to as " line width ".Independent circuit in line pattern and specifically line pattern, can have previously mentioned length and width Degree.In some implementations, the length of line pattern and specifically independent circuit is arranged essentially parallel to the processing equipment Handle direction (for example, print direction), and the width of line pattern is substantially perpendicular to processing direction.

In some implementations, the width of first line pattern and/or the line pattern of combination can for mean breadth or Breadth Maximum.Mean breadth can be determined relative to the length of respective lines pattern.For example, can be in circuit pattern length 50% or more, 75% or more, determine mean breadth on 90% or more, or 100%.Specifically, can be in respective lines Mean breadth is determined in the basic whole length of pattern (such as first line pattern and the line pattern of combination).

In some implementations, the length of first line pattern and/or the line pattern of combination can for average length or Maximum length.Average length can be determined relative to respective lines pattern width (such as mean breadth or Breadth Maximum).Citing For, it can be determined on basic whole respective lines pattern (such as first line pattern and the line pattern of combination) average long Degree.

According to some embodiments that can be combined with other embodiment described herein, first line pattern, the second line The width of at least one of road pattern and the line pattern of combination can be 100 microns or smaller, particularly 80 microns or smaller, spy It is not 60 microns or smaller, and more particularly 40 microns or smaller.By first line pattern and being superimposed upon first line pattern On the thickness of line pattern of combination of the second line pattern formation can be for 15 microns or bigger, particularly 20 microns or more Greatly, and more particularly 30 microns or bigger.

According to some embodiments that can be combined with other embodiment described herein, first size is to be directed to First Line What one or more circuits in the pattern of road were detected.One or more circuits that second size can be directed in the second line pattern enter Row detection.For example, first size and/or the second size can be in the presumptive areas (for example, detection zone) on substrate One or more circuits existed are determined.It is used to detect first size and the second size if more than a circuit, then just The size of each independent circuit of more than one circuit in detectable line pattern.First size and/or the second size can determine The average value of the size of each of adopted each circuit in for example corresponding line pattern.

With reference to Fig. 5 A, first line pattern 510 has width w1 and length l1.Second line pattern 520 has width w2 With length l2.The line pattern 520 of first line pattern 510 and second is angled with respect to each other.In other words, first line pattern 510 and second line pattern 520 misplace relative to each other.The width tw1 of the line pattern of combination may be defined as the line in combination The Breadth Maximum of the line pattern of combination on the width of road pattern or maximum ductility.The length of the line pattern of combination Tl1 may be defined as the maximum length or maximum ductility of the line pattern of the combination on the length direction of the line pattern of combination.

With reference to Fig. 5 B, first line pattern 610 has width w1 and length l1.Second line pattern 620 has width w2 With length l2.The line pattern 620 of first line pattern 610 and second is offset relative to each other in the direction of the width.Combination The width tw2 of line pattern may be defined as the line pattern Breadth Maximum in the direction of the width or maximum ductility of combination.Group The length tl2 of the line pattern of conjunction may be defined as the maximum length or maximum ductility of the line pattern of combination in the longitudinal direction.

With reference to Fig. 5 C, first line pattern 710 has width w1 and length l1.Second line pattern 720 has width w2 With length l2.The line pattern 720 of first line pattern 710 and second is inclined relative to each other on width and length direction Move.The width tw3 of the line pattern of combination may be defined as the line pattern Breadth Maximum in the direction of the width or most of combination Big ductility.The length tl3 of the line pattern of combination may be defined as combination line pattern maximum length in the longitudinal direction or Maximum ductility.

Information on the dislocation of the line pattern shown in such as Fig. 5 A to Fig. 5 C, which can be used for improving, to be provided (for example, heavy Product is printed) alignment of line pattern in subsequent substrate.Specifically, it is executable to be aligned to provide in subsequent substrate On first line pattern and the second line pattern be basically identical.

Fig. 6 shows the system for manufacture of solar cells according to embodiment described herein.

According to embodiment described herein, the system includes transporting equipment (such as turntable 1000), the and of processing equipment 910 Check component 920.According to some embodiments, the system includes input equipment 3100 and output equipment 3200, the input Equipment 3100 is arranged to substrate 10 being sent to turntable 1000, and the output equipment 3200 is arranged to from turntable 1000 Place receives and is printed with first line pattern and the second line pattern on substrate 10, the substrate.

As illustrated, input equipment 3100 can have input type conveying device.Input type conveying device can have one or more Individual first conveyer belt.For example, input type conveying device may include abreast to be arranged between 5cm and 15cm for example apart Two the first conveyer belts 3150 of distance.Output equipment 3200 can be configured to reception substrate 10, the substrate at turntable 1000 On be printed with first line pattern and the second line pattern.Output equipment 3200 can have output type conveying device.Output type Conveying device can have one or more second conveyer belts.For example, output type conveying device can include abreast being arranged to example Such as two the second conveyer belts 3250 of the distance apart between 5cm and 15cm.Input equipment 3100 and output equipment 3200 can be automated substrate haulage equipment, and it is the larger part for producing circuit.

The system is included according to the device of the disclosure, and specifically processing equipment 910 (processing equipment can be print Brush equipment (for example, being arranged to carry out silk-screen printing on the substrate 10)), check component 920 and aligning equipment (not shown). Processing equipment 910 can extend in the top of turntable 1000.First line pattern is provided and/or the second line pattern can be 10 in substrate Completed when at processing position 2.

Turntable 1000 can rotate around rotation axis 1050.For example, turntable 1000, which can be configured to, can surround rotary shaft Line 1050 rotates at least between substrate receiving position 1 and processing position 2.According to embodiment, turntable 1000 is configured as can Revolved between substrate receiving position 1, processing position 2, and at least one of substrate drain position 3 and substrate emptying position 4 Turn.

Turntable 1000 is configured as along the track (for example, around rotation axis 1050) limited by the rotary motion of turntable Rotation and transport substrate 10.Turntable 1000 is rotatable to cause the substrate branch for being positioned on turntable 1000 or being attached to turntable 1000 Substrate 10 in support member (for example, moveable substrate support or shuttle) is moved according to rotation clockwise or counterclockwise It is dynamic.Turntable 1000 can be configured as accelerating to maximum rotative speed, mobile deceleration is stopped turntable 1000 again.

In some implementations, the anglec of rotation between adjacent position (such as substrate receiving position 1 and processing position 2) It can be about 90 °.For example, 1000 rotatable 90 ° of turntable, so as to which substrate 10 is moved into processing from substrate receiving position 1 Position 2.Equally, 1000 rotatable 90 ° of turntable, so as to which substrate 10 is moved into substrate exhaust position 3 from processing position 2.

Although Fig. 6 shows processing equipment 910 in processing position 2 and checks component 920 in substrate receiving position 1, It should be appreciated that the disclosure is not restricted to this, and processing equipment 910 and/or inspection component 920 are provided in such as turntable 1000 At diverse location.

The device of the disclosure is configured as performing the duplication check to providing the line pattern on substrate, to make to provide Line pattern alignment in subsequent substrate.Specifically, (such as first is wide for the first size of the detection first line pattern Degree), and (for example, deposition) second line pattern is then provided on first line pattern.Then, the line map of detection combination The second size (such as the second width) of case.Processing equipment and/or subsequent substrate can be used to be obtained from first size and the second size The information obtained is aligned.For example, first size and the second size can be compared, and first can be learnt from comparing Dislocation of the line pattern relative to first line pattern.Executable subsequent substrate alignment is wrong for second substrate correction to cause Position.Specifically, pair of another first line pattern and/or another second line pattern in subsequent substrate can be improved It is accurate.In addition, in some embodiments, without using APPVS (only used built-in camera (in-camera)).To dual print For brush and multiple print, different silk screens are not necessarily.In addition, the alignment issues produced by screen warpage can be minimized.

Although the above be directed to embodiment of the present disclosure, also can the base region for not departing from the disclosure feelings Other and further embodiment of the disclosure are designed under condition, and the scope of the present disclosure is determined by appended claims.

Claims (14)

1. a kind of device for being used to handle the substrate used in solar cell manufacture, described device includes：

Component is checked, the inspection component is configured as detecting the first size of the first line pattern on first substrate；

Processing equipment, the processing equipment is configured as providing the second line pattern above the first line pattern, so as to The line pattern of combination is formed, wherein described check the second size that component is additionally configured to detect the line pattern of the combination； And

Aligning equipment, the aligning equipment is configured as setting the processing based on the first size and second size The alignment of at least one of standby and second substrate.

2. device according to claim 1, it is characterised in that the first size of the first line pattern includes institute State at least one of the width of first line pattern and the length of the first line pattern, and the line of wherein described combination Second size of road pattern is included in the length of the width of the line pattern of the combination and the line pattern of the combination At least one.

3. device according to claim 2, it is characterised in that the first line pattern and the line pattern of the combination At least one of width be mean breadth or Breadth Maximum, and wherein described first line pattern and the line of the combination The length of at least one of road pattern is average length or maximum length.

4. device according to claim 1, it is characterised in that the inspection component includes one or more cameras, described one Or multiple cameras are configured as detecting the first size and second size.

5. device according to claim 4, it is characterised in that one or more described cameras include one or more first cameras With one or more second cameras, one or more described first cameras are configured as detecting the first size, it is described one or more Second camera is configured as detection second size, or one or more wherein described magazine identical cameras are configured as Detect both the first size and second size.

6. device according to any one of claim 1 to 5, it is characterised in that the aligning equipment is configured as calculating X At least one of corrected value, Y corrected values and angle corrected value are by least one in the processing equipment and the second substrate Person is aligned.

7. device according to claim 6, it is characterised in that the aligning equipment is configured as：

The first size and second size are compared；And

At least one of the X corrected values, the Y corrected values and described angle corrected value are calculated based on comparative result come will be described At least one alignment in processing equipment and the second substrate.

8. device according to claim 7, it is characterised in that described device is configured to determine that the line map of the combination Relative amplification of the case relative to the first line pattern.

9. device according to claim 1, it is characterised in that the processing equipment, which is selected from, includes the group of the following：Print Brush, the print head for being arranged to silk-screen printing, ink-jet printer, laser equipment, and any combination of them.

10. device according to claim 1, it is characterised in that described device is configured as above carrying in the first substrate For the first line pattern.

11. device according to claim 1, it is characterised in that described device is configured as above carrying in the second substrate Before another first line pattern, based on the first size and second size come by the processing equipment and described At least one of two substrates are aligned.

12. device according to claim 1, it is characterised in that described device is configured as on the second substrate Before another second line pattern is provided on another first line pattern, based on the first size and second size come by At least one of the processing equipment and the second substrate are aligned.

13. device according to claim 1, it is characterised in that described device is configurable for dual printing, reprinted more At least one of brush, ink jet printing and laser grooving and scribing.

14. device according to claim 1, it is characterised in that the line pattern of the combination forms big sun energy battery Fingers.