CN206379329U - The quality selection device and the processing unit of cluster of a kind of cluster - Google Patents
The quality selection device and the processing unit of cluster of a kind of cluster Download PDFInfo
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- CN206379329U CN206379329U CN201621376463.9U CN201621376463U CN206379329U CN 206379329 U CN206379329 U CN 206379329U CN 201621376463 U CN201621376463 U CN 201621376463U CN 206379329 U CN206379329 U CN 206379329U
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- cluster
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- mass selector
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Abstract
The utility model discloses a kind of quality selection device of cluster and the processing unit of cluster, it is related to instrument assembling field, it includes mass selector and electric field bringing device, electric field bringing device is connected by power line with mass selector, and mass selector is provided with accelerating region, movement area and the deceleration area of screening cluster particle.Employ the mode of multilayer screening, cluster particle from the entrance of mass selector entrance is after accelerating region accelerates, enter deceleration area by the screening of movement area again, the cluster particle filtered out by deceleration area is projected from the channel outlet of mass selector, and passing sample system by ultrahigh vacuum enters subsequent processing device.Screened by multilayer, be precisely separated out the cluster particle of extra fine quality, improved the accuracy of quality selection, be conducive to the operation of post-treatment operations.
Description
Technical field
The utility model is related to instrument assembling field, in particular to the quality selection device and cluster of a kind of cluster
Processing unit.
Background technology
Metal, oxidate nano cluster cause electronics, the change of band structure due to quantum size effect.Pass through control
The preparation of nanocluster size, it is possible to achieve the functional material of different purposes, such as biomedicine, gas sensing, photocatalysis.It is right
In the preparation of nanocluster, generally there are hydrothermal synthesis method and gas phase Cluster deposition method.Compared to Hydrothermal Synthesiss, gas phase cluster
Nanocluster size prepared by deposition process is controllable, without other dephasigns, and method is simple, is favored by people.
Mass selector in Cluster Beam experimental provision is that the particle diameter of cluster is screened, experimental facilities.But
The choice accuracy of traditional cluster mass selector is not high, it is impossible to accurately divided the Cluster Beam of different quality
From.
Utility model content
The purpose of this utility model is the quality selection device for providing a kind of cluster, and it is provided with accelerating region, movement area
Cluster particle is separated with deceleration area, is accurately separated out by repeatedly screening after the cluster particle of extra fine quality, convenience
The operation of continuous processing operation.
Another object of the present utility model is to provide a kind of processing unit of cluster, and it includes above-mentioned quality selection dress
Put, screened by the multilayer of quality selection device, be accurately separated out the cluster particle of extra fine quality, handle follow-up cluster
Work is more effectively carried out.
What embodiment of the present utility model was realized in：
A kind of quality selection device of cluster, including mass selector and electric field bringing device, electric field bringing device pass through
Power line is connected with mass selector, and mass selector is provided with particle selection chamber, and particle selection intracavitary is from top to bottom successively
First electrode plate, second electrode plate, the 3rd battery lead plate and the 4th battery lead plate are provided with, between first electrode plate and second electrode plate
The accelerating region of mass selector is formed, the movement area of mass selector, the 3rd are formed between second electrode plate and the 3rd battery lead plate
The deceleration area of mass selector is formed between battery lead plate and the 4th battery lead plate；
Second electrode plate is provided with the first connected entrance for entering movement area by accelerating region for cluster particle, the 3rd battery lead plate
It is provided with the second connected entrance for entering deceleration area by movement area for cluster particle, the side wall of mass selector correspondence deceleration area and sets
It is equipped with the channel outlet that the cluster particle being screened for out is projected；
When electric field bringing device applies high-frequency electric field to mass selector, being formed in accelerating region makes what cluster particle accelerated
The retarding field for making cluster particle slow down is formed in accelerating field, deceleration area.
In the utility model preferred embodiment, the width value of above-mentioned first electrode plate and second electrode plate is all higher than
The distance between 1.5 times first electrode plate and second electrode plate are worth.
In the utility model preferred embodiment, the width value of above-mentioned first connected entrance is more than first electrode plate and second
The distance between battery lead plate is worth, and the width value of above-mentioned second connected entrance is more than the distance between second electrode plate and the 3rd battery lead plate
Value.
In the utility model preferred embodiment, the quality selection device of above-mentioned cluster also includes carrying out Cluster Beam
The ion optical lens of focusing, the outlet of ion optical lens is connected with the entrance of mass selector.
In the utility model preferred embodiment, above-mentioned ion optical lens include the simple lens that a position is fixed.
In the utility model preferred embodiment, above-mentioned ion optical lens include two lists that are coaxial and being oppositely arranged
Lens.
In the utility model preferred embodiment, the inwall of two above-mentioned simple lenses is columnar structured.
In the utility model preferred embodiment, two are provided between the entrance and simple lens of above-mentioned ion optical lens
Individual deflecting plates group, each deflecting plates group includes two deflecting plates being parallel to each other, and two deflecting plates are symmetricly set in two lists
The both sides of lens axis.
In the utility model preferred embodiment, the quality selection device of above-mentioned cluster also includes ultravacuum and passes sample system
System, the channel outlet of mass selector is connected with the entrance that ultravacuum passes sample system.
A kind of processing unit of cluster, it includes the quality selection device of above-mentioned cluster.
The beneficial effect of the utility model embodiment is：The quality selection of cluster particle employs the mode of multilayer screening,
The cluster particle entered from mass selector entrance enters deceleration area after accelerating region accelerates, then by the screening of movement area,
The cluster particle filtered out by deceleration area is projected from the channel outlet of mass selector, and passing sample system by ultrahigh vacuum enters
Subsequent processing device.Screened by multilayer, be precisely separated out the cluster particle of extra fine quality, improve the accurate of quality selection
Property, be conducive to the operation of post-treatment operations.
Brief description of the drawings
In order to illustrate more clearly of the technical scheme of the utility model embodiment, it will use below required in embodiment
Accompanying drawing be briefly described, it will be appreciated that the following drawings illustrate only some embodiments of the present utility model, therefore should not be by
Regard the restriction to scope as, for those of ordinary skill in the art, on the premise of not paying creative work, may be used also
To obtain other related accompanying drawings according to these accompanying drawings.
The structural representation of the quality selection device for the cluster that Fig. 1 provides for the utility model first embodiment；
The structural representation for the mass selector that Fig. 2 provides for the utility model first embodiment；
Fig. 3 is the corresponding current strength of Cu nanoclusters of different-grain diameter in the utility model first embodiment；
The structural representation of the quality selection device for the cluster that Fig. 4 provides for the utility model second embodiment；
The structural representation for the ion optical lens that Fig. 5 provides for the utility model second embodiment；
The schematic diagram of the beam potential line for the polarization plates group that Fig. 6 provides for the utility model second embodiment.
Icon：The quality selection device of 100a- clusters；The quality selection device of 100b- clusters；110- electric fields apply dress
Put；120- ion optical lens；130- mass selectors；131- particle selection chambers；140- ultrahigh vacuum passes sample system；132-
One battery lead plate；133a- accelerating regions；133b- movement areas；133c- deceleration areas；134- second electrode plates；The battery lead plates of 136- the 3rd；
The battery lead plates of 138- the 4th；The connected entrances of 135- first；The connected entrances of 137- second；139- channel outlets；The simple lenses of 122- first；124-
Second simple lens；126- deflecting plates groups；The deflecting plates of 1262- first；The deflecting plates of 1264- second.
Embodiment
It is new below in conjunction with this practicality to make the purpose, technical scheme and advantage of the utility model embodiment clearer
Accompanying drawing in type embodiment, the technical scheme in the utility model embodiment is clearly and completely described, it is clear that retouched
The embodiment stated is a part of embodiment of the utility model, rather than whole embodiments.Generally here described in accompanying drawing and
The component of the utility model embodiment shown can be arranged and designed with a variety of configurations.
Therefore, the detailed description of embodiment of the present utility model below to providing in the accompanying drawings is not intended to limit requirement
The scope of the present utility model of protection, but it is merely representative of selected embodiment of the present utility model.Based in the utility model
Embodiment, the every other embodiment that those of ordinary skill in the art are obtained under the premise of creative work is not made, all
Belong to the scope of the utility model protection.
It should be noted that：Similar label and letter represents similar terms in following accompanying drawing, therefore, once a certain Xiang Yi
It is defined in individual accompanying drawing, then it further need not be defined and explained in subsequent accompanying drawing.
, it is necessary to explanation in description of the present utility model, term " " center ", " on ", " under ", it is "left", "right", " perpendicular
Directly ", the orientation or position relationship of the instruction such as " level ", " interior ", " outer " be based on orientation shown in the drawings or position relationship, or
It is the orientation or position relationship usually put when the utility model product is used, is for only for ease of description the utility model and letter
Change description, rather than indicate or imply signified device or element must have specific orientation, with specific azimuth configuration and
Operation, therefore it is not intended that to limitation of the present utility model.In addition, term " first ", " second ", " the 3rd " etc. are only used for area
Divide description, and it is not intended that indicating or implying relative importance.
In addition, the term such as term " level ", " vertical ", " pendency " is not offered as requiring part abswolute level or pendency, and
It is to be slightly tilted.As " level " only refers to that its direction, with respect to more level for " vertical ", is not the expression structure
Must be fully horizontal, but can be slightly tilted.
In description of the present utility model, in addition it is also necessary to which explanation, unless otherwise clearly defined and limited, term " are set
Put ", " installation ", " connected ", " connection " should be interpreted broadly, for example, it may be fixedly connected or be detachably connected,
Or be integrally connected；Can be mechanical connection or electrical connection；Can be joined directly together, intermediary can also be passed through
It is indirectly connected to, can is the connection of two element internals.For the ordinary skill in the art, it can be managed with concrete condition
Solve concrete meaning of the above-mentioned term in the utility model.
First embodiment
Fig. 1 is refer to, the present embodiment provides a kind of quality selection device 100a of cluster, and it includes mass selector 130
Sample system 140 is passed with ultrahigh vacuum, by the cluster particle of cluster particle generator after treatment from mass selector 130
Entrance enters, and the cluster particle filtered out by mass selector 130 passes sample system 140 through ultrahigh vacuum and is transferred into follow-up place
Manage equipment.
Fig. 2 is refer to, the quality selection device 100a of cluster includes mass selector 130 and electric field bringing device 110, electricity
Bringing device 110 is connected by power line with mass selector 130, cluster particle by mass selector 130 side wall
Lower section is injected, and is projected from the top of corresponding opposite side wall.Mass selector 130 is provided with particle selection chamber 131, particle selection
First electrode plate 132, second electrode plate 134, the 3rd battery lead plate 136 and the 4th electrode are disposed with chamber 131 from top to bottom
Plate 138.The accelerating region 133a of cavity formation mass selector 130 between first electrode plate 132 and second electrode plate 134；The
The movement area 133b of cavity formation mass selector 130 between two battery lead plates 134 and the 3rd battery lead plate 136；3rd battery lead plate
The 136 and deceleration area 133c of the 4th cavity formation mass selector 130 between battery lead plate 138.
Further, the first connected entrance 135 is provided with second electrode plate 134, cluster particle passes through the first connected entrance
135 enter movement area 133b from accelerating region 133a.The second connected entrance 137 is provided with the 3rd battery lead plate 136, cluster particle leads to
Cross the second connected entrance 137 and enter deceleration area 133c from movement area 133b.Deceleration area 133c is provided with channel outlet 139, through matter
Channel outlet 139 is provided with the corresponding deceleration area 133c of amount selector 130, the cluster particle filtered out is penetrated by channel outlet 139
Go out, into subsequent processing device.
Two opposite and the high-frequency electric field with certain phase difference is added on accelerating region 133a and deceleration area 133c respectively.It is excellent
Selection of land, first electrode plate 132, second electrode plate 134, the 3rd battery lead plate 136 bottom surface parallel with the 4th battery lead plate 138 and interval
Set, so setting makes cluster particle point to second electrode plate by first electrode plate 132 in the direction of accelerating region 133a electric field forces
134, accelerate take exercises direction and direction of an electric field identical of cluster particle；Cluster particle is in deceleration area 133c electric field forces
The 3rd battery lead plate 136 is pointed in direction by the 4th battery lead plate 138, make cluster particle take exercises direction with electric field force subtracting in the opposite direction
Speed motion.
Specifically, cluster particle, which enters accelerating region 133a, has a horizontal initial rate, and along with the in the presence of electric field force
One battery lead plate 132 direction vertical with second electrode plate 134 is accelerated, thus cluster particle in accelerating region 133a along parabola
Motion, enters movement area 133b by the first connected entrance 135.In movement area, 133b clusters particle passes through along parabolic motion
Two connected entrances 137 enter deceleration area 133c.Gradually decreased in the speed of deceleration area 133c cluster particles, and along parabolic motion,
Projected by channel outlet 139.
Preferably, the cluster particle projected by channel outlet 139 is transferred into follow-up through ultrahigh vacuum biography sample system 140
Manage equipment.In other embodiments, the cluster particle that mass selector 130 is filtered out can also pass sample without ultrahigh vacuum
System 140 is transferred into subsequent processing device.But there is obvious resistance, shadow in the biography sample system of antivacuum or vacuum not enough
The flight of cluster particle is rung, and influences the laser propagation effect of cluster particle.
It is pointed out that after mass selector 130 is entered, part cluster particle can not be entered by the first connected entrance 135
Enter movement area 133b, or deceleration area 133c can not be entered by the second connected entrance 137, or can not be projected along channel outlet 139, these
Cluster particle can not could pass through mass selector by the screening of mass selector 130, the cluster particle of only extra fine quality
130, and enter subsequent processing device, and generate cluster loss.
Preferably, the width value of first electrode plate 132 and second electrode plate 134 is all higher than 1.5 times of first electrode plate 132
With the distance between second electrode plate 134 value, lost with the cluster for reducing mass selector 130 to a greater extent.In other realities
Apply in mode, the distance between first electrode plate 132 and second electrode plate 134, the battery lead plate 136 of second electrode plate 134 and the 3rd
The distance between, the 3rd battery lead plate 136 it is equal with the distance between the 4th battery lead plate 138, and the electricity of first electrode plate 132, second
The width value of pole plate 134, the 3rd battery lead plate 136 and the 4th battery lead plate 138 is all higher than the distance of 1.5 times of two neighboring battery lead plate
Value, makes cluster particle preferably be separated by each layer of passage, improves the accurate rate of screening.
Preferably, the width value L of the first connected entrance 1351More than between first electrode plate 132 and second electrode plate 134
Distance value, and the width value L of the second connected entrance 1372More than the distance between battery lead plate 136 of second electrode plate 134 and the 3rd value,
To reduce the mass loss of cluster particle.
Preferably, the high-frequency electric field applied to accelerating region 133a and deceleration area 133c can be according to the spy to be filtered out
The cluster particle for determining quality is adjusted, more preferably to filter out the cluster particle of a variety of extra fine qualities.As shown in figure 3, different grains
The corresponding current strength of Cu nanoclusters in footpath is different, and appropriate current strength can be adjusted according to the particle diameter to be filtered out.
The quality selection device 100a of the cluster of example offer, the process that cluster particle enters after mass selector 130 are originally provided
After accelerating region 133a, movement area 133b and deceleration area 133c, the cluster particle filtered out is projected by channel outlet 139, accelerating region
133a is subject to accelerating field and deceleration area 133c is subject to retarding field, significantly improves the accuracy of cluster particle sizing, makes sieve
The cluster particle for the extra fine quality selected meets the requirement of production.The high-frequency electrical applied to accelerating region 133a and deceleration area 133c
Field can be adjusted according to the cluster particle for the extra fine quality to be filtered out, and can screen the cluster grain of a variety of extra fine qualities
Son, has widened the quality selection device 100a of cluster application.
Second embodiment
It refer to Fig. 4, the present embodiment provides a kind of quality selection device 100b of cluster, its cluster with first embodiment
Quality selection device 100a it is roughly the same, the difference of the two is that the quality selection device 100b of the cluster of the present embodiment is also wrapped
Include ion optical lens 120.Ion optical lens 120 are used to be focused cluster particle, make the cluster grain of flying for long time
Son enters mass selector 130 after being converged, and ion optical lens 120 can not change the feelings of ion beam focal position
Under condition, the diameter continuously adjustabe of Cluster Beam is realized.
Fig. 5 is refer to, ion optical lens 120 include two coaxial and relative position fixation simple lenses, i.e., first is single
The simple lens 124 of lens 122 and second.Specifically, it is circle that the first simple lens 122 and the second simple lens 124, which could be arranged to inwall,
The structure of cylinder, works for the inwall and end face of the ion only cylinder of paraxial flight, and produces the electric field needed for focusing.Cause
This should try one's best in focusing ensures the machining accuracy and surface roughness of inwall and end face, and for the outer wall shape of cylinder
As long as having no particular/special requirement in the case where not influenceing near axis area Electric Field Distribution.
When axis of the cluster particle along ion optical lens 120 enter the first simple lens 122 and the second simple lens 124, can
With the current potential by adjusting the first simple lens 122 and the second simple lens 124, change cluster particle in the case where not changing focus
Multiplication factor.Cluster particle is after the first simple lens 122 is tentatively focused on, and the second simple lens 124 gathers cluster particle again
It is burnt.In other embodiments, it would however also be possible to employ a simple lens is focused.But, it is saturating using two lists in the present embodiment
It is better that mirror is focused to cluster particle, realizes the adjustable of method multiple, and make the structure of simple lens and front stage
Preferably coordinate.
It should be noted that simple lens could be arranged to three in other embodiments, it is same it can also be provided that other
Shape.Simple lens could be arranged to three coaxial disc structures, and disc centre is provided with circular hole, and circular hole is located at same axis
On.Space is divided into two regions by three disks, and produced in the two regions is uniform electric field.The list of this structure
Lens only have circular-hole internal-wall and card on disk to be used to produce the electric field needed for focusing, so the guarantor that should try one's best in process
Demonstrate,prove the machining accuracy and surface roughness of circular-hole internal-wall and card.
In engineer applied, it is difficult to ensure that simple lens and its previous level structure are coaxial.For example, due to the essence of machining
Degree, it is difficult to ensure that the flange at simple lens two ends is completely vertical with simple lens axis；The assembling of simple lens internals is fixed, also very
It is difficult to ensure that the axis for demonstrate,proving the structure and simple lens is substantially parallel；The flange at simple lens two ends is fixed using copper band pad and screw,
It is difficult to ensure that simple lens is completely coaxial with previous level structure.Preferably, before cluster particle is focused into simple lens, adopt
The heading of cluster particle is modified with two deflecting plates groups 126, after making cluster particle by two deflecting plates groups 126
Flown along the axis of simple lens, enter back into simple lens and be focused.
Fig. 6 is refer to, each deflecting plates group 126 includes two deflecting plates arranged in parallel, the respectively first deflection
The deflecting plates 1264 of plate 1262 and second, the first deflecting plates 1262 and the second deflecting plates 1264 are symmetricly set in the first simple lens 122
With the both sides of the axis of the second simple lens 124.First deflecting plates 1262 and the second deflecting plates 1264 respectively rectangular configuration, and first
The deflecting plates 1264 of deflecting plates 1262 and second is by the way of symmetrical powering, i.e. the current potential of the first deflecting plates 1262 is set to V0+
1/2VDWhen, the current potential of the second deflecting plates 1264 is set to V0-1/2VD, so ensure that the voltage difference between deflecting plates group 126 begins
It is V eventuallyD, it is symmetrical so to ensure that equipotential line, and the electric field force for producing deflecting plates group 126 is relatively uniform, can subtract
The possibility that few cluster particle beams is distorted.
It should be noted that the cluster loss of mass selector 130 is less than 50% in the present embodiment, into mass selector
130 cluster particle is controlled less than or equal to 1000000amu, and mass range is in several atoms to tens nanometers.Control enters
The quality of the cluster particle of mass selector 130 reduces cluster particle while ensureing to isolate the accuracy of cluster particle
Loss late, to a certain extent save operation production cost.
The utility model additionally provides a kind of processing unit of cluster, and that includes in first embodiment and second embodiment
Cluster quality selection device, by cluster generating means produce cluster particle after treatment enter cluster quality select
Select device；Cluster particle is set to enter movement area 133b, the cluster filtered out by movement area 133b after accelerating region 133a acceleration
Particle enters deceleration area 133c, and the cluster particle filtered out by movement area 133b is projected by channel outlet 139, separated by multilayer
Screening, is precisely separated out the cluster particle of extra fine quality；The cluster particle filtered out passes sample system 140 by ultrahigh vacuum and entered
In follow-up processing unit.
In summary, the utility model provides a kind of quality selection device of cluster and the processing unit of cluster, cluster
Particle enters the accelerating region 133a of mass selector 130, enters movement area 133b after accelerating flight screening, by movement area
The cluster particle that 133b is filtered out enters deceleration area 133c, and the cluster particle filtered out by deceleration area 133c is by channel outlet 139
Project, by multilayer separation screening, be precisely separated out the cluster particle of extra fine quality, improve the accuracy of quality selection；It is right
The high-frequency electric field applied can be adjusted according to the cluster particle for the extra fine quality to be filtered out, and filter out a variety of specific
The cluster particle of quality；Ion optical lens 120 are used to be focused cluster particle, cluster particle is entered after being converged
Mass selector 130；Before cluster particle is focused into simple lens, using two deflecting plates groups 126 to cluster particle
Heading be modified, make cluster particle pass through after two deflecting plates groups 126 along simple lens axis fly.
Preferred embodiment of the present utility model is the foregoing is only, the utility model is not limited to, for this
For the technical staff in field, the utility model can have various modifications and variations.It is all it is of the present utility model spirit and principle
Within, any modification, equivalent substitution and improvements made etc. should be included within protection domain of the present utility model.
Claims (10)
1. the quality selection device of a kind of cluster, it is characterised in that including mass selector and electric field bringing device, the electric field
Bringing device is connected by power line with the mass selector, and the mass selector is provided with particle selection chamber, described
Particle selection intracavitary is disposed with first electrode plate, second electrode plate, the 3rd battery lead plate and the 4th battery lead plate, institute from top to bottom
State the accelerating region that the mass selector is formed between first electrode plate and the second electrode plate, the second electrode plate and institute
The movement area that the mass selector is formed between the 3rd battery lead plate is stated, between the 3rd battery lead plate and the 4th battery lead plate
Form the deceleration area of the mass selector；
The second electrode plate is provided with the first connected entrance for entering the movement area by the accelerating region for cluster particle, described
The second connected entrance for entering the deceleration area by the movement area for cluster particle, the quality choosing are provided with 3rd battery lead plate
The channel outlet that the cluster particle being screened for out is projected is provided with the side wall for selecting the device correspondence deceleration area；
When the electric field bringing device applies high-frequency electric field to the mass selector, being formed in the accelerating region makes cluster grain
The retarding field for making cluster particle slow down is formed in the accelerating field that son accelerates, the deceleration area.
2. the quality selection device of cluster according to claim 1, it is characterised in that the first electrode plate and described
The width value of two battery lead plates is all higher than the distance between 1.5 times of the first electrode plate and second electrode plate value.
3. the quality selection device of cluster according to claim 2, it is characterised in that the width value of first connected entrance
More than the distance between the first electrode plate and the second electrode plate value, the width value of second connected entrance is more than described
The distance between second electrode plate and the 3rd battery lead plate are worth.
4. the quality selection device of the cluster according to any one of claim 1-3, it is characterised in that the matter of the cluster
Amount selection device also includes the ion optical lens that are focused to Cluster Beam, the outlet of the ion optical lens with it is described
The entrance of mass selector is connected.
5. the quality selection device of cluster according to claim 4, it is characterised in that the ion optical lens include one
The simple lens that individual position is fixed.
6. the quality selection device of cluster according to claim 4, it is characterised in that the ion optical lens include two
Simple lens that is individual coaxial and being oppositely arranged.
7. the quality selection device of cluster according to claim 6, it is characterised in that the inwall of two simple lenses is equal
To be columnar structured.
8. the quality selection device of cluster according to claim 6, it is characterised in that the entrance of the ion optical lens
Two deflecting plates groups are provided between the simple lens, each deflecting plates group includes two deflections being parallel to each other
Plate, two deflecting plates are symmetricly set in the both sides of two simple lens axis.
9. the quality selection device of cluster according to claim 8, it is characterised in that the quality selection device of the cluster
Also include ultravacuum and pass sample system, the channel outlet of the mass selector passes the entrance phase of sample system with the ultravacuum
Connection.
10. a kind of processing unit of cluster, it is characterised in that include the quality of the cluster any one of claim 1-9
Selection device.
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| CN201621376463.9U CN206379329U (en) | 2016-12-14 | 2016-12-14 | The quality selection device and the processing unit of cluster of a kind of cluster |
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN106783512A (en) * | 2016-12-14 | 2017-05-31 | 盐城工学院 | A kind of system of selection of the quality selection device and cluster particle of cluster |
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN106783512A (en) * | 2016-12-14 | 2017-05-31 | 盐城工学院 | A kind of system of selection of the quality selection device and cluster particle of cluster |
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