CN206376023U - Sand electroplates liquid processing device on electroplating diamond wire saw - Google Patents
Sand electroplates liquid processing device on electroplating diamond wire saw Download PDFInfo
- Publication number
- CN206376023U CN206376023U CN201621380327.7U CN201621380327U CN206376023U CN 206376023 U CN206376023 U CN 206376023U CN 201621380327 U CN201621380327 U CN 201621380327U CN 206376023 U CN206376023 U CN 206376023U
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- China
- Prior art keywords
- groove
- lead
- sand
- electroplate liquid
- isolation channel
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
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- 239000007788 liquid Substances 0.000 title claims abstract description 91
- 239000004576 sand Substances 0.000 title claims abstract description 68
- 229910003460 diamond Inorganic materials 0.000 title claims abstract description 47
- 239000010432 diamond Substances 0.000 title claims abstract description 47
- 238000009713 electroplating Methods 0.000 title claims abstract description 17
- 239000002245 particle Substances 0.000 claims abstract description 59
- 238000002955 isolation Methods 0.000 claims abstract description 46
- 239000007787 solid Substances 0.000 claims abstract description 31
- 239000012535 impurity Substances 0.000 claims abstract description 30
- 239000004744 fabric Substances 0.000 claims abstract description 23
- 238000004140 cleaning Methods 0.000 claims abstract description 10
- 239000000203 mixture Substances 0.000 claims abstract description 4
- 239000004575 stone Substances 0.000 claims description 5
- 238000003780 insertion Methods 0.000 claims description 2
- 230000037431 insertion Effects 0.000 claims description 2
- 238000007789 sealing Methods 0.000 claims description 2
- 238000004519 manufacturing process Methods 0.000 abstract description 14
- 238000000034 method Methods 0.000 description 9
- 239000011248 coating agent Substances 0.000 description 8
- 238000000576 coating method Methods 0.000 description 8
- 238000007747 plating Methods 0.000 description 7
- 230000000694 effects Effects 0.000 description 6
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 5
- 229910045601 alloy Inorganic materials 0.000 description 4
- 239000000956 alloy Substances 0.000 description 4
- 230000002706 hydrostatic effect Effects 0.000 description 4
- 230000008569 process Effects 0.000 description 4
- 238000001914 filtration Methods 0.000 description 3
- 239000002184 metal Substances 0.000 description 3
- 229910052751 metal Inorganic materials 0.000 description 3
- OFNHPGDEEMZPFG-UHFFFAOYSA-N phosphanylidynenickel Chemical compound [P].[Ni] OFNHPGDEEMZPFG-UHFFFAOYSA-N 0.000 description 3
- 238000004062 sedimentation Methods 0.000 description 3
- 229910001096 P alloy Inorganic materials 0.000 description 2
- 238000005520 cutting process Methods 0.000 description 2
- 230000007423 decrease Effects 0.000 description 2
- 230000005611 electricity Effects 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 2
- 239000010931 gold Substances 0.000 description 2
- 229910052737 gold Inorganic materials 0.000 description 2
- 229910052759 nickel Inorganic materials 0.000 description 2
- 230000000717 retained effect Effects 0.000 description 2
- 230000003068 static effect Effects 0.000 description 2
- 230000008719 thickening Effects 0.000 description 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 230000000903 blocking effect Effects 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 238000010924 continuous production Methods 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 239000011159 matrix material Substances 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 239000011435 rock Substances 0.000 description 1
- 229910052594 sapphire Inorganic materials 0.000 description 1
- 239000010980 sapphire Substances 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
- 238000006467 substitution reaction Methods 0.000 description 1
- 239000000725 suspension Substances 0.000 description 1
Landscapes
- Polishing Bodies And Polishing Tools (AREA)
Abstract
The utility model patent is related to sand on a kind of electroplating diamond wire saw and electroplates liquid processing device, including two-way pump, filter pump, isolation channel, isolation channel closure, screen cloth, female groove, lead-over groove, filter, connecting line composition.Isolation channel is completely or partially immersed in female groove in sand electroplate liquid, and lead-over groove is arranged on outside female groove.Isolation channel bottom is provided with screen cloth, and screen cloth allows solid impurity particle to pass through, do not allow diamond particles to pass through.During work, two-way pump gets to the electroplate liquid in isolation channel in lead-over groove, and filter and filter pump remove the solid particle in upper sand electroplate liquid in lead-over groove, and the electroplate liquid of cleaning flows back to female groove from lead-over groove.The utility model can realize it is non-stop-machine in the case of the solid impurity particle in upper sand electroplate liquid is removed, the relative clean of sand electroplate liquid in holdings, so that the production continuous-stable progress of electroplating diamond wire saw, it is ensured that the stability of diamond fretsaw quality.
Description
Technical field
Liquid processing device is electroplated the present invention relates to sand on a kind of electroplating diamond wire saw, specifically:It is related to a kind of by electricity
The device that the solid impurity particle on diamond fretsaw in sand electroplate liquid carries out Hand scarf is plated, belongs to electroplating technology field.
Background technology
Electroplating diamond wire saw is linear with method one kind that consolidated diamond particle is made over the metal lines of electronickelling
Cutting tool.It is mainly used in the cutting processing of the hard brittle materials such as silicon crystal, sapphire, ceramics.The one of electroplating diamond wire saw
As manufacturing process mainly include following steps:Preplating, upper sand, thickening.Wherein preplating refers to electroplate one layer over the metal lines
Metallic nickel;Upper sand refers to diamond particles are tentatively bonded on metal wire matrix by the method for electronickelling;Thickening refers to
Further electronickelling after sand, to improve hold of the electrodeposited coating to diamond.Wherein, upper sand step is manufacture electroplated diamond line
The committed step of saw.
Upper sand process, typically using sand in suspension method, is diamond particles is suspended in electroplate liquid by stirring.In order to
Improve the Buddha's warrior attendant used during the hold of production efficiency and nickel coating to diamond particles of electroplating diamond wire saw, upper sand
Stone particle surface is coated with ni-p alloy coating, and the thickness of general ni-p alloy coating is no more than 2 microns.Because electroplate liquid is usually acid
Property, breakage occurs due to the corrosion of electroplate liquid, comes off for the ni-p alloy coating of diamond particle surfaces.The Buddha's warrior attendant in whipping process
The mutual collision of stone particle can also damage ni-p alloy coating, and produce small nickel-phosphorus alloy particle and enter in electroplate liquid.Together
When on can also produce other solid impurity particles do not allowed in electroplate liquid during sand.The nickel phosphorus that diamond particle surfaces come off is closed
Other the solid impurity particles do not allowed produced during gold grain and upper sand are referred to as solid impurity particle.In upper sand electroplate liquid
The continuous production that the presence of solid impurity particle can substantially reduce sand process in sand efficiency, reduction is stable, so as to reduce plating
The quality of diamond fretsaw.The nickel-phosphorus alloy particle in upper sand electroplate liquid can deposit to diamond wire during plating simultaneously
Surface is sawed, its surface quality is influenceed.Due to not only existing solid impurity particle in upper sand electroplate liquid, also there are diamond particles,
Therefore it is relatively difficult to remove and diamond particles is retained in electroplate liquid solid impurity particle from electroplate liquid.Now
The method that the solid impurity particle in upper sand electroplate liquid is removed in electroplating diamond wire saw production process is to shut down removing method, its mistake
Journey is as follows:After the diamond fretsaw for producing certain length, production process is terminated, and upper sand electroplate liquid is taken out from production line, and
It is put into sedimentation vessel and is settled.Diamond particles volume in electroplate liquid is larger, and sinking speed is high, and solid impurity particle
Small volume, sinking speed is slow, therefore after the diamond particles sedimentation in liquid to be electroplated, then by electroplate liquid and solid therein
Impurity particle takes out from sedimentation vessel, and is put into filtering container.It is by filtering that the solid impurity particle in electroplate liquid is clear
Remove, form the upper sand electroplate liquid of cleaning.Then the upper sand electroplate liquid of cleaning is added in upper sand device and puts into diamond
Grain, restarts lower whorl production.Therefore the removing of solid impurity particle needs to shut down progress, production in traditional upper sand electroplate liquid
Efficiency is low, and operating process is complicated, and labor intensity is big.How the online solid impurity particle removed in upper sand electroplate liquid of not shutting down is
Electroplating diamond wire saw production field urgent problem to be solved.
The content of the invention
In order to solve the above-mentioned technical problem, the utility model provides solid in sand electroplate liquid on a kind of electroplating diamond wire saw
The remove device of body impurity particle, can realize it is non-stop-machine in the case of by upper sand electroplate liquid solid impurity particle remove,
The relative clean of sand electroplate liquid in holding, while making diamond particles be retained in sand electroplate liquid, so that electroplated diamond
The production continuous-stable of scroll saw is carried out, it is ensured that the stability of diamond fretsaw quality, improves production efficiency.
What the utility model was realized in:Mainly include two-way pump, filter pump, isolation channel, isolation channel closure, sieve
Net, female groove, lead-over groove, filter, connecting line composition.
The upper sand electroplate liquid for being suspended with diamond particles and solid impurity particle is filled in the female groove, the isolation channel is consolidated
Dingan County is mounted in female groove, and isolation channel is completely or partially immersed in female groove in sand electroplate liquid;Isolation channel top be provided with every
From groove closure, bottom is provided with screen cloth;The lead-over groove be arranged on female groove outside, two-way pump by connecting line be arranged on every
From between groove and lead-over groove;The filter pump is arranged between filter and lead-over groove by connecting line, and filter passes through connecting tube
Road and lead-over groove connection;The lead-over groove is connected by connecting line and female groove;
Described cross in coating bath fills cleaning electroplate liquid;Lead-over groove liquid level and female groove liquid level are contour;
The diameter scope of sieve aperture is 3~5 μm on the screen cloth, it is allowed to which solid impurity particle passes through, and does not allow Buddha's warrior attendant
Stone particle passes through;
In the sealing that connecting line passes through isolation channel in lid insertion isolation channel, end is immersed in sand electroplate liquid.
The utility model is that such work is:
(1) the upper sand electroplate liquid in female groove enters isolation channel, while upper sand is electric under hydrostatic pressure effect by screen cloth
Solid impurity particle in plating solution enters isolation channel also by screen cloth, and diamond particles are stopped due to being relatively large in diameter by screen cloth
In upper sand electroplate liquid in female groove;
(2) start two-way pump, the upper sand electroplate liquid containing solid impurity particle in isolation channel is driven into lead-over groove, every
Decline from tank liquor position, under hydrostatic pressure effect, the upper sand electroplate liquid in female groove goes successively to isolation channel, while female groove liquid level
Decline, lead-over groove liquid level rises;
(3) under static pressure effect, the cleaning electroplate liquid in lead-over groove enters female groove by connecting line, realizes in female groove
The renewal of upper sand electroplate liquid;
(4) the upper sand electroplate liquid for entering lead-over groove from isolation channel is entered in filter, upper sand electroplate liquid by filter pump
Solid impurity particle is separated from electroplate liquid in the filter;
(5) the upper sand electroplate liquid of cleaning flows back to lead-over groove by connecting line from filter;
(6) screen cloth may be blocked by the diamond particles in upper sand electroplate liquid after work a period of time, can make two-way pump
Reverse operation, makes the electroplate liquid in lead-over groove enter isolation channel, and enters female groove by screen cloth, while the Buddha's warrior attendant that will block screen cloth
Stone particle is washed out.
The utility model has the advantages that:The achievable online removing for not shutting down solid impurity particle in sand electroplate liquid, makes
The production continuous-stable of electroplating diamond wire saw is carried out, it is ensured that the stability of diamond fretsaw quality, improves production efficiency.
Brief description of the drawings
Accompanying drawing 1 is sand plating liquid processing device composition schematic diagram on a kind of electroplating diamond wire saw of the utility model.
Label in figure:1- female grooves 2- diamond particles 3- solid impurities particle 4- female groove liquid level 5- isolation channels 6- every
Electroplate liquid 11- filter pump 12- connecting lines are cleaned from groove closure 7- two-way pump 8- lead-over groove liquid level 9- lead-over grooves 10-
13- filter 14- screen cloth 15- isolation channel liquid levels
Embodiment
The utility model is described further presently in connection with accompanying drawing 1 and example.
Sand nickel plating liquid processing device on a kind of electroplating diamond wire saw, mainly includes two-way pump 7, filtering as shown in Figure 1
Pump 11, isolation channel 5, isolation channel closure 6, screen cloth 14, female groove 1, lead-over groove 9, filter 13, connecting line 12 is constituted.
The upper sand electroplate liquid for being suspended with diamond particles 2 and solid impurity particle 3, the isolation are filled in the female groove 1
Groove 5 is fixedly mounted in female groove 1, and isolation channel 5 is completely or partially immersed in female groove 1 in sand electroplate liquid;The top of isolation channel 5
Isolation channel closure 6 is installed, bottom is provided with screen cloth 14;The lead-over groove 9 is arranged on the outside of female groove 1, and two-way pump 7 passes through even
Road 12 is taken over to be arranged between isolation channel 5 and lead-over groove 9;The filter pump 11 is arranged on the He of filter 13 by connecting line 12
Between lead-over groove 9, filter 13 is connected by connecting line 12 and lead-over groove 9;The lead-over groove 9 passes through connecting line and female groove
1 connection;
Described cross fills cleaning electroplate liquid 10 in coating bath 9;Lead-over groove liquid level 8 and female groove liquid level 4 are contour;
The diameter scope of sieve aperture is 3~5 μm on the screen cloth 14, it is allowed to which solid impurity particle 3 passes through, and does not allow gold
Hard rock particle 2 passes through;
Connecting line 12 is inserted in isolation channel 5 by the isolation channel closure 6 on isolation channel 5, and end is immersed in sand electricity
In plating solution.
The present embodiment is such operation principle and the course of work is:
(1) the upper sand electroplate liquid in female groove 1 enters isolation channel 6 under hydrostatic pressure effect by screen cloth 14, while on
Solid impurity particle 3 in sand electroplate liquid enters isolation channel 5 also by screen cloth 14, and diamond particles 2 are due to being relatively large in diameter, quilt
Screen cloth 14 is blocked in the upper sand electroplate liquid in female groove 1;
(2) start two-way pump 7, the upper sand electroplate liquid containing solid impurity particle 3 in isolation channel 5 is driven into lead-over groove 9
In, the liquid level of isolation channel 5 declines, and under hydrostatic pressure effect, the upper sand electroplate liquid in female groove 1 goes successively to isolation channel 5, simultaneously
Female groove liquid level 4 declines, and lead-over groove liquid level 8 rises;
(3) under static pressure effect, the cleaning electroplate liquid 10 in lead-over groove 9 enters female groove 1 by connecting line 12, realizes
The renewal of upper sand electroplate liquid in female groove 1;
(4) the upper sand electroplate liquid for entering lead-over groove 9 from isolation channel 5 enters filter 13, upper sand plating by filter pump 11
Solid impurity particle 3 in liquid is separated in filter 13 from electroplate liquid;
(5) the upper sand electroplate liquid of cleaning flows back to lead-over groove 9 by connecting line 12 from filter 13;
(6) screen cloth 14 may be blocked by the diamond particles 2 in upper sand electroplate liquid after work a period of time, can be made two-way
The reverse operation of pump 7, makes electroplate liquid in lead-over groove 9 enter isolation channel 5, and enters female groove 1 by screen cloth 14, while by blocking screen
The diamond particles of net 14 are washed out.
Above-described embodiment, is only the specific case being described in further detail to technical scheme, the present invention is simultaneously
It is non-to be only defined in this.Every any modification, equivalent substitution and improvements made within the scope of disclosed by the invention etc., are included
Within protection scope of the present invention.
Claims (2)
1. sand electroplates liquid processing device on a kind of electroplating diamond wire saw, it is characterised in that:Including two-way pump, filter pump, isolation
Groove, isolation channel closure, screen cloth, female groove, lead-over groove, filter, connecting line composition;Filled in the female groove and be suspended with Buddha's warrior attendant
The upper sand electroplate liquid of stone particle and solid impurity particle, the isolation channel is fixedly mounted in female groove, and isolation channel is complete in female groove
Portion is partially immersed in sand electroplate liquid;Isolation channel top is provided with isolation channel closure, and bottom is provided with screen cloth;The mistake
Aqueduct is arranged on outside female groove, and two-way pump is arranged between isolation channel and lead-over groove by connecting line;The filter pump passes through even
Take over road to be arranged between filter and lead-over groove, filter is connected by connecting line and lead-over groove;The lead-over groove passes through even
Take over road and female groove connection;Cleaning electroplate liquid is filled in the lead-over groove;Lead-over groove liquid level and female groove liquid level are contour, connecting line
By being covered in the sealing of isolation channel in insertion isolation channel, end is immersed in sand electroplate liquid.
2. sand electroplates liquid processing device on a kind of electroplating diamond wire saw according to claim 1, it is characterised in that:Screen cloth
The diameter scope of upper sieve aperture is 3~5 μm.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN201621380327.7U CN206376023U (en) | 2016-12-16 | 2016-12-16 | Sand electroplates liquid processing device on electroplating diamond wire saw |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN201621380327.7U CN206376023U (en) | 2016-12-16 | 2016-12-16 | Sand electroplates liquid processing device on electroplating diamond wire saw |
Publications (1)
Publication Number | Publication Date |
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CN206376023U true CN206376023U (en) | 2017-08-04 |
Family
ID=59407072
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
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CN201621380327.7U Expired - Fee Related CN206376023U (en) | 2016-12-16 | 2016-12-16 | Sand electroplates liquid processing device on electroplating diamond wire saw |
Country Status (1)
Country | Link |
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CN (1) | CN206376023U (en) |
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2016
- 2016-12-16 CN CN201621380327.7U patent/CN206376023U/en not_active Expired - Fee Related
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Legal Events
Date | Code | Title | Description |
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GR01 | Patent grant | ||
GR01 | Patent grant | ||
CF01 | Termination of patent right due to non-payment of annual fee | ||
CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20170804 Termination date: 20171216 |