CN206285705U - A kind of exhaust gas treating device of epitaxy technique - Google Patents
A kind of exhaust gas treating device of epitaxy technique Download PDFInfo
- Publication number
- CN206285705U CN206285705U CN201621353266.5U CN201621353266U CN206285705U CN 206285705 U CN206285705 U CN 206285705U CN 201621353266 U CN201621353266 U CN 201621353266U CN 206285705 U CN206285705 U CN 206285705U
- Authority
- CN
- China
- Prior art keywords
- negative pressure
- spray column
- treating device
- water
- exhaust gas
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn - After Issue
Links
- 238000000034 method Methods 0.000 title claims abstract description 48
- 238000000407 epitaxy Methods 0.000 title claims abstract description 34
- 239000007789 gas Substances 0.000 claims abstract description 107
- 239000007921 spray Substances 0.000 claims abstract description 99
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims abstract description 82
- 238000003860 storage Methods 0.000 claims abstract description 36
- 239000002912 waste gas Substances 0.000 claims abstract description 24
- 239000012530 fluid Substances 0.000 claims abstract description 19
- 238000005406 washing Methods 0.000 claims abstract description 12
- 238000001802 infusion Methods 0.000 claims abstract description 5
- 239000007788 liquid Substances 0.000 claims description 31
- 239000013078 crystal Substances 0.000 claims description 19
- 238000000746 purification Methods 0.000 claims description 12
- 239000002253 acid Substances 0.000 claims description 10
- 238000007667 floating Methods 0.000 claims description 6
- 238000012856 packing Methods 0.000 claims description 5
- 230000001681 protective effect Effects 0.000 claims description 5
- 238000002425 crystallisation Methods 0.000 claims description 3
- 230000008676 import Effects 0.000 claims description 3
- 238000000926 separation method Methods 0.000 claims description 3
- 230000008025 crystallization Effects 0.000 claims description 2
- 238000005507 spraying Methods 0.000 claims description 2
- 230000008569 process Effects 0.000 abstract description 9
- 238000006243 chemical reaction Methods 0.000 description 9
- 229910052681 coesite Inorganic materials 0.000 description 9
- 229910052906 cristobalite Inorganic materials 0.000 description 9
- 239000000945 filler Substances 0.000 description 9
- 239000000377 silicon dioxide Substances 0.000 description 9
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 9
- 229910052682 stishovite Inorganic materials 0.000 description 9
- 229910052905 tridymite Inorganic materials 0.000 description 9
- 238000004140 cleaning Methods 0.000 description 7
- 230000003020 moisturizing effect Effects 0.000 description 6
- 230000006641 stabilisation Effects 0.000 description 6
- 238000011105 stabilization Methods 0.000 description 6
- 238000004519 manufacturing process Methods 0.000 description 5
- 238000002156 mixing Methods 0.000 description 5
- 239000003643 water by type Substances 0.000 description 5
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 4
- 230000033228 biological regulation Effects 0.000 description 4
- 230000000903 blocking effect Effects 0.000 description 4
- 230000008859 change Effects 0.000 description 4
- 239000002245 particle Substances 0.000 description 4
- 239000003125 aqueous solvent Substances 0.000 description 2
- 208000002925 dental caries Diseases 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 238000007599 discharging Methods 0.000 description 2
- 238000011049 filling Methods 0.000 description 2
- XZWYZXLIPXDOLR-UHFFFAOYSA-N metformin Chemical compound CN(C)C(=N)NC(N)=N XZWYZXLIPXDOLR-UHFFFAOYSA-N 0.000 description 2
- 229910052757 nitrogen Inorganic materials 0.000 description 2
- 238000005086 pumping Methods 0.000 description 2
- 230000009467 reduction Effects 0.000 description 2
- 230000004044 response Effects 0.000 description 2
- 239000008399 tap water Substances 0.000 description 2
- 235000020679 tap water Nutrition 0.000 description 2
- 238000009736 wetting Methods 0.000 description 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- 230000001174 ascending effect Effects 0.000 description 1
- 238000005119 centrifugation Methods 0.000 description 1
- SLLGVCUQYRMELA-UHFFFAOYSA-N chlorosilicon Chemical compound Cl[Si] SLLGVCUQYRMELA-UHFFFAOYSA-N 0.000 description 1
- 238000001514 detection method Methods 0.000 description 1
- 238000010790 dilution Methods 0.000 description 1
- 239000012895 dilution Substances 0.000 description 1
- 238000004090 dissolution Methods 0.000 description 1
- 230000003828 downregulation Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 230000009931 harmful effect Effects 0.000 description 1
- 238000007654 immersion Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 230000000149 penetrating effect Effects 0.000 description 1
- 230000000505 pernicious effect Effects 0.000 description 1
- 230000000750 progressive effect Effects 0.000 description 1
- 230000000630 rising effect Effects 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 239000000779 smoke Substances 0.000 description 1
- 239000000243 solution Substances 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 231100000331 toxic Toxicity 0.000 description 1
- 230000002588 toxic effect Effects 0.000 description 1
- 230000003442 weekly effect Effects 0.000 description 1
Landscapes
- Treating Waste Gases (AREA)
Abstract
The utility model discloses a kind of exhaust gas treating device of epitaxy technique, including storage tank (10), the jet spray column (1) for absorbing waste gas is connected with the storage tank (10), and the negative pressure generator (23) being connected with the exhaust outlet of the jet spray column (1), the region communicated before the negative pressure generator (23) forms negative pressure cavity (25), the region communicated after the negative pressure generator (23) forms common pressure chamber (26), the water inlet (19) for being passed through constant stream is provided with the storage tank (10), the fluid connection of the negative pressure cavity (25) and the common pressure chamber (26)；Also include the spill box (8) in atmospheric pressure state and fluid infusion with the fluid connection of the negative pressure cavity (25), the troubled liquor in the spill box (8) is discharged from overfall (9).The exhaust gas treating device of the epitaxy technique efficiently solves common rinsing type tail gas washing tower and can not preferably process the problem of tail gas.
Description
Technical field
The utility model is related to tail gas treatment device technical field, more particularly to a kind of vent gas treatment of epitaxy technique
Device.
Background technology
Can be using to a large amount of TCS, (chemical formula is SiHCl in the epitaxy technique epitaxial furnace EPI of semi-conductor silicon chip manufacture3)、
HCl、H2PH other with ppm concentration levels3Or B2H6Deng gas, technique real reaction rate<20%, substantial amounts of TCS gases can be by conduct
Process tail gas discharge epitaxial furnace reaction chamber, these toxic and harmfuls have to pass through the treatment of suitable exhaust gas treating device it is up to standard after
Air can be entered.Due to TCS and water reaction generation SiO2Grain crystalline thing and HCl gases etc., and HCl can be dissolved in water and effectively be inhaled
Receipts treatment；Plus H2Can be left intact directly emptying, and the PH of denier3Or B2H6Deng by H in exhaust gas treating device2It is dilute
Less than TLV values after releasing, can directly be vented, and without special disposal.
In the prior art, using common rinsing type tail gas washing tower, waste gas is by by fillers such as the Pall rings of water wash
When by water reactive absorption.
But, a large amount of SiO are produced in the process2White crystals thing, it is necessary to 1-3 days shut down cleaning once, SiO2White
Crystal removal is clean, will otherwise make filler felt jam, causes exhaust gas treating device to work；Air inlet is easily blocked
Plug, due to steam reason so that in tail gas air inlet because TCS reacts the SiO of generation with steam2It is not flush with water, directly
Stick to air inlet inwall；Water consumption is big, in order to the white crystals thing of floating on water in equipment water tank is removed, it is necessary to using big
White crystals thing, is drained into device for transferring by the moisturizing and draining of amount with draining；Negative pressure regulation is unstable and can not become with air-flow
Change and quick response, normal pressure type EPI epitaxial furnaces, it is necessary to carry out precise control negative pressure using exhaust treatment system, while satisfaction works as tail
, it is necessary to quick regulation is to setting negative pressure value when tolerance changes；Conventional at present is that a centrifugation wind is installed in exhaust gas treating device rear end
Machine takes out negative pressure mode, and centrifugal blower is big due to exhausting amount, and the ability for adjusting stabilization negative pressure with the change of air inflow is weak；
In sum, how efficiently solving common rinsing type tail gas washing tower can not preferably process the problem of tail gas,
It is current those skilled in the art's urgent problem.
Utility model content
The purpose of this utility model is to provide a kind of exhaust gas treating device of epitaxy technique, the exhaust gas treating device of the epitaxy technique
Efficiently solving common rinsing type tail gas washing tower can not preferably process the problem of tail gas.
In order to solve the above technical problems, the utility model provides following technical scheme：
A kind of exhaust gas treating device of epitaxy technique, including storage tank is connected for absorbing penetrating for waste gas with the storage tank
Stream spray column, and the negative pressure generator being connected with the exhaust outlet of the jet spray column, communicate before the negative pressure generator
Region form negative pressure cavity, the region that is communicated after the negative pressure generator forms common pressure chamber, is provided with the storage tank logical
Enter the water inlet of constant stream, the fluid connection of the negative pressure cavity and the common pressure chamber；Also include being in atmospheric pressure state and fluid infusion
Mouthful with the spill box of the fluid connection of the negative pressure cavity, the troubled liquor in the spill box discharges from overfall.
Preferably, include in the negative pressure generator for spraying liquid and making ejection liquid and the exhaust outlet
Tail gas sprays into the ejector of the common pressure chamber after converging, the common pressure chamber is offered the purification gas discharge after gas-liquid separation
Purification gas outlet.
Preferably, the air inlet for carrying out washing dissolving for the first time to waste gas is also connected with the storage tank including bottom
Tower；
Also include being communicated between the air inlet tower and the jet spray column and be used for acid gas is absorbed by disperse water
Middle spray column, the bottom of the middle spray column connects with the storage tank；
The cylinder of the jet spray column immerses underwater in the storage tank.
Preferably, there is at least two-layer nozzle spray equipment, every layer in the middle spray column and the jet spray column
The nozzle spray equipment lower section is provided with packing layer；
Communicating pipe and the middle spray column and the jet between the middle spray column and the middle spray column
Water jet is provided with communicating pipe between spray column；
The side wall of the middle spray column and the jet spray column is provided with observation access hole.
Preferably, the top of the air inlet tower is provided with inlet cylinder, and the inlet cylinder offers tail gas air inlet and protection
Gas inlet；
The top of the inlet cylinder be provided with its axial identical rotary shaft, being fixed with the rotary shaft to remove
The inlet cylinder inwall adheres to the scraper plate of crystal, has gap between the scraper plate and the inwall of the inlet cylinder.
Preferably, the bottom of the inlet cylinder is connected with ring flange, in the edge of the ring flange and the air inlet tower
There is annular gap, the inlet of the air inlet tower is arranged at the top of the ring flange between wall.
Preferably, the inlet of the air inlet tower, the nozzle spray equipment, the water jet connect with spray pump
It is logical, the fluid connection of the import of the spray pump and the negative pressure cavity.
Preferably, the crystallization floating object that the negative pressure cavity water surface site is provided with for will be formed on the water surface is broken up and is filled with water
Divide well mixed venturi mixed flow nozzle.
Preferably, the water inlet is arranged on the storage tank at the common pressure chamber, is provided with the spill box
Overflow pipe, the troubled liquor in the spill box is discharged from the overfall of the overflow pipe；
Rinse spray head is provided with the top of the spill box, the rinse spray head connects with the liquid of the common pressure chamber
It is logical；
The top of the spill box is provided with the normal pressure mouthful with atmosphere.
Preferably, pressure sensor is installed, the pressure sensor is connected with VFC case, institute in the negative pressure cavity
State VFC case to be connected with variable frequency pump, the variable frequency pump is connected with the ejector；
The VFC case is also connected with liquid-level switch, and the liquid-level switch is located in the negative pressure cavity and can measure
Liquid height in the negative pressure cavity.
The exhaust gas treating device of epitaxy technique provided by the utility model, including storage tank, jet spray column, negative pressure occur
There is water, underwater in jet spray column cylinder immersion storage tank, for being rotated by high speed in device and spill box, storage tank
Current absorb waste gas, and a large amount of disperse waters are fully absorbed to waste gas.Negative pressure generator is connected with the exhaust outlet of jet spray column, is used for
Negative pressure is produced, the exhaust gas treating device of epitaxy technique has two cavitys, negative pressure cavity and common pressure chamber, the area communicated before negative pressure generator
Domain forms negative pressure cavity, and the region communicated after negative pressure generator forms common pressure chamber.Water inlet is provided with storage tank, water inlet leads to
Enter the fluid connection of constant stream, negative pressure cavity and common pressure chamber.Spill box is in atmospheric pressure state, and its fluid infusion and negative pressure cavity liquid
Body is connected, and the troubled liquor in spill box is discharged from overfall, and troubled liquor is mainly SiO2White crystals thing.
The exhaust gas treating device of epitaxy technique provided by the utility model is conducive to steady production to stablize negative pressure device,
With city tap-water as aqueous solvent, the processes such as mixing, dissolving between gas-liquid two-phase are realized in the contact that tail gas passes through gas-liquid two-phase,
Requirement is absorbed to meet gas purification.The SiO of generation2White crystals thing is effectively well mixed with water, with the overfall of spill box
Discharge, shuts down cleaning frequency reduction, is difficult to make filler felt jam, extends to and shuts down cleaning once in more than 60 days, SiO2In vain
The removal of color crystal is clean, and the operating efficiency of exhaust gas treating device is improved；SiO2White crystals thing is effectively well mixed with water, removal
Substantial amounts of moisturizing and draining are not needed during the white crystals thing of floating on water, water consumption is small, water saving ability is good；Simple structure, it is easy to
Maintaining, low cost.
Brief description of the drawings
In order to illustrate more clearly of the utility model embodiment or technical scheme of the prior art, below will be to embodiment
Or the accompanying drawing to be used needed for description of the prior art is briefly described, it should be apparent that, drawings in the following description are only
It is some embodiments of the present utility model, for those of ordinary skill in the art, is not paying the premise of creative work
Under, other accompanying drawings can also be obtained according to these accompanying drawings.
The structure of the exhaust gas treating device of the epitaxy technique that Fig. 1 is provided by a kind of specific embodiment in the utility model is shown
It is intended to；
Fig. 2 is the operation principle schematic diagram of Fig. 1.
Marked in accompanying drawing as follows：
Spray column, 6- nozzles spray dress in the middle of 1- jets spray column, 2- air inlets tower, 3- scraper plates, 4- tail gas air inlet, 5-
Put, 7- pressure sensors, 8- spill boxes, 9- overfalls, 10- storage tanks, 11- filters, 12- discharge outlet, 13- draining valves, 14-
Variable frequency pump, 15- spray pumps, 16- venturi mixed flow nozzle, 17- liquid-level switches, 18- variable frequency pumps flowmeter, 19- water inlets, 20-
Water intaking valve, 21- purification gas outlet, 22- feed water flows gauge, 23- negative pressure generators, 24- protective gas air inlet, 25- bear
Pressure chamber, 26- common pressure chambers, 27- control cabinets, 28- rinse spray heads.
Specific embodiment
Core of the present utility model is to provide a kind of exhaust gas treating device of epitaxy technique, the exhaust gas treating device of the epitaxy technique
Efficiently solving common rinsing type tail gas washing tower can not preferably process the problem of tail gas.
Below in conjunction with the accompanying drawing in the utility model embodiment, the technical scheme in the utility model embodiment is carried out
Clearly and completely describe, it is clear that described embodiment is only a part of embodiment of the utility model, rather than whole
Embodiment.Based on the embodiment in the utility model, those of ordinary skill in the art are not under the premise of creative work is made
The every other embodiment for being obtained, belongs to the scope of the utility model protection.
Refer to the tail of the epitaxy technique that Fig. 1 and Fig. 2, Fig. 1 are provided by a kind of specific embodiment in the utility model
The structural representation for the treatment of apparatus；Fig. 2 is the operation principle schematic diagram of Fig. 1.
In a kind of specific embodiment, the exhaust gas treating device of epitaxy technique provided by the utility model, including water storage
There is water, jet spray column 1 and storage tank in case 10, jet spray column 1, negative pressure generator 23 and spill box 8, storage tank 10
10 connections, for absorbing waste gas by high speed rotary water current, a large amount of disperse waters are fully absorbed to waste gas.Negative pressure generator 23 with penetrate
The exhaust outlet connection of spray column 1 is flowed, the exhaust gas treating device for producing negative pressure, epitaxy technique has two cavitys, the He of negative pressure cavity 25
The region communicated before common pressure chamber 26, negative pressure generator 23 forms the region shape communicated after negative pressure cavity 25, negative pressure generator 23
Into common pressure chamber 26.Water inlet 19 is provided with storage tank 10, water intaking valve 20 is provided with water inlet 19, control the logical of water inlet 19
It is disconnected, feed water flow gauge 22 is additionally provided with, obtain inflow.Water inlet 19 is passed through constant stream, negative pressure cavity 25 and common pressure chamber 26
Fluid connection.Spill box 8 is in atmospheric pressure state, and its fluid infusion and negative pressure cavity 25 fluid connection, the turbid solution in spill box 8
Body is discharged from overfall 9, and troubled liquor is mainly SiO2White crystals thing.
The exhaust gas treating device of epitaxy technique provided by the utility model is conducive to steady production to stablize negative pressure device,
With city tap-water as aqueous solvent, the processes such as mixing, dissolving between gas-liquid two-phase are realized in the contact that tail gas passes through gas-liquid two-phase,
Requirement is absorbed to meet gas purification.By continual and steady moisturizing, certain water dissolves and absorbability are not only met, it is ensured that
Equipment is constantly in stabilization treatment state, while persistently discharging dissolving SiO by current2The troubled liquor of particle, the SiO of generation2
White crystals thing is effectively well mixed with water, is discharged with the overfall 9 of spill box 8, shuts down cleaning frequency reduction, is difficult to make filler
Felt jam, extends to and shuts down cleaning once in more than 60 days, SiO2The removal of white crystals thing is clean, the work of exhaust gas treating device
Efficiency is improved；SiO2White crystals thing is effectively well mixed with water, is not needed when removing the white crystals thing of floating on water a large amount of
Moisturizing and draining, water consumption is small, and water saving ability is good；Simple structure, it is easy to maintaining, low cost.
On the basis of above-mentioned specific embodiment, those skilled in the art can be according to the difference of specific occasion, externally
Prolonging the exhaust gas treating device of technique carries out including ejector in some changes, negative pressure generator 23 that ejector is used to spray liquid simultaneously
Ejection liquid is sprayed into common pressure chamber 26 after converging with the tail gas of exhaust outlet, flow of inlet water is also equipped with the inlet pipeline of ejector
Meter 22, obtains inflow.Common pressure chamber 26 offers purification gas outlet 21, by purification gas outlet 21 by gas-liquid separation
Purification gas discharge afterwards.Specifically, in the case where impeller of pump rotates at a high speed, liquid is sprayed with speed high from nozzle, high velocity stream
When dynamic liquid passes through mixing chamber, vacuum can be formed in mixing chamber, a large amount of gases are sucked by wireway, gas enters mixing chamber
Afterwards, it is vigorously mixed with liquid at trunnion, forms gas liquid mixture, discharged by anemostat, forms efficient in whole process
Material is transmitted, it is also possible to which gas is purified.The exhaust gas treating device of epitaxy technique realizes vacuum cavitations, using ejector negative pressure
Principle forms stabilization negative pressure, is conducive to steady production.
The exhaust gas treating device of above-mentioned epitaxy technique is only a kind of preferred scheme, is specifically not limited thereto, on this basis
Can make according to actual needs with targetedly adjusting, so as to obtain different implementation methods, also including air inlet tower 2, air inlet
The bottom of tower 2 is connected with storage tank 10 for carrying out washing dissolving for the first time to waste gas, and air inlet tower 2, air inlet are entered containing acid waste gas
Tower 2 is first order spray column, and washing dissolving for the first time is carried out to waste gas.Also include middle spray column 5, middle spray column 5 is the
Two grades of spray columns, middle spray column 5 is communicated between air inlet tower 2 and jet spray column 1, the bottom of middle spray column 5 and water storage
Case 10 is connected, and acid gas is fully absorbed by a large amount of disperse waters.Jet spray column 1 is third level spray column, is rotated by high speed
Current absorb remaining acid gas.Acid concentration can be made to drop to less than 0.5% from 10% by the acid gas of tertiary treatment, make its concentration of emission
Atmosphere pollution highest less than national Specification allows concentration of emission value.
Specifically, acid waste gas enter air inlet tower 2 by tail gas air inlet 4, it is preferable that in first half water inlet, under current,
Enter bottom storage tank 10 from top to down, TCS reacts when the upper space of storage tank 10 passes through cascade with water in tail gas, generation
SiO2Particle pours storage tank 10 by cascade.Waste gas enters middle spray column 5 from bottom, and middle spray column 5 has nozzle, middle
Spray column 5 can remove in removing exhaust gas more than 95% TCS, and a large amount of umbrella shape disperse waters that nozzle sprays are not mist-like, and acid is given up
Gas fully absorbs reaction, and whole Pall ring filler region is washed away in whereabouts covering, the SiO for generating reaction2Filler cannot be sticked to
Surface, prevents filling space to be crystallized thing and adheres to hardened blocking.Waste gas is internal in by entering incident flow spray column 1 communicating pipe
Between the structure of spray column 5 it is identical, with nozzle, the process tail gas and water for flowing through are fully contacted dissolving, effectively removal tail gas in it is molten
In the pernicious gas of water.Under the liquid level that the cylinder of jet spray column 1 will be immersed in storage tank 10, water seal is formed, prevent gas from entering
Gas tower 2 is directly entered jet spray column 1.The tail gas of washed purification is formed from the top gas outlet of jet spray column 1 by ejector
Depression generator suction, form gas-liquid mixed and enter common pressure chamber 26, the gas of purification discharges from common pressure chamber 26, accesses workshop
House steward's discharge is outdoor.
On the basis of above-mentioned specific embodiment, those skilled in the art can be according to the difference of specific occasion, externally
Prolonging the exhaust gas treating device of technique carries out some changes, with least two-layer nozzle spray in middle spray column 5 and jet spray column 1
Device 6, a large amount of umbrella shape disperse waters that nozzle spray equipment 6 sprays, are not mist-like, and sour waste gas are fully absorbed with reaction, are fallen
Whole Pall ring filler region is washed away in covering, the SiO for generating reaction2Filler surface cannot be sticked to, filling space quilt is prevented
Crystal adheres to hardened blocking.Every layer of lower section of nozzle spray equipment 6 is provided with packing layer, and packing layer can increase waste gas with water
Contact area, fully wetting, make waste gas fully be reacted with water, are dissolved in water, such as two-layer packing layer and two-layer big flow spray
Mouth spray equipment 6, the specific number of plies is unrestricted, can be according to particular condition in use depending on.
Between communicating pipe and middle spray column 5 and jet spray column 1 between middle spray column 5 and middle spray column 5
Water jet is provided with communicating pipe, the requirement of this water jet has disperse water to spray into pipeline, middle spray column 5 and jet are sprayed
Washing away communicating pipe for tower 1 is drenched, but water column can not seal the mouth of pipe, and smooth and negative pressure is not unstable otherwise to cause air-flow.
The side wall of middle spray column 5 and jet spray column 1 is provided with observation access hole, observation access hole be it is transparent, can
As observation window, while being also for taking out service ports during cleaning filler.
It is important to note that the exhaust gas treating device of epitaxy technique provided by the utility model is not intended to be limited to this
Situation is planted, the top of air inlet tower 2 is provided with inlet cylinder, easy cleaning.Inlet cylinder offers tail gas air inlet 4 and protective gas enters
Gas port 24, is opened in top, and protective gas can be nitrogen, is passed through appropriate nitrogen and plays a part of inertia protection, while dilution
Tail gas concentration, is also prevented from steam rising, and the air of air inlet tower 2 is cemented out, and prevents air from oxidation occurring with waste gas anti-
Should.
The top of inlet cylinder be provided with its axial identical rotary shaft, being fixed with rotary shaft to remove in inlet cylinder
Wall adheres to the scraper plate 3 of crystal, has gap between scraper plate 3 and the inwall of inlet cylinder, weekly in logical protective gas state, rotation
Rotate into gas port scraper plate 3 and once remove the crystal that air inlet may be adhered to, clear up inlet cylinder, prevent from blocking waste gas inlet.
Obviously, under the guidance of this thought, those skilled in the art can be according to the difference of specific occasion to above-mentioned
Specific embodiment carries out some changes, and the bottom of inlet cylinder is connected with ring flange, the edge of ring flange and the inwall of air inlet tower 2
Between there is annular gap, such as annular gap 3mm, the inlet of air inlet tower 2 is arranged at the top of ring flange, acid waste gas by
Waste gas inlet enters air inlet tower 2, and from top to down into bottom storage tank 10, in first half water inlet, water is by cylinder inboard wall 3mm
Annular gap is flowed down certainly, the SiO washed away on inner tube wall2Attachment, prevents adhesion from crystallizing, and TCS is on the top of storage tank 10 in tail gas
Reacted with water when space passes through ring-type cascade, the SiO of generation2Particle pours storage tank 10 by cascade, in tail gas air inlet 4 always
There is water to rinse, the SiO that TCS is generated with steam reaction2Air inlet inwall will not be adhered directly to, waste gas inlet is without blocking.Enter
Gas tower 2 is not provided with nozzle, prevents the steam water smoke produced by spray from ascending into air inlet and results in blockage.
The exhaust gas treating device of epitaxy technique provided by the utility model, in the case of other parts are immovable, air inlet
Inlet, the nozzle spray equipment 6, water jet of tower 2 are connected with spray pump 15, and filter 11 is in series with connecting line,
The import of spray pump 15 and the fluid connection of negative pressure cavity 25.Spray-water is all by the circulation-supplied of spray pump 15 of big flow, spray
Drench the water inlet of pump 15 and come from negative pressure cavity 25.Tail gas during whole washing process, passes through by the continuous washing process of circulation
The Pall ring of wetting and can reduce the usage amount of recirculated water by effective mixed dissolution in water in each chamber.
For the exhaust gas treating device of the epitaxy technique in above-mentioned each embodiment, the water surface site of negative pressure cavity 25 is provided with literary mound
In mixed flow nozzle 16, venturi mixed flow nozzle 16 is used for the SiO that will be formed on the water surface2Crystallization floating object is broken up and is sufficiently mixed with water
Uniformly.
In order to further optimize above-mentioned technical proposal, water inlet 19 is arranged on the storage tank 10 at common pressure chamber 26, overflow
Overflow pipe is provided with case 8, overflow pipe is connected with discharge outlet 12, draining valve 13 is provided with discharge outlet 12, control discharge outlet 12
Break-make.Troubled liquor in spill box 8 is discharged from the overfall 9 of overflow pipe, simple structure, and when normally running, water is whole only
Discharged from overfall 9, and overflow pipe is not provided with any valve, from the moisturizing of common pressure chamber 26, current is all flowed to spill box 8 and overflows
Stream.By continual and steady moisturizing, certain water dissolves and absorbability are not only met, it is ensured that equipment is constantly in stabilization treatment
State, while persistently discharging dissolving SiO by current2The troubled liquor of particle.The top of spill box 8 is provided with rinse spray head
28, the fluid connection of rinse spray first 28 and common pressure chamber 26 rinses the SiO deposited in spill box 82Attachment, prevents adhesion from tying
It is brilliant.The top of spill box 8 is provided with the normal pressure mouthful with atmosphere, keeps the atmospheric pressure state of spill box 8.
Another inventive concept provided by the utility model is to be provided with pressure sensor 7, pressure in negative pressure cavity 25
Sensor 7 is connected with VFC case 27, and VFC case 27 is connected with variable frequency pump 14, and variable frequency pump 14 is connected with ejector, becomes
Variable frequency pump flowmeter 18 is in series with connecting line between frequency pump 14 and ejector, detection enters the uninterrupted of ejector.
Stabilization negative pressure is formed using ejector principle of negative pressure, while by adjusting frequency conversion installed in the pressure sensor 7 of negative pressure cavity 25
Device controlling pump motor speed, ejector effluxvelocity is adjusted by adjusting the output pressure of pump and is realized to the regulation of negative pressure and steady
Fixed control, negative pressure regulation is stable and can change and quick response with air-flow, is affected in exhaust flow change pipe section
In the case of, automatically adjust negative-pressure vacuum pumping speed, it is ensured that production equipment stabilization negative regulation.
VFC case 27 is also connected with liquid-level switch 17, and liquid-level switch 17 is located in negative pressure cavity 25 and can measure negative pressure
Liquid height in chamber 25, is provided with two preset heights, a low value, a high level, when less than low value, termination of pumping；When being higher than
During high level, alarm is sent, it is ensured that equipment normal work.
, it is necessary to the orientation or position relationship of the instruction such as explanation, term top, bottom are base in description of the present utility model
In orientation shown in the drawings or position relationship, be for only for ease of description the utility model and simplify describe, rather than indicate or
Imply signified device or element and must have specific orientation, with specific azimuth configuration and operation, therefore it is not intended that
To limitation of the present utility model.
Each embodiment is described by the way of progressive in this specification, and what each embodiment was stressed is and other
The difference of embodiment, between each embodiment identical similar portion mutually referring to.
The foregoing description of the disclosed embodiments, enables professional and technical personnel in the field to realize or new using this practicality
Type.Various modifications to these embodiments will be apparent for those skilled in the art, determine herein
The General Principle of justice can in other embodiments be realized in the case where spirit or scope of the present utility model are not departed from.Cause
This, the utility model is not intended to be limited to the embodiments shown herein, and is to fit to and principles disclosed herein
The most wide scope consistent with features of novelty.
Claims (10)
1. a kind of exhaust gas treating device of epitaxy technique, it is characterised in that connected with the storage tank (10) including storage tank (10)
Jet spray column (1) for absorbing waste gas, and the negative pressure generator being connected with the exhaust outlet of the jet spray column (1)
(23) region for, being communicated before the negative pressure generator (23) forms phase after negative pressure cavity (25), the negative pressure generator (23)
Logical region forms common pressure chamber (26), and the water inlet (19) for being passed through constant stream is provided with the storage tank (10), described negative
Press the fluid connection of chamber (25) and the common pressure chamber (26)；Also include being in atmospheric pressure state and fluid infusion and the negative pressure cavity (25)
Fluid connection spill box (8), troubled liquor in the spill box (8) discharges from overfall (9).
2. the exhaust gas treating device of epitaxy technique according to claim 1, it is characterised in that in the negative pressure generator (23)
Including for spraying liquid and the ejection liquid is sprayed into the common pressure chamber (26) after converging with the tail gas of the exhaust outlet
Ejector, the common pressure chamber (26) is offered the purification gas outlet (21) of the purification gas discharge after gas-liquid separation.
3. the exhaust gas treating device of epitaxy technique according to claim 2, it is characterised in that also including bottom and the water storage
Case (10) connects the air inlet tower (2) for carrying out washing dissolving for the first time to waste gas；
Also including being communicated between the air inlet tower (2) and the jet spray column (1) is used to absorb acid gas by disperse water
Middle spray column (5), the bottom of the middle spray column (5) connects with the storage tank (10)；
The cylinder of the jet spray column (1) immerses the interior underwater of the storage tank (10).
4. the exhaust gas treating device of epitaxy technique according to claim 3, it is characterised in that the middle spray column (5) and
There is at least two-layer nozzle spray equipment (6), every layer of nozzle spray equipment (6) lower section sets in the jet spray column (1)
It is equipped with packing layer；
Communicating pipe and the middle spray column (5) between the middle spray column (5) and the middle spray column (5) with it is described
Water jet is provided with communicating pipe between jet spray column (1)；
The side wall of the middle spray column (5) and the jet spray column (1) is provided with observation access hole.
5. the exhaust gas treating device of epitaxy technique according to claim 4, it is characterised in that the top of the air inlet tower (2)
Inlet cylinder is provided with, the inlet cylinder offers tail gas air inlet (4) and protective gas air inlet (24)；
The top of the inlet cylinder be provided with its axial identical rotary shaft, be fixed with the rotary shaft can remove it is described
Inlet cylinder inwall adheres to the scraper plate (3) of crystal, has gap between the scraper plate (3) and the inwall of the inlet cylinder.
6. the exhaust gas treating device of epitaxy technique according to claim 5, it is characterised in that the bottom connection of the inlet cylinder
There is ring flange, there is annular gap, the air inlet tower (2) between the edge of the ring flange and the inwall of the air inlet tower (2)
Inlet be arranged at the top of the ring flange.
7. the exhaust gas treating device of epitaxy technique according to claim 6, it is characterised in that the feed liquor of the air inlet tower (2)
Mouth, the nozzle spray equipment (6), the water jet are connected with spray pump (15), the import of the spray pump (15) with
The fluid connection of the negative pressure cavity (25).
8. the exhaust gas treating device of the epitaxy technique according to claim any one of 1-7, it is characterised in that the negative pressure cavity
(25) the crystallization floating object that water surface site is provided with for will be formed on the water surface is broken up and is sufficiently mixed uniform venturi with water and mixes
Flow nozzle (16).
9. the exhaust gas treating device of the epitaxy technique according to claim any one of 1-7, it is characterised in that the water inlet
(19) it is arranged on the storage tank (10) at the common pressure chamber (26) place, overflow pipe is provided with the spill box (8), it is described
Troubled liquor in spill box (8) is discharged from the overfall (9) of the overflow pipe；
Rinse spray head (28), rinse spray head (28) and the common pressure chamber are provided with the top of the spill box (8)
(26) fluid connection；
The top of the spill box (8) is provided with the normal pressure mouthful with atmosphere.
10. the exhaust gas treating device of the epitaxy technique according to claim any one of 1-7, it is characterised in that the negative pressure cavity
(25) pressure sensor (7) is installed in, the pressure sensor (7) is connected with VFC case (27), the VFC
Case (27) is connected with variable frequency pump (14), and the variable frequency pump (14) is connected with the ejector；
The VFC case (27) is also connected with liquid-level switch (17), and the liquid-level switch (17) is positioned at the negative pressure cavity (25)
It is interior and the negative pressure cavity (25) interior liquid height can be measured.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201621353266.5U CN206285705U (en) | 2016-12-09 | 2016-12-09 | A kind of exhaust gas treating device of epitaxy technique |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201621353266.5U CN206285705U (en) | 2016-12-09 | 2016-12-09 | A kind of exhaust gas treating device of epitaxy technique |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN206285705U true CN206285705U (en) | 2017-06-30 |
Family
ID=59096708
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201621353266.5U Withdrawn - After Issue CN206285705U (en) | 2016-12-09 | 2016-12-09 | A kind of exhaust gas treating device of epitaxy technique |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN206285705U (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN106492613A (en) * | 2016-12-09 | 2017-03-15 | 上海至纯洁净系统科技股份有限公司 | A kind of exhaust gas treating device of epitaxy technique |
| CN108568175A (en) * | 2018-04-28 | 2018-09-25 | 江西诺发科技有限公司 | A kind of gas stirring device heated in rinsing type waste gas treatment equipment |
-
2016
- 2016-12-09 CN CN201621353266.5U patent/CN206285705U/en not_active Withdrawn - After Issue
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN106492613A (en) * | 2016-12-09 | 2017-03-15 | 上海至纯洁净系统科技股份有限公司 | A kind of exhaust gas treating device of epitaxy technique |
| CN106492613B (en) * | 2016-12-09 | 2023-11-03 | 上海至纯洁净系统科技股份有限公司 | Tail gas processor for epitaxial process |
| CN108568175A (en) * | 2018-04-28 | 2018-09-25 | 江西诺发科技有限公司 | A kind of gas stirring device heated in rinsing type waste gas treatment equipment |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN106492613A (en) | A kind of exhaust gas treating device of epitaxy technique | |
| CN206285705U (en) | A kind of exhaust gas treating device of epitaxy technique | |
| CN209020110U (en) | A kind of high-speed rotational formula spray purification tower | |
| CN208678794U (en) | Utilize the desulfurizing tower of filter mud of sugar refinery | |
| CN210473513U (en) | Spray tower with pneumatic spiral-flow type | |
| CN110694452A (en) | Cracked waste gas alkaline washing spray tower for battery recovery based on electromagnetic induction | |
| CN220334936U (en) | Zeolite aeration biological filter tank for domestic sewage treatment | |
| CN108782162A (en) | A kind of water-saving gardens environmental protection irrigation equipment | |
| CN210963960U (en) | Novel steam concentration equipment for preparing liquid medicine | |
| CN207778689U (en) | A kind of the Raw-fresh Areas of Supermarkets humidifier | |
| CN207142913U (en) | The filter membrane equipment of self-coupling type installation | |
| KR200379538Y1 (en) | agitation system | |
| CN207259196U (en) | Air supporting removal of impurities water purifier | |
| CN207391053U (en) | A kind of dissolved gas floatator | |
| CN207567071U (en) | A kind of organic matter separating and filtering device applied to sewage disposal | |
| CN220334908U (en) | Waste water treatment device for ceramic fiber paper production | |
| CN206008190U (en) | Multicarity big flow hydro powered well strainer | |
| CN219823743U (en) | Washing and dyeing wastewater treatment equipment | |
| CN215027376U (en) | Dust collector is used in trinity mortar production | |
| CN218501355U (en) | Sedimentation tank sewage discharging equipment | |
| CN210752049U (en) | Avoid spray column of jam | |
| CN216395821U (en) | Rotary spherical filler washing tower device | |
| CN211954702U (en) | Rain test bed for railway vehicle | |
| CN221045795U (en) | Spray tower | |
| CN212450758U (en) | Electrophoresis waste water zero release integrated system |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| GR01 | Patent grant | ||
| GR01 | Patent grant | ||
| CP02 | Change in the address of a patent holder |
Address after: No. 170 purple sea road, Minhang District, Shanghai Patentee after: PURE & CLEAN PROCESS SYSTEMS Co.,Ltd. Address before: 200241 03A 1, Ting 1 building, 555 Dongchuan Road, Minhang District, Shanghai. Patentee before: PURE & CLEAN PROCESS SYSTEMS Co.,Ltd. |
|
| CP02 | Change in the address of a patent holder | ||
| AV01 | Patent right actively abandoned |
Granted publication date: 20170630 Effective date of abandoning: 20231103 |
|
| AV01 | Patent right actively abandoned |
Granted publication date: 20170630 Effective date of abandoning: 20231103 |
|
| AV01 | Patent right actively abandoned | ||
| AV01 | Patent right actively abandoned |