CN206258075U - Micro-displacement measuring device based on symmetrical expression Variable line-space gratings frequency multiplier type frame of reference - Google Patents
Micro-displacement measuring device based on symmetrical expression Variable line-space gratings frequency multiplier type frame of reference Download PDFInfo
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- CN206258075U CN206258075U CN201620682281.8U CN201620682281U CN206258075U CN 206258075 U CN206258075 U CN 206258075U CN 201620682281 U CN201620682281 U CN 201620682281U CN 206258075 U CN206258075 U CN 206258075U
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Abstract
The utility model discloses a kind of micro-displacement measuring device based on symmetrical expression Variable line-space gratings frequency multiplier type frame of reference, equidistant grating cannot meet some in particular cases for spherical aberration under solving existing light path, the problem of the requirements such as distortion, solve and realize doubling in the certainty of measurement of original common light path in original Variable line-space gratings, including：Light source, beam divider, symmetrical expression Variable line-space gratings, lens, speculum limits optical slits, photodetector.Light source sends single color plane ripple and is incided on lens (3) through beam divider, is adjusted to directional light by grating (4).Directional light is focused at the m points on reflective mirror (6) by lens (5), is reflected through reflective mirror (6), then through lens (5), is adjusted to directional light, is incided on grating on (4), forms interference.Interference light is focused on photodetector (8) through lens (3), beam divider (2) and limit optical slits (7).In actual applications, light path design is easy for the utility model, and small volume meets practical situations.
Description
Technical field
The present invention relates to a kind of new structure displacement detector, more particularly to a kind of symmetrical expression Variable line-space gratings reading knot
Structure
Background technology
Grating examinations are used at present, there is features simple structure, the characteristics of data processing is simple.Therefore, displacement is carried out using grating
Detection has a wide range of applications in industry-by-industry.In micro-displacement field, the resolution capability of detection has to the performance of whole device
Conclusive influence.Relatively conventional grating, it is generally at equal intervals, it is impossible to meet some in particular cases to spherical aberration, abnormal
Change etc. is required.
The content of the invention
It is contemplated that inventing, a kind of structure is relatively simple, disclosure satisfy that the frequency multiplier type of the Variable line-space gratings of special circumstances is read
Number system.The system has relatively simple architectural feature, and resolution ratio is realized doubling on the basis of original.
The device include light source (1), beam divider (2), symmetrical expression Variable line-space gratings (4), the first and second lens (3), instead
Penetrate mirror (6), limit optical slits (7), photodetector (8).Light source sends single color plane ripple and incides the first lens (3) through beam divider
On, directional light is adjusted to by grating (4).Directional light is focused at the m points on reflective mirror (6) by the second lens (5), through anti-
Light microscopic (6) reflects, then through the second lens (5), is adjusted to directional light, incides on grating on (4), forms interference.Interference light is passed through
First lens (3), beam divider (2) and limit optical slits (7) are focused on photodetector (8).
Using a kind of new symmetrical expression Variable line-space gratings, with middle cutting as line of symmetry, both sides are according to grade difference for grating
Row change, can obtain the corresponding relation of displacement and grating light intensity period of change.
Beneficial effect of the present invention：Light channel structure is relatively simple, and resolution ratio is realized doubling on the original basis, becomes spacing
Symmetrical expression grating can meet some requirements in particular cases being distorted to spherical aberration relative to common grating.
Brief description of the drawings
Fig. 1, symmetrical expression Variable line-space gratings light path schematic diagram
Fig. 2, symmetrical expression Variable line-space gratings schematic diagram
Fig. 3, symmetrical expression Variable line-space gratings transmitance schematic diagram
Specific embodiment
As shown in figure 1, light source sends single color plane ripple being incided on the first lens (3) through beam divider, directional light is adjusted to
By grating (4).Directional light is focused at the m points on reflective mirror (6) by the second lens (5), is reflected through reflective mirror (6), then
Through the second lens (5), directional light is adjusted to, incided on grating on (4), form interference.Interference light is through the first lens (3), analysis
Light microscopic (2) and limit optical slits (7) are focused on photodetector (8).By detector (8) output signal.
As shown in Fig. 2 grating with intermediate raster with middle cutting as line of symmetry, both sides change according to difference series.
A cycle P0It is mP1(P1＞ 0, m are positive integer) grating G1Amplitude transmittance g (x0) can in a cycle
It is expressed as：
It is expressed as with Fourier space
If A=1, willIn substitution formula
Periodic function g as shown in Figure 31(x0), the cycleLevel grating missing is can be considered original 2,4,5 ...
In the case of, displacement is qP1M g (x0) superposition, be represented by with Fourier space
If the Ronchi gratings G of another cycle P '2, there are a small angle theta, its amplitude transmission in grid line direction with Y-axis
Rate
Work as P '=mP1=P0, G1With G2Superposition when its intensity transmitance
I=| g1(x)|2|g2(x, y) |2.
For convenience, ignore high-order term, have
According to designed index path 1, grating interference corresponding with the generation of its mirror image.
Therefore, θ=0.
In formula, Section 1 is high frequency.
M=1, θ=0, q=0 are substituted into formula, high-order term is neglected, obtained
It is achieved thereby that the precision of whole measurement is doubled.
The above, the only present invention preferably specific embodiment, but protection scope of the present invention is not limited thereto.
Any those of ordinary skill in the art in the technical scope that invention is disclosed, technology according to the present invention scheme and inventive concept
It is subject to equivalent or change, should be all included within the scope of the present invention.
Claims (3)
1. the micro-displacement measuring device based on symmetrical expression Variable line-space gratings frequency multiplier type frame of reference, including light source, beam divider, symmetrically
Formula Variable line-space gratings, lens, speculum limit optical slits, and photodetector, light source sends single color plane ripple and incided through beam divider
On first lens (3), directional light is adjusted to by grating (4), directional light is focused on reflective mirror (6) by the second lens (5)
M points at, reflected through reflective mirror (6), then through the second lens (5), be adjusted to directional light, incide on grating (4), form dry
Relate to, interference light is focused on photodetector (8) through the first lens (3), beam divider (2) and limit optical slits (7).
2. the micro-displacement measuring device based on symmetrical expression Variable line-space gratings frequency multiplier type frame of reference according to claim 1,
It is characterized in that：Symmetrical expression Variable line-space gratings are interfered with its own mirror image.
3. the micro-displacement measuring device of symmetrical expression Variable line-space gratings frequency multiplier type frame of reference according to claim 1, it is special
Levy and be：Using a kind of new symmetrical expression Variable line-space gratings, with middle cutting as line of symmetry, both sides are according to arithmetic progression for grating
Change, can obtain the corresponding relation of displacement and grating light intensity period of change.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201620682281.8U CN206258075U (en) | 2016-06-23 | 2016-06-23 | Micro-displacement measuring device based on symmetrical expression Variable line-space gratings frequency multiplier type frame of reference |
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201620682281.8U CN206258075U (en) | 2016-06-23 | 2016-06-23 | Micro-displacement measuring device based on symmetrical expression Variable line-space gratings frequency multiplier type frame of reference |
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| CN206258075U true CN206258075U (en) | 2017-06-16 |
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| CN201620682281.8U Expired - Fee Related CN206258075U (en) | 2016-06-23 | 2016-06-23 | Micro-displacement measuring device based on symmetrical expression Variable line-space gratings frequency multiplier type frame of reference |
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN110174244A (en) * | 2019-06-11 | 2019-08-27 | 中国科学技术大学 | A kind of the line density test macro and test method of planar substrates Variable line-space gratings |
-
2016
- 2016-06-23 CN CN201620682281.8U patent/CN206258075U/en not_active Expired - Fee Related
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN110174244A (en) * | 2019-06-11 | 2019-08-27 | 中国科学技术大学 | A kind of the line density test macro and test method of planar substrates Variable line-space gratings |
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| Date | Code | Title | Description |
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| GR01 | Patent grant | ||
| CF01 | Termination of patent right due to non-payment of annual fee | ||
| CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20170616 Termination date: 20180623 |