CN206250162U - Silicon chip moisture film water trap - Google Patents
Silicon chip moisture film water trap Download PDFInfo
- Publication number
- CN206250162U CN206250162U CN201621398295.3U CN201621398295U CN206250162U CN 206250162 U CN206250162 U CN 206250162U CN 201621398295 U CN201621398295 U CN 201621398295U CN 206250162 U CN206250162 U CN 206250162U
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- CN
- China
- Prior art keywords
- silicon chip
- tank
- locating back
- moisture film
- conveying roller
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- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn - After Issue
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Abstract
The utility model is related to silicon chip production equipment technical field,More particularly, to a kind of silicon chip moisture film water trap,Including tank,One end of the tank is the input of silicon chip,The other end of the tank is the output end of silicon chip,The conveying roller being provided with for conveying silicon chip is rotated in the tank,The tank is externally provided with the motor for driving conveying roller to rotate,The tank is provided with locating back,The locating back is located at conveying roller top,The locating back has horizontal segment and guide section,The guide section is located on tank near one end of input,The horizontal segment is plane,The utility model can effectively remove the unnecessary water of silicon chip moisture film,So that moisture film is uniformly paved on silicon chip,Good applicability,Reduce production cost,Avoid the moisture film on silicon chip and can overflow and cause acid solution concentration in etching groove to diminish in etching groove,In order to reach the concentration of requirement,Constantly to increase and be measured for acid,Virtually increased the problem of production cost.
Description
Technical field
The utility model is related to silicon chip production equipment technical field, more particularly, to a kind of silicon chip moisture film water trap.
Background technology
So-called etching, actually photoetching corrosion, first pass through photoetching carries out photolithographic exposure treatment, Ran Houtong by photoresist
Cross other manner and realize the part that corrosion treatment is removed needed for falling.With the development of micro manufacturing technique；Be etched into by solution,
Reactive ion or other machinery mode are referred to as peeling off, remove a kind of of material, a kind of pervasive call as micro Process manufacture,
Refer to be made a return journey using the chemical reaction between solution and pre-embossed corrosion material and wet etching is a pure chemical reaction process
Etching purpose is reached except the part sheltered for masked membrane material.
Etching machine sprays soverlay technique using moisture film, and the spray water film on silicon chip is adsorbed water using SiO2 hydrophilies
Surface, makes diffusingsurface PN junction not be subject to destruction, and light-receiving area, raising efficiency are increased to greatest extent simultaneously electric leakage is reduced.
It is the important channel for preventing silicon chip from spending quarter plus moisture film in non-diffusing face, and in actual production process, on silicon chip
Moisture film can overflow and cause acid solution concentration in etching groove to diminish in etching groove, it is continuous in order to reach the concentration of requirement
Increase and measured for acid, virtually increased production cost.
Utility model content
The technical problems to be solved in the utility model is：Cause to carve in etching groove in order to the moisture film solved on silicon chip can overflow
Acid solution concentration diminishes in erosion groove, in order to reach the concentration of requirement, constantly to increase and be measured for acid, virtually increased production
The problem of cost, now there is provided a kind of silicon chip moisture film water trap.
The utility model solves the technical scheme that its technical problem used：A kind of silicon chip moisture film water trap, it is special
Levy and be：Including tank, one end of the tank is the input of silicon chip, and the other end of the tank is the output end of silicon chip,
The conveying roller being provided with for conveying silicon chip is rotated in the tank, the tank is externally provided with the electricity for driving conveying roller to rotate
Machine, the tank is provided with locating back, and the locating back is located at conveying roller top, and the locating back has horizontal segment and leads
To section, the guide section is located on tank near one end of input, and the horizontal segment is plane, and the guide section is along silicon chip
Conveying direction is the first downward-sloping inclined-plane, and the low side of the guide section is fixedly connected with the horizontal segment, the locating back
Bottom surface is provided with liquid separatnig plate, and the liquid separatnig plate is located at guide section, the liquid separatnig plate bottom surface and the horizontal segment bottom surface phase
Mutually horizontally disposed, the liquid separatnig plate is equipped with the second inclined-plane along the both sides of conveying roller axial direction, and the second of the liquid separatnig plate both sides is oblique
Face is gradually inclined upwardly from inside to outside along the conveying direction of silicon chip, and the tank is provided with for controlling locating back to be close to or remote
From the governor motion of conveying roller.Silicon chip is input into by the input of tank, drives conveying roller to rotate and conveyed to silicon chip by motor,
Then separation discharge is carried out by the water unnecessary to moisture film on silicon chip of the guide section and liquid separatnig plate on locating back, then by locating back
Horizontal segment the moisture film on silicon chip is paved and applied treatment, then by tank output end export so that the water on silicon chip
It is flat to keep uniform, it is ensured that after silicon chip enters etching groove, the moisture film on silicon chip will not be overflowed in the etching groove of drippage, while logical
Control and regulation mechanism is crossed, the silicon chip of different-thickness is applicable to.
Further, the governor motion includes the support and screw rod that are fixedly installed on tank, and the locating back is slided
Set on support, one end of the screw rod is threadedly coupled with the support, and the other end of the screw rod is rotated with the locating back
Connection.Spacing between locating back and conveying roller can be adjusted by the screw rod in adjusting bracket, it is convenient and swift.
Further, the locating back is provided with sliding block, and the support is provided with and is provided with chute along tank vertical direction, institute
Sliding block is stated to be slidably arranged in chute.Coordinated by sliding block and chute, certain position-limiting action is played to locating back so that flattened
Plate is reliable and stable when in use.
Further, the screw rod is provided with handwheel away from one end of locating back.Being capable of quick regulation pressure by adjusting handle
Spacing between flat board and conveying roller.
The beneficial effects of the utility model are：When in use, silicon chip is by tank for the utility model silicon chip moisture film water trap
Input input, by motor drive conveying roller rotate and to silicon chip convey, then by the guide section on locating back and point
The liquid plate water unnecessary to moisture film on silicon chip carries out separation discharge, then the moisture film on silicon chip is spread by the horizontal segment on locating back
Flat and applied treatment, then exported by the output end of tank so that the level on silicon chip keeps uniform, it is ensured that enters in silicon chip and loses
After cutting, the moisture film on silicon chip will not be overflowed in the etching groove of drippage, while by controlling to adjust mechanism, being applicable to different thickness
The silicon chip of degree, the utility model can effectively remove the unnecessary water of silicon chip moisture film so that moisture film is uniformly paved on silicon chip, good
Good applicability, reduces production cost, it is to avoid the moisture film on silicon chip can overflow and in etching groove cause acid molten in etching groove
Liquid concentration diminishes, and in order to reach the concentration of requirement, constantly to increase and be measured for acid, virtually increased the problem of production cost.
Brief description of the drawings
The utility model is further illustrated with reference to the accompanying drawings and examples.
Fig. 1 is the front view of the utility model silicon chip moisture film water trap；
Fig. 2 is the left view of the utility model silicon chip moisture film water trap；
Fig. 3 is the internal structure schematic diagram of the utility model silicon chip moisture film water trap；
Fig. 4 is the locating back of the utility model silicon chip moisture film water trap and the three dimensional structure diagram of liquid separatnig plate.
In figure：1st, tank, 101, input, 102, output end, 2, silicon chip, 3, conveying roller, 4, motor, 5, locating back,
501st, horizontal segment, 502, guide section, 503, sliding block, 6, liquid separatnig plate, 7, support, 701, chute, 8, screw rod, 9, handwheel.
Specific embodiment
Presently in connection with accompanying drawing, the utility model is described in more detail.These accompanying drawings are simplified schematic diagram,
Basic structure of the present utility model is only illustrated in a schematic way, therefore it only shows the composition relevant with the utility model.
Embodiment
As shown in Figures 2 and 3, a kind of silicon chip moisture film water trap, including tank 1, one end of the tank 1 is silicon chip 2
Input 101, the other end of the tank 1 is to rotate to be provided with the six roots of sensation for defeated in the output end 102 of silicon chip 2, the tank 1
The conveying roller 3 of silicon chip 2, the tank 1 is sent to be externally provided with the motor 4 for driving conveying roller 3 to rotate, motor 4 is by external electricity
Source is accessed, and by the keying of peripheral control unit controlled motor 4, between motor 4 and conveying roller 3 and conveying roller 3 and conveying roller 3 it
Between be driven by the kind of drive of sprocket wheel chain, as shown in figure 4, the tank 1 is provided with locating back 5, the locating back 5
In the top of the conveying roller 3, the locating back 5 has horizontal segment 501 and guide section 502, and the guide section 502 is located at tank 1
Upper one end near input 101, the horizontal segment 501 is plane, the guide section 502 along the conveying direction of silicon chip 2 be to
Under inclined first inclined-plane, the low side of the guide section 502 is fixedly connected with the horizontal segment 501, the bottom surface of the locating back 5
It is provided with liquid separatnig plate 6, the liquid separatnig plate 6 is located at guide section 502, the bottom surface of the liquid separatnig plate 6 and the bottom surface of the horizontal segment 501
Mutually horizontally disposed, the liquid separatnig plate 6 is equipped with the second inclined-plane along the both sides of the axial direction of conveying roller 3, and the of the both sides of the liquid separatnig plate 6
Two inclined-planes are gradually inclined upwardly from inside to outside along the conveying direction of silicon chip 2, and the tank 1 is provided with for controlling locating back 5 to lean on
Closely or away from the governor motion of conveying roller 3.
As shown in figure 1, the governor motion includes the support 7 and screw rod 8 that are fixedly installed on tank 1, the locating back 5
Slide and set on support 7, one end of the screw rod 8 is threadedly coupled with the support 7, the other end of the screw rod 8 and the pressure
Flat board 5 rotates connection.The screw rod 8 is provided with handwheel 9 away from one end of locating back 5.
The locating back 5 is provided with sliding block 503, and the support 7 is provided with to be provided with to be parallel to each other along the vertical direction of tank 1 and sets
Two chutes 701 put, the sliding block 503 is slidably arranged in chute 701.
Above-mentioned silicon chip moisture film water trap when in use, will coat moisture film on silicon chip 2, concrete operation step is as follows：It is first
Structure is first controlled to adjust according to the thickness of silicon chip 2, by the handwheel 9 on adjusting screw rod 8, screw rod 8 drives the displacement of locating back 5,
Slided in chute 701 of the sliding block 503 on locating back 5 on support 7 simultaneously so that the spacing between locating back 5 and conveying roller 3
Distance needed for reaching silicon chip 2, restarts motor 4, and motor 4 is rotated with the conveying roller 3 in dynamic water tank 1, and silicon chip 2 is placed on into water
On the conveying roller 3 of the input 101 of groove 1, conveying roller 3 drives silicon chip 2 to the direction displacement of output end 102, and the moisture film on silicon chip 2 is first
First contacted with liquid separatnig plate 6, the second inclined-plane of the both sides of liquid separatnig plate 6 separates water unnecessary on moisture film to both sides, with the position of silicon chip 2
Move, the moisture film on silicon chip 2 is contacted and separated again with the first hypotenuse of locating back 5, when silicon chip 2 is by the horizontal segment of locating back 5
When 501, because horizontal segment 501 is plane, the moisture film on silicon chip 2 is smeared and paved, last silicon chip 2 is defeated by tank 1
Go out end 102 to export, that is, complete the treatment to moisture film on silicon chip 2；By controlling to adjust mechanism, the silicon chip of different-thickness is applicable to
2, applicability is good, is coordinated with chute 701 by sliding block 503, and certain position-limiting action is played to locating back 5 so that locating back 5 exists
It is reliable and stable when using；The utility model first passes through the second inclined-plane of the both sides of liquid separatnig plate 6 by moisture film compared with common flat board
Unnecessary water is separated to both sides, and first the water on a part of moisture film can be separated, and ordinary flat is separating unnecessary water
During film, flat board is possible to separate excessively moisture film, causes moisture film on silicon chip 2 uneven.
Above-mentioned is enlightenment according to desirable embodiment of the present utility model, by above-mentioned description, relevant staff
Various changes and amendments can be carried out in the range of without departing from this utility model technological thought completely.This practicality
New technical scope is not limited to the content on specification, it is necessary to determine its according to right technical
Scope.
Claims (4)
1. a kind of silicon chip moisture film water trap, it is characterised in that：Including tank (1), one end of the tank (1) is silicon chip (2)
Input (101), the other end of the tank (1) is to rotate to set in the output end (102) of silicon chip (2), the tank (1)
Have for conveying the conveying roller of silicon chip (2) (3), the tank (1) is externally provided with the motor (4) for driving conveying roller (3) to rotate,
The tank (1) is provided with locating back (5), and the locating back (5) is positioned at the conveying roller (3) top, locating back (5) tool
There are horizontal segment (501) and guide section (502), the guide section (502) is close to one end of input (101) on tank (1),
The horizontal segment (501) is plane, and the guide section (502) is the first downward-sloping inclined-plane along the conveying direction of silicon chip (2),
The low side of the guide section (502) is fixedly connected with the horizontal segment (501), and locating back (5) bottom surface is provided with liquid separatnig plate
(6), the liquid separatnig plate (6) is positioned at guide section (502) place, liquid separatnig plate (6) bottom surface and the horizontal segment (501) bottom surface
Mutually horizontally disposed, the liquid separatnig plate (6) is equipped with the second inclined-plane, the liquid separatnig plate (6) two along the both sides of conveying roller (3) axial direction
Second inclined-plane of side is gradually inclined upwardly from inside to outside along the conveying direction of silicon chip (2), and the tank (1) is provided with for controlling
Locating back (5) is close to or away from the governor motion of conveying roller (3).
2. silicon chip moisture film water trap according to claim 1, it is characterised in that：The governor motion includes being fixedly installed
Support (7) and screw rod (8) on tank (1), the locating back (5) are slided and are set on support (7), and the one of the screw rod (8)
End is threadedly coupled with the support (7), and the other end of the screw rod (8) is rotated with the locating back (5) and is connected.
3. silicon chip moisture film water trap according to claim 2, it is characterised in that：The locating back (5) is provided with sliding block
(503), the support (7) is provided with and is provided with chute (701) along tank (1) vertical direction, and the sliding block (503) is slidably arranged in
In chute (701).
4. silicon chip moisture film water trap according to claim 2, it is characterised in that：The screw rod (8) is away from locating back (5)
One end be provided with handwheel (9).
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201621398295.3U CN206250162U (en) | 2016-12-19 | 2016-12-19 | Silicon chip moisture film water trap |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201621398295.3U CN206250162U (en) | 2016-12-19 | 2016-12-19 | Silicon chip moisture film water trap |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN206250162U true CN206250162U (en) | 2017-06-13 |
Family
ID=59007898
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201621398295.3U Withdrawn - After Issue CN206250162U (en) | 2016-12-19 | 2016-12-19 | Silicon chip moisture film water trap |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN206250162U (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN106653656A (en) * | 2016-12-19 | 2017-05-10 | 常州亿晶光电科技有限公司 | Silicon chip water film dewatering device |
| CN111879229A (en) * | 2020-08-04 | 2020-11-03 | 淮南师范学院 | Thickness detection mechanism utilizing Hall sensing |
-
2016
- 2016-12-19 CN CN201621398295.3U patent/CN206250162U/en not_active Withdrawn - After Issue
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN106653656A (en) * | 2016-12-19 | 2017-05-10 | 常州亿晶光电科技有限公司 | Silicon chip water film dewatering device |
| CN111879229A (en) * | 2020-08-04 | 2020-11-03 | 淮南师范学院 | Thickness detection mechanism utilizing Hall sensing |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| GR01 | Patent grant | ||
| GR01 | Patent grant | ||
| AV01 | Patent right actively abandoned |
Granted publication date: 20170613 Effective date of abandoning: 20230627 |
|
| AV01 | Patent right actively abandoned |
Granted publication date: 20170613 Effective date of abandoning: 20230627 |
|
| AV01 | Patent right actively abandoned | ||
| AV01 | Patent right actively abandoned |