CN206222719U - A kind of solar selectively absorbing coating - Google Patents
A kind of solar selectively absorbing coating Download PDFInfo
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- CN206222719U CN206222719U CN201620961930.8U CN201620961930U CN206222719U CN 206222719 U CN206222719 U CN 206222719U CN 201620961930 U CN201620961930 U CN 201620961930U CN 206222719 U CN206222719 U CN 206222719U
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
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- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
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Abstract
The utility model is on a kind of solar selectively absorbing coating, described includes substrate, infrared reflecting layer, absorbed layer and anti-reflection layer successively from bottom to surface, described absorbed layer is made up of the first subgrade, the second subgrade and the 3rd subgrade, refractive index of the first described subgrade in the wave-length coverage of 300 2500nm is 1.70 7.33, the second described subgrade refractive index in the wave-length coverage of 300 2500nm is 2.17 4.70, and described the 3rd subgrade refractive index in the wave-length coverage of 300 2500nm is 2.2 2.5.The first described subgrade is contacted with infrared reflecting layer, and the 3rd described subgrade is contacted with anti-reflection layer.A kind of metal nitrogen (oxygen) compound solar selectively absorbing coating that the utility model is provided, improves the operating temperature of metal nitrogen (oxygen) compound solar selectively absorbing coating, and prepare simple, large-scale production preferably.
Description
Technical field
The utility model is related to a kind of coating, more particularly to a kind of solar selectively absorbing coating.
Background technology
Coating for selective absorption of sunlight spectrum is solar thermal collector photothermal deformation core material, and it is in wave-length coverage
0.3-2.5 μm of sunshine wave band has high-absorbility, has in the infrared emanation wave band that wave-length coverage is 2.5-50 μm low
Radiance, therefore can realize that high-selenium corn Low emissivity radiates, heat energy is converted solar energy into greatest extent.Coating for selective absorption
According to the difference of operating temperature, can be divided into：Low temperature coating (being less than 100 DEG C), middle temperature coating (100-400 DEG C) and high temperature coating
(being higher than 400 DEG C).Wherein, low temperature coating is mainly used in solar water heater, middle temperature coating be mainly used in industrial process heat production,
Desalinization and solar water heater, high temperature coating are mainly used in centralized solar energy thermal-power-generating.
Heat collector operating temperature is higher, and heat resistance, antioxygenic property, the high/low temperature circulation to coating for selective absorption are steady
It is qualitative to wait requirement higher.Wherein, metal nitrogen (oxygen) compound is one of the most frequently used spectral selective absorbing coating, but, it is based on
The spectral selective absorbing coating that metal nitrogen (oxygen) compound absorbs is mainly used in middle low temperature field, because, based on metal nitrogen (oxygen)
The spectral selective absorbing coating that compound absorbs is raised with operating temperature, and coating performance can deteriorate, and is mainly had the reason for deterioration：1)
Diffusion occurs between infrared reflective metallic and metal nitrogen (oxygen) compound absorbed layer causes radiance rising, absorptivity to decline；2)
Metal nitrogen (oxygen) compound is oxidized under the high temperature conditions under atmospheric environment, absorptivity reduction.
Therefore, the operating temperature of the spectral selective absorbing coating for being absorbed based on metal nitrogen (oxygen) compound is had much room for improvement.
Utility model content
Main purpose of the present utility model is, there is provided a kind of solar selectively absorbing coating, technology to be solved
Problem is to improve the spectral selective absorbing coating operating temperature that metal nitrogen (oxygen) compound absorbs, thus more suitable for practicality.
The purpose of this utility model and solve its technical problem using following technical scheme and realize.
According to the utility model proposes a kind of solar selectively absorbing coating, described coating from bottom to surface according to
It is secondary including substrate, infrared reflecting layer, absorbed layer and anti-reflection layer, described absorbed layer is by the first subgrade, the second subgrade and Sanya
Layer composition, the 3rd described subgrade is contacted with anti-reflection layer.
The purpose of this utility model and solve its technical problem and can also be applied to the following technical measures to achieve further.
Preferably, foregoing a kind of solar selectively absorbing coating, wherein the first described subgrade is in 300-2500nm
Wave-length coverage in refractive index be 1.70-7.33, extinction coefficient is 2.80-7.81.
Preferably, foregoing a kind of solar selectively absorbing coating, wherein the second described subgrade is in 300-2500nm
Wave-length coverage in refractive index be 2.17-4.70, extinction coefficient 1.40-1.80 in the range of 300-1250nm, be more than
2000nm wavelength is less than 0.9.
Preferably, foregoing a kind of solar selectively absorbing coating, wherein the 3rd described subgrade is in 300-2500nm
Wave-length coverage in refractive index be 2.2-2.5, in the wave-length coverage of 300-1250nm extinction coefficient be 0.02-0.47, be more than
The extinction coefficient of the wavelength of 2000nm is less than 0.07.
Preferably, foregoing a kind of solar selectively absorbing coating, wherein the first described subgrade is not exclusively nitridation
Metal nitride, described the second subgrade is metal nitride, and the 3rd described subgrade is metal oxynitride.
Preferably, foregoing a kind of solar selectively absorbing coating, wherein the first described subgrade is chromium and chromium nitride
Mixture；The second described subgrade is chromium nitride；The 3rd described subgrade is nitrogen oxidation chromium.
Preferably, foregoing a kind of solar selectively absorbing coating, wherein the thickness of the first described subgrade is 20-
40nm, the thickness of the second described subgrade is 25-60nm, and the thickness of the 3rd described subgrade is 30-60nm.
Preferably, foregoing a kind of solar selectively absorbing coating, wherein described substrate is glass, aluminium, copper or not
Rust steel；Described infrared reflecting layer is one or more the combination in Al, Cu, W, Mo, Au, Ag, Ni；The anti-reflection layer
It is SiO2、Si3N4、Al2O3、ThO2、Dy2O3、Eu2O3、Gd2O3、Y2O3、La2O3, MgO or Sm2O3In one or more
Combination.
Preferably, foregoing a kind of solar selectively absorbing coating, wherein the thickness of described infrared reflecting layer is 80-
200nm, the thickness of described absorbed layer is 75-160nm, and the thickness of described anti-reflection layer is 50-150nm.
By above-mentioned technical proposal, a kind of solar selectively absorbing coating of the utility model at least has following advantages：
1st, the utility model provides a kind of metal nitrogen (oxygen) compound solar selectively absorbing coating, improves metal nitrogen
The operating temperature of (oxygen) compound solar selectively absorbing coating.
Solar selectively absorbing coating described in the utility model, by setting gradually from bottom to surface substrate, red
Outer reflective layer, absorbed layer and anti-reflection layer, the absorbed layer are followed successively by metal nitride layer, the metal nitride of incomplete nitridation
Layer, three layers of metal oxynitride layer so that the utility model absorber coatings 0.3-2.5 μm of solar energy spectral limit have compared with
Absorptivity high, in heat radiation region of ultra-red, 2.5-48 μm has extremely low radiance, and enables to infrared reflecting layer, inhales
The interfacial stress received between layer is able to effectively reduce, and improves the adhesive force between coating, is conducive to improving the selective absorbing
The heat endurance of coating, improves the operating temperature of metal nitrogen (oxygen) compound solar selectively absorbing coating.
2nd, the metal nitride layer of the incomplete nitridation in the utility model absorbed layer is to absorb subgrade, is also barrier layer,
The diffusion between infrared reflecting layer and absorbed layer is blocked, the absorbability and heat endurance of coating is effectively increased.
3rd, further, solar selectively absorbing coating of the present utility model has only used monometallic nitride and nitrogen
Oxide is as absorbed layer, using the cost of material is low, process is simple, it is easy to large-scale production.
Described above is only the general introduction of technical solutions of the utility model, in order to better understand skill of the present utility model
Art means, and being practiced according to the content of specification, with preferred embodiment of the present utility model and coordinate accompanying drawing detailed below
Describe in detail bright as after.
Brief description of the drawings
Fig. 1 is the structural representation of solar selectively absorbing coating described in the utility model.
Wherein, 1 is substrate, and 2 is infrared reflecting layer, and 3 is absorbed layer, and 31 is the first subgrade, and 32 is the second subgrade, and 33 is the
Three subgrades, 4 is anti-reflection layer.
Fig. 2 is solar selectively absorbing coating described in the utility model unannealed and 250 DEG C, 400 DEG C, 500 DEG C
The curve of spectrum after atmospheric environment annealing.
Specific embodiment
Further to illustrate that the utility model is to reach technological means and effect that predetermined utility model purpose is taken,
Below in conjunction with accompanying drawing and preferred embodiment, to foundation the utility model proposes a kind of solar selectively absorbing coating, its tool
Body implementation method, structure, feature, describe in detail as after.In the following description, different " embodiment " or " embodiment " refers to
It is not necessarily same embodiment.Additionally, the special characteristic, structure or feature in one or more embodiments can be by any suitable forms
Combination.
Embodiment 1
Its structure is as shown in figure 1, wherein, 1 is substrate, and 2 is infrared reflecting layer, and 3 is absorbed layer, and 31 is the first subgrade, 32
It is the second subgrade, 33 is the 3rd subgrade, and 4 is anti-reflection layer.
The present embodiment provides a kind of solar selectively absorbing coating, and described coating includes base successively from bottom to surface
Piece 1, infrared reflecting layer 2, absorbed layer 3 and anti-reflection layer 4, described absorbed layer is by the first subgrade 31, the second subgrade 32 and Sanya
Layer 33 is constituted, and the refractive index of described the first subgrade 31 in the wave-length coverage of 300-2500nm is 1.70-7.33, extinction coefficient
It is 2.80-7.81；The second described subgrade 32 refractive index in the wave-length coverage of 300-2500nm is 2.17-4.70, delustring system
Number 1.40-1.80 in the range of 300-1250nm, is being less than 0.9 more than 2000nm wavelength；The 3rd described subgrade 33 exists
Refractive index is 2.2-2.5 in the wave-length coverage of 300-2500nm, and extinction coefficient is in the wave-length coverage of 300~1250nm
0.02-0.47, the extinction coefficient of the wavelength more than 2000nm is less than 0.07；The first described subgrade 31 is contacted with infrared reflecting layer
2, the 3rd described subgrade 33 is contacted with anti-reflection layer 4.
The first subgrade 31, the second subgrade 32 and the 3rd subgrade 33 described in the present embodiment in 300-1250nm extinction coefficients
Reduce successively, prepared absorber coatings have absorptivity higher for 0.3-2.5 μm in solar energy spectral limit, in heat radiation
2.5-48 μm of region of ultra-red has extremely low radiance, and enables to the interfacial stress between infrared reflecting layer, absorbed layer
It is able to effectively reduce, improves the adhesive force between coating, is further conducive to improving the thermally-stabilised of the coating for selective absorption
Property, improve the operating temperature of metal nitrogen (oxygen) compound solar selectively absorbing coating.
Embodiment 2
The present embodiment provides a kind of solar selectively absorbing coating, and its structure is as shown in figure 1, wherein, the substrate is
Aluminium substrate, its thickness is 0.5mm, and the infrared reflecting layer is Al layers, and its thickness is 200nm.
The absorbed layer includes the first subgrade, the second subgrade and the 3rd subgrade, the first described subgrade successively from the bottom to top
It is CrNx, wherein, 0 ＜ x ＜ 1, described x is N element and the atom number ratio of Cr elements；The second described subgrade is CrNy, its
In, 1≤y≤1.5, described y is N element and the atom number ratio of Cr elements；The 3rd described subgrade is CrNmOn, wherein, 0
＜ m≤1.5,0 ＜ n≤2, described m is N element and the atom number ratio of Cr elements, and described n is O elements and Cr elements
Atom number ratio.The gross thickness of the absorbed layer is 125nm, wherein, the thickness of the first subgrade is 30nm, the thickness of the second subgrade
It is 45nm, the thickness of the 3rd subgrade is 50nm.
The anti-reflection layer is SiO2, its thickness is 90nm.
Described solar selectively absorbing coating is adopted and prepared with the following method：
(1) pretreatment of substrate：
The substrate is tentatively cleaned using neutral detergent solution and deionized water first, is entered piece room in filming equipment afterwards
Bombarding the substrate surface by radio-frequency ion source carries out secondary cleaning, obtains pretreated substrate；Technological parameter is set such as
Under：Radio-frequency power supply sputtering power is 200w, and working gas is the Ar that purity is 99.99%, and flow is 45sccm, and operating air pressure is
9.8×10-2MTorr, sputtering time is 360s；
(2) on the substrate depositing Al layer as the infrared reflecting layer：
Selection purity is 99.7%Al targets, purity is passed through for 99.99% inert working gas Ar, using pulse direct current
By bombarding purity, for the realization of 99.7% aluminium target, depositing Al film is used as infrared reflecting layer to source magnetron sputtering method on the substrate, its
Technological parameter sets as follows：Pulse dc power sputtering power is 1200w, and the flow of the working gas is 50sccm, work
Air pressure is 5mTorr, and the transmission rate of the substrate is 0.4m/min, and the substrate is in Al generated beneaths back and forth movement 5 times, base
The temperature of piece is room temperature；
(3) the first subgrade CrN is sequentially depositing on the Al/ substratesxLayer, the second subgrade CrNyLayer and the 3rd subgrade
CrNmOnLayer：
The Cr targets that purity is 99.7% are chosen, purity is successively passed through and is 99.99% inert working gas Ar, first anti-
Answer gas N2, the second reacting gas O2, using pulse dc power magnetron sputtering method by bombarding Cr targets, on the Al/ substrates
It is sequentially depositing the first subgrade CrNxLayer, the second subgrade CrNyLayer and the 3rd subgrade CrNmOnLayer；
Deposit the first subgrade CrNxThe technological parameter of layer is set to：Pulse dc power sputtering power is 1500w, work
Make air pressure for 3mTorr, the flow of the working gas Ar is 50sccm, the first reacting gas N2Flow be 10sccm,
The transmission rate of the Al/ substrates is 1m/min, and in Cr generated beneaths back and forth movement 2 times, temperature is room temperature to the Al/ substrates；
Deposit the second subgrade CrNyThe technological parameter of layer is set to：Pulse dc power sputtering power is 1500w, work
Make air pressure for 3mTorr, the flow of the working gas Ar is 50sccm, the first reacting gas N2Flow be 50sccm,
The CrNxThe transmission rate of/Al/ substrates is 2m/min, the CrNx/ Al/ substrates are in Cr generated beneaths back and forth movement 7 times, temperature
It is room temperature to spend；
Deposit the 3rd subgrade CrNmOnTechnological parameter be set to：Pulse dc power sputtering power is 1500w, work
Make air pressure for 3mTorr, the flow of the working gas Ar is 50sccm, the first reacting gas N2Flow be 50sccm,
The second reacting gas O2Flow be 10sccm, the CrNy/CrNxThe transmission rate of/Al/ substrates is 0.45m/min, institute
State CrNy/CrNxIn Cr generated beneaths back and forth movement 5 times, temperature is room temperature to/Al/ substrates；
(4) in the CrNmOn/CrNy/CrNxAnti-reflection layer described in/Al/ deposition on substrate
Sial target (Al content 30wt%) that purity is 99.7% is chosen, purity is passed through for 99.99% inertia work gas
Body Ar and the 3rd reacting gas O2, using pulse dc power magnetron sputtering method by bombarding sial target, in the CrNmOn/
CrNy/CrNx/ Al/ substrate depositions SiO2As the anti-reflection layer；Its technological parameter sets as follows：Pulse dc power sputters work(
Rate is 2000w, and operating air pressure is 5mTorr, and the flow of the working gas is 30sccm, the 3rd reacting gas O2Stream
It is 14sccm to measure, the CrNmOn/CrNy/CrNxThe transmission rate of/Al/ substrates is 1m/min, the CrNmOn/CrNy/CrNx/
In sial generated beneath back and forth movement 9 times, temperature is room temperature to Al/ substrates；
(5) after above-mentioned preparation process to be done, sample is made to cool down 20min, slice is shut down.
The absorptivity α of 0.3-2.5 mu m wavebands is tested using Hitachi U-4100 spectrophotometers, using Bruker's
Tensor27 Fourier infrared spectrographs test the radiance ε of 2.5-48 mu m wavebands, and test result is shown in Table 1.
Coating prepared by the present embodiment through the absorptivity α and spoke under 250 DEG C, 400 DEG C, 500 DEG C of different annealing times
The rate ε of penetrating detected, as a result as shown in table 2.
Embodiment 3
The present embodiment provides a kind of solar selectively absorbing coating, and its structure is as shown in figure 1, wherein, 1 is substrate, and 2 are
Infrared reflecting layer, 3 is absorbed layer, and 31 is that the first subgrade 1,32 is the second subgrade, and 33 is the 3rd subgrade, and 4 is anti-reflection layer.Wherein,
The substrate is sheet glass, and its thickness is 6mm.The infrared reflecting layer is Al layers, and its thickness is 100nm.
The absorbed layer includes the first subgrade, the second subgrade and the 3rd subgrade, the first described subgrade successively from the bottom to top
It is CrNx, wherein, 0 ＜ x ＜ 1, described x is N element and the atom number ratio of Cr elements；The second described subgrade is CrNy, its
In, 1≤y≤1.5, described y is N element and the atom number ratio of Cr elements；The 3rd described subgrade is CrNmOn, wherein, 0
＜ m≤1.5,0 ＜ n≤2, described m is N element and the atom number ratio of Cr elements, and described n is O elements and Cr elements
Atom number ratio.The gross thickness of the absorbed layer is 120nm, wherein, the thickness of the first subgrade is 40nm, the thickness of the second subgrade
It is 40nm, the thickness of the 3rd subgrade is 40nm.
The anti-reflection layer is respectively Si3N4、SiO2, its thickness is respectively 20nm, 130nm.
Described solar selectively absorbing coating is adopted and prepared with the following method：
(1) pretreatment of substrate：
The substrate is tentatively cleaned using neutral detergent solution and deionized water first, is entered piece room in filming equipment afterwards
Bombarding the substrate surface by radio-frequency ion source carries out secondary cleaning, obtains pretreated substrate；Technological parameter is set such as
Under：Radio-frequency power supply sputtering power is 200w, and working gas is the Ar that purity is 99.99%, and flow is 45sccm, and operating air pressure is
9.8 × 10-2mTorr, sputtering time is 360s；
(2) on the substrate depositing Al layer as the infrared reflecting layer
The Al targets that purity is 99.7% are chosen, the inert working gas Ar for being passed through that purity is 99.99% is straight using pulse
Stream power supply magnetron sputtering method realizes that depositing Al film is used as infrared anti-on the substrate by bombarding the Al targets that purity is 99.7%
Layer is penetrated, its technological parameter sets as follows：Pulse dc power sputtering power is 1200w, and the flow of the working gas is
50sccm, operating air pressure is 5mTorr, and the transmission rate of the substrate is 0.8m/min, and the substrate comes and goes in Al generated beneaths
Motion 5 times, the temperature of substrate is room temperature；
(3) the first subgrade CrN is deposited in the Al/ glass substratesxLayer, the second subgrade CrNyLayer and the 3rd subgrade
CrNmOn
The Cr targets that purity is 99.7% are chosen, inert working gas Ar, first that purity is 99.99% is successively passed through
Reacting gas N2, the second reacting gas O2, using pulse dc power magnetron sputtering method by bombarding Cr targets, in the Al/ substrates
On be sequentially depositing the first subgrade CrNxLayer, the second subgrade CrNyLayer and the 3rd subgrade CrNmOn；
Deposit the first subgrade CrNxThe technological parameter of layer is set to：Pulse dc power sputtering power is 1500w, work
Make air pressure for 3mTorr, the flow of the working gas Ar is 50sccm, the first reacting gas N2Flow be 10sccm,
The transmission rate of the Al/ substrates is 1.5m/min, and in Cr generated beneaths back and forth movement 4 times, temperature is room to the Al/ substrates
Temperature；
Deposit the second subgrade CrNyThe technological parameter of layer is set to：Pulse dc power sputtering power is 1500w, work
Make air pressure for 3mTorr, the flow of the working gas Ar is 50sccm, the first reacting gas N2Flow be 50sccm,
The CrNxThe transmission rate of/Al/ substrates is 0.95m/min, the CrNx/ Al/ substrates in Cr generated beneaths back and forth movement 3 times,
Temperature is room temperature；
Deposit the 3rd subgrade CrNmOnTechnological parameter be set to：Pulse dc power sputtering power is 1500w, work
Make air pressure for 3mTorr, the flow of the working gas Ar is 50sccm, the first reacting gas N2Flow be 50sccm,
The second reacting gas O2Flow be 10sccm, the CrNy/CrNxThe transmission rate of/Al/ substrates is 0.45m/min, institute
State CrNy/CrNxIn Cr generated beneaths back and forth movement 4 times, temperature is room temperature to/Al/ substrates；
(4) in the CrNmOn/CrNy/CrNxAnti-reflection layer Si described in/Al/ deposition on substrate3N4And SiO2
Sial target (Al content 30wt%) that purity is 99.7% is chosen, purity is passed through for 99.99% inertia work gas
Body Ar and the 3rd reacting gas N2(or O2), using pulse dc power magnetron sputtering method by bombarding sial target, described
CrNmOn/CrNy/CrNx/ Al/ substrate depositions Si3N4And SiO2As the anti-reflection layer；
Deposition Si3N4Technological parameter set it is as follows：Pulse dc power sputtering power is 1300w, and operating air pressure is
2.5mTorr, the flow of the working gas is 30sccm, the 3rd reacting gas O2Flow be 24sccm, it is described
CrNmOn/CrNy/CrNxThe transmission rate of/Al/ substrates is 0.55m/min, the CrNmOn/CrNy/CrNx/ Al/ substrates are in sial
Generated beneath back and forth movement 1 time, temperature is room temperature；
Deposition SiO2Technological parameter set it is as follows：Pulse dc power sputtering power is 2000w, and operating air pressure is
5mTorr, the flow of the working gas is 30sccm, and the flow of the 3rd reacting gas O2 is 14sccm, the Si3N4/
CrNmOn/CrNy/CrNxThe transmission rate of/Al/ substrates is 1m/min, the Si3N4/CrNmOn/CrNy/CrNx/ Al/ substrates exist
Sial generated beneath back and forth movement 13 times, temperature is room temperature；
(5) after above-mentioned preparation process to be done, sample is made to cool down 20min, slice is shut down.
The absorptivity α of 0.3-2.5 mu m wavebands is tested using Hitachi U-4100 spectrophotometers, using Bruker's
Tensor27 Fourier infrared spectrographs test the radiance ε of 2.5-48 mu m wavebands, and test result is shown in Table 1.
Embodiment 4
Solar selectively absorbing coating described in reference embodiment 2 and embodiment 3, the suction of coating manufactured in the present embodiment
The the first subgrade thickness for receiving layer is 40nm, and the second subgrade thickness is 25nm, and Sanya thickness degree is 30nm.
Embodiment 5
Solar selectively absorbing coating described in reference embodiment 2 and embodiment 3, the suction of coating manufactured in the present embodiment
The the first subgrade thickness for receiving layer is 20nm, and the second subgrade thickness is 45nm, and Sanya thickness degree is 60nm.
Embodiment 6
Solar selectively absorbing coating described in reference embodiment 2 and embodiment 3, the suction of coating manufactured in the present embodiment
The the first subgrade thickness for receiving layer is 30nm, and the second subgrade thickness is 60nm, and Sanya thickness degree is 45nm.
Solar selectively absorbing coating with reference to embodiment 2 and described in embodiment 3, substrate of the present utility model can be with
It is copper or stainless steel etc.；Infrared reflecting layer can also be W, Mo, Au, Ag and/or Ni etc.；Anti-reflection layer can also be Al2O3、ThO2、
Dy2O3、Eu2O3、Gd2O3、Y2O3、La2O3, MgO and/or Sm2O3Deng.
Coating performance is tested：
The suction of 0.3-2.5 mu m wavebands is carried out to the coating obtained by embodiment 2 and 3 using Hitachi U-4100 spectrophotometers
Yield alpha test, is carried out using the Tensor27 Fourier infrared spectrographs of Bruker to the coating obtained by embodiment 2 and 3
The radiance ε tests of 2.5-48 mu m wavebands, test result test result is shown in Table 1.
Coating prepared by embodiment 2 through the absorptivity α under 250 DEG C, 400 DEG C, 500 DEG C of different annealing times and radiation
Rate ε detected, the results are shown in Table 2.
The absorptivity and radiance of the coating for selective absorption prepared by the embodiment 2 and 3 of table 1
From table 1 it follows that the absorptivity α of the coating for selective absorption prepared by embodiment 2 and 3 is up to 96.13%
With 96.95%, radiance ε is less than 5%, illustrate the coating for selective absorption prepared by embodiment 2 and 3 with absorptivity higher
α and relatively low radiance.
The absorptivity and radiance of the coating after different condition treatment of coating prepared by the embodiment 2 of table 2
From table 2 it can be seen that the coating prepared by embodiment 2 is by 200h and 400 DEG C of the annealing annealing of 250 DEG C of atmospheric environment
After 420h, absorptivity α still more a height of 95.76%, radiance ε are 3.74%, and α/ε is increased to 25.6, and coating is by big compression ring
After the annealing 8h of 500 DEG C of border, absorptivity α still more a height of 95.73%, radiance ε are 4.75%, and α/ε is 20.2, the present embodiment 2
Prepared coating for selective absorption has good thermal stability, and still has after 500 DEG C of atmospheric environment annealing preferable
Spectral selection.Solar selectively absorbing coating prepared by the present embodiment is unannealed and 250 DEG C, 400 DEG C, 500 DEG C
The curve of spectrum after atmospheric environment annealing is as shown in Figure 2.
Obtained by the performance test of the coating obtained by the utility model other embodiment and embodiment 2 and embodiment 3
The similar nature of coating.
The above, is only preferred embodiment of the present utility model, not makees any formal to the utility model
Limitation, any simple modification, equivalent variations and the modification made to above example according to technical spirit of the present utility model,
Still fall within the range of technical solutions of the utility model.
Claims (9)
1. a kind of solar selectively absorbing coating, it is characterised in that：
Described coating includes substrate, infrared reflecting layer, absorbed layer and anti-reflection layer successively from bottom to surface,
Described absorbed layer is made up of the first subgrade, the second subgrade and the 3rd subgrade,
The first described subgrade is contacted with infrared reflecting layer, and the 3rd described subgrade is contacted with anti-reflection layer.
2. a kind of solar selectively absorbing coating according to claim 1, it is characterised in that：
Refractive index of the first described subgrade in the wave-length coverage of 300-2500nm is 1.70-7.33, and extinction coefficient is 2.80-
7.81。
3. a kind of solar selectively absorbing coating according to claim 1, it is characterised in that：
The second described subgrade refractive index in the wave-length coverage of 300-2500nm is 2.17-4.70, and extinction coefficient is in 300-
1.40-1.80 in the range of 1250nm, is being less than 0.9 more than 2000nm wavelength.
4. a kind of solar selectively absorbing coating according to claim 1, it is characterised in that：
The 3rd described subgrade refractive index in the wave-length coverage of 300-2500nm is 2.2-2.5, in the wavelength of 300-1250nm
In the range of extinction coefficient be 0.02-0.47, the extinction coefficient of the wavelength more than 2000nm is less than 0.07.
5. a kind of solar selectively absorbing coating according to claim 1, it is characterised in that：
The first described subgrade is the metal nitride of incomplete nitridation, and the second described subgrade is metal nitride, described
3rd subgrade is metal oxynitride.
6. a kind of solar selectively absorbing coating according to claim 1, it is characterised in that：
The second described subgrade is chromium nitride；
The 3rd described subgrade is nitrogen oxidation chromium.
7. a kind of solar selectively absorbing coating according to claim 1, it is characterised in that：
The thickness of the first described subgrade is 20-40nm,
The thickness of the second described subgrade is 25-60nm,
The thickness of the 3rd described subgrade is 30-60nm.
8. a kind of solar selectively absorbing coating according to claim 1, it is characterised in that：
Described substrate is glass, aluminium, copper or stainless steel；
Described infrared reflecting layer is the one kind in Al, Cu, W, Mo, Au, Ag, Ni；
The anti-reflection layer is SiO2、Si3N4、Al2O3、ThO2、Dy2O3、Eu2O3、Gd2O3、Y2O3、La2O3, MgO or Sm2O3In one
Kind.
9. a kind of solar selectively absorbing coating according to claim 1, it is characterised in that：
The thickness of described infrared reflecting layer is 80-200nm,
The thickness of described absorbed layer is 75-160nm,
The thickness of described anti-reflection layer is 50-150nm.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201620961930.8U CN206222719U (en) | 2016-08-26 | 2016-08-26 | A kind of solar selectively absorbing coating |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201620961930.8U CN206222719U (en) | 2016-08-26 | 2016-08-26 | A kind of solar selectively absorbing coating |
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Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN106288462A (en) * | 2016-08-26 | 2017-01-04 | 中国建筑材料科学研究总院 | A kind of solar selectively absorbing coating and preparation method thereof |
| CN109594050A (en) * | 2018-12-07 | 2019-04-09 | 岭南师范学院 | A kind of coloured coating for selective absorption of solar energy and preparation method thereof |
| CN111424237A (en) * | 2020-05-20 | 2020-07-17 | 山东三齐能源有限公司 | Preparation method of film for selectively absorbing solar spectrum |
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Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN106288462A (en) * | 2016-08-26 | 2017-01-04 | 中国建筑材料科学研究总院 | A kind of solar selectively absorbing coating and preparation method thereof |
| US10634387B2 (en) | 2016-08-26 | 2020-04-28 | China Building Materials Academy | Solar selective absorbing coating and preparation method thereof |
| CN109594050A (en) * | 2018-12-07 | 2019-04-09 | 岭南师范学院 | A kind of coloured coating for selective absorption of solar energy and preparation method thereof |
| CN111424237A (en) * | 2020-05-20 | 2020-07-17 | 山东三齐能源有限公司 | Preparation method of film for selectively absorbing solar spectrum |
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