CN206192572U - Capillary detecting tube and vacuum degree detection device - Google Patents

Capillary detecting tube and vacuum degree detection device Download PDF

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Publication number
CN206192572U
CN206192572U CN201621157685.1U CN201621157685U CN206192572U CN 206192572 U CN206192572 U CN 206192572U CN 201621157685 U CN201621157685 U CN 201621157685U CN 206192572 U CN206192572 U CN 206192572U
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China
Prior art keywords
main line
detection pipe
capillary
capillary detection
buffer structure
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CN201621157685.1U
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Chinese (zh)
Inventor
杨勇
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Semiconductor Manufacturing International Shanghai Corp
Semiconductor Manufacturing International Beijing Corp
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Semiconductor Manufacturing International Shanghai Corp
Semiconductor Manufacturing International Beijing Corp
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Abstract

The utility model provides a capillary detecting tube and vacuum degree detection device, the capillary detecting tube includes: first main line, with first main line is connected respectively, and first minute pipeline and second divide the pipeline, respectively with first minute pipeline and second divide the second main line of tube coupling, with the buffer structure that the second main line is connected, wherein, second main line partially insert buffer structure, and with the third main line that buffer structure connects. Through the utility model provides a pair of when having solved adoption prior art elimination impurity, there is the capacity that has reduced the capillary detecting tube in capillary detecting tube and vacuum degree detection device, and maintenance, purchasing cost increase, have occupy the operating time of equipment moreover, influence the productivity, and the unsatisfactory problem of effect of elimination impurity.

Description

A kind of capillary detection pipe and vacuum-ness detecting device
Technical field
The utility model is related to ic manufacturing technology field, and more particularly to a kind of capillary detection pipe and vacuum are examined Survey device.
Background technology
Physical vapour deposition (PVD) (PVD:Physical Vapor Deposition) technology refer under vacuum, use Low-voltage, the arc-discharge technique of high current, make target evaporate and make all to be occurred by evaporated material and gas using gas discharge Ionization, using the acceleration of electric field, makes to be deposited on workpiece by evaporated material and its product.
PVD technique comes across later 1970s, and the film of preparation has high rigidity, low-friction coefficient, very well Wearability and chemical stability the advantages of.Initially the successful Application in high-speed steel tool field causes countries in the world manufacturing industry Great attention, people develop high-performance, high reliability coating apparatus while, also in hard alloy, ceramic-like cutter More deep coating application study is carried out.Compared with CVD techniques, PVD treatment temperature is low, when below 600 DEG C pair The bending strength of cutter material is without influence;Film internal stress state is compression, is more suitable for the accurate complexity knife of hard alloy The coating of tool;PVD has no adverse effect to environment, meets the developing direction of Modern Green manufacture.
But, it is high to the vacuum level requirements in chamber during using PVD technique come deposited metal, not only due to micro band Oxygen contaminants that is that the impurity in the resistivity for being likely to form metal oxide and influenceing metal, and chamber is also possible to receive wafer Even damaged to pollution.Therefore when physical vapour deposition (PVD) is carried out, the gas in capillary detection pipe real-time collecting vacuum chamber can be used Body, and by residual gas analyzer (RGA:Residual gas analyzer) residual gas detection is carried out, to realize monitoring Vacuum in vacuum chamber, as depicted in figs. 1 and 2.
However, the vacuum-degree monitoring of vacuum chamber is carried out using capillary detection pipe as shown in Figure 1, when capillary detection pipe 1 ' When residual gas in vacuum chamber is taken out of, impurity therein can be deposited on the inwall of capillary detection pipe 1 ';When backflow is sent out When raw, the impurity piled up in capillary detection pipe 1 ' will be brought back in vacuum chamber and be ejected on wafer by air-flow, because of crystalline substance The wafer throughput loss that the impurity of circular surfaces causes is 3%~5%, and fraction defective is about 3 ‰.
These points measure is typically with the prior art to solve above-mentioned technical problem, 1. shortens capillary detection pipe, 2. shorten the maintenance period time of capillary detection pipe to purify the inwall of capillary detection pipe, 3. shorten the use longevity of capillary detection pipe Life;But had the following disadvantages using the above method:
1. the capacity of capillary detection pipe is reduced;
2. safeguard, purchase cost increases, and occupy the working time of equipment, influence production capacity;
3. the deimpurity effect that disappears is unsatisfactory, and according to statistics, when eliminating impurity by the above method, wafer is because of surface impurity The fraction defective for causing is about 1.5 ‰.
In consideration of it, being necessary that a kind of new capillary detection pipe of design and vacuum-ness detecting device are used to solve above-mentioned technology ask Topic.
Utility model content
The shortcoming of prior art in view of the above, the purpose of this utility model is to provide a kind of capillary detection pipe and true Reciprocal of duty cycle detection means, solves during using prior art elimination impurity, there is the capacity for reducing capillary detection pipe, safeguards, adopts Purchase cost increases, and occupies the working time of equipment, influences production capacity, and the unsatisfactory problem of deimpurity effect that disappears.
In order to achieve the above objects and other related objects, the utility model provides a kind of capillary detection pipe and vacuum degree measurement Device, the capillary detection pipe includes:
First main line;
The first branch pipeline and the second branch pipeline being connected respectively with first main line;
The second main line being connected with first branch pipeline and the second branch pipeline respectively;
The buffer structure being connected with second main line, wherein, knot is buffered described in the second main line partial insertion Structure;
And the 3rd main line being connected with the buffer structure.
Preferably, first branch pipeline and the second branch pipeline form ellipsoidal structure.
Preferably, the length that second main line inserts the part of the buffer structure is 1~1.5cm.
Preferably, the buffer structure is ellipsoidal structure.
Preferably, the pipeline diameter of first, second, third main line is identical.
Preferably, the pipeline diameter of first, second branch pipeline is identical.
Preferably, the pipeline diameter of first, second branch pipeline is 0.1~0.5mm.
Preferably, the first branch pipeline, the second branch pipeline, the first main line, the second main line, the 3rd main line pipeline it is straight Footpath is identical.
The utility model also provides a kind of vacuum-ness detecting device, and the vacuum-ness detecting device includes such as above-mentioned any one Described capillary detection pipe, and the vacuum chamber and residual gas analyzer being connected with the capillary detection pipe two ends respectively.
As described above, a kind of capillary detection pipe of the present utility model and vacuum-ness detecting device, have the advantages that: The utility model is in charge of line structure and buffer structure by being set in capillary detection pipe, when capillary detection pipe flows back, Be in charge of line structure for reduce backflow air pressure, and buffer structure is then for preventing impurity from being back in vacuum chamber;This practicality It is new to be in charge of line structure and buffer structure by setting in the case where the capacity of capillary detection pipe is not reduced, prevent capillary Impurity flows back to the problem that vacuum chamber causes wafer to damage when detection pipe flows back, and capillary described in the utility model is examined The test tube maintenance period time is more long, and without changing often.
Brief description of the drawings
Fig. 1 is shown as the structural representation of capillary detection pipe in the prior art.
Fig. 2 is shown as the structural representation of vacuum-ness detecting device in the prior art.
Fig. 3 is shown as the structural representation of the utility model capillary detection pipe.
Fig. 4 is shown as the structural representation of the utility model vacuum-ness detecting device.
Fig. 5 is shown as the flow graph of gas during vacuum-ness detecting device normal work described in the utility model.
Fig. 6 is shown as the flow graph of gas when vacuum-ness detecting device described in the utility model flows back.
Component label instructions
1 ' existing capillary detection pipe
1 capillary detection pipe described in the utility model
11 first main lines
12 first branch pipelines
13 second branch pipelines
14 second main lines
15 buffer structures
16 the 3rd main lines
Specific embodiment
Implementation method of the present utility model is illustrated below by way of specific instantiation, those skilled in the art can be by this theory Content disclosed by bright book understands other advantages of the present utility model and effect easily.The utility model can also be by addition Different specific embodiments are embodied or practiced, and the various details in this specification can also be based on different viewpoints and answer With, without departing from it is of the present utility model spirit under carry out various modifications or alterations.
Refer to Fig. 3 and Fig. 6.It should be clear that structure, ratio, size depicted in this specification institute accompanying drawings etc., is only used to Coordinate the content disclosed in specification, so that those skilled in the art understands and reads, be not limited to the utility model Enforceable qualifications, therefore do not have technical essential meaning, the modification of any structure, the change of proportionate relationship or size Adjustment, in the effect for not influenceing the utility model can be generated and under the purpose to be reached, all should still fall in the utility model In the range of disclosed technology contents are obtained and can covered.Meanwhile, in this specification it is cited as " on ", D score, " left side ", The term on " right side ", " centre " and " one " etc., is merely convenient to understanding for narration, and it is enforceable to be not used to restriction the utility model Scope, being altered or modified for its relativeness is enforceable when the utility model is also considered as under without essence change technology contents Category.
Embodiment one
As shown in figure 3, the utility model provides a kind of capillary detection pipe 1, the capillary detection pipe 1 includes:
First main line 11;
The first branch pipeline 12 and the second branch pipeline 13 being connected respectively with first main line 11;
The second main line 14 being connected with the branch pipeline 13 of first branch pipeline 12 and second respectively;
The buffer structure 15 being connected with second main line 14, wherein, described in the partial insertion of the second main line 14 Buffer structure 15;
And the 3rd main line 16 being connected with the buffer structure 15.
Wherein, the pipeline diameter of first, second, third main line is identical, the pipeline of first, second branch pipeline Diameter is identical.Preferably, the pipeline diameter of first, second branch pipeline is 0.1~0.5mm.It is further preferred that in this reality In applying example, the first main line 11, the first branch pipeline 12, the second branch pipeline 13, the second main line 14, the pipeline of the 3rd main line 16 Diameter is identical, and the pipeline diameter is 0.3mm;In other embodiments, the pipeline diameter can also be 0.1mm, 0.2mm, 0.4mm, or 0.5mm.
Specifically, having preferably to flow through the air-flow of the first branch pipeline 12, the second branch pipeline 13 and buffer structure 15 Stability, it is preferable that in the utility model, first, second branch pipeline forms ellipsoidal structure, the buffer structure 15 is ellipsoidal structure.
It should be noted that ellipsoidal structure, the ellipse of the buffer structure 15 that first, second branch pipeline is formed The size (oval size is the size of oval diameter long and short diameter) of shape structure is provided with tester table Negative pressure power it is relevant, when tester table provide negative pressure power it is bigger, the size of two ellipsoidal structures is bigger, on the contrary also So.Preferably, in the present embodiment, it is contemplated that the negative pressure power that tester table is provided in the present embodiment, described first, second point Oval the length a diameter of 5cm, short a diameter of 4cm that pipeline is formed;The a diameter of 4cm of length of the buffer structure 15, short diameter It is 3cm.
Specifically, the length that second main line 14 inserts the part of the buffer structure 15 is 1~1.5cm.
It should be noted that described in the partial insertion of the second main line 14 during buffer structure 15, make the buffer structure 15 with The insertion portion of the second main line 14 forms an impurity build-up areas, when the capillary detection pipe 1 flows back, impurity meeting The region is deposited in, without flowing back forward.
Explanation is needed further exist for, the part that second main line 14 inserts the buffer structure 15 can not be oversize, Can not be too short, its oversize or too short reflowing result that can all influence impurity;If the second main line 14 inserts the buffering knot When the insertion portion of structure 15 is oversize, cause the 3rd interface of the main line 16 with buffer structure 15 and the insertion section of the second main line 14 The port distance divided is too short, and when the capillary detection pipe 1 flows back, reflux gas are flowed directly into the presence of negative pressure Second main line 14, and cannot deposit impurity in impurity build-up areas by original gas flow;When the second main line 14 Insertion portion too in short-term, the impurity build-up areas for causing the insertion portion of the second main line 14 to be formed with the buffer structure 15 Too small, when the capillary detection pipe 1 flows back under suction function, the impurity in reflux gas only has can be deposited on a small quantity Impurity build-up areas, major part is flowed back forward by the second main line 14.
Specifically, by setting the branch pipeline 13 of first branch pipeline 12 and second in the capillary detection pipe 1, working as institute State capillary detection pipe 1 because negative pressure flow back when, reflux gas in the capillary detection pipe 1 are in charge of flowing through first, second There is partial pressure during road;By the first branch pipeline 12 and the partial pressure of the second branch pipeline 13, reflux gas in capillary detection pipe 1 are slow down Flow velocity, be conducive to the impurity in reflux gas to be piled up in buffer structure 15, without continue flow back forward.
Specifically, the capillary detection pipe 1 is polystyrene material or quartz material.Preferably, in the present embodiment, institute Capillary detection pipe 1 is stated for polystyrene material.
It should be noted that polystyrene is high molecular polymer, with transparency is high, hardness big, easy-formation processing, suitable Close a large amount of productions, and products formed dimensionally stable.
Embodiment two
As shown in figure 4, the utility model also provides a kind of vacuum-ness detecting device, the vacuum-ness detecting device includes real The capillary detection pipe 1 described in example one is applied, and the vacuum chamber and residual gas point being connected with the two ends of capillary detection pipe 1 respectively Analyzer.
As shown in Figure 5 and Figure 6, when 1 normal work of capillary detection pipe, its interior gas flow will be as shown in figure 5, will be true Gas in plenum chamber sends into residual gas analyzer by capillary detection pipe 1, and by residual gas analyzer to the gas It is analyzed.When the gas in the capillary detection pipe 1 flows back because of negative pressure, its interior gas flow is as shown in fig. 6, work as back When gas body enters the buffer structure 15 by the 3rd main line 16, because the buffer structure 15 is ellipsoidal structure, return The flowing in the buffer structure 15 according to arc circuit of gas body, and insertion portion due to the second main line 14 is slow with described Rush structure 15 and form impurity build-up areas so that the impurity in reflux gas is directly piled up when the region is flowed through in the region, Without flowing into the second main line 14;And because the partial pressure of the first branch pipeline 12 and the second branch pipeline 13 is acted on, it is to avoid institute Buffer structure 15 is stated because suction function makes the reflux gas flow velocity flowed through in it too fast so that reflux gas and impurity are directly through the Two main line 14 flows into vacuum chamber, is conducive to impurity to be piled up in buffer structure 15.
In sum, a kind of capillary detection pipe of the present utility model and vacuum-ness detecting device, have the advantages that: The utility model is in charge of line structure and buffer structure by being set in capillary detection pipe, when capillary detection pipe flows back, Be in charge of line structure for reduce backflow air pressure, and buffer structure is then for preventing impurity from being back in vacuum chamber;This practicality It is new to be in charge of line structure and buffer structure by setting in the case where the capacity of capillary detection pipe is not reduced, prevent capillary Impurity flows back to the problem that vacuum chamber causes wafer to damage when detection pipe flows back, and capillary described in the utility model is examined The test tube maintenance period time is more long, and without changing often.
Above-described embodiment only illustrative principle of the present utility model and its effect are new not for this practicality is limited Type.Any person skilled in the art can all be carried out under without prejudice to spirit and scope of the present utility model to above-described embodiment Modifications and changes.Therefore, such as those of ordinary skill in the art without departing from the essence disclosed in the utility model All equivalent modifications completed under god and technological thought or change, should be covered by claim of the present utility model.

Claims (9)

1. a kind of capillary detection pipe, it is characterised in that the capillary detection pipe includes:
First main line;
The first branch pipeline and the second branch pipeline being connected respectively with first main line;
The second main line being connected with first branch pipeline and the second branch pipeline respectively;
The buffer structure being connected with second main line, wherein, buffer structure described in the second main line partial insertion;
And the 3rd main line being connected with the buffer structure.
2. capillary detection pipe according to claim 1, it is characterised in that first branch pipeline and the second branch pipeline are formed Ellipsoidal structure.
3. capillary detection pipe according to claim 1, it is characterised in that second main line inserts the buffer structure Part length be 1~1.5cm.
4. capillary detection pipe according to claim 1, it is characterised in that the buffer structure is ellipsoidal structure.
5. capillary detection pipe according to claim 1, it is characterised in that the pipeline of first, second, third main line Diameter is identical.
6. capillary detection pipe according to claim 1, it is characterised in that the pipeline diameter of first, second branch pipeline It is identical.
7. capillary detection pipe according to claim 6, it is characterised in that the pipeline diameter of first, second branch pipeline It is 0.1~0.5mm.
8. capillary detection pipe according to claim 6, it is characterised in that the first branch pipeline, the second branch pipeline, the first supervisor Road, the second main line, the 3rd main line pipeline diameter it is identical.
9. a kind of vacuum-ness detecting device, it is characterised in that the vacuum-ness detecting device is included as claim 1~8 is any Capillary detection pipe described in, and the vacuum chamber and residual gas analyzer being connected with the capillary detection pipe two ends respectively.
CN201621157685.1U 2016-10-25 2016-10-25 Capillary detecting tube and vacuum degree detection device Active CN206192572U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN201621157685.1U CN206192572U (en) 2016-10-25 2016-10-25 Capillary detecting tube and vacuum degree detection device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN201621157685.1U CN206192572U (en) 2016-10-25 2016-10-25 Capillary detecting tube and vacuum degree detection device

Publications (1)

Publication Number Publication Date
CN206192572U true CN206192572U (en) 2017-05-24

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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN109411385A (en) * 2017-08-17 2019-03-01 北京北方华创微电子装备有限公司 Vacuum gauge connection component and semiconductor equipment

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN109411385A (en) * 2017-08-17 2019-03-01 北京北方华创微电子装备有限公司 Vacuum gauge connection component and semiconductor equipment

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