CN206114940U - Ultraviolet 365nm narrowband filter component - Google Patents

Ultraviolet 365nm narrowband filter component Download PDF

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Publication number
CN206114940U
CN206114940U CN201621030136.8U CN201621030136U CN206114940U CN 206114940 U CN206114940 U CN 206114940U CN 201621030136 U CN201621030136 U CN 201621030136U CN 206114940 U CN206114940 U CN 206114940U
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CN
China
Prior art keywords
layers
ultraviolet
quartz substrate
reflection film
reflecting films
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Expired - Fee Related
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CN201621030136.8U
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Chinese (zh)
Inventor
黄军
周慧
汪洋
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Nan Xuan Electro-Optical Technology Inc (us) 62 Martin Road Concord Massachusetts 017 Of Shenzhen
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Nan Xuan Electro-Optical Technology Inc (us) 62 Martin Road Concord Massachusetts 017 Of Shenzhen
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Application filed by Nan Xuan Electro-Optical Technology Inc (us) 62 Martin Road Concord Massachusetts 017 Of Shenzhen filed Critical Nan Xuan Electro-Optical Technology Inc (us) 62 Martin Road Concord Massachusetts 017 Of Shenzhen
Priority to CN201621030136.8U priority Critical patent/CN206114940U/en
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  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
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Abstract

The utility model discloses an ultraviolet 365nm narrowband filter component, including melting quartz substrate, the one side that melts quartz substrate is equipped with high reflection film, the another side that melts quartz substrate is equipped with the reflection reducing coating, high reflection film includes 25 layers of hfO2 material and 25 layers of siO2 material of successive layer alternately and pile, the gross thickness of 25 layers of hfO2 material of high reflection film is 1126.3nm, the gross thickness of 25 layers of siO2 material of high reflection film is 1556.7nm, the reflection reducing coating includes hfO2 material and a layer thickness the siO2 material for 63.4nm of a layer thickness for 43.4nm. This scheme optical filter element is greater than 95% to 365nm's transmissivity, and the wavelength half width is lighter than 10nm, is lighter than 1%, center wavelength positional accuracy to other wavelength ultraviolet transmissivities and is 0.5nm. This scheme can improve medical equipment's the precision and the degree of accuracy of precious stone appraisal to and the anti -fake false positive rate of reduction currency examine.

Description

A kind of ultraviolet 365nm narrow-band-filters piece element
Technical field
This utility model is related to optical element technology field, more particularly to a kind of ultraviolet 365nm narrow-band-filters piece element.
Background technology
Ultraviolet 365nm narrow-band-filters piece element is widely used in the fields such as armarium, Gemstone Identification, currency examination be false proof, should Transmitance of the optical filter to 365nm length ultraviolets, the isolation rate to other length ultraviolets and centre wavelength positional accuracy are straight Connect and have influence on the false proof False Rate of the precision of armarium, the accuracy of Gemstone Identification and currency examination.However, prior art life The ultraviolet 365nm narrow band pass filters for producing are relatively low to the transmitance of 365nm length ultraviolets, easily disturbed by other veiling glares, no The required precision of above-mentioned each application can be met.
Therefore, how to make optical filter meet the required precision of above-mentioned each application, be that those skilled in the art need at present Technical problem to be solved.
Utility model content
In view of this, the purpose of this utility model is to provide a kind of ultraviolet 365nm narrow-band-filters piece element, the optical filter unit Part is more than 95% to the transmitance of 365nm length ultraviolets, and wavelength half width is less than 10nm, little to the ultraviolet permeability of other wavelength In 1%, the higher required precisions of application such as armarium, Gemstone Identification and currency examination be false proof are met.
In order to achieve the above object, this utility model provides following technical scheme:
A kind of ultraviolet 365nm narrow-band-filters piece element, including fused quartz substrate, the one side of the fused quartz substrate are provided with height Reflectance coating, the another side of the fused quartz substrate are provided with anti-reflection film, and the highly reflecting films include 25 layers for being successively alternately stacked HfO2Material and 25 layers of SiO2Material, 25 layers of HfO of the highly reflecting films2The gross thickness of material be 1126.3nm, the height 25 layers of SiO of reflectance coating2The gross thickness of material is 1556.7nm, and the anti-reflection film includes a layer thickness for the institute of 43.4nm State HfO2Material and the SiO that a layer thickness is 63.4nm2Material.
Preferably, in above-mentioned ultraviolet 365nm narrow-band-filters piece element, the thickness point of the layers of material of the highly reflecting films Cloth is as shown in table 1;
The thickness distribution of the layers of material of 1 highly reflecting films of table
The number of plies in table 1 represents respective material in the fused quartz substrate surface to the highly reflecting films outer surface direction The sequence number number of place layer;
The anti-reflection film is included in what the fused quartz substrate surface was stacked gradually to the anti-reflection film outer surface direction The HfO of a layer thickness for 43.4nm2Material and the SiO that a layer thickness is 63.4nm2Material.
The ultraviolet 365nm narrow-band-filters piece element that this utility model is provided, including fused quartz substrate, the one of fused quartz substrate Face is provided with highly reflecting films, and the another side of fused quartz substrate is provided with anti-reflection film, and highly reflecting films include 25 layers for being successively alternately stacked HfO2Material and 25 layers of SiO2Material, 25 layers of HfO of highly reflecting films2The gross thickness of material be 1126.3nm, 25 layers of highly reflecting films SiO2The gross thickness of material be 1556.7nm, anti-reflection film include a layer thickness be 43.4nm HfO2Material and a layer thickness are 63.4nm SiO2Material.The arrangement of the layers of material of this programme filter elements can make optical filter pass through 365nm Rate is more than 95%, and its passband width is more than 3nm, and the transmitance of other ultraviolet wavelengths is less than 1%, and wavelength half width is less than 10nm, Centre wavelength positional accuracy is ± 0.5nm.Attenuated optical signal rate is reduced, operating distance and light intensity can be effectively lifted, and be had Effect avoids the interference of other wavelength veiling glares.Armarium can be improved using the ultraviolet 365nm narrow-band-filters piece element of this programme Precision and Gemstone Identification accuracy, and reduce the false proof False Rate of currency examination.
Description of the drawings
In order to be illustrated more clearly that this utility model embodiment or technical scheme of the prior art, below will be to embodiment Or accompanying drawing to be used is briefly described needed for description of the prior art, it should be apparent that, drawings in the following description are only It is some embodiments of the present utility model, for those of ordinary skill in the art, in the premise for not paying creative work Under, can be with according to these other accompanying drawings of accompanying drawings acquisition.
Cross section structure schematic diagrams of the Fig. 1 for the ultraviolet 365nm narrow-band-filters piece element in this utility model specific embodiment.
In Fig. 1:
1- fused quartz substrates, 2- highly reflecting films, 3- anti-reflection films, 4-HfO2Material, 5-SiO2Material.
Specific embodiment
Core of the present utility model is to provide a kind of ultraviolet 365nm narrow-band-filters piece element, the filter elements pair The transmitance of 365nm length ultraviolets is more than 95%, and wavelength half width is less than 10nm, and the ultraviolet permeability of other wavelength is less than 1%, meet the higher required precisions of application such as armarium, Gemstone Identification and currency examination be false proof.
Below in conjunction with the accompanying drawing in this utility model embodiment, the technical scheme in this utility model embodiment is carried out Clearly and completely describe, it is clear that described embodiment is only this utility model a part of embodiment, rather than whole Embodiment.Based on the embodiment in this utility model, those of ordinary skill in the art are not under the premise of creative work is made The every other embodiment for being obtained, belongs to the scope of this utility model protection.
Refer to Fig. 1, sections of the Fig. 1 for the ultraviolet 365nm narrow-band-filters piece element in this utility model specific embodiment Structural representation.
As shown in figure 1, in a kind of specific embodiment scheme, this utility model provides a kind of ultraviolet 365nm arrowbands filter Light piece element, including fused quartz substrate 1, the one side of fused quartz substrate 1 are provided with highly reflecting films 2, and the another side of fused quartz substrate 1 sets There is anti-reflection film 3.Highly reflecting films 2 one are total including 25 layers of HfO being successively alternately stacked2Material 4 and 25 layers of SiO2Material 5, i.e., it is high anti- Totally 50 layers of film 2 is penetrated, total physical thickness of highly reflecting films 2 is 2683nm.Wherein, 25 layers of HfO of highly reflecting films 22Material 4 is high folding Rate material is penetrated, its physics gross thickness is 1126.3nm;25 layers of SiO of highly reflecting films 22Material 5 be low-index material, its total thing Reason thickness is 1556.7nm.Anti-reflection film 3 includes two-layer altogether, specifically includes the HfO that a layer thickness is 43.4nm24 (high folding of material Penetrate rate material) and a layer thickness for 63.4nm SiO2Material 5 (low-index material), total physical thickness of anti-reflection film 3 is 106.8nm。
This programme is first passed through and calculates HfO2Material 4 and SiO2The refractive index of material 5, wherein, HfO2Material 4 is to 365nm ripples The ultraviolet refractive index of length is 2.086, SiO2Material 5 is 1.465 to the refractive index of 365nm length ultraviolets, reapplies interference of light Principle design goes out ultraviolet 365nm narrow-band-filters piece element.
This programme is in product process is prepared, first from stable fused quartz glass substrate, less from uv absorption Coating Materials, according to Fabry moor sieve principle of interference Design Theory, make product meet ultraviolet 365nm narrow-band-filters piece element Requirement, using high-precision optical monitor filming equipment repetition test, develop this product.
Preferably, in above-mentioned ultraviolet 365nm narrow-band-filters piece element, anti-reflection film 3 is included in 1 surface of fused quartz substrate extremely HfO of a layer thickness stacked gradually on 3 outer surface direction of anti-reflection film for 43.4nm2Material 4 is with a layer thickness for 63.4nm's SiO2Material 5.
Preferably, in above-mentioned ultraviolet 365nm narrow-band-filters piece element, the thickness distribution of the layers of material of highly reflecting films 2 As shown in table 1.
The thickness distribution of the layers of material of 1 highly reflecting films of table
The number of plies in table 1 represents place layer of the respective material on 1 surface of fused quartz substrate to 2 outer surface direction of highly reflecting films Sequence number number, such as number of plies 16 represents SiO2Place of the material 5 on 1 surface of fused quartz substrate to 2 outer surface direction of highly reflecting films Layer is the 16th layer.
The complete machining process of the ultraviolet 365nm narrow-band-filters piece element of this programme is as follows:
First, fused quartz glass substrate is cleaned up through ultrasound wave, is put on hundred grades of dustless table after the assay was approved Enter full-automatic coater;Then, the plating run for designing is imported into full-automatic coater, program setting parameter includes plating thickness The other specification of degree, temperature, vacuum, evaporation rate and apparatus control;Finally, a key starts to process whole membrane system Into.
It should be noted that the product of this programme processing preferably adopts fused quartz substrate 1, its stable physical property, plated film Process deformation is little, and the concordance of full wafer product spectrum is good, and the absorption to 365nm length ultraviolets is little.It is preferred that adopting HfO2Material 4 is made For high-index material, the equally absorption to 365nm length ultraviolets is little, high in the transparency of 365nm length ultraviolets, is adapted to electronics Rifle evaporates, and is easily controlled, good stability.Preferably by HfO in the above-mentioned course of processing2The evaporation rate of material 4 is set to 0.25nm/s, Aid in using RF (radio frequency) ion source, to improve passband transmitance, so that the absorption of ultraviolet 365nm narrow-band-filters piece element It is little.With the light-operated control optical thickness of high accuracy in the above-mentioned course of processing, the saturating of ultraviolet 365nm narrow-band-filters piece element is produced The rate of mistake is up to 95%.
The arrangement of the layers of material of this programme filter elements can make optical filter be more than the transmitance of 365nm 95%, attenuated optical signal rate is reduced, operating distance and light intensity can be effectively lifted, and is prevented effectively from the dry of other wavelength veiling glares Disturb.Its passband width is more than 3nm, and other ultraviolet wavelengths are isolated, and is less than 1% to the transmitance of other length ultraviolets, wavelength half Width is less than 10nm, and centre wavelength positional accuracy is ± 0.5nm.Using the ultraviolet 365nm narrow-band-filters piece element of this programme The accuracy of the precision and Gemstone Identification of armarium can be improved, and reduces the false proof False Rate of currency examination.
The foregoing description of the disclosed embodiments, enables professional and technical personnel in the field to realize or use that this practicality is new Type.Various modifications to these embodiments will be apparent for those skilled in the art, determined herein The General Principle of justice can be realized in the case of without departing from spirit or scope of the present utility model in other embodiments.Cause This, this utility model is not intended to be limited to the embodiments shown herein, and is to fit to and principles disclosed herein The most wide scope consistent with features of novelty.

Claims (2)

1. a kind of ultraviolet 365nm narrow-band-filters piece element, including fused quartz substrate (1), the one side of the fused quartz substrate (1) set The another side for having highly reflecting films (2), the fused quartz substrate (1) is provided with anti-reflection film (3), it is characterised in that the highly reflecting films (2) including 25 layers of HfO being successively alternately stacked2Material (4) and 25 layers of SiO2Material (5), 25 layers of institute of the highly reflecting films (2) State HfO2The gross thickness of material (4) is 1126.3nm, 25 layers of SiO of the highly reflecting films (2)2The gross thickness of material (5) is 1556.7nm, the anti-reflection film (3) include the HfO that a layer thickness is 43.4nm2Material (4) and a layer thickness are 63.4nm The SiO2Material (5).
2. ultraviolet 365nm narrow-band-filters piece element according to claim 1, it is characterised in that the highly reflecting films (2) The thickness distribution of layers of material is as shown in table 1;
The thickness distribution of the layers of material of 1 highly reflecting films of table
The number of plies in table 1 represents respective material on fused quartz substrate (1) surface to the highly reflecting films (2) outer surface direction Place layer sequence number number;
The anti-reflection film (3) be included in fused quartz substrate (1) surface to the anti-reflection film (3) outer surface direction heap successively The HfO of the folded a layer thickness for 43.4nm2Material (4) and the SiO that a layer thickness is 63.4nm2Material (5).
CN201621030136.8U 2016-08-31 2016-08-31 Ultraviolet 365nm narrowband filter component Expired - Fee Related CN206114940U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN201621030136.8U CN206114940U (en) 2016-08-31 2016-08-31 Ultraviolet 365nm narrowband filter component

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN201621030136.8U CN206114940U (en) 2016-08-31 2016-08-31 Ultraviolet 365nm narrowband filter component

Publications (1)

Publication Number Publication Date
CN206114940U true CN206114940U (en) 2017-04-19

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Family Applications (1)

Application Number Title Priority Date Filing Date
CN201621030136.8U Expired - Fee Related CN206114940U (en) 2016-08-31 2016-08-31 Ultraviolet 365nm narrowband filter component

Country Status (1)

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CN (1) CN206114940U (en)

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Granted publication date: 20170419