CN206081691U - Remove device of return tank impurity - Google Patents

Remove device of return tank impurity Download PDF

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Publication number
CN206081691U
CN206081691U CN201621136585.0U CN201621136585U CN206081691U CN 206081691 U CN206081691 U CN 206081691U CN 201621136585 U CN201621136585 U CN 201621136585U CN 206081691 U CN206081691 U CN 206081691U
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CN
China
Prior art keywords
return tank
valve
end cap
left end
vacuum
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
CN201621136585.0U
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Chinese (zh)
Inventor
孙长江
江春兴
武志民
郑喜明
朱宏
孙海超
郑银虎
孙国俊
刘存泽
范玉东
张向杰
刘秋艳
孙景阳
刘胜芹
郑海涛
刘东军
窦洪亮
曹立全
牛帅
江春艳
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Tangshan Sanyou Silicon Industry Co ltd
Original Assignee
SANYOU SILICON INDUSTRY Co Ltd
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Priority to CN201621136585.0U priority Critical patent/CN206081691U/en
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Publication of CN206081691U publication Critical patent/CN206081691U/en
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Abstract

The utility model relates to a chemical industry equipment, especially a remove device of return tank impurity. Including the landing leg, arrange the body on the landing leg in, the body is hollow structure, and the both ends of body are equipped with left end lid and right -hand member lid respectively, left end lid and right -hand member lid respectively with body sealing connection, the upper portion that the left end covered is equipped with the feed inlet, upper portion and lower part that the right -hand member covered are equipped with evacuation mouth, discharge gate respectively, the feed inlet passes through second valve and vacuum tube line and vacuum pump intercommunication, discharge gate and third valve and ejection of compact pipeline connection through first valve and feed pipeline and return tank intercommunication, evacuation mouth. Utilize the vacuum to take out the material, take the impurity that stews the return tank bottom away, promote rectification product quality, reduce corrosion of equipment, the long -term steady operation of assurance equipment, reduction in production cost.

Description

The removal device of return tank impurity
Technical field
The utility model is related to chemical industry equipment, particularly a kind of removal device of return tank impurity.
Background technology
Distillation process is most widely used separation process in chemical process, its process variable and controlled variable compared with Many, the dynamic and mechanism of process is complex.In actual production process, the method for operating and relevant parameter of rectifier unit are also simultaneously It is non-fully reasonable.Therefore, some impurity for being difficult to remove are had in distillation process, the quality of product is not only affected, or even can be right Rectifying column causes a certain degree of corrosion, causes the upkeep operation of large-engineering.
Utility model content
To solve above-mentioned technical problem, the utility model provides a kind of return tank impurity for removing return tank impurities at bottom and goes Except device.Adopt the following technical scheme that:
A kind of removal device of return tank impurity, including supporting leg, the body being placed on supporting leg, the body is hollow knot Structure, body is respectively arranged at two ends with left end cap and right end cap, and left end cap and right end cap are tightly connected respectively with body, left end cap Top is provided with charging aperture, and the upper and lower of right end cap is respectively equipped with vacuum orifice, discharging opening;The charging aperture passes through the first valve Door and feeding line are connected with return tank, and vacuum orifice is connected by the second valve and vacuum lines with vavuum pump, discharging opening It is connected with the 3rd valve and discharging pipeline.
Using above-mentioned technical proposal the utility model compared with prior art, beneficial effect is:
Material is taken out using vacuum, the impurity that backflow pot bottom stands is taken away, rectifying product quality is lifted, equipment corrosion is reduced, The long-acting stable operation of guarantee equipment, reduces production cost.
Further, prioritization scheme of the present utility model is:
The inwall of described device body is provided with anti-corrosion layer structure.
The feeding line is less than or equal to 200 millimeters with the distance of discharging pipeline.
The body is square, cuboid or cylinder.
Description of the drawings
Fig. 1 is structural representation of the present utility model.
Fig. 2 is connection diagram of the present utility model.
In figure:Impurity removal means 1;Body 1-1;Charging aperture 1-2;Vacuum orifice 1-3;Discharging opening 1-4;Anticorrosive coat 1-5; Supporting leg 1-6;Left end cap 1-7;Right end cap 1-8;First valve 2;Feeding line 3;Second valve 4;Vacuum lines 5;3rd valve Door 6;Return tank 7;Vavuum pump 8;Discharging pipeline 9.
Specific embodiment
The utility model is described in further detail with reference to the accompanying drawings and examples.
In Fig. 1, the present embodiment includes supporting leg 1-6, the body 1-1 being placed on supporting leg 1-6, and body 1-1 is hollow structure, this Body 1-1's is respectively arranged at two ends with left end cap 1-7 and right end cap 1-8, and left end cap 1-7 and right end cap 1-8 passes through respectively bolt and this Body 1-1 is tightly connected, and the tightness of each sealing position must reach 0.5MPa-0.9MPa, and body 1-1 can be square, length Cube or cylinder.The top of left end cap 1-7 is provided with charging aperture 1-2, and right end cap 1-8 upper and lowers are respectively equipped with vacuum orifice 1-3, discharging opening 1-4;The inwall of body 1-1 is provided with anti-corrosion layer structure 1-4.In Fig. 2, charging aperture 1-2 is by the first valve 2 and enters Expects pipe line 3 is connected with return tank 7, and vacuum orifice 1-3 is connected by the second valve 4 and vacuum lines 5 with vavuum pump 8, is discharged Mouth 1-4 is connected with the 3rd valve 6 and discharging pipeline 9 one end, discharging pipeline 9 other end connection impurity collecting tank.Feeding line 3 with The distance of discharging pipeline 9 is less than or equal to 200 millimeters.
The present embodiment operationally, is first shut off first valve 2 of charging aperture 1-2, opens second valve of vacuum orifice 1-3 Door 4, opens vavuum pump 8, allows in body 1-1 and forms vacuum.After reaching certain vacuum, the second valve 4 is closed, open the first valve 2, the difficult acid impurities for removing that the bottom of return tank 7 stands are extracted, liquid collecting is closed the first valve 2, opens discharging opening 1-4 after terminating The 3rd valve 6, discharge the present embodiment in material.In some cycles, repeat above operating procedure.
The utility model lifts rectifying product quality, reduces corrosion of the acidic materials to equipment, it is ensured that equipment is long-acting stable Operation, reduces production cost.Can be widely used for:The industries such as oil refining, petrochemical industry, fine chemistry industry, chemical fertilizer, pharmacy, are especially suitable for There is difficult removal to have the impurity of sour corrosion to equipment in above-mentioned industry.- 100 DEG C of Applicable temperature -20 DEG C.
The preferably feasible embodiment of the utility model is the foregoing is only, not thereby limits to power of the present utility model Sharp scope, the equivalent structure change that all utilization the utility model specifications and accompanying drawing content are made, is both contained in the utility model Interest field within.

Claims (4)

1. a kind of removal device of return tank impurity, including supporting leg, the body being placed on supporting leg, it is characterised in that:The body For hollow structure, body is respectively arranged at two ends with left end cap and right end cap, and left end cap and right end cap are tightly connected respectively with body, The top of left end cap is provided with charging aperture, and the upper and lower of right end cap is respectively equipped with vacuum orifice, discharging opening;The charging aperture leads to Cross the first valve and feeding line is connected with return tank, vacuum orifice is connected by the second valve and vacuum lines with vavuum pump Logical, discharging opening is connected with the 3rd valve and discharging pipeline.
2. the removal device of return tank impurity according to claim 1, it is characterised in that:The inwall of the body is provided with anti- Rotten Rotating fields.
3. the removal device of return tank impurity according to claim 1, it is characterised in that:The feeding line and discharge nozzle The distance of line is less than or equal to 200 millimeters.
4. the removal device of return tank impurity according to claim 1, it is characterised in that:The body is square, length Cube or cylinder.
CN201621136585.0U 2016-10-19 2016-10-19 Remove device of return tank impurity Active CN206081691U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN201621136585.0U CN206081691U (en) 2016-10-19 2016-10-19 Remove device of return tank impurity

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN201621136585.0U CN206081691U (en) 2016-10-19 2016-10-19 Remove device of return tank impurity

Publications (1)

Publication Number Publication Date
CN206081691U true CN206081691U (en) 2017-04-12

Family

ID=59975710

Family Applications (1)

Application Number Title Priority Date Filing Date
CN201621136585.0U Active CN206081691U (en) 2016-10-19 2016-10-19 Remove device of return tank impurity

Country Status (1)

Country Link
CN (1) CN206081691U (en)

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Address after: 063305 Nanpu Development Zone, Hebei, Tangshan City

Patentee after: Tangshan Sanyou Silicon Industry Co.,Ltd.

Address before: 063305 Nanpu Development Zone, Hebei, Tangshan City

Patentee before: SANYOU SILICON INDUSTRY Co.,Ltd.