CN206040593U - A suppressor electrode for electrostatic lens among ion implanter - Google Patents

Abstract

The utility model provides a suppressor electrode for electrostatic lens among ion implanter. The suppressor electrode has first and second surfaces and suppressor electrode opening and passes wherein the ion beam of marcing along the z axle in order to be used for receiving, be in first and second surfaces at least one at y crooked in the z plane, the suppressor electrode opening has the top, bottom and central part, and the suppressor electrode opening is greater than the width in central part department at the width of top and bottom department, and the suppressor electrode opening equals the width of suppressor electrode opening in bottom department at the width of top department, wherein the first surface of suppressor electrode has first radius of curvature, and the second surface of suppressor electrode has the 2nd curvature radius, first and second curvature radius measure from the point along burden z axle, the opposite direction that burden z axle was marchd at the ion beam from the center of suppressor electrode measures, first radius of curvature is lighter than the 2nd curvature radius. Electrostatic lens can obtain multiple different beam shape through adjusting the termination electrode.

Description

For the suppression electrode of the electrostatic lenses in Ion Implantation Equipment

Technical field

Embodiment of the present utility model is related to the tetrode lens art in ion implant tool.More precisely, this reality With the suppression electrode of the electrostatic lenses in new more particularly, to Ion Implantation Equipment.

Background technology

Be ion implanted is for foreign ion is doped to the process in the substrates such as such as semiconductor chip.In general, Ion beam is guided from ion source chamber towards substrate.Different feeds gas is supplied to ion source chamber and forms tool to obtain There is the plasma of the ion beam of specific dopant characteristic.For example, from feed gas PH₃、BF₃Or AsH₃In, various atoms and Molecular ion is formed in ion source, and is then subjected to accelerate and quality selection.Produced is ion implanted in substrate Depth is the quality based on ion implantation energy and ion.The ionic species of one or more type can be with various dose and not Desired equipment energy characteristic is obtained with being implanted under energy level in objective chip or substrate.Accurate dopant profiles pair in substrate It is crucial to operate in appropriate device.

Ion Implantation Equipment is widely used in semiconductor manufacturing different to provide such dopant profiles or modification in the substrate Material.In typical Ion Implantation Equipment, the ion produced from ion source is conducted through a series of beamlines, these Beamline can include one or more analyzing magnet and multiple electrodes.Analyzing magnet selects desired ion thing Matter, polluter and the ion with undesirable energy is leached, and ion beam quality is adjusted at objective chip.Suitably The electrode (commonly referred to as " lens ") of shaping be used for modification along the ion beam at the difference of the traveling of beam energy and Shape.Significantly changing for ion energy can occur in such lens and the shape of ion beam can be had sizable Affect.The shape of ion beam can affect the quality of the final dopant profiles of target substrate then.Conventional system and method may Cannot provide the control of the degree desired by the deflection and/or aggregation of the ion beam of target substrate is directed into ion beam System.

Utility model content

The utility model discloses for the suppression electrode of the electrostatic lenses in Ion Implantation Equipment.Electrode is suppressed to have first Surface and second surface and suppression electrode opening pass through along z-axis the ion beam advanced, first surface for receiving It is bending in y-z plane with least one of second surface, wherein suppresses electrode opening that there is top, bottom and center Part, and suppress electrode opening to be more than the width for suppressing electrode opening in central part office in the width of top and bottom end. Suppress the first surface of electrode that there is first curvature radius, and suppress the second surface of electrode that there are second curvature radiuss, and And wherein first curvature radius and second curvature radiuss are that wherein negative z-axis are from suppression electrode from the point measurement along negative z-axis Center measure on the rightabout that ion beam is advanced, and wherein first curvature radius is less than second curvature radiuss.

In an embodiment of the present utility model, described the first of the suppression electrode observed in the y-z plane Surface is recessed.

In an embodiment of the present utility model, described the second of the suppression electrode observed in the y-z plane Surface is protrusion.

In an embodiment of the present utility model, the first curvature radius and second curvature radiuss are at 250 millimeters to 310 In the range of millimeter.

Electrostatic lenses suppresses electrode obtain various different beam shapes by adjusting.

Description of the drawings

Fig. 1 is illustrated according to the schematic diagram that system is ion implanted of the present utility model；

Fig. 2 is the side view according to exemplary electrostatic lens of the present utility model；

Fig. 3 is the end-view of the electrostatic lenses of Fig. 2；

Fig. 4 A and Fig. 4 B are the side views of the electrostatic lenses of the Fig. 2 for illustrating independent operator scheme；

Fig. 5-Fig. 7 is correspondingly isometric view, front view and the side view of the exemplary termination electrode of the electrostatic lenses of Fig. 2；

Fig. 8-Figure 10 be correspondingly exemplary the first of the electrostatic lenses of Fig. 2 suppress the isometric view of electrode, front view and Side view；

Figure 11-Figure 13 be correspondingly exemplary the second of the electrostatic lenses of Fig. 2 suppress the isometric view of electrode, front view and Side view；

Figure 14-Figure 16 is correspondingly isometric view, front view and the side-looking of the exemplary ground electrode of the electrostatic lenses of Fig. 2 Figure；

Figure 17 is being not intended to for the exemplary non-concentric surface configuration between the neighbouring electrode of the electrostatic lenses of Fig. 2；

Figure 18-Figure 24 is the exemplary diagram of the electric field line being associated with the electrostatic lenses of Fig. 2.

Specific embodiment

Fig. 1 descriptions are shown as the beam line ion implantation of Ion Implantation Equipment 100 according to various embodiments of the present utility model The plan view from above of the box form of machine.Ion Implantation Equipment 100 includes ion source 102, and the ion source 102 is configured to produce ion Beam 95.Ion beam 95 can be provided as spot beam or ribbon-shaped beam, and which has beam width (along the cartesian coordinate for illustrating X-direction) more than beam height (along the Y direction) section.In the rule for being used herein, Z-direction refer to parallel to The direction of the axle of the central ray track of ion beam 95.Therefore, the absolute direction of Z-direction and X-direction (perpendicular to Z-direction) can Change at the difference in Ion Implantation Equipment 100, as shown in the figure.

Ion source 102 can include ion chamber, and the feed gas for being wherein fed to ion chamber obtain ionizing.This gas Body can be following item or can include or comprising following item：Hydrogen, helium, other rare gas, oxygen, nitrogen, arsenic, boron, Phosphorus, aluminum, indium, antimony, carborane, alkane, another macromolecular compound or other p-types or n-type dopant.Produced ion can be with Extracted from ion chamber by a series of extraction electrode (not shown) to form ion beam 95.Substrate platen is placed in impact Before substrate 116 on 114, ion beam 95 can be advanced through analyser magnet 106, quality parsing gap 108, retarding lenses 109 And pass through collimator 112.Substrate platen 114 may be configured to scan substrate at least along Y-direction in certain embodiments 116。

In the example depicted in fig. 1, ion beam 95 can be provided as the point-like for being scanned by scanner 110 along the X direction Beam, to provide the scanned ion beam with the width similar with the width W of substrate 116.In other embodiments, from Beamlet 95 can be provided as ribbon-shaped beam.In the example of fig. 1, for the sake of clarity, eliminate the general skill to art Obviously can be used for other beamlines of the operation of Ion Implantation Equipment 100 for art personnel.

Ion Implantation Equipment 100 further includes accelerator/decelerator 118.As shown in fig. 1, accelerator/decelerator 118 Can be placed at the point A between ion source 102 and analyser magnet 106.In other embodiments, accelerator/decelerator 118 Can be placed at the other positions in Ion Implantation Equipment 100, for example, point B or point C.Accelerator/decelerator 118 can be coupled To drive system 120, the operable electrode with regulation accelerator/decelerator 118 of the drive system 120 is relative to other The position of electrode.This especially allows the beam current in ion beam 95 adjusted under the given ion energy of ion beam 95.

In various embodiments, Ion Implantation Equipment 100 may be configured to convey for the implantation of " centre " energetic ion Ion beam, or corresponding to for single charged ion 60keV to 300keV implantation energy range 60kV to 300kV electricity Pressure scope.As discussed below, the lens of accelerator/decelerator 118 suppress electrode electric insulation with end and independently drive, because This allows the beam current opereating specification of the increase of Ion Implantation Equipment 100.

Fig. 2 is the side view of exemplary electrostatic lens 200 (which can be used as the lens 109 shown in Fig. 1), the electrostatic lenses 200 there is termination electrode 202, first to suppress electrode 204 and second to suppress electrode 206 and ground electrode 208.Neighbouring electrode along Z-axis (that is, along the direct of travel of ion beam 95) is spaced apart.Therefore, the first space 210 can be formed at termination electrode 202 and One suppresses between electrode 204, and second space 212 can be formed at the first suppression electrode 204 and second and suppress between electrode 206, And the 3rd space 214 can be formed between the second suppression electrode 206 and ground electrode 208.As will be described, it is disclosed quiet Electric lens 200 are tetrode retarding lenses and the input ion beam for slightly dissipating for being designed to height and relative thin 95th, the ion beam 95 is slowed down, and produces the output ion beam of the parallel or convergence more assembled.

Each in electrode can include top section 202a, top section 204a, top section 206a, top section 208a, base section 202b, base section 204b, base section 206b, base section 208b and main part 202c, main part Divide 204c, main part 206c, main part 208c.Each in electrode 202, electrode 204, electrode 206, electrode 208 is also Including opening 202d, opening 204d, opening 206d, opening 208d (Fig. 3), which limits main part 202c of each electrode, master Aperture in body portion 204c, main part 206c, main part 208c, through aperture in the x direction have width " W " and The beam 95 in y-direction with height " H " passes through electrostatic lenses in a z-direction.It is applied to electrode 202, electrode 204, electrode 206th, the voltage of each in electrode 208 can be used to make beam shaping with beam 95 by electrostatic lenses 200.Such as after a while will It is more fully described, electrode 202, electrode 204, electrode 206, the shape of electrode 208 can be additionally used in passing through electrostatic with beam 95 Lens 200 make beam shaping.

Main part 202c of each, main part 204c in electrode 202, electrode 204, electrode 206, electrode 208, Main part 206c, main part 208c can include relative first surface 202e, first surface 204e, first surface 206e, first surface 208e and second surface 202f, second surface 204f, second surface 206f, second surface 208f, wherein One surface is generally oriented to oncoming ion beam 95.Some in the first surface and second surface of each in electrode Can be flat, and the first surface 202e of each in electrode, first surface 204e, first surface 206e, the first table Some in face 208e and second surface 202f, second surface 204f, second surface 206f, second surface 208f can be bending 's.For example, in certain embodiments, when viewed from the side, the first surface 202e of each in electrode, the first table Face 204e, first surface 206e, first surface 208e and second surface 202f, second surface 204f, second surface 206f, second Surface 208f can be protrusion, it is recessed or flat.

In the illustrated embodiment, such as observe in y-z plane (wherein " y " axle be vertical and z-axis along from The direct of travel of beamlet 95), it is convex that the first surface 202e of termination electrode 202 and first suppresses the first surface 204e of electrode 204 Go out, as observed in y-z plane, second suppresses the first surface of the first surface 206e and ground electrode 208 of electrode 206 208e is recessed, and as observed in y-z plane, the second surface 202f of termination electrode 202 and first suppresses the of electrode 204 Two surface 204f are recessed, and as observed in y-z plane, the second surface 206f of the second suppression electrode 206 is protrusion And the second surface 208f of ground electrode 208 is flat.It is " protrusion " in negative z direction that this causes termination electrode 202, the One suppression electrode 204 is " protrusion " on negative, positive z directions, and the second suppression electrode 206 is " protrusion " in positive z direction 's.As the first surface 208e of ground electrode 208 is recessed and second surface 208f is flat, so ground connection Electrode is rendered as recessed in positive z direction.It will be appreciated that the specific illustrated arrangement of surface configuration be only it is exemplary and It is nonrestrictive, and can be using other combinations of curvature.

As can be seen the neighbouring surface of neighbouring electrode is that (that is, concave surface is positioned adjacent to relative for generally complementation Protrusion surface).This causes the first space 210 when observing from the side of electrostatic lenses 200 between, second space 212 It is bending with the 3rd space 214 (i.e., as previously defined, they are bending in y-z plane).

Fig. 3 shows the end-view of electrostatic lenses 200, shows the electrode 202 of exemplary ion beam 95, electrode 204, electricity Pole 206, electrode 208 have the highly opening 202d of " H " and width " W ", opening 204d, opening 206d, opening 208d.Such as may be used See, the opening 202d of termination electrode 202 has hourglass shape.Therefore, being open 202d can be with the open height measured along y-axis " OH ", the first A/F " OW1 " for such as measuring at the top 216 of opening along x-axis, along x-axis opening central part Divide the second A/F " OW2 " measured at 218, and the 3rd A/F measured at the bottom 220 of opening along x-axis “OW3”.First A/F " OW1 " and the 3rd A/F " OW3 " can be identicals, and the second A/F " OW2 " can With less than the first A/F and the 3rd A/F.Desired hourglass shape shown in this configuration provides Fig. 3.As slightly After will be described in further detail, the opening 204d of other electrodes, opening 206d, opening 208d can have similar hourglass configuration, its With the open height as described by the opening 202d with regard to termination electrode and A/F.In certain embodiments, be open 202d, Opening 204d, opening 206d, opening 208d all have the same shape and dimensions, and in other embodiments some opening Shape and/or be sized differently than other opening those.

Electrostatic lenses 200 can be retarding lenses, and which is configured to deceleration ion beam 95 and causes beam in desired plant Enter the working part that hits the mark under energy.Voltage potential can be applied selectively to termination electrode 202, first suppress electrode 204, Each in second suppression electrode 204 and ground electrode 206 is manipulated with travelling across electrostatic lenses 200 with ion beam 95 The ion energy of ion beam 95.With reference to Fig. 4 A and Fig. 4 B, two operator schemes of electrostatic lenses 200 are shown.In these figures Electrostatic lenses 200 is shown in the situation of quality analytic structure 222, and can include that the exemplary scanner of electrode is assembled Part 223 is biased with scanning beam in the desired manner.

The operation of monotype is illustrated in Figure 4 A.As will be appreciated, monotype can be used for higher-energy beam.In this mould In formula, quality analytic structure 220, termination electrode 202, second suppress electrode 206 and ground electrode to be maintained under ground potential, and the One suppression electrode 204 is maintained under negative potential.Such arrangement can provide the aggregation of higher-energy ion beam.Illustrate in figure 4b " deceleration " pattern for the operation slowed down with two steps.Quality analytic structure 220 and termination electrode 202 will remain in same potential “V_T" place.First suppression electrode 204 will remain in low potential " V_S1" suppression electron stream is sentenced, ground electrode 208 will remain in At ground potential, and the second suppression electrode 206 will remain in intermediate electric potential " V_S2" place.It will be appreciated that these patterns are only exemplary And it is nonrestrictive.Actual Top electrode may remain in any one of various potentials and sentence to produce has desired group The ion beam 95 of characteristic.

With reference to Fig. 5-Fig. 7, termination electrode 202 will be described in further detail.Termination electrode 202 can have such as along the saturating of y-axis measurement Mirror height " LH1 ", and such as along the lens width " LW1 " of x-axis measurement.As described previously, termination electrode 202 can have top Divide 202a, base section 202b, main part 202c and opening 202d.Opening 202d can have hourglass shape, and which has along y Axle measurement open height " OHa ", such as along x-axis the top 216a of opening place measurement the first A/F " OW1a ", edge The second A/F " OW2a " that x-axis is measured at the core 218a of opening, and along x-axis in the bottom of opening The 3rd A/F " OW3a " measured at 220a.First A/F " OW1a " and the 3rd A/F " OW3a " can be phases With, and the second A/F " OW2a " can be less than the first A/F and the 3rd A/F.

As described previously, the first surface 202e and second surface 202f of termination electrode 202 can be bending.Therefore, One surface 202e can have first curvature radius " LR1a ", and second surface 202f can have second curvature radiuss " LR1b ".Two Individual radius of curvature can be from the point measurement along positive z-axis (that is, under electrostatic lenses 200 on the direction that ion beam 95 is advanced Trip).In the illustrated embodiment, first curvature radius is more than second curvature radiuss.

With reference to Fig. 8-Figure 10, the first suppression electrode 204 will be described in further detail.First suppresses electrode 204 have such as edge The lens height " LH2 " of y-axis measurement, and such as along the lens width " LW2 " of x-axis measurement.As described previously, first suppresses Electrode 204 can be with top section 204a, base section 204b, main part 204c and opening 204d.Opening 204d can have Hourglass shape, its there is open height " OHb " along y-axis measurement, such as measure at the top 216b of opening places along x-axis the One A/F " OW1b ", the second A/F " OW2b " measured at the core 218b of opening along x-axis, Yi Jiyan The 3rd A/F " OW3b " that x-axis is measured at the bottom 220b of opening.First A/F " OW1b " and the 3rd opening Width " OW3b " can be identical, and the second A/F " OW2b " can be less than the first A/F and the 3rd opening is wide Degree.

As can be seen the size of the opening 204d of the first suppression electrode 204 can be differently configured from the opening 202d's of termination electrode 202 Size.For example, in the illustrated embodiment, first suppresses the open height " OHb " of electrode 204 to be less than termination electrode 202 Open height " OHa ", and first suppresses the A/F " OW1b " of electrode, A/F " OW2b ", A/F " OW3b " Can be correspondingly larger compared with A/F " OW1a ", A/F " OW2a ", A/F " OW3a " with termination electrode.

The first surface 204e and second surface 204f of the first suppression electrode 204 can be bending.Therefore, first surface 204e can have first curvature radius " LR2a ", and second surface 204f can have second curvature radiuss " LR2b ".First curvature Radius " LR2a " can be from the point measurement along positive z-axis (that is, under electrostatic lenses 200 on the direction that ion beam 95 is advanced Trip), and second curvature radiuss " LR2b " can be from the point measurement along negative z-axis (that is, on the rightabout that ion beam 95 is advanced The upstream of electrostatic lenses 200).In the illustrated embodiment, first curvature radius " LR2a " and second curvature radiuss " LR2b " It is identical.

With reference to Figure 11-Figure 13, the second suppression electrode 206 will be described in further detail.Second suppresses electrode 206 have such as edge The lens height " LH3 " of y-axis measurement, and such as along the lens width " LW3 " of x-axis measurement.As described previously, second suppresses Electrode 206 can be with top section 206a, base section 206b, main part 206c and opening 206d.Opening 206d can have Hourglass shape, its there is open height " OHc " along y-axis measurement, such as measure at the top 216c of opening places along x-axis the One A/F " OW1c ", the second A/F " OW2c " measured at the core 218c of opening along x-axis, Yi Jiyan The 3rd A/F " OW3c " that x-axis is measured at the bottom 220c of opening.First A/F " OW1c " and the 3rd opening Width " OW3c " can be identical, and the second A/F " OW2c " can be less than the first A/F and the 3rd opening is wide Degree.

As can be seen the size of the opening 206d of the second suppression electrode 204 can be differently configured from the opening of the first suppression electrode 204 The size of 204d.For example, in the illustrated embodiment, first suppresses the open height " OHb " of electrode 204 to be less than second Suppress the open height " OHc " of electrode 206, and first suppresses the A/F " OW1b " of electrode, " OW2b ", " OW3b " and second Suppress the A/F " OW1c " of electrode, " OW2c ", " OW3c " is compared can be correspondingly larger.

As described previously, the first surface 206e and second surface 206f of the second suppression electrode 206 can be bending.Cause This, first surface 206e can have first curvature radius " LR3a ", and second surface 206f can have second curvature radiuss “LR3b”.Two radius of curvature can be (that is, quiet on the rightabout that ion beam 95 is advanced from the point measurement along negative z-axis The upstream of electric lens 200).In the illustrated embodiment, first curvature radius " LR3a " is less than second curvature radiuss " LR3b ".

With reference to Figure 14-Figure 16, ground electrode 208 will be described in further detail.Ground electrode 208 can have such as to be surveyed along y-axis The lens height " LH4 " of amount, and such as along the lens width " LW4 " of x-axis measurement.As described previously, ground electrode 208 can have There are top section 208a, base section 208b, main part 208c and opening 208d.Opening 208d can have hourglass shape, its The first A/F for the open height " OHd " measured along y-axis, such as measuring at the top 216d of opening along x-axis " OW1d ", the second A/F " OW2d " measured at the core 218d of opening along x-axis, and opening along x-axis The 3rd A/F " OW3d " measured at the bottom 220d of mouth.First A/F " OW1d " and the 3rd A/F " OW3d " Can be identical, and the second A/F " OW2d " can be less than the first A/F and the 3rd A/F.

As can be seen the size of the opening 208d of ground electrode 208 can be differently configured from the opening 206d of the second suppression electrode 206 Size.For example, in the illustrated embodiment, the open height " OHd " of ground electrode 208 suppresses electrode less than second Open height " OHc ", and the A/F " OW1d " of ground electrode, A/F " OW2d ", A/F " OW3d " and the Two suppress the A/F " OW1c " of electrodes, A/F " OW2c ", A/F " OW3c " is compared can be correspondingly larger.

As described previously, the first surface 208e of ground electrode 208 can be bending.Therefore, first surface 208e can With such as from (that is, the upstream of electrostatic lenses 200 on the rightabout that ion beam 95 is advanced) the of the point measurement along negative z-axis One radius of curvature " LR4a ".Second surface 208f can be flat (that is, towards the row perpendicular to the ion beam 95 along z-axis Enter direction).

Although the neighbouring surface of neighbouring electrode is described as generally complementation, and (that is, concave surface is positioned adjacent to In protrusion surface), but the radius of curvature of neighbouring surface can have non-concentric curvature.So that it takes up a position, for example, termination electrode 202 Radius of curvature LR1b of second surface 202f can suppress the radius of curvature of the first surface 202e of electrode 204 less than first LR2a.Therefore, the distance between first surface 202e of the suppression of the second surface 202f of termination electrode 202 and first electrode 204 can With difference.Figure 17 is the illustrative diagram of this non-concentric curvature arrangement.As can be seen (being end in this example in neighbouring electrode In the case that electrode 202 is different with the radius of curvature that first suppresses electrode surface 204), termination electrode 202 and first suppresses electrode The distance between 204 " D1 " at center " C " place of electrode and are in termination electrode and suppression in the upper end " UE " of electrode and lower end " LE " It is different that the distance between electrode processed " D2 " is compared.In the illustrated embodiment, termination electrode 202 and first suppresses electrode 204 corresponding radius of curvature is caused apart from D1 more than apart from D2.This means to be gathered at the top and bottom of ion beam 95 It is higher compared with being gathered in the axis centre of ion beam 95.In certain embodiments, electrode can be respectively maintained at distinct electrical Under gesture, and therefore the voltage difference between electrode will be constant.As electric field is the function of distance, so changing neighbouring The distance between electrode enables electric field to change on demand.It will be understood that, the change in electric field can be used to maintain ion on demand The shape of beam 95.

In non-restrictive illustrative embodiment, the radius of curvature of electrode (for example, 250 can be arrived at hundreds of millimeter (mm) In the range of 310mm), electrode height can be about 100mm, and electrode width can be from 20mm to 50mm.It will be appreciated that, this A little sizes can be driven by the degree of the size of ion beam 95 and desired aggregation.Therefore, these sizes non-limiting And electrode may adapt to produce with desired size and aggregation ion beam 95.

Although Figure 17 illustrate only termination electrode 202 and first suppresses the radius of curvature between the neighbouring surface of electrode 204 Difference, it will be appreciated that similar configuration is can be provided between any neighbouring surface of any electrode of electrostatic lenses 200.Separately Outward, although Figure 17 shown apart from D1 more than the configuration apart from D2, but can also be big apart from D2 in the embodiment for being covered In apart from D1.Additionally, it will be appreciated that electrostatic lenses 200 can be configured including multiple combination, for example, with regard to described in Figure 17 It is individual.In certain embodiments, the electrode of the whole of electrostatic lenses 200 may be incorporated into the such non-concentric curvature half between neighbouring electrode Footpath.In other embodiments, electrostatic lenses 200 all or less than such non-concentric for may be incorporated between neighbouring electrode of electrode it is bent Rate radius.

As will be appreciated, disclosed hourglass orifice shapes provide tightr compared with circular or rectangular apertures can be realized The desired electrical field shape of the desired beam shape of ground matching.For example, the aperture of substantial rectangular such as will cause at the electricity The top and bottom of gesture collapses to deviation that is round-shaped and will being expected in induction ion beam.Figure 18 is shown around lens The exemplary diagram of the electric field line of the hourglass shape opening 202d-208d in 200.As can be seen hourglass shape can offset equipotential " ellipticity ", it is allowed to the vertically and horizontally more preferable uncoupling of electric field.Field wire is relatively straight along the side of opening 202d, and And general shape is preferably matched and will have been placed through the height and thin ion beam 95 of electrostatic lenses 200.Therefore, less deviation will Formed in ion beam 95.

As previously mentioned, the size of the corresponding opening 202d-208d of electrode 202-208 can be on height and width Change.By changing the width and height of opening, and also for example, by the voltage on the second suppression electrode 206, can adjust The position of horizontal and vertical aggregation and amount.In curve shown in Figure 19, ion beam 95 can decelerate to 2keV from 20keV. On the power supply being associated with 22kV and with the second suppression electrode 206 above the power supply being associated with the first suppression electrode 204 Face only has 3kV.As can be seen most of equipotential encapsulate between the first suppression electrode 204 and the second suppression electrode 206 it is non- Often closely.In here explanation, equipotential is spaced apart 500V.This causes sizable in the opening 206d of the second suppression electrode 20 The focusing of level, and convergent beam leaves electrostatic lenses 200, and as shown in Figure 20, Figure 20 is passing through for the setting using Figure 19 The curve chart of the beam trajectory for being calculated of electrostatic lenses.

In figure 21, ion beam 95 decelerates to 2keV from 20keV.Above the power supply being associated with the first suppression electrode 204 With 10kV above the power supply being associated with 22kV and with the second suppression electrode 206.This causes equipotential to suppress first Fairly evenly it is spaced between electrode 204 and the second suppression electrode 206 and between the second suppression electrode and ground electrode 208 Open.In here explanation, equipotential is spaced apart 500V.Further result of this is that in the opening 206d of the second suppression electrode 206 compared with Few horizontal aggregation.Can see that ion beam 95 is occurred parallel to from electrostatic lenses 200 to a great extent, such as in fig. 22 It can be seen that, Figure 22 is the curve chart of the beam trajectory for being calculated through electrostatic lenses of the setting using Figure 21.

Figure 23 is the side view of the curve chart of Figure 19.As mentioned, ion beam 95 is decelerated to from 20keV in this case 2keV.The electricity being associated with 22kV and with the second suppression electrode 206 above the power supply being associated with the first suppression electrode 204 Only there is above source 3kV.As illustrated, most of equipotential suppresses electrode 204 and second to suppress non-between electrode 206 first Often it is packed closely together, this causes the considerably less vertical concentration in the second opening 206d for suppressing electrode 206.Equally, here In curve chart, equipotential is spaced apart 500V.

Figure 24 is the side view of the curve chart of Figure 21.As mentioned, ion beam 95 is decelerated to from 20keV in this case 2keV.The electricity being associated with 22kV and with the second suppression electrode 206 above the power supply being associated with the first suppression electrode 204 There is above source 10kV.As illustrated, equipotential suppresses electrode 204 and second to suppress between electrode 206 and the first Fairly evenly it is spaced apart between two suppression electrodes and ground electrode 208, during this causes the opening 206d of the second suppression electrode Less level aggregation, but substantial amounts of vertical aggregation.Equally, in this curve chart, equipotential is spaced apart 500V.

As will be appreciated, the curve chart shown in Figure 18-Figure 24 be merely exemplary and be applied to electrode shape, opening One embodiment of size and the potential for being applied.Using disclosed electrostatic lenses 200 by adjusting described herein Body characteristicses can obtain various different beam shapes (how many aggregation occurs wherein including aggregation and occur).

Although disclosing this utility model by reference to some embodiments, numerous modifications of described embodiment, Change and change are possible without without departing from field of the present utility model and scope.Accordingly, it is desirable to this utility model is simultaneously Described embodiment is not limited to, but with the four corner limited by the language of claims and its equivalent.

Claims (4)

1. a kind of suppression electrode of the electrostatic lenses in Ion Implantation Equipment, it is characterised in that include：

Suppress electrode, pass through along z-axis for receiving with first surface and second surface and suppression electrode opening At least one of the ion beam of traveling, the first surface and described second surface are bending in y-z plane；

Wherein described suppression electrode opening has top, bottom and core, and the suppression electrode opening on the top The width of end and the bottom end is more than the width for suppressing electrode opening in the central part office, and the suppression electricity Pole opening is equal to the width for suppressing electrode opening in the bottom end in the width of the top end,

The wherein described first surface for suppressing electrode has first curvature radius, and described the second of the suppression electrode Surface has second curvature radiuss, and wherein described first curvature radius and the second curvature radiuss are from along negative z-axis Point measurement, wherein described negative z-axis be from it is described suppress electrode center survey on the rightabout that the ion beam is advanced Amount, and wherein described first curvature radius is less than the second curvature radiuss.

2. suppression electrode according to claim 1, it is characterised in that the suppression electricity observed in the y-z plane The first surface of pole is recessed.

3. suppression electrode according to claim 2, it is characterised in that the suppression electricity observed in the y-z plane The second surface of pole is protrusion.

4. suppression electrode according to claim 3, it is characterised in that the first curvature radius and second curvature radiuss exist In the range of 250 millimeters to 310 millimeters.