CN205954102U - PVD support plate - Google Patents
PVD support plate Download PDFInfo
- Publication number
- CN205954102U CN205954102U CN201620798950.8U CN201620798950U CN205954102U CN 205954102 U CN205954102 U CN 205954102U CN 201620798950 U CN201620798950 U CN 201620798950U CN 205954102 U CN205954102 U CN 205954102U
- Authority
- CN
- China
- Prior art keywords
- support plate
- shade
- pvd
- utility
- model
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
Landscapes
- Physical Vapour Deposition (AREA)
Abstract
The utility model discloses a PVD support plate, including support plate and shade, through hinged joint on one side of the size and the support plate looks adaptation of shade, support plate and shade, the pressure of having arranged on support plate frame, be equipped with a plurality of circular bleeder vents in the pressure frame, the pressure frame that corresponds the support plate on the shade is provided with the fretwork hole. The utility model discloses when the support plate need maintain, need only pull down the stainless steel shade to come, clear up the shade, the support plate clean gently can, be favorable to maintenance, the maintenance of support plate, the life of extension support plate reduces equipment transmission system's fault rate.
Description
Technical field
This utility model is related to the technical field of semiconductor manufacturing, more particularly, to a kind of PVD support plate.
Background technology
PVD full name is physical vapour deposition (PVD), and its sputtering technology is to prepare one of important method of thin-film material.It is to utilize
Charged particle has the characteristics that certain kinetic energy after accelerating in the electric field, ion is guided into the target being intended to that sputtered material is made
Electrode (negative electrode), and target atom is sputtered out so that it is moved to substrate along certain direction and final deposit on substrate
The method of film forming.Magnetron sputtering is the special distributed controll electric field that magnetic control principle is combined with common sputtering technology using magnetic field
In trajectory of electron motion, the technique of sputtering is improved so that coating film thickness and uniformity are controlled with this, and the thin film prepared is fine and close
Property is good, cohesive force is strong and high purity.Magnetron sputtering technique has become as the important means of preparation various functions thin film.
PVD support plate is the vitals of PVD equipment.Its Main Function is the material preparing thin film will to be needed to be positioned over support plate
On, then it is sent to sputtering chamber through drive system, thin film is plated on material surface by sputtering system.Also can simultaneously
Plate thin film in remaining place of support plate, the access times with support plate are more, the film layer plating is thicker, when reaching one
Fixed thickness is it is necessary to being cleaned to support plate, maintaining.The great clearly method adopting at present, chemical solution etch and physics spray
Method of removing sand all can cause to support plate to damage it is therefore desirable to there be a kind of new support plate, solve support plate be difficult to clean, asking of maintaining
Topic.
Utility model content
For the problems referred to above, this utility model provides a kind of easily maintenance, maintenance, the PVD support plate of long service life.
For solving above-mentioned technical problem, this utility model be employed technical scheme comprise that：A kind of PVD support plate, including support plate
And shade, the size of described shade is adapted with support plate, and support plate and shade side are connected through the hinge, and described support plate is placed with
Press box, is provided with some circle air-vents, on described shade, the press box of corresponding support plate is provided with hollow hole in described press box.
Further, described shade is fixedly connected with support plate using screw locking.
Further, described shade has active edges, and described active edges center both sides of the edge are provided with arc convex.
Further, it is provided with four circular air-vents in described press box, four circular air-vents are respectively arranged in press box
Four angles.
From the above-mentioned description to this utility model structure, compared to the prior art, this utility model has excellent as follows
Point：
This utility model, when support plate needs maintenance, need only remove rustless steel shade, shade be cleared up, support plate
Gently wipe, be conducive to maintenance, the maintenance of support plate, extend the service life of support plate, reduce the fault of equipment driven system
Rate.
Brief description
The accompanying drawing constituting the part of the application is used for providing further understanding to of the present utility model, of the present utility model
Schematic description and description is used for explaining this utility model, does not constitute to improper restriction of the present utility model.In accompanying drawing
In：
Fig. 1 is a kind of Unclosing structure schematic diagram of new PVD support plate of this utility model；
Fig. 2 is a kind of covering structure schematic diagram of new PVD support plate of this utility model.
Specific embodiment
In order that the purpose of this utility model, technical scheme and advantage become more apparent, below in conjunction with accompanying drawing and enforcement
Example, is further elaborated to this utility model.It should be appreciated that specific embodiment described herein is only in order to explain
This utility model, is not used to limit this utility model.
Embodiment 1
With reference to Fig. 1, Fig. 2, a kind of PVD support plate, including support plate 1 and shade 2, the size of described shade 2 and support plate 1 are mutually fitted
Join, support plate 1 and shade 2 side are connected through the hinge, and shade 2 is fixedly connected with support plate 1, conveniently disconnects replacing, on described support plate 1
Be placed with press box 3, be provided with the circular air-vent 4 of four Φ 6 in described press box 3, four circular air-vents 4 are respectively arranged on press box
Four interior angles, it is ensured that the silicon chip positive back side pressure reduction being put into inside frame is consistent, are conducive to picking and placeing silicon chip, corresponding on described shade 2
The press box of support plate is provided with hollow hole 5, and described shade 2 has active edges, and it is convex that described active edges center both sides of the edge are provided with arc
Play 6, be easy to open or cover shade, when support plate needs maintenance, rustless steel shade need only be removed, shade is carried out clearly
Reason, support plate gently wipes, and is conducive to maintenance, the maintenance of support plate, extends the service life of support plate, reduces equipment driven system
Fault rate.
Embodiment 2
With reference to Fig. 1, Fig. 2, a kind of PVD support plate, including support plate 1 and shade 2, the size of described shade 2 and support plate 1 are mutually fitted
Join, support plate 1 and shade 2 side are connected through the hinge, and shade 2 is fixedly connected with support plate 1, conveniently disconnects replacing, on described support plate 1
It is placed with press box 3, in described press box 3, is provided with the circular air-vent 4 of four Φ 6, four circular air-vents 4 are respectively arranged in press box
Four angles it is ensured that to be put into silicon chip positive back side pressure reduction inside frame consistent, be conducive to picking and placeing silicon chip, corresponding on described shade 2 carry
The press box of plate is provided with hollow hole 5.
Open shade 2 during use will the silicon chip of plated film be positioned in press box 3, every piece of support plate 1 is provided with 18 press boxes 3, can
Place 18 pieces of silicon chips, insert press box 3 it is ensured that silicon chip edge is not coated with film layer in silicon chip edge, prevent silicon chip short circuit, cover
Shade 2, it is ensured that other regions of support plate will not be coated with film layer, is opened shade 2 and is taken out silicon chip after plating film layer.
The foregoing is only preferred embodiment of the present utility model, not in order to limit this utility model, all this
Any modification, equivalent and improvement made within the spirit of utility model and principle etc., should be included in this utility model
Protection domain within.
Claims (4)
1. a kind of PVD support plate it is characterised in that：Including support plate and shade, the size of described shade is adapted with support plate, support plate and
Shade side is connected through the hinge, and described support plate is placed with press box, is provided with some circle air-vents, described screening in described press box
On cover, the press box of corresponding support plate is provided with hollow hole.
2. according to claim 1 a kind of PVD support plate it is characterised in that：Described shade is fixed with support plate using screw locking
Connect.
3. according to claim 1 a kind of PVD support plate it is characterised in that：Described shade has active edges, in described active edges
Heart both sides of the edge are provided with arc convex.
4. according to claim 1 a kind of PVD support plate it is characterised in that：It is provided with four circular air-vents in described press box, four
Individual circle air-vent is respectively arranged on four angles in press box.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201620798950.8U CN205954102U (en) | 2016-07-27 | 2016-07-27 | PVD support plate |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201620798950.8U CN205954102U (en) | 2016-07-27 | 2016-07-27 | PVD support plate |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN205954102U true CN205954102U (en) | 2017-02-15 |
Family
ID=57972533
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201620798950.8U Active CN205954102U (en) | 2016-07-27 | 2016-07-27 | PVD support plate |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN205954102U (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN108342709A (en) * | 2018-02-12 | 2018-07-31 | 南京中电熊猫液晶显示科技有限公司 | A kind of substrate bearing device and its application method |
-
2016
- 2016-07-27 CN CN201620798950.8U patent/CN205954102U/en active Active
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN108342709A (en) * | 2018-02-12 | 2018-07-31 | 南京中电熊猫液晶显示科技有限公司 | A kind of substrate bearing device and its application method |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US11634808B2 (en) | Anti-corrosion conductive film and pulse bias alternation-based magnetron sputtering deposition method and application thereof | |
| CN105624608B (en) | A kind of preparation method of high heat conduction graphite film surface metal coating | |
| US9593405B2 (en) | Pinhole-free dielectric thin film fabrication | |
| JP6056987B2 (en) | Metal film forming apparatus and film forming method | |
| CN205954102U (en) | PVD support plate | |
| WO2022047949A1 (en) | Production processing system and preparation process of flexible conductive film | |
| CN104120389B (en) | Filming equipment | |
| TW201013959A (en) | Manufacturing device for thin-film solar cell | |
| CN211227346U (en) | Double-sided film coating machine | |
| KR950001863A (en) | Self-Cleaning Collimator | |
| JP2009187682A (en) | Method for manufacturing cathode electrode, and method for manufacturing thin film solid lithium-ion secondary battery | |
| CN106637207A (en) | Method for coating high temperature-resistant diamond on graphite substrate | |
| CN201826007U (en) | Anti-adhesion plate and membrane deposition equipment | |
| CN209276623U (en) | A kind of comprehensive coating apparatus | |
| CN110527961A (en) | A kind of cabinet body metal-coated surface technique based on magnetron sputtering | |
| CN112899627B (en) | Target mounting structure, magnetron sputtering equipment and magnetron sputtering method | |
| CN102634764A (en) | Multifunctional PVD (physical vapor deposition) film plating machine | |
| CN114075652B (en) | Preparation method of conductive film, current collection and transmission material and energy storage device | |
| JP3254782B2 (en) | Double-sided sputter film forming method and apparatus, and sputter film forming system | |
| CN106756886B (en) | A kind of control method of changed electric field atomic layer deposition system | |
| CN207727140U (en) | A kind of opposed target stand magnetic control sputtering device | |
| CN203187747U (en) | Magnetron sputtering target hood | |
| US11377727B2 (en) | Method for preparing bactericidal film on fiber cloth | |
| CN205692926U (en) | A kind of making apparatus of lithium ion battery | |
| WO2020137027A1 (en) | Sputtering device and sputtering method |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant |