CN205925400U - Waste gas processing system - Google Patents
Waste gas processing system Download PDFInfo
- Publication number
- CN205925400U CN205925400U CN201620816471.4U CN201620816471U CN205925400U CN 205925400 U CN205925400 U CN 205925400U CN 201620816471 U CN201620816471 U CN 201620816471U CN 205925400 U CN205925400 U CN 205925400U
- Authority
- CN
- China
- Prior art keywords
- waste gas
- pipeline
- oxidation
- scrubber
- cleaning mixture
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- 239000002912 waste gas Substances 0.000 title claims abstract description 91
- 238000012545 processing Methods 0.000 title abstract description 9
- 238000007254 oxidation reaction Methods 0.000 claims abstract description 40
- 230000003647 oxidation Effects 0.000 claims abstract description 36
- 239000007788 liquid Substances 0.000 claims abstract description 14
- 239000007921 spray Substances 0.000 claims abstract description 11
- 239000000126 substance Substances 0.000 claims abstract description 10
- 239000004065 semiconductor Substances 0.000 claims abstract description 7
- 238000005516 engineering process Methods 0.000 claims abstract description 6
- 238000004140 cleaning Methods 0.000 claims description 40
- 239000000203 mixture Substances 0.000 claims description 39
- 239000007789 gas Substances 0.000 claims description 29
- 238000002203 pretreatment Methods 0.000 claims description 26
- 238000010791 quenching Methods 0.000 claims description 26
- 230000000171 quenching effect Effects 0.000 claims description 26
- 230000001681 protective effect Effects 0.000 claims description 19
- 238000012805 post-processing Methods 0.000 claims description 17
- 239000007800 oxidant agent Substances 0.000 claims description 13
- 230000001590 oxidative effect Effects 0.000 claims description 13
- 239000012809 cooling fluid Substances 0.000 claims description 10
- 238000000034 method Methods 0.000 claims description 7
- 238000004891 communication Methods 0.000 claims description 4
- 238000005406 washing Methods 0.000 abstract description 9
- 239000013618 particulate matter Substances 0.000 abstract description 8
- 238000001816 cooling Methods 0.000 abstract description 4
- 238000010438 heat treatment Methods 0.000 abstract description 4
- 238000006386 neutralization reaction Methods 0.000 abstract description 3
- 239000002699 waste material Substances 0.000 abstract 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 19
- 239000000463 material Substances 0.000 description 4
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 3
- 239000001301 oxygen Substances 0.000 description 3
- 229910052760 oxygen Inorganic materials 0.000 description 3
- 238000006243 chemical reaction Methods 0.000 description 2
- 238000005260 corrosion Methods 0.000 description 2
- 230000007797 corrosion Effects 0.000 description 2
- 238000005201 scrubbing Methods 0.000 description 2
- CBENFWSGALASAD-UHFFFAOYSA-N Ozone Chemical compound [O-][O+]=O CBENFWSGALASAD-UHFFFAOYSA-N 0.000 description 1
- CDBYLPFSWZWCQE-UHFFFAOYSA-L Sodium Carbonate Chemical compound [Na+].[Na+].[O-]C([O-])=O CDBYLPFSWZWCQE-UHFFFAOYSA-L 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 238000003915 air pollution Methods 0.000 description 1
- 238000001914 filtration Methods 0.000 description 1
- 239000012530 fluid Substances 0.000 description 1
- 239000008187 granular material Substances 0.000 description 1
- 239000000479 mixture part Substances 0.000 description 1
- 238000011084 recovery Methods 0.000 description 1
- 238000004064 recycling Methods 0.000 description 1
Landscapes
- Treating Waste Gases (AREA)
Abstract
The utility model provides a waste gas processing system, be used for handling produced waste gas in the semiconductor technology, it includes the preceding processing apparatus according to preface setting and mutual intercommunication, a oxidation unit, a guenching unit and a back processing apparatus, processing apparatus included one day this waste gas and sprayed the first scrubber of a first washing liquid before should, this oxidation unit includes the heater of a pair of this waste heating, this guenching unit includes one day this waste gas and sprays a cooling fluidic cooler, this back processing apparatus includes one day this waste gas and sprays the second scrubber of a second washing liquid. This first washing liquid can carry out the neutralization to waste gas with this second washing liquid to wash the particulate matter in the waste gas, and this heater can carry out the oxidation to the harmful substance of this waste gas, therefore can effectually get rid of the harmful substance in the waste gas.
Description
Technical field
This utility model is to be related to a kind of processing system, espespecially a kind of exhaust treatment system.
Background technology
In semiconductor processing it will usually need using multiple special gases and substantial amounts of soda acid liquid, and in work
During skill, substantial amounts of waste gas of all kinds can be produced according to the difference of technique, right due to waste gas is directly discharged to outdoor meeting
Various biological and ecology causes greatest impact, and therefore, these waste gas can be gathered and passed through the process just meeting of certain procedures
Discharged.
" the semiconductor waste gas wash mill " of common semiconductor waste gas processing system such as Chinese patent CN 202803091,
It includes a scrubbing tower, an escape pipe and a water tank, and this scrubbing tower includes washing cavities, this escape pipe and this washing cavities phase
Intercommunicated, this water tank has a circulation line connecting with this washing cavities and a recovery pipe connecting with this escape pipe.When
When waste gas is passed through, can be neutralized with water in this washing cavities, then, waste gas can enter this escape pipe with part aqueous vapor, and water
Gas can condense into water in this escape pipe, and flows among this water tank, finally, is coming back to this washing cavities by this circulation line
In, recycling, consequently, it is possible to can be with saving water resource.
However, the many material demands in waste gas just can remove further with programs such as heating, if only utilizing water to
It is neutralized, and waste gas cannot be fully cleaned up, and be easily caused air pollution, therefore, how to purify waste gas further, useless to remove
Harmful substance in gas, an actually big problem.
Utility model content
Main purpose of the present utility model there are provided a kind of exhaust treatment system, cannot be complete to solve prior art
Go the problem of the harmful substance in removing exhaust gas.
For reaching above-mentioned purpose, this utility model provides a kind of exhaust treatment system, is produced in order to process in semiconductor technology
Raw waste gas, includes a pretreating device, an oxidation unit, a quenching unit and an after-treatment device, and this pre-treatment fills
Put and include the first scrubber that a pre-treatment pipeline and is arranged in this pre-treatment pipeline, this pre-treatment pipeline includes
The protective conduit that one air inlet and entering for this waste gas is arranged in this pre-treatment pipeline and is connected with this air inlet, should
One first cleaning mixture sprays towards this waste gas in first scrubber, and this oxidation unit includes one with this pre-treatment pipeline communication to receive
The oxidation pipeline and of this waste gas is set around the heater outside this oxidation pipeline, and this quenching unit includes one and this oxidation tube
Road connection is arranged at this quenching pipeline and towards this waste gas sprinkling one cooling fluid with the quenching pipeline and receiving this waste gas
Cooler, this after-treatment device includes one with this quenching pipeline communication to receive post processing pipeline and a setting of this waste gas
The second scrubber in this post processing pipeline, one second cleaning mixture, this post processing pipe spray towards this waste gas in this second scrubber
Road include an emission treatment after this waste gas air vent.
Exhaust treatment system described in the utility model, wherein, this pretreating device has further included one and has been arranged at this front place
In reason pipeline and between the first dehydrater between this first scrubber and this oxidation unit.
Exhaust treatment system described in the utility model, wherein, further included this first cleaning mixture of an offer to this first
First cleaning mixture delivery member of scrubber.
Exhaust treatment system described in the utility model, wherein, this oxidation unit has further included one and has been arranged at this oxidation tube
Adjacent to the oxidant provider of this pretreating device, this oxidant provider inputs an oxidant to this oxidation pipeline in road.
Exhaust treatment system described in the utility model, wherein, this cooler provides part, this cooling stream for a cryogenic liquid
Body is a cryogenic liquid.
Exhaust treatment system described in the utility model, wherein, this cooler provides part, this cooling stream for a cryogenic gas
Body is a cryogenic gas.
Exhaust treatment system described in the utility model, wherein, has further included one and has been communicated in this pre-treatment pipeline, this quenching
Pipeline and this post processing pipeline in order to reclaim this first cleaning mixture, this second cleaning mixture, this cooling fluid and this waste gas
In harmful substance retracting device.
Exhaust treatment system described in the utility model, wherein, this after-treatment device has further included one and has been arranged at this rear place
The filter layer of reason pipeline this quenching pipeline adjacent.
Exhaust treatment system described in the utility model, wherein, this after-treatment device has further included one and has been arranged at this rear place
Away from the second dehydrater of this quenching unit in reason pipeline.
Exhaust treatment system described in the utility model, wherein, further included this second cleaning mixture of an offer to this second
Second cleaning mixture delivery member of scrubber.
In sum, this utility model has the characteristics that：
First, pass through the setting of the first scrubber and the second scrubber, reaction can be neutralized to waste gas, and can be utilized the
One cleaning mixture and the second cleaning mixture rinse out the particulate matter in waste gas.
2nd, by the setting of heater, oxidation reaction can be carried out to waste gas, and having in waste gas can be got rid of further
Evil material.
Brief description
Fig. 1 is the structural representation of this utility model one preferred embodiment.
Wherein, reference：
Waste gas provides part 1
Pretreating device 10
Pre-treatment pipeline 11
Air inlet 111
Protective conduit 112
First scrubber 12
First cleaning mixture 13
First dehydrater 14
Waste gas 2
Oxidation unit 20
Oxidation pipeline 21
Heater 22
One quenching unit 30
Quenching pipeline 31
Cooler 32
Cryogenic liquid provides part 321
Cryogenic gas provides part 322
Cooling fluid 33
After-treatment device 40
Post processing pipeline 41
Air vent 411
Second scrubber 42
Second cleaning mixture 43
Filter layer 44
Second dehydrater 45
First protective gas provider 51
Protective gas air inlet 52
First cleaning mixture delivery member 61
Second cleaning mixture delivery member 62
Oxidant provider 71
Second protective gas provider 72
Retracting device 80
Water curtain system 90
Water source provider 91
Specific embodiment
It is related to of the present utility model detailed description in detail and technology contents, now with regard to coordinating brief description as follows：
Refer to shown in Fig. 1, this utility model is a kind of exhaust treatment system, and it is produced in order to process in semiconductor technology
A raw waste gas 2, and include a pretreating device 10, an oxidation unit 20, a quenching unit 30 and an after-treatment device
40, and this waste gas 2 also can be sequentially through said apparatus, to remove the harmful substance in this waste gas 2.This pretreating device 10 comprises
There are a pre-treatment pipeline 11 and first scrubber 12 being arranged in this pre-treatment pipeline 11, this pre-treatment pipeline 11 more wraps
It is arranged in this pre-treatment pipeline 11 and connects with this air inlet 111 for the air inlet 111 and that this waste gas 2 enters containing one
Protective conduit 112, this waste gas 2 by one waste gas provide part 1 enter after this air inlet 111, this protective conduit 112 can be introduced into,
Then enter back into this pre-treatment pipeline 11, one first cleaning mixture 13 then can spray towards this waste gas 2 in this first scrubber 12, in order to rush
Wash the particulate matter in this waste gas 2 off, and carry out neutralization reaction, and this first cleaning mixture 13 is then to be supplied by one first cleaning mixture
Part 61 is answered to be supplied to this first scrubber 12.Additionally, the present embodiment has further included one is arranged at this pre-treatment pipeline 11 adjacent
In the protective gas air inlet 52 of this air inlet 111, and pass through one first protective gas provider 51, and enter from this protective gas
QI KOU 52 inputs a protective gas to this pre-treatment pipeline 11, and works as this waste gas 2 and enter this pre-treatment by this protective conduit 112
During pipeline 11, this protective gas just can be contacted with this waste gas 2, and by this setting, this protective gas can be surrounded on this waste gas 2
Outside, and this waste gas 2 can be made will not too early to contact with this first cleaning mixture 13.
Furthermore, this pretreating device 10 has further included one and has been arranged in this pre-treatment pipeline 11 and between this first scrubber
The first dehydrater 14 between 12 and this oxidation unit 20, after this waste gas 2 is contacted with this first cleaning mixture 13, this waste gas 2 meeting
It is mingled with a little aqueous vapor, therefore, aqueous vapor can be removed when this waste gas 2 being mingled with aqueous vapor passes through this first dehydrater 14,
Then, then by this waste gas 2 it is transferred to this oxidation unit 20.
This oxidation unit 20 include one connect with this pre-treatment pipeline 11 oxidation pipeline 21 to receive this waste gas 2 and
One is set around the heater 22 outside this oxidation pipeline 21, and this heater 22 heats to this waste gas 2 and carries out oxidation reaction, so may be used
To remove the harmful substance in this waste gas 2 further, and in the present embodiment, further included be arranged at this oxidation pipeline 21 adjacent to
One oxidant provider 71 of this pretreating device 10 and one second protective gas provider 72, this oxidant provider 71 with
This second protective gas provider 72 inputs an oxidant and a protective gas respectively to this oxidation pipeline 21, and this oxidant can
Think air, ozone, oxygen, rich oxygen containing air or other oxygen-containing gas etc., and it is anti-that this waste gas 2 can be helped to carry out oxidation
Should.Additionally, heating after this waste gas 2 can produce because of harmful substance unavoidably corrosivity or temperature too high the problems such as, therefore, in this
Oxidation pipeline 21 is more provided with a Water curtain system 90 away from this pretreating device 10, and this Water curtain system 90 is set around this oxidation pipeline 21
Outward, and through a water source provider 91 provide a water source to this Water curtain system 90, this Water curtain system 90 is then at this oxidation pipeline 21
One water curtain is formed on tube wall, consequently, it is possible to can prevent there is corrosive this waste gas 2 corrosion pipe wall it is possible to prevent granule
Material is piled up on this tube wall.
And this quenching unit 30 then include one be connected with this oxidation pipeline 21 with the quenching pipeline 31 receiving this waste gas 2 with
And one be arranged at this quenching pipeline 31 and towards this waste gas 2 spray a cooling fluid 33 cooler 32, with to heating after this give up
Gas 2 is lowered the temperature, and this cooler 32 can provide part 321 or a cryogenic gas to provide part 322 for a cryogenic liquid, and this fall
Warm fluid 33 can be then a cryogenic liquid or a cryogenic gas, and in the present embodiment, respectively having this cryogenic liquid provides
Part 321 provides part 322 with cryogenic gas, and provides this cryogenic liquid and this cryogenic gas respectively, sprays towards this waste gas 2, to enter
Row cooling.
Finally, this waste gas 2 can enter this after-treatment device 40, and this after-treatment device 40 includes one and this quenching pipeline 31
Connection is arranged at the second scrubber 42 in this post processing pipeline 41 with the post processing pipeline 41 and receiving this waste gas 2, and one
Second cleaning mixture delivery member 62 provides one second cleaning mixture 43 to this second scrubber 42, and this second scrubber 42 is towards this waste gas 2
Spray this second cleaning mixture 43, and the particulate matter in this waste gas 2 can be removed and carry out neutralization reaction again, this enforcement
It is possible to collocation one is arranged at the filter layer 44 of this post processing pipeline 41 this quenching pipeline 31 adjacent in example, and can be to this waste gas 2
Filtered, to filter the particulate matter that cannot be rinsed out by this second cleaning mixture 43, and likewise, when this waste gas 2 with this
After two cleaning mixture 43 contact, this waste gas 2 also can be mingled with a little aqueous vapor, now, can be arranged at this post processing pipeline by one
In 41, the second dehydrater 45 away from this quenching unit 30 is made a return journey except aqueous vapor, and then, this waste gas 2 after process then can be via this
One air vent 411 of post processing pipeline 41 is discharged.
And the harmful substance in this first cleaning mixture 13, this second cleaning mixture 43, this cooling fluid 33 and this waste gas 2 is then
A retracting device 80 being communicated in this pre-treatment pipeline 11, this quenching pipeline 31 and this post processing pipeline 41 can be flowed into, and in
In this retracting device 80, carry out relevant treatment again.
In sum, this utility model has the characteristics that：
First, by the setting of protective conduit, waste gas protected gas can be made to surround, and can make waste gas will not too early with the
One cleaning mixture contact.
2nd, pass through the setting of the first scrubber and the second scrubber, reaction can be neutralized to waste gas, and can be utilized the
One cleaning mixture and the second cleaning mixture rinse out the particulate matter in waste gas.
3rd, pass through heater waste gas is heated, and waste gas can be made to carry out oxidation reaction, to go having in removing exhaust gas further
Evil material.
4th, utilize oxidant provider to input oxidant, waste gas can be helped to carry out oxidation reaction.
5th, by the setting of Water curtain system, water curtain can be formed on tube wall, consequently, it is possible to can prevent with corrosivity
Waste gas corrosion pipe wall it is possible to prevent particulate matter from piling up on tube wall.
6th, by the setting of cooler, waste gas can be made to lower the temperature, with the carrying out of sharp down-stream.
7th, by the setting of filter layer, waste gas can be filtered, cannot be rinsed out by the second cleaning mixture with filtering
Particulate matter.
8th, retracting device can reclaim the nuisance in the first cleaning mixture, the second cleaning mixture, cooling fluid and waste gas
Matter, prevents the pollution of the environment further.
Certainly, this utility model also can have other various embodiments, spiritual and its substantive without departing substantially from this utility model
In the case of, those of ordinary skill in the art can make various corresponding changes according to this utility model and deform, but these phases
The change answered and deformation all should belong to this utility model scope of the claims.
Claims (10)
1. a kind of exhaust treatment system, in order to process produced waste gas in semiconductor technology it is characterised in that this exhaust-gas treatment
System includes：
One pretreating device, this pretreating device includes a pre-treatment pipeline and and is arranged in this pre-treatment pipeline
One scrubber, this pre-treatment pipeline includes an air inlet and entering for this waste gas and is arranged in this pre-treatment pipeline simultaneously
The protective conduit connecting with this air inlet, one first cleaning mixture sprays towards this waste gas in this first scrubber；
One oxidation unit, this oxidation unit include one with this pre-treatment pipeline communication with receive this waste gas oxidation pipeline and
One is set around the heater outside this oxidation pipeline；
One quenching unit, this quenching unit is included one and is connected to receive the quenching pipeline and of this waste gas with this oxidation pipeline
It is arranged at this quenching pipeline and spray the cooler of a cooling fluid towards this waste gas；And
One after-treatment device, this after-treatment device includes one with this quenching pipeline communication to receive the post processing pipeline of this waste gas
And one be arranged at the second scrubber in this post processing pipeline, one second cleaning mixture sprays towards this waste gas in this second scrubber,
This post processing pipeline include an emission treatment after this waste gas air vent.
2. exhaust treatment system according to claim 1 is it is characterised in that this pretreating device has further included one is arranged at
In this pre-treatment pipeline and between the first dehydrater between this first scrubber and this oxidation unit.
3. exhaust treatment system according to claim 1 is it is characterised in that further included this first cleaning mixture of an offer extremely
First cleaning mixture delivery member of this first scrubber.
4. exhaust treatment system according to claim 1 is arranged at this it is characterised in that this oxidation unit has further included one
Adjacent to the oxidant provider of this pretreating device, this oxidant provider inputs an oxidant to this oxidation tube to oxidation pipeline
In road.
5. exhaust treatment system according to claim 1 it is characterised in that this cooler be one cryogenic liquid provide part,
This cooling fluid is a cryogenic liquid.
6. exhaust treatment system according to claim 1 it is characterised in that this cooler be one cryogenic gas provide part,
This cooling fluid is a cryogenic gas.
7. exhaust treatment system according to claim 1 is communicated in this pre-treatment pipe it is characterised in that having further included one
Road, this quenching pipeline and this post processing pipeline and in order to reclaim this first cleaning mixture, this second cleaning mixture, this cooling fluid with
And the retracting device of the harmful substance in this waste gas.
8. exhaust treatment system according to claim 1 is it is characterised in that this after-treatment device has further included one is arranged at
The filter layer of this post processing pipeline this quenching pipeline adjacent.
9. exhaust treatment system according to claim 1 is it is characterised in that this after-treatment device has further included one is arranged at
Away from the second dehydrater of this quenching unit in this post processing pipeline.
10. exhaust treatment system according to claim 1 is it is characterised in that further included this second cleaning mixture of an offer
The second cleaning mixture delivery member to this second scrubber.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201620816471.4U CN205925400U (en) | 2016-07-29 | 2016-07-29 | Waste gas processing system |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201620816471.4U CN205925400U (en) | 2016-07-29 | 2016-07-29 | Waste gas processing system |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN205925400U true CN205925400U (en) | 2017-02-08 |
Family
ID=57924909
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201620816471.4U Active CN205925400U (en) | 2016-07-29 | 2016-07-29 | Waste gas processing system |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN205925400U (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN111093806A (en) * | 2017-08-31 | 2020-05-01 | 易克易呢根股份有限公司 | IPA-containing process system for treating an engineered exhaust stream |
| TWI793266B (en) * | 2018-02-26 | 2023-02-21 | 日商荏原製作所股份有限公司 | Wet abatement system |
-
2016
- 2016-07-29 CN CN201620816471.4U patent/CN205925400U/en active Active
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN111093806A (en) * | 2017-08-31 | 2020-05-01 | 易克易呢根股份有限公司 | IPA-containing process system for treating an engineered exhaust stream |
| TWI793266B (en) * | 2018-02-26 | 2023-02-21 | 日商荏原製作所股份有限公司 | Wet abatement system |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| TR01 | Transfer of patent right | ||
| TR01 | Transfer of patent right |
Effective date of registration: 20190520 Address after: No. 17 Langyashan Road, High-tech Industrial Development Zone, Yijiang District, Wuhu City, Anhui Province Patentee after: Anhui Kaiqian Automation Equipment Co., Ltd. Address before: No. 30 Garrison Square, Garrison Industrial Park, Singapore #01-23/24 Patentee before: Applied Materials Inc. |
|
| CP02 | Change in the address of a patent holder | ||
| CP02 | Change in the address of a patent holder |
Address after: 241002 1-3 floors of No. 3 Building, Soft Wuhu Software Park, No. 17 Langyashan Road, Yijiang District High-tech Industrial Development Zone, Wuhu City, Anhui Province Patentee after: Anhui Kaiqian Automation Equipment Co., Ltd. Address before: 241002 No. 17 Langyashan Road, Yijiang District High-tech Industrial Development Zone, Wuhu City, Anhui Province Patentee before: Anhui Kaiqian Automation Equipment Co., Ltd. |
|
| CP01 | Change in the name or title of a patent holder | ||
| CP01 | Change in the name or title of a patent holder |
Address after: 241002 floor 1-3, building 3, zhongruan Wuhu Software Park, No.17 Langyashan Road, high tech Industrial Development Zone, Yijiang District, Wuhu City, Anhui Province Patentee after: Anhui yikos automation equipment Co., Ltd Address before: 241002 floor 1-3, building 3, zhongruan Wuhu Software Park, No.17 Langyashan Road, high tech Industrial Development Zone, Yijiang District, Wuhu City, Anhui Province Patentee before: Anhui Kaiqian Automation Equipment Co., Ltd. |