CN205880267U - Easy abluent infrared cutoff filter - Google Patents
Easy abluent infrared cutoff filter Download PDFInfo
- Publication number
- CN205880267U CN205880267U CN201620804514.7U CN201620804514U CN205880267U CN 205880267 U CN205880267 U CN 205880267U CN 201620804514 U CN201620804514 U CN 201620804514U CN 205880267 U CN205880267 U CN 205880267U
- Authority
- CN
- China
- Prior art keywords
- material layer
- film
- mgf2
- layer
- index material
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
Abstract
The utility model discloses an easy abluent infrared cutoff filter, including the base plate, set up the composite membrane layer on the base plate, composite membrane layer be provided with outer rete outward, the base plate be glass substrate, composite membrane layer including in turn superimposed high -index material layer and low -index material layer, outer rete be siO2+MgF2 or mgF2 NULL's rete. The utility model discloses a does through the setting of outer rete, the film forming parameter of especially optimizing outer rete reduce the waterproof angle of light filter, because the special chemical property of buffer layer material, the not weakness of acid and alkali -resistance of waterproof coating materials has been overcome in the washing of acid and alkali -resistance solution, the effectual solution owing to the silk screen printing among the prior art the dirty abnormal phenomena of waiting that cutting procedure's introduction is difficult to to clean at the glass surface adsorption, the structure is comparatively simple, easily penetration and promotion, and can improve enterprise competitiveness greatly.
Description
Technical field
This utility model relates to filter technology field, particularly to the cutoff filter of a kind of easy cleaning.
Background technology
Cutoff filter is a kind of optical filter allowing visible light-transmissive and end or reflect infrared light, mainly
For digital camera, mobile phone, computer camera, monitor, videophone etc., can make to filter off height by the light wave after taking the photograph phase camera lens
Frequency range, only allows a range of low frequency light wave pass through.Plus IR-cut between camera lens and CCD or cmos image sensor
Optical filter, can effectively suppress higher than CCD or cmos image sensor spatial frequency light wave by and cause ripple disturbance, and have
Effect ground suppression infrared waves, improves colored CCD, cmos image sensor effective resolution and colour reproduction, makes image clear
With stable.
Along with the most perfect of product quality is pursued by fast development and the people of science and technology, cutoff filter is in processing
During be gradually introduced the operations such as cutting, silk-screen.But easily at glass surface absorption dust and dirty in these manufacturing procedures
Dirt, and these dusts or dirty wash poor effect the super of glass surface, it is necessary to manual wipping, therefore greatly reduce production
Efficiency, improves cost.
The patent of Publication No. CN 104947044 A discloses the film plating process of a kind of cutoff filter, uses spy
The parameter of fixed ultrasonic cleaner sets and the proportioning of cleanout fluid, effectively raises the cleaning performance of ultrasonic cleaner,
The superhard waterproof membrane of plating 95nm thickness is added, by using above-mentioned technique adjustment to stop coating materials in coating process at film layer outermost layer
The abnormal phenomenas such as " the rough surface difficulty wiping " and " easily having dirty and grey dirt pits " formed.But this invented technology is the most multiple
Miscellaneous, it is weak to the special nature of acid-base solution owing to waterproof coating materials has, causes the parameter needing specific ultrasonic cleaner to set
Determining and the proportioning of cleanout fluid, therefore this patent of invention has certain limitation, and coating process is complicated.
Therefore it provides a kind of simple in construction, and difficulty can be adsorbed to due to the introducing of silk-screen, cutting action at glass surface
With the dirty cutoff filter quickly processed of wiping, it it has been a good problem to study.
Summary of the invention
In order to overcome above-mentioned deficiency of the prior art, utility model provides a kind of structure letter, and can effectively solve the problem that
The dirty problem easy cleaning cutoff filter being difficult to clean in cutoff filter surface.
The purpose of this utility model is achieved in that
The cutoff filter of a kind of easy cleaning, including substrate 4, is arranged on the composite film on substrate 4, and its feature exists
In: described composite film is outside equipped with theca externa 1；
Described substrate 4 is glass substrate；Described composite film includes the high refractive index material layer 2 that is superimposed and low
Refractive index material 3；
Described high refractive index material layer 2 is Ti3O5 material layer, vacuum 2.0E-2Pa during plated film, rate of film build
0.2---0.4nm/s, thickness is 10---150nm, and electron gun deflection current is 390mA；
Described low refractive index material layer 3 is SiO2 layer, vacuum 1.3E-2Pa during plated film, rate of film build 0.8---
1.6nm/s, thickness is 50---200nm, and electron gun deflection current is 160mA；
Described theca externa 1 is the film layer that SiO2+MgF2 or MgF2 material is constituted；
Actively beneficial effect: this utility model is by by the setting of theca externa, especially optimizing the film forming ginseng of theca externa
Number reduces the waterproof angle of optical filter, due to the chemical property that cushioning layer material is special, the cleaning of acid and alkali-resistance solution, overcomes waterproof
The weakness of coating materials not acid and alkali-resistance, effectively solves in prior art owing to the introducing of silk-screen cutting action is in glass surface suction
The attached dirty abnormal phenomena such as grade being difficult to wiping, structure is relatively simple, it is easy to penetration and promotion, and can be greatly improved competition among enterprises
Power.
Accompanying drawing explanation
Fig. 1 is structural representation one of the present utility model；
Fig. 2 is structural representation two of the present utility model；
Figure is: theca externa 1, high refractive index material layer 2, low refractive index material layer 3, substrate 4.
Detailed description of the invention
Below in conjunction with the accompanying drawings, this utility model is described further:
The cutoff filter of a kind of easy cleaning, including substrate 4, is arranged on the composite film on substrate 4, and described answers
Close film layer and be outside equipped with theca externa 1；
Described substrate 4 is glass substrate；Described composite film includes the high refractive index material layer 2 that is superimposed and low
Refractive index material 3；
Described high refractive index material layer 2 is Ti3O5 material layer, rate of film build 0.2nm/s, 0.25nm/s, 0.3nm/s,
0.35nm/s、0.4nm/s；Described low refractive index material layer 3 is SiO2 layer, rate of film build 0.8nm/s, 0.9nm/s,
1.0nm/s、1.1nm/s、1.2nm/s、1.3nm/s、1.4nm/s、1.5nm/s、1.6nm/s；Wherein five oxidation Tritanium/Trititanium and oxidation
The ion auxiliary energy of silicon is respectively BV:700-1300V, BI:700-1300mA and BV:600-1100V, BI:600-
1100mA。
Described theca externa 1 is the film layer that SiO2+MgF2 or MgF2 material is constituted；
The coating process parameter of the MgF2 of described theca externa is: vacuum 8.0E-3Pa during plated film, and MgF2 thickness is about
10---100nm, IB voltage 200-900V, electric current 200-900mA, rate of film build 0.2---0.8nm/s, electron gun deflection current
For 21mA.
Embodiment 1
As it is shown in figure 1, the cutoff filter of a kind of easy cleaning, including substrate 4, it is arranged on the composite membrane on substrate 4
Layer, described composite film is outside equipped with theca externa 1；Described composite film includes the high refractive index material layer 2 being superimposed
With low refractive index material layer 3；From substrate 4 upwards set gradually into low refractive index material layer 3 and high refractive index material layer 2 alternately
Arrange, final for arranging theca externa 1 outside high refractive index material layer 2；Described theca externa is the film that SiO2+MgF2 material is constituted
Layer；
Described high refractive index material layer 2 is Ti3O5 material layer, rate of film build 0.2nm/s, 0.25nm/s, 0.3nm/s,
0.35nm/s、0.4nm/s；Described low refractive index material layer 3 is SiO2 layer, rate of film build 0.8nm/s, 0.9nm/s,
1.0nm/s、1.1nm/s、1.2nm/s、1.3nm/s、1.4nm/s、1.5nm/s、1.6nm/s；The MgF2's of described theca externa
Coating process parameter is: vacuum 8.0E-3Pa during plated film, and MgF2 thickness is about 10---100nm, IB voltage 200-900V, electricity
Stream 200-900mA, rate of film build 0.2---0.8nm/s, electron gun deflection current is 21mA.
Embodiment 2
As it is shown in figure 1, the cutoff filter of a kind of easy cleaning, including substrate 4, it is arranged on the composite membrane on substrate 4
Layer, described composite film is outside equipped with theca externa 1；Described composite film includes the high refractive index material layer 2 being superimposed
With low refractive index material layer 3；From substrate 4 upwards set gradually into low refractive index material layer 3 and high refractive index material layer 2 alternately
Arrange, final for arranging theca externa 1 outside high refractive index material layer 2；Described theca externa is the film layer that MgF2 material is constituted；
Described high refractive index material layer 2 is Ti3O5 material layer, rate of film build 0.2nm/s, 0.25nm/s, 0.3nm/s,
0.35nm/s、0.4nm/s；Described low refractive index material layer 3 is SiO2 layer, rate of film build 0.8nm/s, 0.9nm/s,
1.0nm/s、1.1nm/s、1.2nm/s、1.3nm/s、1.4nm/s、1.5nm/s、1.6nm/s；The MgF2's of described theca externa
Coating process parameter is: vacuum 8.0E-3Pa during plated film, and MgF2 thickness is about 10---100nm, IB voltage 200-900V, electricity
Stream 200-900mA, rate of film build 0.2---0.8nm/s, electron gun deflection current is 21mA.
Embodiment 3
As in figure 2 it is shown, the cutoff filter of a kind of easy cleaning, including substrate 4, it is arranged on the composite membrane on substrate 4
Layer, described composite film is outside equipped with theca externa 1；Described composite film includes the high refractive index material layer 2 being superimposed
With low refractive index material layer 3；From substrate 4 upwards set gradually into high refractive index material layer 2 and low refractive index material layer 3 alternately
Arrange, final for arranging theca externa 1 outside high refractive index material layer 2；Described theca externa is the film that SiO2+MgF2 material is constituted
Layer；
Described high refractive index material layer 2 is Ti3O5 material layer, rate of film build 0.2nm/s, 0.25nm/s, 0.3nm/s,
0.35nm/s、0.4nm/s；Described low refractive index material layer 3 is SiO2 layer, rate of film build 0.8nm/s, 0.9nm/s,
1.0nm/s、1.1nm/s、1.2nm/s、1.3nm/s、1.4nm/s、1.5nm/s、1.6nm/s；The MgF2's of described theca externa
Coating process parameter is: vacuum 8.0E-3Pa during plated film, and MgF2 thickness is about 10---100nm, IB voltage 200-900V, electricity
Stream 200-900mA, rate of film build 0.2---0.8nm/s, electron gun deflection current is 21mA.
Embodiment 4
As in figure 2 it is shown, the cutoff filter of a kind of easy cleaning, including substrate 4, it is arranged on the composite membrane on substrate 4
Layer, described composite film is outside equipped with theca externa 1；Described composite film includes the high refractive index material layer 2 being superimposed
With low refractive index material layer 3；From substrate 4 upwards set gradually into high refractive index material layer 2 and low refractive index material layer 3 alternately
Arrange, final for arranging theca externa 1 outside high refractive index material layer 2；Described theca externa is the film layer that MgF2 material is constituted；
Described high refractive index material layer 2 is Ti3O5 material layer, rate of film build 0.2nm/s, 0.25nm/s, 0.3nm/s,
0.35nm/s、0.4nm/s；Described low refractive index material layer 3 is SiO2 layer, rate of film build 0.8nm/s, 0.9nm/s,
1.0nm/s、1.1nm/s、1.2nm/s、1.3nm/s、1.4nm/s、1.5nm/s、1.6nm/s；The MgF2's of described theca externa
Coating process parameter is: vacuum 8.0E-3Pa during plated film, and MgF2 thickness is about 10---100nm, IB voltage 200-900V, electricity
Stream 200-900mA, rate of film build 0.2---0.8nm/s, electron gun deflection current is 21mA.
The present invention, by changing the optimization of outermost layer MgF2 conventional process parameters, uses following technological parameter: during plated film
Vacuum 8.0E-3Pa, thickness is about 10---100nm, IB voltage 200-900V, electric current 200-900mA, rate of film build 0.2---
0.8nm/s, electron gun deflection current is 21mA so that film layer firmness is best, and overcomes traditional handicraft and use merely oxygen
Change titanium and the most washable shortcoming of silicon nitride process optical filter, also overcome outermost layer in CN 104947044 A patent and use waterproof
Coating materials is weak to the shortcomings such as ultrasonic waves for cleaning, thus improves the product quality of optical filter.
This utility model, by by the setting of theca externa, especially optimizes the one-tenth film parameters of theca externa to reduce optical filter
Waterproof angle, due to the chemical property that cushioning layer material is special, the cleaning of acid and alkali-resistance solution, overcomes waterproof coating materials and is weak to soda acid
Weakness, effectively solves in prior art owing to introducing of silk-screen cutting action is difficult to the dirty of wiping in glass surface absorption
The abnormal phenomenas such as dirt, structure is relatively simple, it is easy to penetration and promotion, and can be greatly improved enterprise competitiveness.
Above case study on implementation is merely to illustrate preferred implementation of the present utility model, but on this utility model is not limited to
State embodiment, in the ken that described field those of ordinary skill is possessed, spirit of the present utility model and principle it
Interior made any amendment, equivalent replacement and improvement etc., be regarded as the protection domain of the application.
Claims (5)
1. a cutoff filter for easy cleaning, including substrate (4), is arranged on the composite film on substrate (4), its feature
It is: described composite film is outside equipped with theca externa (1).
The cutoff filter of a kind of easy cleaning the most according to claim 1, it is characterised in that: described substrate (4)
For glass substrate；Described composite film includes high refractive index material layer (2) and the low refractive index material layer (3) being superimposed.
The cutoff filter of a kind of easy cleaning the most according to claim 2, it is characterised in that: described high index of refraction
Material layer (2) is Ti3O5 material layer, vacuum 2.0E-2Pa during plated film, rate of film build 0.2---0.4nm/s, thickness 10---
150nm, electron gun deflection current is 390mA.
The cutoff filter of a kind of easy cleaning the most according to claim 2, it is characterised in that: described low-refraction
Material layer (3) is SiO2 layer, vacuum 1.3E-2Pa during plated film, rate of film build 0.8---1.6nm/s, thickness 50---200nm,
Electron gun deflection current is 160mA.
The cutoff filter of a kind of easy cleaning the most according to claim 1, it is characterised in that: described theca externa
(1) be SiO2+MgF2 or MgF2 material constitute film layer, vacuum 8.0E-3Pa during theca externa MgF2 plated film, MgF2 thickness is about
For 10---100nm, IB voltage 200-900V, electric current 200-900mA, rate of film build 0.2---0.8nm/s, electron gun deflection electricity
Stream is 21mA.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201620804514.7U CN205880267U (en) | 2016-07-29 | 2016-07-29 | Easy abluent infrared cutoff filter |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201620804514.7U CN205880267U (en) | 2016-07-29 | 2016-07-29 | Easy abluent infrared cutoff filter |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN205880267U true CN205880267U (en) | 2017-01-11 |
Family
ID=57699091
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201620804514.7U Active CN205880267U (en) | 2016-07-29 | 2016-07-29 | Easy abluent infrared cutoff filter |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN205880267U (en) |
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN106054299A (en) * | 2016-07-29 | 2016-10-26 | 利达光电股份有限公司 | Easy-to-clean infrared cut-off filter and coating method thereof |
| CN106940456A (en) * | 2017-04-25 | 2017-07-11 | 舜宇光学(中山)有限公司 | The antireflective film and its manufacture craft of a kind of large angle glass lens |
| CN107300727A (en) * | 2017-08-04 | 2017-10-27 | 舜宇光学(中山)有限公司 | Antireflective film lens and preparation method thereof |
| CN107678081A (en) * | 2017-09-14 | 2018-02-09 | 利达光电股份有限公司 | A kind of low haze cutoff filter and its film plating process |
| WO2022052268A1 (en) * | 2020-09-14 | 2022-03-17 | 诚瑞光学(深圳)有限公司 | Lens and lens assembly |
-
2016
- 2016-07-29 CN CN201620804514.7U patent/CN205880267U/en active Active
Cited By (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN106054299A (en) * | 2016-07-29 | 2016-10-26 | 利达光电股份有限公司 | Easy-to-clean infrared cut-off filter and coating method thereof |
| CN106940456A (en) * | 2017-04-25 | 2017-07-11 | 舜宇光学(中山)有限公司 | The antireflective film and its manufacture craft of a kind of large angle glass lens |
| CN107300727A (en) * | 2017-08-04 | 2017-10-27 | 舜宇光学(中山)有限公司 | Antireflective film lens and preparation method thereof |
| CN107300727B (en) * | 2017-08-04 | 2023-08-11 | 舜宇光学(中山)有限公司 | Antireflection film lens and preparation method thereof |
| CN107678081A (en) * | 2017-09-14 | 2018-02-09 | 利达光电股份有限公司 | A kind of low haze cutoff filter and its film plating process |
| CN107678081B (en) * | 2017-09-14 | 2024-02-23 | 南阳利达光电有限公司 | Low-haze infrared cut-off filter and film coating method thereof |
| WO2022052268A1 (en) * | 2020-09-14 | 2022-03-17 | 诚瑞光学(深圳)有限公司 | Lens and lens assembly |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN205880267U (en) | Easy abluent infrared cutoff filter | |
| CN106054299B (en) | A kind of cutoff filter and its film plating process of easy cleaning | |
| CN107924003B (en) | Light-transmitting structure | |
| KR101103264B1 (en) | Fabrication Method for Functional Surface | |
| CN103412350B (en) | Multi-band enhancement type metal reflection film and preparing method thereof | |
| CN102749667B (en) | Optical filter for image chip | |
| CN104553126A (en) | Antireflection glass and preparation method thereof | |
| CN105074513A (en) | Near-infrared cut filter and solid-state image pickup device including same | |
| TW201333777A (en) | Substrate with transparent electrode, method for producing same, and touch panel | |
| CN110196466A (en) | A kind of low warpage cutoff filter and its film plating process | |
| WO2017056598A1 (en) | Hydrophilic multilayer film and method for manufacturing same, and imaging system | |
| JP6053262B2 (en) | Optical element, optical system and optical apparatus using the same | |
| CN205484888U (en) | Blue glass infrared cutoff filter | |
| JP2015094885A (en) | Optical element, optical system and optical device | |
| CN108017290A (en) | The preparation method of anti reflection glass | |
| CN204462434U (en) | Day and night bandpass filter | |
| TW201348758A (en) | Infrared filter and lens module | |
| CN104730675A (en) | Optical lens and portable device | |
| CN104007490A (en) | Optical antireflection film adopting two coating materials | |
| CN210347971U (en) | High-transmittance glass substrate | |
| CN109383083B (en) | Antireflection glass and preparation method thereof | |
| CN205103425U (en) | Touch -sensitive screen is with subtracting reflection and automatically cleaning integration membrane system | |
| CN103407232A (en) | Offline antireflection coated glass and manufacturing method thereof | |
| CN208351024U (en) | Film layer structure and lens barrel comprising the film layer structure | |
| CN107065053B (en) | The method for preparing optical filter |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| GR01 | Patent grant | ||
| TR01 | Transfer of patent right | ||
| TR01 | Transfer of patent right |
Effective date of registration: 20190712 Address after: 473000 No. 366 Xinchen West Road, Nanyang High-tech Zone, Henan Province Patentee after: Nanyang Lida Photoelectric Co.,Ltd. Address before: 473003 No. 508 Industrial Road, Nanyang City, Henan Province Patentee before: LIDA OPTICAL AND ELECTRONIC Co.,Ltd. |
|
| CB03 | Change of inventor or designer information | ||
| CB03 | Change of inventor or designer information |
Inventor after: Sun Bo Inventor after: Jiao Taotao Inventor after: Zhang Hao Inventor after: Gao Lvyang Inventor after: Fu Yong Inventor after: Li Zhichao Inventor before: Sun Bo Inventor before: Jiao Tao Inventor before: Zhang Hao Inventor before: Gao Lvyang Inventor before: Fu Yong Inventor before: Li Zhichao |