CN205863131U - A kind of dry etching machine cavity chamber device - Google Patents

A kind of dry etching machine cavity chamber device Download PDF

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Publication number
CN205863131U
CN205863131U CN201620649899.4U CN201620649899U CN205863131U CN 205863131 U CN205863131 U CN 205863131U CN 201620649899 U CN201620649899 U CN 201620649899U CN 205863131 U CN205863131 U CN 205863131U
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CN
China
Prior art keywords
platen
protuberance
sidewall
dry etching
halfpace
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CN201620649899.4U
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Chinese (zh)
Inventor
董磊磊
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Kunshan Govisionox Optoelectronics Co Ltd
Kunshan Guoxian Photoelectric Co Ltd
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Kunshan Guoxian Photoelectric Co Ltd
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Priority to CN201620649899.4U priority Critical patent/CN205863131U/en
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Abstract

This utility model provides a kind of dry etching machine cavity chamber device, is improved fixed component of the prior art, the problem efficiently solving its cracky, reduces cleaned and changed breakage risk, reduce production cost.This dry etching machine cavity chamber device, including supporting platform, platen and fixed component, described platen is fixed on described support platform top, described support platform top outer edge forms halfpace, the sidewall of described platen is concordant with the sidewall of described halfpace, the sidewall of described fixed component is provided with protuberance, and described protuberance coordinates with described halfpace, the sidewall laminating of described protuberance sidewall and described platen and described halfpace.

Description

A kind of dry etching machine cavity chamber device
Technical field
This utility model relates to dry etching technology field, is specifically related to a kind of dry etching equipment.
Background technology
Deep dry etch process refers to reacting gas as main medium, forms high-density plasma under the effect of rf electric field Body, performs etching semi-conducting material, thus the device contour structures required for being formed.
During dry carving technology, the etch residues such as a lot of abrasive grains can be produced, although major part residue can be with The direction circulation of air flow is pumped, but minority still can remain in the chamber, corrodes chamber body.So in the chamber, logical Platen often can be set to deposit these etch residues to prevent the miscellaneous part in its corrosion chamber body.Fig. 1 show existing There is a kind of device in technology, for supporting and stationary platen 5, as it is shown in figure 1, the upper surface supporting platform 1 is stepped, wherein Plane 3 near outside is less than the plane 4 near inner side, and the centre position of a sidewall of fixed component 2 is provided with little protuberance 6, Little protuberance 6 is placed in plane 3, and with plane 4 at grade, the platen 5 above common support, screw 7 inserts its upper surface Fixed component 2 is fixed on support platform 1 by little protuberance 6, then the platen 5 between two fixed components 2 has the most correspondingly been fixed on fixing Between parts 2 and support platform 1.Owing to platen 5 and support platform 1 generally are metallic plate, the position that they sidewalls contact is easy to Being corroded by reacting gas, so fixed component 2 not only has the effect of stationary platen 5, it is arranged on platen 5 and supports platform 1 The position that contacts of sidewall, it is possible to avoid this position to be corroded.Higher corrosion-resistant in order to be able to make fixed component 2 to have Property, resistance to bombardment and heat-resisting quantity, fixed component 2 would generally select ceramic material.From Fig. 1, we have observed that, due to fixed part The part (the least protuberance 6) that part 2 is connected with support platform 1 is less, and the design of its structure needs little protuberance 6 together with supporting platform 1 Undertake the gravity of platen 5 above it, so in use fixed component 2 is easy at little protuberance 6 rupture.It addition, The a lot of abrasive particles produced in etching process can be attached in platen 5 and fixed component 2, is accomplished by so having arrived some cycles Fixed component 2 is disassembled and is carried out, due to reasons such as its ceramic material and structure designs, hold the most very much in unloading process Fragile.
Utility model content
In view of this, this utility model embodiment provides a kind of dry etching machine cavity chamber device, to of the prior art fixing Parts are improved, the problem efficiently solving its cracky, reduce cleaned and changed breakage risk, reduce production Cost.
A kind of dry etching machine cavity chamber device that this utility model one embodiment provides, including supporting platform, platen and fixed component, Described platen is fixed on described support platform top, and described support platform top outer edge forms halfpace, the sidewall of described platen with The sidewall of described halfpace is concordant, and the sidewall of described fixed component is provided with protuberance, and described protuberance coordinates with described halfpace, described protuberance The sidewall laminating of sidewall and described platen and described halfpace;
Wherein, the upper and lower end face spacing of described protuberance is equal with described halfpace height and described platen thickness sum;
Wherein, the upper and lower end face spacing of described protuberance, higher than described halfpace height and described platen thickness sum, exceed institute The sidewall of the described protuberance stating platen extends in the middle part of described platen, the upper surface of platen described in partial occlusion;
Wherein, described platen is aluminium sheet;
Wherein, described support platform is that aluminum material is made;
Wherein, described fixed component is that ceramic material is made;
Wherein, described protuberance is connected by screw is fixing with supporting platform.
The dry etching machine cavity chamber device that this utility model embodiment is provided, by strengthening fixed component and the connection supporting platform Volume and carry out being arranged side by side this technical scheme by the protuberance of fixed component and platen, it is to avoid support platform and platen sidewall While junction is corroded by etching gas, the problem efficiently solving fixed component cracky, reduce cleaned and changed Breakage risk, reduces production cost.
Accompanying drawing explanation
Fig. 1 show the structural representation of a kind of dry etching machine cavity chamber device of the prior art.
Fig. 2 show the structural representation of a kind of dry etching machine cavity chamber device that this utility model one embodiment provides.
Fig. 3 show the structural representation of a kind of dry etching machine cavity chamber device that another embodiment of this utility model provides.
Detailed description of the invention
Below in conjunction with the accompanying drawing in this utility model embodiment, the technical scheme in this utility model embodiment is carried out Clearly and completely describe, it is clear that described embodiment is only a part of embodiment of this utility model rather than whole realities Execute example.Based on the embodiment in this utility model, those of ordinary skill in the art are institute under not making creative work premise The every other embodiment obtained, broadly falls into the scope of this utility model protection.
As shown in figures 2-3, the dry etching machine cavity chamber device that this utility model provides, including supporting platform 1, platen 5 and fixed part Part 8 (or fixed component 9), platen 5 is fixed on the top supporting platform 1, supports platform 1 top outer edge and forms halfpace, platen 5 Sidewall 10 is concordant with the sidewall 11 of halfpace, and the sidewall of fixed component 8 is provided with protuberance 12, and (sidewall of fixed component 9 is provided with protuberance 13), protuberance 12 (or protuberance 13) coordinates with halfpace, the sidewall of protuberance 12 (or protuberance 13) and the sidewall 10 of platen and the side of halfpace Wall 11 is fitted.
Wherein, Fig. 2 show the structural representation of the dry etching machine cavity chamber device that this utility model one embodiment is provided.As Shown in Fig. 2, the upper and lower end face spacing of protuberance 12 is equal with halfpace height and platen 5 thickness sum.Implement at this utility model one In example, protuberance 12 is connected by screw 7 is fixing with supporting platform 1, and wherein, the head of screw 7 is cased with ceramic cap, to prevent screw 7 Head exposure be etched outside gas attack.In another embodiment, as described in Figure 2, screw 7 is through fixed component 8 Protuberance 12 inserts and supports platform 1, makes fixed component 8 be fixed on support platform 1, and platen 5 has been also secured at fixed component 8 and has propped up simultaneously Between support platform 1.
The dry etching machine cavity chamber device that this utility model embodiment provides, the protuberance 12 of fixed component 8 is arranged on platen 5 and props up The sidewall junction of support platform 1, efficiently avoid junction and is corroded by etching gas.The structure design of the present embodiment, protuberance 12 tops extending to fixed component 8, the connection volume increasing fixed component 8 with supporting platform 1, thus reduce fixing The risk of parts 8 fracture, and the sidewall 10 of platen 5 is concordant with the sidewall 11 of halfpace so that and protuberance 12 can with platen 5 side by side Place, from without undertaking a part of gravity of platen 5, further reduce the probability of protuberance 12 breakage.It addition, with support platform The 1 fixing protuberance 8 connected is directly exposed to the outer surface of whole device, can directly fixed component 8 be torn open when needing cleaned and changed Unload, then take off platen 5, reduce the phase mutual friction between platen 5 with protuberance 12, thus fix when also reducing cleaned and changed The breakage of parts 8, reduces production cost.
Fig. 3 show the structural representation of the dry etching machine cavity chamber device that another embodiment of this utility model is provided.Such as Fig. 3 Shown in, in the present embodiment, the upper and lower end face spacing of protuberance 13, higher than halfpace height and platen 5 thickness sum, exceed platen 5 The sidewall of protuberance 13 extends in the middle part of platen 5, the upper surface of partial occlusion platen 5.In this utility model one embodiment, protuberance 13 Being connected by two screws 7 are fixing with supporting platform 1, the head of each screw 7 is all cased with ceramic cap, and one of them screw 7 passes Fixed component 9 is inserted directly into support platform 1, and another screw 7 sequentially passes through protuberance 13 and platen 5 inserts and supports platform 1, makes fixed part Part 9 is fixed on support platform 1, and platen 5 has been also secured at protuberance 13 and has supported between platform 1 simultaneously.
The dry etching machine cavity chamber device that this utility model embodiment provides, exceeds platen 5 protuberance extended in the middle part of platen 5 13 increase fixed component 9 and the connection volume supporting platform 1 further, reduce the risk of its fracture, protuberance 13 part simultaneously Block the upper surface of platen 5 so that platen 5 is sandwiched in support platform 1 and protuberance 13 is fitted in the space formed, and adds further Strong platen 5 and the fastness supported between platform 1 and fixed component 9.
In this utility model one embodiment, platen 5 is aluminium sheet, supports what platform 1 was made for aluminum material.
In another embodiment of this utility model, fixed component 8 or 9 is made for ceramic material.
The dry etching machine cavity chamber device that this utility model embodiment is provided, by strengthening fixed component and the connection supporting platform Volume and carry out being arranged side by side this technical scheme by the protuberance of fixed component and platen, it is to avoid support platform and platen sidewall While junction is corroded by etching gas, the problem efficiently solving fixed component cracky, reduce cleaned and changed Breakage risk, reduces production cost.
What this utility model embodiment was provided the foregoing is only preferred embodiment of the present utility model, and need not To limit this utility model, all within spirit of the present utility model and principle, any amendment of being made, equivalent etc., all Within protection domain of the present utility model should be included in.

Claims (7)

1. a dry etching machine cavity chamber device, including supporting platform, platen and fixed component, described platen is fixed on described support platform top Portion, it is characterised in that described support platform top outer edge forms halfpace, the sidewall of described platen is flat with the sidewall of described halfpace Together, the sidewall of described fixed component is provided with protuberance, and described protuberance coordinates with described halfpace, described protuberance sidewall and described platen and The sidewall laminating of described halfpace.
Dry etching machine cavity chamber device the most according to claim 1, it is characterised in that the upper and lower end face spacing of described protuberance, with Described halfpace height and described platen thickness sum are equal.
Dry etching machine cavity chamber device the most according to claim 1, it is characterised in that the upper and lower end face spacing of described protuberance is high In described halfpace height and described platen thickness sum, the sidewall of the described protuberance exceeding described platen prolongs in the middle part of described platen Stretch, the upper surface of platen described in partial occlusion.
Dry etching machine cavity chamber device the most according to claim 1, it is characterised in that described platen is aluminium sheet.
Dry etching machine cavity chamber device the most according to claim 1, it is characterised in that described support platform is that aluminum material is made 's.
Dry etching machine cavity chamber device the most according to claim 1, it is characterised in that described fixed component is that ceramic material is made 's.
Dry etching machine cavity chamber device the most according to claim 1, it is characterised in that described protuberance passes through screw admittedly with supporting platform Fixed connection.
CN201620649899.4U 2016-06-27 2016-06-27 A kind of dry etching machine cavity chamber device Active CN205863131U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN201620649899.4U CN205863131U (en) 2016-06-27 2016-06-27 A kind of dry etching machine cavity chamber device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN201620649899.4U CN205863131U (en) 2016-06-27 2016-06-27 A kind of dry etching machine cavity chamber device

Publications (1)

Publication Number Publication Date
CN205863131U true CN205863131U (en) 2017-01-04

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Family Applications (1)

Application Number Title Priority Date Filing Date
CN201620649899.4U Active CN205863131U (en) 2016-06-27 2016-06-27 A kind of dry etching machine cavity chamber device

Country Status (1)

Country Link
CN (1) CN205863131U (en)

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