CN205835002U - Dish lowering or hoisting gear on buffing machine - Google Patents
Dish lowering or hoisting gear on buffing machine Download PDFInfo
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- CN205835002U CN205835002U CN201620799793.2U CN201620799793U CN205835002U CN 205835002 U CN205835002 U CN 205835002U CN 201620799793 U CN201620799793 U CN 201620799793U CN 205835002 U CN205835002 U CN 205835002U
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- cylinder
- slide
- linear slide
- slide rail
- upper plate
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- Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
Abstract
抛光机上盘升降装置,包括气缸Ⅰ、滑座Ⅰ、线性滑轨Ⅰ、上盘装置、支撑板、线性滑轨Ⅱ、滑座Ⅱ和气缸Ⅱ;所述气缸Ⅰ和线性滑轨Ⅰ分别安装在抛光机箱体部件的一侧,所述滑座Ⅰ安装在线性滑轨Ⅰ上,所述气缸Ⅰ与滑座Ⅰ相连,所述气缸Ⅱ和线性滑轨Ⅱ分别安装在抛光机箱体部件的另一侧,所述滑座Ⅱ安装在线性滑轨Ⅱ上,所述气缸Ⅱ与滑座Ⅱ相连,所述支撑板与滑座Ⅰ、滑座Ⅱ相连,所述上盘装置安装在支撑板上。本实用新型结构简单,制造成本低;利用本实用新型可实现上盘装置平稳升降,工作稳定可靠。
The upper plate lifting device of the polishing machine includes cylinder I, slide seat I, linear slide rail I, upper plate device, support plate, linear slide rail II, slide seat II and cylinder II; the cylinder I and linear slide rail I are respectively installed on One side of the polishing machine box, the slide I is installed on the linear slide I, the cylinder I is connected with the slide I, and the cylinder II and the linear slide II are respectively installed on the other side of the polishing machine box On the side, the sliding seat II is installed on the linear slide rail II, the cylinder II is connected to the sliding seat II, the support plate is connected to the sliding seat I and the sliding seat II, and the upper plate device is installed on the supporting plate. The utility model has the advantages of simple structure and low manufacturing cost; the utility model can realize the stable lifting of the upper plate device, and the work is stable and reliable.
Description
技术领域technical field
本实用新型涉及一种抛光机,具体涉及一种抛光机上盘升降装置。The utility model relates to a polishing machine, in particular to a lifting device for an upper plate of the polishing machine.
背景技术Background technique
抛光机作为一种抛光设备,在2.5D、3D玻璃、蓝宝石以及其它硬、脆材料的异形表面抛光中广泛应用。As a kind of polishing equipment, the polishing machine is widely used in the polishing of special-shaped surfaces of 2.5D, 3D glass, sapphire and other hard and brittle materials.
就现有抛光机而言,由于其设计上存在的不足,其上盘装置难以实现平稳升降,影响正常工作。As far as the existing polishing machine is concerned, due to the deficiencies in its design, its upper plate device is difficult to realize stable lifting, which affects normal work.
实用新型内容Utility model content
本实用新型所要解决的技术问题是,提供一种可实现上盘装置平稳升降,工作稳定可靠的抛光机上盘升降装置。The technical problem to be solved by the utility model is to provide a lifting device for the upper plate of the polishing machine which can realize the stable lifting of the upper plate device and work stably and reliably.
本实用新型解决其技术问题所采用的技术方案是:抛光机上盘升降装置,包括气缸Ⅰ、滑座Ⅰ、线性滑轨Ⅰ、上盘装置、支撑板、线性滑轨Ⅱ、滑座Ⅱ和气缸Ⅱ;所述气缸Ⅰ和线性滑轨Ⅰ分别安装在抛光机箱体部件的一侧,所述滑座Ⅰ安装在线性滑轨Ⅰ上,所述气缸Ⅰ与滑座Ⅰ相连,所述气缸Ⅱ和线性滑轨Ⅱ分别安装在抛光机箱体部件的另一侧,所述滑座Ⅱ安装在线性滑轨Ⅱ上,所述气缸Ⅱ与滑座Ⅱ相连,所述支撑板与滑座Ⅰ、滑座Ⅱ相连,所述上盘装置安装在支撑板上。The technical scheme adopted by the utility model to solve the technical problem is: the lifting device of the upper plate of the polishing machine, including the cylinder I, the slide seat I, the linear slide rail I, the upper plate device, the support plate, the linear slide rail II, the slide seat II and the cylinder II; the cylinder I and the linear slide I are respectively installed on one side of the polishing machine box, the slide I is installed on the linear slide I, the cylinder I is connected with the slide I, the cylinder II and The linear slide rail II is respectively installed on the other side of the polishing machine box body, the slide seat II is installed on the linear slide rail II, the cylinder II is connected with the slide seat II, the support plate is connected with the slide seat I, the slide seat II is connected, and the upper plate device is installed on the support plate.
进一步,所述气缸Ⅰ通过接头Ⅰ与滑座Ⅰ相连,所述气缸Ⅱ通过接头Ⅱ与滑座Ⅱ相连。Further, the cylinder I is connected with the sliding seat I through the joint I, and the cylinder II is connected with the sliding seat II through the joint II.
进一步,所述接头Ⅰ、接头Ⅱ均为浮动接头。Further, the joints I and II are both floating joints.
本实用新型结构简单,制造成本低;利用本实用新型可实现上盘装置平稳升降,工作稳定可靠。The utility model has the advantages of simple structure and low manufacturing cost; the utility model can realize the stable lifting of the upper plate device, and the work is stable and reliable.
附图说明Description of drawings
图1为本实用新型实施例的结构示意图;Fig. 1 is the structural representation of the utility model embodiment;
图中:1、气缸Ⅰ,2、接头Ⅰ,3、滑座Ⅰ,4、线性滑轨Ⅰ,5、上盘装置,6、支撑板,7、线性滑轨Ⅱ,8、滑座Ⅱ,9、接头Ⅱ,10、气缸Ⅱ,11、箱体部件。In the figure: 1. Cylinder Ⅰ, 2. Joint Ⅰ, 3. Sliding seat Ⅰ, 4. Linear slide rail Ⅰ, 5. Upper plate device, 6. Support plate, 7. Linear slide rail Ⅱ, 8, Slide seat Ⅱ, 9. Connector II, 10. Cylinder II, 11. Box parts.
具体实施方式detailed description
以下结合附图及实施例对本实用新型作进一步说明。Below in conjunction with accompanying drawing and embodiment the utility model is described further.
参照图1,本实施例气缸Ⅰ1、接头Ⅰ2、滑座Ⅰ3、线性滑轨Ⅰ4、上盘装置5、支撑板6、线性滑轨Ⅱ7、滑座Ⅱ8、接头Ⅱ9和气缸Ⅱ10;所述气缸Ⅰ1和线性滑轨Ⅰ4分别安装在抛光机箱体部件11的一侧,所述滑座Ⅰ3安装在线性滑轨Ⅰ4上,所述气缸Ⅰ1通过接头Ⅰ2与滑座Ⅰ3相连;所述气缸Ⅱ10和线性滑轨Ⅱ7分别安装在抛光机箱体部件11的另一侧,所述滑座Ⅱ8安装在线性滑轨Ⅱ7上,所述气缸Ⅱ10通过接头Ⅱ9与滑座Ⅱ8相连,所述支撑板6与滑座Ⅰ3、滑座Ⅱ8相连,所述上盘装置5安装在支撑板6上。Referring to Fig. 1, cylinder I1, joint I2, sliding seat I3, linear slide rail I4, upper plate device 5, support plate 6, linear slide rail II7, slide seat II8, joint II9 and cylinder II10 in this embodiment; said cylinder I1 and the linear slide rail I4 are respectively installed on one side of the polishing machine box part 11, the slide seat I3 is installed on the linear slide rail I4, the cylinder I1 is connected with the slide seat I3 through the joint I2; the cylinder II10 and the linear slide The rail II7 is respectively installed on the other side of the polishing machine box part 11, the slide seat II8 is installed on the linear slide rail II7, the cylinder II10 is connected with the slide seat II8 through the joint II9, and the support plate 6 is connected with the slide seat I3 , Sliding seat II 8 is connected, and the upper plate device 5 is installed on the support plate 6 .
本实施例中,所述接头Ⅰ2、接头Ⅱ9均为浮动接头。In this embodiment, the joints I2 and II9 are all floating joints.
工作时,气缸Ⅰ1和气缸Ⅱ10同步升降,带动滑座Ⅰ3和滑座Ⅱ8沿线性滑轨Ⅰ4和线性滑轨Ⅱ7同步升降,滑座Ⅰ3和滑座Ⅱ8的同步升降带动支撑板6的稳定升降,支撑板6的稳定升降带动上盘装置5稳步升降。When working, cylinder Ⅰ1 and cylinder Ⅱ10 lift synchronously, drive slide Ⅰ3 and slide Ⅱ8 to move up and down synchronously along linear slide Ⅰ4 and linear slide Ⅱ7, the synchronous lift of slide Ⅰ3 and slide Ⅱ8 drives the stable lift of support plate 6, The stable lifting of the support plate 6 drives the upper plate device 5 to rise and fall steadily.
Claims (3)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201620799793.2U CN205835002U (en) | 2016-07-28 | 2016-07-28 | Dish lowering or hoisting gear on buffing machine |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201620799793.2U CN205835002U (en) | 2016-07-28 | 2016-07-28 | Dish lowering or hoisting gear on buffing machine |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN205835002U true CN205835002U (en) | 2016-12-28 |
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201620799793.2U Expired - Fee Related CN205835002U (en) | 2016-07-28 | 2016-07-28 | Dish lowering or hoisting gear on buffing machine |
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| Country | Link |
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| CN (1) | CN205835002U (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN107866727A (en) * | 2017-11-01 | 2018-04-03 | 湖南宇晶机器股份有限公司 | High rotating speed loading device for planer-type polishing machine |
| CN115365974A (en) * | 2022-08-24 | 2022-11-22 | 宇晶机器(长沙)有限公司 | A hanging wall mechanism that is used for heavily loaded to support and steadily goes up and down |
-
2016
- 2016-07-28 CN CN201620799793.2U patent/CN205835002U/en not_active Expired - Fee Related
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN107866727A (en) * | 2017-11-01 | 2018-04-03 | 湖南宇晶机器股份有限公司 | High rotating speed loading device for planer-type polishing machine |
| CN115365974A (en) * | 2022-08-24 | 2022-11-22 | 宇晶机器(长沙)有限公司 | A hanging wall mechanism that is used for heavily loaded to support and steadily goes up and down |
| CN115365974B (en) * | 2022-08-24 | 2023-06-27 | 宇晶机器(长沙)有限公司 | A mechanism of hanging wall for heavy load supports and steadily goes up and down |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| CF01 | Termination of patent right due to non-payment of annual fee | ||
| CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20161228 |