CN205788856U - A kind of core wafer model for displacement of reservoir oil research - Google Patents
A kind of core wafer model for displacement of reservoir oil research Download PDFInfo
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- CN205788856U CN205788856U CN201620256082.0U CN201620256082U CN205788856U CN 205788856 U CN205788856 U CN 205788856U CN 201620256082 U CN201620256082 U CN 201620256082U CN 205788856 U CN205788856 U CN 205788856U
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Abstract
This utility model provides a kind of core wafer model for displacement of reservoir oil research, and this core wafer model includes quartz glass substrate, photoresist layer and quartz glass upper cover；Photoresist layer is between quartz glass substrate and quartz glass upper cover；Photoresist layer has the microcosmic duct of imitative rock core structure；Quartz glass upper cover is provided with liquid inlet and liquid outlet；It is between quartz glass substrate and photoresist layer, between photoresist layer and quartz glass upper cover and is tightly connected, and be screwed connection between quartz glass substrate, photoresist layer and quartz glass upper cover.Model of the present utility model directly uses photoresist simulation core structure, and it is workable, reduces production cost and difficulty of processing simultaneously.This utility model can obtain the microcosmic duct of arbitrarily devised shape on a photoresist by photoetching technique, and its degree of depth can be 0.5 μm to any number between 1mm.
Description
Technical field
This utility model relates to a kind of thin slice model for simulation core, particularly relates to a kind of rock for displacement of reservoir oil research
Heart thin slice model.
Background technology
The domestic demand to petroleum-based energy is growing, and the difficulty of oil exploration is also continuously increased, and how therefore studies
Improve further oil recovery factor to have become as those skilled in the art and need badly and solve the technical problem that.At present, conventional rock core
Though thin slice model has visuality, but owing to its internal gutter is disorderly, light transmission is bad, so it is existing to be not easy to observation experiment
As.
Therefore, developing a kind of simple and effective core wafer model for displacement of reservoir oil research and preparation method thereof is this area
One of problem demanding prompt solution.
Utility model content
The purpose of this utility model is to provide a kind of core wafer model for displacement of reservoir oil research.
For reaching above-mentioned purpose, this utility model provides a kind of core wafer model for displacement of reservoir oil research, and this rock core is thin
Sheet model includes quartz glass substrate 1, photoresist layer 2 and quartz glass upper cover 5；
Described photoresist layer 2 is between quartz glass substrate 1 and quartz glass upper cover 5；
Described photoresist layer 2 has the microcosmic duct 4 of imitative rock core structure；
Described quartz glass upper cover 5 is provided with liquid inlet 7 and liquid outlet 9；
Between described quartz glass substrate 1 and photoresist layer 2, between photoresist layer 2 and quartz glass upper cover 5, it is sealing
Connect, and connect by screw 6 is fixing between described quartz glass substrate 1, photoresist layer 2 and quartz glass upper cover 5.
According to the core wafer model for displacement of reservoir oil research described in the utility model, this utility model is to photoetching used
Glue does not has particular/special requirement, and those skilled in the art can need to select suitable photoresist according to field operation, as long as can be real
Existing the purpose of this utility model.This utility model preferred embodiment in, photoresist used includes the U.S.
The photoresist that model is SU-8 that Microchem company produces, and the photoresist that model is AZ-50 that Toshiba of Japan produces.
According to the core wafer model for displacement of reservoir oil research described in the utility model, it is preferable that described quartz glass substrate
The thickness of plate 1 is more than 10mm.
According to the core wafer model for displacement of reservoir oil research described in the utility model, it is preferable that described photoresist layer 2
Thickness is 0.5-1000 μm.Wherein, the degree of depth in the microcosmic duct of described imitative rock core structure is identical with the thickness of photoresist layer.
According to the core wafer model for displacement of reservoir oil research described in the utility model, it is preferable that on described quartz glass
The thickness of lid 5 is more than 10mm.
According to the core wafer model for displacement of reservoir oil research described in the utility model, it is preferable that this model also includes spiral shell
Stricture of vagina joint 8, described nipple 8 is connected with liquid inlet 7 and liquid outlet 9 respectively by female thread.Described nipple is used
In importing oil phase and displacement liquid.
According to the core wafer model for displacement of reservoir oil research described in the utility model, it is preferable that the number of described screw 6
No less than 3, preferably 4.
According to the core wafer model for displacement of reservoir oil research described in the utility model, it is preferable that described imitative rock core structure
Microcosmic duct 4 be stair-stepping duct.The microcosmic duct of described stair-stepping imitative rock core structure can use set lithography to enter
Row prepares (in preparation process, suggestion uses the photoresist with attribute, as used the cloudy glue of sun glue, simultaneously use simultaneously), set
Lithography is ordinary skill in the art means, and those skilled in the art can need to select suitably operation according to field operation
And technological parameter, as long as being capable of the purpose of this utility model.
Core wafer model for displacement of reservoir oil research described in the utility model goes for multiple different method and enters
Row makes, in order to further the core wafer model for displacement of reservoir oil research of the present utility model be illustrated, and this utility model
Additionally providing the manufacture method of the application core wafer model for displacement of reservoir oil research of the present utility model, described method includes following
Step:
A, photoresist is spun on quartz glass substrate, then it is carried out baking-curing；
B, the mask plate being provided with the microcosmic duct of imitative rock core structure is covered in the light of toasted solidification described in step a
Photoresist layer；The most through exposure and development, the photoresist layer with the microcosmic duct of imitative rock core structure is obtained；
C, process liquid inlet and liquid outlet respectively in the relevant position of quartz glass upper cover；Liquid will be processed again
The quartz glass upper cover of entrance and liquid outlet is covered on the photoresist layer in the microcosmic duct with imitative rock core structure and to two
Seal between person, the most again by the company of being screwed between quartz glass substrate, photoresist layer and quartz glass upper cover
Connect, obtain the described core wafer model for displacement of reservoir oil research.
According to the manufacture method of the core wafer model for displacement of reservoir oil research described in the utility model, described step a is also
Including operation quartz glass substrate being carried out successively and surface is modified；Photoresist is spun on cleaned and surface again repair
On quartz glass substrate after decorations；And the operation that above-mentioned cleaning and surface are modified is this area conventional method, art technology
Personnel can need to select suitably cleaning and surface modification method and technological parameter according to field operation.
According to the manufacture method of the core wafer model for displacement of reservoir oil research described in the utility model, this utility model pair
Baking-curing operation in step a does not has specific requirement, and those skilled in the art can need to select properly according to field operation
Baking-curing step and process conditions, as long as the purpose of this utility model baking-curing can be realized.
According to the manufacture method of the core wafer model for displacement of reservoir oil research described in the utility model, this utility model pair
Specific requirement the most do not made by mask plate material used in step b, this utility model preferred embodiment in, mask used version
Can select film mask plate or quartz mask version, its size is determined according to the size of the rock core structure simulated, and common is
The mask plate that length and width are 4 inches.Additionally, the concrete behaviour in the microcosmic duct of this utility model rock core structure imitative to processing on mask plate
Also being not required, those skilled in the art can use method of the prior art to process reservation shape on mask plate
Microcosmic duct.
According to the manufacture method of the core wafer model for displacement of reservoir oil research described in the utility model, this utility model walks
Exposure, developing process in rapid b depend on the photoresist selected by this utility model；And those skilled in the art know according to institute
The different choice of the photoresist selected suitably exposes, developing process operates and process conditions.
According to manufacture method described in the utility model, it is preferable that step c also includes using lathe in described liquid inlet
And the operation of liquid outlet machining internal thread.
According to manufacture method described in the utility model, the sealing described in step c can directly carry out gluing, sealing, or
Person adds the plastic sheet of thin layer, or the material of resistance to oil at quartz glass upper cover, but its thickness not can exceed that on photoresist
The degree of depth in microcosmic duct of imitative rock core structure.
This utility model additionally provides the application in the displacement of reservoir oil is studied of the above-mentioned core wafer model for displacement of reservoir oil research.
Compared with prior art, technical solutions of the utility model have a following obvious advantage:
1, the core wafer model for displacement of reservoir oil research of the present utility model directly uses photoresist simulation core structure, its
Workable, reduce production cost and difficulty of processing simultaneously.
2, this utility model can obtain the microcosmic duct of arbitrarily devised shape on a photoresist by photoetching technique, and it is deep
Degree can be 0.5 μm to any number between 1mm.
3, the core wafer model upper and lower cover plates for displacement of reservoir oil research of the present utility model selects thicker quartz glass, stone
The use of English glass makes core wafer model visualization, and core wafer model can bear higher pressure.
4, the core wafer model for displacement of reservoir oil research that this utility model obtains is reusable.
5, the core wafer model of different depth (stepped) can be obtained by alignment process.
Accompanying drawing explanation
Fig. 1 is the schematic diagram of the core wafer model for displacement of reservoir oil research in this utility model embodiment 1；
Fig. 2 is the manufacture method schematic diagram of the core wafer model for displacement of reservoir oil research in this utility model embodiment 2.
Main Reference label declaration:
1, quartz glass substrate；
2, photoresist layer；
3, mask plate；
4, the microcosmic duct of imitative rock core structure；
5, quartz glass upper cover；
6, screw；
7, liquid inlet；
8, nipple；
9, liquid outlet.
Detailed description of the invention
Having of implementation process of the present utility model and generation is described in detail below by way of specific embodiment and Figure of description
Benefit effect, it is intended to help reader to be more fully understood that essence of the present utility model and feature, not as can practical range to this case
Restriction.
Embodiment 1
Present embodiments providing a kind of core wafer model for displacement of reservoir oil research, its schematic diagram is as it is shown in figure 1, this rock core
Thin slice model includes quartz glass substrate 1, photoresist layer 2 and quartz glass upper cover 5；
Described photoresist layer 2 is between quartz glass substrate 1 and quartz glass upper cover 5；
Described photoresist layer 2 has the microcosmic duct 4 of imitative rock core structure；
Described quartz glass upper cover 5 is provided with liquid inlet 7 and liquid outlet 9；
Between described quartz glass substrate 1 and photoresist layer 2, between photoresist layer 2 and quartz glass upper cover 5, it is sealing
Connect, and connect by 4 screws 6 are fixing between described quartz glass substrate 1, photoresist layer 2 and quartz glass upper cover 5；
This model also includes 2 nipples 8, described nipple 8 by female thread respectively with liquid inlet 7 and liquid
Outlet 9 is connected；
Wherein, the thickness of described quartz glass substrate is 10mm；
The thickness of described quartz glass upper cover is 10mm；
The thickness (degree of depth in the microcosmic duct 4 of imitative rock core structure) of described photoresist layer is 100 μm；
Described photoresist layer is the photoresist layer being made up of AZ-50.
Embodiment 2
Present embodiments provide the manufacture method of core wafer model for displacement of reservoir oil research described in embodiment 1, this system
Make method schematic diagram as in figure 2 it is shown, it includes step in detail below:
(1) quartz glass substrate cleans
1, cleanout fluid cleans: preparation cleanout fluid, in cleanout fluid, and dense H2SO4/H2O2=3:1 (volume ratio), uses this cleaning
Liquid cleans 15min；
Wherein, No. 1 cleanout fluid is joined, it is possible to use 2 weeks；Preparation H used by cleanout fluid2O2Concentration be that 30% (volume is dense
Degree)；
2, ultra-pure water cleans；
3, re-using washes of absolute alcohol, 1min (shakes), does not washes with water after washing；
4, acetone cleans, and 1min (shakes)；
5, clean with ultra-pure water again；
After ultra-pure water cleans, absorbent paper is used to draw the moisture at quartz glass substrate edge；
Clamp quartz glass substrate with tweezers again, place it in and drying above 200 DEG C of electric hot plates, (can not be contacted), treat thoroughly
After drying, then it is placed on 5min on electric hot plate, completes the cleaning process of quartz glass substrate.
(2) quartz glass substrate surface is modified
Once purged quartz glass substrate is positioned in volatilization cylinder, instills 1～2 modification reagent (not water breakthrough) and carry out
Modify, modify time >=3min；
Wherein, the modification reagent used by modification is 1,1,1,3,3,3-hexamethyldisiloxane (1,1,1,3,3,3-
Hexamethyldislazane), its concentration is more than or equal to 98% (volumetric concentration).
(3) quartz glass substrate whirl coating
Open compressor, open vacuum pump；
Quartz glass substrate after being modified on surface is positioned over sol evenning machine center, balances；Paving sun glue AZ-50, concentration is more
Height, thickness is the biggest, completes rear static 1～2min；The thickness of described AZ-50 photoresist layer is 100 μm；
By preset program whirl coating: under evacuation state, spin coating whirl coating, different-thickness requires different whirl coating parameter；Wherein walk
Suddenly the whirl coating parameter in (three) is 1500rpm, 1min.
After end, stopping vacuum, (purpose is to recover plane, glue in order to allow in the middle of quartz glass substrate quiet to put 1～2min
Even).
(4) quartz glass substrate exposure
Exposure front baking: the quartz glass substrate after gluing is heated successively at 65 DEG C 1min, heating 4min at 90 DEG C, 65
1min (add hanker quartz glass substrate to be adjusted so that its homogeneous heating) is heated at DEG C；
Quartz glass substrate is positioned on exposure machine glass tray；
The mask plate 3 being provided with the microcosmic duct of the imitative rock core structure of reservation shape is covered on photoresist layer；
Exposure process (has set time of exposure) in advance:
Wherein: depending on time of exposure is according to photoresist thickness, sun glue exposure 75s is (if more than 90s, less than the passage of 30 μm
Easily infringement).
(5) development
Sun glue development: AZ developing agent (developer): distilled water=1:3 (volume ratio), prepares 80mL, subpackage 2 ware, wash
3min, bad wash if, the proper extension time, finally clean with ultrapure water；Obtain the microcosmic hole with imitative rock core structure
The photoresist layer in road.
(6) upper cover punching
Process liquid inlet and liquid outlet in the relevant position of quartz glass upper cover respectively, use lathe at described liquid
Body entrance and liquid outlet machining internal thread；Again the quartz glass upper cover processing liquid inlet and liquid outlet is covered in tool
Have imitative rock core structure microcosmic duct photoresist layer on and to sealing therebetween.
(7) assemble
Last again by being screwed connection between quartz glass substrate, photoresist layer and quartz glass upper cover, obtain
The described core wafer model for displacement of reservoir oil research.
Embodiment 3
Present embodiments providing a kind of core wafer model for displacement of reservoir oil research, this core wafer model includes quartz glass
Glass substrate 1, photoresist layer 2 and quartz glass upper cover 5；
Described photoresist layer 2 is between quartz glass substrate 1 and quartz glass upper cover 5；
Described photoresist layer 2 has the microcosmic duct 4 of imitative rock core structure；
Described quartz glass upper cover 5 is provided with liquid inlet 7 and liquid outlet 9；
Between described quartz glass substrate 1 and photoresist layer 2, between photoresist layer 2 and quartz glass upper cover 5, it is sealing
Connect, and connect by 4 screws 6 are fixing between described quartz glass substrate 1, photoresist layer 2 and quartz glass upper cover 5；
This model also includes 2 nipples 8, described nipple 8 by female thread respectively with liquid inlet 7 and liquid
Outlet 9 is connected；
Wherein, the thickness of described quartz glass substrate is 10mm；
The thickness of described quartz glass upper cover is 10mm；
The thickness (degree of depth in the microcosmic duct 4 of imitative rock core structure) of described photoresist layer is 1000 μm；
Described photoresist layer is the photoresist layer being made up of SU-8.
Embodiment 4
Present embodiments provide the manufacture method of core wafer model for displacement of reservoir oil research described in embodiment 3, its bag
Include step in detail below:
(1) quartz glass substrate cleans
1, cleanout fluid cleans: preparation cleanout fluid, in cleanout fluid, and dense H2SO4/H2O2=3:1 (volume ratio), uses this cleaning
Liquid cleans 15min；
Wherein, No. 1 cleanout fluid is joined, it is possible to use 2 weeks；Preparation H used by cleanout fluid2O2Concentration be that 30% (volume is dense
Degree)；
2, ultra-pure water cleans；
3, re-using washes of absolute alcohol, 1min (shakes), does not washes with water after washing；
4, acetone cleans, and 1min (shakes)；
5, clean with ultra-pure water again；
After ultra-pure water cleans, absorbent paper is used to draw the moisture at quartz glass substrate edge；
Clamp quartz glass substrate with tweezers again, place it in and drying above 200 DEG C of electric hot plates, (can not be contacted), treat thoroughly
After drying, then it is placed on 5min on electric hot plate, completes the cleaning process of quartz glass substrate.
(2) quartz glass substrate surface is modified
Once purged quartz glass substrate is positioned in volatilization cylinder, instills 1～2 modification reagent (not water breakthrough) and carry out
Modify, modify time >=3min；
Wherein, the modification reagent used by modification is 1,1,1,3,3,3-hexamethyldisiloxane (1,1,1,3,3,3-
Hexamethyldislazane), its concentration is more than or equal to 98% (volumetric concentration).
(3) quartz glass substrate whirl coating
Open compressor, open vacuum pump；
Quartz glass substrate after being modified on surface is positioned over sol evenning machine center, balances；Paving AZ-50 (cloudy glue SU-8),
Concentration is the highest, and thickness is the biggest, completes rear static 1～2min；The thickness of described SU-8 photoresist layer is 1000 μm；
By preset program whirl coating: under evacuation state, spin coating whirl coating, different-thickness requires different whirl coating parameter, this area
Technical staff can select suitable whirl coating parameter according to concrete photoresist layer thickness.
After end, stopping vacuum, (purpose is to recover plane, glue in order to allow in the middle of quartz glass substrate quiet to put 1～2min
Even).
(4) quartz glass substrate exposure
Exposure front baking: the quartz glass substrate after gluing is heated successively at 65 DEG C 1min, heating 4min at 90 DEG C, 65
1min (add hanker quartz glass substrate to be adjusted so that its homogeneous heating) is heated at DEG C；
Quartz glass substrate is positioned on exposure machine glass tray；
The mask plate 3 being provided with the microcosmic duct of the imitative rock core structure of reservation shape is covered on photoresist layer；
Exposure process (has set time of exposure) in advance:
Wherein: depending on time of exposure is according to photoresist thickness, cloudy glue exposure 45s, heats 1min in 65 DEG C after cloudy glue exposure；
Exposure after bake (cloudy glue): be positioned at 65 DEG C heating 1min, heat 4min at 90 DEG C, heat 1min at 65 DEG C and (add
Hanker quartz glass substrate to be adjusted so that its homogeneous heating).
(5) development
Cloudy glue development: Su-8 developing agent (developer) (can not water breakthrough), and developing time < 3min, in right amount；
Wherein: shaking while wash, about 1min takes out, dry up (drawing near, blow) along pipeline by nitrogen gun, if chromatic colour,
Wash again；Slightly washing with clean developer solution for the last time can (makes its clean)；Finally, positive ground drying, the back side is wiped clean；Obtain
There is the photoresist layer in the microcosmic duct of imitative rock core structure.
(6) upper cover punching
Process liquid inlet and liquid outlet in the relevant position of quartz glass upper cover respectively, use lathe at described liquid
Body entrance and liquid outlet machining internal thread；Again the quartz glass upper cover processing liquid inlet and liquid outlet is covered in tool
Have imitative rock core structure microcosmic duct photoresist layer on and to sealing therebetween.
(7) assemble
Last again by being screwed connection between quartz glass substrate, photoresist layer and quartz glass upper cover, obtain
The described core wafer model for displacement of reservoir oil research.
Embodiment 5
Present embodiments providing a kind of core wafer model for displacement of reservoir oil research, this core wafer model includes quartz glass
Glass substrate 1, photoresist layer 2 and quartz glass upper cover 5；
Described photoresist layer 2 is between quartz glass substrate 1 and quartz glass upper cover 5；
Described photoresist layer 2 has the microcosmic duct 4 of imitative rock core structure；
Described quartz glass upper cover 5 is provided with liquid inlet 7 and liquid outlet 9；
Between described quartz glass substrate 1 and photoresist layer 2, between photoresist layer 2 and quartz glass upper cover 5, it is sealing
Connect, and connect by 4 screws 6 are fixing between described quartz glass substrate 1, photoresist layer 2 and quartz glass upper cover 5；
This model also includes 2 nipples 8, described nipple 8 by female thread respectively with liquid inlet 7 and liquid
Outlet 9 is connected；
Wherein, the thickness of described quartz glass substrate is 10mm；
The thickness of described quartz glass upper cover is 10mm；
The thickness (degree of depth in the microcosmic duct 4 of imitative rock core structure) of described photoresist layer is 10 μm；
Described photoresist layer is the photoresist layer being made up of AZ-50.
Embodiment 6
Present embodiments provide the manufacture method of core wafer model for displacement of reservoir oil research described in embodiment 5, its bag
Include step in detail below:
(1) quartz glass substrate cleans
1, cleanout fluid cleans: preparation cleanout fluid, in cleanout fluid, and dense H2SO4/H2O2=3:1 (volume ratio), uses this cleaning
Liquid cleans 15min；
Wherein, No. 1 cleanout fluid is joined, it is possible to use 2 weeks；Preparation H used by cleanout fluid2O2Concentration be that 30% (volume is dense
Degree)；
2, ultra-pure water cleans；
3, re-using washes of absolute alcohol, 1min (shakes), does not washes with water after washing；
4, acetone cleans, and 1min (shakes)；
5, clean with ultra-pure water again；
After ultra-pure water cleans, absorbent paper is used to draw the moisture at quartz glass substrate edge；
Clamp quartz glass substrate with tweezers again, place it in and drying above 200 DEG C of electric hot plates, (can not be contacted), treat thoroughly
After drying, then it is placed on 5min on electric hot plate, completes the cleaning process of quartz glass substrate.
(2) quartz glass substrate surface is modified
Once purged quartz glass substrate is positioned in volatilization cylinder, instills 1～2 modification reagent (not water breakthrough) and carry out
Modify, modify time >=3min；
Wherein, the modification reagent used by modification is 1,1,1,3,3,3-hexamethyldisiloxane (1,1,1,3,3,3-
Hexamethyldislazane), its concentration is more than or equal to 98% (volumetric concentration).
(3) quartz glass substrate whirl coating
Open compressor, open vacuum pump；
Quartz glass substrate after being modified on surface is positioned over sol evenning machine center, balances；Paving sun glue AZ-50, concentration is more
Height, thickness is the biggest, completes rear static 1～2min；The thickness of described AZ-50 photoresist layer is 10 μm；
By preset program whirl coating: under evacuation state, spin coating whirl coating, different-thickness requires different whirl coating parameter；Wherein walk
Suddenly the whirl coating parameter in (three) is 1500rpm, 1min.
After end, stopping vacuum, (purpose is to recover plane, glue in order to allow in the middle of quartz glass substrate quiet to put 1～2min
Even).
(4) quartz glass substrate exposure
Exposure front baking: the quartz glass substrate after gluing is heated successively at 65 DEG C 1min, heating 4min at 90 DEG C, 65
1min (add hanker quartz glass substrate to be adjusted so that its homogeneous heating) is heated at DEG C；
Quartz glass substrate is positioned on exposure machine glass tray；
The mask plate 3 being provided with the microcosmic duct of the imitative rock core structure of reservation shape is covered on photoresist layer；
Exposure process (has set time of exposure) in advance:
Wherein: depending on time of exposure is according to photoresist thickness, sun glue exposure 75s is (if more than 90s, less than the passage of 30 μm
Easily infringement).
(5) development
Sun glue development: AZ developing agent (developer): distilled water=1:3 (volume ratio), prepares 80mL, subpackage 2 ware, wash
3min, bad wash if, the proper extension time, finally clean with ultrapure water；Obtain the microcosmic hole with imitative rock core structure
The photoresist layer in road.
(6) upper cover punching
Process liquid inlet and liquid outlet in the relevant position of quartz glass upper cover respectively, use lathe at described liquid
Body entrance and liquid outlet machining internal thread；Again the quartz glass upper cover processing liquid inlet and liquid outlet is covered in tool
Have imitative rock core structure microcosmic duct photoresist layer on and to sealing therebetween.
(7) assemble
Last again by being screwed connection between quartz glass substrate, photoresist layer and quartz glass upper cover, obtain
The described core wafer model for displacement of reservoir oil research.
Embodiment 7
Present embodiments providing a kind of core wafer model for displacement of reservoir oil research, this core wafer model includes quartz glass
Glass substrate 1, photoresist layer 2 and quartz glass upper cover 5；
Described photoresist layer 2 is between quartz glass substrate 1 and quartz glass upper cover 5；
Described photoresist layer 2 has the microcosmic duct 4 of imitative rock core structure；
Described quartz glass upper cover 5 is provided with liquid inlet 7 and liquid outlet 9；
Between described quartz glass substrate 1 and photoresist layer 2, between photoresist layer 2 and quartz glass upper cover 5, it is sealing
Connect, and connect by 4 screws 6 are fixing between described quartz glass substrate 1, photoresist layer 2 and quartz glass upper cover 5；
This model also includes 2 nipples 8, described nipple 8 by female thread respectively with liquid inlet 7 and liquid
Outlet 9 is connected；
Wherein, the thickness of described quartz glass substrate is 10mm；
The thickness of described quartz glass upper cover is 10mm；
The thickness (degree of depth in the microcosmic duct 4 of imitative rock core structure) of described photoresist layer is 1 μm；
Described photoresist layer is the photoresist layer being made up of AZ-50.
Embodiment 8
Present embodiments provide the manufacture method of core wafer model for displacement of reservoir oil research described in embodiment 7, its bag
Include step in detail below:
(1) quartz glass substrate cleans
1, cleanout fluid cleans: preparation cleanout fluid, in cleanout fluid, and dense H2SO4/H2O2=3:1 (volume ratio), uses this cleaning
Liquid cleans 15min；
Wherein, No. 1 cleanout fluid is joined, it is possible to use 2 weeks；Preparation H used by cleanout fluid2O2Concentration be that 30% (volume is dense
Degree)；
2, ultra-pure water cleans；
3, re-using washes of absolute alcohol, 1min (shakes), does not washes with water after washing；
4, acetone cleans, and 1min (shakes)；
5, clean with ultra-pure water again；
After ultra-pure water cleans, absorbent paper is used to draw the moisture at quartz glass substrate edge；
Clamp quartz glass substrate with tweezers again, place it in and drying above 200 DEG C of electric hot plates, (can not be contacted), treat thoroughly
After drying, then it is placed on 5min on electric hot plate, completes the cleaning process of quartz glass substrate.
(2) quartz glass substrate surface is modified
Once purged quartz glass substrate is positioned in volatilization cylinder, instills 1～2 modification reagent (not water breakthrough) and carry out
Modify, modify time >=3min；
Wherein, the modification reagent used by modification is 1,1,1,3,3,3-hexamethyldisiloxane (1,1,1,3,3,3-
Hexamethyldislazane), its concentration is more than or equal to 98% (volumetric concentration).
(3) quartz glass substrate whirl coating
Open compressor, open vacuum pump；
Quartz glass substrate after being modified on surface is positioned over sol evenning machine center, balances；Paving sun glue AZ-50, concentration is more
Height, thickness is the biggest, completes rear static 1～2min；The thickness of described AZ-50 photoresist layer is 1 μm；
By preset program whirl coating: under evacuation state, spin coating whirl coating, different-thickness requires different whirl coating parameter；Wherein walk
Suddenly the whirl coating parameter in (three) is 1500rpm, 1min.
After end, stopping vacuum, (purpose is to recover plane, glue in order to allow in the middle of quartz glass substrate quiet to put 1～2min
Even).
(4) quartz glass substrate exposure
Exposure front baking: the quartz glass substrate after gluing is heated successively at 65 DEG C 1min, heating 4min at 90 DEG C, 65
1min (add hanker quartz glass substrate to be adjusted so that its homogeneous heating) is heated at DEG C；
Quartz glass substrate is positioned on exposure machine glass tray；
The mask plate 3 being provided with the microcosmic duct of the imitative rock core structure of reservation shape is covered on photoresist layer；
Exposure process (has set time of exposure) in advance:
Wherein: depending on time of exposure is according to photoresist thickness, sun glue exposure 75s is (if more than 90s, less than the passage of 30 μm
Easily infringement).
(5) development
Sun glue development: AZ developing agent (developer): distilled water=1:3 (volume ratio), prepares 80mL, subpackage 2 ware, wash
3min, bad wash if, the proper extension time, finally clean with ultrapure water；Obtain the microcosmic hole with imitative rock core structure
The photoresist layer in road.
(6) upper cover punching
Process liquid inlet and liquid outlet in the relevant position of quartz glass upper cover respectively, use lathe at described liquid
Body entrance and liquid outlet machining internal thread；Again the quartz glass upper cover processing liquid inlet and liquid outlet is covered in tool
Have imitative rock core structure microcosmic duct photoresist layer on and to sealing therebetween.
(7) assemble
Last again by being screwed connection between quartz glass substrate, photoresist layer and quartz glass upper cover, obtain
The described core wafer model for displacement of reservoir oil research.
Embodiment 9
Present embodiments providing a kind of core wafer model for displacement of reservoir oil research, this core wafer model includes quartz glass
Glass substrate, photoresist layer and quartz glass upper cover；
Described photoresist layer is between quartz glass substrate and quartz glass upper cover；
Described photoresist layer has the microcosmic duct of imitative rock core structure；
Described quartz glass upper cover is provided with liquid inlet and liquid outlet；
Sealing it is even between described quartz glass substrate and photoresist layer, between photoresist layer and quartz glass upper cover
Connect, and connect by 4 screws are fixing between described quartz glass substrate, photoresist layer and quartz glass upper cover；
This model also includes 2 nipples, described nipple by female thread respectively with liquid inlet and liquid discharge
Mouth is connected；
Wherein, the thickness of described quartz glass substrate is 10mm；
The thickness of described quartz glass upper cover is 10mm；
The thickness of described photoresist layer is 100 μm；
The microcosmic duct of described imitative rock core structure is stepped；
Described photoresist layer is the photoresist layer being made up of AZ-50.
Embodiment 10
Present embodiments provide the manufacture method of core wafer model for displacement of reservoir oil research described in embodiment 9, its bag
Include step in detail below:
(1) quartz glass substrate cleans
1, cleanout fluid cleans: preparation cleanout fluid, in cleanout fluid, and dense H2SO4/H2O2=3:1 (volume ratio), uses this cleaning
Liquid cleans 15min；
Wherein, No. 1 cleanout fluid is joined, it is possible to use 2 weeks；Preparation H used by cleanout fluid2O2Concentration be that 30% (volume is dense
Degree)；
2, ultra-pure water cleans；
3, re-using washes of absolute alcohol, 1min (shakes), does not washes with water after washing；
4, acetone cleans, and 1min (shakes)；
5, clean with ultra-pure water again；
After ultra-pure water cleans, absorbent paper is used to draw the moisture at quartz glass substrate edge；
Clamp quartz glass substrate with tweezers again, place it in and drying above 200 DEG C of electric hot plates, (can not be contacted), treat thoroughly
After drying, then it is placed on 5min on electric hot plate, completes the cleaning process of quartz glass substrate.
(2) quartz glass substrate surface is modified
Once purged quartz glass substrate is positioned in volatilization cylinder, instills 1～2 modification reagent (not water breakthrough) and carry out
Modify, modify time >=3min；
Wherein, the modification reagent used by modification is 1,1,1,3,3,3-hexamethyldisiloxane (1,1,1,3,3,3-
Hexamethyldislazane), its concentration is more than or equal to 98% (volumetric concentration).
(3) quartz glass substrate whirl coating
Open compressor, open vacuum pump；
Quartz glass substrate after being modified on surface is positioned over sol evenning machine center, balances；Paving AZ-50, concentration is the highest, thick
Spend the biggest, complete rear static 1～2min；
By preset program whirl coating: under evacuation state, spin coating whirl coating, different-thickness requires different whirl coating parameter, this area
Technical staff can select suitable whirl coating parameter according to concrete photoresist layer thickness.
After end, stopping vacuum, (purpose is to recover plane, glue in order to allow in the middle of quartz glass substrate quiet to put 1～2min
Even).
(4) quartz glass substrate exposure
Exposure front baking: the quartz glass substrate after gluing is heated successively at 65 DEG C 1min, heating 4min at 90 DEG C, 65
1min (add hanker quartz glass substrate to be adjusted so that its homogeneous heating) is heated at DEG C；
The mask plate being provided with the microcosmic duct of the imitative rock core structure of reservation shape is covered on photoresist layer；
Quartz glass substrate is positioned on exposure machine glass tray；
Exposure process (has set time of exposure) in advance:
Wherein: depending on time of exposure is according to photoresist thickness, sun glue exposure 75s is (if more than 90s, less than the passage of 30 μm
Easily infringement).
(5) secondary quartz glass substrate whirl coating (design of the rock core second layer)
Open compressor, open vacuum pump；
Quartz glass substrate after being modified on surface is positioned over sol evenning machine center, balances；Paving AZ-50 (cloudy glue SU-8),
Concentration is the highest, and thickness is the biggest, completes rear static 1～2min；
By preset program whirl coating: under evacuation state, spin coating whirl coating, different-thickness requires different whirl coating parameter；This area
Technical staff can select suitable whirl coating parameter according to concrete photoresist layer thickness；
The gross thickness of described two-layer AZ-50 photoresist layer is 100 μm；
After end, stopping vacuum, (purpose is to recover plane, glue in order to allow in the middle of quartz glass substrate quiet to put 1～2min
Even).
(6) secondary quartz glass substrate exposure (design of the rock core second layer)
Exposure front baking: the quartz glass substrate after gluing is heated successively at 65 DEG C 1min, heating 4min at 90 DEG C, 65
1min (add hanker quartz glass substrate to be adjusted so that its homogeneous heating) is heated at DEG C；
Quartz glass substrate is positioned on exposure machine glass tray；
The mask plate being provided with the microcosmic duct of the imitative rock core structure of reservation shape is covered on photoresist layer；
Exposure process (has set time of exposure) in advance:
Wherein: depending on time of exposure is according to photoresist thickness, sun glue exposure 75s is (if more than 90s, less than the passage of 30 μm
Easily infringement).
(7) development
Sun glue development: AZ developing agent (developer): distilled water=1:3 (volume ratio), prepares 80mL, subpackage 2 ware, wash
3min, bad wash if, the proper extension time, finally clean with ultrapure water；Obtain the microcosmic hole with imitative rock core structure
The photoresist layer in road.
(8) upper cover punching
Process liquid inlet and liquid outlet in the relevant position of quartz glass upper cover respectively, use lathe at described liquid
Body entrance and liquid outlet machining internal thread；Again the quartz glass upper cover processing liquid inlet and liquid outlet is covered in tool
Have imitative rock core structure microcosmic duct photoresist layer on and to sealing therebetween.
(9) assemble
Last again by being screwed connection between quartz glass substrate, photoresist layer and quartz glass upper cover, obtain
The described core wafer model for displacement of reservoir oil research.
Embodiment 11
Present embodiments providing a kind of core wafer model for displacement of reservoir oil research, this core wafer model includes quartz glass
Glass substrate, photoresist layer and quartz glass upper cover；
Described photoresist layer is between quartz glass substrate and quartz glass upper cover；
Described photoresist layer has the microcosmic duct of imitative rock core structure；
Described quartz glass upper cover is provided with liquid inlet and liquid outlet；
Sealing it is even between described quartz glass substrate and photoresist layer, between photoresist layer and quartz glass upper cover
Connect, and connect by 4 screws are fixing between described quartz glass substrate, photoresist layer and quartz glass upper cover；
This model also includes 2 nipples, described nipple by female thread respectively with liquid inlet and liquid discharge
Mouth is connected；
Wherein, the thickness of described quartz glass substrate is 10mm；
The thickness of described quartz glass upper cover is 10mm；
The thickness of described photoresist layer is 500 μm；
The microcosmic duct of described imitative rock core structure is stepped；
Described photoresist layer is the photoresist layer being made up of SU-8.
Embodiment 12
Present embodiments provide the manufacture method of core wafer model for displacement of reservoir oil research described in embodiment 11, its bag
Include step in detail below:
(1) quartz glass substrate cleans
1, cleanout fluid cleans: preparation cleanout fluid, in cleanout fluid, and dense H2SO4/H2O2=3:1 (volume ratio), uses this cleaning
Liquid cleans 15min；
Wherein, No. 1 cleanout fluid is joined, it is possible to use 2 weeks；Preparation H used by cleanout fluid2O2Concentration be that 30% (volume is dense
Degree)；
2, ultra-pure water cleans；
3, re-using washes of absolute alcohol, 1min (shakes), does not washes with water after washing；
4, acetone cleans, and 1min (shakes)；
5, clean with ultra-pure water again；
After ultra-pure water cleans, absorbent paper is used to draw the moisture at quartz glass substrate edge；
Clamp quartz glass substrate with tweezers again, place it in and drying above 200 DEG C of electric hot plates, (can not be contacted), treat thoroughly
After drying, then it is placed on 5min on electric hot plate, completes the cleaning process of quartz glass substrate.
(2) quartz glass substrate surface is modified
Once purged quartz glass substrate is positioned in volatilization cylinder, instills 1～2 modification reagent (not water breakthrough) and carry out
Modify, modify time >=3min；
Wherein, the modification reagent used by modification is 1,1,1,3,3,3-hexamethyldisiloxane (1,1,1,3,3,3-
Hexamethyldislazane), its concentration is more than or equal to 98% (volumetric concentration).
(3) quartz glass substrate whirl coating
Open compressor, open vacuum pump；
Quartz glass substrate after being modified on surface is positioned over sol evenning machine center, balances；The cloudy glue SU-8 of paving, concentration is more
Height, thickness is the biggest, completes rear static 1～2min；
By preset program whirl coating: under evacuation state, spin coating whirl coating, different-thickness requires different whirl coating parameter；This area
Technical staff can select suitable whirl coating parameter according to concrete photoresist layer thickness.
After end, stopping vacuum, (purpose is to recover plane, glue in order to allow in the middle of quartz glass substrate quiet to put 1～2min
Even).
(4) quartz glass substrate exposure
Exposure front baking: the quartz glass substrate after gluing is heated successively at 65 DEG C 1min, heating 4min at 90 DEG C, 65
1min (add hanker quartz glass substrate to be adjusted so that its homogeneous heating) is heated at DEG C；
The mask plate being provided with the microcosmic duct of the imitative rock core structure of reservation shape is covered on photoresist layer；
Quartz glass substrate is positioned on exposure machine glass tray；
Exposure process (has set time of exposure) in advance:
Wherein: depending on time of exposure is according to photoresist thickness, cloudy glue exposure 45s, heats 1min in 65 DEG C after cloudy glue exposure；
Exposure after bake (cloudy glue): be positioned at 65 DEG C heating 1min, heat 4min at 90 DEG C, heat 1min at 65 DEG C and (add
Hanker quartz glass substrate to be adjusted so that its homogeneous heating).
(5) secondary quartz glass substrate whirl coating (design of the rock core second layer)
Open compressor, open vacuum pump；
Quartz glass substrate after being modified on surface is positioned over sol evenning machine center, balances；The cloudy glue SU-8 of paving, concentration is more
Height, thickness is the biggest, completes rear static 1～2min；
By preset program whirl coating: under evacuation state, spin coating whirl coating, different-thickness requires different whirl coating parameter；This area
Technical staff can select suitable whirl coating parameter according to concrete photoresist layer thickness.
The gross thickness of described two-layer SU-8 photoresist layer is 500 μm；
After end, stopping vacuum, (purpose is to recover plane, glue in order to allow in the middle of quartz glass substrate quiet to put 1～2min
Even).
(6) secondary quartz glass substrate exposure (design of the rock core second layer)
Exposure front baking: the quartz glass substrate after gluing is heated successively at 65 DEG C 1min, heating 4min at 90 DEG C, 65
1min (add hanker quartz glass substrate to be adjusted so that its homogeneous heating) is heated at DEG C；
Quartz glass substrate is positioned on exposure machine glass tray；
The mask plate being provided with the microcosmic duct of the imitative rock core structure of reservation shape is covered on photoresist layer；
Exposure process (has set time of exposure) in advance:
Wherein: depending on time of exposure is according to photoresist thickness, 1min is heated in 65 DEG C after cloudy glue exposure；
Exposure after bake (cloudy glue): be positioned at 65 DEG C heating 1min, heat 4min at 90 DEG C, heat 1min at 65 DEG C and (add
Hanker quartz glass substrate to be adjusted so that its homogeneous heating).
(7) development
Cloudy glue development: Su-8 developing agent (developer) (can not water breakthrough), and developing time < 3min, in right amount；
Wherein: shaking while wash, about 1min takes out, dry up (drawing near, blow) along pipeline by nitrogen gun, if chromatic colour,
Wash again；Slightly washing with clean developer solution for the last time can (makes its clean)；Finally, positive ground drying, the back side is wiped clean；Obtain
There is the photoresist layer in the microcosmic duct of imitative rock core structure；
(8) upper cover punching
Process liquid inlet and liquid outlet in the relevant position of quartz glass upper cover respectively, use lathe at described liquid
Body entrance and liquid outlet machining internal thread；Again the quartz glass upper cover processing liquid inlet and liquid outlet is covered in tool
Have imitative rock core structure microcosmic duct photoresist layer on and to sealing therebetween；
(9) assemble
Last again by being screwed connection between quartz glass substrate, photoresist layer and quartz glass upper cover, obtain
The described core wafer model for displacement of reservoir oil research.
Claims (7)
1. the core wafer model for displacement of reservoir oil research, it is characterised in that this core wafer model includes quartz glass substrate
Plate (1), photoresist layer (2) and quartz glass upper cover (5)；
Described photoresist layer (2) is positioned between quartz glass substrate (1) and quartz glass upper cover (5)；
Described photoresist layer (2) has the microcosmic duct (4) of imitative rock core structure；
Described quartz glass upper cover (5) is provided with liquid inlet (7) and liquid outlet (9)；
Between described quartz glass substrate (1) and photoresist layer (2), it is between photoresist layer (2) and quartz glass upper cover (5)
It is tightly connected, and solid by screw (6) between described quartz glass substrate (1), photoresist layer (2) and quartz glass upper cover (5)
Fixed connection.
Core wafer model for displacement of reservoir oil research the most according to claim 1, it is characterised in that described quartz glass substrate
The thickness of plate (1) is more than 10mm.
Core wafer model for displacement of reservoir oil research the most according to claim 1, it is characterised in that described photoresist layer
(2) thickness is 0.5-1000 μm.
Core wafer model for displacement of reservoir oil research the most according to claim 1, it is characterised in that on described quartz glass
The thickness of lid (5) is more than 10mm.
Core wafer model for displacement of reservoir oil research the most according to claim 1, it is characterised in that this model also includes spiral shell
Stricture of vagina joint (8), described nipple (8) is connected with liquid inlet (7) and liquid outlet (9) respectively by female thread.
Core wafer model for displacement of reservoir oil research the most according to claim 1, it is characterised in that described screw (6)
Number is no less than 3.
7. according to the core wafer model for displacement of reservoir oil research described in any one of claim 1-6, it is characterised in that described imitative
The microcosmic duct (4) of rock core structure is stair-stepping duct.
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN105632323A (en) * | 2016-03-30 | 2016-06-01 | 中国石油大学(北京) | Core slice model for oil displacement research and manufacturing method thereof |
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2016
- 2016-03-30 CN CN201620256082.0U patent/CN205788856U/en not_active Withdrawn - After Issue
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN105632323A (en) * | 2016-03-30 | 2016-06-01 | 中国石油大学(北京) | Core slice model for oil displacement research and manufacturing method thereof |
| CN105632323B (en) * | 2016-03-30 | 2018-08-17 | 中国石油大学(北京) | A kind of core wafer model and preparation method thereof for displacement of reservoir oil research |
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