CN205741268U - Electrochemistry circulating bath device under a kind of high-intensity magnetic field - Google Patents
Electrochemistry circulating bath device under a kind of high-intensity magnetic field Download PDFInfo
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- CN205741268U CN205741268U CN201620461243.XU CN201620461243U CN205741268U CN 205741268 U CN205741268 U CN 205741268U CN 201620461243 U CN201620461243 U CN 201620461243U CN 205741268 U CN205741268 U CN 205741268U
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- magnetic field
- electroplate liquid
- baffle plate
- intensity magnetic
- heatproof
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Abstract
The utility model discloses electroplate liquid recirculation unit under a kind of high-intensity magnetic field, it comprises magnetic field generator, electroplating bath, baffle plate net, electrode, power supply, mozzle, water pump, transformator composition.This utility model transformator is connected with water pump, can reach to regulate plating solution intensity of circulation by the size of regulation voltage device voltage, plating liquid stream is made from top to bottom to flow, thus reach to stir the purpose of plating solution, circulating bath stirring can effectively utilize the space under high-intensity magnetic field, mixing effect is good, the effect of mass transmitting of plating solution can be significantly improved during electroplating particularly composite plating, it is evengranular in plating solution being suspended in electroplate liquid, thus improve the quality of coating of acquisition, prepare high-quality product.
Description
Technical field
This utility model relates to welding technology field, electrochemistry circulating bath device under especially a kind of high-intensity magnetic field.
Background technology
Electroplating technology is widely used in decoration, surface functional material.Since the nineties in last century, composite plating skill under magnetic field
Art is developed rapidly, permissible with the effect (MHD effect) that the reciprocal action of electric field produces Lorentz force mainly due to magnetic field
Significantly improving the effect of mass transmitting of plating solution, this effect of mass transmitting even can be suitable with mechanical agitation intensity under high-intensity magnetic field, but
This reciprocal action is limited to the stirring action bottom electroplating bath, and granule is easily at electroplating bath bottom precipitation.Simultaneously as magnetization
The effect of power and magnetic field energy can also significantly refine the effect of coating crystal grain, preferred orientation, improves quality and the performance of coating,
Therefore under high-intensity magnetic field, the research of composite plating receives much attention in recent years.But, magnetic field still cannot make with the reciprocal action of electric field
Bigger evengranular in plating solution is suspended in electroplate liquid, and therefore in its plating solution, the dispersibility of granule still has problems.
At present, domestic and international research worker has carried out some researchs to the scattering problem of the plating solution of composite plating under magnetic field, as
Bubble agitation, mechanical mixing method etc..Bubble agitation method uses compressed gas to be stirred electroplate liquid exactly, so that electroplate liquid
In particle suspension in electroplate liquid, but, use the method uneven to the stirring action of electroplate liquid, particle is in electroplate liquid
Distribution the most unstable, it is thus achieved that coating stability and uniformity poor.Mechanical mixing method is exactly to use traditional machinery
Stirring technique, enters puddler oar and stirring paddle electroplate liquid above electroplate liquid and is stirred, but due in high-intensity magnetic field
Between the steady magnetic field inter-air space little, high-intensity magnetic field is strong to the magnetization of electric device, therefore electric device and control device and need
Will be away from high-intensity magnetic field, this allows for operating process and becomes extremely difficult, although said method can improve plating to a certain extent
The quality of layer, but said method still needs further to be improved at aspects such as the controllability of production technology, costs.
Summary of the invention
Technical problem to be solved in the utility model is: provide electroplate liquid circulation electric plating method and dress under a kind of magnetic field
Standby, utilize the principle of water pump to realize electroplate liquid circulation under magnetic field, it is achieved an electroplate liquid dispersion more uniform effect of ratio, operable
Simply, dispersion effect is good, and cost ratio is relatively low, to overcome the deficiencies in the prior art.
This utility model is achieved in that
Electrochemistry circulating bath device under a kind of high-intensity magnetic field, including heatproof electroplating bath, heater is wrapped in heatproof plating
Groove surrounding, magnetic field generator parcel heater, in heatproof electroplating bath, it is provided with electroplate liquid, anode and negative electrode inserts plating respectively
In liquid, and this anode and negative electrode connect electroplating power supply respectively and electroplating power supply, anode, negative electrode and electroplate liquid formation are controlled back
Road, the entrance point of mozzle connects with the bottom of heatproof electroplating bath, and the port of export of mozzle connects with the top of heatproof electroplating bath
Electroplate liquid in heatproof electroplating bath is circulated.
Under aforesaid a kind of high-intensity magnetic field in electrochemistry circulating bath device, from interior between magnetic field generator and heater
Insulation material layer and water cooling plant, and this insulation material layer parcel heater, water cooling plant parcel thermal insulation is set gradually to outward
Material layer, magnetic field generator includes water cooling plant.
Under aforesaid a kind of high-intensity magnetic field in electrochemistry circulating bath device, heater is connected with temperature control instrument and realizes temperature control instrument
Controlling the duty of heater, thermocouple is arranged in electroplate liquid, and this thermocouple connects with temperature control instrument.
Under aforesaid a kind of high-intensity magnetic field in electrochemistry circulating bath device, the magnetic direction that described magnetic field generator produces is
Straight up.
Under aforesaid a kind of high-intensity magnetic field in electrochemistry circulating bath device, baffle plate one and baffle plate two are successively set on electroplate liquid
In upper and lower end and the edgewise of this baffle plate one and baffle plate two coordinate with heatproof electroplating bath inwall and realize anode, negative electrode and mozzle
Import and export separate, baffle plate one and baffle plate two are uniformly distributed mesh, realize uniform particle in electroplate liquid by arranging mesh
By mesh and be distributed at anode and cathode site.
Under aforesaid a kind of high-intensity magnetic field in electrochemistry circulating bath device, arranging water pump on mozzle, water pump is by becoming
Depressor realizes driving.
This utility model principle is: added by the plating solution granule of particle size range in electroplate liquid, then uses circulation electroplate liquid
Alr mode electroplate liquid is stirred, control well after plating solution circulation rate, open magnetic field generator and electroplating power supply is carried out
Electroplate under high-intensity magnetic field, realize granule under the influence of a magnetic field in cathode surface enrichment to a certain extent, thus be conducive to preparing
Qualified coating.
Owing to have employed technique scheme, compared with prior art, compared with prior art, this practical information has
Obvious prominent substantive distinguishing features and marked improvement:
1) space in steady magnetic field district in kicker magnet can, be effectively utilized；
2), owing to electric device is away from field regions, this utility model can reduce even elimination magnetic field to electric device
Interference；
3, simple to operate, dispersion effect is good, improves its lumber recovery, improves productivity and quality, significantly reduces and produce into
This.
Accompanying drawing explanation
Accompanying drawing 1 is structural representation of the present utility model；
Accompanying drawing 2 is this utility model baffle arrangement schematic diagram；
Accompanying drawing 3 is coating perseverance basal plane schematic diagram on negative electrode in this utility model.
Detailed description of the invention
Embodiment of the present utility model: electrochemistry circulating bath device under a kind of high-intensity magnetic field, as shown in drawings, including heatproof
Electroplating bath 7, heater 4 is wrapped in heatproof electroplating bath 7 surrounding, and magnetic field generator 1 wraps up heater 4, at heatproof electroplating bath 7
Inside it is provided with electroplate liquid 8, anode 11 and negative electrode 10 to insert in electroplate liquid 8 respectively, and this anode 11 and negative electrode 10 connect plating respectively
Power supply 12 makes electroplating power supply 12, anode 11, negative electrode 10 and electroplate liquid 8 form control loop, and the entrance point of mozzle 15 is with resistance to
The bottom connection of temperature electroplating bath 7, the port of export of mozzle 15 connects so that in heatproof electroplating bath 7 with the top of heatproof electroplating bath 7
Electroplate liquid 8 circulate.
Between magnetic field generator 1 and heater 4, wherein set gradually insulation material layer 3 and water cooling plant from inside to outside
2, and this insulation material layer 3 wraps up heater 4, water cooling plant 2 wraps up insulation material layer 3, and magnetic field generator 1 includes that water-cooled fills
Putting 2, this heater 4 is connected with temperature control instrument 6 and realizes temperature control instrument 6 and control the duty of heater, and thermocouple 5 is arranged on electricity
In plating solution 8, and this thermocouple 6 connects with temperature control instrument 6, and the direction, magnetic field 14 that this magnetic field generator 1 produces is straight up, this gear
Plate 1 and baffle plate 2 13 are successively set on the upper and lower end in electroplate liquid 8 and this baffle plate 1 and the edgewise of baffle plate 2 13 and heatproof
Electroplating bath 7 inwall coordinates the import and export realizing anode 9, negative electrode 10 and mozzle 15 to separate, on baffle plate 1 and baffle plate 2 13 all
Even distribution mesh 18, arranges water pump 16 on mozzle 15, and water pump 16 realizes driving by transformator 17, along with entering of plating
OK, on the matrix 19 of negative electrode 10, the granule 20 in plating solution enters into coating 21.
Time specifically used
The present embodiment is formed, by grain by comprising magnetic field generator, electrode, power supply, baffle plate, drainage tube, water pump, transformator etc.
The plating solution granule of footpath scope adds in electroplate liquid, then uses the alr mode of circulation electroplate liquid to be stirred electroplate liquid, control
After making plating solution circulation rate, open magnetic field generator and electroplating power supply carries out electroplating under high-intensity magnetic field, real under the influence of a magnetic field
Existing granule is in cathode surface enrichment to a certain extent, thus is conducive to preparing qualified coating.
Concrete operation step is as follows:
A () has configured electroplate liquid, and added granule particles, uses mechanical agitation to carry out pre-stirring, make under without magnetic field
Particle is substantially uniform to be suspended in electroplate liquid, and is added in electroplating bath by electroplate liquid.
B the equipment such as magnetic field generator, electroplating bath, mozzle, water pump, transformator are assembled by ().
C () controls the speed of pump power regulation and control electroplate liquid circulation by controlling transformator.Then, open magnetic field to occur
Device, regulates magnetic field intensity.
D () turns on the power and electroplates, regulation suitable current density is electroplated, and prepares qualified coating.
Above-mentioned be applied on electrode can be the DC source of constant amplitude with power supply, or is dutycycle and frequency-adjustable
The pulse power, or the DC source that dutycycle, frequency and cycle can be reverse, provide different qualities for electromagnetic oscillation process
Electric current.Magnetic field generator can be the magnetic field that electric magnet produces, it is also possible to the magnetic obtained for permanent magnet employing magnetic Circuit Design
, it is also possible to it is the magnetic using Bitter magnet or superconducting magnet or Bitter magnet and superconducting magnet hybrid magnet to provide
, it is provided that magnetic induction be 0.001-20T.
The device utilizing the present embodiment carries out composite plating iron tests in magnetic field
The composition of the present embodiment electroplate liquid is: 0.90mol/L FeSO4,0.15mol/LFeCl2,0.43mol/LNH4C1,
Reduced iron powder 1g/L, wetting agent is saturated 2/L of dodecylbenzene sodium sulfonate solution, dispersant cetyl trimethylammonium bromide
0.5g/L, then the H2SO4 of 0.9mol/L, regulation pH value are 1.5, add the Antaciron granule of 20g/L.Filling peak value grain
Footpath is that the electroplate liquid 8 of the silicon grain 20 of 2pm is inserted in the heatproof electroplating bath 7 that capacity is 50L.
Employing thickness is 0.5mm, length and width are 50mm, silicon content be 3wt% low silicon silicon strip as silicon strip negative electrode 10,
Pure iron sheet is anode 11, is immersed in electroplate liquid 8, is connected, the negative pole of negative electrode with DC source (i.e. electroplating power supply 12) by pure iron
Sheet Anodic 10 is connected with the positive pole of DC source 12, uses temperature controller 6 and heater 4 and thermocouple 5 by electricity
Plating solution 8 is heated to 30 DEG C and is incubated, and regulation transformator 17, makes water pump 16 work, by mozzle 15 by electroplate liquid by upper simultaneously
Being sent under in electroplating bath 7, controlling flow of the electrolyte speed is 6L/ minute, is then turned on composite plating unidirectional current
Source 12, adjustment DC current density is 3A/dm2；The magnetic field of Stationary Magnetic Field Generator for Magnetic 1 is provided by electric magnet, and magnetic induction is protected
Hold as 10T.The direction of the magnetic line of force 14 is vertically upward.
After composite electrodeposition completes, it is thus achieved that the Composite Coatings iron layer (i.e. coating 21) of high silicon, measure through EDS (energy spectrum analysis),
This Composite Coatings iron layer silicone content is 10.64wt%.
Comparative example 1.
Identical with embodiment electroplating parameter, difference is to be not added with magnetic field, and cladding silicon granule content is only 0.64wt%.
Comparative example 2.
Identical with embodiment electroplating parameter, difference is to be not added with magnetic field, does not the most circulate electroplate liquid, great majority in plating solution
Granule is quickly deposited to bottom electroplating bath, and cladding silicon granule content is only 0.02wt%.
The description of such scheme is the utility model being understood that for ease of those skilled in the art and using,
Embodiment obviously easily can be made various amendment by person skilled in the art, and therefore, this utility model does not limits
In above-mentioned solid yardage case, those skilled in the art, according to method of the present utility model, are made without departing from this utility model category
Improve and amendment all should be within protection domain of the present utility model.
Claims (6)
1. an electrochemistry circulating bath device under high-intensity magnetic field, including heatproof electroplating bath (7), it is characterised in that: heater (4)
It is wrapped in heatproof electroplating bath (7) surrounding, magnetic field generator (1) parcel heater (4), in heatproof electroplating bath (7), is provided with electricity
Plating solution (8), anode (11) and negative electrode (10) insert in electroplate liquid (8) respectively, and this anode (11) and negative electrode (10) connect respectively
Electroplating power supply (12) makes electroplating power supply (12), anode (11), negative electrode (10) and electroplate liquid (8) form control loop, mozzle
(15) entrance point connects with the bottom of heatproof electroplating bath (7), the port of export of mozzle (15) and the top of heatproof electroplating bath (7)
Connection makes the electroplate liquid (8) in heatproof electroplating bath (7) circulate.
Electrochemistry circulating bath device under a kind of high-intensity magnetic field the most according to claim 1, it is characterised in that: occur in magnetic field
Insulation material layer (3) and water cooling plant (2), and this adiabator is set gradually from inside to outside between device (1) and heater (4)
Layer (3) parcel heater (4), water cooling plant (2) parcel insulation material layer (3), magnetic field generator (1) includes water cooling plant
(2).
Electrochemistry circulating bath device under a kind of high-intensity magnetic field the most according to claim 1, it is characterised in that: heater
(4) be connected with temperature control instrument (6) realize temperature control instrument (6) control heater duty, thermocouple (5) is arranged on electroplate liquid
(8) in, and this thermocouple (6) connects with temperature control instrument (6).
Electrochemistry circulating bath device under a kind of high-intensity magnetic field the most according to claim 1, it is characterised in that: described magnetic field is sent out
Magnetic field (14) direction that raw device (1) produces is for straight up.
Underneath type stirring electroplanting device under a kind of high-intensity magnetic field the most according to claim 1, it is characterised in that: baffle plate one (9)
It is successively set on the edgewise of the upper and lower end in electroplate liquid (8) and this baffle plate one (9) and baffle plate two (13) with resistance to baffle plate two (13)
Temperature electroplating bath (7) inwall coordinate realize anode (9), the import and export of negative electrode (10) and mozzle (15) separate, at baffle plate one (9) and
Mesh (18) it is uniformly distributed on baffle plate two (13).
Electrochemistry circulating bath device under a kind of high-intensity magnetic field the most according to claim 1, it is characterised in that: at mozzle
(15) arranging water pump (16) on, water pump (16) realizes driving by transformator (17).
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201620461243.XU CN205741268U (en) | 2016-05-19 | 2016-05-19 | Electrochemistry circulating bath device under a kind of high-intensity magnetic field |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201620461243.XU CN205741268U (en) | 2016-05-19 | 2016-05-19 | Electrochemistry circulating bath device under a kind of high-intensity magnetic field |
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| Publication Number | Publication Date |
|---|---|
| CN205741268U true CN205741268U (en) | 2016-11-30 |
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201620461243.XU Expired - Fee Related CN205741268U (en) | 2016-05-19 | 2016-05-19 | Electrochemistry circulating bath device under a kind of high-intensity magnetic field |
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Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN108103565A (en) * | 2018-02-05 | 2018-06-01 | 深圳市瑞世兴科技有限公司 | A kind of crystal grain refinement metal plating device |
| CN108796587A (en) * | 2017-05-02 | 2018-11-13 | 贵州理工学院 | A kind of continuous method and device for preparing high-silicon steel thin strip |
| CN113322503A (en) * | 2021-05-27 | 2021-08-31 | 无锡吉智芯半导体科技有限公司 | Horizontal wafer electrochemical deposition equipment |
-
2016
- 2016-05-19 CN CN201620461243.XU patent/CN205741268U/en not_active Expired - Fee Related
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN108796587A (en) * | 2017-05-02 | 2018-11-13 | 贵州理工学院 | A kind of continuous method and device for preparing high-silicon steel thin strip |
| CN108103565A (en) * | 2018-02-05 | 2018-06-01 | 深圳市瑞世兴科技有限公司 | A kind of crystal grain refinement metal plating device |
| CN113322503A (en) * | 2021-05-27 | 2021-08-31 | 无锡吉智芯半导体科技有限公司 | Horizontal wafer electrochemical deposition equipment |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| CF01 | Termination of patent right due to non-payment of annual fee | ||
| CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20161130 Termination date: 20170519 |