CN205645750U - Hall ion source - Google Patents
Hall ion source Download PDFInfo
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- CN205645750U CN205645750U CN201620334637.9U CN201620334637U CN205645750U CN 205645750 U CN205645750 U CN 205645750U CN 201620334637 U CN201620334637 U CN 201620334637U CN 205645750 U CN205645750 U CN 205645750U
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- protective cover
- ion source
- gas tube
- safety cover
- gas
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Abstract
The utility model discloses a hall ion source, including positive pole and cathode filament, its characterized in that: still include the safety cover, the safety cover is equipped with the lumen, positive pole and cathode filament set up in the lumen of safety cover, the safety cover is equipped with the gas tube outward, gas tube one end and air supply intercommunication, the other end is continuous with the positive pole bottom inflation inlet in the safety cover, the trachea winding is in contact on the safety cover and with the safety cover, perhaps at least partial gas tube is located the lumen top. The utility model discloses the gas reentrant positive pole workspace of arriving after a few baidu's temperature ion source self heating obtains that makes normal atmospheric temperature fill, it is gaseous to compare conventional normal atmospheric temperature, and its ionization efficiency improves greatly.
Description
Technical field
This utility model relates to the hall ion source in a kind of vacuum coating, refer more particularly to the Hall of lift gas efficiency of ionization from
Component.
Background technology
Hall ion source has simple in construction, it is easy to safeguard.It is vacuum coating technology to be commonly used to improve by hall ion source auxiliary
The effective means of film layer consistency.
Ionogenic operation principle is heating luminous after cathode filament energising, produces thermoelectron, and thermoelectron draws anode positive voltage
To anode movement under Dong, running into magnetic field in motor process, under the Lorentz force action in magnetic field, electronics makees screw movement,
With O out in inducing QI iron core in motor process2Or Ar molecule carries out collision and produces O+Or Ar+Ion, O+Or Ar+Ion is at anode
The repulsion of positive voltage promotes lower past top to move, and these cations are by running into again thermoelectron time on cathode filament limit, result is just
Ion is neutralized, but still remains original kinetic energy and continue, toward upper direction, to reach up to the plated film of work rest above ion source
Substrate surface, clashes into surface, improves consistency during thin film deposition.The electronics that cathode filament issues should play and hit
Hit the effect that working gas makes working gas ionize, play the positive charge neutralizing the ion being ionized part again.If negative electrode is sent out
Electron number out is inadequate, and neutralization is the most bad, makes the ion of part positively charged escape, and can cause sparking, or make deposition
The harmful effects such as Film roughness increase.
Being the concentration zones of ionization bottom anode, electronics accelerates collision O through anode and magnetic field2Or Ar molecule ionizes, its ionization
Electronics that efficiency is issued by anode voltage, magnetic field, cathode filament, carbonate concentration etc. together decide on.Common hall ion source
The O being filled with2Or Ar is room temperature, substantial amounts of electronics is needed to go to clash into, it is also desirable to be filled with more O2Or Ar is to obtain foot
Enough high ion current densities.And the air pressure upper limit in coating process has certain limitations, so ionogenic aeration quantity also has certain
Limit, other electric parameter such as anode voltage equally.If the parameter regulation of ion source work is improper, the ion stream that output comes
Density is the highest, neutralizes bad, finally makes the film performance being deposited very poor.
Utility model content
The purpose of this utility model is to overcome deficiency of the prior art, it is provided that the hall ion source that a kind of efficiency of ionization is high.
For realizing object above, this utility model is achieved through the following technical solutions:
Hall ion source, including anode and cathode filament, it is characterised in that: also include that protective cover, described protective cover are provided with tube chamber；
Described anode and cathode filament are arranged in the tube chamber of protective cover；Described protective cover is externally provided with gas tube, described gas tube one end
Connecting with source of the gas, the other end is connected with the anode bottom inflatable mouth in protective cover；Described trachea be wrapped on described protective cover and with
Protective cover contacts, or at least partly gas tube is positioned at above described tube chamber.
According to an embodiment of the present utility model, described gas tube is wound around and is arranged on the protective cover first half.
According to an embodiment of the present utility model, described gas tube is wound around and is arranged on described protective cover outer wall.
According to an embodiment of the present utility model, described gas tube part is positioned at above described tube chamber.
According to an embodiment of the present utility model, described gas tube part is positioned at directly over described cathode filament.
According to an embodiment of the present utility model, described protective cover and gas tube all use Heat Conduction Material to make.
The heat that gas utilized cathode filament to be sent out before being filled with anode working district is heated by this utility model, with hundreds of
After the gas of degree temperature enters into anode working district, comparing the gas at normal temperature of routine, its efficiency of ionization is greatly improved.This practicality is new
Type gas tube height on protective cover is positioned near cathode filament, and gas tube is located close to the position between anode and cathode filament,
Temperature is higher.
Accompanying drawing explanation
Fig. 1 is this utility model embodiment 1 structural representation；
Fig. 2 is the structure sectional view of the present embodiment 1.
Fig. 3 is the structural representation of this utility model embodiment 2.
Label declaration in figure:
1, anode；2, cathode filament；3, upper conduction magnetic board；4, lower magnetic conductive board；5, the permanent bar magnet of aluminum nickel cobalt；6, inducing QI
Iron core；7, insulating ceramic pad；8, protective cover；81, tube chamber；9, gas tube.
Detailed description of the invention
Below in conjunction with the accompanying drawings this utility model is described in detail:
As shown in Figure 1 and Figure 2, hall ion source, including protective cover 8, protective cover 8 is provided with tube chamber 81.The pipe of protective cover 8
Anode 1, cathode filament 2, upper conduction magnetic board 3 and lower magnetic conductive board 4 it is provided with in chamber 81.Upper conduction magnetic board 3 and lower magnetic conductive board 4 are respectively
It is installed on the two ends up and down of the permanent bar magnet of aluminum nickel cobalt 5.Anode 1 is arranged between the permanent bar magnet of aluminum nickel cobalt 5, anode 1 ring
Arrange around inducing QI iron core 6.It is provided with insulating ceramic pad 7 between inducing QI iron core 6 and lower magnetic conductive board 4, twines outside described protective cover 8
Around being provided with gas tube 9.Gas tube 9 one end connects with source of the gas, and the other end is connected with anode 1 bottom inflatable mouth.Described guarantor
Guard shield 8 and gas tube 9 all use Heat Conduction Material to make, and when anode 1 and cathode filament 2 work, liberated heat makes protective cover 8
Temperature raises, and protective cover 8 transfers heat to gas tube 9, so that the gas supplied by source of the gas was subject to before entering anode 1
Heat and improve temperature.
After this utility model this utility model enters into anode 1 working area with the gas of several Baidu temperature, compare the room temperature of routine
Gas, first preheats ionogenic working gas and is passed into anode 1 working area again and is passed into anode 1 working area than gas at normal temperature and has
Obviously improving effect, its efficiency of ionization is greatly improved.
This utility model utilizes the heat of hall ion source self to heat the gas in gas tube 9, it is not necessary to additional thermal energy
Thering is provided device, the gas tube 9 height on protective cover is between anode 1 and cathode filament 2, and gas tube 9 is located close to sun
Position between pole 1 and cathode filament 2, temperature is higher.
Embodiment 2
As it is shown on figure 3, its difference with embodiment 1 is, gas tube 9 is not wrapped in the outer wall of protective cover 8, but
A part is positioned at above tube chamber 81, is more preferably located at the surface of cathode filament 2.Cathode filament 2 or protective cover 8 distribute
Heat the gas temperature in gas tube 9 still can be made to raise.
This utility model makes efficiency of ionization promote due to the gas after heating, and the gas concentration being filled with anode 1 working area can reduce,
Plated film vacuum is made to reduce, hence it is evident that to improve the consistency of deposition thin film；The operating current of cathode filament 2 reduces, and extends filament
Service life, decrease the operating power of cathode filament 2, there is energy-saving effect；Owing to the gas after heating makes ionization imitate
Rate promotes, and neutralization improves, and anode 1 spark phenomenon once in a while originally disappears, and makes the film light cleanliness of deposition improve.
This utility model makes efficiency of ionization promote due to the gas after heating, when not using the hall ion source in this utility model,
Insufflation gas concentration 40sccm could export the anode line of 4.7A；Hall ion source in this utility model is used to make gas heating
After in rear input cavity volume, gas concentration 36sccm just can export the anode line of 4.7A, illustrates that the utilization rate of gas is high.
Using the hall ion source in this utility model, aeration quantity drops to 36sccm from 40sccm, and plated film vacuum can be from 2.2X10-2Pa
It is reduced to 2.0X10-2Pa.Not using hall ion source of the present utility model, under its vacuum, the thin film of plating has the 0.5% of centre wavelength
The drift of left and right；Use the hall ion source in this utility model, almost 0 drift, illustrate that consistency rises.And,
Relative to existing hall ion source, the hall ion source filament in this utility model rose to 10 hours from 6 hours service life,
The heater current of cathode filament reduces about 1A, and power probably reduces 25W.
Embodiment in this utility model is only used for illustrating this utility model, is not intended that the restriction to right,
Those skilled in that art it is contemplated that other replacements being substantially equal to, all in this utility model protection domain.
Claims (6)
1. hall ion source, including anode and cathode filament, it is characterised in that: also include that protective cover, described protective cover are provided with tube chamber；
Described anode and cathode filament are arranged in the tube chamber of protective cover；Described protective cover is externally provided with gas tube, described gas tube one
End connects with source of the gas, and the other end is connected with the anode bottom inflatable mouth in protective cover；Described trachea is wrapped on described protective cover
And contact with protective cover, or at least partly gas tube is positioned at above described tube chamber.
Hall ion source the most according to claim 1, it is characterised in that: described gas tube is wound around and is arranged on the protective cover first half.
Hall ion source the most according to claim 1 and 2, it is characterised in that: described gas tube is wound around and is arranged on described protective cover
On outer wall.
Hall ion source the most according to claim 1, it is characterised in that: described gas tube part is positioned at above described tube chamber.
5. according to the hall ion source described in claim 1 or 4, it is characterised in that: described gas tube part is positioned at described cathode modulation
Directly over Si.
Hall ion source the most according to claim 1, it is characterised in that: described protective cover and gas tube all use Heat Conduction Material
Make.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201620334637.9U CN205645750U (en) | 2016-04-20 | 2016-04-20 | Hall ion source |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201620334637.9U CN205645750U (en) | 2016-04-20 | 2016-04-20 | Hall ion source |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN205645750U true CN205645750U (en) | 2016-10-12 |
Family
ID=57062809
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201620334637.9U Active CN205645750U (en) | 2016-04-20 | 2016-04-20 | Hall ion source |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN205645750U (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN105826151A (en) * | 2016-04-20 | 2016-08-03 | 上海兆九光电技术有限公司 | Hall ion source |
| CN109686639A (en) * | 2018-12-25 | 2019-04-26 | 哈工大机器人（岳阳）军民融合研究院 | Magnetic screen hall ion source and its ionization method with flow apron |
-
2016
- 2016-04-20 CN CN201620334637.9U patent/CN205645750U/en active Active
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN105826151A (en) * | 2016-04-20 | 2016-08-03 | 上海兆九光电技术有限公司 | Hall ion source |
| CN105826151B (en) * | 2016-04-20 | 2017-10-27 | 上海兆九光电技术有限公司 | Hall ion source |
| CN109686639A (en) * | 2018-12-25 | 2019-04-26 | 哈工大机器人（岳阳）军民融合研究院 | Magnetic screen hall ion source and its ionization method with flow apron |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant |