CN205594304U - Be suitable for many times mask plate group of photoetch pattern of preface for a long time of alignment - Google Patents
Be suitable for many times mask plate group of photoetch pattern of preface for a long time of alignment Download PDFInfo
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- CN205594304U CN205594304U CN201620203434.6U CN201620203434U CN205594304U CN 205594304 U CN205594304 U CN 205594304U CN 201620203434 U CN201620203434 U CN 201620203434U CN 205594304 U CN205594304 U CN 205594304U
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Abstract
The utility model provides a be suitable for many times mask plate group of photoetch pattern of preface for a long time of alignment, the mask plate includes the polylith mask plate, and the number of mask plate is m+1, and m is the alignment number of times, wherein, evenly divides a plurality of patterns district on the every mask plate, and the whole area in pattern district equals the surface area of mask plate, and the number in pattern district is m+1 at least, being provided with the light shield layer in every pattern district, having seted up the printing opacity figure on the light shield layer, the kind number of printing opacity figure is m+1, it is different just to be in the printing opacity figure of seting up in the pattern district in the same position on the every mask plate to if a m+1 printing opacity figure that is in on the mask plate on the same position is alignment preface group, alignment preface group on two arbitrary corresponding positions is different. The utility model discloses mask plate group need not to consider the processing sequence of graphic structure when carrying out a lot of alignment technology, alright obtain different sequential series arrangement modes, made things convenient for different chronogenesis process scheme, practiced thrift the quantity of mask plate simultaneously, the cost is reduced.
Description
Technical field
This utility model relates to technical field of semiconductor device preparation, particularly relates to the mask plate group of a kind of multiple timings photoengraving pattern being suitable to repeatedly alignment.
Background technology
Photoetching technique is semiconductor MOS pipe and the technology of circuit of building on a piece of smooth silicon chip, is the Micrometer-Nanometer Processing Technology of a kind of precision.
When existing photoetching process carries out repeatedly alignment, typically can be processed according to fixing processing sequence.As a example by the cross figure of three alignments, participate in four kinds of cross figures (1), (2), (3), (4) during three alignments as shown in Figure 1.Photoengraving pattern after four kinds of cross figure alignments as shown in Figure 2.As it is shown on figure 3, mask plate is divided into a, b, c, d.In technical process, the use order of general mask plate is a-b-c-d, then alignment order is (1)-(2)-(3)-(4).
But emerging MEMS micromachined requires different with original MEMS processing request, and it requires that the processing of mechanical mechanism is flexible and changeable, therefore processing sequence arbitrarily can convert according to the requirement of laboratory technician.Continuing as a example by the mask plate of above-mentioned Fig. 3, if the use order of mask plate is c-a-b-d, then alignment order is (4)-(2)-(3)-(1).Now, after (4th) plants cross graph exposure, (2nd) block cross figure can not accurately be directed at predeterminated position, (3rd) block cross figure can be made with (4th) kind or (2nd) exposed when exposure to plant cross figure overlap phenomenon, as shown in Figure 4.Thus, the processing mode of existing existence can not arbitrarily change the use order of mask plate, the figure of the mask plate i.e. reserved not malleable, causes processing sequence not malleable, and then have impact on the motility of micromachined.
Utility model content
This utility model provides the mask plate group of a kind of multiple timings photoengraving pattern being suitable to repeatedly alignment, for solving the figure not malleable of the mask plate reserved in prior art, causes processing sequence not malleable, and then the problem that have impact on the motility of micromachined.
This utility model provide a kind of multiple timings photoengraving pattern being applicable to repeatedly alignment mask plate group, including polylith mask plate, the number of mask plate be m+1, m be alignment number of times, wherein,
Being evenly dividing multiple pattern district on every piece of described mask plate, the gross area in described pattern district is equal to the surface area of mask plate, and the number in pattern district is at least m+1；
Being provided with light shield layer in each pattern district, light shield layer offers transparent figure, the kind number of transparent figure is m+1, and various types of transparent figure is set-located and forms described photoengraving pattern；
The transparent figure that on every piece of described mask plate and the pattern district that is in same position is offered is different, and sets m+1 transparent figure being on mask plate on same position as an alignment sequence group；Alignment sequence group on any two correspondence position is different.
Preferably, every piece of described mask plate is evenly dividingIndividual pattern district, m is alignment number of times.
Preferably, described mask plate at least includes four pieces.
Preferably, described transparent figure includes cross, circular or square.
Preferably, in described photoengraving pattern, the spacing of adjacent transparent figure is 5-10um.
As shown from the above technical solution, this utility model provides the mask plate group of a kind of multiple timings photoengraving pattern being suitable to repeatedly alignment, described mask plate group is when carrying out time carving technology, without considering the processing sequence of graphic structure, just the order arrangement mode of available different sequential, facilitate different sequential work flow, saved the quantity of mask plate simultaneously, reduced cost.
Accompanying drawing explanation
The structural representation of four kinds of transparent figure that Fig. 1 is used by three alignment courses of processing；
Fig. 2 is the photoengraving pattern schematic diagram in Fig. 1 after transparent figure alignment；
Fig. 3 is the mask plate design drawing in prior art with transparent figure described in Fig. 1；
Fig. 4 is mask plate exposure Fold schematic diagram in prior art；
Fig. 5 is the mask plate design drawing in this utility model embodiment with transparent figure described in Fig. 1.
Detailed description of the invention
Below in conjunction with the accompanying drawings and embodiment, detailed description of the invention of the present utility model is described in further detail.Following example are used for illustrating this utility model, but are not limited to scope of the present utility model.
This utility model embodiment provide a kind of multiple timings photoengraving pattern being applicable to repeatedly alignment mask plate group, including polylith mask plate, the number of mask plate be m+1, m be alignment number of times, wherein,
Being evenly dividing multiple pattern district on every piece of described mask plate, the gross area in described pattern district is equal to the surface area of mask plate, and the number in pattern district is at least m+1.If for the variation highlighting mask plate processing sequence, every piece of described mask plate is evenly dividingIndividual pattern district, m is alignment number of times.
Being provided with light shield layer in each pattern district, light shield layer offers transparent figure, the kind number of transparent figure is m+1, and various types of transparent figure is set-located and forms described photoengraving pattern；
The transparent figure that on every piece of described mask plate and the pattern district that is in same position is offered is different, and sets m+1 transparent figure being on mask plate on same position as an alignment sequence group；Alignment sequence group on any two correspondence position is different.
Below with described transparent figure for cross figure, described alignment number of times is 3 times, and mask plate is 4, and pattern district isAs a example by individual, the mask plate group providing above-mentioned this utility model describes in detail.At this, it should be noted that, described alignment number of times is to become final photoengraving pattern several times determined according to innermost transparent figure (such as (1st) kind cross figure of dash area in Fig. 1) alignment successively, i.e. there is several transparent figure according to innermost transparent figure periphery and is determined.
Participate in four kinds of cross figures (1), (2), (3), (4) during three alignments as shown in Figure 1.Photoengraving pattern after four kinds of cross figure alignments as shown in Figure 2.As it is shown in figure 5, mask plate is divided into A, B, C, D.On mask plate every piece described and the transparent figure offered of the pattern district that is in same position is different.Such as, cross figure (1), (2), (3), (4) it are followed successively by, it can be seen that the transparent figure that the pattern district being in same position is offered is different in the pattern district in the upper left corner of mask plate A, B, C, D.Cross figure (2), (1), (4), (3) it are followed successively by the pattern district in the upper right corner of mask plate A, B, C, D, can be seen that the transparent figure that the pattern district being in same position is offered is different, and set m+1 transparent figure being on mask plate on same correspondence position as an alignment sequence group.In Fig. 5,1. alignment sequence group is cross figure (1), (2), (3), (4), 2. alignment sequence group is cross figure (3), (2), (4), (1), and 3. alignment sequence group is cross figure (3), (4), (1), (2).Other alignment sequence groups are described the most one by one, therefore it is different to understand the alignment sequence group on any two correspondence position.
The mask plate group using said structure carries out lithography process technique, no matter four pieces of mask plates are carried out any type of use order to exchange, after the first mask plate uses, cross figure in expose on (2nd) kind cross figure and the first mask plate (1st) after more preferable second mask plate, all can be found to carry out para-position.As long as para-position one, the cross figure on other any positions all can Correct exposure.
To this end, mask plate group described in the utility model is when carrying out time carving technology, it is not necessary to consider the processing sequence of graphic structure, just the order arrangement mode of available different sequential, facilitate different sequential work flow, saved the quantity of mask plate simultaneously, reduced cost.
It should be noted that this utility model is illustrated rather than by above-described embodiment this utility model is limited, and those skilled in the art can design alternative embodiment without departing from the scope of the appended claims.In the claims, any reference marks that should not will be located between bracket is configured to limitations on claims.Word " comprises " and does not excludes the presence of the element or step not arranged in the claims.Word "a" or "an" before being positioned at element does not excludes the presence of multiple such element.This utility model by means of including the hardware of some different elements and can realize by means of properly programmed computer.If in the unit claim listing equipment for drying, several in these devices can be specifically to be embodied by same hardware branch.Word first, second and third use do not indicate that any order.Can be title by these word explanations.
One of ordinary skill in the art will appreciate that: various embodiments above only in order to the technical solution of the utility model to be described, is not intended to limit；Although this utility model being described in detail with reference to foregoing embodiments, it will be understood by those within the art that: the technical scheme described in foregoing embodiments still can be modified by it, or the most some or all of technical characteristic is carried out equivalent；And these amendments or replacement, do not make the essence of appropriate technical solution depart from this utility model claim limited range.
Claims (5)
1. the mask plate group of the multiple timings photoengraving pattern being suitable to repeatedly alignment, it is characterised in that include polylith mask plate, the number of mask plate be m+1, m be alignment number of times, wherein,
Being evenly dividing multiple pattern district on every piece of described mask plate, the gross area in described pattern district is equal to the surface area of mask plate, and the number in pattern district is at least m+1；
Being provided with light shield layer in each pattern district, light shield layer offers transparent figure, the kind number of transparent figure is m+1, and various types of transparent figure is set-located and forms described photoengraving pattern；
The transparent figure that on every piece of described mask plate and the pattern district that is in same position is offered is different, and sets m+1 transparent figure being on mask plate on same position as an alignment sequence group；Alignment sequence group on any two correspondence position is different.
Mask plate group the most according to claim 1, it is characterised in that be evenly dividing on every piece of described mask plateIndividual pattern district, m is alignment number of times.
Mask plate group the most according to claim 1 and 2, it is characterised in that described mask plate at least includes four pieces.
Mask plate group the most according to claim 1, it is characterised in that described transparent figure includes cross, circular or square.
Mask plate group the most according to claim 1, it is characterised in that in described photoengraving pattern, the spacing of adjacent transparent figure is 5-10um.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201620203434.6U CN205594304U (en) | 2016-03-16 | 2016-03-16 | Be suitable for many times mask plate group of photoetch pattern of preface for a long time of alignment |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201620203434.6U CN205594304U (en) | 2016-03-16 | 2016-03-16 | Be suitable for many times mask plate group of photoetch pattern of preface for a long time of alignment |
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|---|---|
| CN205594304U true CN205594304U (en) | 2016-09-21 |
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| Application Number | Title | Priority Date | Filing Date |
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| CN201620203434.6U Expired - Fee Related CN205594304U (en) | 2016-03-16 | 2016-03-16 | Be suitable for many times mask plate group of photoetch pattern of preface for a long time of alignment |
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN105629659A (en) * | 2016-03-16 | 2016-06-01 | 北京航空航天大学 | Mask group suitable for multi-overlay multi-time sequence photoetching pattern and fabrication method of mask group |
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2016
- 2016-03-16 CN CN201620203434.6U patent/CN205594304U/en not_active Expired - Fee Related
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN105629659A (en) * | 2016-03-16 | 2016-06-01 | 北京航空航天大学 | Mask group suitable for multi-overlay multi-time sequence photoetching pattern and fabrication method of mask group |
| CN105629659B (en) * | 2016-03-16 | 2023-08-18 | 北京航空航天大学 | Mask plate set suitable for multi-time sequence photoetching patterns for multiple overlay and manufacturing method |
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| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| CF01 | Termination of patent right due to non-payment of annual fee | ||
| CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20160921 Termination date: 20170316 |