CN205522528U - Three -dimensional forming device - Google Patents

Abstract

The utility model provides a three -dimensional forming device, including stratum basale and substrate forming mechanism, exposure mechanism, supporting mechanism and peeling means, substrate forming mechanism includes parting liquid injection apparatus and is used for holding photosensitive material's storage tank, parting liquid injection apparatus sprays parting liquid to stratum basale below surface in order to form separation type coating, the photosensitive material layer later coats, the stratum basale, separation type coating forms the substrate with photosensitive material layer shaping in proper order, the substrate is relapseed to transport in proper order to substrate forming mechanism, supporting mechanism and peeling means, control substrate forming mechanism, exposure mechanism and peeling means's the position that corresponds, can be so that three -dimensional forming device carries out the substrate shaping simultaneously, the exposure, two or three step in peeling off, the substrate shaping, expose and peel off the action and go on repeatedly simultaneously, and operation efficiency is improved, be applicable to three -dimensional physical big breadth, the high efficiency, preparation such as high accuracy and low cost requirement.

Description

A kind of three-dimensional modeling apparatus

Technical field

This utility model relates to Stereolithography technical field, particularly relates to the molding dress of a kind of three-dimensional body Put.

Background technology

Layering superposition is the main implementation of current three-dimensionally shaped technology, its principle is simple, structure reliable, Data processing method is ripe, thus is applied widely.Its superposition between layers, based on difference Physics, chemical material and method, such as, glue is bonding, hot melt lamination, laser sintered and photopolymerization Deng.Wherein light polymerization process is based on photochemical reaction principle, mechanical power and heating process, has High formed precision.

The typical material of photopolymerization is light solidifying resin, is the outstanding mixed thing of liquid of short molecular chain before its polymerization, When being irradiated by the electromagnetic radiation of specific wavelength (typical wavelengths is ultraviolet band), that adds in photosensitive resin draws Send out agent absorb radiation and discharge catalyst so that molecular resin forms long strand solid by chain reaction Polymer, thus realize three-dimensionally shaped.

Photosensitive resin is in a liquid state before curing, utilizes the flowable of liquid and Self-leveling characteristic, and its typical case becomes Type process is for using exposed mode.Exposing optical head is positioned at above resin liquid level, part bracket submergence In resin liquid.During every formable layer, the liquid layer between the end face of resin liquid surface and molded part is exposed Photocuring, then, part bracket sinks, and the end face of molded part is covered and levelling by resin, subsequently Carry out the solidification of new a layer.Concrete structure and scheme are found in the patent of Envisiontec company of Germany 200710130353.3 and United States Patent (USP) US 5,630,981 of 3D systems company of the U.S..

The major limitation of said method has 2 points, and one is that the consumption to resin is relatively big, because of its plastic part The degree of depth depending highly on resin liquid, this requires to store substantial amounts of resin in liquid bath, and these are untapped Resin is susceptible to the most photo-curing, and ingress of air is easily caused rotten simultaneously, causes unnecessary material Loss.Two is that shaping speed is relatively slow, often has bigger viscosity, the speed of its Self-leveling because of photosensitive resin Degree is slow, and the surface accuracy after levelling is difficult to control to.Use for these many later patents and strike off and Liquid level Method, including United States Patent (USP), US 5,651,934 and Chinese patent CN 204020012U, CN 201420472035.0 and CN 201520169421 etc..These methods generally use mechanical mechanism to realize, Owing to resin liquid has bigger viscosity, the speed of this kind of method is by the biggest retardance.Additionally, these Motion is easily caused the fluctuation of resin liquid level, the precision of impact exposure molding.

In order to overcome the problems referred to above, patent US 5,630,981 of 3D systems company of the U.S. also proposes Another kind of forming method of based on bottom Exposure mode.It uses transparent liquid bath (such as quartz glass), Part bracket faces down and stretches in resin liquid.During every formable layer, light source passes liquid bath base plate, at the bottom of liquid bath Liquid layer between the bottom surface of plate and molded part is exposed solidification, then new cured layer upper surface attachment And be lifted up therewith on part bracket, with stylish cured layer lower surface with separate bottom liquid bath and formed Space, resin liquid flows into and fills this void area, carries out the solidification of new a layer subsequently.

The forming method using bottom Exposure mode overcomes aforementioned 2 restrictions, have the advantage that one, The consumption of resin greatly reduces, and resin only need to cover and the coating region of packing fluid trench bottom, when needing Can supplement at any time；Two, shaping speed is significantly increased, and the surface of liquid layer to be solidified is by bottom liquid bath Restriction, there is good flatness and stability.After every layer of solidification, resin liquid is supplementary, is not based on Liquid Self-leveling under gravity, but significantly increase based on vacuum pumping, filling speed and reliability Add.

But, this bottom Exposure mode is the most defective, and major limitation has following 2 points: one, plastic zero Part can not be the heaviest, because part is hung upside down below support, its retentivity be only resin solidification after bonding attached Put forth effort.Although the buoyancy that can utilize resin liquid is solved, but this will cause the unnecessary of material again Consume；Two, it is difficult to quick between lower surface and the liquid bath base plate of cured layer and peels off reliably, stripping Resistance from action is made up of 4 aspects: gravity, the adhesive force of material interface, the damping of liquid and true Idling pressure, these resistances not only limit the speed of peeling action, it is also possible to make molded part be torn Split or depart from support.Wherein gravity can be alleviated by the buoyancy of resin liquid, the adhesive force of material interface (such as silicone oil and Teflon) can be alleviated by coating divergence type coating, but due to ultraviolet light Irradiating and contact repeatedly and stripping, the service life of these coatings is limited, be necessary for after the most several weeks into Row is changed, and the damping of liquid and negative pressure of vacuum increase rapidly along with the increase of peeling rate, it is difficult to overcome.

Paper " Rapid Manufacturing in Minutes:The Development of a Mask Projection Stereolithography Process for High-Speed Fabrication " point out, with Germany Envisiontec company is the stripping machine that a lot of 3D printing device company of representative also proposes a kind of tilting Structure so that peeling action starts from the edge of faying face and gradually extends.Can be big by this mechanism for stripping The adhesive force at width lightening material interface, the damping of liquid and the impact of negative pressure of vacuum, it can be difficult to accomplished Entirely overcoming, each typical case of its commercial type peels off and the resin liquid filling time is more than 3 seconds, therefore, The work efficiency of stripping and filling action becomes the bottleneck of whole formation system.

It addition, in above-mentioned forming method, it is layered and solidifies all to be immersed in resin liquid and complete.Add During the part of work near closed hollow ring type, unwanted resin liquid is easily made to be closed or remain in part Inside, affects the formed precision that part is final.

Therefore, industry need badly a kind of be capable of high efficiency, in high precision and save material layering molding Scheme.

Utility model content

In view of this, the utility model proposes a kind of three-dimensional modeling apparatus based on basal layer, this device Including basal layer, substrate forming mechanism, exposure mechanism, supporting mechanism and mechanism for stripping, by every layer pattern Processing procedure be divided into substrate forming, expose with peel off step, basal layer is transported to base the most successively Forming machine structure, supporting mechanism and mechanism for stripping, it is possible to achieve substrate forming, exposure, strip step depend on Secondary carry out or at least two step is carried out simultaneously, promote work efficiency and save material.

A kind of based on basal layer the three-dimensional modeling apparatus proposed according to the purpose of this utility model, including base Bottom, and:

Substrate forming mechanism, described substrate forming mechanism includes that at least one separates liquid jetting device and at least One, for holding the storage tank of sensitive material, is provided with winding up roller in described storage tank, described winding up roller is rotatable And in sensitive material described in winding up roller surface-coated, described separation liquid jetting device injection of separation liquid to described base Bottom underlying surfaces is to form divergence type coating, when described divergence type coating is positioned at described winding up roller overhead surface Being coated with described sensitive material to form photosensitive material layer, described basal layer, divergence type coating are with photosensitive The molding successively of material layer forms base material, and described base material is moved transport；

Exposure mechanism, including laser instrument and optical lens, the exposure spot of described exposure mechanism is through described Basal layer, moves scan exposure to described photosensitive material layer, it is achieved part three-dimensionally shaped；

Supporting mechanism, is positioned at the side of described exposure mechanism, is formed three-dimensionally shaped on described supporting mechanism After part；

Mechanism for stripping, including at least one scraper plate, described scraper plate is positioned at described supporting mechanism and separates with described Between liquid jetting device, in order to peel off unexposed photosensitive material layer and divergence type coating；

Preferably, described separation liquid jetting device includes for holding the collecting bottle separating liquid and for spraying Separate the drive system of liquid.

Preferably, the both sides of described supporting mechanism respectively set one group of scraper plate discharged successively, Hold and separate housing bottle and holding the storage tank of sensitive material of liquid, described basal layer in the first direction and with The second direction that first direction is contrary is transported repeatedly.

Preferably, described basal layer is circular, and the side of described supporting mechanism from the close-by examples to those far off sets gradually and scrapes Plate, holding and separate housing bottle and holding the storage tank of sensitive material of liquid, described basal layer with its center of circle is Basic point is clockwise or counterclockwise.

Preferably, described exposure mechanism also includes at least one pressing plate, is positioned at the upper surface of described base material, For keeping the uniformity of described base material.

Preferably, the bottom of described pressing plate is provided with rotatable winding up roller.

Preferably, described basal layer selects glass substrate.

Preferably, the material selection Teflon of described divergence type coating or silicone oil, thickness≤0.2 μm.

This utility model also proposes a kind of three-dimensionally shaped method based on basal layer, uses base as above In the three-dimensional modeling apparatus of basal layer, comprise the following steps:

Substrate forming: be applied above the separation liquid jetting device in basal layer transport to substrate forming mechanism Form divergence type coating, then be transported to the coated photosensitive material layer that formed of winding up roller overhead surface, described basal layer, Divergence type coating forms base material with photosensitive material layer molding successively, and described base material is moved transport to support machine Above structure, supporting mechanism contacts with described photosensitive material layer；

Exposure: exposure mechanism moves in one direction, and exposure mechanism is in scanning process, and exposure spot is worn Cross basal layer, photosensitive material layer is exposed, supporting mechanism realizes the three-dimensionally shaped of part；

Peel off: the part after three-dimensionally shaped is transported to mechanism for stripping, to peel off unexposed sensitive material Layer and divergence type coating；

Wherein, substrate forming, exposure, strip step are carried out successively or at least two step is carried out simultaneously.

Preferably, described base material is moved transport to time above supporting mechanism, and supporting mechanism uses skewed The mode of upper shifting, contacts with described photosensitive material layer.

Compared with prior art, this utility model has a following technical advantage:

(1) unexposed part photosensitive material layer and divergence type coating, directly peeled off by scraper plate, and laggard The step that row is follow-up, basal layer is transported to substrate forming mechanism, supporting mechanism and stripping machine the most successively Structure, substrate forming, exposure, strip step are carried out successively or at least two step is repeated simultaneously, work Making efficiency high, material saves, and formed precision is good.

(2) material of photosensitive material layer has bigger viscosity, meanwhile, height≤50 μm of every layer, because of The material of this photosensitive material layer is not easy to trickling and drippage, thus spatial arrangement has sufficient motility, Both exposed layout can have been used, it is possible to use bottom exposure layout.

(3) peeling action of mechanism for stripping is carried out in atmosphere, and the damping of liquid and vacuum can be avoided to bear The resistance that pressure causes, speed and the reliability of peeling action are substantially improved.

(4) by adjusting the movement of basal layer or velocity of rotation, can adjust exposure be molded into separation time Between poor, be conducive to realizing good balance at abundant curing molding with between being easily isolated.

(5) also including divergence type coating between basal layer and photosensitive material layer, divergence type coating can make to have exposed The photosensitive material layer of light is easily isolated with basal layer, and makes photosensitive material layer be securely attached to part On moulding section or supporting mechanism.

(6) bottom of pressing plate is provided with rotatable winding up roller, can reduce friction and make substrate surface Uniformly, scuffing or the stretcher strain of substrate surface are reduced.

Accompanying drawing explanation

In order to be illustrated more clearly that this utility model embodiment or technical scheme of the prior art, below will The accompanying drawing used required in embodiment or description of the prior art is briefly described, it should be apparent that, Accompanying drawing in describing below is only embodiments more of the present utility model, for ordinary skill people From the point of view of Yuan, on the premise of not paying creative work, it is also possible to obtain the attached of other according to these accompanying drawings Figure.

Fig. 1 is the structural representation of base material in this utility model

Fig. 2 is the structural representation of three-dimensional modeling apparatus based on basal layer in this utility model embodiment one

Fig. 3 is the structural representation of three-dimensional modeling apparatus based on basal layer in this utility model embodiment two

Detailed description of the invention

As described in the background art, in existing three-dimensionally shaped technology, being layered and solidifying is all to be immersed in tree Fat liquid completes, when processing the part of near closed hollow ring type, easily makes unwanted resin liquid be sealed Close or remain in inside parts, affecting the formed precision that part is final, method the most of the prior art More waste material, and efficiency is low.

Therefore, the utility model proposes a kind of be capable of high efficiency, in high precision, save material three-dimensional Shaped device and method.

Below, concrete technical scheme of the present utility model will be described in detail.

Three-dimensional modeling apparatus based on basal layer in this utility model, becomes including basal layer 1 and base material Type mechanism, exposure mechanism, supporting mechanism and mechanism for stripping, basal layer is transported to base material the most successively Type mechanism, supporting mechanism and exposure mechanism and mechanism for stripping, wherein, basal layer 1 preferably employs glass base Plate, has preferably hardness, will not deform.

Substrate forming mechanism, separates liquid jetting device including at least one and at least one is photosensitive for holding The storage tank 2 of material, separates liquid jetting device and includes for holding the collecting bottle 3 separating liquid and for spraying Separating the drive system of liquid, this drive system controls to separate when liquid sprays, and separates liquid sprayable to substrate Layer underlying surfaces, to form divergence type coating 4, is contained with sensitive material in storage tank 2, sets simultaneously inside it Have winding up roller 5, winding up roller 5 rotatable and in winding up roller 5 surface-coated sensitive material, when divergence type coating 4 When winding up roller 5 overhead surface, it is photosensitive to be formed that the lower surface of divergence type coating 4 is coated with sensitive material Material layer 6, basal layer 1, divergence type coating 4 form base material, base material with photosensitive material layer 6 molding successively Transported by mobile, refer to Fig. 1, be the structural representation of base material, base material include top basal layer 1, Middle divergence type coating 4 and the photosensitive material layer 6 of bottom, the material selection Teflon of divergence type coating 4 Or silicone oil, coating layer thickness generally≤0.2 μm, it has good transmitance to the ultraviolet light of 405nm. The material of photosensitive material layer 6 has bigger viscosity, meanwhile, height≤50 μm of its every layer coating, because of This photosensitive material layer 6 is not easy to trickling and drippage, and spatial arrangement has sufficient motility.Divergence type is coated with Layer 4 can make the follow-up photosensitive material layer 6 exposed be easily isolated with basal layer 1, and makes sensitive material Layer 6 is securely attached on molded part or the supporting mechanism of part.

Exposure mechanism, exposure mechanism motion scan, its exposure spot passes basal layer 1, to photosensitive material layer 6 move scan exposure, it is achieved part three-dimensionally shaped, and exposure mechanism can use the mode of flight exposure, Height can be used referring specifically to the Exposure mode in patent CN 201210076397.3 of applicant's earlier application The spatial light modulator that speed refreshes, is exposed photosensitive material layer 6, it is achieved figure three-dimensionally shaped； Exposure mechanism also can be selected for the exposure system that this area is common, including laser instrument 7 and optical lens, optics Camera lens includes scanning galvanometer 8 and field mirror 9, wherein, the purple that laser instrument 7 uses wavelength to be 405nm Ray laser diode or LED, this wavelength is in the edge of visible light wave range, in this utility model Basal layer has good transmitance.

Supporting mechanism, i.e. part bracket 10, use aluminum material, be positioned at the relative exposure mechanism of base material Opposite side, is used for supporting base material, can be formed on supporting mechanism three-dimensionally shaped after part.

Mechanism for stripping, including at least one scraper plate 11, scraper plate 11 is positioned at supporting mechanism, and injection fills with separating liquid Between putting, in order to peel off unexposed photosensitive material layer 6 and divergence type coating 4.

Refer to Fig. 2, be the structure of three-dimensional modeling apparatus based on basal layer in this utility model embodiment one Schematic diagram, the both sides of supporting mechanism respectively set one group of scraper plate discharged successively 11, hold point The housing bottle 3 and hold the storage tank 2 of sensitive material of chaotropic, three-dimensionally shaped step is as follows:

(1) substrate forming: basal layer 1 transports and is coated with above the collecting bottle 3 holding separation liquid in left side Covering formation divergence type coating 4, basal layer 1 transports to the left with divergence type coating 4 afterwards, photosensitive to holding The top of the storage tank 2 of material, winding up roller 5 rotates, and sensitive material is coated on divergence type coating 4 times Surface forms photosensitive material layer 6, and thus, basal layer 1, divergence type coating 4 are with photosensitive material layer 6 successively Molding forms base material；

(2) above-mentioned base material right direction transport, now, the scraper plate 11 on the left of supporting mechanism does not works, left Side holds the collecting bottle 3 the most not injection of separation liquid separating liquid, and base material is moved transport to supporting mechanism upper Side, supporting mechanism contacts with photosensitive material layer 6, supporting mechanism can by employing skewed upper shifting in the way of, Contacting with photosensitive material layer 6, Sloped rotating is centrally located at the top layer of photosensitive material layer 6, pure to realize Roller contacts, and avoids horizontal force, thus, can reduce contact force and be beneficial to get rid of air, Improve three-dimensionally shaped efficiency and quality；

(3) exposure: exposure mechanism moves along the direction shown in Fig. 2, exposure mechanism in scanning process, Exposure spot pass basal layer 1, photosensitive material layer 6 is exposed, exposure area gradually by line (or Arrowband) it is accumulated as face, it is achieved and the solidification to this layer of assignment graph generates, and obtains required part, at part The three-dimensionally shaped of figure is realized on bracket 10；Exposure mechanism may also include at least one pressing plate 12, and preferably two Individual, pressing plate 12 is positioned at the foot in exposure mechanism, and the upper surface at base material moves, and is used for keeping base material Thickness evenness, and exposure spot is projeced between two pressing plates 12, it can be ensured that exposure mechanism accurate Focusing on, the bottom of pressing plate 12 is provided with rotatable winding up roller, can reduce and friction between base material, and Even tension is made to be distributed in whole base material, to reduce scuffing or the stretcher strain of substrate surface；

(4) peel off: the part after three-dimensionally shaped is transported to mechanism for stripping, and the scraper plate 11 in mechanism for stripping can Peel off unexposed photosensitive material layer 6 and divergence type coating 4, only retain basal layer 1；

(5) basal layer 1 continues right direction conveying, and that places on the right side of supporting mechanism holds separation liquid Collecting bottle 3, be covered with divergence type coating 4 to be coated with, then be delivered to the right hold the storage tank 2 of sensitive material, To form photosensitive material layer 6, after forming base material, base material left direction again moves conveying, now, supports machine Scraper plate 11 on the right side of structure does not works, and right side holds the collecting bottle 3 the most not injection of separation liquid separating liquid, base material Again moved to transport and be exposed to the top of supporting mechanism, now scraper plate 11 on the left of supporting mechanism and The collecting bottle 3 holding separation liquid is started working；

Afterwards, the step of above-mentioned (1)-(5) is repeated, finally, completes three-dimensional based on basal layer Molding, obtains corresponding part, by adjusting the translational speed of basal layer, can adjust exposure and be molded into The time difference separated, is conducive to realizing good balance at abundant curing molding with between being easily isolated.

Preferably, control substrate forming mechanism, exposure mechanism and the correspondence position of mechanism for stripping, can make Three-dimensional modeling apparatus carry out simultaneously substrate forming, expose, peels off in two or three steps, as ought When proceeding to strip step, exposure mechanism is exposed step to the base material of corresponding position simultaneously, now, Shaping mechanism carries out substrate forming step to the base material of corresponding position simultaneously, and such basal layer 1 depends on repeatedly Secondary substrate forming mechanism, supporting mechanism and the mechanism for stripping of being transported to, substrate forming, exposure and peeling action It is repeated simultaneously, thus, improves work efficiency.

Refer to Fig. 3, be the structure of three-dimensional modeling apparatus based on basal layer in this utility model embodiment two Schematic diagram, basal layer 1 is circular, and the side of supporting mechanism from the close-by examples to those far off sets gradually scraper plate 11, separates Liquid jetting device and hold the storage tank 2 of sensitive material, basal layer rotates with its center of circle counterclockwise for basic point, Three-dimensionally shaped step is as follows:

(1) substrate forming: basal layer 1 transports to holding coated above the collecting bottle 3 separating liquid formation Divergence type coating 4, basal layer 1 rotates with its center of circle counterclockwise for basic point afterwards, until divergence type coating 4 Follow basal layer 1 and rotate the top to the storage tank 2 holding sensitive material, divergence type coating 4 times In surface-coated, sensitive material is to form photosensitive material layer 6, thus, basal layer 1, divergence type coating 4 with Photosensitive material layer 6 molding successively forms base material；

(2) above-mentioned base material continues along rotating counterclockwise, until base material rotates the top to supporting mechanism, Support mechanism contacts with photosensitive material layer 6, and supporting mechanism can be in the way of using skewed upper shifting, with photosensitive Material layer 6 contacts, and Sloped rotating is centrally located at the top layer of photosensitive material layer 6, to realize pure rolling formula Contact, and avoid horizontal force, thus, contact force can be reduced and be beneficial to get rid of air, improving Three-dimensionally shaped efficiency and quality；

(3) exposure: exposure mechanism moves along the direction shown in Fig. 3, exposure mechanism in scanning process, Exposure spot pass basal layer 1, photosensitive material layer 6 is exposed, exposure area gradually by line (or Arrowband) it is accumulated as face, it is achieved and the solidification to this layer of assignment graph generates, and obtains required part, at part The three-dimensionally shaped of figure is realized on bracket 10；Exposure mechanism may also include at least one pressing plate 12, and preferably two Individual, pressing plate 12 is positioned at the foot in exposure mechanism, and the upper surface at base material moves, and is used for keeping base material Thickness evenness, and exposure spot is projeced between two pressing plates 12, it can be ensured that exposure mechanism accurate Focusing on, the bottom of pressing plate 12 is provided with rotatable winding up roller, can reduce and friction between base material, and Even tension is made to be distributed in whole base material, to reduce scuffing or the stretcher strain of substrate surface；

(4) peel off: the part after three-dimensionally shaped is transported to mechanism for stripping, and the scraper plate 11 in mechanism for stripping can Peel off unexposed photosensitive material layer 6 and divergence type coating 4, only retain basal layer 1；

(5) basal layer 1 continues, along rotating counterclockwise, the step of above-mentioned (1)-(4) to be repeated, Eventually, complete based on basal layer three-dimensionally shaped, obtain corresponding part, by adjusting the rotation of basal layer Speed, can adjust exposure and be molded into the time difference of separation, is conducive at abundant curing molding and is prone to point Good balance is realized between from.

Preferably, control substrate forming mechanism, exposure mechanism and the correspondence position of mechanism for stripping, can make Three-dimensional modeling apparatus carry out simultaneously substrate forming, expose, peels off in two or three steps, as ought When proceeding to strip step, exposure mechanism is exposed step to the base material of corresponding position simultaneously, now, Shaping mechanism carries out substrate forming step to the base material of corresponding position simultaneously, thus, improves work effect Rate.

It should be appreciated that in the present embodiment two, circular basal layer 1 rotates in the counterclockwise direction, with Carry out corresponding substrate forming, exposure, strip step, the most in other embodiments, substrate forming machine Structure, exposure mechanism, mechanism for stripping can also be distributed along clockwise direction, and now, basal layer 1 can edge It is rotated clockwise, to carry out corresponding substrate forming, exposure, strip step, concrete three-dimensional one-tenth Type step is similar with the step in embodiment two, the most no longer repeats.

Three-dimensional modeling apparatus based on film substrate in this utility model and method, be mainly applied to figure The precision three-dimensional forming field of shape dimensional thickness≤50 μm, the height≤50um of every layer pattern during molding. The depth of focus of exposure mechanism is less, generally≤50 μm, and exposure light field focuses primarily upon in current layer, so, It is more conducive to layering exposure, separation, by adjusting the surface being located proximate to photosensitive material layer 6 of focal plane, The molded part that can make this layer of photosensitive material layer 6 and part is combined closely, and is prone to and basal layer 1 Separate.

In this utility model, because the material of photosensitive material layer 6 has bigger viscosity, meanwhile, every layer Height≤50 μm, therefore the material of photosensitive material layer 6 is not easy to trickling and drippage, thus spatial arrangement There is sufficient motility, be not limited to use the exposure layout on top, it is possible to use bottom exposure layout Mode, will be placed in the top of basal layer 1 and exposure mechanism by part bracket 10, part bracket 10 down, Hanging upside down part in the lower section of part bracket 10, retentivity is the bonding adhesive force after part curing molding.

Three-dimensional modeling apparatus based on basal layer in this utility model, becomes including basal layer 1 and base material Type mechanism, exposure mechanism, supporting mechanism and mechanism for stripping, control substrate forming mechanism, exposure mechanism with The correspondence position of mechanism for stripping, so that three-dimensional modeling apparatus carries out substrate forming, exposes, shells simultaneously Two or three steps in from, as when proceeding to strip step, exposure mechanism is to corresponding position Base material is exposed step simultaneously, and now, shaping mechanism carries out base material to the base material of corresponding position simultaneously Forming step, such basal layer is transported to substrate forming mechanism, supporting mechanism and mechanism for stripping the most successively, Substrate forming, exposure are repeated with peeling action simultaneously, improve work efficiency, it is adaptable to three-dimensional real The large format of body, high efficiency, high accuracy and low cost etc. make requirement.

It is obvious to a person skilled in the art that this utility model is not limited to above-mentioned one exemplary embodiment Details, and in the case of without departing substantially from spirit or essential attributes of the present utility model, it is possible to other Concrete form realizes this utility model.Which point therefore, no matter from the point of view of, embodiment all should be regarded as Exemplary, and be nonrestrictive, scope of the present utility model by claims rather than on State bright restriction, it is intended that all changes that will fall in the implication of equivalency and scope of claim Change and include in this utility model.Any reference in claim should be considered as restriction involved Claim.

Moreover, it will be appreciated that although this specification is been described by according to embodiment, but the most each reality Mode of executing only comprises an independent technical scheme, and this narrating mode of description is only for understand Seeing, those skilled in the art should be using description as an entirety, and the technical scheme in each embodiment is also Other embodiments that it will be appreciated by those skilled in the art that can be formed through appropriately combined.

Claims (8)

1. a three-dimensional modeling apparatus, it is characterised in that include basal layer, and:

Substrate forming mechanism, described substrate forming mechanism includes that at least one separates liquid jetting device and at least one is for holding the storage tank of sensitive material, described storage tank is provided with winding up roller, described winding up roller is rotatable and in sensitive material described in winding up roller surface-coated, described separation liquid jetting device injection of separation liquid extremely described basal layer underlying surfaces is to form divergence type coating, described divergence type coating is coated with described sensitive material to form photosensitive material layer when being positioned at described winding up roller overhead surface, described basal layer, divergence type coating forms base material with photosensitive material layer molding successively, described base material is moved transport；

Exposure mechanism, including laser instrument and optical lens, the exposure spot of described exposure mechanism passes described basal layer, and described photosensitive material layer is moved scan exposure, it is achieved part three-dimensionally shaped；

Supporting mechanism, is positioned at the side of described exposure mechanism, described supporting mechanism is formed three-dimensionally shaped after part；

Mechanism for stripping, including at least one scraper plate, described scraper plate separates between liquid jetting device at described supporting mechanism with described, in order to peel off unexposed photosensitive material layer and divergence type coating.

2. a kind of three-dimensional modeling apparatus as claimed in claim 1, it is characterised in that: described separation liquid jetting device includes the collecting bottle for holding separation liquid and the drive system for injection of separation liquid.

3. a kind of three-dimensional modeling apparatus as claimed in claim 2, it is characterized in that: the both sides of described supporting mechanism respectively set one group of scraper plate discharged successively, hold the collecting bottle separating liquid and the storage tank holding sensitive material, and described basal layer is in the first direction and the second direction contrary with first direction is transported repeatedly.

4. a kind of three-dimensional modeling apparatus as claimed in claim 2, it is characterized in that: described basal layer is circle, the side of described supporting mechanism from the close-by examples to those far off sets gradually scraper plate, holds the collecting bottle separating liquid and the storage tank holding sensitive material, and described basal layer is with its center of circle for basic point clockwise or counterclockwise.

5. a kind of three-dimensional modeling apparatus as claimed in claim 1, it is characterised in that: described exposure mechanism also includes at least one pressing plate, is positioned at the upper surface of described base material, for keeping the uniformity of described base material.

6. a kind of three-dimensional modeling apparatus as claimed in claim 5, it is characterised in that: the bottom of described pressing plate is provided with rotatable winding up roller.

7. a kind of three-dimensional modeling apparatus as claimed in claim 1, it is characterised in that: described basal layer selects glass substrate.

8. a kind of three-dimensional modeling apparatus as claimed in claim 1, it is characterised in that: the material selection Teflon of described divergence type coating or silicone oil, thickness≤0.2 μm.