CN205520069U - Optical element laser pretreatment systems - Google Patents
Optical element laser pretreatment systems Download PDFInfo
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- CN205520069U CN205520069U CN201620345442.4U CN201620345442U CN205520069U CN 205520069 U CN205520069 U CN 205520069U CN 201620345442 U CN201620345442 U CN 201620345442U CN 205520069 U CN205520069 U CN 205520069U
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Abstract
The embodiment of the utility model provides an optical element laser pretreatment systems belongs to optical material laser preliminary treatment field. Optical element laser pretreatment systems includes the light source device, analyser and reflect meter, and pending sample setting is in the analyser reaches among the smooth propagation path between the reflect meter. The preliminary treatment laser beam of the light source device output incides the analyser sees through the preliminary treatment laser beam incident of analyser extremely pending sample predetermine processing point, see through the preliminary treatment laser beam warp of pending sample incide extremely once more after the reflect meter reflection pending sample predetermine processing point, see through the preliminary treatment laser beam warp of pending sample the analyser outgoing. The embodiment of the utility model provides an optical element laser pretreatment systems has improved optical element's laser preliminary treatment efficiency effectively, has reduced the cost of optical element laser preliminary treatment.
Description
Technical field
This utility model relates to optical material laser pre-treated field, in particular to one
Optical element laser pre-treated system.
Background technology
In order to improve the damage from laser performance of optical element, generally before element is added, with low
Laser energy in damage threshold carries out laser pre-treated to territory, element transparent zone, i.e. uses laser light
Bundle carries out irradiation to optical element.By laser pre-treated, element damage threshold value is the highest to be promoted
1 to 2 times, the most significantly damage performance promotes and has for the application of optical element
Significance, at present, laser pre-treated become high power laser system optical element added before
Steps necessary.
In preprocessing process, the fluence of laser pulse needs to be gradually increased from low to high, with
Avoid the damage from laser that element is likely to occur.The key parameter affecting laser pre-treated effect has:
Under initial fluence, fluence increasing degree, each flux irradiation to element send out time,
The highest fluence.Numerous studies show, fluence amplification (energy step) is the least, first
Part is illuminated sends out that time (pass) fluence the most, maximum is the highest (does not occur the premise of damage
Under), pretreating effect is the best.So, for the pretreating effect obtained, need to use
The least energy step carries out the irradiation of multiple time to element.And the element in laser system
Bore, up to hundreds of millimeter, will process a block element, and needing sending out of irradiation time is considerable
's.So many irradiation is sent out and time is not only taken time and effort, and the consumption for laser instrument also can make operation
Cost increases.
Utility model content
In consideration of it, the purpose of this utility model is to provide a kind of optical element laser pre-treated system
System, to improve the problems referred to above.
To achieve these goals, the technical scheme that this utility model embodiment uses is as follows:
First aspect, this utility model embodiment provides a kind of optical element laser pre-treated system
System, including light supply apparatus, analyzer and reflection unit, pending sample is arranged on described analyzing
In propagation path of light between device and described reflection unit.The pretreatment of described light supply apparatus output
Laser beam incides described analyzer, and the pretreatment laser beam through described analyzer is incident
To the default process points of described pending sample, through the pretreatment laser of described pending sample
Light beam is again incident on the default process of described pending sample after described reflection unit reflects
Point, through the pretreatment laser beam of described pending sample through described analyzer outgoing.
In conjunction with first aspect, this utility model additionally provides the first possible enforcement of first aspect
Mode, wherein, described optical element laser pre-treated system also includes polarization rotator, described
Polarization rotator is arranged between described analyzer and described pending sample.Described polarization rotates
Device for the polarization state of pretreatment laser beam that will inject every time in line polarized light and circular polarization
Change between light, until incided the pretreatment laser of described analyzer by described polarization rotator
The polarization direction of light beam is parallel with the direction that thoroughly shakes of described analyzer.
In conjunction with the first possible embodiment of first aspect or first aspect, this utility model is also
Providing the possible embodiment of the second of first aspect, wherein, described optical element laser is pre-
Processing system also includes the translation stage of the position for regulating described pending sample, described in wait to locate
Reason sample is arranged on described translation stage.
In conjunction with the possible embodiment of the second of first aspect, this utility model additionally provides first
Aspect the third may embodiment, wherein, the regulation step-length of described translation stage less than or etc.
Preset multiple in the pretreatment laser spot diameter inciding pending sample.
In conjunction with the third possible embodiment of first aspect, this utility model additionally provides first
The possible embodiment of the 4th kind of aspect, wherein, described preset multiple is
In conjunction with the possible embodiment of the second of first aspect, this utility model additionally provides first
The possible embodiment of the 5th kind of aspect, wherein, described translation stage is two dimension motorized precision translation stage.
In conjunction with first aspect, this utility model additionally provides the 6th kind of possible enforcement of first aspect
Mode, wherein, described light supply apparatus includes that laser instrument and optical collimator, described laser instrument send
Pretreatment laser beam through described optical collimator collimate after incide described analyzer.
In conjunction with first aspect, this utility model additionally provides the 7th kind of possible enforcement of first aspect
Mode, wherein, described optical element laser pre-treated system also includes polarization rotator, described
Polarization rotator is arranged between described pending sample and described reflection unit, described polarization rotation
The polarization state turning the device pretreatment laser beam for will inject every time is inclined with circle at line polarized light
Shake and change between light, until being incided presetting of described pending sample by described polarization rotator
The polarization direction of the pretreatment laser beam of process points is parallel with the direction that thoroughly shakes of described analyzer.
In conjunction with first aspect, this utility model additionally provides the 8th kind of possible enforcement of first aspect
Mode, wherein, described reflection unit is laser high reflective mirror.
In conjunction with first aspect, this utility model additionally provides the 9th kind of possible enforcement of first aspect
Mode, wherein, described optical element laser pre-treated system also includes laser beam absorption plant,
Described laser beam absorption plant is arranged at the one of the close described light supply apparatus of described analyzer
Side.
The optical element laser pre-treated system that this utility model embodiment provides is examined by design
Device and reflection unit partially so that pretreatment laser beam transmits twice pending sample, each time
All pending sample front first preset process points, pending sample through during pending sample
The second of the product back side presets process points and pending sample interior corresponding first is preset and processed
Point and second is preset the region of pretreatment laser beam process between process points and is carried out laser and locate in advance
Reason, is effectively improved the laser pre-treated efficiency of optical element, reduces optical element laser
The cost of pretreatment.Additionally, this utility model embodiment is on analyzer and the basis of reflection unit
On be also additionally arranged polarization rotator so that pretreatment laser beam four times through pending sample,
Further increase the laser pre-treated efficiency of optical element.
Other feature and advantage of the present utility model will illustrate in description subsequently, and, portion
Ground is divided to become apparent from description, or by enforcement this utility model embodiment
Solve.The purpose of this utility model and other advantages can be by the description write, claim
Structure specifically noted in book and accompanying drawing realizes and obtains.
Accompanying drawing explanation
In order to be illustrated more clearly that this utility model embodiment or technical scheme of the prior art,
The accompanying drawing used required in embodiment will be briefly described below, it should be apparent that under,
Accompanying drawing during face describes is only embodiments more of the present utility model, skill common for this area
From the point of view of art personnel, on the premise of not paying creative work, it is also possible to obtain according to these accompanying drawings
Obtain other accompanying drawing.Shown in accompanying drawing, above and other purpose of the present utility model, feature
To become apparent from advantage.The part that reference instruction identical in whole accompanying drawings is identical.
The most deliberately draw accompanying drawing by actual size equal proportion scaling, it is preferred that emphasis is this utility model is shown
Purport.
Fig. 1 shows a kind of optical element laser pre-treated that this utility model embodiment provides
The structural representation of system；
Fig. 2 shows that the another kind of optical element laser that this utility model embodiment provides is located in advance
The structural representation of reason system；
Fig. 3 shows that the third optical element laser that this utility model embodiment provides is located in advance
The structural representation of reason system；
Fig. 4 shows that pretreatment laser facula that this utility model embodiment provides is pending
The arrangement schematic diagram in sample front.
Wherein, reference is respectively as follows:
Light supply apparatus 101；Analyzer 102；Pending sample 103；Pending sample front
1031；The pending sample back side 1032；Reflection unit 104；Polarization rotator 105.
Detailed description of the invention
For making the purpose of this utility model embodiment, technical scheme and advantage clearer, below
The accompanying drawing in this utility model embodiment will be combined, to the technical side in this utility model embodiment
Case is clearly and completely described, it is clear that described embodiment is this utility model one
Divide embodiment rather than whole embodiments.Generally herein described in accompanying drawing and the basis that illustrates
The assembly of utility model embodiment can be arranged with various different configurations and design.
Therefore, below to the detailed description of the embodiment of the present utility model provided in the accompanying drawings also
It is not intended to be limiting claimed scope of the present utility model, but is merely representative of this utility model
Selected embodiment.Based on the embodiment in this utility model, those of ordinary skill in the art exist
Do not make the every other embodiment obtained under creative work premise, broadly fall into this practicality
Novel protected scope.
It should also be noted that similar label and letter expression similar terms in following accompanying drawing, therefore,
The most a certain Xiang Yi accompanying drawing is defined, then need not it is carried out in accompanying drawing subsequently
Definition and explanation further.
In description of the present utility model, it should be noted that term " on ", D score, " interior ",
Orientation or the position relationship of the instruction such as " outward ", " front ", " back side " are based on shown in the drawings
Orientation or position relationship, or the orientation usually put or position when this utility model product uses
Put relation, be for only for ease of description this utility model and simplify description rather than instruction or dark
Show that device or the element of indication must have specific orientation, with specific azimuth configuration and behaviour
Make, therefore it is not intended that to restriction of the present utility model.Term " first ", " second ",
" the 3rd " etc. are only used for distinguishing and describe, and it is not intended that indicate or hint relative importance.
Additionally, term " parallel " is not offered as requiring parts abswolute level, but can be slightly tilted.
In description of the present utility model, in addition it is also necessary to explanation, unless otherwise clear and definite regulation
And restriction, term " is arranged ", " installation ", " being connected ", " connection " should be interpreted broadly, example
As, can be fixing connection, it is also possible to be to removably connect, or be integrally connected；Can be
It is mechanically connected, it is also possible to be electrical connection；Can be to be joined directly together, it is also possible to pass through intermediary
It is indirectly connected to, can be the connection of two element internals.For those of ordinary skill in the art
For, above-mentioned term concrete meaning in this utility model can be understood with concrete condition.
In preprocessing process, the fluence of laser pulse needs to be gradually increased from low to high, with
Avoid the damage from laser that element is likely to occur.For the pretreating effect obtained, need to use up
Element may be carried out little energy step multiple secondary irradiation.And the element mouth in laser system
Footpath, up to hundreds of millimeter, will process a block element, and needing sending out of irradiation time is appreciable.
So many irradiation is sent out and time is not only taken time and effort, and the consumption for laser instrument also can make operating cost
Increase.In consideration of it, this utility model embodiment provides a kind of optical element laser pre-treated system
System, is effectively improved the efficiency of optical element laser pre-treated.
As it is shown in figure 1, the optical element laser pre-treated system that this utility model embodiment provides
Including: light supply apparatus 101, analyzer 102 and reflection unit 104.Light supply apparatus 101,
Analyzer 102 and reflection unit 104 set gradually.Wherein, light supply apparatus 101 is used for sending
Pretreatment laser beam, in this utility model embodiment, described light supply apparatus 101 swashs for pulse
Radiant.
The pretreatment laser beam that light supply apparatus 101 sends incides analyzer 102, regulation inspection
The direction that thoroughly shakes of device 102 partially so that through the light intensity of the pretreatment laser beam of analyzer 102
Reach preset value.Wherein said preset value can carry out laser according to this pending sample 103
Fluence required for pretreatment is arranged.Pending sample 103 is arranged on analyzer 102
And in the propagation path of light between reflection unit 104.
Regulate the position of pending sample 103 so that through the pretreatment laser of analyzer 102
What light beam was incident to pending sample front 1031 first presets process points, through pending sample
Second process points outgoing is preset from the pending sample back side 1032 after product 103.After outgoing
Pretreatment laser beam is again incident on the pending sample back side after being reflected device 104 reflection
The second of 1032 presets process points, through after pending sample 103 from pending sample front
The first of 1031 presets process points outgoing, and the pretreatment laser beam after outgoing passes through analyzer
102 outgoing.Hereafter, regulate the position of pending sample 103 and that LASER Light Source sends is pre-
Process the energy of laser beam, it is possible to complete the laser of whole pending sample 103 is located in advance
Reason.
The optical element laser pre-treated system that this utility model embodiment provides is examined by design
Device 102 and reflection unit 104 partially so that pretreatment laser beam transmits twice pending sample
103, each time through pending sample 103 time all to pending sample front 1031 first
Preset process points, the second of the pending sample back side 1032 preset process points and pending sample
Product 103 internal corresponding first are preset process points and second and are preset pretreatment between process points and swash
The region of light light beam process carries out laser pre-treated, and the laser being effectively improved optical element is pre-
Treatment effeciency, has saved the time that optical element carries out laser pre-treated, reduces light simultaneously
Learn the cost of element laser pre-treated.
Locate in advance as in figure 2 it is shown, this utility model embodiment provides another kind of optical element laser
Reason system.Set up on the basis of light supply apparatus 101, analyzer 102 and reflection unit 104
Polarization rotator 105.As in figure 2 it is shown, polarization rotator 105 is arranged on analyzer 102
And between pending sample 103.Described polarization rotator 105 is for the pre-place that will inject every time
Reason laser beam polarization state change between line polarized light and circularly polarized light, until by described partially
The rotator 105 that shakes incide the polarization direction of the pretreatment laser beam of described analyzer 102 with
The direction that thoroughly shakes of described analyzer 102 is parallel.Preferably, polarization rotator 105 is 45 degree
Polarization rotator 105.
Such as, the polarization state of the pretreatment laser that light supply apparatus 101 sends is p-polarization, and inspection
Device 102 partially is to p light full impregnated.The p light transmission analyzer 102 that light supply apparatus 101 sends is incident
To polarization rotator 105, it is incident to wait to locate after polarization rotator 105 is converted into circularly polarized light
Reason sample front 1031 first preset process points, through after pending sample 103 from treating
The second of the reason sample back side 1032 presets process points outgoing.Pretreatment laser beam after outgoing
It is reflected device 104 to reflex to the second of the pending sample back side 1032 and preset process points, thoroughly
First process points outgoing is preset from pending sample front 1031 after crossing pending sample 103.
Pretreatment laser beam after outgoing incides polarization rotator 105, through polarization rotator 105
Incide analyzer 102 after being converted into s light, analyzer 102 by incident s luminous reflectance to inclined
Shake rotator 105.The s light inciding polarization rotator 105 converts through polarization rotator 105
Preset process points for inciding the first of pending sample front 1031 after circularly polarized light, pass through
Second process points outgoing is preset from the pending sample back side 1032 after pending sample 103.
Pretreatment laser beam after outgoing is again reflected device 104 and reflexes to the pending sample back of the body
The second of face 1032 presets process points, through after pending sample 103 from pending sample just
The first of face 1031 presets process points outgoing.Pretreatment laser beam after outgoing incides partially
Shake rotator 105, through analyzer 102 outgoing after polarization rotator 105 is converted into p light.
Hereafter, regulate the position of pending sample 103 and pretreatment that LASER Light Source sends swashs
The energy of light light beam, it is possible to complete the laser pre-treated to whole pending sample 103.
It should be noted that pending sample 103 mostly is the optical element of plating anti-reflection film, plating increases
The transmitance of the optical element of permeable membrane > 99%, pretreatment laser beam passes through pending sample four times
After product 103, intensity is the 96% of initial beam intensity, decays the least.Therefore, for plated film unit
For part, when carrying out laser pre-treated with device described in this patent, can ignore to come transmission back and draw
The change of the laser intensity risen.
Additionally, reflection unit 104 can be completely reflecting mirror or reflecting prism.In order to reduce pre-place
Reason laser beam four times is by the decay in pending sample, this utility model embodiment
In, reflection unit 104 is preferably laser high reflective mirror.
Such as, during laser pre-treated, the energy step of pretreatment laser beam has 10,
With a laser flux by pending 100 pretreatment laser arteries and veins of time needs of sample 103 irradiation
Punching, each energy step irradiation 4 times, use existing laser pre-treated method to need the most altogether
4000 pretreatment laser pulses.The optical element provided due to this utility model embodiment swashs
In light pretreatment system, the pretreatment laser pulse of a default flux can be with 4 times through waiting to locate
Reason sample 103, completes 4 irradiation of the current preset process points of pending sample 103.Cause
This, identical at pending sample 103, energy number of steps is identical, the spoke of each energy step
According to number of times identical under conditions of, this utility model embodiment provide optical element laser pre-treated
System has only to 1000 pretreatment laser pulses and i.e. can complete this pending sample 103
Laser pre-treated.
Therefore, this utility model embodiment changes pretreatment laser light by polarization rotator 105
The polarization state of bundle, coordinates polarization rotator 105 with analyzer 102 and reflection unit 104 and makes
With so that the pretreatment laser beam that light supply apparatus 101 sends passes through pending sample four times
103, further increase the laser pre-treated efficiency of optical element, save laser pre-treated
Time.Meanwhile, pretreatment laser required during considerably reducing laser pre-treated
Pulse number, reduce further the cost of optical element laser pre-treated.
Certainly, except above-mentioned, polarization rotator 105 is arranged on analyzer 102 and pending sample
Beyond mode between product 103, as shown in Figure 3, it is also possible to polarization rotator 105 is arranged
Between pending sample 103 and reflection unit 104.It should be noted that this utility model
In embodiment, it is preferably and polarization rotator 105 is arranged on analyzer 102 and pending sample
Between 103.
Further, during pending sample 103 is carried out laser pre-treated, in order to
User is facilitated to regulate the position of pending sample 103, the optics that this utility model embodiment provides
Element laser pre-treated system also includes translation stage, for regulating the position of pending sample 103
Put.Pending sample 103 is arranged on described translation stage.Wherein, translation stage can be manual
Regulation translation stage, it is also possible to motorized precision translation stage.In this utility model embodiment, translation stage is preferred
For two dimension motorized precision translation stage.
It should be noted that owing to the response time of motorized precision translation stage motor can be far above light source
The persistent period of the pretreatment laser pulse that device 101 sends.Therefore, this utility model is utilized
The optical element laser pre-treated systems for optical element that embodiment provides carries out laser pre-treated
Time, pretreatment laser pulse reciprocal time the most back and forth can be considered.
During ensureing laser pre-treated, pending sample 103 is by pretreatment laser light
The Uniform Irradiation of bundle, to improve the effect of laser pre-treated, the regulation step-length of described translation stage is little
In or equal to the preset multiple of pretreatment laser spot diameter inciding pending sample 103.
Wherein, described preset multiple isIn this utility model embodiment, the tune of described translation stage
Joint step-length preferably incides the pretreatment laser spot diameter of pending sample 103
Times so that during laser pre-treated, incide the adjacent default process of pending sample 103
Mutually there is overlap in the pretreatment laser facula of point, arranges approximating orthohexagonal mode, as
Shown in Fig. 4.It should be noted that the pending sample of square region domain representation 103 in Fig. 4,
Border circular areas represents pretreatment laser facula.This arrangement mode is conducive to improving pending sample
On the premise of the laser pre-treated effect of product 103, it is possible to reduce pending sample 103 as far as possible
Time required pretreatment laser pulse quantity of irradiation, reduces optical element laser pre-treated
Cost.
Further, in order to improve the spot size in pretreatment laser beam transmitting procedure back and forth
And the stability of pharosage, it is ensured that pretreating effect, described light supply apparatus 101 is except bag
Include outside laser instrument, also include optical collimator.In this utility model embodiment, described laser instrument
For pulse laser.The pretreatment laser beam that described laser instrument sends is accurate through described optical collimator
Described analyzer 102 is incided after Zhi.Such as, described optical collimator can include diaphragm and standard
Straight lens, described diaphragm is for controlling size and the shape of hot spot, and described collimating lens is for standard
The pretreatment laser beam that straight described laser instrument sends.
Additionally, due to pending sample 103 mostly is the optical element of plating anti-reflection film, plate anti-reflection film
The transmitance of optical element > 99%, pretreatment laser beam four times is by pending sample 103
After, intensity is the 96% of initial beam intensity, decays the least, in order to avoid swashing by system exit
Light light beam causes potential safety hazard, the optical element laser pre-treated that this utility model embodiment provides
System also includes laser beam absorption plant.Described laser beam absorption plant is arranged at described inspection
The side of the close described light supply apparatus 101 of device 102 partially, for absorbing swashing by system exit
Light light beam.
The foregoing is only preferred embodiment of the present utility model, be not limited to this reality
With novel, for a person skilled in the art, this utility model can have various change and
Change.All within spirit of the present utility model and principle, any amendment, the equivalent made are replaced
Change, improvement etc., within should be included in protection domain of the present utility model.
Claims (10)
1. an optical element laser pre-treated system, it is characterised in that include light supply apparatus,
Analyzer and reflection unit, pending sample be arranged on described analyzer and described reflection unit it
Between propagation path of light in,
The pretreatment laser beam of described light supply apparatus output incides described analyzer, through institute
The pretreatment laser beam stating analyzer is incident to the default process points of described pending sample, thoroughly
The pretreatment laser beam crossing described pending sample enters after described reflection unit reflects again
Being incident upon the default process points of described pending sample, the pretreatment through described pending sample swashs
Light light beam is through described analyzer outgoing.
Optical element laser pre-treated system the most according to claim 1, it is characterised in that
Also including polarization rotator, it is pending with described that described polarization rotator is arranged on described analyzer
Between sample, the polarization of the described polarization rotator pretreatment laser beam for will inject every time
State is changed between line polarized light and circularly polarized light, until being incided institute by described polarization rotator
The polarization direction of pretreatment laser beam stating analyzer is put down with the direction that thoroughly shakes of described analyzer
OK.
Optical element laser pre-treated system the most according to claim 1 and 2, its feature
It is, also includes the translation stage of position for regulating described pending sample, described pending
Sample is arranged on described translation stage.
Optical element laser pre-treated system the most according to claim 3, it is characterised in that
The regulation step-length of described translation stage is less than or equal to the pretreatment inciding described pending sample
The preset multiple of laser spot diameter.
Optical element laser pre-treated system the most according to claim 4, it is characterised in that
Described preset multiple is
Optical element laser pre-treated system the most according to claim 3, it is characterised in that
Described translation stage is two dimension motorized precision translation stage.
Optical element laser pre-treated system the most according to claim 1, it is characterised in that
Described light supply apparatus includes laser instrument and optical collimator, the pretreatment laser that described laser instrument sends
Light beam incides described analyzer after described optical collimator collimates.
Optical element laser pre-treated system the most according to claim 1, it is characterised in that
Also include polarization rotator, described polarization rotator be arranged on described pending sample with described instead
Between injection device, described polarization rotator is for pretreatment laser beam inclined that will inject every time
Polarization state is changed between line polarized light and circularly polarized light, until being incided by described polarization rotator
The polarization direction of the pretreatment laser beam of the default process points of described pending sample is with described
The direction that thoroughly shakes of analyzer is parallel.
Optical element laser pre-treated system the most according to claim 1, it is characterised in that
Described reflection unit is laser high reflective mirror.
Optical element laser pre-treated system the most according to claim 1, its feature exists
In, also include that laser beam absorption plant, described laser beam absorption plant are arranged at described inspection
The side of the close described light supply apparatus of device partially.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201620345442.4U CN205520069U (en) | 2016-04-21 | 2016-04-21 | Optical element laser pretreatment systems |
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201620345442.4U CN205520069U (en) | 2016-04-21 | 2016-04-21 | Optical element laser pretreatment systems |
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| CN205520069U true CN205520069U (en) | 2016-08-31 |
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| CN201620345442.4U Expired - Fee Related CN205520069U (en) | 2016-04-21 | 2016-04-21 | Optical element laser pretreatment systems |
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN105750740A (en) * | 2016-04-21 | 2016-07-13 | 中国工程物理研究院激光聚变研究中心 | Optical element laser preprocessing system |
-
2016
- 2016-04-21 CN CN201620345442.4U patent/CN205520069U/en not_active Expired - Fee Related
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN105750740A (en) * | 2016-04-21 | 2016-07-13 | 中国工程物理研究院激光聚变研究中心 | Optical element laser preprocessing system |
| CN105750740B (en) * | 2016-04-21 | 2017-10-10 | 中国工程物理研究院激光聚变研究中心 | A kind of optical element laser pre-treated system |
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| CF01 | Termination of patent right due to non-payment of annual fee |