CN205450560U - Be suitable for regional exposure device of branch of contact litho machine - Google Patents
Be suitable for regional exposure device of branch of contact litho machine Download PDFInfo
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- CN205450560U CN205450560U CN201620238897.6U CN201620238897U CN205450560U CN 205450560 U CN205450560 U CN 205450560U CN 201620238897 U CN201620238897 U CN 201620238897U CN 205450560 U CN205450560 U CN 205450560U
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- guide rail
- chute
- chute guide
- contact
- litho machine
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Abstract
The utility model provides a be suitable for regional exposure device of branch of contact litho machine, include: chute guide rail group, the 2nd chute guide rail group, first baffle and second baffle, chute guide rail group is including a pair of parallel interval distribution's a chute guide rail, the 2nd chute guide rail that the 2nd chute guide rail group arranged including a pair of parallel interval. The utility model discloses a device simple structure does not destroy litho machine the whole structure and normal exposure technology during the use, again can be fine play the effect of sheltering from the ultraviolet ray, and among the the device baffle change convenient, can not the destructor structure during change, it can set for according to the size in the light zone territory of exposing to the sun on the mask frame to keep off the plate size, and the flexibility is strong.
Description
Technical field
This utility model relates to semi-conductor device technology field, particularly relates to a kind of subregion exposure device being adapted for contact with formula litho machine.
Background technology
Contact photoetching machine, during exposure, mask is pressed on the substrate wafer of photoresist, and its major advantage is that the device fabrication that price can be used relatively low goes out less characteristic size.Contact photolithography and deep-submicron light source have reached the characteristic size less than 0.1gm, and conventional light source resolution is about 0.5gm.The mask of contact photoetching machine includes all chip array figures on substrate to be copied to.Substrate coats photoresist, and be installed to one by the estrade of Non-follow control, estrade can carry out the location of X, Y-direction and rotation and control.Mask and substrate wafer need to be observed by the microscope of discrete visual field simultaneously, and such operator just can be the pattern alignment on mask graph and substrate wafer with Non-follow control location estrade.Through ultraviolet photoetching, light passes through the part that mask is transparent, and figure has been transferred on photoresist.Contact photoetching machine the most all copies to the figure of mask on substrate.Therefore, contact photoetching machine is generally used for tolerating the device research of higher defect level and other application aspect.
Photoetching is to utilize photo-chemical reaction principle and chemistry, physical etchings method, is delivered to by circuitous pattern on single-crystal surface or dielectric layer, forms the Technology of effective graphical window or functional graphic.
Ultraviolet photolithographic is as image information carrier with ultraviolet light, realize the conversion of figure with photoresist (photoresist) for middle (image record) medium, shift and process, finally image information is delivered to a kind of technique on wafer (referring mainly to silicon chip) or dielectric layer.
SUSSMA6 double face photoetching machine is the high resolution lithography system being designed under laboratory extension research and development, small lot batch manufacture or trial-production production environment.The MA6 type litho machine of SUSS is considered as to study, from quasiconductor submicron technology, the whole industry technology mark post that three-dimensional micro-system produces.The system of this set innovation can meet client's requirement to precision, reliability and low cost.
SUSSMA6 is applicable to the application of all standard lithographic.For thick glue MEMS application, SUSSMA6 provides high-quality exposure optical system to meet high-resolution and the requirement of splendid edge quality.Powerful SUSSMA6 can choose to install back side aligming microscope, and this microscope can help through back process accurately.Additionally, SUSSMA6 can also flexible customization, it is achieved frangible III-V, the ultra-thin or application of warpage wafer.
In actual process, always run into expose on a piece of substrate of needs half, 1/4th or the figure of smaller area, in order to subsequent technique is compared in difference, such as etches, sputtering etc..Existing method is usually and uses the optical filtering scraps of paper to block, but optical filtering paper has Railway Project: 1. paper is flexible, poor plasticity.2. one layer of even multilamellar optical filtering paper all can't stop strong ultraviolet light, weak effect.3. cannot position placement, block position big with ideal position gap.There are so many problems at optical filtering paper, in actual work, bring a lot of inconvenience, it is therefore desirable to design the problem that a simple and effective device solves the exposure of contact photolithography subregion.
Utility model content
The shortcoming of prior art in view of the above, the purpose of this utility model is to provide a kind of subregion exposure device being adapted for contact with formula litho machine, poor plasticity, shaded effect difference and the problem that cannot position placement caused in order to solve to use the optical filtering scraps of paper to block in existing technologies.
For achieving the above object and other relevant purposes, this utility model provides a kind of subregion exposure device being adapted for contact with formula litho machine, described in be adapted for contact with the subregion exposure device of formula litho machine and include: the first chute set of rails, the second chute set of rails, the first baffle plate and second baffle；
Described first chute set of rails includes pair of parallel first chute guide rail spaced apart；Described first chute guide rail includes the first guide rail body and is arranged at the first chute in described first guide rail body；Described first chute is positioned at the inner side of described first chute guide rail；
Described first baffle plate is between described first chute guide rail, and the two ends of described first baffle plate lay respectively in described first chute on the first chute guide rail described in two, and can slide along the length direction of described first chute；
Described second chute set of rails includes pair of parallel the second chute guide rail being intervally arranged；Described second chute guide rail is across described first chute set of rails, and is fixed on the surface of described first chute guide rail, and described second chute guide rail is perpendicular with described first chute guide rail；Described second chute guide rail includes the second guide rail body and is arranged at the second chute in described second guide rail body；Described second chute is positioned at the inner side of described second chute guide rail；
Described second baffle is between described second chute guide rail, and the two ends of described second baffle lay respectively in described second chute on the second chute guide rail described in two, and can slide along the length direction of described second slideway.
A kind of preferred version as the subregion exposure device being adapted for contact with formula litho machine of the present utility model, the length direction of described first chute is consistent with the length direction of described first guide rail body, and described first chute extends to other end from the end face of described first guide rail body.
A kind of preferred version as the subregion exposure device being adapted for contact with formula litho machine of the present utility model, the length direction of described second chute is consistent with the length direction of described second guide rail body, and described second chute extends to other end from the end face of described second guide rail body.
A kind of preferred version as the subregion exposure device being adapted for contact with formula litho machine of the present utility model, the outside flush of the end face of described first chute guide rail and described second chute guide rail, and the outside flush of the end face of described second chute guide rail and described first chute guide rail.
As a kind of preferred version of the subregion exposure device being adapted for contact with formula litho machine of the present utility model, the length of described first chute guide rail is more than the length of described second chute guide rail, and the length of described first baffle plate is less than the length of described second baffle.
As a kind of preferred version of the subregion exposure device being adapted for contact with formula litho machine of the present utility model, the width of described first baffle plate and described second baffle is 2.5mm～150mm.
It is plastics chute guide rail as a kind of preferred version of the subregion exposure device being adapted for contact with formula litho machine of the present utility model, described first chute guide rail and described second chute guide rail.
As a kind of preferred version of the subregion exposure device being adapted for contact with formula litho machine of the present utility model, described first baffle plate and described second baffle are rustless steel baffle plate.
It is shaped as inverted trapezoidal as a kind of preferred version of the subregion exposure device being adapted for contact with formula litho machine of the present utility model, described first baffle plate and described second baffle cross section.
As a kind of preferred version of the subregion exposure device being adapted for contact with formula litho machine of the present utility model, the surface irregularity of described first chute guide rail and described second chute guide rail is 3 μm/m；Nonstraightness is 10～15 μm/m.
As it has been described above, the subregion exposure device being adapted for contact with formula litho machine of the present utility model, have the advantages that
1) apparatus structure of the present utility model is simple, does not destroy litho machine complete machine structure and normal exposure technology, can well play again the effect blocking ultraviolet light during use；And baffle plate is changed conveniently in this device, will not breaking plant structure during replacing；The size of baffle plate can be set according to the size of exposure area on mask frame, and motility is strong；
2) baffle plate in device of the present utility model can carry out the manual mobile of 4DOF on circular exposure area on mask frame, form exposure area freely, realize on a piece of substrate, once coat photoresist step exposure in subregion one on same mask, once develop molding, also the exposure of photoresist difference mask multizone can once be coated on a piece of substrate, once develop the photoetching process of molding, so that photoetching process is flexible and changeable；Meanwhile, use the contact photoetching machine of device of the present utility model can reduce mask plate cost of manufacture, reduce production cost.
Accompanying drawing explanation
Fig. 1 is shown as the perspective view of the subregion exposure device being adapted for contact with formula litho machine of the present utility model.
Fig. 2 is shown as the perspective view of the first chute guide rail in the subregion exposure device being adapted for contact with formula litho machine of the present utility model.
Fig. 3 is shown as the plan structure schematic diagram of the first chute guide rail in the subregion exposure device being adapted for contact with formula litho machine of the present utility model.
Fig. 4 is shown as the perspective view of the second chute guide rail in the subregion exposure device being adapted for contact with formula litho machine of the present utility model.
Fig. 5 is shown as the plan structure schematic diagram of the second chute guide rail in the subregion exposure device being adapted for contact with formula litho machine of the present utility model.
Fig. 6 is shown as the structural representation of the first baffle plate in the subregion exposure device being adapted for contact with formula litho machine of the present utility model.
Fig. 7 is shown as the structural representation of second baffle in the subregion exposure device being adapted for contact with formula litho machine of the present utility model.
Fig. 8 to Figure 22 is shown as the subregion exposure device being adapted for contact with formula litho machine of the present utility model schematic diagram in different use examples.
Element numbers explanation
The 1 subregion exposure device being adapted for contact with formula litho machine
11 first chute guide rails
111 first rail body
112 first chutes
12 first baffle plates
13 second chute guide rails
131 second rail body
132 second chutes
14 second baffles
2 substrates
3 photoresists
4 first mask plates
5 second mask plates
6 ultraviolet lights
Detailed description of the invention
Below by way of specific instantiation, embodiment of the present utility model being described, those skilled in the art can be understood other advantages of the present utility model and effect easily by the content disclosed by this specification.This utility model can also be carried out by the most different detailed description of the invention or apply, and the every details in this specification can also carry out various modification or change based on different viewpoints and application under without departing from spirit of the present utility model.
Refer to Fig. 1 to Figure 22, it should be noted that, diagram provided in the present embodiment illustrates basic conception of the present utility model the most in a schematic way, though component count, shape and size when only showing the assembly relevant with this utility model rather than implement according to reality in Tu Shi are drawn, during its actual enforcement, the kenel of each assembly, quantity and ratio can be a kind of random change, and its assembly layout kenel is likely to increasingly complex.
Refer to Fig. 1 to Fig. 7, this utility model provides a kind of has the subregion exposure device 1 being adapted for contact with formula litho machine, described in be adapted for contact with the subregion exposure device 1 of formula litho machine and include: the first chute set of rails, the second chute set of rails, the first baffle plate 12 and second baffle 14；Described first chute set of rails includes pair of parallel first chute guide rail 11 spaced apart；Described first chute guide rail 11 includes the first guide rail body 111 and is arranged at the first chute 112 in described first guide rail body 111；Described first chute 112 is positioned at the inner side of described first chute guide rail 111；Described first baffle plate 12 is between described first chute guide rail 11, and the two ends of described first baffle plate 12 lay respectively in described first chute 112 on the first chute guide rail 11 described in two, and can slide along the length direction of described first chute 112；Described second chute set of rails includes pair of parallel the second chute guide rail 13 being intervally arranged；Described second chute guide rail 13 is across described first chute set of rails, and is fixed on the surface of described first chute guide rail 11, and described second chute guide rail 13 is perpendicular with described first chute guide rail 11；Described second chute guide rail 13 includes the second guide rail body 131 and is arranged at the second chute 132 in described second guide rail body 131；Described second chute 132 is positioned at the inner side of described second chute guide rail 13；Described second baffle 14 is between described second chute guide rail 13, and the two ends of described second baffle 14 lay respectively in described second chute 132 on the second chute guide rail 13 described in two, and can slide along the length direction of described second slideway 132.
It should be noted that said two the first chute guide rail 11 upper surface and lower surface are all distributed in being generally aligned in the same plane, to guarantee that described first chute 112 being positioned at said two the first chute guide rail 11 is generally aligned in the same plane；Said two the second chute guide rail 13 upper surface and lower surface are all distributed in being generally aligned in the same plane, to guarantee that described second chute 132 being positioned at said two the second chute guide rail 13 is generally aligned in the same plane.
As example, described second chute guide rail 13 can be by it is not limited to rivet be fixed on the surface of described first chute guide rail 11.
As example, the length direction of described first chute 112 is consistent with the length direction of described first guide rail body 111, and described first chute 112 extends to other end from the end face of described first guide rail body 111, the most described first chute 112 runs through whole described first guide rail body 111 along the length direction of described first guide rail body 111.
As example, the length direction of described second chute 132 is consistent with the length direction of described second guide rail body 131, and described second chute 132 extends to other end from the end face of described second guide rail body 131, the most described second chute 132 runs through whole described second guide rail body 131 along the length direction of described second guide rail body 131.
As example, the outside flush of the end face of described first chute guide rail 11 and described second chute guide rail 13, and the outside flush of the end face of described second chute guide rail 13 and described first chute guide rail 12.
As example, the length of described first chute guide rail 11 and described second chute guide rail 13 can be set according to actual needs, it is preferable that in the present embodiment, and the length of described first chute guide rail 11 is more than the length of described second chute guide rail 13.
As example, the length of described first baffle plate 12 and described second baffle 14 can be set according to actual needs, it is preferable that in the present embodiment, and the length of described first baffle plate 12 is less than the length of described second baffle 14.
As example, the width of described first baffle plate 12 and described second baffle 14 can be set according to actual needs, it is preferable that in the present embodiment, and the width of described first baffle plate 12 and described second baffle 14 is 2.5mm～150mm.
As example, the material of described first chute guide rail 11 and described second chute guide rail 13 can select according to actual needs, and the material of described first chute guide rail 11 and described second chute guide rail 13 can be identical, it is also possible to different；Preferably, in the present embodiment, described first chute guide rail 11 and described second chute guide rail 13 are plastics chute guide rail.
As example, the material of described first baffle plate 12 and described second baffle 14 can select according to actual needs, and the material of described first baffle plate 12 and described second baffle 14 can be identical, it is also possible to different；Preferably, the material of described first baffle plate 12 and described second baffle 14 is rustless steel；It is further preferable that described first baffle plate 12 and described second baffle 14 material be austenite 304 rustless steel through delustring blackening special handling.
As example, the shape of described first baffle plate 12 and described second baffle 14 cross section can be set according to actual needs, it is preferable that in the present embodiment, described first baffle plate 12 and described second baffle 14 cross section be shaped as inverted trapezoidal.
As example, the surface irregularity of described first chute guide rail 11 and described second chute guide rail 13 is 3 μm/m, and nonstraightness is 10～15 μm/m, to be adapted for contact with subregion exposure device 1 accuracy of manufacture and the installation accuracy of formula litho machine described in guaranteeing.
The described subregion exposure device 1 being adapted for contact with formula litho machine can unrestricted choice exposure area, i.e. can freely block the ultraviolet light being radiated on mask plate.Owing to mask plate is planar structure, so the degree of freedom that the subregion exposure device 1 being adapted for contact with formula litho machine described in of the present utility model has along vertical X, Y both direction can meet requirement.
Being adapted for contact with the subregion exposure device 1 of formula litho machine described in it should be noted that during using, its position placed needs to meet the most not to be destroyed litho machine complete machine structure and is directed at exposure technology normally, can well play again the effect blocking ultraviolet light.As a example by SUSSMA6 double face photoetching machine, groove on the mask frame (Maskholder) installing mask plate is adapted for contact with the subregion exposure device 1 of formula litho machine described in can disposing, owing to mask plate is at the another side of described mask frame, exposure device exposure when above mask frame at 3cm, so, the described subregion exposure device 1 being adapted for contact with formula litho machine is installed in the groove on described mask frame, i.e. mask plate will not be caused damage, not interfere with again exposure.
The described subregion exposure device 1 being adapted for contact with formula litho machine can be used in the exposure technology under different situations according to actual needs, is explained with concrete example below:
Embodiment one, same mask plate blocks a part of exposure area
In the present embodiment, with positive photoresist example, first, at substrate 2 surface spin coating one layer photoetching glue 3, as shown in Figure 8；Using the first mask plate 4 to be directed at normally, after alignment completes, the region that need not exposure is blocked, as shown in Figure 9 in the position that the described subregion exposure device 1 being adapted for contact with formula litho machine is placed on correspondence；Normal ultraviolet light 6 exposure technology is carried out, as shown in Figure 10 after blocking；Finally, development i.e. can get litho pattern, as shown in figure 11.
Embodiment two, same mask plate blocks zones of different exposure
In the present embodiment, with positive photoresist example, first, at substrate 2 surface spin coating one layer photoetching glue 3, as shown in figure 12；Use the first mask plate 4 to be directed at normally, after alignment completes, the described subregion exposure device 1 being adapted for contact with formula litho machine is placed on the position of correspondence and blocks and different need not exposure area, as shown in figure 13；Normal ultraviolet light 6 exposure technology is carried out, as shown in figure 14 after blocking；Finally, development i.e. can get litho pattern, as shown in figure 15.
Embodiment three, different mask plates expose on same substrate
In the present embodiment, with positive photoresist example, first, at substrate 2 surface spin coating one layer photoetching glue 3, as shown in figure 16；Using the first mask plate 4 to be directed at normally, after alignment completes, the region that need not exposure is blocked, as shown in figure 17 in the position that the described subregion exposure device 1 being adapted for contact with formula litho machine is placed on correspondence；Normal ultraviolet photoetching technique is carried out, as shown in Figure 18 and Figure 19 after blocking；After end exposure, described first mask plate 4 being replaced by the second mask plate 5 to be directed at normally, after being directed at, the region that need not exposure is blocked, as shown in figure 20 in the position that the described subregion exposure device 1 being adapted for contact with formula litho machine is placed on correspondence；Normal ultraviolet light 6 exposure technology is carried out, as shown in figure 21 after blocking；Finally, development i.e. can get litho pattern, as shown in figure 22.
In sum, this utility model provides a kind of subregion exposure device being adapted for contact with formula litho machine, described in be adapted for contact with the subregion exposure device of formula litho machine and include: the first chute set of rails, the second chute set of rails, the first baffle plate and second baffle；Described first chute set of rails includes pair of parallel first chute guide rail spaced apart；Described first chute guide rail includes the first guide rail body and is arranged at the first chute in described first guide rail body；Described first chute is positioned at the inner side of described first chute guide rail；Described first baffle plate is between described first chute guide rail, and the two ends of described first baffle plate lay respectively in described first chute on the first chute guide rail described in two, and can slide along the length direction of described first chute；Described second chute set of rails includes pair of parallel the second chute guide rail being intervally arranged；Described second chute guide rail is across described first chute set of rails, and is fixed on the surface of described first chute guide rail, and described second chute guide rail is perpendicular with described first chute guide rail；Described second chute guide rail includes the second guide rail body and is arranged at the second chute in described second guide rail body；Described second chute is positioned at the inner side of described second chute guide rail；Described second baffle is between described second chute guide rail, and the two ends of described second baffle lay respectively in described second chute on the second chute guide rail described in two, and can slide along the length direction of described second slideway.Apparatus structure of the present utility model is simple, does not destroy litho machine complete machine structure and normal exposure technology, can well play again the effect blocking ultraviolet light during use；And baffle plate is changed conveniently in this device, will not breaking plant structure during replacing；The size of baffle plate can be set according to the size of exposure area on mask frame, and motility is strong；Baffle plate in device of the present utility model can carry out the manual mobile of 4DOF on the circular exposure area on mask frame, form exposure area freely, realize on a piece of substrate, once coat photoresist step exposure in subregion one on same mask, once develop molding, also the exposure of photoresist difference mask multizone can once be coated on a piece of substrate, once develop the photoetching process of molding, so that photoetching process is flexible and changeable；Meanwhile, use the contact photoetching machine of device of the present utility model can reduce mask plate cost of manufacture, reduce production cost.
Above-described embodiment only illustrative principle of the present utility model and effect thereof, not for limiting this utility model.Above-described embodiment all can be modified under spirit and the scope of the present utility model or change by any person skilled in the art.Therefore, art has all equivalence modification or changes that usually intellectual is completed under without departing from the spirit disclosed in this utility model and technological thought such as, must be contained by claim of the present utility model.
Claims (10)
1. the subregion exposure device being adapted for contact with formula litho machine, it is characterised in that described in be adapted for contact with the subregion exposure device of formula litho machine and include: the first chute set of rails, the second chute set of rails, the first baffle plate and second baffle；
Described first chute set of rails includes pair of parallel first chute guide rail spaced apart；Described first chute guide rail includes the first guide rail body and is arranged at the first chute in described first guide rail body；Described first chute is positioned at the inner side of described first chute guide rail；
Described first baffle plate is between described first chute guide rail, and the two ends of described first baffle plate lay respectively in described first chute on the first chute guide rail described in two, and can slide along the length direction of described first chute；
Described second chute set of rails includes pair of parallel the second chute guide rail being intervally arranged；Described second chute guide rail is across described first chute set of rails, and is fixed on the surface of described first chute guide rail, and described second chute guide rail is perpendicular with described first chute guide rail；Described second chute guide rail includes the second guide rail body and is arranged at the second chute in described second guide rail body；Described second chute is positioned at the inner side of described second chute guide rail；
Described second baffle is between described second chute guide rail, and the two ends of described second baffle lay respectively in described second chute on the second chute guide rail described in two, and can slide along the length direction of described second slideway.
The subregion exposure device being adapted for contact with formula litho machine the most according to claim 1, it is characterized in that: the length direction of described first chute is consistent with the length direction of described first guide rail body, and described first chute extends to other end from the end face of described first guide rail body.
The subregion exposure device being adapted for contact with formula litho machine the most according to claim 1, it is characterized in that: the length direction of described second chute is consistent with the length direction of described second guide rail body, and described second chute extends to other end from the end face of described second guide rail body.
The subregion exposure device being adapted for contact with formula litho machine the most according to claim 1, it is characterized in that: the outside flush of the end face of described first chute guide rail and described second chute guide rail, and the outside flush of the end face of described second chute guide rail and described first chute guide rail.
The subregion exposure device being adapted for contact with formula litho machine the most according to claim 1, it is characterised in that: the length of described first chute guide rail is more than the length of described second chute guide rail, and the length of described first baffle plate is less than the length of described second baffle.
The subregion exposure device being adapted for contact with formula litho machine the most according to claim 1, it is characterised in that: the width of described first baffle plate and described second baffle is 2.5mm～150mm.
The subregion exposure device being adapted for contact with formula litho machine the most according to claim 1, it is characterised in that: described first chute guide rail and described second chute guide rail are plastics chute guide rail.
The subregion exposure device being adapted for contact with formula litho machine the most according to claim 1, it is characterised in that: described first baffle plate and described second baffle are rustless steel baffle plate.
The subregion exposure device being adapted for contact with formula litho machine the most according to claim 1, it is characterised in that: described first baffle plate and described second baffle cross section be shaped as inverted trapezoidal.
The subregion exposure device being adapted for contact with formula litho machine the most according to claim 1, it is characterised in that: the surface irregularity of described first chute guide rail and described second chute guide rail is 3 μm/m；Nonstraightness is 10～15 μm/m.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201620238897.6U CN205450560U (en) | 2016-03-25 | 2016-03-25 | Be suitable for regional exposure device of branch of contact litho machine |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201620238897.6U CN205450560U (en) | 2016-03-25 | 2016-03-25 | Be suitable for regional exposure device of branch of contact litho machine |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN205450560U true CN205450560U (en) | 2016-08-10 |
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201620238897.6U Expired - Fee Related CN205450560U (en) | 2016-03-25 | 2016-03-25 | Be suitable for regional exposure device of branch of contact litho machine |
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Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN105652605A (en) * | 2016-03-25 | 2016-06-08 | 中国科学院上海微系统与信息技术研究所 | Regional exposure device suitable for contact type lithography machine |
| CN108054141A (en) * | 2017-12-12 | 2018-05-18 | 深圳市华星光电技术有限公司 | The preparation method of display panel |
| CN110398883A (en) * | 2019-07-19 | 2019-11-01 | 上海微高精密机械工程有限公司 | A kind of light-blocking panel assembly of litho machine |
-
2016
- 2016-03-25 CN CN201620238897.6U patent/CN205450560U/en not_active Expired - Fee Related
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN105652605A (en) * | 2016-03-25 | 2016-06-08 | 中国科学院上海微系统与信息技术研究所 | Regional exposure device suitable for contact type lithography machine |
| CN105652605B (en) * | 2016-03-25 | 2018-01-26 | 中国科学院上海微系统与信息技术研究所 | It is adapted for contact with the subregion exposure device of formula litho machine |
| CN108054141A (en) * | 2017-12-12 | 2018-05-18 | 深圳市华星光电技术有限公司 | The preparation method of display panel |
| CN108054141B (en) * | 2017-12-12 | 2020-11-06 | 深圳市华星光电技术有限公司 | Preparation method of display panel |
| CN110398883A (en) * | 2019-07-19 | 2019-11-01 | 上海微高精密机械工程有限公司 | A kind of light-blocking panel assembly of litho machine |
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