CN205394244U - High -efficient grinding and polishing processingequipment - Google Patents
High -efficient grinding and polishing processingequipment Download PDFInfo
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- CN205394244U CN205394244U CN201620120062.0U CN201620120062U CN205394244U CN 205394244 U CN205394244 U CN 205394244U CN 201620120062 U CN201620120062 U CN 201620120062U CN 205394244 U CN205394244 U CN 205394244U
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Abstract
The utility model discloses a high -efficient grinding and polishing processingequipment, including sun gear, planet wheel and ring gear, having seted up in the planet wheel and having carried the thing hole, the work piece is arranged in year thing of planet wheel is downthehole, planet wheel respectively with the sun gear with the ring gear meshes mutually. The festival curve that has one among sun gear, planet wheel, the ring gear three at least is not completely circular shape, and then makes planet wheel center in sun gear center revolution, along radial movement, planet wheel center to sun gear center apart from e no longer be the constant, but grinding and polishing time t's function, and then improve the spray deposition uniformity of grinding and polishing orbit reaches the purpose that improves accurate ultra -precise grinding and polishing machining precision and efficiency.
Description
Technical field
This utility model relates to mechanical manufacturing field, particularly relates to a kind of high-efficient grinding polishing processing device using planetary mechanism.
Background technology
Important processing technique accurate, that ultraprecision grinding polishing is the products such as large scale integrated circuit, LED, computer disk, for obtaining smooth, smooth surface.This technique generally uses finishing ring type or planet gear type polishing grinding equipment to carry out, and the former is mainly used in the processing of one side grinding and polishing, and the latter is mainly used in Two sides milling and polishing processing.The main tool of grinding and polishing processing is abrasive disk or polishing pad, abrasive disk or be scattered with free or set abrasive material on polishing pad.Abrasive material relative in the movement locus of workpiece to be machined, the part of abrasive material and surface to be machined practical function, be called grinding and polishing track, it is clear that machining accuracy and efficiency, in the distributing homogeneity degree of surface to be machined, are had material impact by grinding and polishing track.
In actual processing, accurate ultra grinding and polishing process equipment has two kinds of comparatively typical cases: finishing ring type and planet gear type polishing grinding equipment, all have a wide range of applications in actual production.Finishing ring type polishing grinding equipment structural representation is as it is shown in figure 1, finishing ring 15 is cylindrical shape, and its hollow space is called loading hole, and its outer wall contacts with the rolling bearing 13 on finishing ring retainer 14.One or more finishing rings 15 are placed on grinding/polishing pad 12.Workpiece to be machined 17 is placed in the loading hole 11 of finishing ring 15, and the machined surface of workpiece to be machined 17 contacts with grinding/polishing pad 12 down, applies tonnage by load 16 to workpiece to be machined 17.Grinding and polishing adds man-hour, and grinding/polishing pad 12, under motor drives, turns round around own axes；Finishing ring 15, under the friction of grinding/polishing pad 12 and the supporting role of rolling bearing 13, turns round around own axes；Workpiece to be machined 17 also does gyration under the effect of grinding/polishing pad 12 and finishing ring 15.
Fig. 2 show the motion analysis of finishing ring type polishing grinding equipment, and workpiece is around O point with angular velocity omega h rotation, and grinding/polishing pad is put around O ' with angular velocity omega p rotation, and the distance that O point and O ' put is e.Setting up coordinate system xOy, x ' O ' y ' as in figure 2 it is shown, then abrasive material point A (rp, φ) is relative to the movement locus of workpiece on grinding/polishing pad, namely grinding and polishing track is
X=rpcos [(ω p-ω h) t+ φ]-e cos ω ht
Y=rpsin [(ω p-ω h) t+ φ]+e sin ω ht
Wherein, t is grinding/polishing time.
Planet gear type polishing grinding equipment schematic diagram is as it is shown on figure 3, retainer 6 outer ring has gear to engage with ring gear 1, sun gear 4, and three constitutes planet circular system.Having the hole identical with workpiece 5 profile on retainer 6, workpiece is placed in wherein, and the thickness of workpiece 5 is bigger compared with the thickness of retainer 6.Grinding and polishing adds man-hour, and retainer 6 is placed on lower grinding/polishing pad, upper grinding/polishing pad 3 and workpiece 5 upper surface, and applies certain load；Under the gyroscopic action of sun gear 4, retainer 6 one aspect, around the revolution of sun gear 4 center, on the other hand around its center rotation, constitutes planetary motion；Workpiece 5 is under the effect of retainer 6, and relatively upper grinding/polishing pad and lower grinding/polishing pad 3 move.
Fig. 4 show the motion analysis of planet gear type polishing grinding equipment, and O point is retainer center, and O ' point is sun gear, ring gear center.Retainer around O point with angular velocity omegahRotation, puts around O ' with angular velocity omega simultaneouslycRevolution.Grinding/polishing pad is put around O ' with angular velocity omegapRotation, the distance that O point and O ' put is e.Set up coordinate system xOy, x ' O ' y ' as in figure 2 it is shown, a then abrasive material point A (r on grinding/polishing padp, φ) and relative to the movement locus of workpiece, namely grinding and polishing track is
X=rpcos [(ω p-ω h) t+ φ]-ecos (ω h-ω c) t
Y=rpsin [(ω p-ω h) t+ φ]+esin (ω h-ω c) t
Wherein, t is grinding/polishing time.
By above-mentioned analysis it can be seen that the grinding track of finishing ring type and planet gear type polishing grinding equipment has identical math equation form, two kinds of tracks are all rendered as gerotor type.From grinding track equation it can be seen that abrasive material position (rp, φ) on grinding and polishing pad determines the grinding and polishing track position at surface to be machined, determining the size of cycloid to footpath rp, polar angle φ determines the phase place of cycloid.
On grinding and polishing dish in all of effective abrasive material, namely in Fig. 2 and Fig. 4 to footpath more thanLess thanAbrasive material point, to footpath be onlyAbrasive material point through finishing ring or the center of planetary gear；Abrasive material point to footpath withDifference more big, its zone of action from finishing ring or planetary gear center more away from；The outer rim of finishing ring or planetary gear all can be worked by all of abrasive material point.Therefore, grinding and polishing track in the overall distribution trend of finishing ring or planetary gear surface is: be gradually increased to outer rim track density by centre.If workpiece is placed in the middle of finishing ring or planetary gear, then workpiece centre clearance is low and outer rim is high；If workpiece is along finishing ring or planetary gear circumference, then workpiece side clearance is low and opposite side clearance is high.
According to above-mentioned analysis, the grinding and polishing track skewness of finishing ring type and planet gear type polishing grinding equipment, the raising of grinding and polishing machining accuracy and efficiency is caused to be restricted.
Therefore, utility model people of the present utility model needs a kind of new technique of design badly to improve its problem.
Utility model content
This utility model aims to provide a kind of high-efficient grinding polishing processing device, and it can improve the distributing homogeneity of grinding and polishing track, reaches to improve the purpose of accurate ultra grinding and polishing machining accuracy and efficiency.
For solving above-mentioned technical problem, the technical solution of the utility model is:
A kind of high-efficient grinding polishing processing device, including: sun gear, planetary gear and ring gear, wherein said sun gear, described planetary gear and described ring gear three have at least one for non-circular gear, three collectively forms not rounded planetary wheeling mechanism；Offering loading hole in described planetary gear, workpiece is placed in the loading hole of described planetary gear, and described planetary gear is meshed with described sun gear and described ring gear respectively.
Preferably, the pitch curve of described sun gear is the one in high-order ellipse, higher hamonic wave curve, ellipse, circular；The pitch curve of described planetary gear is the one in high-order ellipse, higher hamonic wave curve, ellipse, circular；The pitch curve of described ring gear is the one in high-order ellipse, higher hamonic wave curve, ellipse, circular.
Preferably, also including grinding and polishing dish, lower grinding and polishing dish, wherein said upper grinding and polishing dish, described not rounded planetary wheeling mechanism, described lower grinding and polishing dish three be arranged in parallel from top to bottom；Workpiece lower surface contacts with described lower grinding and polishing dish, is pressed on workpiece surface under described upper grinding and polishing dish.
Preferably, also include working fluid feed mechanism, drive structure and control unit.
Preferably, described sun gear pitch curve is that high-order is oval, and described planetary gear pitch curve is circular.
Preferably, described sun gear pitch curve is that high-order is oval, and exponent number is 4, eccentricity 0.1052, central diameter 154.17mm；Described planetary gear pitch curve is circular, and radius is 35.27mm.
Preferably, described ring gear pitch curve is higher hamonic wave curve, and described planetary gear pitch curve is circular.
Preferably, described ring gear pitch curve is higher hamonic wave curve, and exponent number is 6, amplitude coefficient 0.0626, central diameter 534.13mm；Described planetary gear pitch curve is circular, radius 85mm.
Preferably, described sun gear pitch curve is circular；Described ring gear pitch curve is oval；Described planetary gear pitch curve is circular.
Preferably, described sun gear pitch curve is circular, radius 50mm；Described ring gear pitch curve is oval, eccentricity 0.2736, central diameter 346.82mm；Described planetary gear pitch curve is circular, radius 63.14mm.
Adopting technique scheme, this utility model at least includes following beneficial effect:
High-efficient grinding polishing processing device described in the utility model, the pitch curve having at least one in sun gear, planetary gear, ring gear three is not circular, and then make planetary gear center while revolving round the sun around sun gear center, move radially, the distance e at planetary gear center to sun gear center is no longer constant, but the function of grinding and polishing time t, and then improve the distributing homogeneity of grinding and polishing track, reach to improve the purpose of accurate ultra grinding and polishing machining accuracy and efficiency.
Accompanying drawing explanation
Fig. 1 is the structural representation of finishing ring type polishing grinding equipment；
Fig. 1 a is the schematic diagram of Fig. 1；
Fig. 2 is the motion analysis figure of Fig. 1；
Fig. 3 is the structural representation of planet gear type polishing grinding equipment；
Fig. 4 is the motion analysis figure of Fig. 3；
Fig. 5 is the structural representation of high-efficient grinding polishing processing device described in the utility model；
Fig. 6 is the grinding and polishing track schematic diagram of Fig. 5；
Fig. 7 is the grinding and polishing track schematic diagram of an abrasive material point in the wheeled grinding and polishing processing unit (plant) of conventional planet；
Fig. 8 is the structural representation of high-efficient grinding polishing processing device in an embodiment；
Fig. 9 is the structural representation of high-efficient grinding polishing processing device in an embodiment；
Figure 10 is the structural representation of high-efficient grinding polishing processing device in an embodiment.
Wherein: 1. ring gear, 101. ring gear pitch curves, the 102. ring gear centres of gyration, 2. descend grinding/polishing pad, 3. go up grinding/polishing pad, 4. sun gear, 401. sun gear pitch curves, 402. the sun gear centre of gyration, 5. workpiece, 6. retainer, 7. planetary gear, 701. planetary gear pitch curves, 11. loading holes, 12. grinding/polishing pad, 13. rolling bearings, 14. finishing ring retainers, 15. finishing ring, 16. loads, 17. workpieces to be machined.
Detailed description of the invention
Below in conjunction with the accompanying drawing in this utility model embodiment, the technical scheme in this utility model embodiment is clearly and completely described, it is clear that described embodiment is only a part of embodiment of this utility model, rather than whole embodiments.Based on the embodiment in this utility model, the every other embodiment that those of ordinary skill in the art obtain under not making creative work premise, broadly fall into the scope of this utility model protection.
As shown in Figure 5, for meeting a kind of high-efficient grinding polishing processing device of the present utility model, including: sun gear 4, planetary gear 7 and ring gear 1, wherein said sun gear 4, described planetary gear 7 and described ring gear 1 three have at least one (to be also heterotypic gear for non-circular gear, it is different from traditional circular gear), namely at least one is non-circular, and three collectively forms not rounded planetary gear 7 mechanism；Offering loading hole in described planetary gear 7, workpiece 5 is placed in the loading hole of described planetary gear 7, and described planetary gear 7 is meshed with described sun gear 4 and described ring gear 1 respectively.
Preferably, the pitch curve of described sun gear 4 is the one in high-order ellipse, higher hamonic wave curve, ellipse, circular；The pitch curve of described planetary gear 7 is the one in high-order ellipse, higher hamonic wave curve, ellipse, circular；The pitch curve of described ring gear 1 is the one in high-order ellipse, higher hamonic wave curve, ellipse, circular.
The pitch curve having at least one in sun gear 4, planetary gear 7, ring gear 1 three is not circular, and then make planetary gear 7 center while revolving round the sun around sun gear 4 center, moving radially, the distance e at planetary gear 7 center to sun gear 4 center is no longer constant, but the function of grinding and polishing time t.Such as shown in Fig. 7, sun gear 4 nodel line is that quadravalence is oval, it is assumed that ring gear 1 is static, and sun gear 4 rotates, then the motion of planetary gear 7 has three components: 1) around the revolution motion of sun gear 4 center O；2) around its center O ' spinning motion put；3) along the radial motion of O ' O straight line.In grinding and polishing pad, the grinding and polishing equation of locus of abrasive material point A (rp, φ) can be described as
X=rpcos [(ω p-ω h) t+ φ]-ecos (ω h-ω c) t
Y=rpsin [(ω p-ω h) t+ φ]+esin (ω h-ω c) t
Wherein, e=Rz/ (1-ε cos (n ω 1-t)), Rz is sun gear 4 nodel line central diameter, and ε is sun gear 4 nodel line eccentricity, and n is sun gear 4 nodel line exponent number, and ω 1 is sun gear 4 angle of revolution speed, and t is grinding/polishing time.In grinding and polishing pad, the grinding and polishing track of an abrasive material point is as shown in Figure 6.
The attrition process track (Fig. 7) of contrast conventional line star-wheel 7 formula grinding and polishing processing unit (plant), the distribution in planetary gear 7 scope of the grinding and polishing track of visible the grinding and polishing processing unit (plant) sent out described in embodiment, seeing on the whole and more they tend to uniformly, this is beneficial to the raising of grinding and polishing machining accuracy and efficiency.
Preferably, also including grinding and polishing dish, lower grinding and polishing dish, wherein said upper grinding and polishing dish, described not rounded planetary gear 7 mechanism, described lower grinding and polishing dish three be arranged in parallel from top to bottom；Workpiece 5 lower surface contacts with described lower grinding and polishing dish, is pressed on workpiece 5 upper surface under described upper grinding and polishing dish.
Preferably, also include working fluid feed mechanism, drive structure and control unit.Those skilled in the art are specifically set it is to be understood that so place repeats no more due to it.
A revolution in sun gear 4 and ring gear 1, one maintain static, it is also possible to both turn round.Upper and lower grinding and polishing dish can turn round, it is also possible to maintains static.Planetary gear 7 can open multiple loading hole, is used for loading workpiece 5.Process suitable in Two sides milling and polishing.If not using grinding and polishing dish to load, and adopt the load mode of trimming ring type polishing grinding equipment, then can be used for the processing of one side grinding and polishing.
In a preferred embodiment, as shown in Figure 8, described sun gear pitch curve 401 is that high-order is oval, and exponent number is 4, eccentricity 0.1052, central diameter 154.17mm；Described planetary gear pitch curve 701 is circular, and radius is 35.27mm.Sun gear 4 turns round, and ring gear 1 maintains static.
In a preferred embodiment, as it is shown in figure 9, described ring gear pitch curve 101 is higher hamonic wave curve, exponent number is 6, amplitude coefficient 0.0626, central diameter 534.13mm；Described planetary gear pitch curve 701 is circular, radius 85mm.Sun gear 4 maintains static, and ring gear 1 turns round.
In a preferred embodiment, as shown in Figure 10, described sun gear pitch curve 401 is circular, radius 50mm；Described ring gear pitch curve 101 is oval, eccentricity 0.2736, central diameter 346.82mm；Described planetary gear pitch curve 701 is circular, radius 63.14mm.Sun gear 4 does eccentric revolution, and eccentric throw is 27.53mm.
Three above embodiment is preferred embodiment, it is not excluded that other combinations, those skilled in the art are it is to be understood that any apparent variation is all within protection domain of the present utility model.
High-efficient grinding polishing processing device described in the utility model, in precise finiss polishing processing, the distance between the sun gear centre of gyration 402 and finishing ring or the centre of gyration of planetary gear 7, is not constant, but with grinding and polishing change process time.By the constant eccentric distance e in above-mentioned grinding and polishing equation of locus, change into the variable relevant to time t, and then improve the distributing homogeneity of grinding and polishing track, reach to improve the purpose of accurate ultra grinding and polishing machining accuracy and efficiency.
The beneficial effects of the utility model are embodied in:
1) grinding and polishing track is uniformly distributed at surface to be machined, improves precision and the efficiency of the processing of accurate ultra grinding and polishing.
2) grinding and polishing pad can place multiple planetary gear 7 simultaneously, process multiple workpiece 5, and the motion of planetary gear 7 is completed by the engaged transmission of sun gear 4 and ring gear 1, it is not necessary to independent driver element.
3) large-size workpiece 5 can with place that planetary gear 7 is concentric places, be conducive to reducing equipment size, improve equipment precision.
4) if not using grinding and polishing dish to load, and adopt the load mode of trimming ring type polishing grinding equipment, then can be used for the processing of one side grinding and polishing.
5) it is applicable to produce in enormous quantities.
6) device structure is simple, low cost of manufacture.
Described above to the disclosed embodiments, makes professional and technical personnel in the field be capable of or uses this utility model.The multiple amendment of these embodiments be will be apparent from for those skilled in the art, and generic principles defined herein when without departing from spirit or scope of the present utility model, can realize in other embodiments.Therefore, this utility model is not intended to be limited to the embodiments shown herein, and is to fit to the widest scope consistent with principles disclosed herein and features of novelty.
Claims (10)
1. a high-efficient grinding polishing processing device, it is characterised in that including: sun gear, planetary gear and ring gear, has at least one for non-circular gear in wherein said sun gear, described planetary gear and described ring gear three, three collectively forms not rounded planetary wheeling mechanism；Offering loading hole in described planetary gear, workpiece is placed in the loading hole of described planetary gear, and described planetary gear is meshed with described sun gear and described ring gear respectively.
2. high-efficient grinding polishing processing device as claimed in claim 1, it is characterised in that: the pitch curve of described sun gear is the one in high-order ellipse, higher hamonic wave curve, ellipse, circular；The pitch curve of described planetary gear is the one in high-order ellipse, higher hamonic wave curve, ellipse, circular；The pitch curve of described ring gear is the one in high-order ellipse, higher hamonic wave curve, ellipse, circular.
3. high-efficient grinding polishing processing device as claimed in claim 1, it is characterized in that: also including grinding and polishing dish, lower grinding and polishing dish, wherein said upper grinding and polishing dish, described not rounded planetary wheeling mechanism, described lower grinding and polishing dish three be arranged in parallel from top to bottom；Workpiece lower surface contacts with described lower grinding and polishing dish, is pressed on workpiece surface under described upper grinding and polishing dish.
4. the high-efficient grinding polishing processing device as described in as arbitrary in claim 1-3, it is characterised in that: also include working fluid feed mechanism, drive structure and control unit.
5. high-efficient grinding polishing processing device as claimed in claim 4, it is characterised in that: described sun gear pitch curve is that high-order is oval, and described planetary gear pitch curve is circular.
6. high-efficient grinding polishing processing device as claimed in claim 5, it is characterised in that: described sun gear pitch curve is that high-order is oval, and exponent number is 4, eccentricity 0.1052, central diameter 154.17mm；Described planetary gear pitch curve is circular, and radius is 35.27mm.
7. high-efficient grinding polishing processing device as claimed in claim 4, it is characterised in that: described ring gear pitch curve is higher hamonic wave curve, and described planetary gear pitch curve is circular.
8. high-efficient grinding polishing processing device as claimed in claim 7, it is characterised in that: described ring gear pitch curve is higher hamonic wave curve, and exponent number is 6, amplitude coefficient 0.0626, central diameter 534.13mm；Described planetary gear pitch curve is circular, radius 85mm.
9. high-efficient grinding polishing processing device as claimed in claim 4, it is characterised in that: described sun gear pitch curve is circular；Described ring gear pitch curve is oval；Described planetary gear pitch curve is circular.
10. high-efficient grinding polishing processing device as claimed in claim 9, it is characterised in that: described sun gear pitch curve is circular, radius 50mm；Described ring gear pitch curve is oval, eccentricity 0.2736, central diameter 346.82mm；Described planetary gear pitch curve is circular, radius 63.14mm.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201620120062.0U CN205394244U (en) | 2016-02-15 | 2016-02-15 | High -efficient grinding and polishing processingequipment |
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| Application Number | Priority Date | Filing Date | Title |
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| CN201620120062.0U CN205394244U (en) | 2016-02-15 | 2016-02-15 | High -efficient grinding and polishing processingequipment |
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| CN205394244U true CN205394244U (en) | 2016-07-27 |
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| CN201620120062.0U Withdrawn - After Issue CN205394244U (en) | 2016-02-15 | 2016-02-15 | High -efficient grinding and polishing processingequipment |
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Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN105643433A (en) * | 2016-02-15 | 2016-06-08 | 张欣 | Efficient grinding and polishing machining device |
| CN107401494A (en) * | 2017-09-06 | 2017-11-28 | 西南交通大学 | A kind of piston type air compressor |
| CN110153839A (en) * | 2019-06-06 | 2019-08-23 | 中国工程物理研究院激光聚变研究中心 | Unified polishing immersion element processing unit (plant), processing method and polishing machine |
-
2016
- 2016-02-15 CN CN201620120062.0U patent/CN205394244U/en not_active Withdrawn - After Issue
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN105643433A (en) * | 2016-02-15 | 2016-06-08 | 张欣 | Efficient grinding and polishing machining device |
| CN105643433B (en) * | 2016-02-15 | 2018-11-06 | 张欣 | A kind of high-efficient grinding polishing processing device |
| CN107401494A (en) * | 2017-09-06 | 2017-11-28 | 西南交通大学 | A kind of piston type air compressor |
| CN110153839A (en) * | 2019-06-06 | 2019-08-23 | 中国工程物理研究院激光聚变研究中心 | Unified polishing immersion element processing unit (plant), processing method and polishing machine |
| CN110153839B (en) * | 2019-06-06 | 2023-12-26 | 中国工程物理研究院激光聚变研究中心 | Full-caliber polishing immersed element processing device, processing method and polishing machine |
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