CN205231032U - Positioning apparatus - Google Patents
Positioning apparatus Download PDFInfo
- Publication number
- CN205231032U CN205231032U CN201521070919.4U CN201521070919U CN205231032U CN 205231032 U CN205231032 U CN 205231032U CN 201521070919 U CN201521070919 U CN 201521070919U CN 205231032 U CN205231032 U CN 205231032U
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- CN
- China
- Prior art keywords
- glass substrate
- electrostatic chuck
- positioner
- baseplate carrier
- electrode
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
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- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
Abstract
The utility model discloses a positioning apparatus, it is used for bearing and fixing a position glass substrate, and it is including being used for accepting glass substrate's base plate microscope carrier and installing two electrostatic chuck on the base plate microscope carrier, two electrostatic chuck are exerted behind positive DC voltage and the negative direct -current voltage respectively, glass substrate is positioned the base plate microscope carrier. Owing to have the electrostatic chuck who installs on the base plate microscope carrier in the positioning apparatus, make through electrostatic chuck to produce the appeal between glass substrate and the base plate microscope carrier and on firmly being positioned glass substrate for the base plate microscope carrier, avoid glass substrate to take place to squint and cause the glass substrate piece at the removal in -process of base plate microscope carrier.
Description
Technical field
The utility model relates to panel and manufactures field, particularly relates to a kind of for carrying and the positioner of Locating Glass substrate.
Background technology
In recent years, along with the lasting increase of the prevailing of high-resolution smart mobile phone and smart mobile phone screen average-size, based on the panel demand of low temperature polycrystalline silicon (LowTemperaturePoly-Silicon, LTPS) technology by Continued.In above-mentioned panel manufacturing process, when needs are return in furnace apparatus in sclerosis, rapid thermal annealing (RapidThermalAnnealing is carried out to glass substrate, RTA) during technique, the Main Function of this technique is that the interior tissue making glass basic reaches or close to poised state, and then obtains good processing performance and serviceability.Carrying out in RTA technical process, a kind of implementation of prior art is be positioned over by glass substrate on the baseplate carrier be made up of quartz material, baseplate carrier is then positioned on a conveyer, glass substrate under the drive of conveyer in overcure annealing furnace each treatment region carry out RTA technique.
But, in the transport process of glass substrate, the process that the baseplate carrier accepting glass substrate may have acceleration and slow down, simultaneously because the relative friction forces between glass substrate and baseplate carrier is less than the possibility of glass substrate self inertia power, this just causes glass substrate can drift about on baseplate carrier, causes the abnormal conditions such as glass substrate fragment.
Utility model content
The purpose of this utility model is to solve the problem, and provides a kind of and can ensure that glass substrate can by the positioner of good location in transport process.
For achieving the above object, the utility model provides a kind of positioner, for carrying also Locating Glass substrate, the electrostatic chuck that described positioner comprises the baseplate carrier for accepting glass substrate and is installed on baseplate carrier, after described electrostatic chuck is applied in direct voltage, described glass substrate is positioned baseplate carrier.
Further, described electrostatic chuck is bipolar electrostatic chuck.
Further, described electrostatic chuck is two, is provided with the first electrode and the second electrode in each described electrostatic chuck.
Further, described direct voltage comprises positive direct-current voltages and negative dc voltage, and described positive direct-current voltages puts on the first electrode in an electrostatic chuck, and described negative dc voltage puts on the second electrode of another electrostatic chuck.
Further, described two electrostatic chucks connect power supply respectively.
Further, the lower surface of described baseplate carrier is provided with two accepting grooves, and described two electrostatic chucks lay respectively in described two accepting grooves.
Further, described positioner is positioned on the conveyer of sclerosis annealing furnace.
Further, a part for described conveyer is contained in described accepting groove.
Compared with prior art, in the positioner that the utility model embodiment provides, there is the electrostatic chuck be installed on baseplate carrier, make to produce attraction between glass substrate and baseplate carrier by electrostatic chuck and glass substrate is securely in place on baseplate carrier, avoiding glass substrate skew occurs in the moving process of baseplate carrier and causes glass substrate fragment.
Accompanying drawing explanation
Accompanying drawing described herein is used to provide further understanding of the present utility model, forms a part of the present utility model, and schematic description and description of the present utility model, for explaining the utility model, is not formed improper restriction of the present utility model.In the accompanying drawings:
The cross sectional view of the positioner that Fig. 1 provides for the utility model preferred embodiment;
Fig. 2 coordinates schematic diagram with glass substrate and conveyer for the positioner shown in Fig. 1;
Fig. 3 is the schematic diagram of the electrostatic chuck in positioner shown in Fig. 1.
Embodiment
For making the purpose of this utility model, technical scheme and advantage clearly, below in conjunction with the utility model specific embodiment and corresponding accompanying drawing, technical solutions of the utility model are clearly and completely described.Obviously, described embodiment is only the utility model part embodiment, instead of whole embodiments.Based on the embodiment in the utility model, those of ordinary skill in the art are not making the every other embodiment obtained under creative work prerequisite, all belong to the scope of the utility model protection.
As shown in Figure 1 and Figure 2, the utility model preferred embodiment provides one and is applied to the positioner 100 hardened in annealing furnace (not shown), and this positioner 100 is for locating the glass substrate 3 needing to carry out rapid thermal anneal process.Needs illustrate, have the circulating conveyer 200 that can transmit positioner 100 in sclerosis annealing furnace, conveyer 200 can transmit process continuously to positioner 100 and glass substrate 3, i.e. online (in-line) process.Concrete, this conveyer 200 can be a guide rail structure.
When glass substrate 3 needs to carry out rapid thermal anneal process, glass substrate 3 can be positioned on the baseplate carrier 1 of positioner 100, under the drive of conveyer 200, glass substrate 3 together enters in sclerosis annealing furnace with positioner 100 and carries out transmitting and heating simultaneously, after completing rapid thermal annealing, glass substrate 3 is transferred out sclerosis annealing furnace together with positioner 100.
Particularly, positioner 100 comprises: baseplate carrier 1 and two electrostatic chucks (ElectrostaticChuck, ESC) 2 be installed on below baseplate carrier 1.Element in the positioner 100 provided for the utility model preferred embodiment below illustrates.
As shown in Figures 1 and 2, baseplate carrier 1 is in tabular, and it is made up of quartz material.Baseplate carrier 1 comprise one can bearing glass substrate 3 upper surface 11 and the lower surface 12 of electrostatic chuck 2 can be installed.Baseplate carrier 1 can be positioned on conveyer 200, and under the drive of conveyer 200, baseplate carrier 1 passes in and out sclerosis annealing furnace.The lower surface 12 of baseplate carrier 1 is provided with two accepting grooves 13 can accommodating two electrostatic chucks 2, and a portion of conveyer 200 extends in above-mentioned accepting groove 13.Concrete, two electrostatic chucks 2 are placed in the interior sidewall surface of two accepting grooves 13 respectively.Two electrostatic chucks 2 together move under the drive of conveyer 200 with baseplate carrier 1.
As shown in Figure 3, preferably, two electrostatic chucks 2 can be all bipolar electrostatic chuck.Each electrostatic chuck 2 inside is provided with the first electrode 21 and the second electrode 22.First electrode 21 and the second electrode 22 can be made up of thin conductor material, as Copper Foil is made.First electrode 21 and the second electrode 22 are communicated with power supply.Concrete, the first electrode 21 is connected with power supply 20a, and the second electrode 22 is connected with power supply 20b.Positive direct-current voltages can be applied to the first electrode 21 by power supply 20a, negative dc voltage can be applied to the second electrode 22 by power supply 20b.Two electrostatic chuck 2 structures are identical, and one of them can be called the first electrostatic chuck, and another can be called the second electrostatic chuck.
After positive direct-current voltages is applied to the first electrode 21 of the first electrostatic chuck 2 be positioned at below baseplate carrier 1, the first electrode 21 in the first electrostatic chuck 2 can produce polarization charge, the first electrode 21 can produce positive charge.Meanwhile, the position that baseplate carrier 1 is corresponding with this first electrostatic chuck 2 also produces positive charge simultaneously.Above-mentioned corresponding position refers to position corresponding in the vertical direction with the first electrostatic chuck 2 on baseplate carrier 1, or refers to baseplate carrier 1 is positioned at the position of homonymy with the first electrostatic chuck 2.This corresponding position can set as required.As shown in Figure 2, the position that baseplate carrier 1 is corresponding with this first electrostatic chuck 2 is the left side of baseplate carrier 1.Because above-mentioned positive charge can produce electric field, make the generation polarization charge of the position being placed in positive charge on lower surface counterpart substrate microscope carrier 1 on the left of the glass substrate 3 on baseplate carrier 1, this polarization charge is contrary with the charge polarity be distributed on the first electrostatic chuck 2, namely produces negative electrical charge below on the left of glass substrate 3.Due to the electric charge principle that there is a natural attraction between the sexes, the left side of glass substrate 3 and the left side of baseplate carrier 1 are located mutually.
While positive direct-current voltages is applied to the first electrode 21 of the first electrostatic chuck 2 be positioned at below baseplate carrier 1, after negative dc voltage is applied to the second electrode 22 of the second electrostatic chuck 2 be positioned at below baseplate carrier 1, the second electrode 22 in second electrostatic chuck 2 can produce polarization charge, the second electrode 22 can produce negative electrical charge.Meanwhile, the position that baseplate carrier 1 is corresponding with this second electrostatic chuck 2 also produces negative electrical charge simultaneously.As shown in Figure 2, the position that baseplate carrier 1 is corresponding with this second electrostatic chuck 2 is the right side of baseplate carrier 1.Because above-mentioned negative electrical charge can produce electric field, make the generation polarization charge of the position being placed in negative electrical charge on lower surface counterpart substrate microscope carrier 1 on the right side of the glass substrate 3 on baseplate carrier 1, this polarization charge is contrary with the charge polarity be distributed on the second electrostatic chuck 2, namely produces positive charge below on the right side of glass substrate 3.Due to the electric charge principle that there is a natural attraction between the sexes, the right side of glass substrate 3 and the right side of baseplate carrier 1 are located mutually.
Due to the existence of two electrostatic chucks 2, the left and right sides of glass substrate 3 is all mutually located with the both sides of baseplate carrier 1 and is made glass substrate 3 be securely in place baseplate carrier 1.In addition, when glass substrate 3 needs to take off from baseplate carrier 1, negative dc voltage and positive direct-current voltages can be applied respectively respectively on the second electrode 22 of the first electrostatic chuck 2 and the first electrode 21 of the second electrostatic chuck 2, eliminate the positive and negative charge resulting from baseplate carrier 1 left and right sides, thus eliminate attraction.Like this, glass substrate 3 just can take off from baseplate carrier 1.
In sum, there is in the positioner 100 that the utility model embodiment provides the electrostatic chuck 2 be installed on baseplate carrier 1, make to produce attraction between glass substrate 3 and baseplate carrier 1 by electrostatic chuck 2 and glass substrate 3 is securely in place on baseplate carrier 1, avoiding glass substrate 3 skew occurs in the moving process of baseplate carrier 1 and causes glass substrate fragment.
Above-described instantiation; the purpose of this utility model, technical scheme and beneficial effect are further described; be understood that; the foregoing is only specific embodiment of the utility model; be not limited to the utility model; all within spirit of the present utility model and principle, any amendment made, equivalent replacement, improvement etc., all should be included within protection range of the present utility model.
Claims (8)
1. a positioner, for carrying also Locating Glass substrate, it is characterized in that: the electrostatic chuck that described positioner comprises the baseplate carrier for accepting glass substrate and is installed on baseplate carrier, after described electrostatic chuck is applied in direct voltage, described glass substrate is positioned baseplate carrier.
2. positioner as claimed in claim 1, it is characterized in that, described electrostatic chuck is bipolar electrostatic chuck.
3. positioner as claimed in claim 2, it is characterized in that, described electrostatic chuck is two, is provided with the first electrode and the second electrode in each described electrostatic chuck.
4. positioner as claimed in claim 3, it is characterized in that, described direct voltage comprises positive direct-current voltages and negative dc voltage, and described positive direct-current voltages puts on the first electrode in an electrostatic chuck, and described negative dc voltage puts on the second electrode of another electrostatic chuck.
5. positioner as claimed in claim 1, it is characterized in that, described two electrostatic chucks connect power supply respectively.
6. positioner as claimed in claim 1, it is characterized in that, the lower surface of described baseplate carrier is provided with two accepting grooves, and described two electrostatic chucks lay respectively in described two accepting grooves.
7. positioner as claimed in claim 6, is characterized in that, described positioner is positioned on the conveyer of sclerosis annealing furnace.
8. positioner as claimed in claim 7, it is characterized in that, a part for described conveyer is contained in described accepting groove.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201521070919.4U CN205231032U (en) | 2015-12-21 | 2015-12-21 | Positioning apparatus |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201521070919.4U CN205231032U (en) | 2015-12-21 | 2015-12-21 | Positioning apparatus |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN205231032U true CN205231032U (en) | 2016-05-11 |
Family
ID=55906078
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201521070919.4U Expired - Fee Related CN205231032U (en) | 2015-12-21 | 2015-12-21 | Positioning apparatus |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN205231032U (en) |
-
2015
- 2015-12-21 CN CN201521070919.4U patent/CN205231032U/en not_active Expired - Fee Related
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20160511 Termination date: 20191221 |
|
| CF01 | Termination of patent right due to non-payment of annual fee |