CN205112578U - High barrier film and complex film - Google Patents
High barrier film and complex film Download PDFInfo
- Publication number
- CN205112578U CN205112578U CN201520638870.1U CN201520638870U CN205112578U CN 205112578 U CN205112578 U CN 205112578U CN 201520638870 U CN201520638870 U CN 201520638870U CN 205112578 U CN205112578 U CN 205112578U
- Authority
- CN
- China
- Prior art keywords
- resistant diaphragm
- layer
- hardened layer
- diaphragm according
- film
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
Landscapes
- Laminated Bodies (AREA)
Abstract
The utility model provides a high barrier film and complex film, high barrier film includes the polymer matrix material to and the single face of polymer matrix material or the two -sided barrier layer that sets up of going up, at least one side surface of high barrier film is provided with the sclerosis layer, and the sclerosis layer is the photocuring resin. The utility model discloses to present high barrier film in the shortcoming of volume to volume processing with easy embrittlement of transport loading and unloading in -process and fish tail, provide the high barrier film that can improve the damage resistant and prevent piercing through the performance, can guarantee the stable height oxygen performance that blocks water.
Description
Technical field
The utility model belongs to fexible film field, particularly a kind of high-resistant diaphragm and composite membrane.
Background technology
Flexible thin-film solar cell is as OPV(OrganicPhotovoltaic, organic photovoltaic battery) and CIGS(CIGS) with the flexibility of its uniqueness, frivolous performance, be widely used on solar energy knapsack, solar tent, solar electric torch, solar telephone, even solar sailor and aircraft.The important application of another one is BIPV, and it can not need support, is laid in roof, is pasted onto on window, exterior wall and interior wall.
The significant advantages such as organic electroluminescent LED (OLED) has in flat-panel monitor that luminosity is high, rich color, low-voltage direct drive, preparation technology is simple, and less than in the time of 20 years, OLED has entered the industrialization stage.
Flexible thin-film solar cell and OLED are subject to the impact of water oxygen, cause bad stability, therefore need transparent flexible film water oxygen to high-barrier effect to encapsulate it.High-resistant diaphragm conventional mostly now is and utilizes vacuum coating equipment, as evaporation, CVD(ChemicalVaporDeposition, chemical vapour deposition (CVD)), PVD(PhysicalVaporDeposition, physical vapour deposition (PVD)), ALD(AtomicLayerDeposition, ald) etc., flexible polymeric substrate is coated with transparent inorganic thing or nitride.Simultaneously in order to increase the flexibility of coating, organic layer can be added between inorganic coating.And after high-resistant diaphragm product plated film now completes, generally all directly rolling, does not protect barrier layer, causes barrier layer embrittlement in wrapup procedure, the especially inorganic barrier layer that is coated with of sputtering and technique for atomic layer deposition; In addition, high-resistant diaphragm product is subsequently with the volume to volume Compound Machining of other film, transportation and handling procedure, and outer surface very easily damages, and then causes coming off and piercing through of barrier layer coating, causes high-resistant diaphragm entirety to block water the remarkable reduction of oxygen performance.
Utility model content
The technical problems to be solved in the utility model is, for the shortcoming of existing high-resistant diaphragm easily embrittlement and scuffing in volume to volume processing and transportation and handling procedure, there is provided a kind of can raising scratch-resistantly to injure the anti-stab high-resistant diaphragm wearing performance, ensure stable high water resistant oxygen performance.
The utility model solves the problems of the technologies described above adopted technical scheme, provides a kind of high-resistant diaphragm, and described high-resistant diaphragm comprises: be coated with barrier layer at the single or double of polymeric substrate, barrier layer is also provided with hardened layer.
This hardened layer, as the outer surface of high-resistant diaphragm, plays anti-scratch and anti-pierces through performance, and then avoids the scuffing because of barrier layer to come off or pierce through and cause high-resistant diaphragm to block water the remarkable reduction of oxygen performance.
Preferably, hardened layer is light-cured resin, such as urethane acrylate, polyester acrylate, epoxy acrylate, polyalcohol acrylate, epoxy resin etc.; And preferably there is the monomer of polyfunctionality.
The light transmittance of hardened layer is greater than 95%, and pencil hardness is greater than 2H, prevent outside scuffing, and pulls intensity is better, can share the internal stress during bending of high-resistant diaphragm winding.
Further, the thickness of hardened layer is preferably 2 ~ 20 μm (microns).
Hardened layer can adopt coating process to be prepared from, such as, can adopt scraper for coating method, rolling method, scraper plate rubbing method, spraying process, gravure coating process etc., but is not limited to coating process and makes.
Described high-resistant diaphragm is transparent flexible high-resistant diaphragm, high to water and oxygen barrier property, WVTR(WaterVaporTransmissionRate, permeability rate) be less than 10
-3g/m
2day.
Further, between the barrier layer and hardened layer of high-resistant diaphragm, flexible organic layer is also provided with.
This flexible organic layer, mainly for relaxing the stress of barrier layer, effectively prevents high-resistant diaphragm from volume to volume Compound Machining and wrapup procedure, causing the embrittlement of barrier layer, especially adopts inorganic barrier layer prepared by sputtering or atom layer deposition process.
Preferably, flexible organic layer can adopt light-cured resin, and the monomer of preferred low degree of functionality.
The thickness of flexible organic layer is generally 5 ~ 50 μm.
Flexible organic layer can adopt but be not limited to the coating techniques such as scraper for coating method, rolling method, scraper plate rubbing method, spraying process, gravure coating process and be prepared from.
In addition; the utility model additionally provides a kind of composite membrane; by above-mentioned high-resistant diaphragm further with other thin-film materials as the Compound Machining such as ETFE film become the header board composite membrane of flexible encapsulant material; be applied to electron display device or solar film battery assembly etc., can available protecting core devices by the erosion of water oxygen.
Compared with prior art, the utility model by applying hardened layer on barrier layer, improves scratch-resistant the injuring in the surface of high-resistant diaphragm and anti-stably wears performance, thus can stand the various damages in machining; In addition, also can add flexible organic layer between barrier layer and hardened layer, guarantee in later stage Compound Machining, handling cuts in use procedure, through the impact of Tensile, friction, kink, impact, stable high water resistant oxygen performance can be kept, keep the high-transmittance of more than 95% simultaneously.
Accompanying drawing explanation
Fig. 1 is the structural representation of the high-resistant diaphragm of the utility model embodiment one.
Fig. 2 is the structural representation of the high-resistant diaphragm of the utility model embodiment two.
Detailed description of the invention
Below in conjunction with drawings and the specific embodiments, the utility model embodiment is elaborated further.
Embodiment one: shown in composition graphs 1, the high-resistant diaphragm of the present embodiment comprises from bottom to top successively: base material 1, barrier layer 2 and hardened layer 3.
Wherein, base material 1 is general transparent polymeric support, is not particularly limited, can carries out unrestricted choice according to application target etc. to the material of base material and thickness.Specifically can exemplify polyester film, nylon membrane, polypropylene film, transparent fluororesin, polyamide, fluoridize polyamide, polyimides, polyimide amide, polytrimethylene ether acid amides, epoxy resin, Merlon, polyurethane resin, polytrimethylene ether ethyl ketone ester, ester ring type polysulfones, polyether sulfone, polyacrylate, polytrimethylene ether, fluorenes ring sex change Merlon, alicyclic ring sex change Merlon, fluorenes ring sex change polyester, cyclic olefine copolymer etc.Preferred PETG film (PET), nylon membrane (PA).The thickness of the utility model to base material 1 is not particularly limited, preferably 10 ~ 250 μm.
The composition of the barrier layer 2 in the utility model can be inorganic barrier layer, as metal oxide, nitrogen oxide, oxycarbide etc., more specifically optional from containing silicon, aluminium, tin, zinc, titanium, magnesium, zirconium, nickel, cobalt, iron, plumbous, copper, palladium, the oxide of one or more metals such as indium, nitrogen oxide, oxycarbide, carbonitride, carbon nitrogen oxide.Wherein, preferred silicon, aluminium, tin, zinc, the metal oxide of titanium, nitride and nitrogen oxide, more preferably silicon, the metal oxide of aluminium, nitride and nitrogen oxide, can also contain other auxiliary element.But this transparent barrier layer 2 is not limited to inorganic barrier layer, also can be organic barrier layer.This barrier layer 2 mainly plays and intercepts the effect of water oxygen, and protection internal layer is not by water oxygen attack.
Being coated with of barrier layer 2 can adopt but be not limited to vacuum coating equipment, suitably selects according to selected barrier layer constituent kind.Preparation method can using plasma chemical vapour deposition technique, sputtering method, evaporation send out, atomic layer deposition method etc., also can adopt sol-gal process.The thickness of barrier layer is preferably 20 ~ 300nm(nanometer).
Hardened layer 3 in the utility model is light-cured resin, such as urethane acrylate, polyester acrylate, epoxy acrylate, polyalcohol acrylate, epoxy resin etc.And preferably there is the monomer of polyfunctionality, further, be preferably greater than (or equaling) 3 methacrylate monomers of degree of functionality, such as trimethyol propane triacrylate, pentaerythritol triacrylate, pentaerythritol tetracrylate, three (3-acryloxypropyl) isocyanuric acid ester etc., they may be used alone, can also be used in combination.After the acrylate monomer film-forming of high functionality, crosslink density is high, therefore, effectively can improve the hardness after film forming and scratch resistance capability.Light trigger can select IRGACURE184,1172,2959, the efficient non yellowing ultraviolet absorber such as DAROCUR1173.Other additive all can add not affecting effect of the present utility model.
The coating technique of hardened layer 3 is not restricted, such as, can adopt the wet coating techniques such as scraper for coating method, rolling method, scraper plate rubbing method, spraying process and gravure coating process.
The thickness of hardened layer 3 is preferably 2-20 μm.
Further, the light transmittance of hardened layer 3 is greater than 95%, and hardness is greater than 2H, can prevent outside scuffing, and pulls intensity is better, effectively can share the internal stress during bending of high-resistant diaphragm winding.
Embodiment two: shown in composition graphs 2, the high-resistant diaphragm of the present embodiment comprises from bottom to top successively: base material 1, barrier layer 2, flexible organic layer 4 and hardened layer 3.
Base material 1 in the present embodiment, barrier layer 2 and hardened layer 3 are all identical with previous embodiment one.The difference of the present embodiment and previous embodiment one is, is provided with flexible organic layer 4 between barrier layer 2 and hardened layer 3.
Wherein, flexible organic layer 4, for for hardened layer 3, is also specifically light-cured resin, such as urethane acrylate, polyester acrylate, epoxy acrylate, polyalcohol acrylate, epoxy resin etc.Preferred low functionality monomer, be further preferably less than (or equaling) 2 acrylate monomer of degree of functionality, such as diacrylate 1,6-hexylene glycol ester, diacrylic acid pentyl diol ester etc., they may be used alone, can also be used in combination.Light trigger is also optional uses above-mentioned ultraviolet absorber.The organic layer formed has better pliability, for slowing down barrier layer internal stress, plays cushioning effect in addition between hardened layer 3 and barrier layer 2.
The light transmittance of flexible organic layer 4 is greater than 95%.Further, the thickness of flexible organic layer is generally 5 ~ 50 μm, preferably 5 ~ 20 μm.
The coating technique of flexible organic layer 4 is not restricted, and can adopt but be not limited to the wet coating techniques such as scraper for coating method, rolling method, scraper plate rubbing method, spraying process and gravure coating process.
Below with reference to CIGS(CIGS) some application examples of high-resistant diaphragm of adopting in solar film battery assembly and comparative example, the specific performance of high-resistant diaphragm of the present utility model and test data are described.
Application example 1: the production technology of the high-resistant diaphragm of this example, comprises following key step: 1) be base material with polyester film, is coated with the thick barrier silicon oxide layer of 100nm by PVD equipment; 2) utilize gravure coating process, barrier silicon oxide layer applies high functionality methyl acrylic ester photocuring hardened layer, coating thickness 20 μm.
Application example 2: the production technology of the high-resistant diaphragm of this example, comprises following key step: 1) be base material with polyester film, is coated with the thick barrier alumina layer of 20nm by atomic layer deposition apparatus (ALD); 2) utilize gravure coating process, barrier alumina layer applies the flexible organic layer of low degree of functionality esters of acrylic acid, and coating thickness is 5 μm; 3) utilize gravure coating process, esters of acrylic acid organic layer applies methyl acrylic ester photocuring hardened layer, coating thickness is 2 μm.
Application example 3: the production technology of the high-resistant diaphragm of this example, comprises following key step: 1) be base material with polyester film, is coated with the thick barrier silicon oxide layer of 200nm by PECVD device; 2) utilize gravure coating process, barrier silicon oxide layer applies low degree of functionality esters of acrylic acid organic layer, and coating thickness is 20 μm; 3) utilize gravure coating process, above-mentioned organic layer applies high functionality methyl acrylic ester photocuring hardened layer, and coating thickness is 20 μm.
Comparative example 1: a kind of production technology of high-resistant diaphragm, comprises following key step: 1) be base material with polyester film, is coated with the thick barrier alumina layer of 20nm by ALD equipment.2) utilize gravure coating process, barrier alumina layer applies esters of acrylic acid organic layer, coating thickness is 50 μm.
Comparative example 2: a kind of production technology of high-resistant diaphragm, comprises following key step: 1) be base material with polyester film, is coated with the thick barrier silicon oxide layer of 200nm by PECVD device.
Wherein, the barrier layer that in above-mentioned each application example and comparative example, different vacuum coating equipment is coated with, tests through Mocon Inc. (MOCON) permeability tester: permeability rate (WVTR) is 5 × 10
-3g/m
2day (38 DEG C, 90%RH).
To high-resistant diaphragm obtained in above-mentioned each application example and comparative example, by adhesive, being combined with each other obtains composite membrane with other rete (as ETFE film etc.), then process cuts into pieces, and tests its permeability rate WVTR, the results are shown in following table 1.Be packaged together by glued membrane with CIGS cell piece and backboard again.Above-mentioned CIGS battery component, at 85 DEG C, tests its conversion efficiency after hydrothermal aging 1000h under 85%RH again, and aging front and back conversion efficiency sees the following form 1.
| Testing battery | The Obstruct membrane adopted | Composite membrane WVTR | Aging front conversion efficiency | Aging rear conversion efficiency |
| CIGS battery | Embodiment 1 | 5×10 -3 | 12.6% | 11.3% |
| CIGS battery | Embodiment 2 | 5×10 -3 | 12.6% | 11.5% |
| CIGS battery | Embodiment 3 | 5×10 -3 | 12.6% | 11.7% |
| CIGS battery | Comparative example 1 | 7×10 -2 | 11.5% | 9.7% |
| CIGS battery | Comparative example 2 | 0.3 | 10.8% | 8.9% |
Table 1
According to the data in table 1, adopt the high-resistant diaphragm that the production technology in the utility model application example is obtained, gluing rear obtained solar module is cut by compound, its conversion efficiency is better, less by the change of environment hydrothermal aging properties, and the solar module that the high-resistant diaphragm that comparative example 1 and comparative example 2 obtain is made by same processes, large by environment hydrothermal aging performance change, its main cause is exactly that the barrier property of barrier layer is destroyed, cause water oxygen to the erosion of battery, have influence on photoelectric transformation efficiency.
Claims (10)
1. a high-resistant diaphragm, comprises polymeric substrate, and the barrier layer of the one side of described polymeric substrate or two-sided upper setting, it is characterized in that, at least one side external surface of described high-resistant diaphragm is provided with hardened layer, and described hardened layer is light-cured resin.
2. high-resistant diaphragm according to claim 1, is characterized in that,
Described hardened layer is esters of acrylic acid light-cured resin or the epoxy resin light-cured resin of polyfunctionality.
3. high-resistant diaphragm according to claim 2, is characterized in that,
Described hardened layer selects one or more combinations independent of the methacrylate monomers being more than or equal to 3 degrees of functionality.
4. the high-resistant diaphragm according to Claims 2 or 3, is characterized in that,
Also be provided with flexible organic layer between described barrier layer and described hardened layer, described flexible organic layer is esters of acrylic acid light-cured resin or the epoxy resin light-cured resin of low degree of functionality.
5. high-resistant diaphragm according to claim 4, is characterized in that,
Described flexible organic layer selects one or more combinations independent of the acrylate monomer being less than or equal to 2 degrees of functionality.
6. the high-resistant diaphragm according to claim 1,2 or 3, is characterized in that,
Described hardened layer adopts coating process to be prepared from, and the thickness of described hardened layer is 2 ~ 20 μm.
7. the high-resistant diaphragm according to claim 1,2 or 3, is characterized in that,
The pencil hardness of described hardened layer is greater than 2H.
8. high-resistant diaphragm according to claim 1, is characterized in that,
Described barrier layer is oxide, nitrogen oxide, oxycarbide, carbonitride, the carbon nitrogen oxide of one or more metals.
9. a composite membrane, described composite membrane is made up of the high-resistant diaphragm described in any one of claim 1 to 8 and other thin-film material Compound Machining.
10. composite membrane according to claim 9, is characterized in that, described composite membrane is applied to electron display device or solar film battery.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201520638870.1U CN205112578U (en) | 2015-08-21 | 2015-08-21 | High barrier film and complex film |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201520638870.1U CN205112578U (en) | 2015-08-21 | 2015-08-21 | High barrier film and complex film |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN205112578U true CN205112578U (en) | 2016-03-30 |
Family
ID=55568219
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201520638870.1U Active CN205112578U (en) | 2015-08-21 | 2015-08-21 | High barrier film and complex film |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN205112578U (en) |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN106476388A (en) * | 2015-08-21 | 2017-03-08 | 汉能新材料科技有限公司 | A kind of high-resistant diaphragm and composite membrane |
| CN106903954A (en) * | 2016-04-08 | 2017-06-30 | 宁波长阳科技股份有限公司 | A kind of steam oxygen blocking barrier film and preparation method thereof |
| CN108570159A (en) * | 2017-03-07 | 2018-09-25 | 宁波惠之星新材料科技有限公司 | A kind of water vapor rejection film and preparation method thereof |
| CN113937417A (en) * | 2021-10-27 | 2022-01-14 | 长园泽晖新能源材料研究院(珠海)有限公司 | Photocuring modified lithium ion battery diaphragm and preparation method thereof |
-
2015
- 2015-08-21 CN CN201520638870.1U patent/CN205112578U/en active Active
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN106476388A (en) * | 2015-08-21 | 2017-03-08 | 汉能新材料科技有限公司 | A kind of high-resistant diaphragm and composite membrane |
| CN106903954A (en) * | 2016-04-08 | 2017-06-30 | 宁波长阳科技股份有限公司 | A kind of steam oxygen blocking barrier film and preparation method thereof |
| CN108570159A (en) * | 2017-03-07 | 2018-09-25 | 宁波惠之星新材料科技有限公司 | A kind of water vapor rejection film and preparation method thereof |
| CN113937417A (en) * | 2021-10-27 | 2022-01-14 | 长园泽晖新能源材料研究院(珠海)有限公司 | Photocuring modified lithium ion battery diaphragm and preparation method thereof |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN106476388A (en) | A kind of high-resistant diaphragm and composite membrane | |
| CN205112578U (en) | High barrier film and complex film | |
| CN104508849B (en) | Laminate, the manufacture method of laminate, electrode, EL element, planar luminous body and solar cell | |
| CN101837667B (en) | Ultraviolet cured coating and application thereof | |
| US20180179643A1 (en) | Laminated film and method for manufacturing laminated film | |
| JP6970022B2 (en) | Ultra-thin barrier laminates and devices | |
| JP5966821B2 (en) | Gas barrier laminated film | |
| TWI654084B (en) | Multilayer film and composite film manufacturing method | |
| JP6441484B2 (en) | Laminated film | |
| JP5567934B2 (en) | Amorphous silicon nitride film and method for manufacturing the same, gas barrier film, organic electroluminescence element, method for manufacturing the same, and sealing method | |
| JP5580561B2 (en) | Barrier laminate, gas barrier film, and method for producing barrier laminate | |
| CN206179880U (en) | Multilayer composite films is used in flexible solar cell encapsulation | |
| JP2013111874A (en) | Gas barrier base material and gas barrier laminate | |
| JP2013188871A (en) | Gas barrier laminated film | |
| CN102086317B (en) | Vacuum plating and ultraviolet curing coating for mobile phone | |
| CN202322705U (en) | PVC (polyvinyl chloride) protective film | |
| JP6260412B2 (en) | Gas barrier film | |
| JP2013095111A (en) | Gas barrier laminated film | |
| TWI606934B (en) | Water-Vapor Barrier Material | |
| CN103589307A (en) | High-filling UV (ultraviolet) transparent primer | |
| JP5927943B2 (en) | GAS BARRIER FILM, MANUFACTURING METHOD THEREOF, AND DEVICE USING GAS BARRIER FILM | |
| CN207250519U (en) | Functional thin film structure and display device having the same | |
| JP2011031434A (en) | Method for forming functional film | |
| JP5757170B2 (en) | Method for producing gas barrier film | |
| JP2016159510A (en) | Gas barrier film and method for producing the same |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| TR01 | Transfer of patent right |
Effective date of registration: 20170829 Address after: 100101, No. 14, building 1, 7, 101, 0801, 3, building 8, building No. 2, West Beichen Road, Chaoyang District, Beijing Patentee after: HANERGY CO-INNO MOBILE ENERGY INVESTMENT Co.,Ltd. Address before: 100101 Beijing, Beichen West Road, No. 8, Beichen Century Center, block B, floor 10, Patentee before: HANERGY NEW MATERIAL TECHNOLOGY Co.,Ltd. |
|
| TR01 | Transfer of patent right | ||
| TR01 | Transfer of patent right |
Effective date of registration: 20190219 Address after: Room 103, Building 2, Office District, Olympic Village, Chaoyang District, Beijing Patentee after: HANERGY PHOTOVOLTAIC TECHNOLOGY Co.,Ltd. Address before: 100101 Beijing Chaoyang District Beichen West Road No. 8 Courtyard 3 Building 1 to 14 Floor 101, 7 Floor 0801 Patentee before: HANERGY CO-INNO MOBILE ENERGY INVESTMENT Co.,Ltd. |
|
| TR01 | Transfer of patent right | ||
| TR01 | Transfer of patent right |
Effective date of registration: 20190313 Address after: Room 107, Building 2, Olympic Village Street Comprehensive Office District, Chaoyang District, Beijing Patentee after: HANERGY MOBILE ENERGY HOLDING GROUP Co.,Ltd. Address before: Room 103, Building 2, Office District, Olympic Village, Chaoyang District, Beijing Patentee before: HANERGY PHOTOVOLTAIC TECHNOLOGY Co.,Ltd. |
|
| TR01 | Transfer of patent right | ||
| PP01 | Preservation of patent right |
Effective date of registration: 20221114 Granted publication date: 20160330 |
|
| PP01 | Preservation of patent right |