CN205099747U - Planar cathode - Google Patents
Planar cathode Download PDFInfo
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- CN205099747U CN205099747U CN201520738884.0U CN201520738884U CN205099747U CN 205099747 U CN205099747 U CN 205099747U CN 201520738884 U CN201520738884 U CN 201520738884U CN 205099747 U CN205099747 U CN 205099747U
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- magnet
- cathode
- regulating rod
- cover plate
- pedestal
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Abstract
The utility model discloses a planar cathode, include: negative pole body base, magnet and aversion mechanism. Negative pole body base is provided with and holds the chamber. The magnet set up one side of target with the restraint electron, form plasma, the magnet is movably set up in hold the intracavity. Aversion mechanism is movably set up in on the negative pole body base, and extend to hold the intracavity drive the magnet removes. The utility model discloses planar cathode passes through the aversion institutional adjustment the magnet is for the target distance to thereby change target surface field intensity distribution, and this adjustment need not the broken sky of filming equipment. Planar cathode adjusts easy operation, adjusts the precision height, can realize the requirement of any harsh rete homogeneity, has guaranteed the product quality of coating film product, has improved the productivity of filming equipment.
Description
Technical field
The utility model relates to a kind of vacuum magnetic-control sputtering equipment, particularly a kind of planar cathode.
Background technology
At present, planar cathode of the prior art does not possess the function directly adjusting magnetic field homogeneity at atmospheric side.Membrane uniformity, in big area magnetic-controlled sputtering coating equipment, is a very important index.Affect a lot of because have of magnetron sputtering film uniformity, the factors such as such as Distribution of Magnetic Field, gas distribution distribution, electric field distribution and sputtering baffle openings.At present, the main method improving membrane uniformity is, ensures the methods such as the opening size of the magnetic field homogeneity of equipment, the homogeneity of gas distribution and adjustment sputtering baffle plate, and comprehensively uses this several method.But, require in very harsh technique at some to membrane uniformity, these modes just cannot realize the technique required, or after realizing, homogeneity can etch gradually along with target and be deteriorated gradually, the later stage needs equipment broken empty, do the adjustment of further filming equipment, cause equipment to stop production, production capacity reduces, or quality product is poor and be difficult to meet specification of quality.
Utility model content
One of the purpose of this utility model is to overcome deficiency of the prior art, provides the planar cathode that a kind of magnetic field relative to target can regulate.
For realizing above object, the utility model is achieved through the following technical solutions:
Planar cathode, comprising:
Cathode pedestal, described cathode pedestal is provided with cavity volume;
Magnet, the side that this magnet is arranged on target, with about beam electrons, forms plasma body;
Shift mechanism;
Described magnet is arranged in described cavity volume movably, and described shift mechanism is arranged on described cathode pedestal movably, and extends in described cavity volume and drive described magnet to move.
According to a preferred embodiment of the present utility model, described shift mechanism comprises regulating rod and setting nut; Described regulating rod runs through described cathode pedestal, and one end is positioned at described cavity volume, the other end to stretch out outside described cavity volume and with described setting nut thread fit; Described regulating rod can be arranged on described cathode pedestal vertically movably; Described regulating rod one end is directly connected with described magnet or is in transmission connection; Described regulating rod and described setting nut one of them arrange rotationally, described regulating rod and described setting nut one of them described regulating rod can be made to move vertically when rotating, described regulating rod drives described magnet to move in moving process vertically.
According to a preferred embodiment of the present utility model, described magnet is arranged on supporting beam, and described supporting beam is arranged in described cavity volume movably, and described regulating rod one end is connected with described supporting beam.
According to a preferred embodiment of the present utility model, described setting nut is provided with scale marks.
According to a preferred embodiment of the present utility model, between described regulating rod and described cathode pedestal, be provided with the first sealing-ring.
According to a preferred embodiment of the present utility model, also comprise limited post, described limited post is provided with the first tube chamber, and described limited post is connected with described cathode pedestal, and described regulating rod is through described first tube chamber; Described setting nut is arranged on described limited post end.
According to a preferred embodiment of the present utility model, described setting nut is arranged rotationally.
According to a preferred embodiment of the present utility model, also comprise cover plate, described cover plate is arranged on below described cathode pedestal, and described limited post is through described cover plate.
According to a preferred embodiment of the present utility model, described cathode pedestal insulate with described cover plate and is connected; Be provided with insulcrete between described cathode pedestal and described cover plate, described insulcrete makes described cathode pedestal and described cover plate insulate; Between described cathode pedestal and described insulcrete, between described insulcrete and described cover plate, be respectively arranged with the second sealing-ring, described second sealing-ring is arranged around described limited post, by between described cathode pedestal and described insulcrete, seal between described insulcrete and described cover plate.
According to a preferred embodiment of the present utility model, also comprise back positive plate and cushion block, described back positive plate insulate with described cathode pedestal and is connected; Be provided with insulcrete between described back positive plate and described cathode pedestal, described insulcrete makes described cathode pedestal and described back positive plate insulate; The second sealing-ring is respectively arranged with between described cathode pedestal and described cover plate, between described insulcrete and described back positive plate, described second sealing-ring is arranged around described limited post, seals between described cathode pedestal and described insulcrete, between described insulcrete and described back positive plate; Described cushion block one end and described back positive plate are tightly connected, and the other end is connected with cover plate for sealing.
According to a preferred embodiment of the present utility model, also comprise limited post and support bar, described limited post is provided with the first tube chamber, and described support bar is provided with the second tube chamber; Described limited post one end is connected with described support bar, and the other end is connected with described cathode pedestal; Described support bar one end is connected with described limited post, and the other end extends through described cover plate and is provided with rotating setting nut, and described second tube chamber is communicated with described first tube chamber.
According to a preferred embodiment of the present utility model, described magnet comprises:
Yoke, this yoke transmission magnetic line of force;
First magnet;
Second magnet;
Described first magnet and described second magnet interval are arranged, and all contact with described yoke;
Described first magnet and the second magnet form the closed magnetic line of force, and described magnetic line of force makes it to form plasma body for retraining the electronics being positioned at target side.
Compared with prior art, the utility model planar cathode adjusts described magnet relative to target distance by described shift mechanism, thus changes target material surface magnetic field distribution.Described planar cathode adjustment operation is simple, sharpness of regulation is high, can realize the requirement of any harsh membrane uniformity, ensure that the quality product of coated product.
In addition, the regulating rod of the shift mechanism of the planar cathode that the utility model patent provides extends in air, can complete under the not broken empty condition of plated film production unit, simple and convenient, reduce the time that coating wire stops production greatly, effectively raise the production capacity of filming equipment.
Accompanying drawing explanation
Fig. 1 is the structural representation of the utility model embodiment 1.
Fig. 2 is embodiment 1 structural representation of not shown target.
Fig. 3 is cathode base interior structure vertical view.
Fig. 4 is the sectional view of planar cathode along A-A line of Fig. 1.
Fig. 5 is regulating rod and setting nut matching relationship schematic diagram.
Fig. 6 is the sectional view of embodiment 2 along A-A line of the utility model planar cathode.
Embodiment
Below in conjunction with accompanying drawing, the utility model is described in detail:
Embodiment 1
Refer to Fig. 1 to Fig. 5, the structural representation of its a kind of planar cathode 100 provided for the utility model and sectional view.Described planar cathode 100 comprises cover plate 1, cathode pedestal 14, magnet, and for changing the shift mechanism of this magnet relative to the distance of target 191.Preferably, described planar cathode 100 comprises the 7th fastening piece 13.Described cover plate 1 is fixedly connected with described cathode pedestal 14 by the 7th fastening piece 13.Further, described planar cathode 100 also comprises the 7th fastening piece insulation covering 10 coordinated with described 7th fastening piece 13.When described 7th fastening piece 13 is conductor, the 7th fastening piece insulation covering 10 is set on described 7th fastening piece 13 to make described cover plate 1 insulate with described cathode pedestal 14.In addition, described planar cathode 100 also comprises the insulcrete 12 be arranged between described cover plate 1 and described cathode pedestal 14.
Cathode pedestal 14 is provided with cavity volume 141.Cathode pedestal 14 is provided with sealing plate 31, cavity volume 141 seals by sealing plate 31.Supporting seat 192 is provided with in cavity volume 141.In the present embodiment, target 191 is fixed by target press strip 18.Illustrate below described cover plate 1 and target 191, institute's cathode pedestal 14 relation is set.In the present embodiment, in order to seal water coolant, described planar cathode 100 arranges sealing plate 31.Described sealing plate 31 is arranged on the cavity volume 141 sealing described cathode pedestal 14 between target 191 and described cathode pedestal 14, makes water coolant and vacuum-sealing isolation.Described sealing plate 31 can be made compared with the material of high-air-tightness for having.Described sealing plate 31 is fixedly installed on described cathode pedestal 14.Preferably, described planar cathode 100 comprises the first fastening piece 20.This first fastening piece 20 is arranged on described cathode pedestal 14 by sealing plate press strip 17 by fastening for described sealing plate 31, and sealing plate press strip 17 is around being arranged on a week, sealing plate 31 edge, and sealing plate 31 1 weeks is all fixing.In addition, target 191 is fixedly installed.In example as shown in the figure, target 191 has ten pieces, is arranged in rectangular shape composition target plate 190.First target press strip 181 is arranged around all target plate 190 edges.Target plate 190 edge through the first target press strip 181, sealing plate press strip 17 and be fastened on described cathode pedestal 14, is fixed by the second fastening piece 15 successively.In the middle part of target plate 190, be provided with a second target press strip 182, ten pieces of targets 191 are fixed.Second target press strip 182 is fixed on supporting seat 192 by the second fastening piece 15.First target press strip 181 matches with the second target press strip 182, is completely fixed by ten pieces of targets 191.
Target 191 sputters coating particle when being subject to plasma bombardment.The material of target 191 needs according to plated film and selects.Target 191 can be tabular, bulk etc.The specification of target 191, material select the technology all known by those skilled in the art, just repeat no more at this.
Be arranged in parallel with target 191 in the cavity volume 141 that described magnet is arranged on described cathode pedestal 14, with about beam electrons, form plasma body.Described magnet comprises yoke 22, first magnet 211 and the second magnet 212.First magnet 211 and the second magnet 212 interval are arranged, and are all arranged in this yoke 22 and contact with yoke 22.Second magnet 212 is arranged around the first magnet 211.Described first magnet 211 and the second magnet 212 form the closed magnetic line of force, and described magnetic line of force makes it to form plasma body for retraining the electronics being positioned at target side.Described yoke 22 is transmitted the magnetic line of force of corresponding first magnet 211 and the output of the second magnet 212 and is formed loop.It is envisioned that described yoke 22 can adopt the manufactures such as soft iron, non-retentive alloy and the ferrite material that permeability is higher.Described first magnet 211 and the second magnet 212 play and provide magnetic field to retrain to extend the movement locus of this electronics to the electronics entering this magnetic field.The specification of described yoke 22, first magnet 211 and the second magnet 212 and the technology of corresponding cooperation all known by this life those skilled in the art, do not repeat them here.Described supporting beam 23 for supporting described magnet, and provides and arranges structure to described shift mechanism.Described yoke 22, first magnet 211 and the second magnet 212 are installed on supporting beam 23.As long as the structure of described supporting beam 23 can meet support the function of respective magnet, and meet shift mechanism needs are set.In the present embodiment, described supporting beam 23 is arranged to tabular so that fit with described yoke 22, first magnet 211 and the second magnet 212 and arrange.In the present embodiment, in order to improve the steadiness of described magnetic circuit assembly and improve the precision that described shift mechanism moves this magnetic circuit assembly, described magnet is fixedly connected with described supporting beam 23.Further, described yoke 22 is fixedly connected with described supporting beam 23 by the 3rd fastening piece 24.Described 3rd fastening piece 24 can be bolt, screw or stud.Described 3rd fastening piece 24 can wear until be fastened on described yoke 22 from described supporting beam 23.The quantity of described 3rd fastening piece 24 and the technology of specification all known by those skilled in the art.
Described cathode pedestal 14 is for accommodating described magnet and carry target 191, makes target 191 and magnet be set to be parallel to each other.Described cathode pedestal 14 is arranged to have cavity volume 141.The cavity volume 141 of described cathode pedestal 14 is equipped with described magnet.The top of the sidewall of the cavity volume 141 of described cathode pedestal 14 arranges target 191.As long as the shape of the cavity volume 141 of described cathode pedestal 14, size make respective magnet can move in this cavity volume 141.In the present embodiment, water coolant is perfused with to cool target 191 in the cavity volume 141 of described cathode pedestal 14.
Please continue to refer to Fig. 1 to Fig. 5, according to seal request, described planar cathode 100 can also comprise the first sealing-ring 29, two the second sealing-rings 11, sealing-ring 9,16,30, and sealing plate press strip 17.This first sealing-ring 29 is arranged between the regulating rod 28 of following shift mechanism and described cathode pedestal 14.Described two the second sealing-rings 11 are separately positioned between described cathode pedestal 14 and insulcrete 12, and between insulcrete 12 and cover plate 1, seal between cathode pedestal 14 and insulcrete 12 and between insulcrete 12 and cover plate 1.But the setting of sealed structure is not the utility model emphasis, just repeats no more at this.
Described cover plate 1 is arranged on the opposite side of institute's cathode pedestal 14 to isolate the inside of described planar cathode 100 and exchanging between outside atmosphere.Cover plate 1 can also use as anode, also can as the base supported, and its function requires to determine according to actual use occasion.As aforementioned, the concrete airtight construction of described planar cathode 100 and the technology that is embodied as known by those skilled in the art and be not the utility model emphasis, just do not repeating at this.Described cover plate 1 can adopt the material meeting resistance to air loss requirement to make corresponding shape.In the present embodiment, described cover plate 1 is fixedly connected with described cathode pedestal 14.Further, described planar cathode 100 comprises the first isolator.This first isolator can be insulation film, insulcrete or insulating coating etc.Described first isolator is arranged between described cover plate 1 and described cathode pedestal 14, and in example as shown in the figure, the first isolator is insulcrete 12.Preferably, described planar cathode 100 comprises the 5th fastening piece 13.Described 5th fastening piece 13 is fixedly installed on described cathode pedestal 14 through described cover plate 1 and described insulcrete 12 successively.Described 5th fastening piece 13 can be corresponding screw, bolt or stud.Preferably, described planar cathode 100 also comprises the 5th fastening piece insulation covering 10.Described 5th fastening piece insulation covering 10 is located on described 5th fastening piece 13, to insulate with described cover plate 1 for making described cathode pedestal 14 during conductive material at the 5th fastening piece 13.When described 5th fastening piece 13 is isolator, described 5th fastening piece insulation covering 10 is optional.Insulcrete 12 is arranged between cathode pedestal 14 and cover plate 1, makes both insulation, avoids both to conduct.
Described shift mechanism comprises regulating rod 28, limited post 8 and setting nut 4.Described supporting beam 23 correspondence offers providing holes (not indicating in figure).One end of described regulating rod 28 is arranged on this supporting beam 23 mobile on described supporting beam 23, thus change is arranged on the distance of the magnet on this supporting beam 23 relative to target 191.Described regulating rod 28 can be fixedly installed or be movably arranged on described supporting beam 23, as long as this regulating rod 28 can move described supporting beam 23.Preferably, one end of described regulating rod 28 is fixedly installed on described supporting beam 23.Described limited post 8 correspondence offers the first tube chamber (not indicating in figure), and limited post 8 one end is connected with cathode pedestal 14, and the other end extends through cover plate 1.Regulating rod 28 one end is connected with supporting beam 23, and through cathode pedestal 14, stretch out from the first tube chamber of limited post 8, extend to the atmospheric side of described cover plate 1, so that described planar cathode 100 keeps changing the distance of the relative target 191 of described magnet at atmospheric side by described shift mechanism during inner vacuum state.Described regulating rod 28 the other end extended in air offers the outside screw coordinated with described setting nut 4.
Illustrate described regulating rod 28 below how to be fixedly installed on described supporting beam 23.Described planar cathode 100 comprises the 4th fastening piece 25.4th fastening piece 25 has head and bar portion.It is envisioned that described head is arranged in described bar portion.Described head and described bar portion coaxially arrange and have the cross-sectional area being greater than bar portion.Described supporting beam 23 offers corresponding the 4th fastener hole (not indicating in figure) coordinated with the 4th fastening piece 25.Preferably, the providing holes of described supporting beam 23 is through hole.Described 4th fastener hole is offered around this providing holes and is connected with this providing holes.The radial sidewalls of one end of described regulating rod 28 is provided with protuberance.Described supporting beam 23 has top.This top extends along the direction parallel with the axis of described regulating rod 28 and is set to face with the protuberance of described regulating rod 28.The bar portion of described 4th fastening piece 25 is located in corresponding 4th fastener hole, to make head by the protuberance of described regulating rod 28 along being pressed on the top of described supporting beam 23 with the axial parallel direction of this regulating rod 28, thus described regulating rod 28 is fixedly installed on described supporting beam 23.Regulating rod 28 can also adopt other mode of connection of the prior art with the connection of supporting beam 23.Described supporting beam 23 also can be set to integral piece with regulating rod 28.
In addition, the 4th fastener hole on described supporting beam 23 can also be offered as crossing with described providing holes, and namely the 4th fastener hole and providing holes partly overlap.Described 4th fastening piece 25 and corresponding 4th fastener hole thread fit, make the 4th fastening piece 25 push against along the radial direction of described regulating rod 28 regulating rod 28 be contained in described providing holes, thus this regulating rod 28 be fixedly installed on described supporting beam 23.Now, the protuberance on described regulating rod 28 and the top on described supporting beam 23 all optional.
Described limited post 8 to be fixedly installed on described cathode pedestal 14 and to extend in air through described cover plate 1.Limited post 8 is provided with the first tube chamber (not shown).Preferably, described planar cathode 100 comprises the 6th fastening piece 26.Described 6th fastening piece 26 is fixed on described cathode pedestal 14 through described limited post 8 and described cover plate 1 successively.Described limited post 8 coaxially can be arranged with described regulating rod 28.
See also Fig. 5, setting nut 4 is installed in rotation on limited post 8 end, and with regulating rod 28 thread fit.Described setting nut 4 is screwed onto described regulating rod 28 and extends on the outside screw of the other end in air.Described rotating adjusting nut 4, can make regulating rod 28 move vertically, thus supporting beam 23 described in push-and-pull is to regulate described magnet relative to the distance of target 191.Preferably, described setting nut 4 offers scale marks 41, by reading scale marks 41, can magnet described in fine adjustment relative to target 191 distance thus obtain the magnetic field of high field intensity precision.Be understandable that, described distance scale can correspondingly according to the externally threaded flight pitch on described regulating rod 28 be arranged.Regulating rod 28 is provided with markings 61.By markings 61, the angle of scale marks 41 and setting nut 4 rotation easily can be read.
Preferably, keep to make magnet after described setting nut 4 completes adjustment not changing for the distance of target 191, described planar cathode 100 also arranges the 9th fastening piece 5.Described setting nut 4 is fixed and can not rotate freely by described 9th fastening piece 5.In the present embodiment, described setting nut 4 is fastened on described limited post 8 by described 9th fastening piece 5.
Compared with prior art, the utility model planar cathode 100 adjusts described magnet relative to target 191 distance by described shift mechanism, thus changes target 191 Surface field intensity distribution.Described planar cathode 100 adjustment operation is simple, sharpness of regulation is high, can realize the requirement of any harsh membrane uniformity, ensure that the quality product of coated product.
In addition, the regulating rod 28 of the shift mechanism of the planar cathode 100 that the utility model patent provides extends in air, can complete under the not broken empty condition of plated film production unit, simple and convenient, reduce the time that coating wire stops production greatly, effectively raise the production capacity of filming equipment.
Embodiment 2:
Refer to 6, the difference executing example two and embodiment one is: described planar cathode 100 also comprises and is arranged on cushion block 2 between described cover plate 1 and described cathode pedestal 14 and back positive plate 32, and the support bar 6 be connected with limited post 8.Described cushion block 2 for adjusting the distance between target material surface and cover plate 1, to adjust the distance of on different filming equipment target 191 and substrate.This cushion block 2 pad is located between described back positive plate 32 and described cover plate 1.And described cushion block 2 is set to one end is fixedly connected with described back positive plate 32, the other end is connected with cover plate 1.Described cushion block 2 can be bulk, column etc.Preferably, described planar cathode 100 comprises the 8th fastening piece (not shown).Described cushion block 2 is fixedly connected with described back anode 32 by the 8th fastening piece, and those skilled in that art can infer, and it is routine techniques that the 8th fastening piece connects back anode 32 with the mode of cushion block 2.Described cushion block 2 offers the second through hole and wears in described second through hole for described limited post 8.
Described shift mechanism also comprises support bar 6, and support bar 6 is provided with the second tube chamber.。One end of described support bar 6 axially abutting against with this limited post 8 along described limited post 8, and is arranged through described cover plate 1 through the second through hole of described cushion block 2 and third through-hole (not indicating in the figure) the other end of described cover plate 1 and extends in air successively.
Described support bar 6 offers the second tube chamber (not indicating in figure) for described regulating rod 28 successively through the first tube chamber of described limited post 8 and the second tube chamber of described support bar 6, and makes the other end of described regulating rod 28 can stretch out described first tube chamber and extend in air.
Described limited post 8 is provided with the first tube chamber (not indicating in figure).Described limited post 8 one end is connected with described support bar 6, and the other end is connected with described cathode pedestal 14; Described second tube chamber is communicated with described first tube chamber.In the present embodiment two, described setting nut 4 is arranged on the end of support bar 6 rotationally, and regulating rod 28 thread fit of stretching out with the second tube chamber of self-supporting bar 6.Setting nut 4 with offer scale marks, be convenient to fine adjustment magnetic field to show the distance of rotation.
It should be noted that, in order to concise explanation, described first fastening piece 20, second fastening piece the 15, three fastening piece the 24, four fastening piece the 25, five fastening piece the 13, six fastening piece the 26, seven fastening piece the 10, nine fastening piece 5 can be screw, stud or bolt.All above-mentioned fastening pieces can adopt metallic conductor or dielectric support, when adopting metallic conductor to support, corresponding fastening piece insulation covering can be adopted to carry out insulation and be fastenedly connected.The both sides of described cover plate 1 are evacuated interior and the atmospheric exterior of described planar cathode 100 respectively.The both ends of described regulating rod 28 are placed in evacuated interior and atmospheric exterior respectively.In addition, mentioned by the utility model, " vacuum " refers to this comparatively hypobaric meeting the normal work of described planar cathode 100.
These are only the utility model preferred embodiment, and be not used in limitation protection domain of the present utility model, any amendment in the utility model spirit, equivalently to replace or improvement etc., be all encompassed in right of the present utility model.
Claims (12)
1. a planar cathode, comprising:
Cathode pedestal, described cathode pedestal is provided with cavity volume;
Magnet, the side that this magnet is arranged on target, with about beam electrons, forms plasma body;
Shift mechanism;
Described magnet is arranged in described cavity volume movably, and described shift mechanism is arranged on described cathode pedestal movably, and extends in described cavity volume and drive described magnet to move.
2. planar cathode according to claim 1, is characterized in that, described shift mechanism comprises regulating rod and setting nut; Described regulating rod runs through described cathode pedestal, and one end is positioned at described cavity volume, the other end to stretch out outside described cavity volume and with described setting nut thread fit; Described regulating rod can be arranged on described cathode pedestal vertically movably; Described regulating rod one end is directly connected with described magnet or is in transmission connection; Described regulating rod and described setting nut one of them arrange rotationally, described regulating rod and described setting nut one of them described regulating rod can be made to move vertically when rotating, described regulating rod drives described magnet to move in moving process vertically.
3. planar cathode according to claim 2, is characterized in that, described magnet is arranged on supporting beam, and described supporting beam is arranged in described cavity volume movably, and described regulating rod one end is connected with described supporting beam.
4. planar cathode according to claim 2, is characterized in that, described setting nut is provided with scale marks.
5. planar cathode according to claim 2, is characterized in that, is provided with the first sealing-ring between described regulating rod and described cathode pedestal.
6. planar cathode according to claim 2, is characterized in that, also comprises limited post, and described limited post is provided with the first tube chamber, and described limited post is connected with described cathode pedestal, and described regulating rod is through described first tube chamber; Described setting nut is arranged on described limited post end.
7. planar cathode according to claim 6, is characterized in that, described setting nut is arranged rotationally.
8. planar cathode according to claim 6, is characterized in that, also comprises cover plate, and described cover plate is arranged on below described cathode pedestal, and described limited post is through described cover plate.
9. planar cathode according to claim 8, is characterized in that, described cathode pedestal insulate with described cover plate and is connected; Be provided with insulcrete between described cathode pedestal and described cover plate, described insulcrete makes described cathode pedestal and described cover plate insulate; Between described cathode pedestal and described insulcrete, between described insulcrete and described cover plate, be respectively arranged with the second sealing-ring, described second sealing-ring is arranged around described limited post, by between described cathode pedestal and described insulcrete, seal between described insulcrete and described cover plate.
10. planar cathode according to claim 8, is characterized in that, also comprises back positive plate and cushion block, and described back positive plate insulate with described cathode pedestal and is connected; Be provided with insulcrete between described back positive plate and described cathode pedestal, described insulcrete makes described cathode pedestal and described back positive plate insulate; The second sealing-ring is respectively arranged with between described cathode pedestal and described cover plate, between described insulcrete and described back positive plate, described second sealing-ring is arranged around described limited post, seals between described cathode pedestal and described insulcrete, between described insulcrete and described back positive plate; Described cushion block one end and described back positive plate are tightly connected, and the other end is connected with cover plate for sealing.
11. planar cathodes according to claim 10, is characterized in that, also comprise limited post and support bar, and described limited post is provided with the first tube chamber, and described support bar is provided with the second tube chamber; Described limited post one end is connected with described support bar, and the other end is connected with described cathode pedestal; Described support bar one end is connected with described limited post, and the other end extends through described cover plate and is provided with rotating setting nut, and described second tube chamber is communicated with described first tube chamber.
12. planar cathodes according to claim 1, is characterized in that, described magnet comprises:
Yoke, this yoke transmission magnetic line of force;
First magnet;
Second magnet;
Described first magnet and described second magnet interval are arranged, and all contact with described yoke;
Described first magnet and the second magnet form the closed magnetic line of force, and described magnetic line of force makes it to form plasma body for retraining the electronics being positioned at target side.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201520738884.0U CN205099747U (en) | 2015-09-22 | 2015-09-22 | Planar cathode |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201520738884.0U CN205099747U (en) | 2015-09-22 | 2015-09-22 | Planar cathode |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN205099747U true CN205099747U (en) | 2016-03-23 |
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| Application Number | Title | Priority Date | Filing Date |
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| CN201520738884.0U Withdrawn - After Issue CN205099747U (en) | 2015-09-22 | 2015-09-22 | Planar cathode |
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Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN105154839A (en) * | 2015-09-22 | 2015-12-16 | 上海晓睿真空科技有限公司 | Planar cathode |
| CN110643966A (en) * | 2019-11-14 | 2020-01-03 | 谢斌 | Device and method for improving utilization rate of magnetron sputtering target |
-
2015
- 2015-09-22 CN CN201520738884.0U patent/CN205099747U/en not_active Withdrawn - After Issue
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN105154839A (en) * | 2015-09-22 | 2015-12-16 | 上海晓睿真空科技有限公司 | Planar cathode |
| CN110643966A (en) * | 2019-11-14 | 2020-01-03 | 谢斌 | Device and method for improving utilization rate of magnetron sputtering target |
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| C14 | Grant of patent or utility model | ||
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Effective date of registration: 20170207 Address after: Pudong New Area Xinchang Town of Shanghai City, Hunan Road 200000 Lane 7508 No. 3 layer 2-24 (double) Patentee after: I hereby vacuum technology (Shanghai) Co. Ltd. Address before: Pudong New Area kangqiaozhen 201307 Hunan Road Shanghai City No. 2588 Room 201 -47 Patentee before: SPUTTERING COMPONENTS CHINA CO., LTD. |
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Granted publication date: 20160323 Effective date of abandoning: 20180309 |