CN205024317U - Insulation board of pure ion plating device filter keeps off ring - Google Patents
Insulation board of pure ion plating device filter keeps off ring Download PDFInfo
- Publication number
- CN205024317U CN205024317U CN201520813164.6U CN201520813164U CN205024317U CN 205024317 U CN205024317 U CN 205024317U CN 201520813164 U CN201520813164 U CN 201520813164U CN 205024317 U CN205024317 U CN 205024317U
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- China
- Prior art keywords
- strainer
- insulcrete
- baffle ring
- insulation board
- filter
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Abstract
The utility model relates to an insulation board of pure ion plating device filter keeps off ring, wherein the plasma that produces of negative pole target removes to the entry of filter, be provided with the positive pole around the negative pole target, the export and the coating chamber room intercommunication of filter, the indoor substrate of placing of coating chamber, the entry position department of filter is provided with the insulation board and keeps off the ring, the insulation board keeps off the ring and is the cone pipe form, it is fixed with the entry of filter that the insulation board keeps off the big pipe diameter of the one end end of ring, the insulation board keeps off the other end tubule of ring and directly holds in the directional filter, the plasma that the negative pole target produced marchs to filter entry direction under the anodal effect, the insulation board baffle that sets up in the entry position of filter department, the cone pipe column structure is set to the insulation board baffle, its coniform inside pipe wall can effectively blockking most dust, both kept apart insulation board and dust, the maintenance period of insulation board has been improved, reduce the volume that the dust got into the filter again, and then the probability of reduction dust granule by filter entering coating chamber room, thereby ensure the coating film quality.
Description
Technical field
The utility model relates to technical field of material surface treatment, is specifically related to a kind of insulcrete baffle ring of pure apparatus for ionically plating strainer.
Background technology
Pure apparatus for ionically plating is widely used in the outside surface plated film production of part, the part to be coated after production utilizes pure apparatus for ionically plating establish one deck or several layers of coating at the plated surface of part, to change the surface property of plated component.Pure apparatus for ionically plating is formed primarily of vacuum-pumping system, cathode targets, anode, strainer, plated film chamber, substrate and some auxiliary spare parts, and wherein, described strainer entirety presents quarter bend tubular structure.From cathode targets surface excitation plasma body out to strainer side's entrance to movement; the other end outlet and the plated film chamber of strainer; described substrate to be coated is arranged in plated film chamber; ionic fluid after filtration is by strainer and be deposited on substrate; thus complete coating process; wherein; strainer forms the passage of plasma body on the one hand; play on the other hand and absorb or store impurity particle; stop larger particle through strainer; thus reduce particle dust to the pollution of plated film chamber, play the clean effect keeping plated film chamber.
Insulcrete baffle ring is also provided with between anode and strainer opening for feed; insulcrete baffle ring plays the effect of the insulating property strengthening anode and strainer; but in coating process; insulcrete baffle ring absorbs the particle dust on directive surface on the one hand; the particle dust being attracted to surface was on the other hand departed from surface by being splashed to surperficial plasma bombardment afterwards, and the particle of a large amount of sputtering observes cosine distribution on vertical bombarded surface direction.Because insulcrete baffle ring of the prior art is cylindrical tube structure, after the dust of surface adsorption is subject to the bombardment of plasma body, particle flies to overflow strainer and to pollute the likelihood ratio of plated film chamber larger.
Utility model content
The purpose of this utility model is: the insulcrete baffle ring providing a kind of pure apparatus for ionically plating strainer, while guaranteeing that plasma body can pass through, can reduce dust granule and be entered the probability polluting plated film chamber by strainer.
For achieving the above object, the technical solution adopted in the utility model is: a kind of insulcrete baffle ring of pure apparatus for ionically plating strainer, comprise cathode targets, the plasma body that described cathode targets produces moves to the entrance of strainer, anode is provided with around cathode targets, the outlet of strainer and plated film chamber, substrate is placed in described plated film chamber, the entry position place of described strainer is provided with insulcrete baffle ring, described insulcrete baffle ring is tapered tube shape, one end Large Diameter Pipeline end of insulcrete baffle ring and the entrance of strainer are fixed, the other end pipe with small pipe diameter end of insulcrete baffle ring points in strainer.
Compared with prior art, the technique effect that the utility model possesses is: the ionic fluid that the plasma body that described cathode targets produces is formed is advanced to filter inlet direction, at the insulcrete baffle ring that the entry position place of strainer is arranged, insulcrete baffle plate is arranged to tapered tube shape structure, its coniform inside pipe wall can to effective stop of most of dust, both insulcrete and dust were kept apart, improve the maintenance intervals of insulcrete, additionally reduce dust granule is entered plated film chamber probability by strainer, thus guarantee coating quality.
Accompanying drawing explanation
Fig. 1 is the structural representation of pure apparatus for ionically plating;
Fig. 2 is the structural representation of insulcrete baffle ring.
Embodiment
Composition graphs 1 and Fig. 2, the utility model is further described:
A kind of insulcrete baffle ring of pure apparatus for ionically plating strainer, comprise cathode targets 10, the plasma body that described cathode targets 10 produces moves to the entrance of strainer 20, anode 30 is provided with around cathode targets 10, the outlet of strainer 20 is communicated with plated film chamber 40, substrate 50 is placed in described plated film chamber 40, the entry position place of described strainer 20 is provided with insulcrete baffle ring 60, described insulcrete baffle ring 60 is in tapered tube shape, one end Large Diameter Pipeline end of insulcrete baffle ring 60 and the opening for feed of strainer 20 are fixed, the other end pipe with small pipe diameter end of insulcrete baffle ring 60 points in strainer 20.
The ionic fluid a that the plasma body that described cathode targets 10 produces is formed advances to strainer 20 Way in, at the insulcrete baffle ring 60 that the entry position place of strainer 20 is arranged, insulcrete baffle ring 60 is arranged to tapered tube shape structure, its coniform inside pipe wall can to effective stop of most dust, both insulcrete and dust were kept apart, improve the maintenance intervals of insulcrete, additionally reduce dust granule is entered plated film chamber 40 probability by strainer 20, thus guarantee coating quality.
As preferred version of the present utility model, angular range between described insulcrete baffle ring 60 tapered tube shape bus and its shaft core line is 10 ° ~ 20 °, shown in composition graphs 2, the angle of b is the angle between insulcrete baffle ring 60 tapered tube shape bus and its shaft core line, and above-mentioned angular range can guarantee that the ionic fluid a of plasma generation is smoothly by insulcrete baffle ring 60.The a large amount of dust granules sputtered, on the direction of insulcrete baffle ring 60 internal surface perpendicular to insulcrete, on the inner conical surface of namely insulcrete baffle ring 60, in accordance with remaining profound distribution, conical design makes particle fly to overflow strainer 20 and to pollute the probability of plated film chamber 40 relatively much smaller, ensure that the clean of film coating environment.
Further, the Large Diameter Pipeline end of described insulcrete baffle ring 60 is provided with flange 61, and described flange 61 is connected with the entrance of strainer 20, and the circular cone pipe shaft of insulcrete baffle ring 60 stretches into the inlet internal of insulcrete baffle ring 60.
The overall at right angles syphon shape structure of described strainer 20, the quarter bend tubular structure that strainer 20 entirety presents, the dust overwhelming majority entered in strainer 20 is blocked on the tube wall of the pipe bent position of strainer, so just greatly reduce the quantity of dust granule, ensure that the quality of plated film, one end mouth of pipe of strainer 20 forms entrance, and the mouth of pipe of the other end of strainer 20 forms outlet, and outlet and the plated film chamber 40 of strainer 20 are tightly connected.
In tubular construction, described cathode targets 10 is arranged in the tube chamber of anode 30 described anode 30, and the pipe end of anode 30 and the entrance of strainer 20 form and be tightly connected.
Claims (5)
1. the insulcrete baffle ring of a pure apparatus for ionically plating strainer, comprise cathode targets (10), the plasma body that described cathode targets (10) produces moves to the entrance of strainer (20), cathode targets (10) is provided with anode (30) around, the outlet of strainer (20) is communicated with plated film chamber (40), substrate (50) is placed in described plated film chamber (40), it is characterized in that: the entry position place of described strainer (20) is provided with insulcrete baffle ring (60), described insulcrete baffle ring (60) is in tapered tube shape, one end Large Diameter Pipeline end of insulcrete baffle ring (60) and the entrance of strainer (20) are fixed, the other end pipe with small pipe diameter end of insulcrete baffle ring (60) points in strainer (20).
2. the insulcrete baffle ring of pure apparatus for ionically plating strainer according to claim 1, is characterized in that: the angular range between described insulcrete baffle ring (60) tapered tube shape bus and its shaft core line is 10 ° ~ 20 °.
3. the insulcrete baffle ring of pure apparatus for ionically plating strainer according to claim 1 and 2, it is characterized in that: the Large Diameter Pipeline end of described insulcrete baffle ring (60) is provided with flange (61), described flange (61) is connected with the entrance of strainer (20), and the circular cone pipe shaft of insulcrete baffle ring (60) stretches into the inlet internal of insulcrete baffle ring (60).
4. the insulcrete baffle ring of pure apparatus for ionically plating strainer according to claim 3, it is characterized in that: the overall at right angles syphon shape structure of described strainer (20), one end mouth of pipe of strainer (20) forms entrance, the mouth of pipe of the other end of strainer (20) forms outlet, and outlet and the plated film chamber (40) of strainer (20) are tightly connected.
5. the insulcrete baffle ring of pure apparatus for ionically plating strainer according to claim 4, it is characterized in that: described anode (30) in tubular construction, described cathode targets (10) is arranged in the tube chamber of anode (30), and the pipe end of anode (30) and the entrance of strainer (20) form and be tightly connected.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201520813164.6U CN205024317U (en) | 2015-10-21 | 2015-10-21 | Insulation board of pure ion plating device filter keeps off ring |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201520813164.6U CN205024317U (en) | 2015-10-21 | 2015-10-21 | Insulation board of pure ion plating device filter keeps off ring |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN205024317U true CN205024317U (en) | 2016-02-10 |
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201520813164.6U Active CN205024317U (en) | 2015-10-21 | 2015-10-21 | Insulation board of pure ion plating device filter keeps off ring |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN205024317U (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN108456862A (en) * | 2018-03-13 | 2018-08-28 | 西华大学 | A kind of metal ion source and its application method |
-
2015
- 2015-10-21 CN CN201520813164.6U patent/CN205024317U/en active Active
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN108456862A (en) * | 2018-03-13 | 2018-08-28 | 西华大学 | A kind of metal ion source and its application method |
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| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant |