CN204918821U - Plating bath - Google Patents
Plating bath Download PDFInfo
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- CN204918821U CN204918821U CN201520458734.4U CN201520458734U CN204918821U CN 204918821 U CN204918821 U CN 204918821U CN 201520458734 U CN201520458734 U CN 201520458734U CN 204918821 U CN204918821 U CN 204918821U
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- cell body
- board
- anode plate
- plating
- anode
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Abstract
The utility model relates to a plating bath, including the cell body, the cell body upper end is equipped with the horizontal pole that the surface has a plurality of recess, and horizontal pole lower extreme symmetry is equipped with first anode board, ultor board, first anode board, ultor board one side in opposite directions are equipped with division first shield plate that has the perforating hole respectively, open the secondary shielding board that has the perforating hole, first anode board, ultor board, first shield plate, secondary shielding board are equallyd divide otherly and horizontal pole sliding connection, the cell body upper end is equipped with vapor -recovery unit, is equipped with heating device, magnetic stirrers in the cell body, is equipped with the battery on the cell body outside, first anode board, ultor board, vapor -recovery unit, heating device, magnetic stirrers equally divide and bie are connected with the battery, the utility model provides an electroplating effect not good, the part produces the inhomogeneous problem of electroplating easily.
Description
Technical field
The utility model relates to a kind of plating tank, belongs to electroplating technology field.
Background technology
Plating is exactly the process utilizing electrolysis principle to plate other metal or alloy of skim on some metallic surface, be utilize electrolytic action to make the technique of the surface attachment layer of metal film of metal or other material thus play to prevent burning (as corrosion), improve the effects such as wear resistance, electroconductibility, reflective, erosion resistance (copper sulfate etc.) and having improved aesthetic appearance.The skin of many coins is also plating.
During plating, coated metal or other insoluble materials do anode, and workpiece to be plated does negative electrode, and the positively charged ion of coated metal is reduced formation coating at workpiece surface to be plated.For getting rid of other cationic interference, and making coating evenly, firmly, electroplate liquid need be done, to keep the cationic concentration of coated metal constant with containing the cationic solution of coated metal.The object of plating plates metal plating on base material, changes substrate surface character or size.Plating can strengthen metal erosion resistance (the corrosion resistant metal of the many employings of coated metal), increase hardness, prevent abrasion, improve electroconductibility, slipperiness, thermotolerance and surface aesthetic.
Coating is single metal or alloy mostly, as titanium palladium, zinc, cadmium, gold or brass, bronze etc.; Also disperse layer is had, as nickel-silicon carbide, nickel-fluorographite etc.; Also has laminating layer, as the copper-nickel-layers of chrome on steel, the silver-indium layer etc. on steel.The body material of plating, except the cast iron of iron-based, steel and stainless steel, also has non-ferrous metal, or ABS plastic, polypropylene, polysulfones and phenoplast, but before plastic electroplating, has to pass through special activation and sensitized treatment.
Utilize electrolytic action on machinework, deposit the good but technology of the metal cover that performance is different with body material of attachment.Electrolytic coating is more even than hot dipping layer, generally all thinner, from several micron to tens microns not etc.By plating, decoration protectiveness and various functional upper layer can be obtained on machinework, the workpiece of wearing and tearing and processing error can also be repaired.
Plating is divided into rack plating, barrel plating, the continuously mode such as plating and brush plating, mainly relevant with batch with the size of unplated piece.Rack plating is applicable to the goods of stock size, as the collision bumper of automobile, and the handlebar etc. of bike.Barrel plating is applicable to smallclothes, as fastening piece, packing ring, pin etc.Continuous plating is applicable to mass-producted wire rod and band.Brush plating is applicable to local plating or repairs.Electroplate liquid has acidity that is acid, alkalescence and that be added with chelating agent and neutral solution, no matter adopts which kind of plating mode, the coating bath contacted, hangs tool etc. and should have versatility to a certain degree with goods to be plated with plating solution.
The low-voltage high-current power source that plating needs one are powered to plating tank and the electrolyzer be made up of electroplate liquid, part to be plated (negative electrode) and anode.Wherein to look coating different and different for electroplating bath components, but all containing the main salt providing metal ion, in the main salt of energy complexing, metal ion forms the complexing agent of complex compound, for the buffer reagent of stabilizing solution potential of hydrogen, anode activation agent and special additive (as brightening agent, grain-refining agent, leveling agent, wetting agent, stress relieving agent and inhibiting fog agent etc.).Electroplating process be the metal ion in plating solution under the effect of external electric field, be reduced into atoms metal through electrode reaction, and in the process of negative electrode enterprising row metal deposition.Therefore, this is a metal electrodeposition process comprising the steps such as mass transfer in liquid phase, electrochemical reaction and electrocrystallization.
In the coating bath filling electroplate liquid, through cleaning and the unplated piece of special pre-treatment as negative electrode, make anode with metal lining, the two poles of the earth connect with the negative pole of direct supply and positive pole respectively.Electroplate liquid is made up of the aqueous solution of the salt of the compound containing metal lining, conduction, buffer reagent, pH adjusting agent and additive etc.After energising, the metal ion in electroplate liquid, is moved on negative electrode in the effect of potential difference and forms coating.The metal of anode forms metal ion and enters electroplate liquid, to keep the concentration of the metal ion be plated.In some cases, as chromium plating, be the insoluble anode that employing is plumbous, lead antimony alloy is made, it only plays a part to transmit electronics, On current.Chromium ion concentration in electrolytic solution, need rely on and add chromium cpd to maintain termly in plating solution.During plating, the impurity, power supply wave shape etc. of the quality of anode material, the composition of electroplate liquid, temperature, current density, conduction time, stirring intensity, precipitation all can affect the quality of coating, need to control in good time.Electroplating principle comprises four aspects: the electrodeposition process of electroplate liquid, electroplating reaction, electrode and reaction principle, metal.
When people electroplate part, the most frequently used instrument is plating tank, and plating tank is most basic supporting in electroplating device.Plating tank is used for device solution, for zinc-plated, copper facing, nickel plating, gold-plated etc.Movable cathode plating tank serves as a contrast the cell body of soft polyvinyl chloride plastic, electric installation, steam heating tube and cathode moving device etc. by steel tank and forms.Cell body also can serve as a contrast Vybak manufacture with steelframe, and the factor such as character and temperature of bath solution is depended in the selection of trough body structure.But it is even that general plating bath plates article out there will be uneven coating, the problem that electroplating effect is bad.
Chinese utility model patent specification sheets CN204198882U is so a kind of plating tank openly, relates to a kind of electroplanting device, and comprise plating tank cell body, hanger and plating tank supporting beam, described plating tank also comprises a scaffold, and this scaffold is arranged in described plating tank cell body; Described plating tank supporting beam has roller support, is bearing steel plate under this roller support, is insulcrete below bearing steel plate, is plating tank pier body below insulcrete.But this plating bath plates effect is bad, it is uneven that part easily produces plating.
Chinese utility model patent specification sheets CN202830207U is so a kind of plating tank openly, comprise for the cell body of splendid attire electroplate liquid, whipping appts and circulation device, the bottom of cell body is provided with at least one blast main in the horizontal direction, this blast main is provided with pore, and the opening of pore is inclined upwardly 30-45 degree in the horizontal direction; The pump that described circulation device comprises transfer tube and drives plating solution to flow along transfer tube, one end of transfer tube is communicated with the bottom of cell body, and the other end is communicated with the top of cell body.But this plating bath plates effect is bad, it is uneven that part easily produces plating.
Utility model content
The technical problems to be solved in the utility model is to provide a kind of plating tank, and it is bad that this plating tank solves electroplating effect, and part easily produces the uneven problem of plating, and the steam in recoverable plating tank.
In order to solve the problems of the technologies described above, plating tank of the present utility model comprises cell body, cell body upper end is provided with the cross bar of surface with several grooves, cross bar lower end has been arranged with first anode plate, second anode plate, described first anode plate, second anode plate in opposite directions side is respectively equipped with the first shielding slab having communicating pores, have the secondary shielding plate of communicating pores, described first anode plate, second anode plate, first shielding slab, secondary shielding plate is slidably connected with cross bar respectively, described cell body upper end is provided with vapor-recovery unit, heating unit is provided with in cell body, magnetic stirring apparatus, store battery is provided with outside cell body, described first anode plate, second anode plate, vapor-recovery unit, heating unit, magnetic stirring apparatus is connected with store battery respectively.
Described vapor-recovery unit is arranged on cell body upper end by pillar stiffener.
Communicating pores quantity on described first shielding slab, secondary shielding plate is two or more.
Described cell body is provided with liquid level charactron.
Described heating unit is heating tube.
Adopt this plating tank, have the following advantages:
1, because first anode plate, second anode plate, the first shielding slab, secondary shielding plate are slidably connected with cross bar respectively, the distance of cathode and anode can be regulated like this according to plated object, more effectively to electroplate; 2, because rail surface is with several grooves, positive plate, shielding slab can be hung on groove, prevent it from sliding, reduce irrelevant variable to the impact of test-results; 3, because cell body upper end is provided with vapor-recovery unit, the steam of cell body electroplate liquid can be recycled; 4, because the first shielding slab, secondary shielding plate are provided with communicating pores, the current density in electroplate liquid can be regulated, improve electroplating quality; 5, owing to being provided with magnetic stirring apparatus in cell body, can make electroplate liquid stir evenly, improve electroplating effect.
Accompanying drawing explanation
Below in conjunction with the drawings and specific embodiments, the utility model is described in further detail.
Fig. 1 is the structural representation of the utility model plating tank.
Wherein have: 1. cell body; 2. cross bar; 3. first anode plate; 4. the first shielding slab; 5. secondary shielding plate; 6. second anode plate; 7. pillar stiffener; 8. vapor-recovery unit; 9. heating unit; 10. magnetic stirring apparatus; 11. store batteries.
Embodiment
Plating tank shown in Fig. 1, comprise groove 1, cell body 1 upper end is provided with the cross bar 2 of surface with several grooves, cross bar 2 lower end has been arranged with first anode plate 3, second anode plate 6, described first anode plate 3, second anode plate 6 in opposite directions side is respectively equipped with the first shielding slab 4 having communicating pores, have the secondary shielding plate 5 of communicating pores, described first anode plate 1, second anode plate 6, first shielding slab 4, secondary shielding plate 5 is slidably connected with cross bar 2 respectively, described cell body 1 upper end is provided with vapor-recovery unit 8, heating unit 9 is provided with in cell body 1, magnetic stirring apparatus 10, store battery 11 is provided with outside cell body 1, described first anode plate 3, second anode plate 6, vapor-recovery unit 8, heating unit 9, magnetic stirring apparatus 10 is connected with store battery 11 respectively.
Described vapor-recovery unit 8 is arranged on cell body 1 upper end by pillar stiffener 7.
Communicating pores quantity on described first shielding slab 4, secondary shielding plate 5 is two or more.
Described cell body 1 is provided with liquid level charactron.
Described heating unit 9 is heating tube.
During plating, plated item is placed in plating tank, and be placed between first anode plate 1, second anode plate 6, at this moment, plated item is as negative electrode, then according to the size of plated item, regulate the distance of negative electrode and anode, then heating unit 9, magnetic stirring apparatus 10, vapor-recovery unit 8 is opened, electroplate liquid in heating unit 9 pairs of cell bodies 1 heats, and the electroplate liquid in magnetic stirring apparatus 10 pairs of cell bodies 1 stirs, and so just substantially increases electroplating effect, make coating more even, vapor-recovery unit 8 can recycle the steam that electroplate liquid produces.
Because cross bar 2 surface is with several grooves, positive plate, shielding slab can be hung on groove, prevents it from sliding, reduce irrelevant variable to the impact of test-results; Because the first shielding slab 4, secondary shielding plate 5 are provided with communicating pores, the current density in electroplate liquid can be regulated, improve electroplating quality.
The technical characteristic described in detail is not had to be prior art in the application.Above-described embodiment is the principle of illustrative the application and effect thereof only, but not for limiting the application.Any person skilled in the art scholar all under the spirit and category of the application, can modify above-described embodiment or changes.Therefore, have in art and usually know that the knowledgeable modifies or changes not departing from all equivalences completed under the spirit and technological thought that the application discloses, must be contained by the claim of the application.
Claims (5)
1. a plating tank, it is characterized in that: comprise cell body, cell body upper end is provided with the cross bar of surface with several grooves, cross bar lower end has been arranged with first anode plate, second anode plate, described first anode plate, second anode plate in opposite directions side is respectively equipped with the first shielding slab having communicating pores, have the secondary shielding plate of communicating pores, described first anode plate, second anode plate, first shielding slab, secondary shielding plate is slidably connected with cross bar respectively, described cell body upper end is provided with vapor-recovery unit, heating unit is provided with in cell body, magnetic stirring apparatus, store battery is provided with outside cell body, described first anode plate, second anode plate, vapor-recovery unit, heating unit, magnetic stirring apparatus is connected with store battery respectively.
2. according to plating tank according to claim 1, it is characterized in that: described vapor-recovery unit is arranged on cell body upper end by pillar stiffener.
3. according to plating tank according to claim 1, it is characterized in that: the communicating pores quantity on described first shielding slab, secondary shielding plate is two or more.
4. according to plating tank according to claim 1, it is characterized in that: described cell body is provided with liquid level charactron.
5. according to plating tank according to claim 1, it is characterized in that: described heating unit is heating tube.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201520458734.4U CN204918821U (en) | 2015-06-30 | 2015-06-30 | Plating bath |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201520458734.4U CN204918821U (en) | 2015-06-30 | 2015-06-30 | Plating bath |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN204918821U true CN204918821U (en) | 2015-12-30 |
Family
ID=54967967
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201520458734.4U Expired - Fee Related CN204918821U (en) | 2015-06-30 | 2015-06-30 | Plating bath |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN204918821U (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN105002548A (en) * | 2015-06-30 | 2015-10-28 | 苏州华日金菱机械有限公司 | Plating bath |
| CN115925449A (en) * | 2022-12-30 | 2023-04-07 | 浙江朗德电子科技有限公司 | Preparation method of functional electrode for tail gas sensor chip |
-
2015
- 2015-06-30 CN CN201520458734.4U patent/CN204918821U/en not_active Expired - Fee Related
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN105002548A (en) * | 2015-06-30 | 2015-10-28 | 苏州华日金菱机械有限公司 | Plating bath |
| CN115925449A (en) * | 2022-12-30 | 2023-04-07 | 浙江朗德电子科技有限公司 | Preparation method of functional electrode for tail gas sensor chip |
| CN115925449B (en) * | 2022-12-30 | 2023-11-07 | 浙江朗德电子科技有限公司 | Preparation method of functional electrode for tail gas sensor chip |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| CF01 | Termination of patent right due to non-payment of annual fee | ||
| CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20151230 Termination date: 20160630 |