CN204911266U - Normal atmospheric temperature is in liquid gaseous reference material down and takes place system - Google Patents
Normal atmospheric temperature is in liquid gaseous reference material down and takes place system Download PDFInfo
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- CN204911266U CN204911266U CN201520502559.4U CN201520502559U CN204911266U CN 204911266 U CN204911266 U CN 204911266U CN 201520502559 U CN201520502559 U CN 201520502559U CN 204911266 U CN204911266 U CN 204911266U
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Abstract
The utility model relates to a gaseous reference material's preparation field specifically is a normal atmospheric temperature is in liquid gaseous reference material down and takes place system, including carrier gas pipeline and background air pipe, carrier gas pipeline and background air pipe are divided equally and have do not been connected gradually manometer (1), a current stabilizer (2), drying device (3), the 2nd current stabilizer (4) and flowmeter (5), the import of exit linkage gaseous generating device (6) of background air pipe, be equipped with accuse temperature stove in gaseous generating device (6), put in the accuse temperature stove anemostat (7), the export of gaseous generating device (6) is passed through the pipeline and is connected with mixing arrangement's preparation gaseous air inlet (11), the export of carrier gas pipeline is connected with mixing arrangement's diluent gas air inlet (12). The utility model relates to a rationally, easily distribution in -process temperature can be guaranteed in the operation, and the accurate control of flow isoparametric has improved experimental stability, has practiced thrift the space.
Description
Technical field
The utility model relates to the preparation field of gas reference material, is in liquid gas reference material generation systems under being specially a kind of normal temperature.
Background technology
In the preparation field of gas reference material, the preparation of gas reference material is mainly divided into static method (weighing method, divide platen press, Capacity Ratio mixing method, static capacity method) and dynamic method (osmosis, diffusion method, flow-rate ratio mixing method etc.), in static method, weighing method and the standby calibrating gas major storage of dividing potential drop legal system are in high pressure or pressurized cylinder, due to the wall reaction such as physical absorption or chemistry can be there is between container and packaging gas, thus stably to exist and some ripple gas alive or corrosive gas are difficult to realize, and the content range of preparation also receives restriction.And osmosis in dynamic method and diffusion method just in time can make up, and this is not enough, it can use the direct configuration standard gas of material of known purity, also the calibrating gas that the high pressure of known content is packed can be diluted, the gas content scope of configuration scope as required can carry out any option and installment.
The configuration of existing standard gas mainly adopts static method, dynamic method also has part to use, but the difference according to its principle separately respectively has pluses and minuses, wherein flow-rate ratio mixing method is according to the calibrating gas that can configure ppm in ISO6145-7:2001, but its space occupied is comparatively large, operates more complicated; Osmosis and diffusion method can configure 10 according in ISO6145-10,8-2002
-9~ 10
-6the gas of concentration, but osmosis has certain useful life.
For diffusion denuder method configuration gas reference material, the scholar of present research is also more, but also there is a problem herein, be exactly that mixing arrangement in general anemostat dynamic air-distributing device uses threeway, by the gas of its mixing, there is intermittent stability, gas can not fully mix, and is necessary to improve.
Summary of the invention
The purpose of this utility model is uneven for solving gas and vapor permeation in prior art, provides a kind of novel gas reference material generation systems.
The utility model adopts following technical scheme to realize:
Liquid gas reference material generation systems is under a kind of normal temperature, comprise carrier gas pipeline and background gas pipeline, described carrier gas pipeline and background gas pipeline are connected with Pressure gauge, the first constant-current stabilizer, drying device, the second constant-current stabilizer and flowmeter respectively in turn, the outlet of described background gas pipeline connects the import of gas generating unit, temperature control furnace is provided with in described gas generating unit, be placed with anemostat in described temperature control furnace, the outlet of described gas generating unit is connected with the preparation gas inlet of mixing arrangement by pipeline; The outlet of described carrier gas pipeline is connected with the diluent gas air inlet of mixing arrangement.
Described mixing arrangement comprises casing, mixing ante-chamber and mixing back cavity is divided into by aperture turbulent flow baffle plate in described casing, described mixing ante-chamber is provided with preparation gas inlet and diluent gas air inlet, described preparation gas inlet and diluent gas air inlet are positioned at same plane and are in vertical distribution; Described mixing back cavity is provided with mixed gas outlet.
The mixed gas outlet of described mixing arrangement is used system by a branch line connection standard gas, is connected exhaust gas processing device by installing another branch line valvular.
For liquid component gas is placed in anemostat under normal temperature.Pressure gauge one end is connected with source of the gas pipeline, source of the gas pipeline communicates with compressed air source, the Pressure gauge other end is by connecting line and volume control device (the first constant-current stabilizer, drying device, second constant-current stabilizer and flowmeter), one road background gas air-flow deliver a gas in gas generating unit by connecting line, the component gas that is evaporated in anemostat is taken out of with certain flow in mixing arrangement from gas generating unit, another road enters in mixing arrangement with the carrier gas flow needed, after mixing arrangement, mist one tunnel uses as calibrating gas, harmless treatment is carried out through exhaust gas processing device in another road.
This generation systems is by being stored in suitable anemostat for configuration gas component, and at stable temperature, its gas vapor is along uniform capillary diffusion, and background gas is mixed and made into normal mixture body with known mass flow by the other end of capillary and component gas.The calibrating gas of variable concentrations content can be obtained by changing another road carrier gas flow.
During use, first close the valve leading to exhaust gas processing device, make the calibrating gas Engage of standard gas operative installations prepared.Switch on power, make the temperature of temperature control furnace reach temperature required, load the anemostat filled for configuration component, open source of the gas, pass into background gas and carrier gas.Regulate carrier gas flow to required flow, the calibrating gas for configuration content can be obtained.After finishing using, standard of closure gas operative installations, opens the valve towards exhaust gas processing device, enters in air after carrying out vent gas treatment.Wherein, the temperature control furnace adopting temperature control precision to reach 0.1 DEG C controls the temperature of generating means, can ensure the gas stabilization occurring out; Error is the accurate control of the flowmeter guarantee distribution flow in process of 1%; The vertical air inlet mouth of design, aperture turbulent flow baffle-type mixing arrangement can ensure the uniformity of gas and vapor permeation.The application of this device can be implemented in line formula configuration standard gas, now with the current.
Further, what mix to make preparation gas and carrier gas is more even, and the volume mixing ante-chamber in described mixing arrangement is greater than the volume of mixing back cavity.Be positioned on the concentric circles on aperture turbulent flow baffle plate and offer turbulent flow hole, the aperture being positioned at the turbulent flow hole on same circle is equal, increases and the aperture in turbulent flow hole increases with concentric radius of a circle.Two vertical air inlet mouths and aperture baffle-type turbulent closure scheme is adopted in mixing arrangement.The preparation gas obtained from generating means and carrier gas are entered mixing arrangement in vertical manner, after its mixing, can ensure the mist obtaining uniform desired concn by aperture turbulent closure scheme baffle plate again, what can be good at solution institute configuration standard gas mixes sex chromosome mosaicism.
The utility model is reasonable in design, and be easy to operation, can ensure temperature in distribution process, the isoparametric accurate control of flow, improves test stability, saved space.Simultaneously by a large amount of test datas, determine that studied gas reference material generation systems can accurately prepare the calibrating gas of desired concn.
Accompanying drawing explanation
Fig. 1 represents structural representation of the present utility model.
Fig. 2 represents the structural representation of mixing arrangement.
Fig. 3 represents the structural representation of aperture turbulent flow baffle plate.
In figure, 1-Pressure gauge, 2-first constant-current stabilizer, 3-drying device, 4-second constant-current stabilizer, 5-flowmeter, 6-gas generating unit, 7-anemostat, 8-loads in mixture device, and 9-calibrating gas uses system, 10-exhaust gas processing device, 11-prepares gas inlet, 12-diluent gas air inlet, 13-aperture turbulent flow baffle plate, 14-mixed gas outlet, 15-casing, 16-mixing ante-chamber, 17-mixing back cavity, 18-turbulent flow hole, 19-valve.
Detailed description of the invention
Below in conjunction with accompanying drawing, specific embodiment of the utility model is described in detail.
Be in a liquid gas reference material generation systems under normal temperature, comprise gas generating unit, volume control device, mixing arrangement and exhaust gas processing device.
As shown in Figure 1, comprise carrier gas pipeline and background gas pipeline, described carrier gas pipeline and background gas pipeline are connected with Pressure gauge 1, first constant-current stabilizer 2, drying device 3, second constant-current stabilizer 4 and flowmeter 5 respectively in turn.
As shown in Figure 1, the outlet of described background gas pipeline connects the import of gas generating unit 6, is provided with temperature control furnace, is placed with anemostat 7 in described temperature control furnace in described gas generating unit 6.Anemostat 7 is liquid component gas under being placed with normal temperature, when the temperature increases, component gas becomes gaseous state and sheds by the capillary of anemostat, and the temperature control furnace adopting temperature control precision to reach 0.1 DEG C controls the temperature of generating means, can ensure the gas stabilization occurring out.
As shown in Figure 1, the outlet of described gas generating unit 6 is connected with the preparation gas inlet 11 of mixing arrangement 8 by pipeline.
As shown in Figure 1, the outlet of described carrier gas pipeline is connected with the diluent gas air inlet 12 of mixing arrangement 8.
As shown in Figure 1, the mixed gas outlet 14 of described mixing arrangement 8 is used system 9 by a branch line connection standard gas, is connected exhaust gas processing device 10 by another branch line being provided with valve 19.
As shown in Figure 2, described mixing arrangement 8 comprises casing 15, is divided into mixing ante-chamber 16 and mixing back cavity 17 in described casing 15 by aperture turbulent flow baffle plate 13, and wherein, the volume of mixing ante-chamber 16 is greater than the volume of mixing back cavity 17.Described mixing ante-chamber 16 is provided with preparation gas inlet 11 and diluent gas air inlet 12, described preparation gas inlet 11 and diluent gas air inlet 12 are positioned at same plane and are in vertical distribution; Described mixing back cavity 17 is provided with mixed gas outlet 14.As shown in Figure 3, be positioned on the concentric circles on aperture turbulent flow baffle plate 13 and offer turbulent flow hole 18, the aperture being positioned at the turbulent flow hole 18 on same circle is equal, increases and the aperture in turbulent flow hole 18 increases with concentric radius of a circle.Two vertical air inlet mouths and aperture baffle-type turbulent closure scheme is adopted in the mixing arrangement of design.The preparation gas obtained from generating means and carrier gas are entered mixing arrangement in vertical manner, after its mixing, can ensure the mist obtaining uniform desired concn by aperture turbulent closure scheme baffle plate again, what can be good at solution institute configuration standard gas mixes sex chromosome mosaicism.
By the research to gas reference material generation systems, establish and be in liquid gas reference material generation systems at normal temperatures, this device is in the online configuration of liquid gas standard substance under can realizing normal temperature.
It should be noted last that; above embodiment is only in order to illustrate the technical solution of the utility model and unrestricted; although be described in detail with reference to the utility model embodiment; those of ordinary skill in the art is to be understood that; the technical solution of the utility model is modified or equivalent replacement; do not depart from the spirit and scope of the technical solution of the utility model, it all should be contained in claims of the present utility model.
Claims (3)
1. under a normal temperature, be in liquid gas reference material generation systems, it is characterized in that: comprise carrier gas pipeline and background gas pipeline, described carrier gas pipeline and background gas pipeline are connected with Pressure gauge (1) respectively in turn, first constant-current stabilizer (2), drying device (3), second constant-current stabilizer (4) and flowmeter (5), the outlet of described background gas pipeline connects the import of gas generating unit (6), described gas generating unit is provided with temperature control furnace in (6), anemostat (7) is placed with in described temperature control furnace, the outlet of described gas generating unit (6) is connected with the preparation gas inlet (11) of mixing arrangement (8) by pipeline, the outlet of described carrier gas pipeline is connected with the diluent gas air inlet (12) of mixing arrangement (8),
Described mixing arrangement (8) comprises casing (15), mixing ante-chamber (16) and mixing back cavity (17) is divided into by aperture turbulent flow baffle plate (13) in described casing (15), described mixing ante-chamber (16) is provided with preparation gas inlet (11) and diluent gas air inlet (12), described preparation gas inlet (11) and diluent gas air inlet (12) are positioned at same plane and are in vertical distribution; Described mixing back cavity (17) is provided with mixed gas outlet (14);
The mixed gas outlet (14) of described mixing arrangement (8) is used system (9) by a branch line connection standard gas, is connected exhaust gas processing device (10) by another branch line being provided with valve (19).
2. be in liquid gas reference material generation systems under normal temperature according to claim 1, it is characterized in that: in described mixing arrangement (8), the volume of mixing ante-chamber (16) is greater than the volume of mixing back cavity (17).
3. under normal temperature according to claim 1 and 2, be in liquid gas reference material generation systems, it is characterized in that: be positioned on the concentric circles on aperture turbulent flow baffle plate (13) and offer turbulent flow hole (18), the aperture being positioned at the turbulent flow hole (18) on same circle is equal, increases and the aperture of turbulent flow hole (18) increases with concentric radius of a circle.
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| CN201520502559.4U CN204911266U (en) | 2015-07-14 | 2015-07-14 | Normal atmospheric temperature is in liquid gaseous reference material down and takes place system |
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Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN108554207A (en) * | 2018-06-15 | 2018-09-21 | 上海雷密传感技术有限公司 | A kind of low concentration calibrating gas continues generating means and its method for generation |
| CN109283036A (en) * | 2018-08-28 | 2019-01-29 | 南京天博环境检测技术有限公司 | A kind of portable gas pollutant dilution device |
| CN114184446A (en) * | 2021-12-21 | 2022-03-15 | 中国计量科学研究院 | Volatile organic gas standard substance preparation system capable of weighing on line |
-
2015
- 2015-07-14 CN CN201520502559.4U patent/CN204911266U/en active Active
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN108554207A (en) * | 2018-06-15 | 2018-09-21 | 上海雷密传感技术有限公司 | A kind of low concentration calibrating gas continues generating means and its method for generation |
| CN108554207B (en) * | 2018-06-15 | 2023-12-12 | 上海雷密传感技术有限公司 | Low-concentration standard gas continuous generation device and generation method thereof |
| CN109283036A (en) * | 2018-08-28 | 2019-01-29 | 南京天博环境检测技术有限公司 | A kind of portable gas pollutant dilution device |
| CN114184446A (en) * | 2021-12-21 | 2022-03-15 | 中国计量科学研究院 | Volatile organic gas standard substance preparation system capable of weighing on line |
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