CN204908081U - Double -deck plain weave down coat surface fabric of imitative needle seam - Google Patents

Double -deck plain weave down coat surface fabric of imitative needle seam Download PDF

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Publication number
CN204908081U
CN204908081U CN201520256126.5U CN201520256126U CN204908081U CN 204908081 U CN204908081 U CN 204908081U CN 201520256126 U CN201520256126 U CN 201520256126U CN 204908081 U CN204908081 U CN 204908081U
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China
Prior art keywords
fabric
weft yarn
imitative
warp thread
lower floor
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Withdrawn - After Issue
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CN201520256126.5U
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Chinese (zh)
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不公告发明人
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FUJIAN LONGFENG TEXTILE TECHNOLOGY INDUSTRY Co Ltd
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FUJIAN LONGFENG TEXTILE TECHNOLOGY INDUSTRY Co Ltd
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Abstract

The utility model discloses a double -deck plain weave down coat surface fabric of imitative needle seam, including upper surface fabric, lower floor's surface fabric and imitative seam woof, this upper strata surface fabric is woven by a plurality of first warp and a plurality of first woof and is formed, and this lower floor's surface fabric is woven by a plurality of second warp and a plurality of second woof and is formed, should imitative seam woof wears to establish and distinguishes the space between upper surface fabric and the lower floor's surface fabric at a distance from as the relatively independent region of a plurality of using between upper surface fabric and the lower floor's surface fabric, imitative seam woof is the periodic cycle setting, all has the section of sinking and the section of mentioning that are connected in every cycle, each period number in below of lower floor's surface fabric that sinks, and each mentions the top of period number in upper surface fabric, the rugosity of imitative seam woof be the 7 -8 times of first warp, first woof, second warp and second woof rugosity.

Description

A kind of imitative pin stitches double-deck plain weave feather dress fabric
Technical field
The utility model relates to garment material field, and what be specifically related to is that a kind of imitative pin stitches double-deck plain weave feather dress fabric.
Background technology
Advance by leaps and bounds the today of developing in science and technology, people also propose higher requirement to the performance parameter of clothing fabric.For feather dress fabric, traditional manufacture method is generally weave upper shell fabric and lower floor's fabric respectively with the requirement of highly dense plain, then after cutting, adopt the mode of stitching upper shell fabric and lower floor's fabric to be stitched together again, and in order to ensure that the eider down between upper shell fabric and lower floor's fabric can not converge together, suture also needs to be separated in region between upper shell fabric and lower floor's fabric as multiple fritter independent of each other, being filled with eider down respectively in each fritter, there is not disorderly to go here and there phenomenon in the eider down between different pocket.
But at least there is following defect in above-mentioned traditional handicraft:
One, because upper shell fabric and lower floor's fabric are independent braidings, and the step carrying out sewing up also is needed after braiding, so comparatively time-consuming, have impact on output and cost;
Two, owing to being the stitching that the mode of employing sewing realizes between upper shell fabric and lower floor's fabric, define more pin hole due to essential in sewing process, be so very easy to saturating suede phenomenon occurs.
For the problems referred to above, the applicant's hammer away, has this case to produce then.
Utility model content
Main purpose of the present utility model is to provide a kind of imitative pin to stitch double-deck plain weave feather dress fabric, and not only production efficiency is high for it, but also can avoid the generation of suede phenomenon.
In order to reach above-mentioned purpose, solution of the present utility model is:
A kind of imitative pin stitches double-deck plain weave feather dress fabric, wherein, comprise shell fabric, lower floor's fabric and imitative seam weft yarn, on this, shell fabric is formed by some first warp thread and some first weft yarns, this lower floor's fabric is formed by some second warp thread and some second weft yarns, and this imitative seam weft yarn is located between shell fabric and lower floor's fabric so that the space region between upper shell fabric and lower floor's fabric is divided into several relatively independent regions; Described imitative seam weft yarn is that loop cycle is arranged, and all have the sinking section and the section of mentioning that are connected in each cycle, each sinking section is positioned at the below of lower floor's fabric, and each section of mentioning is positioned at the top of shell fabric; The rugosity of described imitative seam weft yarn is 7-8 times of the first warp thread, the first weft yarn, the second warp thread and the second weft yarn rugosity.
Further, the span of each sinking section and each section of mentioning is at least 24 first warp thread or the second warp thread.
Further, this first warp thread and the first weft yarn adopt 20D, and weft density is more than or equal to 150/CM, and this second warp thread and the second weft yarn adopt 20D, and weft density is more than or equal to 150/CM.
Further, this first warp thread and the first weft yarn adopt 30D, and weft density is more than or equal to 118/CM, and this second warp thread and the second weft yarn adopt 30D, and weft density is more than or equal to 118/CM.
Further, this imitative seam weft yarn adopts the chinlon filament of 140D/48F, 500T/M.
Further, described imitative seam weft yarn is two that are disposed adjacent, and when an imitative seam weft yarn is in sinking section, another root adjacent imitative seam weft yarn is in the section of mentioning, and when an imitative seam weft yarn is in the section of mentioning, another imitative seam weft yarn adjacent is in sinking section.
After adopting said structure, the one that the utility model relates to is imitated pin and is stitched double-deck plain weave feather dress fabric, and the feather dress fabric of its fabric formed not only in appearance with traditional is completely the same, and compared with prior art, it at least has following beneficial effect:
One, the utility model is on processing after shell fabric and lower floor's fabric, and it does not need equally with prior art to carry out cutting, does not need to carry out marker space pin seam more yet, has economized the trouble of two cutting suture again;
Two, the marker space having automatic institutional framework to produce due to the utility model does not need pin to stitch, and so just without pin hole, prevents the generation of suede;
Three, because upper shell fabric is formed by the first warp thread and the first weft yarns, lower floor's fabric has the second warp thread and the second weft yarns to form, so upper shell fabric and lower floor's fabric can be independent of one another, select arbitrarily different raw materials, such as go up shell fabric and can adopt terylene, lower floor's fabric then adopts polyamide fibre; Similarly, upper shell fabric and lower floor's fabric also can adopt different decorative patterns, and such as go up shell fabric and adopt twill, lower floor's fabric adopts plain weave; And for example go up shell fabric and adopt the patterns such as small jacquard sub-box, lower floor's fabric adopts another kind of figure, and both conflict not;
Four, this imitative seam weft yarn can be vertical bar, also can be that shaped form, waveform and various pattern are unimpeded when only needing guarantee to fill eider down.
Accompanying drawing explanation
Fig. 1 is the schematic diagram of manufacture method when weaving shell fabric and lower floor's fabric respectively that the utility model relates to that a kind of imitative pin stitches double-deck plain weave feather dress fabric.
Fig. 2 is that the utility model relates to a kind of imitative pin and to stitch in double-deck plain weave feather dress fabric imitative seam weft yarn and the structural relation schematic diagram between the first warp thread and the first weft yarn.
In figure:
Upper shell fabric-1; First warp thread-11; First weft yarn-12;
Lower floor's fabric-2; Second warp thread-21; Second weft yarn-22;
Imitative seam weft yarn-3; Sinking section-31; The section of mentioning-32.
Detailed description of the invention
In order to explain the technical solution of the utility model further, below by specific embodiment, the utility model is elaborated.
As depicted in figs. 1 and 2, the one that the utility model relates to is imitated pin and is stitched double-deck plain weave feather dress fabric, comprises shell fabric 1, lower floor's fabric 2 and imitative seam weft yarn 3.
On this, shell fabric 1 is woven by some first warp thread 11 and some first weft yarns 12 and forms, and this lower floor's fabric 2 is woven by some second warp thread 21 and some second weft yarns 22 and forms.
This imitative seam weft yarn 3 is located between shell fabric 1 and lower floor's fabric 2 so that the space region between upper shell fabric 1 and lower floor's fabric 2 is divided into several relatively independent regions; Described imitative seam weft yarn 3 is arranged in loop cycle, and all have the sinking section 31 and the section of mentioning 32 that are connected in each cycle, each sinking section 31 is positioned at the below of lower floor's fabric 2, and each section of mentioning 32 is positioned at the top of shell fabric 1; The rugosity of described imitative seam weft yarn 3 is 7-8 times of the first warp thread 11, first weft yarn 12, second warp thread 21 and the second weft yarn 22 rugosity, and so this imitative seam weft yarn 3 just has effect of simulation suture.More specifically, in order to have simulated effect comparatively true to nature, the span of each sinking section 31 and each section of mentioning 32 is at least 24 first warp thread 11 or the second warp thread 21.
In order to ensure that the risk of suede can not occur for upper shell fabric 1 and lower floor's fabric 2, if this first warp thread 11 and the first weft yarn 12 adopt 20D, weft density is more than or equal to 150/CM, similarly, this second warp thread 21 and the second weft yarn 22 adopt 20D, and weft density is more than or equal to 150/CM.If this first warp thread 11 and the first weft yarn 12 adopt 30D, weft density then should be more than or equal to 118/CM, and similarly, this second warp thread 21 and the second weft yarn 22 adopt 30D, and weft density is more than or equal to 118/CM.
Have in order to ensure the lines in marker space and embody pin seam effect as the line that sewing machine stitched, this imitative seam weft yarn 3 adopts the chinlon filament of 140D/48F, 500T/M, wherein 500T/M refer to every meter imitative seam weft yarn 3 its need rotation 500 to enclose, thus there is better simulation suture effect.
As shown in Figure 2, more preferably, in order to allow both sides inside and outside eiderdown shell fabric, all there is emulation suture effect, described imitative seam weft yarn 3 is two of being disposed adjacent, when an imitative seam weft yarn 3 is in sinking section 31, another root adjacent imitative seam weft yarn 3 is in the section of mentioning 32, and when imitative seam weft yarn 3 is in the section of mentioning 32, another imitative seam weft yarn 3 adjacent is in sinking section 31.
Another object of the present utility model is to provide a kind of imitative pin to stitch the manufacture method of double-deck plain weave feather dress fabric, comprises the steps:
1. Weaving device is adopted, be divided into two-layer up and down, weaving goes out upper shell fabric 1 and lower floor's fabric 2 respectively, and on this, shell fabric 1 is woven by some first warp thread 11 and some first weft yarns 12 and forms, and this lower floor's fabric 2 is woven by some second warp thread 21 and some second weft yarns 22 and forms; Similarly, in order to prevent the generation of suede phenomenon, this first warp thread 11 and the first weft yarn 12 adopt 20D, and weft density is more than or equal to 150/CM, and this second warp thread 21 and the second weft yarn 22 adopt 20D, and weft density is more than or equal to 150/CM; This first warp thread 11 and the first weft yarn 12 adopt 30D, and weft density is more than or equal to 118/CM, and this second warp thread 21 and the second weft yarn 22 adopt 30D, and weft density is more than or equal to 118/CM;
2. upper shell fabric 1 and lower floor's fabric 2 are superimposed together, feeding imitative seam weft yarn 3, rugosity of this imitative seam weft yarn 3 is 7-8 times of the first warp thread 11, first weft yarn 12, second warp thread 21 and the second weft yarn 22 rugosity;
3. under the effect carrying yarn equipment, this imitative seam weft yarn 3 will be raised to form several cycles after at least 24 first warp thread 11 or the second warp thread 21, each cycle all has the sinking section 31 and the section of mentioning 32 that are connected, each sinking section 31 is positioned at the below of lower floor's fabric 2, and each section of mentioning 32 is positioned at the top of shell fabric 1;
4. above-mentioned imitative seam weft yarn 3 is all sent into obtained finished product along the bearing of trend of warp every one section at upper shell fabric 1 and lower floor's fabric 2; This imitative seam weft yarn 3 adopts the chinlon filament of 140D/48F, 500T/M.
Step 2. with step 3. in, it is sent into second imitative seam weft yarn 3 when two imitative seam weft yarns 3, first imitative seam weft yarns 3 are in sinking section 31 continuously and is in the section of mentioning 32, and when first imitative seam weft yarn 3 is in the section of mentioning 32, second imitative seam weft yarn 3 is in sinking section 31.
Like this, the one that the utility model relates to is imitated pin and is stitched double-deck plain weave feather dress fabric and manufacture method thereof, and the feather dress fabric of its fabric formed not only in appearance with traditional is completely the same, and compared with prior art, it at least has following beneficial effect:
One, the utility model is on processing after shell fabric 1 and lower floor's fabric 2, and it does not need equally with prior art to carry out cutting, does not need to carry out marker space pin seam more yet, has economized the trouble of two cutting suture again;
Two, the marker space having automatic institutional framework to produce due to the utility model does not need pin to stitch, and so just without pin hole, prevents the generation of suede;
Three, because upper shell fabric 1 is woven by the first warp thread 11 and the first weft yarn 12 to form, lower floor's fabric 2 has the second warp thread 21 and the braiding of the second weft yarn 22 to form, so upper shell fabric 1 and lower floor's fabric 2 can be independent of one another, select arbitrarily different raw materials, such as go up shell fabric 1 and can adopt terylene, lower floor's fabric 2 adopts polyamide fibre; Similarly, upper shell fabric 1 and lower floor's fabric 2 also can adopt different decorative patterns, and such as go up shell fabric 1 and adopt twill, lower floor's fabric 2 adopts plain weave; And for example go up shell fabric 1 and adopt the patterns such as small jacquard sub-box, lower floor's fabric 2 adopts another kind of figure, and both conflict not;
Four, this imitative seam weft yarn 3 can be vertical bar, also can be that shaped form, waveform and various pattern are unimpeded when only needing guarantee to fill eider down.
Above-described embodiment and graphic and non-limiting product form of the present utility model and style, any person of an ordinary skill in the technical field, to its suitable change done or modification, all should be considered as not departing from patent category of the present utility model.

Claims (6)

1. an imitative pin stitches double-deck plain weave feather dress fabric, it is characterized in that, comprise shell fabric, lower floor's fabric and imitative seam weft yarn, on this, shell fabric is formed by some first warp thread and some first weft yarns, this lower floor's fabric is formed by some second warp thread and some second weft yarns, and this imitative seam weft yarn is located between shell fabric and lower floor's fabric so that the space region between upper shell fabric and lower floor's fabric is divided into several relatively independent regions; Described imitative seam weft yarn is that loop cycle is arranged, and all have the sinking section and the section of mentioning that are connected in each cycle, each sinking section is positioned at the below of lower floor's fabric, and each section of mentioning is positioned at the top of shell fabric; The rugosity of described imitative seam weft yarn is 7-8 times of the first warp thread, the first weft yarn, the second warp thread and the second weft yarn rugosity.
2. a kind of imitative pin as claimed in claim 1 stitches double-deck plain weave feather dress fabric, and it is characterized in that, the span of each sinking section and each section of mentioning is at least 24 first warp thread or the second warp thread.
3. a kind of imitative pin as claimed in claim 1 stitches double-deck plain weave feather dress fabric, it is characterized in that, this first warp thread and the first weft yarn adopt 20D, and weft density is more than or equal to 150/CM, this second warp thread and the second weft yarn adopt 20D, and weft density is more than or equal to 150/CM.
4. a kind of imitative pin as claimed in claim 1 stitches double-deck plain weave feather dress fabric, it is characterized in that, this first warp thread and the first weft yarn adopt 30D, and weft density is more than or equal to 118/CM, this second warp thread and the second weft yarn adopt 30D, and weft density is more than or equal to 118/CM.
5. a kind of imitative pin as claimed in claim 1 stitches double-deck plain weave feather dress fabric, it is characterized in that, this imitative seam weft yarn adopts the chinlon filament of 140D/48F, 500T/M.
6. a kind of imitative pin as claimed in claim 1 stitches double-deck plain weave feather dress fabric, it is characterized in that, described imitative seam weft yarn is two that are disposed adjacent, when an imitative seam weft yarn is in sinking section, another root adjacent imitative seam weft yarn is in the section of mentioning, and when an imitative seam weft yarn is in the section of mentioning, another imitative seam weft yarn adjacent is in sinking section.
CN201520256126.5U 2015-04-24 2015-04-24 Double -deck plain weave down coat surface fabric of imitative needle seam Withdrawn - After Issue CN204908081U (en)

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CN201520256126.5U CN204908081U (en) 2015-04-24 2015-04-24 Double -deck plain weave down coat surface fabric of imitative needle seam

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Application Number Priority Date Filing Date Title
CN201520256126.5U CN204908081U (en) 2015-04-24 2015-04-24 Double -deck plain weave down coat surface fabric of imitative needle seam

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Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN104872874A (en) * 2015-04-24 2015-09-02 福建龙峰纺织科技实业有限公司 Imitation needle-sewn double-layer plain fabric for down coats and manufacturing method thereof
CN105671726A (en) * 2016-02-25 2016-06-15 河南工程学院 Double-layer lining-free down-proof fabric
CN112746374A (en) * 2020-12-03 2021-05-04 信泰(福建)科技有限公司 Knitted fabric imitating splicing and sewing and weaving method and application thereof

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN104872874A (en) * 2015-04-24 2015-09-02 福建龙峰纺织科技实业有限公司 Imitation needle-sewn double-layer plain fabric for down coats and manufacturing method thereof
CN104872874B (en) * 2015-04-24 2016-07-06 福建龙峰纺织科技实业有限公司 A kind of imitative double-deck plain weave feather dress fabric of pin seam and manufacture method thereof
CN105671726A (en) * 2016-02-25 2016-06-15 河南工程学院 Double-layer lining-free down-proof fabric
CN112746374A (en) * 2020-12-03 2021-05-04 信泰(福建)科技有限公司 Knitted fabric imitating splicing and sewing and weaving method and application thereof

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AV01 Patent right actively abandoned

Granted publication date: 20151230

Effective date of abandoning: 20160706

C25 Abandonment of patent right or utility model to avoid double patenting