CN204841441U - Full -automatic polish preparation system - Google Patents

Full -automatic polish preparation system Download PDF

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Publication number
CN204841441U
CN204841441U CN201520609185.6U CN201520609185U CN204841441U CN 204841441 U CN204841441 U CN 204841441U CN 201520609185 U CN201520609185 U CN 201520609185U CN 204841441 U CN204841441 U CN 204841441U
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CN
China
Prior art keywords
polishing fluid
polishing
operated valve
pneumatic operated
preparing tank
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Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
CN201520609185.6U
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Chinese (zh)
Inventor
高烨
胡晓亮
李宏儒
赵文龙
魏海霞
张磊
焦二强
陈卫群
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MCL Electronic Materials Ltd
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MCL Electronic Materials Ltd
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Priority to CN201520609185.6U priority Critical patent/CN204841441U/en
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Publication of CN204841441U publication Critical patent/CN204841441U/en
Expired - Fee Related legal-status Critical Current
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Abstract

The utility model provides a full -automatic polish preparation system, belongs to monocrystalline silicon polishing piece production field, and main line and bye -pass are leading -in to the liquid storage pot in with pure water and polish stoste respectively, and then are supplied to the polish to prepare jar by the liquid storage pot, are provided with level sensor in liquid storage pot and polish are prepared jar, and the break -make of each pipeline of signal control that level sensor exported in the control system of peripheral hardware prepared jar according to liquid storage pot and polish is in order to realize joining in marriage liquid and confession liquid automatically. This preparation system simple structure, configuration polish concentration is stable, does not have the polish crystallization, has increased the sample branch road moreover and can in time detect the polish pH value that the configuration is good, has reduced human error, has guaranteed product quality's stability.

Description

A kind of full automatic polishing liquid compounding system
Technical field
The utility model relates to monocrystalline silicon buffing sheet production field, specifically a kind of full automatic polishing liquid compounding system.
Background technology
The polishing fluid compounding system that current monocrystalline silicon buffing sheet production field uses, the polishing fluid stoste mainly measuring prescribed volume by labo r usage's cup is poured in preparing tank, then manually add water in preparing tank, pure water valve is closed after water to regulation liquid level, open circulating pump and carry out polishing fluid circulation, after circulation certain hour, close circulating pump, open polishing fluid transfer pump, polishing fluid is provided to polissoir, when equipment does not need polishing fluid, polishing fluid is got back to again in preparing tank through reflux line, reach the object preparing polishing fluid to scale, but there is following shortcoming in existing artificial preparation polishing fluid system: 1) manually measures polishing fluid, exist and measure error, the polishing stoste existence that different operating personnel measure measures difference, the polishing fluid concentration after preparation is caused to occur fluctuation, unstable product quality can be caused, 2) after measuring polishing stoste with measuring cup, if rinse measuring cup not in time, can there is polishing fluid crystallization in long-time measuring cup surface of placing, during preparation, crystallization can be mixed in polishing fluid again, causes product quality to decline, 3) do not have sampling box, the polishing fluid after preparation can not sample in time, can not detect the pH value having prepared rear polishing fluid, does not reach the object of Timeliness coverage problem.
Utility model content
For solving existing polishing fluid compounding system above shortcomings, the utility model provides a kind of full automatic polishing liquid compounding system, and this compounding system can realize automatic preparation, the automatic cycle mixing, automatically supply, automatic back flow and sampling of polishing fluid.
The utility model is the technical scheme solving the problems of the technologies described above employing: a kind of full automatic polishing liquid compounding system, comprise the main line in pure water suction polishing fluid preparing tank in pure water cylinder by transfer pump, by transfer pump by the bye-pass in polishing fluid stoste suction polishing fluid preparing tank in polishing original liquid box, the pure water supply line of pure water is supplied in polishing fluid preparing tank, by the polishing fluid supply line of transfer pump to polishing machine supply polishing fluid, coordinate with polishing fluid supply line and pot liquid is prepared to polishing fluid carry out the circulation branch road mixed that circulates, polishing fluid in shunting polishing fluid supply line carries out sampling the sampling slip detected and the polishing fluid return line when polishing machine does not need polishing fluid, polishing fluid being led back to polishing fluid preparing tank, pure water and polishing fluid stoste import in fluid reservoir by described main line and bye-pass respectively, and then be supplied to polishing fluid preparing tank by fluid reservoir, liquid level sensor is provided with in described fluid reservoir and polishing fluid preparing tank, the signal that the control system of peripheral hardware exports according to liquid level sensor in fluid reservoir and polishing fluid preparing tank controls the break-make of each pipeline to realize automatic liquid matching and feed flow.
Described pure water cylinder is communicated with polishing fluid preparing tank by main line, main line is disposed with pneumatic operated valve I, transfer pump I, pneumatic operated valve II, fluid reservoir and pneumatic operated valve III, the pure water that transfer pump I extracts in pure water cylinder enters in polishing fluid preparing tank through pneumatic operated valve I, transfer pump I, pneumatic operated valve II, fluid reservoir and pneumatic operated valve III successively, described polishing original liquid box is communicated with main line by bye-pass, this bye-pass is provided with pneumatic operated valve IV, its end is connected to the position on main line between pneumatic operated valve I and transfer pump I.
The head end of described polishing fluid supply line is connected to the bottom of polishing fluid preparing tank, and end supplies polishing fluid to polishing machine after being communicated with pneumatic operated valve VI, transfer pump II, pneumatic operated valve VII and filter successively; One end of described polishing fluid return line is communicated with the end of polishing fluid supply line, and the other end is connected to the top of polishing fluid preparing tank by pneumatic operated valve VIII; Described circulation branch road and sampling slip are respectively equipped with pneumatic operated valve Ⅸ and pneumatic operated valve Ⅹ, wherein, one end of circulation branch road is connected with the top of polishing fluid preparing tank, the other end is connected to the position on polishing fluid supply line between transfer pump II and pneumatic operated valve VII, polishing fluid after being filtered in sampling slip shunting polishing fluid supply line, and import in sampling box.
The top of described fluid reservoir and polishing fluid preparing tank is respectively arranged with liquid level sensor I and liquid level sensor II, and the control system of peripheral hardware controls the break-make of each pipeline according to the signal that liquid level sensor I and liquid level sensor II export.
Beneficial effect: the utility model is by being fed in fluid reservoir from polishing original liquid box Automatic Extraction polishing fluid stoste, the polishing fluid stoste volume be fed in fluid reservoir is controlled by level sensor, when reaching level sensor and sensing liquid level, automatic stopping is to fluid reservoir supply polishing fluid stoste, polishing stoste in it flows in polishing fluid preparing tank by fluid reservoir, reach automatic measurement polishing fluid stoste, automatically the object of supply polishing fluid stoste; Simultaneously, increase a pure water cylinder, after the polishing fluid stoste in fluid reservoir flow into polishing fluid preparing tank completely, pure water in pure water cylinder is from trend fluid reservoir supply pure water, the pure water volume of supply is controlled by level sensor equally, and after reaching liquid level, pure water flows in polishing fluid preparing tank, reach the object of pure water rinsing fluid reservoir, prevent polishing fluid crystallization in fluid reservoir; Polishing fluid supply line arranges sampling slip, increase a sampling box, in sampling box, hand-operated valve is installed, when often having prepared a tank polishing fluid to polishing machine for seasonable, the hand-operated valve on this sampling slip can be opened, access polishing fluid to detect, reach and detect polishing fluid proportioning whether accurately object in time.
Accompanying drawing explanation
Fig. 1 is the system diagram of the utility model embodiment;
Reference numeral: 1, pure water cylinder, 2, polishing original liquid box, 3, transfer pump I, 4, fluid reservoir, 5, polishing fluid preparing tank, 6, transfer pump II, 7, sampling box, 8, pneumatic operated valve I, 9, pneumatic operated valve IV, 10, pneumatic operated valve II, 11, pneumatic operated valve III, 12, pneumatic operated valve V, 13, pneumatic operated valve VI, 14, pneumatic operated valve Ⅸ, 15, pneumatic operated valve VIII, 16, hand-operated valve, 17, liquid level sensor I, 18, pneumatic operated valve VII, 19, liquid level sensor II, 20, filter, 21, main line, 22, bye-pass, 23, pure water supply line, 24, polishing fluid supply line, 25, polishing fluid return line, 26, circulation branch road, 27, sampling slip.
Detailed description of the invention
A kind of full automatic polishing liquid compounding system, comprise the main line 21 in pure water suction polishing fluid preparing tank 5 in pure water cylinder 1 by transfer pump, by transfer pump by the bye-pass 22 in polishing fluid stoste suction polishing fluid preparing tank 5 in polishing original liquid box 2, the pure water supply line 23 of pure water is supplied in polishing fluid preparing tank 5, by the polishing fluid supply line 24 of transfer pump to polishing machine supply polishing fluid, coordinate with polishing fluid supply line 24 and the circulation branch road 26 mixed that circulates is carried out to liquid in polishing fluid preparing tank 5, polishing fluid in shunting polishing fluid supply line 24 carries out sampling the sampling slip 27 detected and the polishing fluid return line 25 when polishing machine does not need polishing fluid, polishing fluid being led back to polishing fluid preparing tank 5, pure water and polishing fluid stoste import in fluid reservoir 4 by described main line 21 and bye-pass 22 respectively, and then be supplied to polishing fluid preparing tank 5 by fluid reservoir 4, liquid level sensor is provided with in described fluid reservoir 4 and polishing fluid preparing tank 5, the signal that the control system of peripheral hardware exports according to liquid level sensor in fluid reservoir 4 and polishing fluid preparing tank 5 controls the break-make of each pipeline to realize automatic liquid matching and feed flow.
Below in conjunction with specific embodiment, the utility model is further elaborated.
As shown in the figure, described pure water cylinder 1 is communicated with polishing fluid preparing tank 5 by main line 21, main line 21 is disposed with pneumatic operated valve I 8, transfer pump I 3, pneumatic operated valve II 10, fluid reservoir 4 and pneumatic operated valve III 11, pure water in transfer pump I 3 extraction pure water cylinder 1 is successively through pneumatic operated valve I 8, transfer pump I 3, pneumatic operated valve II 10, fluid reservoir 4 and pneumatic operated valve III 11 enter in polishing fluid preparing tank 5, described polishing original liquid box 2 is communicated with main line 21 by bye-pass 22, this bye-pass 22 is provided with pneumatic operated valve IV 9, its end is connected to the position on main line 21 between pneumatic operated valve I 8 and transfer pump I 3,
The head end of described polishing fluid supply line 24 is connected to the bottom of polishing fluid preparing tank 5, and end supplies polishing fluid to polishing machine after being communicated with pneumatic operated valve VI 13, transfer pump II 6, pneumatic operated valve VII 18 and filter 20 successively; One end of described polishing fluid return line 25 is communicated with the end of polishing fluid supply line 24, and the other end is connected to the top of polishing fluid preparing tank 5 by pneumatic operated valve VIII 15; Described circulation branch road 26 and sampling slip 27 are respectively equipped with pneumatic operated valve Ⅸ 14 and hand-operated valve 16, wherein, one end of circulation branch road 26 is connected with the top of polishing fluid preparing tank 5, the other end is connected to the position on polishing fluid supply line 24 between transfer pump II 6 and pneumatic operated valve VII 18, sampling slip 27 shunts the polishing fluid in polishing fluid supply line 24 after filter 20 filters, and imports in sampling box 7; Described pure water supply line 23 is provided with pneumatic operated valve V 12;
The top of described fluid reservoir 4 and polishing fluid preparing tank 5 is respectively arranged with liquid level sensor I 17 and liquid level sensor II 19, and the control system of peripheral hardware controls the start and stop of the break-make of each pneumatic operated valve and transfer pump I 3, transfer pump II 6 according to the signal that liquid level sensor I 17 and liquid level sensor II 19 export:
When the polishing fluid stoste liquid level in fluid reservoir 4 to liquid level sensor I 17 time, pneumatic operated valve IV 9, pneumatic operated valve II 10 and transfer pump I 3 are closed, stop supply polishing fluid stoste, at this moment pneumatic operated valve III 11 is opened, polishing fluid stoste flows in polishing fluid preparing tank 5, polished stoste flows into after in polishing fluid preparing tank 5 completely, pneumatic operated valve III 11 cuts out, pneumatic operated valve I 8 simultaneously, pneumatic operated valve II 10 and transfer pump I 3 are opened, in pure water cylinder 1, pure water is fed in fluid reservoir 4, when pure water liquid level to liquid level sensor I 17 time, pneumatic operated valve II 10, pneumatic operated valve I 8 and transfer pump I 3 are closed, stop supplying pure water to fluid reservoir 4, pneumatic operated valve III 11 is opened, pure water flows in polishing fluid preparing tank 5, pneumatic operated valve V 12 is opened simultaneously, pure water flows in polishing fluid preparing tank 5, when liquid level is raised to liquid level sensor II 19, pneumatic operated valve V 12 cuts out, pneumatic operated valve VI 13, pneumatic operated valve Ⅸ 14 and transfer pump II 6 are opened, carry out polishing fluid circulation stirring, after being recycled to certain hour, pneumatic operated valve Ⅸ 14 cuts out, pneumatic operated valve VII 18, pneumatic operated valve VIII 15 is opened, start the polishing fluid prepared to polishing machine supply, when polishing machine does not need polishing fluid, polishing fluid is got back in polishing fluid preparing tank 5 through polishing fluid return line 25 and pneumatic operated valve VIII 15, the hand-operated valve 16 of sampling slip 27 can be opened simultaneously, in sampling box 7, access a certain amount of polishing fluid carry out pH value detection.

Claims (4)

1. a full automatic polishing liquid compounding system, it is characterized in that: comprise the main line (21) in pure water cylinder (1) interior pure water suction polishing fluid preparing tank (5) by transfer pump, by transfer pump by the bye-pass (22) in polishing original liquid box (2) interior polishing fluid stoste suction polishing fluid preparing tank (5), the pure water supply line (23) of supply pure water in polishing fluid preparing tank (5), by the polishing fluid supply line (24) of transfer pump to polishing machine supply polishing fluid, coordinate with polishing fluid supply line (24) and the circulation branch road (26) mixed that circulates is carried out to polishing fluid preparing tank (5) interior liquid, polishing fluid in shunting polishing fluid supply line (24) carries out sampling the sampling slip (27) detected and the polishing fluid return line (25) when polishing machine does not need polishing fluid, polishing fluid being led back to polishing fluid preparing tank (5), pure water and polishing fluid stoste import in fluid reservoir (4) by described main line (21) and bye-pass (22) respectively, and then be supplied to polishing fluid preparing tank (5) by fluid reservoir (4), liquid level sensor is provided with in described fluid reservoir (4) and polishing fluid preparing tank (5), the signal that the control system of peripheral hardware exports according to fluid reservoir (4) and polishing fluid preparing tank (5) interior liquid level sensor controls the break-make of each pipeline to realize automatic liquid matching and feed flow.
2. a kind of full automatic polishing liquid compounding system according to claim 1, it is characterized in that: described pure water cylinder (1) is communicated with polishing fluid preparing tank (5) by main line (21), main line (21) is disposed with pneumatic operated valve I (8), transfer pump I (3), pneumatic operated valve II (10), fluid reservoir (4) and pneumatic operated valve III (11), pure water in transfer pump I (3) extraction pure water cylinder (1) is successively through pneumatic operated valve I (8), transfer pump I (3), pneumatic operated valve II (10), fluid reservoir (4) and pneumatic operated valve III (11) enter in polishing fluid preparing tank (5), described polishing original liquid box (2) is communicated with main line (21) by bye-pass (22), this bye-pass (22) is provided with pneumatic operated valve IV (9), its end is connected to the upper position between pneumatic operated valve I (8) and transfer pump I (3) of main line (21).
3. a kind of full automatic polishing liquid compounding system according to claim 1, it is characterized in that: the head end of described polishing fluid supply line (24) is connected to the bottom of polishing fluid preparing tank (5), end is communicated with pneumatic operated valve VI (13), transfer pump II (6), pneumatic operated valve VII (18) and filter (20) backward polishing machine supply polishing fluid successively; One end of described polishing fluid return line (25) is communicated with the end of polishing fluid supply line (24), and the other end is connected to the top of polishing fluid preparing tank (5) by pneumatic operated valve VIII (15); Described circulation branch road (26) and sampling slip (27) are respectively equipped with pneumatic operated valve Ⅸ (14) and hand-operated valve (16), wherein, one end of circulation branch road (26) is connected with the top of polishing fluid preparing tank (5), the other end is connected to the upper position between transfer pump II (6) and pneumatic operated valve VII (18) of polishing fluid supply line (24), polishing fluid in sampling slip (27) shunting polishing fluid supply line (24) after filter (20) filters, and import in sampling box (7).
4. a kind of full automatic polishing liquid compounding system according to claim 1, it is characterized in that: the top of described fluid reservoir (4) and polishing fluid preparing tank (5) is respectively arranged with liquid level sensor I (17) and liquid level sensor II (19), the control system of peripheral hardware controls the break-make of each pipeline according to the signal that liquid level sensor I (17) and liquid level sensor II (19) export.
CN201520609185.6U 2015-08-14 2015-08-14 Full -automatic polish preparation system Expired - Fee Related CN204841441U (en)

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Application Number Priority Date Filing Date Title
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Application Number Priority Date Filing Date Title
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Cited By (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN105536622A (en) * 2016-02-01 2016-05-04 珠海格力智能装备有限公司 Vehicle urea machine
CN105688701A (en) * 2016-02-24 2016-06-22 金昌大顺和电气仪表维修有限责任公司 Process and equipment for massively and continuously producing solution with powder
CN107520759A (en) * 2016-06-21 2017-12-29 上海新昇半导体科技有限公司 A kind of polishing solution supplying system and method
CN109352531A (en) * 2018-10-24 2019-02-19 上海华力微电子有限公司 A kind of supply method of lapping slurry feeding system and chemical-mechanical grinding liquid
CN110449081A (en) * 2019-09-04 2019-11-15 天津中环领先材料技术有限公司 A kind of polishing fluid configuration device and its control method
CN111750275A (en) * 2020-07-06 2020-10-09 重庆国际复合材料股份有限公司 Glass fiber impregnating compound discharging system and control method thereof
CN112657360A (en) * 2020-12-02 2021-04-16 合肥中辰轻工机械有限公司 Liquid substance proportional mixing device and proportional mixing method based on same
CN113533446A (en) * 2021-07-13 2021-10-22 长鑫存储技术有限公司 Chemical cleaning liquid preparation system and method
CN115138234A (en) * 2022-06-27 2022-10-04 上海华力集成电路制造有限公司 Grinding fluid mixing device and method for aluminum chemical mechanical grinding process
CN115155410A (en) * 2022-06-30 2022-10-11 西安奕斯伟材料科技有限公司 Polishing solution storage and mixing arrangement

Cited By (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN105536622A (en) * 2016-02-01 2016-05-04 珠海格力智能装备有限公司 Vehicle urea machine
CN105536622B (en) * 2016-02-01 2020-07-24 珠海格力智能装备有限公司 Vehicle urea machine
CN105688701A (en) * 2016-02-24 2016-06-22 金昌大顺和电气仪表维修有限责任公司 Process and equipment for massively and continuously producing solution with powder
CN107520759A (en) * 2016-06-21 2017-12-29 上海新昇半导体科技有限公司 A kind of polishing solution supplying system and method
CN109352531A (en) * 2018-10-24 2019-02-19 上海华力微电子有限公司 A kind of supply method of lapping slurry feeding system and chemical-mechanical grinding liquid
CN110449081A (en) * 2019-09-04 2019-11-15 天津中环领先材料技术有限公司 A kind of polishing fluid configuration device and its control method
CN111750275A (en) * 2020-07-06 2020-10-09 重庆国际复合材料股份有限公司 Glass fiber impregnating compound discharging system and control method thereof
CN112657360A (en) * 2020-12-02 2021-04-16 合肥中辰轻工机械有限公司 Liquid substance proportional mixing device and proportional mixing method based on same
CN113533446A (en) * 2021-07-13 2021-10-22 长鑫存储技术有限公司 Chemical cleaning liquid preparation system and method
WO2023284032A1 (en) * 2021-07-13 2023-01-19 长鑫存储技术有限公司 Chemical cleaning fluid configuration system and method
CN115138234A (en) * 2022-06-27 2022-10-04 上海华力集成电路制造有限公司 Grinding fluid mixing device and method for aluminum chemical mechanical grinding process
CN115155410A (en) * 2022-06-30 2022-10-11 西安奕斯伟材料科技有限公司 Polishing solution storage and mixing arrangement

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CF01 Termination of patent right due to non-payment of annual fee
CF01 Termination of patent right due to non-payment of annual fee

Granted publication date: 20151209

Termination date: 20170814