CN204803403U - System based on chemical vapor deposition process prepares sample - Google Patents
System based on chemical vapor deposition process prepares sample Download PDFInfo
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- CN204803403U CN204803403U CN201520388465.9U CN201520388465U CN204803403U CN 204803403 U CN204803403 U CN 204803403U CN 201520388465 U CN201520388465 U CN 201520388465U CN 204803403 U CN204803403 U CN 204803403U
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- room
- vapor deposition
- chemical vapor
- deposition process
- silica tube
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Abstract
The utility model relates to a system based on chemical vapor deposition process prepares sample mainly includes tube -like stove (1), regulation control room (7), gas input room (8) and tail gas recovery room (9), and wherein tube -like stove (1) comprises substrate (2), quartz capsule (3), ceramic boat (4), thermocouple (5) and elema (6), quartz capsule (3) wear to establish and the mistake in the middle of substrates (2), and thermocouple (5) are inserted and are established in substrate (2) top, respectively are provided with a elema (5) at quartz capsule (3) both ends, and regulation control room (7) are connected with two elema (5) respectively, and the both ends of quartz capsule (3) are connected respectively to gas input room (8) and tail gas recovery room (9). The utility model provides a system based on chemical vapor deposition process prepares sample, have easy operation, easily control and experimental period characteristics such as short.
Description
Technical field
The utility model relates to a kind of device adopting chemical phase deposition method to prepare nano material test sample, particularly relates to a kind of system preparing sample based on chemical Vapor deposition process, belongs to field of nano material preparation.
Background technology
Nano material refers to the material having at least the size of a dimension to be less than 100nm or to be made up of as elementary cell them in three dimensions.Because its size is close to the coherence length of electronics, great changes will take place because the strong relevant self-organization brought makes character for its character, and the character as optics, calorifics, electricity, magnetics, mechanics and chemical aspect is compared will have significant difference with block materials.So nanoscale and the special change of performance are two essential characteristics that nano material must possess simultaneously.
The effects such as the quantum size effect of semiconductor nano material and surface and interface, make it show unique optical characteristics, as optics luminous, energy of absorption edge blue shift, excitonic luminescence etc.Especially II-VI group monodimension nanometer material, they are wide direct band-gap semicondictor materials, are typical photoelectric semiconductor materials.Bandgap semiconductor material is typical photoelectric semiconductor material.Be (CdSe) example with cadmium selenide, as one of typical photoelectric semiconductor material, itself there is unique optical and electrical properties, having broad application prospects as in light source, photoabsorption, optical waveguides, photoluminescence and opto-electronic conversion etc.
The domestic device being used for preparing semiconductor nano material associated sample specially that there is no maturation, does not have supporting testing tool yet at present.
Utility model content
In order to overcome the deficiencies in the prior art, resolving the problem of prior art, making up the deficiency of existing currently available products in the market.
The utility model provides a kind of system preparing sample based on chemical Vapor deposition process, mainly comprise tube furnace, regulable control room, gas input room and tail gas recycle room, wherein tube furnace is made up of substrate, silica tube, ceramic boat, thermopair and globars, described silica tube wears and mistake in the middle of substrate, thermopair is plugged in types of flexure, a globars is respectively provided with at silica tube two ends, regulable control room is connected with two globarss respectively, and gas input room and tail gas recycle room are connected the two ends of silica tube respectively.
Preferably, above-mentioned ceramic boat is arranged on silica tube inside, and thermopair is arranged on directly over ceramic boat, the bottom contact silica tube outer wall of thermopair.
Preferably, medicine is equipped with in above-mentioned ceramic boat inside.
Preferably, above-mentioned silica tube both ends open, gas enters from one end of silica tube, and the other end is discharged.
Preferably, above-mentioned gas input room and tail gas recycle room are connected the two ends of silica tube respectively by globars.
Preferably, NaOH solution is equipped with in above-mentioned tail gas recycle indoor.
The system preparing sample based on chemical Vapor deposition process that the utility model provides, have simple to operate, be easy to control and the feature such as experimental period is short.
Accompanying drawing explanation
Fig. 1 is the utility model structural representation.
Reference numeral: 1-tube furnace; 2-substrate; 3-silica tube; 4-ceramic boat; 5-thermopair; 6-globars; 7-regulable control room; 8-gas input room; 9-tail gas recycle room.
Embodiment
Understand for the ease of those of ordinary skill in the art and implement the utility model, below in conjunction with the drawings and the specific embodiments, the utility model being described in further detail.
The system preparing sample based on chemical Vapor deposition process that the utility model provides, mainly comprise tube furnace 1, regulable control room 7, gas input room 8 and tail gas recycle room 9, wherein tube furnace 1 is made up of substrate 2, silica tube 3, ceramic boat 4, thermopair 5 and globars 6, silica tube 3 wears and mistake in the middle of substrate 2, thermopair 5 is plugged in above substrate 2, a globars 5 is respectively provided with at silica tube 3 two ends, regulable control room 7 is connected with two globarss 5 respectively, and gas input room 8 and tail gas recycle room 9 are connected the two ends of silica tube 3 respectively.
Wherein, it is inner that ceramic boat 4 is arranged on silica tube 3, and thermopair 5 is arranged on directly over ceramic boat 4, bottom contact silica tube 3 outer wall of thermopair 5.Medicine is equipped with in ceramic boat 4 inside.Silica tube 2 both ends open, gas 6 enters from one end of silica tube 2, and the other end is discharged.Gas input room 8 and tail gas recycle room 9 are connected the two ends of silica tube 3 respectively by globars 5.Tail gas recycle room 9 is built with NaOH solution.
The utility model adopts globars 6 to heat, the center warm area temperature at globars 6 place is the highest, temperature rise rate can be controlled by the electric current and voltage of regulable control room 7, and the distribution approximate Gaussian distribution of warm area, namely globars 6 is the highest for the position temperature of silica tube 3, in silica tube 3 there is certain thermograde along with away from globars 6 in temperature, the temperature near room temperature of silica tube 3 both sides.The ceramic boat 4 of medicine and substrate will be housed, be placed on different positions in silica tube 3 (medicine is positioned at center warm area in principle, and substrate is positioned at upstream and downstream).Pass into argon hydrogen gas mixture in the upstream of silica tube 3 by gas input room 8, downstream connection is equipped with in the middle of the exhaust gas processing device tail gas recycle room 9 of NaOH solution.The system preparing sample based on chemical Vapor deposition process that the utility model provides, have simple to operate, be easy to control and the feature such as experimental period is short.
The embodiment of the above is better embodiment of the present utility model; not limit concrete practical range of the present utility model with this; scope of the present utility model comprises and is not limited to this embodiment, and the equivalence change that all shapes according to the utility model, structure are done is all in protection domain of the present utility model.
Claims (6)
1. prepare the system of sample based on chemical Vapor deposition process for one kind, it is characterized in that: the described system preparing sample based on chemical Vapor deposition process mainly comprises tube furnace (1), regulable control room (7), gas input room (8) and tail gas recycle room (9), wherein tube furnace (1) is by substrate (2), silica tube (3), ceramic boat (4), thermopair (5) and globars (6) are formed, described silica tube (3) wears and mistake in the middle of substrate (2), thermopair (5) is plugged in substrate (2) top, a globars (5) is respectively provided with at silica tube (3) two ends, regulable control room (7) is connected with two globarss (5) respectively, gas input room (8) and tail gas recycle room (9) are connected the two ends of silica tube (3) respectively.
2. the system preparing sample based on chemical Vapor deposition process according to claim 1, it is characterized in that: it is inner that described ceramic boat (4) is arranged on silica tube (3), thermopair (5) is arranged on directly over ceramic boat (4), bottom contact silica tube (3) outer wall of thermopair (5).
3. the system preparing sample based on chemical Vapor deposition process according to claim 1, is characterized in that: medicine is equipped with in described ceramic boat (4) inside.
4. the system preparing sample based on chemical Vapor deposition process according to claim 1, is characterized in that: described silica tube (2) both ends open, and gas (6) enters from one end of silica tube (2), and the other end is discharged.
5. the system preparing sample based on chemical Vapor deposition process according to claim 1, is characterized in that: described gas input room (8) and tail gas recycle room (9) are connected the two ends of silica tube (3) respectively by globars (5).
6. the system preparing sample based on chemical Vapor deposition process according to claim 1, is characterized in that: described tail gas recycle room (9) is built with NaOH solution.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201520388465.9U CN204803403U (en) | 2015-06-03 | 2015-06-03 | System based on chemical vapor deposition process prepares sample |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201520388465.9U CN204803403U (en) | 2015-06-03 | 2015-06-03 | System based on chemical vapor deposition process prepares sample |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN204803403U true CN204803403U (en) | 2015-11-25 |
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201520388465.9U Expired - Fee Related CN204803403U (en) | 2015-06-03 | 2015-06-03 | System based on chemical vapor deposition process prepares sample |
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN108866507A (en) * | 2018-07-19 | 2018-11-23 | 河北环亚线缆有限公司 | A kind of method that chemical vapour deposition technique prepares cable copper conductor plating packet graphene film |
-
2015
- 2015-06-03 CN CN201520388465.9U patent/CN204803403U/en not_active Expired - Fee Related
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN108866507A (en) * | 2018-07-19 | 2018-11-23 | 河北环亚线缆有限公司 | A kind of method that chemical vapour deposition technique prepares cable copper conductor plating packet graphene film |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| CF01 | Termination of patent right due to non-payment of annual fee | ||
| CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20151125 Termination date: 20160603 |