CN204746041U - Plasma exhaust treatment device - Google Patents
Plasma exhaust treatment device Download PDFInfo
- Publication number
- CN204746041U CN204746041U CN201520287686.7U CN201520287686U CN204746041U CN 204746041 U CN204746041 U CN 204746041U CN 201520287686 U CN201520287686 U CN 201520287686U CN 204746041 U CN204746041 U CN 204746041U
- Authority
- CN
- China
- Prior art keywords
- discharge cell
- control equipment
- plasma emission
- equipment according
- plasma
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Landscapes
- Treating Waste Gases (AREA)
- Physical Or Chemical Processes And Apparatus (AREA)
Abstract
The utility model provides a plasma exhaust treatment device, including bed frame and discharge cell, the discharge cell can the dismouting in the bed frame, wherein: at least one row the discharge cell is arranged in the bed frame, every row of discharge cell includes at least one -level the discharge cell. The utility model discloses an exhaust treatment device can arrange the number according to the large -minded ditty economize on electricity utmost point, adjusts each progression of arranging the electrode according to exhaust -gas treatment efficiency, adjusts through adaptability and has effectively improved exhaust -gas treatment efficiency.
Description
Technical field
The utility model relates to exhaust-gas treatment field, is specifically related to a kind of plasma emission-control equipment.
Background technology
Day by day deep along with the industrialized level of society, inevitably supervenes all kinds of pollutions comprising solid, water and air.The generation of exhaust emission wherein mainly produces with the development of heavy industry, due in waste gas usually containing a large amount of if volatile organic matter VOCs, benzene homologues (as toluene, dimethylbenzene), perfluorocarbon, halocarbon hydrocarbon compound, sulfur dioxide, nitrogen oxide, dioxin-like chemical etc. are at interior poisonous, harmful and/or Taste and odor compounds, seek the high and method not producing secondary pollution of Feasible degree to process above-mentioned organic pollution, alleviation environmental pressure is seemed particularly important.
Along with plasma, (plasma continues admittedly, liquid, material after gas the 4th state, after being deprived of by the portions of electronics of atom and atomic group, the ionized gas shape material of the negative ions composition that ionization produces) the developing rapidly and improve of technology, especially the application of lower temperature plasma technology is increasingly extensive, the discharge type of lower temperature plasma technology mainly comprises glow discharge, corona discharge and dielectric barrier discharge, wherein the lower temperature plasma technology of dielectric barrier discharge is a kind of gas discharge form being inserted discharge space by dielectric, because it can realize large-area Uniform Discharge, organic molecule can be made, hydrone and oxygen molecule fully produce ionization, inspire to enrich and comprise-OH, O
3,-O, taking can electronics, R and H
2o
2deng at interior active particle and high energy particle, above-mentioned active particle and high energy particle can react with the part poisonous and harmful element in waste gas, be Small molecular by macromolecules degradation, waste gas toxicity is reduced by abundant redox reaction, while removing its malodorous elements, play good sterilization functions.
But, the efficiency of dielectric barrier discharge generation plasma is the key parameter in the application of the lower temperature plasma technology of dielectric barrier discharge, in application at present about the lower temperature plasma technology of dielectric barrier discharge, many employings single-stage discharge cell, therefore some high density pollution waste gas difficulties are removed, exhaust-gas treatment level can not get substantial breakthrough, a kind of device based on dielectric impedance corona discharge plasma process waste gas as disclosed in invention (CN102814109A), and all there is above-mentioned defect in the disclosed a kind of atmospheric pressure plasma generator etc. based on dielectric barrier discharge of invention (CN103841741A).How improving the efficiency that dielectric barrier discharge produces plasma, is problem demanding prompt solution.
Utility model content
In view of this, the utility model provides a kind of plasma emission-control equipment, is intended to by effectively improving machining area, increases the efficiency of plasma and waste gas reaction.
The technical solution adopted in the utility model is specially:
A kind of plasma emission-control equipment, comprises pedestal and discharge cell, described discharge cell can dismounting in described pedestal; Wherein: the described discharge cell of at least one row is placed in described pedestal, often discharge electric unit and comprise at least discharge cell described in one-level.
In above-mentioned plasma emission-control equipment, as progression or the row > 1 of discharge cell, be parallel to each other between multiple described discharge cell.
In above-mentioned plasma emission-control equipment, described discharge cell comprises electrode and dielectric layer, and described dielectric layer is coaxially wrapped in the outside of described electrode.
In above-mentioned plasma emission-control equipment, described dielectric layer is quartz medium layer or PTFE medium layer.
In above-mentioned plasma emission-control equipment, described pedestal comprises fixed mount and baffle plate, described fixed mount comprises the first circuit board and the second circuit board, described discharge cell is fixed between described first circuit board and described second circuit board, and the described discharge cell of adjacent column is intercepted by described baffle plate.
In above-mentioned plasma emission-control equipment, described baffle plate comprises the first dividing plate and second partition, is provided with gap between described first dividing plate and described second partition.
In above-mentioned plasma emission-control equipment, the width in described gap is 0.5 ~ 3.5cm.
In above-mentioned plasma emission-control equipment, the structure of described first dividing plate comprises several cancave cambered surfaces, and described cancave cambered surface and described discharge cell are coaxial configuration, leave gap between described cancave cambered surface and described discharge cell.
In above-mentioned plasma emission-control equipment, the width in described gap is 1 ~ 8mm.
The beneficial effect that the utility model produces is:
More emission-control equipment of the present utility model arrange based on the multistage of dielectric barrier discharge the device that plasmas efficiently process waste gas, can combine discharge cell according to the actual conditions for the treatment of effeciency and waste gas tolerance, according to large-minded minor adjustment electrode row, and then regulate effective processing area, and adapt to corresponding exhaust treatment efficiency demand by the electrode progression of adjusting device, produce multistage, the plasma producing apparatus of many rows, by increasing the distance of waste gas passage between electrode, waste gas and plasma are fully reacted, the hazardous contaminant in waste gas is removed on efficient energy-saving ground
In addition, baffle plate and interelectrode curved channel can increase the distance of waste gas and Plasma contact further, make it more fully react, further increase the processing horizontal of waste gas; Be particularly useful for the process to sulfur-bearing, nitrogenous gas with foreign flavor and benzene homologues, ester class, alcohols, ethers waste gas.
Accompanying drawing explanation
When considered in conjunction with the accompanying drawings, more completely the utility model can be understood better.Accompanying drawing described herein is used to provide further understanding of the present utility model, and embodiment and explanation thereof, for explaining the utility model, are not formed improper restriction of the present utility model.
Fig. 1 is the structural representation of a kind of plasma emission-control equipment of the utility model;
Fig. 2-1 is the dividing plate schematic front view (analysing and observe) of a kind of plasma emission-control equipment of the utility model;
Fig. 2-2 is the dividing plate schematic side view (analysing and observe) of a kind of plasma emission-control equipment of the utility model.
In figure: 1, dielectric layer 2, electrode 3, circuit board 4, rubber blanket 5, dividing plate 6 gap (waste gas inlet).
Detailed description of the invention
Below in conjunction with drawings and Examples, the technical solution of the utility model is described in further detail.
A kind of gas ions emission-control equipment as shown in Figure 1, comprise pedestal and several discharge cells, according to treatment effeciency and process tolerance, by dismounting and/or the assembling of discharge cell, make it have the version that at least one-level one is arranged, for multistage many rows the technical solution of the utility model is described to (certainly, the technical scheme of single, single and single-row version is also covered by the utility model below.); Wherein:
Each discharge cell comprises metal electrode 2 and by its coaxially wrapped insulating medium layer 1, the material of dielectric layer 1 can adopt quartz or polytetrafluoroethylene (PTFE); The row of electrode 2 can regulate according to concrete exhaust treatment efficiency demand, is generally 2 ~ 3 rows; And can the number of poles in same row's electrode 2 be regulated further according to the exhausted air quantity of reality and then regulate effective processing area, be generally 8 ~ 20 grades; Certainly, also according to the exhaust-gas treatment processing horizontal of reality, row and the progression often arranged can be extended further to rational N.
Pedestal comprises circuit board 3, and circuit board 3 is provided with rubber blanket 4, and the two ends of discharge cell are fixed on respectively by rubber blanket 4 between the circuit board 3 of both sides, and are parallel to each other between each discharge cell; Intercepted by two pieces of ground dummy boards 5 between the discharge cell of adjacent column, different according to handled gas componant, be provided with the gap 6 of 0.5 ~ 3.5cm between two pieces of ground dummy boards 5, the charge air flow direction of waste gas, perpendicular to electrode 2, enters plasma device by the gap 6 between dividing plate 5.
Preferred as one, the structure of dividing plate 5 is further as shown in Fig. 2-1 and 2-2, and its section is provided with the cancave cambered surface coaxial with electrode 2, and on dividing plate 5, the number of cancave cambered surface is preferably consistent with the row of electrode 2.So, the arc shaped slits passage that charge air flow is 1 ~ 8mm along the width between dividing plate 5 and electrode 2 passes, arc shaped slits passage can increase the distance of waste gas and Plasma contact further, make it, by being obtained by reacting purification with plasma in process chamber, to further increase exhaust treatment efficiency.
Below explain embodiment of the present utility model by reference to the accompanying drawings, accompanying drawing is herein used to provide further understanding of the present utility model.Obviously; the foregoing is only the utility model preferably detailed description of the invention; but protection domain of the present utility model is not limited thereto; any be to one skilled in the art can expect easily, do not depart from change of the present utility model or replacement in fact, be also all included within protection domain of the present utility model.
Claims (8)
1. a plasma emission-control equipment, is characterized in that, comprises pedestal and discharge cell, described discharge cell can dismounting in described pedestal; Wherein: the described discharge cell of at least one row is placed in described pedestal, often discharge electric unit and comprise at least discharge cell described in one-level.
2. plasma emission-control equipment according to claim 1, is characterized in that, as progression or the row > 1 of described discharge cell, is parallel to each other between described discharge cell.
3. plasma emission-control equipment according to claim 1, is characterized in that, described discharge cell comprises electrode and dielectric layer, and described dielectric layer is coaxially wrapped in the outside of described electrode.
4. plasma emission-control equipment according to claim 1, it is characterized in that, described pedestal comprises fixed mount and baffle plate, described fixed mount comprises the first circuit board and the second circuit board, described discharge cell is fixed between described first circuit board and described second circuit board, and the described discharge cell of adjacent column is intercepted by described baffle plate.
5. plasma emission-control equipment according to claim 4, is characterized in that, described baffle plate comprises the first dividing plate and second partition, is provided with gap between described first dividing plate and described second partition.
6. plasma emission-control equipment according to claim 5, is characterized in that, the width in described gap is 0.5 ~ 3.5cm.
7. plasma emission-control equipment according to claim 5, it is characterized in that, the structure of described first dividing plate comprises several cancave cambered surfaces, and described cancave cambered surface and described discharge cell are coaxial configuration, leave gap between described cancave cambered surface and described discharge cell.
8. plasma emission-control equipment according to claim 7, is characterized in that, the width in described gap is 1 ~ 8mm.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201520287686.7U CN204746041U (en) | 2015-05-06 | 2015-05-06 | Plasma exhaust treatment device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201520287686.7U CN204746041U (en) | 2015-05-06 | 2015-05-06 | Plasma exhaust treatment device |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN204746041U true CN204746041U (en) | 2015-11-11 |
Family
ID=54460800
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201520287686.7U Expired - Fee Related CN204746041U (en) | 2015-05-06 | 2015-05-06 | Plasma exhaust treatment device |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN204746041U (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN104941399A (en) * | 2015-05-06 | 2015-09-30 | 北京源生恒通环保科技有限公司 | Plasma waste gas treatment device |
-
2015
- 2015-05-06 CN CN201520287686.7U patent/CN204746041U/en not_active Expired - Fee Related
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN104941399A (en) * | 2015-05-06 | 2015-09-30 | 北京源生恒通环保科技有限公司 | Plasma waste gas treatment device |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN103143245A (en) | Louver type large-area cold plasma exhaust gas processing device | |
| CN201969474U (en) | Plasma waste gas purification apparatus | |
| CN204485609U (en) | A kind of Combined type low-temperature plasma generator for the treatment of organic exhaust gas | |
| CN205356788U (en) | High -efficient plasma discharge dish of metal frame plate formula | |
| CN112893435A (en) | Dielectric barrier discharge plasma repairing method and device for POPs contaminated soil | |
| CN203754483U (en) | Dam-type DBD (dielectric barrier discharge) plasma based pharmaceutically industrial wastewater treatment device | |
| CN201969473U (en) | UV (ultraviolet) plasma exhaust gas purifier | |
| CN204746041U (en) | Plasma exhaust treatment device | |
| CN104941399A (en) | Plasma waste gas treatment device | |
| CN204485611U (en) | A kind of low-temperature plasma industrial | |
| CN203108411U (en) | Big air volume low concentration plasma exhaust gas treatment device | |
| CN201752625U (en) | Dielectric barrier discharge plasma air treatment ozone treater | |
| CN203678245U (en) | Novel oxidized waste gas purification equipment | |
| CN103127810A (en) | Inhomogeneous field strength plasma waste gas processing apparatus and processing system thereof | |
| CN204672109U (en) | Level of platoon leader formula oxide reactor high efficiency plasma dish | |
| CN204485610U (en) | A kind of low-temperature plasma industrial with fire resisting damper | |
| CN201726583U (en) | Plasma discharge electrode and odor gas treatment device provided with the same | |
| CN107088362A (en) | A kind of plasma body cooperative catalytic treatment VOCs reactor | |
| CN213995385U (en) | Combined low-temperature plasma air purification equipment | |
| CN207856637U (en) | A kind of novel low temperature plasma processing equipment | |
| CN103111168A (en) | Large-air-volume low-concentration plasma exhaust gas treatment device | |
| CN203075826U (en) | Blind-window type large-area plasma waste gas treatment device | |
| CN215138471U (en) | Discharge structure and sterilization device | |
| CN105797546A (en) | Purification device and purification method for industrial waste gas | |
| CN104971590A (en) | Plasma waste gas treatment equipment and treatment process |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| CB03 | Change of inventor or designer information |
Inventor after: Zhang Miaolei Inventor before: Zhang Kuanzhao |
|
| COR | Change of bibliographic data | ||
| CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20151111 Termination date: 20180506 |
|
| CF01 | Termination of patent right due to non-payment of annual fee |