CN204706544U - Brush scrubber - Google Patents

Abstract

Relate to brush scrubber, comprising: base plate supports body, rotational substrate, make the substrate rotation of disc-shape, first cleaning brush, carry out rotary actuation to the first direction of rotation contacted with the sense of rotation rightabout of substrate, while contact substrate plate face cleaning base plate plate face, second cleaning brush, rotate with the state contacted with the plate face of substrate, thus with the plate face of way of contact cleaning base plate, its direction of rotation is set to, rotary actuation is carried out to the first rightabout cleaning the direction of rotation relative to plate face of brush, thus contact with the rightabout of the sense of rotation of substrate, and the first cleaning brush and the second cleaning brush rotate respectively to rightabout, the direction of rotation of the sense of rotation of substrate and cleaning brush is contacted in the opposite direction, thus, the contact cleaning force that cleaning brush and substrate rub maximizes, thus can with the foreign matter in larger power separating base plate plate face, and then can clean more neatly sooner.

Description

Brush scrubber

Technical field

The utility model relates to brush scrubber, relate more specifically to when making cleaning brush rotate and clean with the way of contact, improve the brush scrubber of cleaning efficiency by maximizing contact cleaning force, above-mentioned cleaning brush makes the substrate of disc-shape carry out rotating while spin rotates.

Background technology

After the wafer adopted in for the substrate of display unit or the making of semiconductor element (following, to be referred to as " substrate ") is processed, will perform matting, and remove and be attached to surperficial foreign matter in treatment process.

Fig. 1 represents the existing base plate cleaning device 9 removing the foreign matter adhered in grinding step after complete cmp operation.According to existing base plate cleaning device 9, under the state of contact site 15 substrate W being placed in rotary supporting body 10 by base plate transfer portion, by making the contact site 15 of rotary supporting body 10 rotate, make substrate W rotation r1.

Further, cleaning brush 99 rotates with the state contacted with the surface of substrate W, while remove the foreign matter being attached to the surface of substrate W.Now, cleaning brush 99 is arranged with the state being fixed on brace table 90 one or both ends, and above-mentioned cleaning brush 99 rotates in the mode be connected with the rotating shaft 95 carrying out rotary actuation 99r by drive motors M.

Be formed with multiple cleaning projection 99a at cleaning brush 99, assist and carry out base-plate cleaning.Meanwhile, apply the liquid (industry also claims " chemicals ") containing cleaning fluid composition to cleaning brush 99 or substrate W, improve the efficiency removing foreign matter from the plate face of substrate W.

But, according to existing brush scrubber 9, the liquid applied to cleaning brush 99 or substrate W can arbitrarily spray, by cleaning brush 99 foreign matter that is separated from the surface of substrate W be again attached to substrate W or with the state being bonded to cleaning brush 99 to perform substrate W with clean brush 99 contact cleaning, thus, cause the secondary pollution of substrate W, or cause substrate W to occur the problem of cut because being bonded to the foreign matter cleaning brush.

And, with the pivot of substrate W for benchmark, the half of cleaning brush 99 contacts to the direction contrary with the sense of rotation r1 of substrate W, but along with the residue half of cleaning brush 99 contacts to the direction identical with the sense of rotation r1 of substrate W, and there is the problem that the contact cleaning efficiency that makes to there is substrate W in half region is low.

On the one hand, the foreign matter on the surface being attached to substrate W removed by the cleaning brush 99 rotatably arranged while carrying out rotating with the state contacted with the surface of substrate W.Now, apply the liquid (industry also claims " chemicals ") containing cleaning fluid composition to cleaning brush 99 or substrate W, thus improve the efficiency removing foreign matter from the plate face of substrate W.

But, according to existing brush scrubber 9, the liquid applied to cleaning brush 99 or substrate W can arbitrarily spray, by cleaning brush 99 foreign matter that is separated from the surface of substrate W be again attached to substrate W or with the state being bonded to cleaning brush 99 to perform substrate W with clean brush 99 contact cleaning, thus, cause the secondary pollution of substrate W, or cause substrate W to occur the problem of cut because being bonded to the foreign matter cleaning brush.

Therefore, fundamentally solve the foreign matter be separated from substrate W in matting be again attached to substrate W or be bonded to cleaning brush 99 thus cause the necessity of the problem that the cleaning efficiency of substrate W is low or substrate W is impaired more and more higher.

Utility model content

The utility model proposes to solve above-mentioned existing problems, the purpose of this utility model is to provide following brush scrubber: namely, guide the moving direction of cleaning brush and substrate, make it mutually in rightabout, the frictional force of cleaning between brush and substrate is maximized, more forcefully from substrate segregating foreign objects, and then improve cleaning efficiency.

And, the purpose of this utility model is, during making brush contacts cleaning base plate surface, comes from after the surperficial separating out foreign objects of substrate by the contact of brush while making the substrate rotation of disc-shape, prevent be separated foreign matter to be again attached to the surface of substrate, and then improve cleaning efficiency.

And, the purpose of this utility model is, during cleaning brush contacts cleaning base plate surface, the foreign matter be separated by cleaning brush is prevented again to be attached to the surface of cleaning brush, make cleaning brush rotate while when cleaning with substrate contacts, the foreign matter because of the surface being attached to cleaning brush causes the surface damage of substrate.

Further, the purpose of this utility model is, utilizes a drive motors, makes two parts of cleaning brush carry out rotary actuation round about, thus maximizes the frictional force between cleaning brush and substrate, and then improves the efficiency from substrate segregating foreign objects.

On the one hand, the purpose of this utility model is to provide following brush scrubber: namely, with during brush contacts cleaning base plate surface while making the substrate rotation of disc-shape, come from after the surperficial separating out foreign objects of substrate by the contact of brush, prevent be separated foreign matter to be again attached to the surface of substrate, and then improve cleaning efficiency.

Especially, the purpose of this utility model is, by carrying out concentrating cleaning in the diametical region of moving direction of cleaning brush and substrate, and then improves the efficiency from substrate segregating foreign objects.

And, the purpose of this utility model is, during cleaning brush contacts cleaning base plate surface, the foreign matter be separated by cleaning brush is attached to the surface cleaning brush again, cleaning brush being rotated while when cleaning with substrate contacts, preventing the foreign matter on the surface because being attached to cleaning brush from causing the surface damage of substrate.

Thus, the purpose of this utility model is, improves the cleaning efficiency of substrate, and during the contact cleaning performing substrate, prevents substrate from occurring cut equivalent damage.

In order to solve technical problem as above, the utility model provides brush scrubber, it is characterized in that, comprising: base plate supports body, rotates aforesaid substrate, makes the substrate rotation of disc-shape; First cleaning brush, the first direction of rotation that the rightabout to the sense of rotation with aforesaid substrate contacts carries out rotary actuation, is contacted with the plate face of aforesaid substrate to clean the plate face of aforesaid substrate; And second cleans brush, rotate with the state contacted with the plate face of aforesaid substrate, thus with the plate face of way of contact cleaning aforesaid substrate, its direction of rotation is set to, to with first clean brush carry out rotary actuation relative to the direction of rotation rightabout in above-mentioned plate face, thus to contact with the sense of rotation rightabout of aforesaid substrate.

So, the cleaning brush in contact cleaning base plate plate face is divided into the first cleaning brush and the second cleaning brush, first cleaning brush and the second cleaning brush rotate respectively to rightabout, the sense of rotation of substrate is formed in the opposite direction with the direction of rotation of cleaning brush contact, make to maximize by the cleaning force that contacts of cleaning brush with the friction of substrate, compare existing mode, the time of removing needed for foreign matter from the plate face of substrate shortens, and then has the effect that can complete matting more rapidly.

Add, the utility model also can comprise: the first liquid supply unit, is positioned at the side of above-mentioned first cleaning brush, and to above-mentioned first cleaning brush supply liquid; And the first washings injection portion, the plate to the aforesaid substrate that have passed above-mentioned first cleaning brush faces the lateral direction spray rinse water of aforesaid substrate.

Thus, when substrate is by the first cleaning brush, when being attached to the foreign matter on the surface of substrate by strong friction contact load from the surface separation of substrate, face the lateral direction spray rinse water of aforesaid substrate to the plate of the aforesaid substrate that have passed the first cleaning brush from the first washings injection portion, before foreign matter on the plate face of aforesaid substrate arrives above-mentioned second cleaning brush, above-mentioned foreign matter is guided to discharge to the outside of aforesaid substrate, can obtain thus and prevent the foreign matter be separated from the plate face of substrate by the first cleaning brush from again arriving the effect of cleaning brush from root.

Therefore, according to the utility model, when making brush and substrate contact from the surperficial segregating foreign objects of substrate with the highest friction contact load in the first cleaning brush, perform rinsing process, make washings from the outside to substrate that spray by and isolated foreign matter, discharged by the outside of pushing substrate in time to, thus prevent the foreign matter be separated from the surface of substrate to be again attached to the surface of substrate, and then can cleaning efficiency be improved, the foreign matter that the contact by cleaning brush simultaneously can also be prevented to be separated is attached to the surface of cleaning brush again, the problem because foreign matter causes substrate impaired is solved with this.

Equally, the utility model also can comprise: the second liquid supply unit, is positioned at the side of above-mentioned second cleaning brush, and to above-mentioned second cleaning brush supply liquid; And the second washings injection portion, the plate to the aforesaid substrate that have passed above-mentioned second cleaning brush faces the lateral direction spray rinse water of aforesaid substrate.Thus, when substrate is while the second cleaning brush, when the foreign matter on the surface being attached to substrate is separated from the surface of substrate by strong friction contact load, face the lateral direction spray rinse water of aforesaid substrate to the plate through the aforesaid substrate by the second cleaning brush from the second washings injection portion, before foreign matter on the plate face of aforesaid substrate arrives above-mentioned first cleaning brush, above-mentioned foreign matter is guided to discharge to the outside of aforesaid substrate, thus, foreign matter by being separated from the plate face of substrate while the second cleaning brush positively can be discharged to the outside of substrate immediately, meanwhile, can obtain and prevent the foreign matter be separated from plate face to be again attached to other cleaning brush and the effect that causes substrate impaired.

In the case, any one in above-mentioned first cleaning brush and the second cleaning brush extends to the center of circular substrate, even if form plural cleaning brush, and also can the center of thorough cleaning base plate.

On the one hand, at least one in above-mentioned first cleaning brush and above-mentioned second cleaning brush carries out moving back and forth or to specify the anglec of rotation to carry out reciprocal turning motion to axis direction in matting, thus, by the cleaning projection being formed at the surface cleaning brush, the direction relative to wafer to radial direction is moved.Thus, even if the ground arrangement of cleaning projection systematicness, also can the integral surface of contact wafer, make foreign matter can not be gathered in the local on the surface of wafer, and clean equably on the whole.

On the one hand, above-mentioned first cleaning brush and above-mentioned second cleaning brush can not be configured at coaxially, also can supplement the 3rd cleaning brush.In contrast, above-mentioned first cleaning brush and above-mentioned second cleaning brush configurable on coaxial.

When the first cleaning brush and the second cleaning brush be configured at coaxial on, can the rotary driving force of above-mentioned first cleaning brush be received from the second cleaning brush and clean the contrary direction of brush carry out rotary actuation to first.

For this reason, above-mentioned first cleaning brush can comprise: drive motors, for the above-mentioned first cleaning brush of rotary actuation; Above-mentioned first cleaning brush has hollow bulb and ring, and wherein, above-mentioned hollow bulb is formed in the axis direction of above-mentioned first cleaning brush, and above-mentioned ring is formed in the surrounding of above-mentioned hollow bulb and is formed with internal thread; The second rotating shaft for the above-mentioned second cleaning brush of rotary actuation can be inserted in above-mentioned hollow bulb and carry out rotary support by bearing, and the external screw thread being formed at above-mentioned second rotating shaft is arranged at above-mentioned second cleaning brush; Connect gear, can be rotatably set in axle from above-mentioned bearing to axis direction that extend from, be engaged in above-mentioned internal thread and above-mentioned external screw thread rotates simultaneously.

Or above-mentioned first cleaning brush can comprise: drive motors, for the above-mentioned second cleaning brush of rotary actuation; Above-mentioned second cleaning brush has hollow bulb and ring, and wherein, above-mentioned hollow bulb is formed in the axis direction of above-mentioned second cleaning brush, and above-mentioned ring is formed in the surrounding of above-mentioned hollow bulb and is formed with internal thread; The first rotating shaft for the above-mentioned first cleaning brush of rotary actuation can be inserted in above-mentioned hollow bulb and carry out rotary support by bearing, and the external screw thread being formed at above-mentioned first rotating shaft is arranged at above-mentioned first cleaning brush; Connect gear, can be rotatably set in axle from above-mentioned bearing to axis direction that extend from, be engaged in above-mentioned internal thread and above-mentioned external screw thread rotates simultaneously.

Now, preferably, above-mentioned connection gear is formed with more than three, circumferentially to keep the mode of assigned position to arrange.

In order to solve technical problem as above, the utility model provides brush scrubber, it is characterized in that, comprising: base plate supports body, rotates aforesaid substrate, makes the substrate rotation of disc-shape; Cleaning brush, rotates with the state contacted with the plate face of aforesaid substrate, thus the plate face of contact cleaning aforesaid substrate; First liquid supply unit, is positioned at the side of above-mentioned cleaning brush, to the above-mentioned cleaning brush supply liquid of first area; And washings injection portion, plate to the aforesaid substrate that have passed above-mentioned first area faces the lateral direction spray rinse water of aforesaid substrate, before foreign matter on the plate face of aforesaid substrate arrives above-mentioned cleaning brush, release foreign matter, foreign matter is discharged to the outside of aforesaid substrate.

Thus, according to the utility model, when the foreign matter being attached to the surface of substrate while substrate is by first area is separated from the surface of substrate, plate to the aforesaid substrate that have passed first area faces the lateral direction spray rinse water of aforesaid substrate, before foreign matter on the plate face of aforesaid substrate arrives above-mentioned second area, above-mentioned foreign matter is guided to discharge to the outside of aforesaid substrate, thus, can obtain from root prevent the foreign matter be separated from the plate face of substrate by first area again arrive cleaning brush effect.

In the case, preferably, above-mentioned first area is the region that the cleaning direction of rotation of brush and the sense of rotation of substrate contact with opposite directions.Thus, the cleaning direction of rotation of brush and the sense of rotation of substrate are rightabout, in the contact site cleaning brush and substrate, there is to the first area supply with the fastest relative moving speed the liquid of cleaning composition, in the first region, by the CONTACT WITH FRICTION of cleaning brush and substrate, make separating residual at the maximizing efficiency of the foreign matter in the plate face of substrate.

Therefore, according to the utility model, when making brush and substrate contact from the surperficial segregating foreign objects of substrate with the highest friction contact load in the first region, perform rinsing process, make washings from the outside to substrate that spray by and isolated foreign matter, be pushed to the outside of substrate in time and discharge, thus prevent the foreign matter be separated from the surface of substrate to be again attached to the surface of substrate, and then can cleaning efficiency be improved, the foreign matter that the contact by cleaning brush simultaneously can also be prevented to be separated is attached to the surface of cleaning brush again, the problem because foreign matter causes substrate impaired is solved with this.

Now, compared to washings tap, above-mentioned washings injection portion large area spray rinse water, therefore, the foreign matter be separated from the surface of substrate can be pushed to the outside of substrate up hill and dale by washings and be discharged.

For this reason, the form that above-mentioned washings injection portion can mix mutually with washings and Compressed Gas is sprayed.Thereby, it is possible to significantly increase washings to hit to the strength on the surface of substrate, make from the strength of the surface removal foreign matter of substrate in maximizing.

On the one hand, at least one in above-mentioned first cleaning brush and above-mentioned second cleaning brush carries out moving back and forth or to specify the anglec of rotation to carry out reciprocal turning motion to axis direction in matting, thus, by the cleaning projection being formed at the surface cleaning brush, move to the direction with radial direction composition relative to wafer.Thus, even if the ground arrangement of cleaning projection systematicness, also can the integral surface of contact wafer, make foreign matter can not be gathered in the local on the surface of wafer, and clean equably on the whole.

On the one hand, above-mentioned washings ejection electrodes is in aforesaid liquid donor, and washings and liquid all can be supplied by a liquid donor, and the management and the control that make to have parts become easy advantage.

Further, aforesaid liquid donor is formed as elongated rod-shaped, and is arranged side by side with above-mentioned cleaning brush.Thus, liquid donor can to configure with the first area and second area mode in opposite directions of cleaning brush.

The plate face of above-mentioned washings injection portion and aforesaid substrate formed be less than or equal to 45 ° angle with spray rinse water, the energy of the washings sprayed plays the Main Function as the strength pushed open to horizontal direction, more effectively can push to the outside of substrate the foreign matter dropped from the plate face of substrate open.

On the one hand, the second liquid supply unit also can be formed in aforesaid liquid donor, above-mentioned second liquid supply unit is used for spraying liquid to the above-mentioned cleaning brush of second area, and above-mentioned second area is the region that the direction of rotation of above-mentioned cleaning brush is identical with the sense of rotation of aforesaid substrate.Be different from first area, the direction of rotation of cleaning brush is in the second area identical with the sense of rotation of substrate, compared to first area, although low from the efficiency of the plate face segregating foreign objects of substrate, in the second area, and also can from the plate face segregating foreign objects of substrate.

And, above-mentioned cleaning brush can be configured to the center through aforesaid substrate, in the side of aforesaid substrate not being configured with aforesaid liquid donor, also can comprise the second washings injection portion, above-mentioned second washings injection portion faces the lateral direction spray rinse water of aforesaid substrate to the plate of the aforesaid substrate that have passed above-mentioned second area, thus make the foreign matter on the plate face of aforesaid substrate before the above-mentioned second area of arrival, outside to aforesaid substrate is discharged, thus discharge foreign matter be separated in the second area to the outside of substrate in time, and then the cleaning efficiency of substrate can be improved and prevent substrate impaired.

" liquid " recorded in this specification and utility model right claim, for having the chemical substance of cleaning effect, in the industry, is also defined as the general designation of the material being called chemicals, cleaning agent, cleaning fluid etc.Further, " washings " recorded in this specification and utility model right claim are the material for rinsing, in the industry, are also defined as the general designation of the material being called pure water, desalted water etc.

As mentioned above, according to the utility model, the cleaning brush in contact cleaning base plate plate face is divided into the first cleaning brush and the second cleaning brush, first cleaning brush and the second cleaning brush rotate respectively to rightabout, the sense of rotation of substrate is made to form rightabout contact with the direction of rotation of cleaning brush, thus maximize by the cleaning force that contacts of cleaning brush with the friction of substrate, the time of removing needed for foreign matter from the plate face of substrate is shortened, and then obtains the advantageous effects that can complete matting more rapidly.

Add, when the foreign matter being attached to the surface of substrate while substrate is by the first cleaning brush is separated from the surface of substrate by strong friction contact load, face the lateral direction spray rinse water of aforesaid substrate to the plate of the aforesaid substrate that have passed the first cleaning brush from the first washings injection portion, before foreign matter on the plate face of aforesaid substrate arrives above-mentioned second cleaning brush, above-mentioned foreign matter is guided to discharge to the outside of aforesaid substrate, thus, can obtain and prevent the foreign matter be separated from the plate face of substrate by the first cleaning brush from again arriving the effect of cleaning brush from root.

Thus, according to the utility model, when making brush and substrate contact from the surperficial segregating foreign objects of substrate with the highest friction contact load in the first cleaning brush, perform rinsing process, make washings from the outside to substrate that spray by and isolated foreign matter, discharged by the outside of pushing substrate in time to, thus prevent the foreign matter be separated from the surface of substrate to be again attached to the surface of substrate, and then can cleaning efficiency be improved, the foreign matter that the contact by cleaning brush simultaneously can also be prevented to be separated is attached to the surface of cleaning brush again, the problem because foreign matter causes substrate impaired is solved with this.

And, according to the utility model, rotating contact is in the cleaning brush in the plate face of the substrate of rotation, and it is configured at two coaxial parts and utilizes a power mutually to rotate in the opposite direction, so have can make by cleaning brush and substrate friction contact the maximized effect of cleaning force.

And, according to the utility model, in the first cleaning brush, the foreign matter be separated from the plate face of substrate is before brush is cleaned in arrival second, be pushed to the outside of substrate and be discharged, meanwhile, the foreign matter that the contact by cleaning brush can be prevented to be separated is attached to the surface of cleaning brush again, and then can solve the problem because foreign matter causes substrate impaired.

Moreover, according to the utility model, the cleaning brush supply liquid in first area reverse on the contrary to the direction of rotation of cleaning brush and the sense of rotation of aforesaid substrate, because the cleaning direction of rotation of brush and the sense of rotation of substrate are rightabout, make along with in the contact site of cleaning brush and substrate, in the first area that relative velocity is the fastest, supply liquid, and then the next isolated effect remaining in the efficiency of the foreign matter in the plate face of substrate of CONTACT WITH FRICTION maximized by cleaning brush and substrate can be obtained.

Add, according to the utility model, to have passed the cleaning direction of rotation of brush and the sense of rotation of aforesaid substrate is the plate face of the substrate of rightabout first area, to the lateral direction spray rinse water of aforesaid substrate, when the foreign matter being attached to the surface of substrate while substrate is by first area is separated from the surface of substrate, plate to the aforesaid substrate that have passed first area faces the lateral direction spray rinse water of aforesaid substrate, make the foreign matter on the plate face of aforesaid substrate before the above-mentioned second area of arrival, outside to aforesaid substrate is discharged, thus, the foreign matter by being separated from the surface of substrate during first area is prevented again to be attached to the surface of substrate, and then the advantageous effects improving cleaning efficiency can be obtained.

Also have, according to the utility model, in the first region, the foreign matter be separated from the plate face of substrate is before arrival cleaning brush, outside to substrate is open and is discharged, meanwhile, the foreign matter that the contact by cleaning brush can be prevented to be separated is attached to the surface of cleaning brush again, and then solves the problem because foreign matter causes substrate impaired.

Accompanying drawing explanation

Fig. 1 is the stereogram of the formation representing existing brush scrubber.

Fig. 2 is the vertical view of Fig. 1.

Fig. 3 is the vertical view of the formation except injection portion of the brush scrubber representing the first embodiment of the present utility model.

Fig. 4 is the vertical view of the formation of the brush scrubber represented in matting.

Fig. 5 is the skeleton diagram of the formation of the liquid donor representing Fig. 4.

Fig. 6 a to Fig. 6 c is the schematic diagram of the action principle of brush scrubber for illustration of Fig. 3.

Fig. 7 is the vertical view of the formation of the brush scrubber representing other embodiment of the present utility model.

Fig. 8 is the longitudinal section of the line of cut Ⅸ-Ⅸ along Fig. 7.

Fig. 9 is the sectional elevation of the line of cut X-X along Fig. 8.

Figure 10 is the stereogram representing that the brush scrubber of other embodiment of the present utility model is formed.

Figure 11 is the vertical view of Figure 10.

Figure 12 is the front view of the formation of express liquid supply bar.

Figure 13 a to Figure 13 f is the schematic diagram of the action principle of brush scrubber for illustration of Figure 10.

Reference numeral

1,1': brush scrubber 10: base plate supports body

110: the first cleaning brushes 120: first liquid donor

130A: the first liquid supply unit 130B: the second liquid supply unit

131: the first liquid nozzle 132: the second liquid nozzles

141: washings jet 142: the second washings jet

210: the second cleaning brushes 220: second liquid donor

310: cleaning brush 320: liquid donor

330A: the first liquid supply unit 330B: the second liquid supply unit

331: the first liquid nozzle 332: the second liquid nozzles

341: washings jet 342: the second washings jet

CN1: the first liquid medicine jet loophole RN1: the first washings jet

CN2: the second liquid medicine jet loophole RN2: the second washings jet

W: substrate

Embodiment

Below, with reference to the accompanying drawings the brush scrubber 1 of the first embodiment of the present utility model is described in detail.But, in the process that the utility model is described, by omitting the explanation of related known function or formation, with main idea clearly of the present utility model, for same or analogous function or formation, same or analogous Reference numeral will be adopted.

The brush scrubber 1 of the first embodiment of the present utility model comprises: base plate supports body 10, and substrate W is rotated, and makes the substrate W rotation r1 of disc-shape; First brush cleaning part 100, by contacting cleaning base plate W with a part of plate face of substrate W; Second brush cleaning part 200, by contacting cleaning base plate W with another part plate face of substrate W; And brace table 90, for supporting cleaning brush.

As shown in Figure 1, aforesaid substrate supporter 10 is configured with more than three, and carries out rotary actuation 10d with the state that the side edge with substrate W is tactile, makes circular substrate W rotate r1.The base plate supports body 10 being illustrated in accompanying drawing forms opening due to the bottom surface of substrate, thus with the state that can realize brush cleaning, rotary actuation is carried out to substrate W, but base plate supports body of the present utility model is not limited to diagram form, the form rotated under being also included in the state that bottom surface or the side of substrate W are fixed.That is, base plate supports body of the present utility model also comprises the form of the non-opening of substrate bottom surface.

Above-mentioned first brush cleaning part 100 comprises the first cleaning brush 110, rotates with the state that the plate face of the substrate W with rotation contacts, and with the plate face of way of contact cleaning base plate W; And first liquid donor 120, be provided with multiple first liquid medicine jet loophole CN1 and washings jet RN1, above-mentioned multiple first liquid medicine jet loophole CN1 supplies liquid 33 to the first cleaning brush 110; Above-mentioned washings jet RN1 is to the plate face spray rinse water of substrate W.

Above-mentioned first cleaning brush 110 is connected with drive motors M by the first rotating shaft 103, carries out rotary actuation 110r by drive motors M.Although not shown, when to base plate supports body 10 supplying substrate W, first cleaning brush 110 carries out movement vertically, open the mobile route of substrate W, when substrate W is placed in base plate supports body 10 and is in the state of rotatable driving, rightabout moves up and down, is formed as the state of the lateral plates being up and down contacted with substrate W.Further, rotary actuation is carried out by drive motors M, thus the plate face of contact cleaning base plate W.The Reference numeral 109 be not described in accompanying drawing is the brace table of rotary support first rotating shaft 103.

In the case, the first cleaning brush 110 is formed by the material can holding in the mouth or the eyes water, cleans while contacting with the plate face of substrate W, and assists cleaning by forming cleaning projection 111 on surface.The length L1 of the first cleaning brush 110 extends to the center of substrate, the central part of contact cleaning base plate.

Now, the direction of rotation of the first cleaning brush 110 is the direction contrary with the sense of rotation r1 of the substrate W by base plate supports body 10.Therefore, in the first contact site A1 that the first cleaning brush 110 and substrate W contact, take Fig. 3 as benchmark, cleaning brush 110 moves downwards, and substrate W is moved upward, and the friction contact load between these parts 110, W will in maximization.

Further, as shown in Figure 4, first liquid donor 120 extends to form with rectangular form, with the length direction entirety coating liquid to the first cleaning brush 110, and cleans brush 110 and row arrangement with first.

As shown in Figure 5, first liquid donor 120 is provided with the multiple liquid medicine jet loophole CN1 for applying the nozzle form of liquid 33 to the first cleaning brush 110, obtain liquid by liquid supply pipe 120c from liquid supply unit 150, apply liquid 33 to the first cleaning brush 110.By the chemical action after liquid medicine coating, the cleaning performance of substrate W can be improved.

Further, first liquid donor 120 be provided with for substrate W outside spray rinse water or be mixed with the mist of washings and Compressed Gas (" washings " described in this specification and utility model right claimed range and term definition be similarly for comprising " mist ".Below, be referred to as " washings ") at least one first washings jet RN1, only washings are obtained from washings supply unit 130, or obtain from washings supply unit 130 and Compressed Gas supply unit 140 mist being mixed with washings and Compressed Gas, to the washings (comprising Compressed Gas) of the surperficial inject high pressure of substrate W, the foreign matter remaining in the surface of substrate W is performed rinsing process while the outside of substrate is pushed open.Now, first washings jet RN1 with close to level plate surface large area from the angle of less than 45 ° to substrate W spray the washings such as pure water 44, by carrying out high-pressure injection to substrate lateral direction with the form of dispersion, thus the effect that the foreign matter that can improve the surface by remaining in substrate W is pushed open outside substrate.

So, supply the first liquid medicine jet loophole CN1 of liquid and the setting of the first washings jet RN1, liquid medicine jet loophole CN1 and the first washings jet RN1 and configuration to the liquid donor 120 extended with rectangular form and will become by together arranging and be more prone to.

As the first brush cleaning part 100, above-mentioned second brush cleaning part 200 comprises: the second cleaning brush 210, rotates with the state that the plate face of the substrate W with rotation contacts, and with the plate face of way of contact cleaning base plate W; And second liquid donor 220, be provided with multiple second liquid medicine jet loophole CN2 and the second washings jet RN2, above-mentioned multiple second liquid medicine jet loophole CN2 supplies liquid 33 to the second cleaning brush 210; Above-mentioned second washings jet RN2 is to the plate face spray rinse water of substrate W.

Above-mentioned second cleaning brush 210 is formed by the material can holding in the mouth or the eyes water, cleans in the mode contacted with the plate face of substrate W, and cleaning projection 111 is auxiliary cleans by being formed on surface.Further, the second cleaning brush 210 is connected with drive motors M by the second rotating shaft 203, carries out rotary actuation 210r by drive motors M.In the case, clean the length of brush 210 compared to the first cleaning brush 110, second short, thus the central part of not cleaning base plate.The Reference numeral 209 be not described in accompanying drawing is the brace table of rotary support second rotating shaft 203.

Now, the direction of rotation 210r as the first cleaning brush 110, second cleaning brush 210 is that the direction contrary with the sense of rotation r1 of the substrate W by base plate supports body 10 contacts and determine.Therefore, in the second contact site A2 that the second cleaning brush 210 and substrate W contact, take Fig. 3 as benchmark, cleaning brush 110 is moved upward, and substrate W moves downwards, thus the friction contact load between these parts 210, W will in maximization.

Further, as shown in Figure 4, second liquid donor 220 extends to form with rectangular form, with the length direction entirety coating liquid to the second cleaning brush 210, and cleans brush 210 and row arrangement with second.

As first liquid donor 120 as shown in Figure 5, also the multiple second liquid medicine jet loophole CN2 for applying the nozzle form of liquid 33 to the second cleaning brush 210 are provided with in second liquid donor 220, obtain liquid by liquid supply pipe from liquid supply unit 150, apply liquid 33 to the second cleaning brush 210.By this by the chemical action after liquid medicine coating, the cleaning performance of substrate W can be improved.

And, second liquid donor 220 be provided with for substrate W outside spray rinse water or be mixed with at least one second washings jet RN2 of mist of washings and Compressed Gas, obtain washings from washings supply unit 130, high-pressure injection is carried out on the surface to substrate W.Thus, the foreign matter remaining in the surface of substrate W is pushed open to the outside of substrate, performs rinsing process with this.Now, second washings jet RN2 with close to level plate surface large area from the angle of less than 45 ° to substrate W spray the washings such as pure water 44, by carrying out high-pressure injection, the effect that the foreign matter that can improve the surface by remaining in substrate W is pushed open outside substrate to substrate lateral direction with the form of dispersion.

So, supply the second liquid medicine jet loophole CN2 of liquid and the setting of the second washings jet RN2, the second liquid medicine jet loophole CN2 and the second washings jet RN2 and configuration to the second liquid donor 220 extended with rectangular form and will become by together arranging and be more prone to.

There is shown the first cleaning brush 110 and the second cleaning brush 120 is arranged in coaxial formation, but because both are by rotary actuation independently, therefore, also can not be arranged in and coaxially and freely configure.

On the one hand, the first rotating shaft 103 making the first cleaning brush 110 rotate and the second rotating shaft 203 that the second cleaning brush 210 is rotated move back and forth with the direction of drive motors to the radial direction composition with wafer.Thus, the cleaning projection being arranged in the surface of cleaning brush 110,210 moves to the direction of the radial direction composition with wafer, cleaning projection is contacted with the integral surface of wafer equably, and then the integral surface of wafer W is cleaned equably by cleaning projection.This formation can by rotating shaft 103,203 and drive motors by driving screw 1 second ~ 10 seconds in move in reciprocal stroke by the spacing size of cleaning projection, or make rotating shaft 103,203 and drive motors by being that anglec of rotation size that benchmark is determined is carried out turning motion and realized with pivot.

With reference to Fig. 6 a ~ Fig. 6 c, the operation principle of brush scrubber 1 as constructed as above is described in detail.

step 1: when the extended center to substrate W first cleaning brush 110 carry out rotation 110r and substrate W carries out rotation r1 time, in the first contact site A1 that the first cleaning brush 110 contacts with substrate W, the first cleaning brush 110 contacts cleaning base plate W with while substrate W round about movement.Therefore, by the friction that the first cleaning brush 110 produces by contacting with substrate W, maximizing contact cleaning force, and then improving the efficiency from substrate W segregating foreign objects.

Meanwhile, when the not extended center to substrate W second cleaning brush 210 carry out rotation 210r and substrate W carries out rotation r1 time, in the second contact site A2 that the second cleaning brush 210 contacts with substrate W, the second cleaning brush 210 contacts cleaning base plate W with while substrate W round about movement.Therefore, by the friction that the second cleaning brush 210 produces by contacting with substrate W, maximizing contact cleaning force, and then improving the efficiency from substrate W segregating foreign objects.

Meanwhile, liquid 33 is coated on the first cleaning brush 110 and the second cleaning brush 210 respectively from the first liquid supply port CN1 and the second liquid supply port CN2, therefore, when the first cleaning brush 110 and the second cleaning brush 210 clean by contacting with substrate W, chemical cleaning power doubles, and then can play the high cleaning force of the plate face segregating foreign objects from substrate W.

step 2: as shown in Figure 6 a, clean the high cleaning force of brush 110 and the second cleaning brush 210 by first, from the foreign matter 88 that the surface of substrate W is separated, carry out in rotary moving along with the rotation r1 of substrate W.

step 3: now, with the sense of rotation r1 of substrate W for benchmark, first liquid donor 120 between the first cleaning brush 110 and the second cleaning brush 210 is provided with the first washings jet RN1, above-mentioned first washings jet RN1 sprays the washings such as pure water to substrate lateral direction to the plate face of substrate in large area with the angle of less than 45 ° close to level, carries out high-pressure injection with the form of disperseing.And, with the sense of rotation r1 of substrate W for benchmark, second liquid donor 220 between the second cleaning brush 210 and the first cleaning brush 110 is provided with the second washings jet RN2, above-mentioned second washings jet RN2 sprays the washings such as pure water to substrate lateral direction to the plate face of substrate in large area with the angle of less than 45 ° close to level, carries out high-pressure injection with the form of disperseing.

Therefore, as fig. 6 c, by the washings 44 sprayed from the first washings jet RN1 and the second washings jet RN2, after substrate W separation, the foreign matter 88 be positioned at substrate W is pushed the outside of substrate W to along with the flowing of washings 44 and is discharged 99.

So, the foreign matter 88 be separated with the second cleaning brush 210 from the first cleaning brush 110 does not remain in substrate W, and the outside cleaning the forward direction substrate W of brush 210 and the first cleaning brush 110 in arrival second is discharged, therefore, the foreign matter 88 be separated from substrate W can be prevented again to be attached to the surface of substrate W and to cause cleaning efficiency low, meanwhile, contact at cleaning brush 110,210 the substrate W caused because of foreign matter the process of cleaning after the foreign matter be separated from substrate W can also be prevented to be attached to cleaning brush 110,210 impaired.

About aforesaid step 1 ~ step 3, each step can be implemented successively, but also can with while continuous print form implementation step 1 ~ step 3.Thereby, it is possible to obtain the advantage of the brush matting of more effectively carrying out the substrate implemented continuously.

Below, be described in detail to the brush scrubber 3 of other execution mode of the present utility model.But, for the formation of aforesaid embodiment and act on same or analogous formation and effect, same or analogous Reference numeral will be adopted, and omit explanation related to this, with the main idea of clear and definite the present embodiment.

As shown in Figure 7, the brush scrubber 3 of other example of the present utility model, it is characterized in that, when making the first cleaning brush 110 rotary actuation 110r by a drive motors M, second cleaning 210, brush can rotate to the first rightabout cleaning brush 110, guides substrate W to be rightabout with the direction that contacts of cleaning brush 110,210 all the time.

For this reason, as can be seen from figures 8 and 9, in the inside of the first cleaning brush 110, form hollow bulb in region that the first rotating shaft 101 does not relate to, clean the ring 31 that brush 110 together rotates be formed as around hollow bulb with first.Ring 31, by being close to the inside of the first cleaning brush 110 and cleaning brush 110 together rotate with first by friction, together can also rotate by being connected to fetch with the first rotating shaft 103.

Now, at the center of hollow bulb, extended to form the second rotating shaft 203, the outer peripheral face of the second rotating shaft 203 extended in the inside of hollow bulb is formed with external screw thread 203o.Now, the second rotating shaft 203 carries out rotary support in the inside of hollow bulb by bearing 103b.The foreign steamer of bearing 103b is fixed on ring 31, and the interior wheel of bearing 103b is fixed on the second rotating shaft 203, and therefore, ring 31 and the second rotating shaft 203 can rotate to equidirectional or different directions independently.

Further, in the gap of cyclic form being provided with bearing 103b, be fixed with the sheet material 32f of annular state, be formed with the axle 32x extended from this sheet material 32f to axis direction everywhere.Be provided with at this axle 32x and connect gear 32, above-mentioned connection gear 32 also engages with the external screw thread 203o of the second rotating shaft 203 while engaging with the internal thread 31i of ring 31.Illustrated four spacing connecting gear 32 and can keep circumferencial direction each other.According to other example of the present utility model, connect gear 32 and be provided with at least two, preferably, be provided with more than three.Further, preferably, it is little that connection gear 32 is formed as diameter, but the length long enough of axis, to guarantee the contact area that the rotary driving force of the first cleaning brush 110 can transmit to the second rotating shaft 203.

In the case, first rotating shaft 103 and the second rotating shaft 203 vertically, intervening gaps c1 and being configured, ring 31 and the second cleaning brush 210 also intervening gaps c and being configured vertically, even if thus mutually rotate to different directions, also can not be interfered.

Therefore, when the first cleaning brush 110 carries out rotary actuation by drive motors M to first direction 110r, clean the ring 31 that brush 110 together rotates also can rotate to first direction 31r with first.Therefore, connect gear 32 and carry out rotation 32r while engaging with the internal thread 31i of ring 31, the second rotating shaft 203 engaged with connection gear 32r rotates to the direction 203r contrary with first direction 110r.

By formation as above, first cleaning brush 110 and the second cleaning brush 210 can carry out rotary actuation by a drive motors M to different directions, thus, under state cleaning brush 110,210 being configured at the position at the center through substrate W with a rectangular form, obtain to occupy the compact formation in less space to realize the advantage that the direction of rotation of substrate W and cleaning brush 110,210 is rightabout contact condition.

The formation being formed at the inside of the first cleaning brush 110 in accompanying drawing for hollow bulb is illustrated, but, can form hollow bulb in the inside of the second cleaning brush 210, the first rotating shaft 103 is inserted in hollow bulb and the formation utilizing the rotary driving force of the second cleaning brush 210 to carry out round about rotating is apparent.

According to the brush scrubber of the present utility model 1 formed as mentioned above, the cleaning brush in the plate face of contact cleaning base plate W is divided into the first cleaning brush 110 and the second cleaning brush 210, first cleaning brush 110 and the second cleaning brush 210 rotate respectively to rightabout, with the sense of rotation r1 of substrate W and cleaning brush 110, the direction of rotation of 210 is that rightabout mode contacts, maximize by cleaning brush 110, 210 with the friction of substrate W contact cleaning force, thus, can with the next plate face segregating foreign objects from substrate of larger strength, therefore, the advantageous effects that Rapid dry pure land more carries out cleaning can be obtained.

And, according to the utility model, be configured to substrate through while the first cleaning brush 110, before the foreign matter 88 be separated from the surface of substrate arrives the second cleaning brush 210, by with the washings sprayed close to the low-angle of level, above-mentioned foreign matter 88 is externally discharged, thus, have and can eliminate foreign matter from root and be re-attached to substrate and cause cleaning efficiency low, or foreign matter is attached to cleaning brush and causes substrate to occur the advantage of the problems such as cut.

Below, with reference to the accompanying drawings the brush scrubber 1 ' of the second embodiment of the present utility model is described in detail.But, in the process that the utility model is described, by omitting the explanation of related known function or formation, with main idea clearly of the present utility model, for same or analogous function or formation, same or analogous Reference numeral will be adopted.

The brush scrubber 1 ' of the second embodiment of the present utility model comprises: base plate supports body 10, and substrate W is rotated, and makes the substrate W rotation r1 of disc-shape; Cleaning brush 310, rotates with the state that the plate face of the substrate W with rotation contacts, and the plate face of cleaning base plate W in a contact fashion; Brace table 90, for rotary support cleaning brush 310; Liquid donor 320, has liquid nozzle 331,332 and washings jet 341, and wherein above-mentioned liquid nozzle 331,332 supplies liquid 33 and the above-mentioned washings jet 341 plate face spray rinse water to substrate W to cleaning brush 310; And the second washings jet 342, be positioned at the opposition side of liquid donor 320, to substrate W surface and to the direction spray rinse water of radius lateral direction composition.

As shown in Figures 1 and 2, aforesaid substrate supporter 10 is configured with more than three, and to carry out rotary actuation 10d with the state that the edge of substrate W contacts in contact site 15, makes circular substrate W rotate r1.Illustrated base plate supports body 10 forms opening due to the bottom surface of substrate, thus with cocoa realize brush cleaning state rotary actuation is carried out to substrate W, but, base plate supports body of the present utility model is not limited to diagram form, the form rotated under being also included in the state be fixed bottom surface or the side of substrate W.That is, base plate supports body of the present utility model also comprises the form of the non-opening of substrate bottom surface.

Above-mentioned cleaning brush 310 is connected with drive motors M by rotating shaft, carries out rotary actuation by drive motors M.Although not shown, when to base plate supports body 10 supplying substrate W, cleaning brush 310 carries out movement vertically, open the mobile route of substrate W, when substrate W is placed in base plate supports body 10 and is in the state of rotatable driving, rightabout moves up and down, is formed as the state of the lateral plates being up and down contacted with substrate W.Further, rotary actuation is carried out by drive motors M, thus the plate face of contact cleaning base plate W.

Preferably, cleaning brush 310, with the morphologic arrangement at the center through substrate W, makes to increase with the contact area of substrate W.

So, when substrate W carrys out rotation r1 by base plate supports body 10 and carries out rotary actuation by cleaning brush 310, be divided into first area A1 and second area A2, in above-mentioned first area A1, the sense of rotation r1 of substrate W contacts round about with the direction of rotation 310r of cleaning brush 310, in above-mentioned second area A2, the sense of rotation of substrate W contacts to equidirectional with the direction of rotation 310r of cleaning brush 310.

As shown in figure 11, aforesaid liquid donor 320 extends to form with rectangular form, and is arranged side by side with cleaning brush 310.Liquid donor 320 is provided with the first medical liquid spraying portion 330A, there are the multiple nozzles 331 for spraying liquid 33 to sense of rotation r1 and the first area A1 that contacts round about of direction of rotation 310r of cleaning brush 310 of substrate W; Second medical liquid spraying portion 330B, has the multiple nozzles 332 for spraying liquid 33 to the sense of rotation r1 of substrate W and the direction of rotation 310r of cleaning brush 310 to the second area A2 that equidirectional contacts; And washings jet 341, the mist that outside spray rinse water or washings to substrate W mix mutually with Compressed Gas.

The liquid sprayed by multiple nozzle 331,332 is supplied from liquid supply unit 350 by liquid supply pipe 330p, and the washings sprayed by washings injection portion 341 or mist are through mixing gas supply pipe 140p to supply after being mixed mutually with Compressed Gas supply unit 370 by washings supply unit 360.Now, determine chemical drug supply pipe 330P, make the first medical liquid spraying portion 330A and the second medical liquid spraying portion 330B spray liquid 33 independently.

So, by arranging the first liquid supply unit 330A and the second liquid supply unit 330B and washings jet 341 with the morphogenetic liquid donor of strip, make desired location configure and these parts 330A is set, 330B, 341 becomes and is more prone to, and then have and control to become easier advantage.

Further, owing to being provided with the second washings jet 342 independently, by substrate lateral direction spray rinse water 44 or mist, the outside of the foreign matter 88 be separated from second area A2 to substrate being pushed open and made it discharge.

On the contrary, in the second area A2 that the cleaning direction of rotation 310r of brush 310 and the sense of rotation r1 of substrate W contact to equidirectional, diminish by the contact cleaning force cleaning the friction that brush 310 is produced during wiping by contact substrate W, make the efficiency step-down from substrate W segregating foreign objects.Therefore, be necessary that the contact cleaning force of utilization at first area A1 is to perform the foreign substance cleaning of substrate W.

On the one hand, the rotating shaft making cleaning brush 310 rotate and drive motors one in the same way axis direction move back and forth.Thus, the cleaning projection being arranged in the surface of cleaning brush 310 is contacted with wafer integral surface equably, and the integral surface of wafer W is cleaned equably by cleaning projection.This formation can by the cleaning rotating shaft of brush 310 and drive motors together by driving screw 1 second ~ 10 seconds within by cleaning projection between be interposed between forming of movement in reciprocal stroke and realize.

On the one hand, the direction that the rotating shaft making cleaning brush 310 rotate and drive motors one have wafer W radial direction composition in the same way moves back and forth.Thus, the cleaning projection being arranged in the surface of cleaning brush 310 moves to the direction of the radial direction composition with wafer, the integral surface of wafer is contacted equably with cleaning projection, thus the integral surface of wafer W is cleaned equably by cleaning projection.This formation can by for cleaning brush 310 is carried out the rotating shaft of rotary actuation and drive motors together by driving screw 1 second ~ 10 seconds within move in reciprocal stroke by the gap size of cleaning projection, or rotating shaft 303,303 and drive motors are according to being that benchmark carries out turning motion by the anglec of rotation of regulation and realizes with pivot.

Below, with reference to Figure 13 a ~ Figure 13 f, the operation principle of the brush scrubber 1 ' for meeting this necessity is described in detail.

step 1: when the cleaning brush 310 at the center being arranged through substrate W carries out rotation 310r and substrate W carries out rotation r1, contact site C1, C2 of cleaning brush 310 and substrate W are then divided at cleaning brush 310 and the first area A1 of substrate W movement round about in contact site and the second area A2 to equidirectional movement.

But, in the first area A1 that the cleaning direction of rotation 310r of the brush 310 and sense of rotation r1 of substrate W contacts in the opposite direction, will in maximization by the contact cleaning force cleaning the friction that brush 310 is produced during wiping by contact substrate W, therefore, uprise from the efficiency of substrate W segregating foreign objects.

Therefore, as depicted in fig. 13 a, in the first liquid supply unit 330A of liquid donor 320, the cleaning brush 310 to first area A1 applies liquid 33.Because the cleaning efficiency completed in the A1 of first area is high, the unit interval quantity delivered of the liquid that regulation supplies to first area A1 is greater than the unit interval quantity delivered of the liquid supplied to second area A2.

So, along with liquid 33 supplies in a large number from the first liquid supply unit 330A to the first area A1 of cleaning brush 310, in the first contact site C1 of first area A1, when cleaning brush 310 and contacting with the surface of substrate W, by the large frictional force of cleaning brush 310 and substrate W, the foreign matter on the surface being attached to substrate W can be isolated forcefully from physical layer, moreover, the chemical cleaning power of the liquid of enough supplies doubles, and then can play the high cleaning force of the plate face segregating foreign objects from substrate W.

step 2: by the high cleaning force of cleaning brush 310 in the A1 of first area, as illustrated in fig. 13b, the foreign matter 88 be separated from the surface of substrate W carries out in rotary moving along with the rotation r1 of substrate W.

step 3: now, with the sense of rotation r1 of substrate W for benchmark, the first washings jet 341 is provided with between first area A1 and second area A2, above-mentioned first washings jet 341 sprays the washings such as pure water to substrate lateral direction to the plate face of substrate in large area with the angle of less than 45 ° close to level, carries out high-pressure injection with the form of disperseing.First washings jet 341 can be configured to only spray pure water, as shown in the figure, and also can by mixing pure water and compressed air or Compressed Gas and spraying with mist form.

Therefore, as shown in figure 13 c, by the washings sprayed from the first washings jet 341, after substrate W separation, be positioned at the foreign matter 88 of substrate W, push the outside of substrate W to along with the flowing of washings 44 and be discharged 99.

So, the foreign matter 88 be separated in the first area A1 of cleaning brush 310 does not remain in substrate W, and discharge in the outside of the forward direction substrate W arriving the second area A2 cleaning brush 310, therefore, the foreign matter 88 be separated from substrate W can be prevented again to be attached to the surface of substrate W and to cause cleaning efficiency low, meanwhile, with together rotating of brush 310 of cleaning and cause substrate W to occur the problem that cut etc. is impaired while the second area A2 of cleaning brush 310 can also be prevented from being attached to.

step 4: and as shown in figure 13d, in the second area A2 that the cleaning direction of rotation 310r of the brush 310 and sense of rotation r1 of substrate W contacts to equidirectional, compared to first area A1, contact cleaning force is low.Therefore, as shown in figure 13d, compared to the amount of liquid medicine supplied in the A1 of first area, liquid 33 is supplied with relatively little unit interval quantity delivered from the second liquid supply unit 330B to the second area A2 of cleaning brush 310.

step 5: as shown in figure 13e, the foreign matter 88 be separated from the surface of substrate W in the second area A2 of cleaning brush 310 carries out in rotary moving along with the rotation r1 of substrate W.Compared to the foreign matter be separated from the A1 of first area, the foreign matter of less amount is separated from the surface of substrate W thus carries out in rotary moving.

step 6: same, with the sense of rotation r1 of substrate W for benchmark, the second washings jet 342 is provided with between second area A2 and first area A1, above-mentioned second washings jet 342 sprays the washings such as pure water to substrate lateral direction to the plate face of substrate in large area with the angle of less than 45 ° close to level, carries out high-pressure injection with the form of disperseing.Now, the second washings jet 342 can be configured to only spray pure water, as shown in the figure, and also can by mixing pure water and compressed air or Compressed Gas and spraying with mist form.

Therefore, as shown in figure 13f, by the washings sprayed from the second washings jet 342, be separated from substrate W, the foreign matter 88 be positioned on substrate W is pushed the outside of substrate W to along with the flowing of washings 44 and is discharged 99.

So, the foreign matter 88 be separated in the second area A2 of cleaning brush 310 does not remain in substrate W, and discharge in the outside of the forward direction substrate W arriving the first area A1 cleaning brush 310, therefore, the foreign matter 88 be separated from substrate W can be prevented again to be attached to the surface of substrate W and to cause cleaning efficiency low, meanwhile, with together rotating of brush 310 of cleaning and cause substrate W to occur the problem that cut etc. is impaired while the second area A2 of cleaning brush 310 can also be prevented from being attached to.

About aforesaid step 1 ~ step 6, each step can be implemented successively, but also can with while continuous print form implementation step 1 ~ step 6.Thereby, it is possible to more effectively carry out the brush matting of the substrate implemented continuously.

According to brush scrubber 1 ' of the present utility model as above, if substrate W forms separation by the foreign matter 88 being attached to the surface of substrate W while the A1 of first area from the surface of substrate, the lateral direction spray rinse water 44 of substrate is then faced to the plate of the substrate W that have passed first area A1, before foreign matter 88 on the plate face of substrate arrives the second area A2 as another region of cleaning brush 310, above-mentioned foreign matter 88 is guided to discharge to the outside of substrate, thus, substrate is prevented to be subject to secondary pollution, improve cleaning efficiency, and the foreign matter be separated from the surface of substrate can be prevented to be attached to cleaning brush from root and rotate with it and cause substrate to occur the situation that cut etc. is impaired.

Above exemplary illustration is carried out to preferred embodiment of the present utility model; but protection range of the present utility model is not limited to specific embodiment as above, the utility model person of an ordinary skill in the technical field suitably can change in the scope described in the utility model claims.Such as, the utility model can be configured to the formation not comprising the second washings jet or the second liquid supply unit.

Claims (25)

1. a brush scrubber, is characterized in that, comprising:

Base plate supports body, rotates aforesaid substrate, makes the substrate rotation of disc-shape;

First cleaning brush, the first direction of rotation that the rightabout to the sense of rotation with aforesaid substrate contacts carries out rotary actuation, is contacted with the plate face of aforesaid substrate to clean the plate face of aforesaid substrate; And

Second cleaning brush, rotate with the state contacted with the plate face of aforesaid substrate, thus with the plate face of way of contact cleaning aforesaid substrate, its direction of rotation is set to, carry out rotary actuation to the first rightabout cleaning the direction of rotation relative to above-mentioned plate face of brush, thus contact with the rightabout of the sense of rotation of aforesaid substrate.

2. brush scrubber according to claim 1, is characterized in that, also comprises:

First liquid supply unit, is positioned at the side of above-mentioned first cleaning brush, and to above-mentioned first cleaning brush supply liquid; And

First washings injection portion, the plate to the aforesaid substrate that have passed above-mentioned first cleaning brush faces the lateral direction spray rinse water of aforesaid substrate.

3. brush scrubber according to claim 2, is characterized in that,

A body is fixed in above-mentioned first liquid supply unit and above-mentioned first washings injection portion.

4. brush scrubber according to claim 1, is characterized in that, also comprises:

Second liquid supply unit, is positioned at the side of above-mentioned second cleaning brush, and to above-mentioned second cleaning brush supply liquid; And

Second washings injection portion, the plate to the aforesaid substrate that have passed above-mentioned second cleaning brush faces the lateral direction spray rinse water of aforesaid substrate.

5. brush scrubber according to claim 4, is characterized in that,

A body is fixed in above-mentioned second liquid supply unit and above-mentioned second washings injection portion.

6. brush scrubber according to claim 1, is characterized in that,

The direction of above-mentioned first cleaning brush and the radial direction of above-mentioned second cleaning brush to wafer in matting moves back and forth.

7. the brush scrubber according to any one in claim 1 to 6, is characterized in that,

Above-mentioned first cleaning brush is formed as having the length at the center of the radius extending to aforesaid substrate.

8. the brush scrubber according to any one in claim 1 to 6, is characterized in that,

Above-mentioned first cleaning brush and above-mentioned second cleaning brush are unworthy of being placed in coaxially.

9. the brush scrubber according to any one in claim 1 to 6, is characterized in that,

Above-mentioned first cleaning brush and above-mentioned second cleaning brush are configured at coaxially.

10. brush scrubber according to claim 9, is characterized in that,

Above-mentioned second cleaning brush carries out rotary actuation by the rotary driving force receiving above-mentioned first cleaning brush to the above-mentioned first rightabout cleaning brush.

11. brush scrubbers according to claim 10, is characterized in that, comprising:

Drive motors, for the above-mentioned first cleaning brush of rotary actuation;

Above-mentioned first cleaning brush has hollow bulb and ring, and wherein, above-mentioned hollow bulb is formed in the axis direction of above-mentioned first cleaning brush, and above-mentioned ring is formed in the surrounding of above-mentioned hollow bulb and is formed with internal thread;

The second rotating shaft for the above-mentioned second cleaning brush of rotary actuation is inserted in above-mentioned hollow bulb and carries out rotary support by bearing, and the external screw thread being formed at above-mentioned second rotating shaft is arranged at above-mentioned second cleaning brush;

Connect gear, can be rotatably set in axle from above-mentioned bearing to axis direction that extend from, be engaged in above-mentioned internal thread and above-mentioned external screw thread simultaneously and rotate.

12. brush scrubbers according to claim 11, is characterized in that,

Above-mentioned connection gear is formed with more than three, circumferentially to keep the mode of assigned position to arrange.

13. brush scrubbers according to claim 10, is characterized in that, comprising:

Drive motors, for the above-mentioned second cleaning brush of rotary actuation;

Above-mentioned second cleaning brush has hollow bulb and ring, and wherein, above-mentioned hollow bulb is formed in the axis direction of above-mentioned second cleaning brush, and above-mentioned ring is formed in the surrounding of above-mentioned hollow bulb and is formed with internal thread;

The first rotating shaft for the above-mentioned first cleaning brush of rotary actuation is inserted in above-mentioned hollow bulb and carries out rotary support by bearing, and the external screw thread being formed at above-mentioned first rotating shaft is arranged at above-mentioned first cleaning brush;

Connect gear, can be rotatably set in axle from above-mentioned bearing to axis direction that extend from, be engaged in above-mentioned internal thread and above-mentioned external screw thread simultaneously and rotate.

14. brush scrubbers according to claim 13, is characterized in that,

Above-mentioned connection gear is formed with more than three, circumferentially to keep the mode of assigned position to arrange.

15. 1 kinds of brush scrubbers, is characterized in that, comprising:

Base plate supports body, rotates aforesaid substrate, makes the substrate rotation of disc-shape;

Cleaning brush, rotates with the state contacted with the plate face of aforesaid substrate, thus the plate face of contact cleaning aforesaid substrate;

First liquid supply unit, is positioned at the side of above-mentioned cleaning brush, to the above-mentioned cleaning brush supply liquid of first area; And

Washings injection portion, the plate to the aforesaid substrate that have passed above-mentioned first area faces the lateral direction spray rinse water of aforesaid substrate,

Before foreign matter on the plate face of aforesaid substrate arrives above-mentioned cleaning brush, release foreign matter, foreign matter is discharged to the outside of aforesaid substrate.

16. brush scrubbers according to claim 15, is characterized in that,

Above-mentioned first area is the region that the above-mentioned direction of rotation of cleaning brush and the sense of rotation of aforesaid substrate contact with direction opposite each other.

17. brush scrubbers according to claim 16, is characterized in that,

Compared to washings tap, above-mentioned washings injection portion large area spray rinse water.

18. brush scrubbers according to claim 16, is characterized in that,

The form that above-mentioned washings injection portion mixes mutually with washings and Compressed Gas is sprayed.

19. brush scrubbers according to claim 16, is characterized in that,

Above-mentioned washings injection portion and above-mentioned first liquid donor site are in a liquid donor.

20. brush scrubbers according to claim 19, is characterized in that,

Aforesaid liquid donor is formed as elongated rod-shaped, is arranged side by side with above-mentioned cleaning brush.

21. brush scrubbers according to claim 19, is characterized in that,

The second liquid supply unit is formed in aforesaid liquid donor, above-mentioned second liquid supply unit is used for spraying liquid to the above-mentioned cleaning brush of second area, and above-mentioned second area is the mutually the same region of the sense of rotation of the direction of rotation of above-mentioned cleaning brush and aforesaid substrate.

22. brush scrubbers according to claim 21, is characterized in that,

The liquid quantity delivered of the time per unit by above-mentioned first liquid supply unit supply is less than by the liquid quantity delivered of the time per unit of above-mentioned second liquid supply unit supply.

23. brush scrubbers according to claim 15, is characterized in that,

The direction of the radial direction of above-mentioned cleaning brush to wafer in matting moves back and forth.

24., according to claim 15 to the brush scrubber described in any one in 23, is characterized in that,

Relative to the plate face of aforesaid substrate, the formation of above-mentioned washings injection portion is less than or equal to the angle of 45 ° with spray rinse water.

25. brush scrubbers according to claim 24, is characterized in that,

Above-mentioned cleaning brush is configured to the center through aforesaid substrate, in the side of aforesaid substrate not being configured with aforesaid liquid donor, also comprise the second washings injection portion, above-mentioned second washings injection portion faces the lateral direction spray rinse water of aforesaid substrate to the plate of the aforesaid substrate that have passed above-mentioned second area, thus making the foreign matter on the plate face of aforesaid substrate before the above-mentioned second area of arrival, the outside to aforesaid substrate is discharged.