CN204702662U - Temperable three-silver LOW-E glass - Google Patents
Temperable three-silver LOW-E glass Download PDFInfo
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- CN204702662U CN204702662U CN201520403756.0U CN201520403756U CN204702662U CN 204702662 U CN204702662 U CN 204702662U CN 201520403756 U CN201520403756 U CN 201520403756U CN 204702662 U CN204702662 U CN 204702662U
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- 239000011521 glass Substances 0.000 title claims abstract description 45
- 229910052709 silver Inorganic materials 0.000 title claims description 26
- 239000004332 silver Substances 0.000 title claims description 26
- VNNRSPGTAMTISX-UHFFFAOYSA-N chromium nickel Chemical group [Cr].[Ni] VNNRSPGTAMTISX-UHFFFAOYSA-N 0.000 claims abstract description 44
- 229910001120 nichrome Inorganic materials 0.000 claims abstract description 43
- 238000005496 tempering Methods 0.000 claims abstract description 24
- 239000000758 substrate Substances 0.000 claims abstract description 8
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 claims description 26
- 229910010413 TiO 2 Inorganic materials 0.000 claims description 24
- 239000012528 membrane Substances 0.000 claims description 5
- LKJPSUCKSLORMF-UHFFFAOYSA-N Monolinuron Chemical compound CON(C)C(=O)NC1=CC=C(Cl)C=C1 LKJPSUCKSLORMF-UHFFFAOYSA-N 0.000 claims description 3
- 239000002131 composite material Substances 0.000 claims description 3
- 238000002310 reflectometry Methods 0.000 abstract description 5
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N titanium dioxide Inorganic materials O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 abstract description 5
- 229910004205 SiNX Inorganic materials 0.000 abstract description 4
- 150000001875 compounds Chemical class 0.000 abstract 2
- 241000251468 Actinopterygii Species 0.000 abstract 1
- 239000010410 layer Substances 0.000 description 137
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical group [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 description 50
- 239000007789 gas Substances 0.000 description 36
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 34
- 239000011787 zinc oxide Substances 0.000 description 25
- 238000004544 sputter deposition Methods 0.000 description 22
- 238000001755 magnetron sputter deposition Methods 0.000 description 20
- 239000000376 reactant Substances 0.000 description 19
- 229910052786 argon Inorganic materials 0.000 description 17
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical group [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 description 11
- 229910010271 silicon carbide Inorganic materials 0.000 description 11
- 229910052751 metal Inorganic materials 0.000 description 10
- 239000002184 metal Substances 0.000 description 10
- 238000009413 insulation Methods 0.000 description 6
- 239000000463 material Substances 0.000 description 6
- 239000004065 semiconductor Substances 0.000 description 5
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 4
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 3
- 230000005540 biological transmission Effects 0.000 description 3
- 238000006243 chemical reaction Methods 0.000 description 3
- 238000000576 coating method Methods 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 210000004379 membrane Anatomy 0.000 description 3
- 239000001301 oxygen Substances 0.000 description 3
- 229910052760 oxygen Inorganic materials 0.000 description 3
- 230000005855 radiation Effects 0.000 description 3
- 239000010936 titanium Substances 0.000 description 3
- 210000002469 basement membrane Anatomy 0.000 description 2
- 239000000919 ceramic Substances 0.000 description 2
- 238000002347 injection Methods 0.000 description 2
- 239000007924 injection Substances 0.000 description 2
- 150000002500 ions Chemical class 0.000 description 2
- 229910044991 metal oxide Inorganic materials 0.000 description 2
- 150000004706 metal oxides Chemical class 0.000 description 2
- 229910052757 nitrogen Inorganic materials 0.000 description 2
- 230000003287 optical effect Effects 0.000 description 2
- 230000003647 oxidation Effects 0.000 description 2
- 238000007254 oxidation reaction Methods 0.000 description 2
- 229910052710 silicon Inorganic materials 0.000 description 2
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 2
- 238000002834 transmittance Methods 0.000 description 2
- 229910018487 Ni—Cr Inorganic materials 0.000 description 1
- 229910052581 Si3N4 Inorganic materials 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- ORILYTVJVMAKLC-UHFFFAOYSA-N adamantane Chemical compound C1C(C2)CC3CC1CC2C3 ORILYTVJVMAKLC-UHFFFAOYSA-N 0.000 description 1
- 229910001573 adamantine Inorganic materials 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 230000007812 deficiency Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 230000007613 environmental effect Effects 0.000 description 1
- 239000011152 fibreglass Substances 0.000 description 1
- 230000004907 flux Effects 0.000 description 1
- 239000002346 layers by function Substances 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000011159 matrix material Substances 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 229910003465 moissanite Inorganic materials 0.000 description 1
- 230000007935 neutral effect Effects 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 239000011241 protective layer Substances 0.000 description 1
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 1
- 239000000243 solution Substances 0.000 description 1
- 238000007669 thermal treatment Methods 0.000 description 1
- 239000004408 titanium dioxide Substances 0.000 description 1
- 239000011701 zinc Substances 0.000 description 1
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- Surface Treatment Of Glass (AREA)
Abstract
The utility model discloses a but three silver-colored LOW-E glass of tempering, including the glass substrate the compound face of glass substrate on by interior to outer compound twenty retes, its characterized in that adjacently in proper order: wherein the first film layer, i.e. the innermost layer, is SiNxThe second film layer is TiO2The third film layer is a ZnO layer, the fourth film layer is a NiCr layer, the fifth film layer is an Ag layer, the sixth film layer is a NiCr layer, and the seventh film layer is TiO2The eighth film layer is ZnO2The ninth film layer is a NiCr layer, the tenth film layer is an Ag layer, the eleventh film layer is a NiCr layer, and the twelfth film layer is TiO2The thirteenth film layer is ZnO2The fourteenth film layer is a NiCr layer, the fifteenth layer is an Ag layer, the sixteenth layer is a NiCr layer, and the seventeenth layer is TiO2The eighteenth layer is a ZnO layer, and the nineteenth layer is SiNxThe twentieth layer, the outermost layer, is a SiC layer. The utility model provides a three silver-colored LOW-E glass of tempering that the anti mechanical fish tail ability of rete is strong and heat resistance is good, and the transmissivity is high, and the reflectivity is LOW, and the shading coefficient is little, and color deviation is little after the tempering.
Description
[technical field]
The utility model relates to a kind of coated glass, is more particularly that one can tempering three silver medal LOW-E glass.
[background technology]
Glass plays key player, coated glass widespread use in the production and life in the present age, but existing film on coated glass easily scratches, heat resistanceheat resistant poor performance, and light transmission rate is low, and reflectivity is high, and shading coefficient is high, and after tempering, misalignment is large.
[utility model content]
The utility model object overcomes the deficiencies in the prior art, and ability is strong and resistance toheat good to provide a kind of rete resistance to mechanical to scratch, and transmitance is high, and reflectivity is low, and shading coefficient is little, and what after tempering, misalignment was little can tempering three silver medal LOW-E glass.
The utility model is achieved through the following technical solutions:
One can tempering three silver medal LOW-E glass, includes glass substrate 1, the composite surface of described glass substrate 1 is adjacent to from inside to outside be successively compounded with 20 retes, it is characterized in that: wherein the first rete and innermost layer are SiN
xlayer the 21, second rete is TiO
2layer 22, third membrane layer is ZnO layer 23, and the 4th rete is NiCr layer the 24, five rete is Ag layer 25, and layer 6 film is NiCr layer the 26, seven rete is TiO
2layer the 27, eight rete is ZnO
2layer the 28, nine rete be NiCr layer the 29, ten rete is Ag layer the 210, the 11 rete is NiCr layer 211, and the 12 rete is TiO
2layer the 212, the 13 rete is ZnO
2layer the 213, the 14 rete is NiCr layer 214, and the 15 layer is Ag layer 215, and the 16 layer is NiCr layer 216, and the 17 layer is TiO
2the 217, the 18 layer, layer is ZnO layer 218, and the 19 layer is SiN
xthe 219, the 20 layer, layer i.e. outermost layer is SiC layer 220.
Compared with prior art, the utility model has the following advantages:
1, this glass use SiC makes resistance to mechanical scuffing ability and the resistance toheat that teleblem improves coatings further, with SiN
xfilm combinationally uses and the hardness of rete is improved further, reduces the difficulty of processing, more convenient processing, SiC and SiN
xoptical property is close.
2, this glass utilizes SiN
xmake basement membrane, improve the hardness of rete, the injection of ion of can preventing from receiving destroys silver layer, and at high temperature thermotolerance is better to make whole rete, and mechanicalness is better, has the characteristic of visible ray high transmission and centering far infrared rays high reverse--bias.
3, transmittance T (through the optical throughput of transparent or semitransparent body and the percentage of its incident flux) >=65% after this glass tempering, radiant ratio≤0.03, reflectivity≤15, shading coefficient SC≤0.4.This glass radiant ratio≤0.03, radiant ratio is the ratio of heat commensurability area black matrix radiations heat energy under uniform temp, the same terms of the unit surface radiation of object.Radiant ratio definition is the ability of object absorption or reflecting heat.The radiant ratio of glass is more close to zero, and its heat-insulating property is better.
4, this glass reinforced plastic can synthesize hollow use, can meet strange land tempering, hollow processing uses.
5, after this glass tempering, misalignment is less, a*=-3.5 ~-4, b*=-4.5 ~-5.5.
[accompanying drawing explanation]
Fig. 1 is the utility model structural representation.
[embodiment]
One can tempering three silver medal LOW-E glass, and include glass substrate 1, the composite surface of described glass substrate 1 is adjacent to from inside to outside be successively compounded with 20 retes, wherein the first rete and innermost layer are SiN
xlayer the 21, second rete is TiO
2layer 22, third membrane layer is ZnO layer 23, and the 4th rete is NiCr layer the 24, five rete is Ag layer 25, and layer 6 film is NiCr layer the 26, seven rete is TiO
2layer the 27, eight rete is ZnO
2layer the 28, nine rete be NiCr layer the 29, ten rete is Ag layer the 210, the 11 rete is NiCr layer 211, and the 12 rete is TiO
2layer the 212, the 13 rete is ZnO
2layer the 213, the 14 rete is NiCr layer 214, and the 15 layer is Ag layer 215, and the 16 layer is NiCr layer 216, and the 17 layer is TiO
2the 217, the 18 layer, layer is ZnO layer 218, and the 19 layer is SiN
xthe 219, the 20 layer, layer i.e. outermost layer is SiC layer 220.
Described innermost layer SiN
xlayer 21, i.e. silicon nitride layer; SiN
xbe a kind of adamantine material, utilize SiN
xmake basement membrane, improve the hardness of rete, the injection of ion of can preventing from receiving destroys silver layer, and at high temperature thermotolerance is better to make whole rete, and mechanicalness is better, has the characteristic of visible ray high transmission and centering far infrared rays high reverse--bias.SiN
xthe thickness of layer 21 is 15 ~ 25nm, and preferred 20nm, nm are nanometers, 1m=10
9nm.19 rete SiN
xthe thickness of layer 219 is 20 ~ 35nm, preferred 28nm.
Described second layer TiO
2layer 22, i.e. titanyl compound---titanium dioxide.Adopt the TiO of high refractive index n=2.5
2being the transmittance in order to improve glass, reducing the surface resistance of silver layer, reduce the consumption of silver, produce scattering of light after LOW-E thermal treatment can being reduced again, and glass is neutral color, TiO
2film surface unusual light, thus improves the electric conductivity of silverskin.The TiO of described second rete
2the thickness of layer 22 is 20 ~ 35nm, preferred 28nm.Layer 7 rete TiO
2the thickness of layer 27 is 15 ~ 35nm, the 12 rete TiO
2the thickness of layer 212 is 15 ~ 30nm, the 17 rete TiO
2the thickness of layer 217 is 25 ~ 35nm.
Described third layer ZnO layer 23, i.e. zinc oxide film is antireflecting metal oxide layer, improves visible light transmissivity and the thermal insulation of rete further simultaneously.Zinc oxide ZnO can be used as medium layer, and the temperature of reduction glass is the infringement to silver layer, as coated glass medium layer, not only protects silver layer, also improves while visible ray passes through and have high reflection to infrared rays, to reach insulation and heat insulation effect.ZnO layer has anti-reflection effect.The thickness of the ZnO layer 23 of described third membrane layer is 5 ~ 15nm, and the thickness of the 18 layer of ZnO layer 218 is 10 ~ 20nm.
Described 4th rete NiCr layer 24, i.e. nickel chromium triangle metal level, as protective layer and the levelling blanket of Ag layer, improves the oxidation that oxidation resistent susceptibility prevents Ag layer.The thickness of described 4th rete NiCr layer the 24, the 6th rete NiCr layer the 26, the 9th rete NiCr layer the 29, the 11 rete NiCr layer the 211, the 14 rete NiCr layer the 214, the 16 layer of NiCr layer 216 is 2 ~ 5nm.Be preferably 3nm.
Described layer 5 Ag layer 24, i.e. metallic silver layer, functional layer, argent provides lower radiant ratio, plays environmental protection and energy saving.The thickness of described 5th rete Ag layer the 25, the tenth rete Ag layer the 210, the 15 rete Ag layer 215 is 5 ~ 10nm.
Described 8th rete ZnO
2layer 28, i.e. zinc oxide film is antireflecting metal oxide layer, improves visible light transmissivity and the thermal insulation of rete further simultaneously.Zinc oxide ZnO can be used as medium layer, and the temperature of reduction glass is the infringement to silver layer, as coated glass medium layer, not only protects silver layer, also improves while visible ray passes through and have high reflection to infrared rays, to reach insulation or heat insulation effect.Described 8th rete ZnO
2layer the 28, the 13 rete ZnO
2the thickness of layer 213 is 5 ~ 15nm.
Described outermost layer SiC layer 220, i.e. silicon carbide layer, use SiC makes resistance to mechanical scuffing ability and the resistance toheat that teleblem improves coatings further, combinationally using with SiNx film makes the hardness of rete improve further, reduce the difficulty of processing, more convenient processing, SiC and SiNx optical property is close.The thickness of described outermost layer SiC layer 220 is 30 ~ 60nm.
Preparation can the method for tempering three silver medal LOW-E glass, comprises the steps:
(1) magnetron sputtering SiN
xlayer, makes reactant gases sputtering semiconductor material with interchange intermediate frequency power supply, nitrogen, use purity be 99.9% Si target sputter;
(2) magnetron sputtering TiO
2layer, the sputtering semiconductor material pottery Ti target of reactant gases of deciding with midfrequent AC power supply, argon gas;
(3) magnetron sputtering ZnO layer, sputters ceramic Zn target with midfrequent AC power supply;
(4) magnetron sputtering NiCr layer, the metal sputtering of reactant gases of deciding with direct supply, argon gas;
(5) magnetron sputtering Ag layer, the metal sputtering of reactant gases of deciding with direct supply, argon gas;
(6) magnetron sputtering NiCr layer, the metal sputtering of reactant gases of deciding with direct supply, argon gas;
(7) magnetron sputtering TiO
2layer, the sputtering semiconductor material pottery Ti target of reactant gases of deciding with midfrequent AC power supply, argon gas;
(8) magnetron sputtering ZnO
2layer, with the sputtering of midfrequent AC power supply, the decide argon gas of reactant gases of oxygen does assisted reaction sputtering;
(9) magnetron sputtering NiCr layer, the metal sputtering of reactant gases of deciding with direct supply, argon gas;
(10) magnetron sputtering Ag layer, the metal sputtering of reactant gases of deciding with direct supply, argon gas;
(11) magnetron sputtering NiCr layer, the metal sputtering of reactant gases of deciding with direct supply, argon gas;
(12) magnetron sputtering TiO
2layer, the sputtering semiconductor material pottery Ti target of reactant gases of deciding with midfrequent AC power supply, argon gas;
(13) magnetron sputtering ZnO
2layer, with the sputtering of midfrequent AC power supply, the decide argon gas of reactant gases of oxygen does assisted reaction sputtering;
(14) magnetron sputtering NiCr layer, the metal sputtering of reactant gases of deciding with direct supply, argon gas;
(15) magnetron sputtering Ag layer, the metal sputtering of reactant gases of deciding with direct supply, argon gas;
(16) magnetron sputtering NiCr layer, the metal sputtering of reactant gases of deciding with direct supply, argon gas;
(17) magnetron sputtering TiO
2layer, the sputtering of reactant gases of deciding with midfrequent AC power supply, argon gas;
(18) magnetron sputtering ZnO layer, with the sputtering of midfrequent AC power supply, the decide argon gas of reactant gases of oxygen does assisted reaction sputtering;
(19) magnetron sputtering SiN
xlayer, with midfrequent AC power supply, nitrogen decide reactant gases sputtering semiconductor material, use purity be 99.9% Si target sputter;
(20) magnetron sputtering SiC layer, uses midfrequent AC power supply, and argon gas is decided reactant gases sputtering semiconductive ceramic SiC target.
Can improve a lot on solar properties by tempering three silver medal LOW-E glass, three layers of silverskin can make emittance drop to very low value, and namely heat transfer coefficient drops to low value; And it is while reduction sun power, still can keep very high visible light transmissivity, so three silver medal LOW-E coating have good selectivity in solar properties.
LOW-E glass is also called low radiation coated glass.
After this glass tempering, misalignment is less, a*=-3.5 ~-4, b*=-4.5 ~-5.5.
Transmitance >=65%, radiant ratio≤0.03, reflectivity is≤15%, shading coefficient SC≤0.40.
Claims (8)
1. one kind can tempering three silver medal LOW-E glass, include glass substrate (1), the composite surface of described glass substrate (1) is adjacent to be compounded with 20 retes from inside to outside successively, it is characterized in that: wherein the first rete and innermost layer are SiN
xlayer (21), the second rete is TiO
2layer (22), third membrane layer is ZnO layer (23), and the 4th rete is NiCr layer (24), and the 5th rete is Ag layer (25), and layer 6 film is NiCr layer (26), and the 7th rete is TiO
2layer (27), the 8th rete is ZnO
2layer (28), the 9th rete is NiCr layer (29), and the tenth rete is Ag layer (210), and the 11 rete is NiCr layer (211), and the 12 rete is TiO
2layer (212), the 13 rete is ZnO
2layer (213), the 14 rete is NiCr layer (214), and the 15 layer is Ag layer (215), and the 16 layer is NiCr layer (216), and the 17 layer is TiO
2layer (217), the 18 layer is ZnO layer (218), and the 19 layer is SiN
xlayer (219), the 20 layer is outermost layer is SiC layer (220).
2. according to claim 1 can tempering three silver medal LOW-E glass, it is characterized in that the SiN of described first rete
xthe thickness of layer (21) is 15 ~ 25nm, the 19 rete SiN
xthe thickness of layer (219) is 20 ~ 35nm.
3. according to claim 1 can tempering three silver medal LOW-E glass, it is characterized in that the TiO of described second rete
2the thickness of layer (22) is 20 ~ 35nm, layer 7 rete TiO
2the thickness of layer (27) is 15 ~ 35nm, the 12 rete TiO
2the thickness of layer (212) is 15 ~ 30nm, the 17 rete TiO
2the thickness of layer (217) is 25 ~ 35nm.
4. according to claim 1 can tempering three silver medal LOW-E glass, it is characterized in that the thickness of the ZnO layer (23) of described third membrane layer is 5 ~ 15nm, the thickness of the 18 layer of ZnO layer (218) is 10 ~ 20nm.
5. according to claim 1 can tempering three silver medal LOW-E glass, it is characterized in that the 8th rete ZnO
2layer (28), the 13 rete ZnO
2the thickness of layer (213) is 5 ~ 15nm.
6. according to claim 1 can tempering three silver medal LOW-E glass, it is characterized in that described 4th rete NiCr layer (24), the 6th rete NiCr layer (26), the 9th rete NiCr layer (29), the 11 rete NiCr layer (211), the 14 rete NiCr layer (214), the thickness of the 16 layer of NiCr layer (216) be 2 ~ 5nm.
7. according to claim 1 can tempering three silver medal LOW-E glass, it is characterized in that the thickness of described 5th rete Ag layer (25), the tenth rete Ag layer (210), the 15 rete Ag layer (215) is 5 ~ 10nm.
8. according to claim 1 can tempering three silver medal LOW-E glass, it is characterized in that the thickness of described 20 layer of i.e. outermost layer SiC layer (220) is 30 ~ 60nm.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201520403756.0U CN204702662U (en) | 2015-06-12 | 2015-06-12 | Temperable three-silver LOW-E glass |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201520403756.0U CN204702662U (en) | 2015-06-12 | 2015-06-12 | Temperable three-silver LOW-E glass |
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| Publication Number | Publication Date |
|---|---|
| CN204702662U true CN204702662U (en) | 2015-10-14 |
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|---|---|---|---|
| CN201520403756.0U Expired - Fee Related CN204702662U (en) | 2015-06-12 | 2015-06-12 | Temperable three-silver LOW-E glass |
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| CN (1) | CN204702662U (en) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN104944798A (en) * | 2015-06-12 | 2015-09-30 | 中山市格兰特实业有限公司 | Temperable three-silver LOW-E glass and preparation method thereof |
| CN108218253A (en) * | 2018-01-11 | 2018-06-29 | 中建材光电装备（太仓）有限公司 | A kind of high-permeability, tempered three silver medal Low-E glass and preparation method thereof |
| CN110484875A (en) * | 2019-08-20 | 2019-11-22 | 蚌埠兴科玻璃有限公司 | A kind of resistance to oxidation glass-film |
-
2015
- 2015-06-12 CN CN201520403756.0U patent/CN204702662U/en not_active Expired - Fee Related
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN104944798A (en) * | 2015-06-12 | 2015-09-30 | 中山市格兰特实业有限公司 | Temperable three-silver LOW-E glass and preparation method thereof |
| CN104944798B (en) * | 2015-06-12 | 2017-11-14 | 中山市格兰特实业有限公司 | Temperable three-silver LOW-E glass and preparation method thereof |
| CN108218253A (en) * | 2018-01-11 | 2018-06-29 | 中建材光电装备（太仓）有限公司 | A kind of high-permeability, tempered three silver medal Low-E glass and preparation method thereof |
| CN108218253B (en) * | 2018-01-11 | 2020-12-11 | 中建材光电装备（太仓）有限公司 | High-permeability tempered three-silver Low-E glass and preparation method thereof |
| CN110484875A (en) * | 2019-08-20 | 2019-11-22 | 蚌埠兴科玻璃有限公司 | A kind of resistance to oxidation glass-film |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| CF01 | Termination of patent right due to non-payment of annual fee | ||
| CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20151014 Termination date: 20200612 |